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Journal articles on the topic 'Inductively coupled radio frequency plasma'

Author: Grafiati

Published: 9 March 2023

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1

Boulos, Maher I. "THE INDUCTIVELY COUPLED RADIO FREQUENCY PLASMA." High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) 1, no. 1 (1997): 17–39. http://dx.doi.org/10.1615/hightempmatproc.v1.i1.20.

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2

Boulos, M. I. "The inductively coupled R.F. (radio frequency) plasma." Pure and Applied Chemistry 57, no. 9 (1985): 1321–52. http://dx.doi.org/10.1351/pac198557091321.

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3

Bera, K., B. Farouk, and P. Vitello. "Inductively coupled radio frequency methane plasma simulation." Journal of Physics D: Applied Physics 34, no. 10 (2001): 1479–90. http://dx.doi.org/10.1088/0022-3727/34/10/308.

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4

Abdel-Rahman, M., V. Schulz-von der Gathen, and T. Gans. "Transition phenomena in a radio-frequency inductively coupled plasma." Journal of Physics D: Applied Physics 40, no. 6 (2007): 1678–83. http://dx.doi.org/10.1088/0022-3727/40/6/017.

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5

Stittsworth, J. A., and A. E. Wendt. "Striations in a radio frequency planar inductively coupled plasma." IEEE Transactions on Plasma Science 24, no. 1 (1996): 125–26. http://dx.doi.org/10.1109/27.491744.

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6

Lafleur, T., and C. S. Corr. "Characterization of a radio-frequency inductively coupled electrothermal plasma thruster." Journal of Applied Physics 130, no. 4 (2021): 043304. http://dx.doi.org/10.1063/5.0056124.

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7

Tuszewski, M. "Enhanced Radio Frequency Field Penetration in an Inductively Coupled Plasma." Physical Review Letters 77, no. 7 (1996): 1286–89. http://dx.doi.org/10.1103/physrevlett.77.1286.

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8

Bozeman, S. P., D. A. Tucker, B. R. Stoner, J. T. Glass, and W. M. Hooke. "Diamond deposition using a planar radio frequency inductively coupled plasma." Applied Physics Letters 66, no. 26 (1995): 3579–81. http://dx.doi.org/10.1063/1.113793.

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9

Hua, Yue, Jian Song, Zeyu Hao, Gailing Zhang, and Chunsheng Ren. "Characteristics of a dual-radio-frequency cylindrical inductively coupled plasma." Contributions to Plasma Physics 59, no. 7 (2019): e201800029. http://dx.doi.org/10.1002/ctpp.201800029.

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10

Wang, Dongxiang, Zhenhua Hao, Xingying Zhu, Fa Zhou, Yongchun Shu, and Jilin He. "Spheroidization of lithium niobate powder by radio-frequency inductively coupled plasma." Ceramics International 48, no. 9 (2022): 12126–31. http://dx.doi.org/10.1016/j.ceramint.2022.01.073.

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11

Xianliang, Jiang, and M. I. Boulos. "Heat Transfer During Radio Frequency Inductively Coupled Plasma Deposition of Tungsten." Plasma Science and Technology 9, no. 4 (2007): 427–30. http://dx.doi.org/10.1088/1009-0630/9/4/09.

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12

Yanguang Shan. "A Stochastic Spray Model for the Radio-Frequency Inductively Coupled Plasma." IEEE Transactions on Plasma Science 37, no. 9 (2009): 1747–53. http://dx.doi.org/10.1109/tps.2009.2028141.

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13

Dewangan, Rakesh Kumar, Sangeeta B. Punjabi, N. K. Joshi, D. N. Barve, H. A. Mangalvedekar, and B. K. Lande. "State-space modeling of the radio frequency inductively-coupled plasma generator." Journal of Physics: Conference Series 208 (February 1, 2010): 012056. http://dx.doi.org/10.1088/1742-6596/208/1/012056.

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14

Amorim, J. "High-density plasma mode of an inductively coupled radio frequency discharge." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 9, no. 2 (1991): 362. http://dx.doi.org/10.1116/1.585576.

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15

Tang, Deli, and Paul K. Chu. "Anode double layer in magnetized radio frequency inductively coupled hydrogen plasma." Journal of Applied Physics 94, no. 3 (2003): 1390–95. http://dx.doi.org/10.1063/1.1589592.

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16

Qin, Qian, Fang Yang, Tao Shi, et al. "Spheroidization of tantalum powder by radio frequency inductively coupled plasma processing." Advanced Powder Technology 30, no. 8 (2019): 1709–14. http://dx.doi.org/10.1016/j.apt.2019.05.022.

