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Journal articles on the topic 'Inductive plasma'

Author: Grafiati

Published: 17 September 2022

Last updated: 25 July 2025

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1

Keller, John H. "Inductive plasmas for plasma processing." Plasma Sources Science and Technology 5, no. 2 (1996): 166–72. http://dx.doi.org/10.1088/0963-0252/5/2/008.

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2

Isupov, M. V. "Distributed ferromagnetic enhanced inductive plasma source for plasma processing." Journal of Physics: Conference Series 2119, no. 1 (2021): 012115. http://dx.doi.org/10.1088/1742-6596/2119/1/012115.

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Abstract New experimental data on the plasma density profiles have been obtained for a low-frequency (100 kHz) distributed ferromagnetic enhanced inductive plasma source at different locations of inductive discharges. An ability to control the plasma density profiles in a large gas discharge chamber in order to achieve a uniform treatment of a substrate is demonstrated. The differences between the obtained results and literature data for a distributed ferromagnetic enhanced inductive plasma source combined with a radio-frequency inductive discharge are discussed.

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3

Vinogradov, Georgy K., and Shimao Yoneyama. "Balanced Inductive Plasma Sources." Japanese Journal of Applied Physics 35, Part 2, No. 9A (1996): L1130—L1133. http://dx.doi.org/10.1143/jjap.35.l1130.

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4

BURM, K. T. A. L. "The electronic identity of inductive and capacitive plasmas." Journal of Plasma Physics 74, no. 2 (2008): 155–61. http://dx.doi.org/10.1017/s0022377807006654.

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AbstractAn electronic identity relation, relating capacitively coupled plasma sources to corresponding inductively coupled plasma sources, has been derived, starting from the Maxwell relations for matter and the characteristics of a capacitor and of an inductor. Furthermore, the breakdown conditions for both capacitively coupled plasmas and for inductively coupled plasmas as well as their optimal operation frequency ranges are discussed.

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5

Godyak, Valery. "Ferromagnetic enhanced inductive plasma sources." Journal of Physics D: Applied Physics 46, no. 28 (2013): 283001. http://dx.doi.org/10.1088/0022-3727/46/28/283001.

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6

Godyak, Valery. "Plasma phenomena in inductive discharges." Plasma Physics and Controlled Fusion 45, no. 12A (2003): A399—A424. http://dx.doi.org/10.1088/0741-3335/45/12a/026.

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7

Tuszewski, M., I. Henins, M. Nastasi, W. K. Scarborough, K. C. Walter, and D. H. Lee. "Inductive plasma sources for plasma implantation and deposition." IEEE Transactions on Plasma Science 26, no. 6 (1998): 1653–60. http://dx.doi.org/10.1109/27.747883.

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8

Sobolewski, Mark A. "Second-harmonic currents in rf-biased, inductively coupled discharges." Plasma Sources Science and Technology 32, no. 6 (2023): 065015. http://dx.doi.org/10.1088/1361-6595/acda5a.

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Abstract Capacitively-coupled plasmas generate strong current or voltage signals at harmonics of their driving frequencies. Inductively coupled plasma (icp) systems generally do not, unless they are equipped with capacitively-coupled rf bias, which generates strong signals at harmonics of its driving frequency. Recently, however, at an asymmetric, rf-biased electrode, a current component was detected at the second harmonic of the inductive source frequency, not the rf-bias frequency. The origin of this current is here investigated (in argon discharges at 1.3 Pa) by comparison with measurements

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9

Lian, H., H. Q. Liu, D. L. Brower, et al. "Non-inductive plasma vertical position measurement for the 1056 s discharge on EAST." Review of Scientific Instruments 93, no. 10 (2022): 103511. http://dx.doi.org/10.1063/5.0101707.

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Vertical position stability plays a crucial role in maintaining safe and reliable plasma operation for long-pulse fusion devices. In general, the vertical position is measured by using inductive magnetic coils installed inside the vacuum vessel; however, the integration drift effects are inherent for steady-state or long-pulse plasma operation. Developing a non-magnetic approach provides a fusion reactor-relevant steady-state solution that avoids the negative impact of integration drift. In this paper, we compare the non-inductively determined vertical position achieved by line-integrated inte

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10

Gudmundsson, J. T., and M. A. Lieberman. "Magnetic induction and plasma impedance in a cylindrical inductive discharge." Plasma Sources Science and Technology 6, no. 4 (1997): 540–50. http://dx.doi.org/10.1088/0963-0252/6/4/012.

