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Relevant bibliographies by topics / Ion lithography / Dissertations / Theses

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Dissertations / Theses on the topic 'Ion lithography'

Author: Grafiati

Published: 28 May 2022

Last updated: 31 July 2025

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1

Heard, P. J. "Applications of scanning ion beam lithography." Thesis, University of Cambridge, 1985. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.372653.

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2

Alves, Andrew David Charles, and aalves@unimelb edu au. "Characterisation of Single Ion Tracks for use in Ion Beam Lithography." RMIT University. Applied Sciences, 2008. http://adt.lib.rmit.edu.au/adt/public/adt-VIT20080414.135656.

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To investigate the ultimate resolution in ion beam lithography (IBL) the resist material poly(methyl methacrylate) PMMA has been modified by single ion impacts. The latent damage tracks have been etched prior to imaging and characterisation. The interest in IBL comes from a unique advantage over more traditional electron beam or optical lithography. An ion with energy of the order of 1 MeV per nucleon evenly deposits its energy over a long range in a straight latent damage path. This gives IBL the ability to create high aspect ratio structures with a resolution in the order of 10 nm. Precise i

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3

Winston, Donald Ph D. Massachusetts Institute of Technology. "Sub-10-nm lithography with light-ion beams." Thesis, Massachusetts Institute of Technology, 2012. http://hdl.handle.net/1721.1/71495.

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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012.<br>Cataloged from PDF version of thesis.<br>Includes bibliographical references (p. 203-212).<br>Scanning-electron-beam lithography (SEBL) is the workhorse of nanoscale lithography in part because of the high brightness of the Schottky source of electrons, but also benefiting from decades of incremental innovation and engineering of apparatus around the Schottky source. Light ions are an attractive intermediary between electrons and heavy ions in terms of exposure efficiency and

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4

Puretz, Joseph. "A theoretical and experimental study of liquid metal ion sources and their application to focused ion beam technology /." Full text open access at:, 1988. http://content.ohsu.edu/u?/etd,182.

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5

Lindeberg, Mikael. "High aspect ratio microsystem fabrication by ion track lithography." Doctoral thesis, Uppsala : Acta Universitatis Upsaliensis : Univ.-bibl. [distributör], 2003. http://publications.uu.se/theses/91-554-5515-8/.

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6

Yasaka, Anto. "Feasibility study of spatial-phase-locked focused-ion-beam lithography." Thesis, Massachusetts Institute of Technology, 1995. http://hdl.handle.net/1721.1/32663.

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7

Tucker, Thomas Marshall. "Three dimensional measurement data analysis in stereolithography rapid prototyping." Thesis, Georgia Institute of Technology, 1997. http://hdl.handle.net/1853/17082.

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8

Sager, Benay. "A method for understanding and predicting stereolithography resolution." Thesis, Georgia Institute of Technology, 2003. http://hdl.handle.net/1853/17832.

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9

Cybart, Shane A. "Planar Josephson junctions and arrays by electron beam lithography and ion damage." Diss., Connected to a 24 p. preview or request complete full text in PDF format. Access restricted to UC campuses, 2005. http://wwwlib.umi.com/cr/ucsd/fullcit?p3190007.

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Thesis (Ph. D.)--University of California, San Diego, 2005.<br>Title from first page of PDF file (viewed March 8, 2006). Available via ProQuest Digital Dissertations. Vita. Includes bibliographical references (p. 108-111).

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10

Vaseashta, Ashok K. "Photonic studies of defects and amorphization in ion beam damaged GaAs surfaces." Diss., This resource online, 1990. http://scholar.lib.vt.edu/theses/available/etd-08082007-170507/.

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11

Brown, Karl. "Coupled electron gases fabricated by in situ ion beam lithography and MBE growth." Thesis, University of Cambridge, 1994. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.319460.

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12

López, Josué Jacob. "Characterization of nanostructured hexagonal boron nitride patterned via high-resolution ion beam lithography." Thesis, Massachusetts Institute of Technology, 2017. http://hdl.handle.net/1721.1/111919.

