Academic literature on the topic 'Ion sources'
Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles
Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Ion sources.'
Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.
You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.
Journal articles on the topic "Ion sources"
Tanizuka, Noboru. "Analysis of magnetron ion sources and PIG ion sources." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 37-38 (February 1989): 189–93. http://dx.doi.org/10.1016/0168-583x(89)90166-3.
Full textBacal, M., M. Sasao, and M. Wada. "Negative ion sources." Journal of Applied Physics 129, no. 22 (June 14, 2021): 221101. http://dx.doi.org/10.1063/5.0049289.
Full textSharkov, B., and R. Scrivens. "Laser ion sources." IEEE Transactions on Plasma Science 33, no. 6 (December 2005): 1778–85. http://dx.doi.org/10.1109/tps.2005.860080.
Full textRoy, Prabir K., Wayne G. Greenway, Dave P. Grote, Joe W. Kwan, Steven M. Lidia, Peter A. Seidl, and William L. Waldron. "Lithium ion sources." Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 733 (January 2014): 112–18. http://dx.doi.org/10.1016/j.nima.2013.05.086.
Full textSugitani, Michiro. "Ion implantation technology and ion sources." Review of Scientific Instruments 85, no. 2 (February 2014): 02C315. http://dx.doi.org/10.1063/1.4854155.
Full textHolmes, A. J. T., and G. Proudfoot. "Negative-ion sources for ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 55, no. 1-4 (April 1991): 323–27. http://dx.doi.org/10.1016/0168-583x(91)96186-o.
Full textBelchenko, Yu. "Surface negative ion production in ion sources." Review of Scientific Instruments 64, no. 6 (June 1993): 1385–93. http://dx.doi.org/10.1063/1.1144048.
Full textPanteleev, V. N., A. E. Barzakh, D. V. Fedorov, F. V. Moroz, S. Yu Orlov, M. D. Seliverstov, Yu M. Volkov, L. Tecchio, and A. Andrighetto. "High temperature ion sources with ion confinement." Review of Scientific Instruments 73, no. 2 (February 2002): 738–40. http://dx.doi.org/10.1063/1.1427345.
Full textSakai, Shigeki, Nariaki Hamamoto, Yutaka Inouchi, Sei Umisedo, and Naoki Miyamoto. "Ion sources for ion implantation technology (invited)." Review of Scientific Instruments 85, no. 2 (February 2014): 02C313. http://dx.doi.org/10.1063/1.4852315.
Full textWhite, Nicholas R. "Ion sources for use in ion implantation." Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 37-38 (February 1989): 78–86. http://dx.doi.org/10.1016/0168-583x(89)90139-0.
Full textDissertations / Theses on the topic "Ion sources"
Mynors, Diane Julie. "Modelling of volume ion sources." Thesis, University of Oxford, 1993. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.333192.
Full textPerez, Martinez Carla S. (Carla Sofia). "Engineering ionic liquid ion sources for ion beam applications." Thesis, Massachusetts Institute of Technology, 2016. http://hdl.handle.net/1721.1/105605.
Full textCataloged from PDF version of thesis.
Includes bibliographical references (pages 177-186).