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11

Gudmundsson, J. T., and M. A. Lieberman. "Magnetic induction and plasma impedance in a planar inductive discharge." Plasma Sources Science and Technology 7, no. 2 (1998): 83–95. http://dx.doi.org/10.1088/0963-0252/7/2/002.

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12

Lim, Yeong-Min, Young-Hun Hong, Gil-Ho Kang, and Chin-Wook Chung. "Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor." Journal of Vacuum Science & Technology A 41, no. 1 (2023): 013005. http://dx.doi.org/10.1116/6.0002180.

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A highly efficient plasma source is developed in inductively coupled plasmas (ICPs) using a parallel capacitor, which is connected to an antenna in parallel. The power absorbed by the ICP is proportional to the equivalent resistance of the ICP. In order to improve the plasma generation, a parallel resonance is used between the parallel capacitor and the equivalent inductance by the plasma and the antenna. In all experiments conducted under an H-mode regime where the inductive heating is dominant, the resistance of a load involving the plasma increases about ten times near the resonance, and th

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13

Lho, T., N. Hershkowitz, G. H. Kim, W. Steer, and J. Miller. "Asymmetric plasma potential fluctuation in an inductive plasma source." Plasma Sources Science and Technology 9, no. 1 (2000): 5–11. http://dx.doi.org/10.1088/0963-0252/9/1/302.

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14

BURM, K. T. A. L. "Examination of aluminium and zinc plasmas from an inductive furnace by spectroscopy." Journal of Plasma Physics 79, no. 1 (2012): 25–31. http://dx.doi.org/10.1017/s0022377812000645.

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AbstractThe production of aluminium and zinc plasmas for the deposition of coatings upon steel strip is monitored by optical emission spectroscopy measurements. The plasma is created from an inductive source. The atom and the ion densities as well as the electron temperature are obtained such that the plasma can be characterized. It will be shown that the obtained plasmas are typically highly ionized and deviate from thermal equilibrium.

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15

Bournonville, B., and E. Meillot. "CHLOROFORM DESTRUCTION BY INDUCTIVE PLASMA PROCESS." High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) 11, no. 2 (2007): 245–56. http://dx.doi.org/10.1615/hightempmatproc.v11.i2.80.

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16

Vinogradov, G. K. "Transmission line balanced inductive plasma sources." Plasma Sources Science and Technology 9, no. 3 (2000): 400–412. http://dx.doi.org/10.1088/0963-0252/9/3/318.

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17

Arrowsmith, C. D., A. Dyson, J. T. Gudmundsson, R. Bingham, and G. Gregori. "Inductively-coupled plasma discharge for use in high-energy-density science experiments." Journal of Instrumentation 18, no. 04 (2023): P04008. http://dx.doi.org/10.1088/1748-0221/18/04/p04008.

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Abstract Inductively-coupled plasma discharges are well-suited as plasma sources for experiments in fundamental high-energy density science, which require large volume and stable plasmas. For example, experiments studying particle beam-plasma instabilities and the emergence of coherent macroscopic structures — which are key for modelling emission from collisionless shocks present in many astrophysical phenomena. A meter-length, table-top, inductive radio-frequency discharge has been constructed for use in a high-energy density science experiment at CERN which will study plasma instabilities of

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18

Sun, Xubo, and Longfei Xia. "ICP Test Sample Technology Reserve." Frontiers in Humanities and Social Sciences 3, no. 12 (2023): 150–53. http://dx.doi.org/10.54691/t563md80.

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The full name of ICP is the INDUCTIVELY COUPLED PLASMA, that is, the inductive coupling plasma technology, which is a very effective analysis method for measuring marks (PPM, PPB level). Under normal circumstances, it can be used with MS, AES, etc., which can realize various uses such as analysis of the amount of inorganic element marks, isotopes, unit elements, multi -element analysis, and multi -morphological analysis in organic matter.

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19

Turner, Matthew W., Clark W. Hawk, and Ron J. Litchford. "Inductive Measurement of Plasma Jet Electrical Conductivity." Journal of Propulsion and Power 21, no. 5 (2005): 900–907. http://dx.doi.org/10.2514/1.12077.

