Books on the topic 'Integrated circuits – Ultra large scale integration'

1937-, Chang C. Y., and Sze S. M. 1936-, eds. ULSI devices. Wiley, 2000.

1962-, Pileggi Lawrence, and Odabasioglu Altan 1973-, eds. IC interconnect analysis. Kluwer Academic Publishers, 2002.

Tan, Cher Ming. Electromigration in ULSI Interconnections. World Scientific, 2010.

International, Symposium on ULSI Process Integration (5th 2007 Washington DC). ULSI process integration 5. Electrochemical Society, 2007.

International Symposium on ULSI Process Integration (5th 2007 Washington, DC). ULSI process integration 5. Edited by Claeys Cor L, Electrochemical Society Meeting, and Electrochemical Society. Electronics and Photonics Division. Electrochemical Society, 2007.

Schmitz, John E. J. Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications. Noyes Publications, 1992.

Symposium, on Gate Stack and Silicide Issues in Silicon Processing (2000 San Francisco CA). Gate stack and silicide issues in silicon processing: Symposium held April 25-27, 2000, San Francisco, California, U.S.A. Materials Research Society, 2001.

L, Claeys Cor, Electrochemical Society Meeting, and International Symposium on ULSI Process Integration (1st : 1999 : Honolulu, Hawaii), eds. ULSI process integration: Proceedings of the first international symposium. Electrochemical Society, 1999.

International Symposium on ULSI Process Integration (2nd 2001 Washington, D.C.). ULSI process integration II: Proceedings of the international symposium. Edited by Claeys Cor L, Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2001.

International, Symposium on Ultra Large Scale Integration Science and Technology (3rd 1991 Washington D. C. ). ULSI science and technology, 1991: Proceedings of the Third International Symposium on Ultra Large Scale Integration Science and Technology. Electrochemical Society, 1991.

International, Symposium on Advanced Materials for ULSI (1st 1988 Atlanta Ga ). Proceedings of the First International Symposium on Advanced Materials for ULSI. Electrochemical Society, 1988.

International Symposium on Ultra Large Scale Integration Science and Technology (4th 1993 Honolulu, Hawaii). ULSI science and technology, 1993: Proceedings of the Fourth International Symposium on Ultra Large Scale Integration Science and Technology. Edited by Celler George K, Middlesworth Ed, Hoh Koichiro, and Electrochemical Society Electronics Division. Electrochemical Society, 1993.

International Symposium on Ultra Large Scale Integration Science and Technology (6th 1997 Montréal, Québec). ULSI science and technology/1997: Proceedings of the Sixth International Symposium on UltraLarge Scale Integration Science and Technology. Edited by Massoud Hisham Z and Electrochemical Society Electronics Division. Electrochemical Society, 1997.

International Symposium on Ultra Large Scale Integration Science and Technology (5th 1995 Reno, Nev.). ULSI science and technology, 1995: Proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology. Edited by Middlesworth Ed, Massoud Hisham Z, and Electrochemical Society Electronics Division. Electrochemical Society, 1995.

International Symposium on Ultra Large Scale Integration Science and Technology (2nd 1989 Los Angeles, Calif.). ULSI science and technology, 1989: Proceedings of the Second International Symposium on Ultra Large Scale Integration Science and Technology. Electrochemical Society, 1989.

International Symposium on Ultra Large Scale Integration Science and Technology (1st 1987 Philadelphia, Pa.). ULSI science and technology/1987: Proceedings of the First International Symposium on Ultra Large Scale Integration Science and Technology. Edited by Broydo S, Osburn C. M, Electrochemical Society Electronics Division, and Electrochemical Society. Dielectrics and Insulation Division. Electrochemical Society, 1987.

E, McGuire G., ed. Semiconductor materials and process technology handbook: For very large scale integration (VLSI) and ultra large scale integration (ULSI). Noyes Publications, 1988.

Tan, Cher Ming. Applications of finite element methods for reliability studies on ULSI interconnections. Springer, 2011.

1955-, Lombardi Fabrizio, Sami Mariagiovanna, and North Atlantic Treaty Organization. Scientific Affairs Division., eds. Testing and diagnosis of VLSI and ULSI. Kluwer Academic Publishers, 1988.

Seiler, David G. Characterization and metrology for ULSI technology, 2000: International conference, Gaithersburg, Maryland, 26-29 June 2000. American Institute of Physics, 2001.

International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (2009 Albany, N.Y.). Frontiers of characterization and metrology for nanoelectronics: 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics : Albany, New York, 11-15 May 2009. Edited by Seiler David G. AIP Conference Proceedings, 2009.

G, Seiler David, and National Institute of Standards and Technology (U.S.), eds. Characterization and metrology for ULSI technology. American Institute of Physics, 2005.

International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (2007 Gaithersburg, Md.). Frontiers of characterization and metrology for nanoelectronics: 2007 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics : Gaithersburg, Maryland, 27-29 March 2007. Edited by Seiler David G and National Institute of Standards and Technology (U.S.). American Institute of Physics, 2007.

G, Seiler David, and International Conference on Characterization and Metrology for ULSI Technology (1998 : Gaithersburg, Md.), eds. Characterization and metrology for ULSI technology 2000: International Conference,Gaithersburg, Maryland, 26-29, June 2000. American Institute of Physics, 2000.