Ionic liquid ion sources (ILIS) are devices capable of producing positive and negative molecular ion beams through field evaporation from room-temperature molten salts. If sufficiently high hydraulic impedance from the liquid-supporting emitter is provided such that the ratio of flow rate Q to liquid's electrical conductivity K is sufficiently small, a pure ionic regime (PIR) can be achieved, in contrast with traditional electrosprays that produce charged droplets, or mixtures of droplets and ions. The PIR provides high current density from a point source, making ionic liquid ion beams suitable for use in focused ion beam (FIB) applications. The use of ionic liquids in focused ion beams could allow the production of sub-100 nm beams of up to kiloDalton organic ions as well as reactive species, with the possibility of engineering ionic liquid properties for a specific application. In addition, using micro-fabricated and nano-structured emitter arrays operating in the PIR can give access to efficient and compact positive or negative ion sources, for applications from spacecraft thrusters to deep reactive ion etchers (DRIE). There is a need for novel tip geometries and materials that favor the stable formation of a single emission site on the liquid supporting structure, while providing a continuous liquid supply compatible with the PIR. In this thesis, porous carbon based on resorcinol-formaldehyde xerogels is introduced as an emitter substrate. The target pore sizes and emitter geometries to attain the PIR are obtained through analytical estimates. The carbon xerogel can be shaped to the required micron-sized geometry through mechanical polishing. Time-of-flight mass (TOF) spectrometry is used to verify that charged particle beams produced from the mechanically polished carbon xerogel source, infused with the ionic liquid 1-ethyl-3-methylimidazolium tetrafluoroborate (EMI-BF₄), contain solvated ions exclusively. In the case of the liquid 1-ethyl-3-methylimidazolium bis(trifluorometrylsulfonyl)imide (EMI-Im), mixed ion-drop operation is obtained. Laser micro-machining has been validated as a manufacturing technique to shape carbon xerogel into emitters. This technique should allow the production of emitter arrays for DRIE or propulsion applications, and allow the reproducible fabrication of emitters for FIB. Stable emission has been obtained from a laser micromachined tip infused with the ionic liquid EMI-BF₄ . The results of TOF and retarding potential analysis (RPA) experiments indicate that the emission consists mostly of monomers and dimers, and that a small fraction (< 5%) of the beam might be composed of cluster ions with greater degrees of solvation. To conclude, the thesis reports on the etching properties of the beams obtained from ILIS, both in the case of traditional externally wetted tungsten sources and with the novel carbon xerogel emitter technology. The W ILIS etches silicon with sputtering rates between 6 and 35 atoms of silicon removed per incident ion at 15 keV irradiation energies, whereas the carbon xerogel ILIS has been used to etch gold, silicon and gallium nitride with sputtering rates in the order of 10 for irradiation energies between 2 and 7 keV.
by Carla S. Perez Martinez.
Ph. D.
Hornsey, Richard Ian. "Factors affecting ion energy distributions in liquid metal ion sources." Thesis, University of Oxford, 1989. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.236154.
Full textPapadopoulos, S. "Atomic and cluster ion emission from liquid metal ion sources." Thesis, University of Oxford, 1986. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.375310.
Full textMiller, Catherine Elizabeth. "Characterization of ion Cluster fragmentation in ionic liquid ion sources." Thesis, Massachusetts Institute of Technology, 2019. https://hdl.handle.net/1721.1/122372.
Full textThesis: Ph. D., Massachusetts Institute of Technology, Department of Aeronautics and Astronautics, 2019
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 273-281).
Ion electrospray propulsion is a cutting-edge micropropulsion technology that could revolutionize the capabilities of microsatellites. Ion electrospray thrusters could also be used on large spacecraft for precision attitude control applications such as gravity wave detection and exoplanet imaging. Novel room temperature molten salts, called ionic liquids, are used as propellant, which are composed purely of positive and negative molecular ions. When exposed to strong electric fields, ions and metastable clusters of ions are evaporated from the bulk liquid surface. The free ions and ion clusters can be accelerated to high velocities, producing thrust at high specific impulse. The performance of ion electrospray thrusters is affected by the composition of the ion beam and the amount of ion clusters that break apart during the acceleration phase. To improve thruster performance, a better understanding of the fundamental physics of ion evaporation and cluster break-up is needed.
The break-up of ion clusters, also called fragmentation, is not a well understood phenomenon. It has been observed in past experiments, but the rates of break-up have not been measured. The focus of this work is to experimentally investigate fragmentation more deeply than ever before. To accomplish this, a specialized instrumentation suite has been designed, built, and tested to measure fragmentation characteristics in unprecedented detail. A full-beam, spherical geometry retarding potential analyzer is used to measure the rates of fragmentation of ion clusters both outside the thruster and within the acceleration region for the first time. A narrow-beam, high time-resolution time of flight mass spectrometer is used to measure the beam composition. Single emitters based on resorcinol formaldehyde carbon xerogels were used as ion sources. Four ionic liquids spanning a wide range of liquid properties were characterized: EMI-FAP, EMI-Im, EMI-BF4, and BMI-I.
Analytical models were also developed to enhance the interpretation of the experimental results. The experimental measurements show that the amount of fragmentation increases with distance from the thruster and follows a constant rate equation. The mean lifetimes of ion clusters outside of the thruster range from 1-6 [mu]s, indicating that these clusters are quite unstable. It is observed that the fragmentation throughout most of the acceleration region is linear with respect to electric potential, which can be understood using analytical models. Rapid fragmentation likely occurs immediately after evaporation due to the strong electric fields near the emission site, which has significant implications for thruster performance. It is also observed that clusters of complex molecular ions which consist of many atoms tend to be the most stable. The initial temperature of ion clusters, which range from 520 K - 790 K, were estimated using analytical methods.