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20

Vieira, Robson, Sergey Balashov, and Stanislav Moshkalev. "Modeling of the Inductive Coupled Plasma Discharges." ECS Transactions 31, no. 1 (2019): 409–15. http://dx.doi.org/10.1149/1.3474186.

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21

Abeele, David Vanden, and Gerard Degrez. "Efficient Computational Model for Inductive Plasma Flows." AIAA Journal 38, no. 2 (2000): 234–42. http://dx.doi.org/10.2514/2.977.

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22

Scholze, F., M. Tartz, and H. Neumann. "Inductive coupled radio frequency plasma bridge neutralizer." Review of Scientific Instruments 79, no. 2 (2008): 02B724. http://dx.doi.org/10.1063/1.2802587.

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23

Tuszewski, M., and R. R. White. "Instabilities of Ar/SF6 inductive plasma discharges." Journal of Applied Physics 94, no. 5 (2003): 2858–63. http://dx.doi.org/10.1063/1.1600830.

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24

Croccolo, F., R. Barni, S. Zanini, A. Palvarini, and C. Riccardi. "Material surface modifications with an inductive plasma." Journal of Physics: Conference Series 100, no. 6 (2008): 062023. http://dx.doi.org/10.1088/1742-6596/100/6/062023.

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25

Martin, Adam, and Richard Eskridge. "Electrical coupling efficiency of inductive plasma accelerators." Journal of Physics D: Applied Physics 38, no. 23 (2005): 4168–79. http://dx.doi.org/10.1088/0022-3727/38/23/005.

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26

Vanden Abeele, David, and Gerard Degrez. "Efficient computational model for inductive plasma flows." AIAA Journal 38 (January 2000): 234–42. http://dx.doi.org/10.2514/3.14402.

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27

Teske, C., J. Jacoby, W. Schweizer, and J. Wiechula. "Thyristor stack for pulsed inductive plasma generation." Review of Scientific Instruments 80, no. 3 (2009): 034702. http://dx.doi.org/10.1063/1.3095686.

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28

Serbin, Sergey, and Аnna Mostipanenko. "INFLUENCE OF MODE AND GEOMETRIC CHRATERISTICS ON HIGHT-FREQUENCY INDUCTIVE PLASMA TORCH WITH REVERSE VORTEX FLOW." Science Journal Innovation Technologies Transfer, no. 2019-1 (February 2, 2019): 77–82. http://dx.doi.org/10.36381/iamsti.1.2019.77-82.

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The analysis of aerodynamic and heat structure of flow in high-frequency inductive plasma torch has been carried out. The range of plasma torch power is measured in dozens of kilowatts. The numerical simulation methods of the turbulent flow in the plasma torch affected by high frequency electromagnetic field without considering the chemical kinetics are used during the research. The data of temperature field and induced current density in the plasma torch depending on current amperage and frequency are obtained. Also, these data are obtained depending on the flow scheme in the operated on argo

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29

Cheng, Yuguo, and Guangqing Xia. "Numerical investigation of flow properties of the pulsed inductive thruster considering plasma electrical characteristics." Proceedings of the Institution of Mechanical Engineers, Part G: Journal of Aerospace Engineering 233, no. 11 (2018): 4106–14. http://dx.doi.org/10.1177/0954410018813439.

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The pulsed inductive thruster accelerates the propellant by the repulsion between inductive coil and current sheet. To accurately investigate the acceleration characteristics in the first half period of pulsed inductive discharge and the energy needed to generate effective impulse, an unsteady magnetohydrodynamics model is developed, in which the coil-plasma boundary condition is improved by plasma electrical model, and the electrical conductivity is calculated using gas kinetic method. The analysis of plasma electrical characteristics shows confining of particles in the beginning and accelera

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30

Kral'kina, E. A. "Low-pressure radio-frequency inductive discharge and possibilities of optimizing inductive plasma sources." Physics-Uspekhi 51, no. 5 (2008): 493–512. http://dx.doi.org/10.1070/pu2008v051n05abeh006422.

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31

KAWATA, Hiroaki, Hidetomo IYANAGA, Takashi MATSUNAGA, Masaaki YASUDA, and Kenji MURATA. "Relations between Antenna Coil Current and Plasma Parameters for Inductive Coupled Plasmas." SHINKU 44, no. 3 (2001): 260–63. http://dx.doi.org/10.3131/jvsj.44.260.

