Journal articles: 'Kelvin force probe microscopy'

1

Nonnenmacher, M., M. P. O’Boyle, and H. K. Wickramasinghe. "Kelvin probe force microscopy." Applied Physics Letters 58, no. 25 (June 24, 1991): 2921–23. http://dx.doi.org/10.1063/1.105227.

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Jakob, Devon S., Haomin Wang, and Xiaoji G. Xu. "Pulsed Force Kelvin Probe Force Microscopy." ACS Nano 14, no. 4 (April 13, 2020): 4839–48. http://dx.doi.org/10.1021/acsnano.0c00767.

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3

Blücher, D. Bengtsson, J. E. Svensson, L. G. Johansson, M. Rohwerder, and M. Stratmann. "Scanning Kelvin Probe Force Microscopy." Journal of The Electrochemical Society 151, no. 12 (2004): B621. http://dx.doi.org/10.1149/1.1809590.

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Jakob, Devon S., Haomin Wang, Guanghong Zeng, Daniel E. Otzen, Yong Yan, and Xiaoji G. Xu. "Peak Force Infrared–Kelvin Probe Force Microscopy." Angewandte Chemie International Edition 59, no. 37 (June 25, 2020): 16083–90. http://dx.doi.org/10.1002/anie.202004211.

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Jakob, Devon S., Haomin Wang, Guanghong Zeng, Daniel E. Otzen, Yong Yan, and Xiaoji G. Xu. "Peak Force Infrared–Kelvin Probe Force Microscopy." Angewandte Chemie 132, no. 37 (June 25, 2020): 16217–24. http://dx.doi.org/10.1002/ange.202004211.

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Kohl, Dominik, Patrick Mesquida, and Georg Schitter. "Quantitative AC - Kelvin Probe Force Microscopy." Microelectronic Engineering 176 (May 2017): 28–32. http://dx.doi.org/10.1016/j.mee.2017.01.005.

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7

MIZUTANI, Takashi. "Expectation on Kelvin Probe Force Microscopy." Hyomen Kagaku 22, no. 5 (2001): 281. http://dx.doi.org/10.1380/jsssj.22.281.

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Collins, Liam, Stephen Jesse, Jason I. Kilpatrick, Alexander Tselev, M. Baris Okatan, Sergei V. Kalinin, and Brian J. Rodriguez. "Kelvin probe force microscopy in liquid using electrochemical force microscopy." Beilstein Journal of Nanotechnology 6 (January 19, 2015): 201–14. http://dx.doi.org/10.3762/bjnano.6.19.

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Conventional closed loop-Kelvin probe force microscopy (KPFM) has emerged as a powerful technique for probing electric and transport phenomena at the solid–gas interface. The extension of KPFM capabilities to probe electrostatic and electrochemical phenomena at the solid–liquid interface is of interest for a broad range of applications from energy storage to biological systems. However, the operation of KPFM implicitly relies on the presence of a linear lossless dielectric in the probe–sample gap, a condition which is violated for ionically-active liquids (e.g., when diffuse charge dynamics are present). Here, electrostatic and electrochemical measurements are demonstrated in ionically-active (polar isopropanol, milli-Q water and aqueous NaCl) and ionically-inactive (non-polar decane) liquids by electrochemical force microscopy (EcFM), a multidimensional (i.e., bias- and time-resolved) spectroscopy method. In the absence of mobile charges (ambient and non-polar liquids), KPFM and EcFM are both feasible, yielding comparable contact potential difference (CPD) values. In ionically-active liquids, KPFM is not possible and EcFM can be used to measure the dynamic CPD and a rich spectrum of information pertaining to charge screening, ion diffusion, and electrochemical processes (e.g., Faradaic reactions). EcFM measurements conducted in isopropanol and milli-Q water over Au and highly ordered pyrolytic graphite electrodes demonstrate both sample- and solvent-dependent features. Finally, the feasibility of using EcFM as a local force-based mapping technique of material-dependent electrostatic and electrochemical response is investigated. The resultant high dimensional dataset is visualized using a purely statistical approach that does not require a priori physical models, allowing for qualitative mapping of electrostatic and electrochemical material properties at the solid–liquid interface.