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Thesis: S.M., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2017.<br>Cataloged from PDF version of thesis.<br>Includes bibliographical references (pages 51-57).<br>The forefront of polariton research in two-dimensional (2D) materials focuses on pushing the limits of patterning 2D materials into nanoresonators and other nanophotonic structures that manipulate highly confined polaritons for technologically relevant near-IR and mid-IR applications. Furthermore, tuning the properties of hexagonal boron nitride, graphene, and other 2D materials in

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13

Воробйов, Геннадій Савелійович, Геннадий Савельевич Воробьев, Hennadii Saveliiovych Vorobiov та ін. "Процессы прохождения пучков заряженных частиц в материальных средах". Thesis, Издательство СумГУ, 2012. http://essuir.sumdu.edu.ua/handle/123456789/27619.

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В связи с ограничениями оптической литографии, связанными с явлением дифракции, сравнительно недавно появилась технология нового поколения – ионная литография, в которой применяется прямое экспонирование сфокусированным пучком заряженных частиц. Определенный интерес в разработке таких литографических технологий высокого разрешения связан с возможностью преодоления трудностей при создании структур с размерами ниже 100 нм. При цитировании документа, используйте ссылку http://essuir.sumdu.edu.ua/handle/123456789/27619

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14

O'Neill, Robin W. "Characterisation of micron sized ferromagnetic structures fabricated by focussed ion beam and electron beam lithography." Thesis, University of Glasgow, 2007. http://theses.gla.ac.uk/6256/.

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Traditionally electron beam lithography (EBL) has been used to fabricate micron and sub-micron sized devices, such as Γ and Τ gates for metal-semiconductor devices for study within the semiconductor industry. EBL is also used for the fabrication of ferromagnetic elements for use as components in magnetic random access memory (MRAM) and read/write heads in hard disk drives (HDD). MRAM is being investigated as a direct replacement to standard semiconductor RAM as it has lower power consumption and is a non-volatile memory solution, although the areal density, at present, is not as great. Smaller

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15

West, Aaron P. "A decision support system for fabrication process planning in stereolithography." Thesis, Georgia Institute of Technology, 1999. http://hdl.handle.net/1853/16896.

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16

Morgan, Brian C. "Development of a deep silicon phase Fresnel lens using gray-scale lithography and deep reactive ion etching." College Park, Md. : University of Maryland, 2004. http://hdl.handle.net/1903/240.

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Thesis (M.S.) -- University of Maryland, College Park, 2004.<br>Thesis research directed by: Dept. of Electrical and Computer Engineering. Title from t.p. of PDF. Includes bibliographical references. Published by UMI Dissertation Services, Ann Arbor, Mich. Also available in paper.

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17

Perng, John Kangchun. "High Aspect-Ratio Nanoscale Etching in Silicon using Electron Beam Lithography and Deep Reactive Ion Etching (DRIE) Technique." Thesis, Georgia Institute of Technology, 2006. http://hdl.handle.net/1853/11543.

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This thesis reports the characterization and development of nanolithography using Electron Beam Lithography system and nanoscale plasma etching. The standard Bosch process and a modified three-pulse Bosch process were developed in STS ICP and Plasma ICP system separately. The limit of the Bosch process at the nanoscale regime was investigated and documented. Furthermore, the effect of different control parameters on the process were studied and summarized in this report. 28nm-wide trench with aspect-ratio of 25 (smallest trench), and 50nm-wide trench with aspect ratio of 37 (highest aspect-rat

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18

Overbuschmann, Johannes [Verfasser]. "Fabrication of Fresnel Zone Plates for Soft X-Ray and EUV Microscopy by Ion Beam Lithography / Johannes Overbuschmann." Bonn : Universitäts- und Landesbibliothek Bonn, 2014. http://d-nb.info/107728926X/34.

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19

Moore, Chad Andrew. "A multi-axis stereolithography controller with a graphical user interface (GUI)." Thesis, Georgia Institute of Technology, 2000. http://hdl.handle.net/1853/16350.

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20

Márik, Marian. "Pokročilé techniky vytváření mikro a nanosystémů pro senzoriku." Master's thesis, Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií, 2013. http://www.nusl.cz/ntk/nusl-220083.

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The use of micro- and nanotechnologies is necessary in the development of advanced sensor systems. In this thesis few selected technologies were studied and tested on fabrication of creating two different systems for bioelectrical and electrochemical applications. For biolelectrical applications a chip with a pair of gold nanoelectrodes was designed and implemented. For electrochemical analysis a novel two electrode system was designed and realized, which should contribute by greater sensitivity and accuracy in amperometric detection compared with three-electrode systems in voltammetric analys

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21

Franich, Rick, and rick franich@rmit edu au. "Monte Carlo Simulation of Large Angle Scattering Effects in Heavy Ion Elastic Recoil Detection Analysis and Ion Transmission Through Nanoapertures." RMIT University. Applied Sciences, 2007. http://adt.lib.rmit.edu.au/adt/public/adt-VIT20080212.121837.

