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Journal articles on the topic 'Ion-Beam-Assisted Deposition'

Author: Grafiati

Published: 4 June 2021

Last updated: 9 February 2022

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1

Nielsen, B. R. "Ion Beam Assisted Deposition." Europhysics News 25, no. 7 (1994): 149–50. http://dx.doi.org/10.1051/epn/19942507149.

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2

Rossnagel, S. M., and J. J. Cuomo. "Ion-Beam-Assisted Deposition and Synthesis." MRS Bulletin 12, no. 2 (1987): 40–51. http://dx.doi.org/10.1557/s0883769400068391.

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Concurrent energetic particle bombardment during film deposition can strongly modify the structural and chemical properties of the resulting thin film. The interest in this technique, ion-assisted deposition, comes about because it can be used to produce thin films with properties not achievable by conventional deposition. Bombardment by low energy ions occurs during almost all plasma-based thin film deposition techniques. Bombardment of a growing film, particularly by accelerated ions, can also be combined with non-plasma-based deposition techniques, such as evaporation, to simulate some of t

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3

Iwase, Mitsuo, Susumu Masaki, and Hiroshi Morisaki. "Ion-beam-assisted thin film deposition." Journal of Advanced Science 2, no. 4 (1990): 218–25. http://dx.doi.org/10.2978/jsas.2.4_218.

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4

Gamo, Kenji. "Ion beam assisted etching and deposition." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 8, no. 6 (1990): 1927. http://dx.doi.org/10.1116/1.584876.

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5

Wolf, G. K., K. Zucholi, M. Barth, and W. Ensinger. "Equipment for ion beam assisted deposition." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 21, no. 1-4 (1987): 570–73. http://dx.doi.org/10.1016/0168-583x(87)90906-2.

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6

Hirvonen, James K. "Ion beam assisted thin film deposition." Materials Science Reports 6, no. 6 (1991): 215–74. http://dx.doi.org/10.1016/0920-2307(91)90008-b.

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7

Colligon, J. S. "Applications of ion-beam-assisted deposition." Materials Science and Engineering: A 139 (July 1991): 199–206. http://dx.doi.org/10.1016/0921-5093(91)90617-v.

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8

Kim, Sung Jin, Kyoon Choi, and Se Young Choi. "Preparation and Characterization of ITO Thin Films Deposition by Ion Beam Assisted Deposition." Korean Journal of Metals and Materials 52, no. 6 (2014): 475–84. http://dx.doi.org/10.3365/kjmm.2014.52.6.475.

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9

Miralami, Raheleh, John G. Sharp, Fereydoon Namavar, Curtis W. Hartman, Kevin L. Garvin, and Geoffrey M. Thiele. "Effects of nano-engineered surfaces on osteoblast adhesion, growth, differentiation, and apoptosis." Proceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanomaterials, Nanoengineering and Nanosystems 234, no. 1-2 (2019): 59–66. http://dx.doi.org/10.1177/2397791419886778.

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Modifying implant surfaces to improve their biocompatibility by enhancing osteoblast activation, growth, differentiation, and induction of greater bone formation with stronger attachments should result in improved outcomes for total joint replacement surgeries. This study tested the hypothesis that nano-structured surfaces, produced by the ion beam-assisted deposition method, enhance osteoblast adhesion, growth, differentiation, bone formation, and maturation. The ion beam-assisted deposition technique was employed to deposit zirconium oxide films on glass substrates. The effects of the ion be

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10

Chakaroun, M., R. Antony, P. Taillepierre, and A. Moliton. "Lifetime obtained by ion beam assisted deposition." Materials Science and Engineering: C 27, no. 5-8 (2007): 1043–45. http://dx.doi.org/10.1016/j.msec.2006.06.015.

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11

Miyake, Shoji. "Surface modification by Ion Beam Assisted Deposition." Materia Japan 36, no. 8 (1997): 771–74. http://dx.doi.org/10.2320/materia.36.771.

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12

Jin, Ning, Lu Yusun, Zhai Houming, Feng Yudong, and Wang Yi. "Ion-beam-assisted deposition of CNx films." Surface and Coatings Technology 145, no. 1-3 (2001): 71–74. http://dx.doi.org/10.1016/s0257-8972(01)01266-x.

