Relevant bibliographies by topics / Lithographic applications

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  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
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Academic literature on the topic 'Lithographic applications'

Author: Grafiati
Published: 9 March 2023
Last updated: 31 July 2025

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Journal articles on the topic "Lithographic applications"

1

Kwon, B., and Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds." Journal of Nanoscience 2016 (June 22, 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.

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Nanoimprint lithography has attracted considerable attention in academic and industrial fields as one of the most prominent lithographic techniques for the fabrication of the nanoscale devices. Effectively controllable shapes of fabricated elements, extremely high resolution, and cost-effectiveness of this especial lithographic system have shown unlimited potential to be utilized for practical applications. In the past decade, many different lithographic techniques have been developed such as electron beam lithography, photolithography, and nanoimprint lithography. Among them, nanoimprint lith
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Researcher. "COMPREHENSIVE ANALYSIS OF NANOSCALE FABRICATION TECHNIQUES FOR SEMICONDUCTOR DEVICES WITH EMPHASIS ON LITHOGRAPHIC INNOVATIONS AND QUANTUM DOT INTEGRATION." International Journal of Semiconductor Science (IJSS) 3, no. 1 (2025): 1–6. https://doi.org/10.5281/zenodo.14753456.

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Nanoscale fabrication is a cornerstone of semiconductor device advancement, enabling the miniaturization and enhanced functionality of modern electronics. This paper provides a comprehensive analysis of nanoscale fabrication techniques, focusing on lithographic innovations and the integration of quantum dots (QDs) as active components. Key lithographic methods, including EUV lithography and nanoimprint lithography, are compared, and the unique properties and applications of quantum dots in semiconductor devices are discussed. A review of recent literature highlights the interplay between advan
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Hruby, Jill. "LIGA Technologies and Applications." MRS Bulletin 26, no. 4 (2001): 337–40. http://dx.doi.org/10.1557/mrs2001.76.

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LIGA, an acronym for the German words for lithography, electroplating, and molding, is a technique used to produce micro-electromechanical systems (MEMS) made from metals, ceramics, or plastics. The LIGA process utilizes x-ray synchrotron radiation as a lithographic light source. Highly collimated, high-energy x-rays from the synchrotron impinge on a patterned mask in proximity to an x-ray-sensitive photoresist, typically poly(methyl methacrylate) (PMMA).
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Stewart, Michael D., and C. Grant Willson. "Imprint Materials for Nanoscale Devices." MRS Bulletin 30, no. 12 (2005): 947–51. http://dx.doi.org/10.1557/mrs2005.248.

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AbstractNanoimprint lithography is a potentially low-cost, high-resolution patterning technique, but most of the surrounding development work has been directed toward tool designs and processing techniques. There remains a tremendous opportunity and need to develop new materials for specific nanoimprint applications. This article provides an overview of relevant materials-related development work for nanoimprint lithographic applications. Material requirements for nanoimprint patterning for the sub-45-nm integrated-circuit regime are discussed, along with proposed nanoimprint applications such
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Finter, J. "Photopolymer Systems for Lithographic Applications." Molecular Crystals and Liquid Crystals Incorporating Nonlinear Optics 161, no. 1 (1988): 231–53. http://dx.doi.org/10.1080/00268948808070251.

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Angelopoulos, Marie. "Lithographic applications of conducting polymers." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 9, no. 6 (1991): 3428. http://dx.doi.org/10.1116/1.585816.

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Schriever, Guido, and Peter Zink. "EUV Sources for Lithographic Applications." Optik & Photonik 3, no. 2 (2008): 40–43. http://dx.doi.org/10.1002/opph.201190189.

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Hatzakis, Michael. "Organosilicon polymers for lithographic applications." Makromolekulare Chemie. Macromolecular Symposia 24, no. 1 (1989): 169–75. http://dx.doi.org/10.1002/masy.19890240117.

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Lauria, John, Ronald Albright, Olga Vladimirsky, et al. "SLM device for 193nm lithographic applications." Microelectronic Engineering 86, no. 4-6 (2009): 569–72. http://dx.doi.org/10.1016/j.mee.2008.11.022.

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Díaz, Diego J., Jamie E. Hudson, Gregory D. Storrier, Héctor D. Abruña, Narayanan Sundararajan, and Christopher K. Ober. "Lithographic Applications of Redox Probe Microscopy." Langmuir 17, no. 19 (2001): 5932–38. http://dx.doi.org/10.1021/la010561j.

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Dissertations / Theses on the topic "Lithographic applications"

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Hadley, Philip. "Aqueous photopolymers for lithographic applications." Thesis, Lancaster University, 1995. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.308991.