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Heavy Ion Elastic Recoil Detection Analysis (HIERDA) is a versatile Ion Beam Analysis technique well suited to multi-elemental depth profiling of thin layered structures and near-surface regions of materials. An existing limitation is the inability to accurately account for the pronounced broadening and tailing effects of multiple scattering typically seen in HIERDA spectra. This thesis investigates the role of multiple large angle scattering in heavy ion applications such as HIERDA, and seeks to quantify its contribution to experimental output. This is achieved primarily by the development of

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22

Davis, Brian Edward. "Characterization and calibration of stereolithography products and processes." Thesis, Georgia Institute of Technology, 2001. http://hdl.handle.net/1853/17677.

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23

Hansen, Brett Jacob. "Microfabrication Processes and Advancements in Planar Electrode Ion Traps as Mass Spectrometers." BYU ScholarsArchive, 2013. https://scholarsarchive.byu.edu/etd/3479.

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This dissertation presents advances in the development of planar electrode ion traps. An ion trap is a device that can be used in mass analysis applications. Electrode surfaces create an electric field profile that trap ionized molecules of an analyte. The electric fields can then be manipulated to mass-selectively eject ions out of the trap into a detector. The resulting data can be used to analyze molecular structure and composition of an unknown compound. Conventional ion traps require machined electrode surfaces to form the electric trapping field. This class of electrode presents signific

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24

Diaz, Regis. "Développement du pompage de charges pour la caractérisation in-situ de nanocristaux de Si synthétisés localement dans SiO2 par implantation ionique basse énergie et lithographie stencil." Thesis, Toulouse, INSA, 2011. http://www.theses.fr/2011ISAT0034/document.

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Le regain d'attention des industriels pour les mémoires non volatiles intégrant des nanocristaux, illustré par l'introduction sur le marché de la Flexmemory de Freescale en technologie 90 nm, incite à poursuivre des études sur ce type de systèmes. Pour cela, nous avons mis au point des cellules mémoires élémentaires, à savoir des transistors MOS dont l'oxyde de grille contient une grille granulaire formée par un plan de nanocristaux de silicium (Si-ncx) stockant la charge électrique.Ce travail présente les principaux résultats issus de ces travaux, ceux-ci allant du procédé de fabrication à la

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25

Nouri, Lamia. "Développement d'un procédé de structuration 3D pour le silicium." Thesis, Université Grenoble Alpes (ComUE), 2017. http://www.theses.fr/2017GREAT088/document.

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Ce travail porte sur le développement d’une technique de structuration de surface pour le silicium. Celle-ci repose sur trois étapes essentielles : la lithographie, l’implantation ionique et le retrait par voie humide. Le motif formé par lithographie est transféré par homothétie dans la couche sous-jacente de silicium grâce à l’implantation ionique. Après le retrait du masque de résine, le substrat est traité par voie humide en vue de retirer des zones localement implantées. Le motif initial défini par la lithographie est ainsi révélé dans le silicium.La compréhension des modifications induite

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26

Lynn, Charity M. "Accuracy models for SLA build style decision support." Thesis, Georgia Institute of Technology, 1998. http://hdl.handle.net/1853/16832.

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27

Ostřížek, Petr. "Elektrotransportní vlastnosti nanostruktur připravených metodou FIB." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2011. http://www.nusl.cz/ntk/nusl-229474.

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The aim of this work is fabrication of nanostructures and measurement of their electrotransport properties. There are two different methods used for fabrication - electron beam lithography with sputtering of thin films and focused ion beam with deposition from gas phase. I-V characteristic was measured for characterisation of as prepared nanostructures - wires. Material of wires prepared by using of electron beam lithography was permalloy - an alloy of iron and nickel. Second types of wires prepared by using of chemical vapor deposition induced by focused ion beam was platinum based.

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28

FENG, Zhifu. "Electron Beam Lithography and Focused Ion Beam Techniques for the Development of Low Power Consumption Microelectromechanical Systems-based Chemiresistive Gas Sensors." Doctoral thesis, Università degli studi di Ferrara, 2023. https://hdl.handle.net/11392/2502108.