The effect of liquid temperature on the rates of fragmentation was also investigated. In conclusion, the work in this thesis provides a greatly enhanced understanding of ion cluster fragmentation, particularly how it is affected by ionic liquid properties, liquid temperature, and electric fields.
This research was supported by a NASA Space Technology Research Fellowship
by Catherine Elizabeth Miller.
Ph. D.
Ph.D. Massachusetts Institute of Technology, Department of Aeronautics and Astronautics
Perez, Martinez Carla S. (Carla Sofia). "Characterization of ionic liquid ion sources for focused ion beam applications." Thesis, Massachusetts Institute of Technology, 2013. http://hdl.handle.net/1721.1/82506.
Full textThis thesis was scanned as part of an electronic thesis pilot project.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 79-82).
In the Focused Ion Beam (FIB) technique, a beam of ions is reduced to nanometer dimensions using dedicated optics and directed to a substrate for patterning. This technique is widely used in micro- and nanofabrication for etching, material deposition, microscopy, and chemical surface analysis. Traditionally, ions from metals or noble gases have been used for FIB, but it may be possible to diversify FIB applications by using ionic liquids. In this work, we characterize properties of an ionic liquid ion source (ILIS) relevant for FIB and recommend strategies for FIB implementation. To install ILIS in FIB, it is necessary to demonstrate single beam emission, free of neutral particles. Beams from ILIS contain a fraction of neutral particles, which could be detrimental for FIB as they are not manipulated by ion optics and could lead to undesired sample modification. We estimate the neutral particle fraction in the beam via retarding potential analysis, and use a beam visualization tool to determine that most of the neutral population is located at the center of the beam; the neutral population might then be eliminated using filtering. The same instrument is used to determine the transition of the source from single to multiple beam emission as the extraction voltage is increased. These studies should guide in the design of the optical columns for an ILIS-based FIB.
by Carla S. Perez Martinez.
S.M.
Miller, Catherine Elizabeth. "On the stability of complex ions in ionic liquid Ion sources." Thesis, Massachusetts Institute of Technology, 2015. http://hdl.handle.net/1721.1/98808.
Full textCataloged from PDF version of thesis.
Includes bibliographical references (pages 139-141).
Ionic liquids are molten salts at room temperature that consist of positive and negative ions. These liquids can be used in electrosprays to produce ion beams. Ionic liquid ion source (ILIS) beams typically consist of single ions and solvated ions. It has been observed that solvated ions are not always stable and can break up into lighter ions midflight. Past experiments show that the stability of solvated ions depends on the molecular composition of the ionic liquid. Based on these results, it has been hypothesized that the stability of solvated ions increases with increasing molecular complexity of the ions. The focus of this work is to test this hypothesis by characterizing ionic liquids of different molecular complexities under controlled conditions. A time of flight mass spectrometer and a retarding potential analyzer were developed specifically for this purpose. The ion beam composition and energy distribution were measured at various temperatures and source voltages for each ionic liquid. With some exceptions, the observed trend was in agreement with the results of past experiments and with the hypothesis. The exceptions to the expected trend may have resulted from the limitations of the detectors. The data from this work can be used to test the hypothesis with moderate confidence. Future study requires improvements to the detectors, namely the retarding potential analyzer, so that the hypothesis can be evaluated more conclusively.
by Catherine Elizabeth Miller.
S.M.
Dowsett, David Mark Francis. "High Brightness Ion Sources for Surface Analysis." Thesis, University of Warwick, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.491929.
Full textGotoh, Yasuhito. "Development of Novel Metal Ion Beam Systems with Liquid-Metal Ion Sources." 京都大学 (Kyoto University), 2001. http://hdl.handle.net/2433/77906.
Full textPetrov, A., A. Alexandrov, E. Kralkina, P. Nekliudova, K. Vavilin, and V. Pavlov. "Advanced Ion and Plasma Sources for Materials Surface Engineering." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35409.
Full textBooks on the topic "Ion sources"
Zhurin, Viacheslav V. Industrial Ion Sources. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2011. http://dx.doi.org/10.1002/9783527635726.
Full text1939-, Wolf Bernhard, ed. Handbook of ion sources. Boca Raton, Fla: CRC Press, 1995.