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13

Sharma, N., S. M. Casey, G. A. Jones, and P. J. Grundy. "Ion beam assisted deposition of CoPt films." Journal of Magnetism and Magnetic Materials 193, no. 1-3 (1999): 93–96. http://dx.doi.org/10.1016/s0304-8853(98)00495-8.

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14

Qu, B. D., W. L. Zhong, K. M. Wang, P. L. Zhang, Z. L. Wang, and W. Z. Li. "Ion‐beam‐assisted deposition of ferroelectric PbTiO3films." Journal of Applied Physics 74, no. 4 (1993): 2896–99. http://dx.doi.org/10.1063/1.354644.

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15

Ensinger, W., M. Barth, H. Martin, et al. "Ion beam assisted deposition with a duoplasmatrona)." Review of Scientific Instruments 63, no. 5 (1992): 3058–62. http://dx.doi.org/10.1063/1.1142606.

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16

Puckett, Reese, Lawrence Stelmack, Stephen Michel, Michael J. O'Connell, and Paul Natishan. "Oxygen ion beam assisted thin film deposition." Surface and Coatings Technology 41, no. 3 (1990): 259–67. http://dx.doi.org/10.1016/0257-8972(90)90137-2.

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17

Wolf, G. K., M. Barth, and W. Ensinger. "Ion beam assisted deposition for metal finishing." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 37-38 (February 1989): 682–87. http://dx.doi.org/10.1016/0168-583x(89)90274-7.

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18

Hubler, G. K., C. A. Carosella, E. P. Donovan, et al. "Physical aspects of ion beam assisted deposition." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 46, no. 1-4 (1990): 384–91. http://dx.doi.org/10.1016/0168-583x(90)90734-c.

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19

Wolf, G. K. "Ion beam assisted deposition of insulating layers." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 65, no. 1-4 (1992): IN3–114. http://dx.doi.org/10.1016/0168-583x(92)95022-j.

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20

Liu, Xianghong, and Tengcai Ma. "Effects of electron beam during ion implantation and ion beam assisted deposition." Applied Physics Letters 63, no. 14 (1993): 1901–2. http://dx.doi.org/10.1063/1.110642.

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21

Li, Xue Lei, Yu Dong Feng, and Hu Wang. "The Study of Ion Beam Assisted Deposition of CuInSe2 Absorber Films." Materials Science Forum 900 (July 2017): 78–82. http://dx.doi.org/10.4028/www.scientific.net/msf.900.78.

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Based on the selenium ion beam assisted magnetron sequential sputtering technology, low temperature deposition of CIS thin-film solar cells in high quality can be achieved. By comparing with the method of conventional gas phase atomic deposition, and through simulated analysis from the perspective of diffusion uniformity, numerical calculation on the depth of ion beam injection is proceeded. First, according to the classical collision theory in molecular dynamics, the theoretical calculation on the process of ion implantation is done; the concentration distribution of implanted selenium ions c

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22

Miralami, Raheleh, Hani Haider, John G. Sharp, et al. "Surface nano-modification by ion beam–assisted deposition alters the expression of osteogenic genes in osteoblasts." Proceedings of the Institution of Mechanical Engineers, Part H: Journal of Engineering in Medicine 233, no. 9 (2019): 921–30. http://dx.doi.org/10.1177/0954411919858018.

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Biomaterials with enhanced biocompatibility are favored in implant studies to improve the outcomes of total joint replacement surgeries. This study tested the hypothesis that nano-structured surfaces for orthopedic applications, produced by the ion beam–assisted deposition method, would enhance osteointegration by altering the expression of bone-associated genes in osteoblasts. The ion beam–assisted deposition technique was employed to deposit nano-films on glass or titanium substrates. The effects of the ion beam–assisted deposition produced surfaces on the human osteosarcoma cell line SAOS-2

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23

He, Zhigang, Shinichiro Inoue, George Carter, Hamid Kheyrandish, and John S. Colligon. "Ion-beam-assisted deposition of Si-carbide films." Thin Solid Films 260, no. 1 (1995): 32–37. http://dx.doi.org/10.1016/0040-6090(94)06465-2.

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24

Donovan, E. P., D. R. Brighton, G. K. Hubler, and D. van Vechten. "Ion beam assisted deposition of substoichiometric silicon nitride." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 19-20 (January 1987): 983–86. http://dx.doi.org/10.1016/s0168-583x(87)80196-9.