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17

Tong, J. B., X. Lu, C. C. Liu, Z. Q. Pi, R. J. Zhang, and X. H. Qu. "Numerical simulation and prediction of radio frequency inductively coupled plasma spheroidization." Applied Thermal Engineering 100 (May 2016): 1198–206. http://dx.doi.org/10.1016/j.applthermaleng.2016.02.108.

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18

Tang, D. L., R. K. Y. Fu, X. B. Tian, and P. K. Chu. "Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation." Review of Scientific Instruments 74, no. 5 (2003): 2704–8. http://dx.doi.org/10.1063/1.1568559.

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19

Allen, G. Mark, and David M. Coleman. "Characterization of a Dual Inductively Coupled Plasma Atomic Emission Source." Applied Spectroscopy 41, no. 3 (1987): 381–87. http://dx.doi.org/10.1366/0003702874449039.

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A dual inductively copuled plasma atomic emission spectroscopic system is described. This new analytical discharge segregates the normally integrated processes of sampling and spectral excitation associated with atomic emission sources. A low-power, low-argon-flow, radio-frequency plasma is used as a sampling device to create gaseous species from liquid and solid samples which are subsequently transported to a second plasma for excitation. Design and construction of instrumentation and associated operational parameters are reviewed. Comparisons of the sampling and the excitation plasmas includ

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20

Scholze, F., M. Tartz, and H. Neumann. "Inductive coupled radio frequency plasma bridge neutralizer." Review of Scientific Instruments 79, no. 2 (2008): 02B724. http://dx.doi.org/10.1063/1.2802587.

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21

Cui, Chunshi, and R. W. Boswell. "Role of excitation frequency in a low‐pressure, inductively coupled radio‐frequency, magnetized plasma." Applied Physics Letters 63, no. 17 (1993): 2330–32. http://dx.doi.org/10.1063/1.110516.

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22

Ding, Z. F., W. G. Huo, and Y. N. Wang. "Novel low-frequency oscillation in a radio-frequency inductively coupled plasma with tuned substrate." Physics of Plasmas 11, no. 6 (2004): 3270–77. http://dx.doi.org/10.1063/1.1740772.

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23

Chin, O. H., K. K. Jayapalan, and C. S. Wong. "Effect of neutral gas heating in argon radio frequency inductively coupled plasma." International Journal of Modern Physics: Conference Series 32 (January 2014): 1460320. http://dx.doi.org/10.1142/s2010194514603202.

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Heating of neutral gas in inductively coupled plasma (ICP) is known to result in neutral gas depletion. In this work, this effect is considered in the simulation of the magnetic field distribution of a 13.56 MHz planar coil ICP. Measured electron temperatures and densities at argon pressures of 0.03, 0.07 and 0.2 mbar were used in the simulation whilst neutral gas temperatures were heuristically fitted. The simulated results showed reasonable agreement with the measured magnetic field profile.

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24

Zhenfeng, Ding, Huo Weigang, and Wang Younian. "The Tuned Substrate Self-bias in a Radio-frequency Inductively Coupled Plasma." Plasma Science and Technology 6, no. 6 (2004): 2549–58. http://dx.doi.org/10.1088/1009-0630/6/6/007.

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25

Li, Weifeng, Zhibin Yin, Wei Hang, Bin Li, and Benli Huang. "Pulsed radio-frequency discharge inductively coupled plasma mass spectrometry for oxide analysis." Spectrochimica Acta Part B: Atomic Spectroscopy 122 (August 2016): 69–74. http://dx.doi.org/10.1016/j.sab.2016.05.010.

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26

Noda, Hideyuki, Hisao Nagai, Masao Shimakura, Mineo Hiramatsu, and Masahito Nawata. "Synthesis of diamond using a low pressure, radio frequency, inductively coupled plasma." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16, no. 6 (1998): 3170–74. http://dx.doi.org/10.1116/1.581516.

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27

Hao, Zhenhua, Zhenhua Fu, Jintao Liu, et al. "Spheroidization of a granulated molybdenum powder by radio frequency inductively coupled plasma." International Journal of Refractory Metals and Hard Materials 82 (August 2019): 15–22. http://dx.doi.org/10.1016/j.ijrmhm.2019.03.023.

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28

Tsai, Chen-Ming, A. P. Lee, and C. S. Kou. "Characteristics of heating mode transitions in a radio-frequency inductively coupled plasma." Journal of Physics D: Applied Physics 39, no. 17 (2006): 3821–25. http://dx.doi.org/10.1088/0022-3727/39/17/017.

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29

Wagatsuma, Kazuaki. "APPLICATION OF MODULATION TECHNIQUES TO ATOMIC EMISSION SPECTROMETRY WITH INDUCTIVELY-COUPLED RADIO-FREQUENCY PLASMA AND RADIO-FREQUENCY GLOW DISCHARGE PLASMA." Applied Spectroscopy Reviews 37, no. 2 (2002): 223–45. http://dx.doi.org/10.1081/asr-120006045.