Find full textPrewett, P. D. Focused ion beams from liquid metal ion sources. Taunton, Somerset, England: Research Studies Press, 1991.
Find full textDudnikov, Vadim. Development and Applications of Negative Ion Sources. Cham: Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-28437-4.
Full textG, Brown Ian, ed. The Physics and technology of ion sources. New York: Wiley, 1989.
Find full textDudnikov, Vadim. Development and Applications of Negative Ion Sources. Cham: Springer International Publishing, 2023. http://dx.doi.org/10.1007/978-3-031-28408-3.
Full textG, Brown Ian, ed. The Physics and technology of ion sources. 2nd ed. New York: Wiley-VCH, 2004.
Find full textShirkov, Grigori D. Electron impact ion sources for charged heavy ions. Braunschweig: Vieweg, 1996.
Find full textShirkov, Grigori D., and Günter Zschornack. Electron Impact Ion Sources for Charged Heavy Ions. Wiesbaden: Vieweg+Teubner Verlag, 1996. http://dx.doi.org/10.1007/978-3-663-09896-6.
Full textBacal, Marthe, ed. Physics and Applications of Hydrogen Negative Ion Sources. Cham: Springer International Publishing, 2023. http://dx.doi.org/10.1007/978-3-031-21476-9.
Full textBook chapters on the topic "Ion sources"
Ippolito, N., F. Taccogna, P. Minelli, V. Variale, and N. Colonna. "RF Negative Ion Sources and Polarized Ion Sources." In Springer Proceedings in Physics, 145–52. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-39471-8_12.
Full textSakudo, Noriyuki. "Microwave Ion Sources." In The Physics and Technology of Ion Sources, 177–201. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603956.ch10.
Full textLeitner, Daniela, and Claude Lyneis. "ECR Ion Sources." In The Physics and Technology of Ion Sources, 203–31. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603956.ch11.
Full textSharkov, Boris. "Laser Ion Sources." In The Physics and Technology of Ion Sources, 233–56. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603956.ch12.
Full textIshikawa, Junzo. "Negative Ion Sources." In The Physics and Technology of Ion Sources, 285–310. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603956.ch14.
Full textBrown, Ian G. "Elementary Ion Sources." In The Physics and Technology of Ion Sources, 29–40. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603956.ch3.
Full textFlewitt, Peter E. J., and Robert K. Wild. "Atom/Ion Sources." In Physical Methods for Materials Characterisation, 513–619. Third edition. | Boca Raton, FL : CRC Press, Taylor & Francis Group, [2017] | Series: Series in materials science and engineering: CRC Press, 2017. http://dx.doi.org/10.1201/9781315382012-6.
Full textTrassl, R. "ECR Ion Sources." In The Physics of Multiply and Highly Charged Ions, 3–37. Dordrecht: Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-017-0542-4_1.
Full textZelenski, Anatoli. "Polarized Ion Sources." In Polarized Beam Dynamics and Instrumentation in Particle Accelerators, 245–60. Cham: Springer International Publishing, 2022. http://dx.doi.org/10.1007/978-3-031-16715-7_10.
Full textKwan, Joe. "Ion Sources for Heavy Ion Fusion." In The Physics and Technology of Ion Sources, 311–40. Weinheim, FRG: Wiley-VCH Verlag GmbH & Co. KGaA, 2005. http://dx.doi.org/10.1002/3527603956.ch15.
Full textConference papers on the topic "Ion sources"
Popelier, Lara, Ane Aanesland, Pascal Chabert, Yasuhiko Takeiri, and Katsuyoshi Tsumori. "Extraction and Acceleration of Ions from an Ion-Ion Plasma." In SECOND INTERNATIONAL SYMPOSIUM ON NEGATIVE IONS, BEAMS AND SOURCES. AIP, 2011. http://dx.doi.org/10.1063/1.3637439.
Full textKaufmann, Johannes, Thomas Siefke, Carsten Ronning, and Uwe Zeitner. "Fabrication of EUV Gratings via Ion Irradiation." In Compact EUV & X-ray Light Sources. Washington, D.C.: Optica Publishing Group, 2024. http://dx.doi.org/10.1364/euvxray.2024.jw4a.15.
Full textLeung, Ka-Ngo. "Ion sources for high purity ions." In The fourteenth international conference on the application of accelerators in research and industry. AIP, 1997. http://dx.doi.org/10.1063/1.52618.