G, Seiler David, and International Conference on Characterization and Metrology for ULSI Technology (1998 : Gaithersburg, Md.), eds. Characterization and metrology for ULSI technology: 1998 international conference, Gaithersburg, Maryland, March 1998. American Institute of Physics, 1998.

International Conference on Characterization and Metrology for ULSI Technology (2003 Austin, Tex.). Characterization and metrology for ULSI technology: 2003 International Conference on Characterization and Metrology for ULSI Technology, Austin, Texas, 24-28 March, 2003. Edited by Seiler David G and National Institute of Standards and Technology (U.S.). American Institute of Physics, 2003.

Lhadi, Merhari, ed. Nanopatterning--from ultralarge-scale integration to biotechnology: Symposium held November 25-29, 2001, Boston, Massachusetts, U.S.A. Materials Research Society, 2002.

1944-, Levy Roland A., North Atlantic Treaty Organization. Scientific Affairs Division., and NATO Advanced Study Institute on Reduced Thermal Processing for ULSI (1988 : Boca Raton, Fla.), eds. Reduced thermal processing for ULSI. Plenum Press, 1989.

Celik, Mustafa. IC interconnect analysis. Kluwer Academic Publishers, 2002.

Advanced Metallization Conference (2005 Colorado Springs, Colo. and Tokyo, Japan). Advanced Metallization Conference 2005 (AMC 2005): Proceedings of the conference held September 27-29, 2005, in Colorado Springs, Colorado, U.S.A., and October 13-14, 2005, University of Tokyo, Tokyo, Japan. Edited by Brongersma Sywert H and University of California, Berkeley. Continuing Education in Engineering. Materials Research Society, 2006.

Symposium on Electrochemical Processes in ULSI and MEMS (2004 San Antonio, Tex.). Electrochemical processes in ULSI and MEMS: Proceedings of the international symposium. Edited by Deligianni H. 1958- and Electrochemical Society Meeting. Electrochemical Society, 2005.

Shacham-Diamand, Yosi. Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications. Springer-Verlag New York, 2009.

Kondo, K. Morphological evolution of electrodeposits and electrochemical processing in ULSI fabrication and electrodeposition of and on semiconductors IV: Proceedings of the international symposia. Edited by Electrochemical Society Electrodeposition Division, Electrochemical Society. Dielectric Science and Technology Division, Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2005.

1937-, Tu K. N., and Materials Research Society Meeting, eds. Advanced metallization for future ULSI: Symposium held April 8-11, 1996, San Francisco, California, U.S.A. Materials Research Society, 1996.

C, Ellwanger Russell, Wang Shi-Qing, and University of California, Berkeley. Continuing Education in Engineering., eds. Advanced metallization and interconnect systems for ULSI applications in 1995: Proceedings of the conference held October 3-5, 1995 in Portland, Oregon, sponsored by Continuing Education in Engineering, University Extension, University of California at Berkeley, U.S.A., a parallel session of the conference was held from October 24- 25, 1995 in Tokyo, Japan. Materials Research Society, 1996.

Clive, Hayzelden, Hetherington Crispin, and Ross Frances, eds. Electron microscopy of semiconducting materials and ULSI devices. Materials Research Society, 1998.

Yeo, Kiat Seng. CMOS/BiCMOS ULSI: Low voltage, low power. Prentice Hall PTR, 2002.

Reiner, Joachim C. Latent gate oxide damage induced by ultra-fast electrostatic discharge. Hartung-Gorre, 1995.

(Editor), H. Z. Massoud, H. Iwai (Editor), C. Claeys (Editor), and Richard B. Fair (Editor), eds. Ultra Large Scale Integration Science & Technology: 6th International Symposium (Proceedings). Electrochemical Society, 1997.

Schmitz, John E. J. Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications. Elsevier Science & Technology Books, 1992.

Lau, Wai Shing. ULSI Front-End Technology: Covering from the First Scientific Paper on Semiconductor to State-Of-the-Art CMOS Finfet Technology. World Scientific Publishing Co Pte Ltd, 2017.

Lu, Yan, and Chi-Seng Lam. Selected Topics in Power, RF, and Mixed-Signal ICs. River Publishers, 2017.

Moore. Yield Modelling and Defect Tolerance in VLSI, Papers Presented at the INT Workshop on Designing for Yield, 1-3 July 1987, Oxford. Taylor & Francis, 1988.

Lu, Yan, and Chi-Seng Lam. Selected Topics in Power, RF, and Mixed-Signal ICs. River Publishers, 2022.

Lu, Yan, and Chi-Seng Lam. Selected Topics in Power, RF, and Mixed-Signal ICs. River Publishers, 2022.

Lu, Yan, and Chi-Seng Lam. Selected Topics in Power, RF, and Mixed-Signal ICs. River Publishers, 2017.

Lu, Yan, and Chi-Seng Lam. Selected Topics in Power, RF, and Mixed-Signal ICs. River Publishers, 2022.

ULSI Semiconductor Technology Atlas. John Wiley & Sons Inc, 2004.

ULSI process integration III: Proceedings of the international symposium. Electrochemical Society, 2003.

(Editor), C. L. Claeys, F. Gonzalez (Editor), S. Zaima (Editor), D. A. Buchanan (Editor), and J. O. Borland (Editor), eds. ULSI Process Integration IV, 2005: Proceedings Of The International Symposium. Electrochemical Society, 2005.