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Ligowski, Maciej, Michiharu Tabe, and Ryszard Jabłoński. "Kelvin Probe Force Microscope Measurement Uncertainty." Advanced Materials Research 222 (April 2011): 114–17. http://dx.doi.org/10.4028/www.scientific.net/amr.222.114.

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Kelvin Probe Force Microscopy is an attractive technique for characterizing the surface potential of various samples. The main advantage of this technique is its high spatial resolution together with high sensitivity. However as in any nanoscale measurements also in case of KFM it is extremly difficult to describe the uncertainty of the measurement. Moreover, a wide variety of measuring conditions, together with the complicated operation principle cause situation, where no standard calibration methods are available. In the paper we propose the model of the KFM microscope and analyze the uncertainty of the KFM measurement.

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Kline, R. J., J. F. Richards, and P. E. Russell. "Scanning Kelvin Force and Capacitance Microscopy Applications." Microscopy and Microanalysis 4, S2 (July 1998): 330–31. http://dx.doi.org/10.1017/s1431927600021772.

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Scanning Probe Microscopy (SPM) is being developed as a possible solution to the problems inherent with analyzing the nanometer scale electronic properties of ULSI integrated circuits. Scanning Kelvin Probe Microscopy (SKPM) and Scanning Capacitance Microscopy (SCM) are both being developed to provide two dimensional dopant profiles of semiconductor devices. SKPM can also determine surface potentials, work functions, dielectric properties, and capacitance.SKPM is based on the concept of Kelvin probe oscillating capacitor work function measurements. The small capacitance area of the SKPM tip and the high resistance of the system produce difficulties in monitoring and minimizing the current in the system. SKPM solves this problem by utilizing the force monitoring capability of the SPM to minimize the Kelvin force instead of the current. An AC voltage applied to the cantilever produces a DC force and AC forces at the AC frequency and the first harmonic of the AC frequency.

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Melitz, Wilhelm, Jian Shen, Andrew C. Kummel, and Sangyeob Lee. "Kelvin probe force microscopy and its application." Surface Science Reports 66, no. 1 (January 2011): 1–27. http://dx.doi.org/10.1016/j.surfrep.2010.10.001.

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12

Jacobs, H. O., H. F. Knapp, and A. Stemmer. "Practical aspects of Kelvin probe force microscopy." Review of Scientific Instruments 70, no. 3 (March 1999): 1756–60. http://dx.doi.org/10.1063/1.1149664.

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13

Sun, Hao, Haibin Chu, Jinyong Wang, Lei Ding, and Yan Li. "Kelvin probe force microscopy study on nanotriboelectrification." Applied Physics Letters 96, no. 8 (February 22, 2010): 083112. http://dx.doi.org/10.1063/1.3330866.

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14

Fujihira, Masamichi. "KELVIN PROBE FORCE MICROSCOPY OF MOLECULAR SURFACES." Annual Review of Materials Science 29, no. 1 (August 1999): 353–80. http://dx.doi.org/10.1146/annurev.matsci.29.1.353.

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15

Domanski, Anna L., Esha Sengupta, Karina Bley, Maria B. Untch, Stefan A. L. Weber, Katharina Landfester, Clemens K. Weiss, Hans-Jürgen Butt, and Rüdiger Berger. "Kelvin Probe Force Microscopy in Nonpolar Liquids." Langmuir 28, no. 39 (September 18, 2012): 13892–99. http://dx.doi.org/10.1021/la302451h.

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16

Mesquida, P., D. Kohl, and G. Schitter. "Signal reversal in Kelvin-probe force microscopy." Review of Scientific Instruments 90, no. 11 (November 1, 2019): 113703. http://dx.doi.org/10.1063/1.5118357.

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17

Ferguson, R. S., K. Fobelets, and L. F. Cohen. "Kelvin probe force microscopy of beveled semiconductors." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 20, no. 5 (2002): 2133. http://dx.doi.org/10.1116/1.1511215.

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18

Takahashi, Satoru, Takayoshi Kishida, Seiji Akita, and Yoshikazu Nakayama. "Kelvin Probe Force Microscopy Imaging Using Carbon Nanotube Probe." Japanese Journal of Applied Physics 40, Part 1, No. 6B (June 30, 2001): 4314–16. http://dx.doi.org/10.1143/jjap.40.4314.