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32

Okhapkin A. I., Kraev S. A., Arkhipova E. A., et al. "Influence of chloropentafluoroethane inductively coupled plasma parameters on the rate and characteristics of gallium arsenide etching." Semiconductors 56, no. 7 (2022): 489. http://dx.doi.org/10.21883/sc.2022.07.54652.15.

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In paper the influence of parameters of inductively coupled chloropentafluoroethane plasma on the rate and characteristics of gallium arsenide etching was studied. Etched GaAs profiles by white light interferometry and scanning electron microscopy were investigated. It turned out that the process rate does not depend on freon flow, but forward and inductive power, as well as pressure determined. In this case, when the power of the plasma generator increase, the surface morphology changes significantly, that manifests itself in roughness increase and the detection of defects on GaAs and mask. C

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33

Korytchenko, K. V., V. F. Bolyukh, S. G. Buriakovskyi, Y. V. Kashansky, and O. I. Kocherga. "Plasma acceleration in the atmosphere by pulsed inductive thruster." Electrical Engineering & Electromechanics, no. 4 (June 21, 2024): 61–69. http://dx.doi.org/10.20998/2074-272x.2024.4.08.

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Introduction. One of the directions of development of plasma technologies consists in the formation of gas-metal plasma formations and throwing them to a certain distance. Known thrusters of plasma formation either have an electrode system that is prone to erosion, or a discharge system in a solid dielectric substance in which ablation occurs, or a complex gas-dynamic system with fuel supply. They do not provide acceleration of plasma formation in the atmosphere for a significant distance. Purpose. A theoretical and experimental study of electromechanical and thermophysical processes in a plas

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34

Gehring, Tim, Qihao Jin, Fabian Denk, Santiago Eizaguirre, David Karcher, and Rainer Kling. "Reducing the Transition Hysteresis of Inductive Plasmas by a Microwave Ignition Aid." Plasma 2, no. 3 (2019): 341–47. http://dx.doi.org/10.3390/plasma2030026.

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Inductive plasma discharge has been a part of continuous investigations since it was discovered. Especially the E- to H-mode transition and the hysteresis behavior have been topics of research in the last few decades. In this paper, we demonstrate a way to reduce the hysteresis behavior by the usage of a microwave ignition system. With this system, a significant decrease of the needed coil current for the ignition of the inductive driven plasma is realized. For the microwave generation, a magnetron as in a conventional microwave oven is used, which offers a relatively inexpensive way for micro

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35

Lim, Jong Hyeuk, Kyong Nam Kim, and Geun Young Yeom. "Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing." Solid State Phenomena 124-126 (June 2007): 271–74. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.271.

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An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a

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36

Cheng Yu-Guo and Xia Guang-Qing. "Numerical investigation on the plasma acceleration of the inductive pulsed plasma thruster." Acta Physica Sinica 66, no. 7 (2017): 075204. http://dx.doi.org/10.7498/aps.66.075204.

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37

Godyak, V., B. Alexandrovich, R. Piejak, and A. Smolyakov. "Nonlinear radio-frequency potential in an inductive plasma." Plasma Sources Science and Technology 9, no. 4 (2000): 541–44. http://dx.doi.org/10.1088/0963-0252/9/4/309.

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38

Bottin, Benoit, David Vanden Abeele, Mario Carbonaro, Gerard Degrez, and Gabbita S. R. Sarma. "Thermodynamic and Transport Properties for Inductive Plasma Modeling." Journal of Thermophysics and Heat Transfer 13, no. 3 (1999): 343–50. http://dx.doi.org/10.2514/2.6444.

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39

Tuszewski, M., and R. R. White. "Equilibrium properties of Ar/SF6 inductive plasma discharges." Plasma Sources Science and Technology 11, no. 3 (2002): 338–50. http://dx.doi.org/10.1088/0963-0252/11/3/317.

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40

Polzin, K. A., and E. Y. Choueiri. "Performance optimization criteria for pulsed inductive plasma acceleration." IEEE Transactions on Plasma Science 34, no. 3 (2006): 945–53. http://dx.doi.org/10.1109/tps.2006.875732.