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I sensori di gas sono ampiamente utilizzati per rilevare gas tossici per la protezione ambientale, il monitoraggio industriale, la sicurezza domestica, l'analisi del respiro e il deterioramento degli alimenti. A parte i sensori di gas elettrochimici, che hanno una breve durata, e i sensori di gas ottici di grandi dimensioni con un costo elevato, i sensori di gas chemiresistivi basati su ossidi metallici semiconduttori (OMS) risultano essere una soluzione tecnologica estremamente interessante, grazie alla sua bassa produzione costo, proprietà fisiche stabili e versatilità chimica. Tuttavia, per

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29

Kato, T., S. Iwata, Y. Yamauchi, et al. "Planar patterned media fabricated by ion irradiation into CrPt3 ordered alloy films." American Institite of Physics, 2009. http://hdl.handle.net/2237/12635.

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30

Patryarcha, Lukas [Verfasser]. "Experiments and simulations on the structural and electrical properties of nano- and microstructures on graphite surfaces produced by ion beam lithography / Lukas Patryarcha." Dortmund : Universitätsbibliothek Technische Universität Dortmund, 2011. http://d-nb.info/1018124373/34.

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31

Blom, Tobias. "Fabrication and Applications of a Focused Ion Beam Based Nanocontact Platform for Electrical Characterization of Molecules and Particles." Doctoral thesis, Uppsala universitet, Experimentell fysik, 2010. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-122940.

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The development of new materials with novel properties plays an important role in improving our lives and welfare. Research in Nanotechnology can provide e.g. cheaper and smarter materials in applications such as energy storage and sensors. In order for this development to proceed, we need to be able to characterize the material properties at the nano-, and even the atomic scale. The ultimate goal is to be able to tailor them according to our needs. One of the great challenges concerning the characterization of nano-sized objects is how to achieve the physical contact to them. This thesis is f

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32

Oliveira, Joao Wagner Lopes de. "Síntese e caracterização de nanofios de ZnO para aplicações em emissão de campo." reponame:Biblioteca Digital de Teses e Dissertações da UFRGS, 2010. http://hdl.handle.net/10183/70355.

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Neste trabalho, descrevemos o crescimento controlado e alinhado de nanofios de óxido de zinco (ZnO), bem como a análise das propriedades de emissão de campo (Field Emission) destes nanomateriais. Diferentes estratégias de síntese e posicionamento dos nanofios foram utilizadas para a otimização da emissão de elétrons por campo. Utilizamos diferentes técnicas de litografia no processo de crescimento de nanofios em regiões pré-definidas. Como resultado, são apresentadas diferentes condições para o crescimento de nanofios de ZnO. As caracterizações estruturais comprovam a qualidade cristalina dos

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33

Richardson, Scott. "The fabrication and lithography of conjugated polymer distributed feedback lasers and development of their applications." Thesis, St Andrews, 2007. http://hdl.handle.net/10023/401.

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34

Hartl, Hugo M. "Modification of small-molecule organic thin films using energetic beams and plasma." Thesis, Queensland University of Technology, 2019. https://eprints.qut.edu.au/129526/9/Hugo%20Hartl%20Thesis.pdf.

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This project investigated directed energy techniques for modifying organic films. These techniques show great promise for creating materials with unique, tailored properties. In this work, ion and electron beams were used to fabricate spatially-defined polymer features in nanometre-scale film of small molecules. An alternative pathway to the direct on-surface fabrication of polymer surface coatings was also investigated and showed that a room temperature, atmospheric pressure plasma can facilitate coupling of small molecules at a catalytic surface. In all cases, it was possible to control the

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35

Shahali, Hesam. "Assessment of the bactericidal effect of biomimicked nanopillars of cicada wings on titanium implants." Thesis, Queensland University of Technology, 2020. https://eprints.qut.edu.au/204245/1/Hesam_Shahali_Thesis.pdf.

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Biofilm formation is the major causes of infection in implants. This research presented nanopillars architecture to eliminate the bacteria attachment based on mechanical interaction. Advanced microscopy techniques (e.g. HIM and SEM and AFM) were employed to characterize the cicada wings' nanopillars and find the optimum geometry with the highest bactericidal effect. Electron beam lithography was used to mimic and fabricate versatile geometry of titanium nanopillars for orthopaedic application. It is proposed that the biomimicked titanium nanopillars have an excellent bactericidal effect in the

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36

Reinspach, Julia. "High-Resolution Nanostructuring for Soft X-Ray Zone-Plate Optics." Doctoral thesis, KTH, Biomedicinsk fysik och röntgenfysik, 2011. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-47409.