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19

Rohwerder, Michael, and Florin Turcu. "High-resolution Kelvin probe microscopy in corrosion science: Scanning Kelvin probe force microscopy (SKPFM) versus classical scanning Kelvin probe (SKP)." Electrochimica Acta 53, no. 2 (December 2007): 290–99. http://dx.doi.org/10.1016/j.electacta.2007.03.016.

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20

Xu, Jie, Jianfeng Chen, Long Chen, Yuanlingyun Cai, Tianqi Yu, and Jinze Li. "Force and resolution analysis in Kelvin probe force microscopy using nanotube probes." IOP Conference Series: Materials Science and Engineering 592 (September 10, 2019): 012036. http://dx.doi.org/10.1088/1757-899x/592/1/012036.

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21

Brown, Keith A., Kevin J. Satzinger, and Robert M. Westervelt. "High spatial resolution Kelvin probe force microscopy with coaxial probes." Nanotechnology 23, no. 11 (February 28, 2012): 115703. http://dx.doi.org/10.1088/0957-4484/23/11/115703.

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22

Henning, Alex, Gino Günzburger, Res Jöhr, Yossi Rosenwaks, Biljana Bozic-Weber, Catherine E. Housecroft, Edwin C. Constable, Ernst Meyer, and Thilo Glatzel. "Kelvin probe force microscopy of nanocrystalline TiO2 photoelectrodes." Beilstein Journal of Nanotechnology 4 (July 1, 2013): 418–28. http://dx.doi.org/10.3762/bjnano.4.49.

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Dye-sensitized solar cells (DSCs) provide a promising third-generation photovoltaic concept based on the spectral sensitization of a wide-bandgap metal oxide. Although the nanocrystalline TiO2 photoelectrode of a DSC consists of sintered nanoparticles, there are few studies on the nanoscale properties. We focus on the microscopic work function and surface photovoltage (SPV) determination of TiO2 photoelectrodes using Kelvin probe force microscopy in combination with a tunable illumination system. A comparison of the surface potentials for TiO2 photoelectrodes sensitized with two different dyes, i.e., the standard dye N719 and a copper(I) bis(imine) complex, reveals an inverse orientation of the surface dipole. A higher surface potential was determined for an N719 photoelectrode. The surface potential increase due to the surface dipole correlates with a higher DSC performance. Concluding from this, microscopic surface potential variations, attributed to the complex nanostructure of the photoelectrode, influence the DSC performance. For both bare and sensitized TiO2 photoelectrodes, the measurements reveal microscopic inhomogeneities of more than 100 mV in the work function and show recombination time differences at different locations. The bandgap of 3.2 eV, determined by SPV spectroscopy, remained constant throughout the TiO2 layer. The effect of the built-in potential on the DSC performance at the TiO2/SnO2:F interface, investigated on a nanometer scale by KPFM measurements under visible light illumination, has not been resolved so far.

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23

Ziegler, Dominik, Jörg Rychen, Nicola Naujoks, and Andreas Stemmer. "Compensating electrostatic forces by single-scan Kelvin probe force microscopy." Nanotechnology 18, no. 22 (May 8, 2007): 225505. http://dx.doi.org/10.1088/0957-4484/18/22/225505.

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24

Schulz, Fabian, Juha Ritala, Ondrej Krejčí, Ari Paavo Seitsonen, Adam S. Foster, and Peter Liljeroth. "Elemental Identification by Combining Atomic Force Microscopy and Kelvin Probe Force Microscopy." ACS Nano 12, no. 6 (May 25, 2018): 5274–83. http://dx.doi.org/10.1021/acsnano.7b08997.

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25

Xu, Jie, Gang Bai, Jinze Li, and Wei Li. "Inhomogeneous probe surface induced effect in Kelvin probe force microscopy." Journal of Applied Physics 127, no. 18 (May 14, 2020): 184302. http://dx.doi.org/10.1063/5.0005276.

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26

Sadewasser, Sascha, Nicoleta Nicoara, and Santiago D. Solares. "Artifacts in time-resolved Kelvin probe force microscopy." Beilstein Journal of Nanotechnology 9 (April 24, 2018): 1272–81. http://dx.doi.org/10.3762/bjnano.9.119.