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30

Lim, Hyuna, Yoonsoo Park, Namwuk Baek, et al. "Plasma Polymerized SiCOH Films from Octamethylcyclotetrasiloxane by Dual Radio Frequency Inductively Coupled Plasma Chemical Vapor Deposition System." Journal of Nanoscience and Nanotechnology 21, no. 8 (2021): 4477–83. http://dx.doi.org/10.1166/jnn.2021.19417.

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We have fabricated porous plasma polymerized SiCOH (ppSiCOH) films with low-dielectric constants (low-k, less than 2.9), by applying dual radio frequency plasma in inductively coupled plasma chemical vapor deposition (ICP-CVD) system. We varied the power of the low radio frequency (LF) of 370 kHz from 0 to 65 W, while fixing the power of the radio frequency (RF) of 13.56 MHz. Although the ppSiCOH thin film without LF had the lowest k value, its mechanical strength is not high to stand the subsequent semiconductor processing. As the power of the LF was increased, the densities of ppSiCOH films

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31

Shin, Jong-Hyeon, Yong-Hyun Kim, Jong-Bae Park, et al. "A Study on the Characteristics of Inductively Coupled Plasma Nitridation Process." Coatings 12, no. 10 (2022): 1372. http://dx.doi.org/10.3390/coatings12101372.

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In this study, we investigated the nitridation of silicon oxide film surfaces using an inductively coupled plasma source. The plasma parameters and nitride film characteristics were measured under various nitrogen gas pressures and radio frequency power levels. Plasma parameters such as electron density, electron temperature, and ion density were measured and analyzed using several instruments. The nitridation characteristics of the thin films were characterized using X-ray photoelectron spectroscopy. The findings provide information on the correlation between nitridation rate and process para

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32

Munafò, A., S. A. Alfuhaid, J. L. Cambier, and M. Panesi. "A tightly coupled non-equilibrium model for inductively coupled radio-frequency plasmas." Journal of Applied Physics 118, no. 13 (2015): 133303. http://dx.doi.org/10.1063/1.4931769.

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33

Tong, Lei, Yu-Ru Zhang, Jia-Wei Huang, et al. "Hybrid simulation of radio frequency biased inductively coupled Cl2 plasmas." Physics of Plasmas 28, no. 5 (2021): 053512. http://dx.doi.org/10.1063/5.0048522.

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34

Sidelev, Dmitrii V., Sergey E. Ruchkin, Yuriy N. Yurjev, et al. "Stripping of carbon coatings in radio-frequency inductively coupled plasma of H2/Ar." Surface and Coatings Technology 427 (December 2021): 127837. http://dx.doi.org/10.1016/j.surfcoat.2021.127837.

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35

Mirek, Patrick, Sina Alavi, and Javad Mostaghimi. "Correction to: A Novel Radio‑Frequency Inductively Coupled Plasma Torch for Material Processing." Plasma Chemistry and Plasma Processing 41, no. 6 (2021): 1567–68. http://dx.doi.org/10.1007/s11090-021-10209-z.

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36

Meyer, J. A., and A. E. Wendt. "Measurements of electromagnetic fields in a planar radio‐frequency inductively coupled plasma source." Journal of Applied Physics 78, no. 1 (1995): 90–96. http://dx.doi.org/10.1063/1.360585.

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37

HE, Jianwu, Longfei MA, Senwen XUE, Chu ZHANG, Li DUAN, and Qi KANG. "Study of electron-extraction characteristics of an inductively coupled radio-frequency plasma neutralizer." Plasma Science and Technology 20, no. 2 (2018): 025403. http://dx.doi.org/10.1088/2058-6272/aa89e1.

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38

Yu, S. J., Z. F. Ding, J. Xu, J. L. Zhang, and T. C. Ma. "CVD of hard DLC films in a radio frequency inductively coupled plasma source." Thin Solid Films 390, no. 1-2 (2001): 98–103. http://dx.doi.org/10.1016/s0040-6090(01)00945-2.

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39

Shan, Yanguang, and J. Mostaghimi. "Numerical simulation of aerosol droplets desolvation in a radio frequency inductively coupled plasma." Spectrochimica Acta Part B: Atomic Spectroscopy 58, no. 11 (2003): 1959–77. http://dx.doi.org/10.1016/j.sab.2003.09.003.

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40

Seo, D. C., T. H. Chung, H. J. Yoon, and G. H. Kim. "Electrostatic probe diagnostics of a planar-type radio-frequency inductively coupled oxygen plasma." Journal of Applied Physics 89, no. 8 (2001): 4218–23. http://dx.doi.org/10.1063/1.1354633.