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Diffractive zone-plate lenses are widely used as optics in high-resolution x-ray microscopes. The achievable resolution in such microscopes is presently not limited by the x-ray wavelength but by limitations in zone-plate nanofabrication. Thus, for the advance of high-resolution x-ray microscopy, progress in zone-plate nanofabrication methods are needed. This Thesis describes the development of new nanofabrication processes for improved x-ray zone-plate optics. Cold development of the electron-beam resist ZEP7000 is applied to improve the resolution of soft x-ray Ni zone plates. The influenc

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37

Mulot, Mikaël. "Two-Dimensional Photonic Crystals in InP-based Materials." Doctoral thesis, KTH, Microelectronics and Information Technology, IMIT, 2004. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-3751.

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<p>Photonic crystals (PhCs) are structures periodic in thedielectric constant. They exhibit a photonic bandgap, i.e., arange of wavelengths for which light propagation is forbidden.Engineering of defects in the PhC lattice offers new ways toconfine and guide light. PhCs have been manufactured usingsemiconductors and other material technologies. This thesisfocuses on two-dimensional PhCs etched in InP-based materials.Only recently, such structures were identified as promisingcandidates for the realization of novel and advanced functionsfor optical communication applications.</p><p>The primary f

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38

Dvořák, Petr. "Studium vlastností povrchových plazmonových polaritonů na magnetických materiálech." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2011. http://www.nusl.cz/ntk/nusl-229810.

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The diploma thesis deals with the experimental study of surface plasmon polaritons (SPPs) on nano-structures with the Au/Co/Au multilayer. Plasmonic structures were prepared by the electron beam lithography and by the focused ion beam. A Scanning optical near-field microscope was used for detection of surface plasmon polaritons. SPPs were confirmed by the experiment with different polarizations of the illuminating light. Furthermore, differences in plasmon interference wavelengths was measured for different surface dielectric functions. Finally, the decantation of the SPPs interference image w

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39

Liu, Yandi. "Block Copolymer Lithographyfor Nano-porous Oxide Thin Films." Thesis, KTH, Skolan för elektroteknik och datavetenskap (EECS), 2018. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-254331.

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This thesis focuses on employing a new patterning technique called block copolymer lithography to transfer the nano-porous pattern from the polymer template to the underlying oxide thin film. Nano-porous block copolymer films are produced by spin-coating polymer solution on wafers followed by annealing, UV exposure and development processes. Reactive-ion etching is then used to etch the oxide films based on the pattern of polymer template and the polymer is then removed. The obtained oxide microstructure is characterized by SEM, showing a nanomesh of microdomains with the same hole size and de

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40

Yan, Li. "Two phase magnetoelectric epitaxial composite thin films." Diss., Virginia Tech, 2009. http://hdl.handle.net/10919/30130.

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Magnetoelectricity (ME) is a physical property that results from an exchange between polar (electric dipole) and spin (magnetic dipole) subsystem: i.e., a change in polarization (P) with application of magnetic field (H), or a change in magnetization (M) with applied electric field (E). Magnetoelectricity can be found both in single phase and composite materials. Compared with single phase multiferroic materials, composite multiferroics have higher ME effects. Through a strictive interaction between the piezoelectricity of the ferroelectric phase and the magnetostriction of the ferromagnetic p

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Kandulski, Witold. "Shadow nanosphere lithography." [S.l.] : [s.n.], 2007. http://deposit.ddb.de/cgi-bin/dokserv?idn=985533013.

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42

Johansson, Anders. "Template-Based fabrication of Nanostructured Materials." Doctoral thesis, Uppsala : Acta Universitatis Upsaliensis, 2006. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-7364.

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Höwler, Marcel. "Präparation und Charakterisierung von TMR-Nanosäulen." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2012. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-91946.

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Diese Arbeit befasst sich mit der Nanostrukturierung von magnetischen Schichtsystemen mit Tunnelmagnetowiderstandseffekt (TMR-Effekt), welche in der Form von Nanosäulen in magnetoresistiven Speichern (MRAM) eingesetzt werden. Solche Nanosäulen können zukünftig ebenfalls als Nanoemitter von Mikrowellensignalen eine Rolle spielen. Dabei wird von der Auswahl eines geeigneten TMR-Schichtsystems mit einer MgO-Tunnelbarriere über die Präparation der Nanosäulen mit Seitenisolierung bis hin zum Aufbringen der elektrischen Zuleitungen eine komplette Prozesskette entwickelt und optimiert. Die Strukturen

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Höwler, Marcel. "Präparation und Charakterisierung von TMR-Nanosäulen." Doctoral thesis, Helmholtz-Zentrum Dresden-Rossendorf, 2011. https://tud.qucosa.de/id/qucosa%3A26102.