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Kelvin probe force microscopy (KPFM) has been used for the characterization of metals, insulators, and semiconducting materials on the nanometer scale. Especially in semiconductors, the charge dynamics are of high interest. Recently, several techniques for time-resolved measurements with time resolution down to picoseconds have been developed, many times using a modulated excitation signal, e.g., light modulation or bias modulation that induces changes in the charge carrier distribution. For fast modulation frequencies, the KPFM controller measures an average surface potential, which contains information about the involved charge carrier dynamics. Here, we show that such measurements are prone to artifacts due to frequency mixing, by performing numerical dynamics simulations of the cantilever oscillation in KPFM subjected to a bias-modulated signal. For square bias pulses, the resulting time-dependent electrostatic forces are very complex and result in intricate mixing of frequencies that may, in some cases, have a component at the detection frequency, leading to falsified KPFM measurements. Additionally, we performed fast Fourier transform (FFT) analyses that match the results of the numerical dynamics simulations. Small differences are observed that can be attributed to transients and higher-order Fourier components, as a consequence of the intricate nature of the cantilever driving forces. These results are corroborated by experimental measurements on a model system. In the experimental case, additional artifacts are observed due to constructive or destructive interference of the bias modulation with the cantilever oscillation. Also, in the case of light modulation, we demonstrate artifacts due to unwanted illumination of the photodetector of the beam deflection detection system. Finally, guidelines for avoiding such artifacts are given.

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27

Jacobs, H. O., P. Leuchtmann, O. J. Homan, and A. Stemmer. "Resolution and contrast in Kelvin probe force microscopy." Journal of Applied Physics 84, no. 3 (August 1998): 1168–73. http://dx.doi.org/10.1063/1.368181.

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28

Guo, Senli, Sergei V. Kalinin, and Stephen Jesse. "Open-loop band excitation Kelvin probe force microscopy." Nanotechnology 23, no. 12 (March 9, 2012): 125704. http://dx.doi.org/10.1088/0957-4484/23/12/125704.

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29

Takeuchi, Osamu, Yoshihisa Ohrai, Shoji Yoshida, and Hidemi Shigekawa. "Kelvin Probe Force Microscopy without Bias-Voltage Feedback." Japanese Journal of Applied Physics 46, no. 8B (August 23, 2007): 5626–30. http://dx.doi.org/10.1143/jjap.46.5626.

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30

Faliya, Kapil, Herbert Kliem, and Carlos J. Dias. "Space charge measurements with Kelvin probe force microscopy." IEEE Transactions on Dielectrics and Electrical Insulation 24, no. 3 (June 2017): 1913–22. http://dx.doi.org/10.1109/tdei.2017.006457.

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31

Barth, C., T. Hynninen, M. Bieletzki, C. R. Henry, A. S. Foster, F. Esch, and U. Heiz. "AFM tip characterization by Kelvin probe force microscopy." New Journal of Physics 12, no. 9 (September 15, 2010): 093024. http://dx.doi.org/10.1088/1367-2630/12/9/093024.

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32

Kikukawa, Atsushi, Sumio Hosaka, and Ryo Imura. "Vacuum compatible high‐sensitive Kelvin probe force microscopy." Review of Scientific Instruments 67, no. 4 (April 1996): 1463–67. http://dx.doi.org/10.1063/1.1146874.

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33

Kang, Zhuo, Haonan Si, Mingyue Shi, Chenzhe Xu, Wenqiang Fan, Shuangfei Ma, Ammarah Kausar, Qingliang Liao, Zheng Zhang, and Yue Zhang. "Kelvin probe force microscopy for perovskite solar cells." Science China Materials 62, no. 6 (February 14, 2019): 776–89. http://dx.doi.org/10.1007/s40843-018-9395-y.

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34

Diesinger, Heinrich, Dominique Deresmes, and Thierry Mélin. "Noise performance of frequency modulation Kelvin force microscopy." Beilstein Journal of Nanotechnology 5 (January 2, 2014): 1–18. http://dx.doi.org/10.3762/bjnano.5.1.