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41

Guittienne, Ph, S. Lecoultre, P. Fayet, J. Larrieu, A. A. Howling, and Ch Hollenstein. "Resonant planar antenna as an inductive plasma source." Journal of Applied Physics 111, no. 8 (2012): 083305. http://dx.doi.org/10.1063/1.4705978.

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42

Alemany, C., C. Trassy, B. Pateyron, K. I. Li, and Y. Delannoy. "Refining of metallurgical-grade silicon by inductive plasma." Solar Energy Materials and Solar Cells 72, no. 1-4 (2002): 41–48. http://dx.doi.org/10.1016/s0927-0248(01)00148-9.

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43

Folio, F. "Centrifugal dispersion of metallic barstock in inductive plasma." Metal Powder Report 51, no. 1 (1997): 38. http://dx.doi.org/10.1016/s0026-0657(97)80130-0.

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44

Bandari, Anashe. "Plasma simulations reveal important parameters affecting inductive discharges." Scilight 2020, no. 36 (2020): 361106. http://dx.doi.org/10.1063/10.0001957.

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45

Godyak, V. A., R. B. Piejak, B. M. Alexandrovich, and V. I. Kolobov. "Hot plasma and nonlinear effects in inductive discharges." Physics of Plasmas 6, no. 5 (1999): 1804–12. http://dx.doi.org/10.1063/1.873438.

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46

Kontogeorgos, A. A., D. P. Korfiatis, K. A. Th Thoma, and J. C. Vardaxoglou. "Plasma generation in silicon-based inductive grid arrays." Optics and Lasers in Engineering 47, no. 11 (2009): 1195–98. http://dx.doi.org/10.1016/j.optlaseng.2009.06.006.

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47

Korytchenko, K. V., V. F. Bolyukh, S. G. Buriakovskyi, Y. V. Kashansky, and O. I. Kocherga. "Plasma acceleration in the atmosphere by pulsed inductive thruster." Electrical Engineering and Electromechanics 2024, no. 4 (2024): 61–69. https://doi.org/10.20998/2074-272X.2024.4.08.

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<strong><em>Introduction. </em></strong><em>One of the directions of development of plasma technologies consists in the formation of gas-metal plasma formations and throwing them to a certain distance. Known thrusters of plasma formation either have an electrode system that is prone to erosion, or a discharge system in a solid dielectric substance in which ablation occurs, or a complex gas-dynamic system with fuel supply. They do not provide acceleration of plasma formation in the atmosphere for a significant distance. </em><strong><em>Purpose</em></strong><strong><em>.</em></strong>

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48

Volynets, V. N., Wontaek Park, Yu N. Tolmachev, V. G. Pashkovsky, and Jinwoo Yoo. "Spatial variation of plasma parameters and ion acceleration in an inductive plasma system." Journal of Applied Physics 99, no. 4 (2006): 043302. http://dx.doi.org/10.1063/1.2170419.

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49

Melrose, D. B., and R. Yuen. "Pulsar electrodynamics revisited." Proceedings of the International Astronomical Union 8, S291 (2012): 283–86. http://dx.doi.org/10.1017/s1743921312023873.

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AbstractThe inductive electric field is unjustifiably neglected in most models for pulsar electrodynamics; it cannot be screened by the magnetospheric plasma, and it is not small in comparison with the corotation electric field. The perpendicular component of the inductive electric field implies a drift motion that is inconsistent with corotation at any angular velocity. Some implications of the inductive electric field and the associated drift motion are discussed.

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50

Kralkina, Elena A., Polina A. Nekludova, Alexander M. Nikonov, Alexandr A. Airapetov, Vadim A. Sologub, and Nikolay A. Dyuzhev. "Formation of Nanosized Coatings in Hybrid Plasma Reactor Combining Magnetron or Arc Deposition with RF Plasma Assistance." Materials Science Forum 900 (July 2017): 137–40. http://dx.doi.org/10.4028/www.scientific.net/msf.900.137.

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The hybrid plasma reactor is based on the combined magnetron or arc discharge and radio-frequency inductive discharge located in the external magnetic field. Magnetron or arc discharge provides the generation of atoms and ions of the target materials while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge. An external magnetic field is used to optimize the power input to the discharge, to increase the ion current density in the realm of substrate and to enhance the area of uniform plasma. The high value of the ion flow bombarding the substrate g

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