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Diese Arbeit befasst sich mit der Nanostrukturierung von magnetischen Schichtsystemen mit Tunnelmagnetowiderstandseffekt (TMR-Effekt), welche in der Form von Nanosäulen in magnetoresistiven Speichern (MRAM) eingesetzt werden. Solche Nanosäulen können zukünftig ebenfalls als Nanoemitter von Mikrowellensignalen eine Rolle spielen. Dabei wird von der Auswahl eines geeigneten TMR-Schichtsystems mit einer MgO-Tunnelbarriere über die Präparation der Nanosäulen mit Seitenisolierung bis hin zum Aufbringen der elektrischen Zuleitungen eine komplette Prozesskette entwickelt und optimiert. Die Struktur

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45

Takenoshita, Kazutoshi. "DEBRIS CHARACTERIZATION AND MITIGATION OF DROPLET LASER PLASMA SOURCES FOR EUV LITHOGRAPHY." Doctoral diss., University of Central Florida, 2006. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/2786.

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Extreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The wavelength of choice is 13.5 nm determined by the optimum reflectivity of the mirror coatings. The light source required for this wavelength is derived from a hot-dense plasma produced by either a gas discharge or a laser. This study concentrate only on the laser produced plasma source because of its ad

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46

Skupinski, Marek. "Nanopatterning by Swift Heavy Ions." Doctoral thesis, Uppsala University, Department of Engineering Sciences, 2006. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-7183.

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<p>Today, the dominating way of patterning nanosystems is by irradiation-based lithography (e-beam, DUV, EUV, and ions). Compared to the other irradiations, ion tracks created by swift heavy ions in matter give the highest contrast, and its inelastic scattering facilitate minute widening and high aspect ratios (up to several thousands). Combining this with high resolution masks it may have potential as lithography technology for nanotechnology. Even if this ‘ion track lithography’ would not give a higher resolution than the others, it still can pattern otherwise irradiation insensitive materia

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47

Merhari, Lhadi. "De l'interaction ions-polymères : Approche d'une lithographie ionique optimale." Limoges, 1991. http://www.theses.fr/1991LIMO0131.

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Dans le cadre de l'optimisation du procede de lithographie ionique, nous etudions l'autodeveloppement de resines par le biais de l'interaction ion-matiere. Deux polymeres de proprietes physico-chimiques tres differentes, le nitrate de cellulose et le polyamidoimide sont alors systematiquement irradies et analyses par spectrometrie de masse des ions secondaires et spectrometrie infrarouge a basse temperature, afin de determiner les mecanismes les plus probables des modifications induites. Nous proposons alors un modele mathematique permettant de simuler la vitesse d'autodeveloppement du nitrate

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48

Abargues, López Rafael. "Conducting polymers as charge dissipator layers for electron beam lithography." [S.l.] : [s.n.], 2006. http://deposit.ddb.de/cgi-bin/dokserv?idn=981465927.

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Yu, Fayou. "Laser interference lithography micropatterning of polymer surface for cell adhesion /." [S.l.] : [s.n.], 2006. http://deposit.ddb.de/cgi-bin/dokserv?idn=980208009.

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Teixeira, Fernanda de Sá. "Implantação iônica de baixa energia em polímero para desenvolvimento de camadas compósitas nanoestruturadas condutoras litografáveis." Universidade de São Paulo, 2010. http://www.teses.usp.br/teses/disponiveis/3/3140/tde-23082010-103839/.

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Eletrônica utilizando polímero em substituição ao silício é uma área de pesquisa recente com perspectivas econômicas promissoras. Compósitos de polímeros com partículas metálicas apresentam interessantes propriedades elétricas, magnéticas e ópticas e têm sido produzidos por uma grande variedade de técnicas. Implantação iônica de metais utilizando plasma é um dos métodos utilizados para obtenção desses compósitos condutores. Neste trabalho é realizada implantação de íons de ouro de baixa energia em PMMA utilizando plasma. O PMMA tem grande importância tecnológica sendo largamente utilizado como

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