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41

Murata, Masayoshi, Yosiaki Takeuchi, Eishiro Sasagawa, and Kazutoshi Hamamoto. "Inductively coupled radio frequency plasma chemical vapor deposition using a ladder‐shaped antenna." Review of Scientific Instruments 67, no. 4 (1996): 1542–45. http://dx.doi.org/10.1063/1.1146885.

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42

Eng, K., K. Strohmaier, R. Palmer, B. Stoner, and S. Washburn. "Comparison of external and internal planar radio frequency antennae for inductively coupled plasma." Review of Scientific Instruments 68, no. 6 (1997): 2381–83. http://dx.doi.org/10.1063/1.1148121.

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43

Hossain, M. M., K. C. Paul, Y. Tanaka, T. Sakuta, and T. Ishigaki. "Prediction of operating region of pulse-modulated radio frequency inductively coupled thermal plasma." Journal of Physics D: Applied Physics 33, no. 15 (2000): 1843–53. http://dx.doi.org/10.1088/0022-3727/33/15/314.

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44

Ye, Rubin, Pierre Proulx, and Maher I. Boulos. "Particle turbulent dispersion and loading effects in an inductively coupled radio frequency plasma." Journal of Physics D: Applied Physics 33, no. 17 (2000): 2154–62. http://dx.doi.org/10.1088/0022-3727/33/17/310.

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45

Zuo, Yong-gang, Jia-jun Li, Yang Bai, Hao Liu, He-wei Yuan, and Guang-chao Chen. "Growth of nanocrystalline diamond by dual radio frequency inductively coupled plasma jet CVD." Diamond and Related Materials 73 (March 2017): 67–71. http://dx.doi.org/10.1016/j.diamond.2016.12.006.

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46

Bai, Y., J. Liu, P. Ma, et al. "Effect of radio frequency power on the inductively coupled plasma etched Al0.65Ga0.35N surface." Applied Surface Science 256, no. 21 (2010): 6254–58. http://dx.doi.org/10.1016/j.apsusc.2010.03.150.

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47

Hafh Marza, Hawraa, and Thamir H. Khalaf. "The Effect of Power on Inductively Coupled Plasma Parameters." Iraqi Journal of Physics 20, no. 3 (2022): 98–108. http://dx.doi.org/10.30723/ijp.v20i3.1017.

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In this work, we studied the effect of power variation on inductively coupled plasma parameters using numerical simulation. Different values were used for input power (750 W-1500 W), gas temperature 300K, gas pressure (0.02torr), 5 tourns of the copper coil and the plasma was produced at radio frequency (RF) 13.56 MHZ on the coil above the quartz chamber. For the previous purpose, a computer simulation in two dimensions axisymmetric, based on finite element method, was implemented for argon plasma. Based on the results we were able to obtain plasma with a higher density, which was represen

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48

Levko, Dmitry, Rochan R. Upadhyay, Kenta Suzuki, and Laxminarayan L. Raja. "Limitations of the independent control of ion flux and energy distribution function in high-density inductively coupled chlorine plasmas." Journal of Vacuum Science & Technology B 41, no. 1 (2023): 012205. http://dx.doi.org/10.1116/6.0002236.

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Using a self-consistent plasma model coupled with Maxwell's equations, the limitations of independent control of ion fluxes and their energy distribution functions extracted from the high-density inductively coupled chlorine plasma are studied. Two extreme cases of discharge power are considered: 100 W and 1 kW. We find that in the low-power case, plasma is mainly generated by electromagnetic waves while the radio-frequency biased electrode primarily enables plasma ion extraction. Therefore, the ion fluxes and distribution functions are controlled independently. For the high-power case of 1 kW

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49

Todorovic-Markovic, Biljana, Zoran Markovic, I. Mohai, et al. "Optical diagnostics of fullerene synthesis in the RF thermal plasma process." Journal of the Serbian Chemical Society 70, no. 1 (2005): 79–85. http://dx.doi.org/10.2298/jsc0501079t.

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In this work, the results of an optical emission study of fullerene synthesis in an inductively coupled radio frequency thermal plasma reactor are presented. The emission spectroscopy studies, based on the use of the Swan C2 (0,1) and CN (0,0) vibration emission spectra, were carried out to determine the plasma temperature. The evaporation process of graphite powder was observed by scanning electron microscopy.

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50

Chung, ChinWook, Sang-Hun Seo, and Hong-Young Chang. "The radio frequency magnetic field effect on electron heating in a low frequency inductively coupled plasma." Physics of Plasmas 7, no. 9 (2000): 3584–87. http://dx.doi.org/10.1063/1.1286804.

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