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25

Matias, Vladimir, Brady J. Gibbons, and D. Matthew Feldmann. "Coated conductors textured by ion-beam assisted deposition." Physica C: Superconductivity and its Applications 460-462 (September 2007): 312–15. http://dx.doi.org/10.1016/j.physc.2007.03.357.

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26

Dong, L., and D. J. Srolovitz. "Texture development mechanisms in ion beam assisted deposition." Journal of Applied Physics 84, no. 9 (1998): 5261–69. http://dx.doi.org/10.1063/1.368794.

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27

Kubota, Hiroshi, Jen Sue Chen, Masanori Nagata, Elzbieta Kolawa, and Marc Aurele Nicolet. "Ion-Beam-Assisted Deposition of TiN Thin Films." Japanese Journal of Applied Physics 32, Part 1, No. 8 (1993): 3414–19. http://dx.doi.org/10.1143/jjap.32.3414.

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28

Xu, Zheng, Toshihiko Kosugi, Kenji Gamo, and Susumu Namba. "Ion Beam Assisted Deposition of Tungsten on GaAs." Japanese Journal of Applied Physics 29, Part 2, No. 1 (1990): L23—L26. http://dx.doi.org/10.1143/jjap.29.l23.

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29

Fedotov, Serguei A., Andrey A. Efimchik, and Alexey V. Byeli. "Ion Beam Assisted Deposition: A Molecular Dynamics Simulation." Materials and Manufacturing Processes 12, no. 3 (1997): 529–39. http://dx.doi.org/10.1080/10426919708935162.

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30

Oechsner, H. "Ion and plasma beam assisted thin film deposition." Thin Solid Films 175 (August 1989): 119–27. http://dx.doi.org/10.1016/0040-6090(89)90818-3.

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31

Neubeck, K., R. Nitsche, H. Hahn, L. Alberts, G. K. Wolf, and M. Friz. "Ion beam assisted deposition of ZrO2 thin films." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 106, no. 1-4 (1995): 110–15. http://dx.doi.org/10.1016/0168-583x(95)00687-7.

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32

Donovan, E. P., G. K. Hubler, M. S. Mudholkar, and L. T. Thompson. "Ion-beam-assisted deposition of molybdenum nitride films." Surface and Coatings Technology 66, no. 1-3 (1994): 499–504. http://dx.doi.org/10.1016/0257-8972(94)90056-6.

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33

Bhattacharya, Rabi S., A. K. Rai, and A. W. McCormick. "Ion-beam-assisted deposition of Al2O3 thin films." Surface and Coatings Technology 46, no. 2 (1991): 155–63. http://dx.doi.org/10.1016/0257-8972(91)90158-s.

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34

Jin, C. G., X. M. Wu, and L. J. Zhuge. "Room-Temperature Growth of SiC Thin Films by Dual-Ion-Beam Sputtering Deposition." Research Letters in Physical Chemistry 2008 (April 3, 2008): 1–5. http://dx.doi.org/10.1155/2008/760650.

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Silicon carbide (SiC) films were prepared by single and dual-ion-beamsputtering deposition at room temperature. An assisted Ar+ ion beam (ion energy Ei = 150 eV) was directed to bombard the substrate surface to be helpful for forming SiC films. The microstructure and optical properties of nonirradicated and assisted ion-beam irradicated films have been characterized by transmission electron microscopy (TEM), scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FTIR), and Raman spectra. TEM result shows that the films are amorphous. The films exposed to a low-energy assi

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35

Bricault, R. J., P. Sioshansi, and S. N. Bunker. "Deposition of boron nitride thin films by ion beam assisted deposition." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 21, no. 1-4 (1987): 586–87. http://dx.doi.org/10.1016/0168-583x(87)90912-8.

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36

Ma, Zhenqiang, and Gary S. Was. "Aluminum metallization for flat-panel displays using ion-beam-assisted physical vapor deposition." Journal of Materials Research 14, no. 10 (1999): 4051–61. http://dx.doi.org/10.1557/jmr.1999.0547.