Full textStolee, Jessica A., Bennett N. Walker, Yong Chen, Akos Vertes, and Claude Phipps. "Nanophotonic Ion Sources." In INTERNATIONAL SYMPOSIUM ON HIGH POWER LASER ABLATION 2010. AIP, 2010. http://dx.doi.org/10.1063/1.3507188.
Full textAlessi, J. G. "H− ion sources." In High-brightness beams for advanced accelerator applications. AIP, 1992. http://dx.doi.org/10.1063/1.42140.
Full textFaehl, R. J., and B. P. Wood. "PIC modelling of plasma source ion implantation using metal ion sources." In International Conference on Plasma Science (papers in summary form only received). IEEE, 1995. http://dx.doi.org/10.1109/plasma.1995.533487.
Full textLevy, C. D. P., Ahovi Kponou, Yousef Makdisi, and Anatoli Zelenski. "Polarized Radioactive Ion Beams." In POLARIZED ION SOURCES, TARGETS AND POLARIMETRY. AIP, 2008. http://dx.doi.org/10.1063/1.2888097.
Full textZhao, W. J., Z. Q. Zhao, X. T. Ren, Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, and Yevgeniy V. Kondratenko. "Metal Ion Sources for Ion Beam Implantation." In ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology. AIP, 2008. http://dx.doi.org/10.1063/1.3033630.
Full textGrote, D. P., G. Westenskow, and J. Kwan. "Heavy ion fusion sources." In Proceedings of the 2003 Particle Accelerator Conference. IEEE, 2003. http://dx.doi.org/10.1109/pac.2003.1288843.
Full textWilley, Ron. "Capabilities and Limitations of Various Gridless Ion Sources." In Optical Interference Coatings. Washington, D.C.: Optica Publishing Group, 1995. http://dx.doi.org/10.1364/oic.1995.tua2.
Full textReports on the topic "Ion sources"
Hershcovitch, Ady, and Michael Furey. Highly Stripped Ion Sources for MeV Ion Implantation. Office of Scientific and Technical Information (OSTI), June 2009. http://dx.doi.org/10.2172/990451.
Full textJi, Lili. Plasma ion sources and ion beam technology inmicrofabrications. Office of Scientific and Technical Information (OSTI), January 2007. http://dx.doi.org/10.2172/924801.
Full textLeung, K. N. High current short pulse ion sources. Office of Scientific and Technical Information (OSTI), August 1996. http://dx.doi.org/10.2172/414414.
Full textSchmidt, Charles. Review of negative hydrogen ion sources. Office of Scientific and Technical Information (OSTI), February 1991. http://dx.doi.org/10.2172/6267018.
Full textKamperschroer, J. H., L. R. Grisham, R. A. Newman, T. E. O`Connor, T. N. Stevenson, A. von Halle, M. D. Williams, and K. E. Wright. Low Z impurity ion extraction from TFTR ion sources. Office of Scientific and Technical Information (OSTI), April 1993. http://dx.doi.org/10.2172/10144103.
Full textKamperschroer, J. H., L. R. Grisham, R. A. Newman, T. E. O'Connor, T. N. Stevenson, A. von Halle, M. D. Williams, and K. E. Wright. Low Z impurity ion extraction from TFTR ion sources. Office of Scientific and Technical Information (OSTI), April 1993. http://dx.doi.org/10.2172/6867280.
Full textHershcovitch, A. HOLLOW HEAVY PRIMARY ION SOURCES FOR EBIS. Office of Scientific and Technical Information (OSTI), November 1994. http://dx.doi.org/10.2172/1151310.
Full textSchiffer, J. P., B. B. Back, and I. Ahmad. Ion sources and targets for radioactive beams. Office of Scientific and Technical Information (OSTI), August 1995. http://dx.doi.org/10.2172/166411.
Full textChacon-Golcher, Edwin. Studies in High Current Density Ion Sources for Heavy Ion Fusion Applications. Office of Scientific and Technical Information (OSTI), June 2002. http://dx.doi.org/10.2172/920171.
Full textPeroutka, Balthazar. Electromagnetic Fields from Quantum Sources in Heavy Ion Collisions. Ames (Iowa): Iowa State University, January 2019. http://dx.doi.org/10.31274/cc-20240624-609.
Full text