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Noise performance of a phase-locked loop (PLL) based frequency modulation Kelvin force microscope (FM-KFM) is assessed. Noise propagation is modeled step by step throughout the setup using both exact closed loop noise gains and an approximation known as “noise gain” from operational amplifier (OpAmp) design that offers the advantage of decoupling the noise performance study from considerations of stability and ideal loop response. The bandwidth can be chosen depending on how much noise is acceptable and it is shown that stability is not an issue up to a limit that will be discussed. With thermal and detector noise as the only sources, both approaches yield PLL frequency noise expressions equal to the theoretical value for self-oscillating circuits and in agreement with measurement, demonstrating that the PLL components neither modify nor contribute noise. Kelvin output noise is then investigated by modeling the surrounding bias feedback loop. A design rule is proposed that allows choosing the AC modulation frequency for optimized sharing of the PLL bandwidth between Kelvin and topography loops. A crossover criterion determines as a function of bandwidth, temperature and probe parameters whether thermal or detector noise is the dominating noise source. Probe merit factors for both cases are then established, suggesting how to tackle noise performance by probe design. Typical merit factors of common probe types are compared. This comprehensive study is an encouraging step toward a more integral performance assessment and a remedy against focusing on single aspects and optimizing around randomly chosen key values.

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35

Polak, Leo, and Rinke J. Wijngaarden. "Preventing probe induced topography correlated artifacts in Kelvin Probe Force Microscopy." Ultramicroscopy 171 (December 2016): 158–65. http://dx.doi.org/10.1016/j.ultramic.2016.09.014.

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36

Miyahara, Yoichi, and Peter Grutter. "Force-gradient sensitive Kelvin probe force microscopy by dissipative electrostatic force modulation." Applied Physics Letters 110, no. 16 (April 17, 2017): 163103. http://dx.doi.org/10.1063/1.4981937.

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37

Ziegler, Dominik, and Andreas Stemmer. "Force gradient sensitive detection in lift-mode Kelvin probe force microscopy." Nanotechnology 22, no. 7 (January 14, 2011): 075501. http://dx.doi.org/10.1088/0957-4484/22/7/075501.

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38

Shikler, R., and Y. Rosenwaks. "Kelvin probe force microscopy using near-field optical tips." Applied Surface Science 157, no. 4 (April 2000): 256–62. http://dx.doi.org/10.1016/s0169-4332(99)00536-x.

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39

Ono, Shiano, and Takuji Takahashi. "Sample-and-Hold Operation in Kelvin Probe Force Microscopy." Japanese Journal of Applied Physics 44, no. 8 (August 5, 2005): 6213–17. http://dx.doi.org/10.1143/jjap.44.6213.

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40

Tsui, Bing-Yue, Chih-Ming Hsieh, Po-Chih Su, Shien-Der Tzeng, and Shangjr Gwo. "Two-Dimensional Carrier Profiling by Kelvin-Probe Force Microscopy." Japanese Journal of Applied Physics 47, no. 6 (June 13, 2008): 4448–53. http://dx.doi.org/10.1143/jjap.47.4448.

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41

Collins, Liam, Stephen Jesse, Nina Balke, Brian J. Rodriguez, Sergei Kalinin, and Qian Li. "Band excitation Kelvin probe force microscopy utilizing photothermal excitation." Applied Physics Letters 106, no. 10 (March 9, 2015): 104102. http://dx.doi.org/10.1063/1.4913910.

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42

Fernández Garrillo, Pablo A., Benjamin Grévin, Nicolas Chevalier, and Łukasz Borowik. "Calibrated work function mapping by Kelvin probe force microscopy." Review of Scientific Instruments 89, no. 4 (April 2018): 043702. http://dx.doi.org/10.1063/1.5007619.

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43

Fuller, Elliot J., Deng Pan, Brad L. Corso, O. Tolga Gul, Jose R. Gomez, and Philip G. Collins. "Quantitative Kelvin probe force microscopy of current-carrying devices." Applied Physics Letters 102, no. 8 (February 25, 2013): 083503. http://dx.doi.org/10.1063/1.4793480.

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44

Müller, F., and A. D. Müller. "Frequency dependent Kelvin probe force microscopy on silicon surfaces." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 27, no. 2 (2009): 969. http://dx.doi.org/10.1116/1.3039682.