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Failures in aluminum interconnects in display control devices are often caused by the formation of hillocks during postdeposition annealing. Ion-beam-assisted deposition was used to create a (110) out-of-plane texture in aluminum films to suppress hillocking. X-ray diffraction was used to quantify the (110)/(111) out-of-plane texture ratio, and scanning electron microscopy and atomic force microscopy were used to characterize the surface topology. Results show that no hillocks were observed on (110)-textured aluminum films following annealing for 30 min at 450 °C. Following annealing, the resi

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37

Aisenberg, S., and F. M. Kimock. "Ion Beam and Ion-Assisted Deposition of Diamond-Like Carbon Films." Materials Science Forum 52-53 (January 1991): 1–40. http://dx.doi.org/10.4028/www.scientific.net/msf.52-53.1.

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38

Gerlach, J. W., P. Schumacher, M. Mensing, S. Rauschenbach, I. Cermak, and B. Rauschenbach. "Ion mass and energy selective hyperthermal ion-beam assisted deposition setup." Review of Scientific Instruments 88, no. 6 (2017): 063306. http://dx.doi.org/10.1063/1.4985547.

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39

Yixin, Yan. "Broad beam cold cathode ion source for an ion assisted deposition." Vacuum 42, no. 16 (1991): 1096–97. http://dx.doi.org/10.1016/0042-207x(91)91478-7.

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40

Wituschek, H., M. Barth, W. Ensinger, et al. "ALLIGATOR−An apparatus for ion beam assisted deposition with a broad‐beam ion source." Review of Scientific Instruments 63, no. 4 (1992): 2411–13. http://dx.doi.org/10.1063/1.1142946.

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41

Kotov, D. A. "Broad beam low-energy ion source for ion-beam assisted deposition and material processing." Review of Scientific Instruments 75, no. 5 (2004): 1934–36. http://dx.doi.org/10.1063/1.1702109.

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42

Sueda, Minoru, Toshiro Kobayashi, Tadashi Rokkaku, et al. "Formation of cBN Films by Ion Beam Assisted Deposition." Journal of the Japan Institute of Metals 57, no. 8 (1993): 932–37. http://dx.doi.org/10.2320/jinstmet1952.57.8_932.

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43

Scaglione, S., D. Flori, I. Soymié, and A. Piegari. "Laser optical coatings produced by ion beam assisted deposition." Thin Solid Films 214, no. 2 (1992): 188–93. http://dx.doi.org/10.1016/0040-6090(92)90768-7.

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44

Kennedy, M., D. Ristau, and H. S. Niederwald. "Ion beam-assisted deposition of MgF2 and YbF3 films." Thin Solid Films 333, no. 1-2 (1998): 191–95. http://dx.doi.org/10.1016/s0040-6090(98)00847-5.

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45

Akbari, A., C. Templier, M. F. Beaufort, D. Eyidi, and J. P. Riviere. "Ion beam assisted deposition of TiN–Ni nanocomposite coatings." Surface and Coatings Technology 206, no. 5 (2011): 972–75. http://dx.doi.org/10.1016/j.surfcoat.2011.03.102.

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46

Moussant, C., R. Antony, A. Moliton, and G. Froyer. "Electroluminescence of parasexiphenyl prepared by ion beam assisted deposition." Synthetic Metals 102, no. 1-3 (1999): 1093–94. http://dx.doi.org/10.1016/s0379-6779(98)01380-0.

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47

Mori, Takanori, Makoto Fujiwara, Rafael R. Manory, Ippei Shimizu, Takeo Tanaka, and Shoji Miyake. "HfO2 thin films prepared by ion beam assisted deposition." Surface and Coatings Technology 169-170 (June 2003): 528–31. http://dx.doi.org/10.1016/s0257-8972(03)00189-0.

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48

Hioki, T., K. Okumura, Y. Itoh, S. Hibi, and S. Noda. "Formation of carbon films by ion-beam-assisted deposition." Surface and Coatings Technology 65, no. 1-3 (1994): 106–11. http://dx.doi.org/10.1016/s0257-8972(94)80015-4.

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49

Demaree, J. D., C. G. Fountzoulas, and J. K. Hirvonen. "Chromium nitride coatings produced by ion beam assisted deposition." Surface and Coatings Technology 86-87 (December 1996): 309–15. http://dx.doi.org/10.1016/s0257-8972(96)03035-6.

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50

Schwarz, G., F. Friess, and G. K. Wolf. "Deposition of c-BN by ion beam assisted CVD." Surface and Coatings Technology 125, no. 1-3 (2000): 106–10. http://dx.doi.org/10.1016/s0257-8972(99)00608-8.

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