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45

Почтенный, А. Е., А. Н. Лаппо, and И. П. Ильюшонок. "Исследование пленок диметилдиимида перилентетракарбоновой кислоты методами циклической термодесорбции и сканирующей зондовой микроскопии." Физика твердого тела 60, no. 2 (2018): 255. http://dx.doi.org/10.21883/ftt.2018.02.45377.162.

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AbstractSome results of studying the direct-current (DC) conductivity of perylenetetracarboxylic acid dimethylimide films by cyclic oxygen thermal desorption are presented. The microscopic parameters of hopping electron transport over localized impurity and intrinsic states were determined. The bandgap width and the sign of major current carriers were determined by scanning probe microscopy methods (atomic force microscopy, scanning probe spectroscopy, and photoassisted Kelvin probe force microscopy). The possibility of the application of photoassisted scanning tunneling microscopy for the nanoscale phase analysis of photoconductive films is discussed.

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46

Jaafar, Miriam, Oscar Iglesias-Freire, Luis Serrano-Ramón, Manuel Ricardo Ibarra, Jose Maria de Teresa, and Agustina Asenjo. "Distinguishing magnetic and electrostatic interactions by a Kelvin probe force microscopy–magnetic force microscopy combination." Beilstein Journal of Nanotechnology 2 (September 7, 2011): 552–60. http://dx.doi.org/10.3762/bjnano.2.59.

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The most outstanding feature of scanning force microscopy (SFM) is its capability to detect various different short and long range interactions. In particular, magnetic force microscopy (MFM) is used to characterize the domain configuration in ferromagnetic materials such as thin films grown by physical techniques or ferromagnetic nanostructures. It is a usual procedure to separate the topography and the magnetic signal by scanning at a lift distance of 25–50 nm such that the long range tip–sample interactions dominate. Nowadays, MFM is becoming a valuable technique to detect weak magnetic fields arising from low dimensional complex systems such as organic nanomagnets, superparamagnetic nanoparticles, carbon-based materials, etc. In all these cases, the magnetic nanocomponents and the substrate supporting them present quite different electronic behavior, i.e., they exhibit large surface potential differences causing heterogeneous electrostatic interaction between the tip and the sample that could be interpreted as a magnetic interaction. To distinguish clearly the origin of the tip–sample forces we propose to use a combination of Kelvin probe force microscopy (KPFM) and MFM. The KPFM technique allows us to compensate in real time the electrostatic forces between the tip and the sample by minimizing the electrostatic contribution to the frequency shift signal. This is a great challenge in samples with low magnetic moment. In this work we studied an array of Co nanostructures that exhibit high electrostatic interaction with the MFM tip. Thanks to the use of the KPFM/MFM system we were able to separate the electric and magnetic interactions between the tip and the sample.

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47

Zhukov, M. V., F. E. Komissarenko, and A. M. Mozharov. "Kelvin probe force microscopy with high aspect ratio Pt/C nanowhisker probes." Journal of Physics: Conference Series 1135 (December 2018): 012040. http://dx.doi.org/10.1088/1742-6596/1135/1/012040.

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48

Castanon, Elisa G., Alexander Fernández Scarioni, Hans W. Schumacher, Steve Spencer, Richard Perry, James A. Vicary, Charles A. Clifford, and Héctor Corte-León. "Calibrated Kelvin-probe force microscopy of 2D materials using Pt-coated probes." Journal of Physics Communications 4, no. 9 (October 1, 2020): 095025. http://dx.doi.org/10.1088/2399-6528/abb984.

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49

Murawski, J., T. Graupner, P. Milde, R. Raupach, U. Zerweck-Trogisch, and L. M. Eng. "Pump-probe Kelvin-probe force microscopy: Principle of operation and resolution limits." Journal of Applied Physics 118, no. 15 (October 21, 2015): 154302. http://dx.doi.org/10.1063/1.4933289.

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50

Liu, Jun, Kovur Prashanthi, Zhi Li, Ryan T. McGee, Kaveh Ahadi, and Thomas Thundat. "Strain-induced electrostatic enhancements of BiFeO3nanowire loops." Physical Chemistry Chemical Physics 18, no. 33 (2016): 22772–77. http://dx.doi.org/10.1039/c6cp03068h.

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Journal articles on the topic 'Kelvin force probe microscopy'

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