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Ceresoli, M. "SYMMETRIC BLOCK COPOLYMERS TEMPLATES FOR NANO-LITHOGRAPHIC APPLICATIONS." Doctoral thesis, Università degli Studi di Milano, 2016. http://hdl.handle.net/2434/422644.

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Nanofabrication has been long characterized by a top-down approach for the definition of small features starting from large pieces of material. In this contest the process of size scaling in microelectronics devices is based on photolithography that is an advanced top-down technology. In order to design integrated circuits with small features with characteristic dimension below 20 nm, a new kind of approach is needed such as the bottom-up one of self-assembly systems. Indeed symmetric block copolymers are able to spontaneously phase separate into ordered nanoscale lamellar pattern, which can b
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Eravuchira, Pinkie Jacob. "Lithographic Micro- and Nanostructuring of SU-8 for Biotechnological Applications." Doctoral thesis, Universitat Rovira i Virgili, 2015. http://hdl.handle.net/10803/292245.

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En aquesta tesi doctoral s’ha dut a terme recerca en mètodes de fabricació d’estructures micromètriques i nanomètriques de SU-8. La recerca ha partit de la base d’una anàlisi dels treballs anteriors en estructuració de SU-8 i ha tingut com a principal objectiu el d’obtenir noves estructures per a aplicació en biotecnologia. Un dels resultats més importants de la recerca ha estat la proposta d’una tècnica híbrida que combina fotolitografia i litografia per pressió per obtenir superfícies de SU-8 amb estructura jerarquitzada. Les investigacions també han portat a proposar un mecanisme d
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Liang, Jianyu. "Non-lithographic fabrication of superlattices for nanometric electro-magnetic-optic applications /." View online version; access limited to Brown University users, 2005. http://wwwlib.umi.com/dissertations/fullcit/3174638.

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Murphy, Julian James. "Lithographic characterisation of a selection of polymeric resists for microlithographic applications." Thesis, University of Kent, 1997. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.244327.

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Gotrik, Kevin Willy. "Flow controlled solvent vapor annealing of block copolymers for lithographic applications." Thesis, Massachusetts Institute of Technology, 2013. http://hdl.handle.net/1721.1/81057.

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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2013.<br>Cataloged from PDF version of thesis.<br>Includes bibliographical references (p. 185-192).<br>Self-assembly of block copolymer thin-films may provide an inexpensive alternative to patterning lithographic features below the resolution limits of traditional optical methods. Block copolymers (BCPs) are polymers made of two or more distinct monomer/block units that are covalently bonded. Due to their differences in surface energy, the different blocks tend to phase segregate like oil and wa
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Alnaimi, Radhwan. "Development of a low-debris laser driven soft X-ray source for lithographic applications." Thesis, Imperial College London, 2016. http://hdl.handle.net/10044/1/61658.

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This work comprehensively describes the design, build and characterisation of a low-debris laser driven soft x-ray source for a variety of applications in particular lithography, in combination with the optimized multilayer structures in order to use the source output as efficiently as possible. The aim of this work was to study the debris emission from different target materials and to minimise or eliminate debris from laser irradiated thin tapes used in multi-shot and long run-time applications. VHS video tape is used as the primary test target in this work and is made of a Mylar (C10H8O4) c
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ANDREOZZI, ANDREA. "Fabrication of nanostructured materials using block copolymer based lithography." Doctoral thesis, Università degli Studi di Milano-Bicocca, 2012. http://hdl.handle.net/10281/28333.

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The main objective of the PhD research activity carried out at MDM Laboratory was the growth and manipulation of nano-objects to be used as building blocks for the fabrication of new generation of nano-transistors, nano-memories and nano-emitters. The first part of the research activity was related to the development of reproducible and controlled protocols for the fabrication of polymeric soft masks for advanced lithographic applications using block copolymers. To this purpose hexagonally packed nanoporous polymeric thin films were fabricated using PS-b-PMMA block copolymers and accurately ch
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Wieberger, Florian [Verfasser], and Hans-Werner [Akademischer Betreuer] Schmidt. "Synthesis and Combinatorial Optimization of Novel Star-Shaped Resist Materials for Lithographic Applications / Florian Wieberger. Betreuer: Hans-Werner Schmidt." Bayreuth : Universität Bayreuth, 2012. http://d-nb.info/1059412489/34.

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Tu, Fan [Verfasser], and Hubertus [Gutachter] Marbach. "On the Lithographic Fabrication of Fe and Co Nanostructures via Focused Electron/Photon Beam Induced Processing: Properties and Applications of the Structures / Fan Tu ; Gutachter: Hubertus Marbach." Erlangen : Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), 2017. http://d-nb.info/1150964308/34.

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Books on the topic "Lithographic applications"

1

E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. SPIE, 1997.

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Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. SPIE, 2000.

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L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. SPIE, 2003.

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1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. SPIE, 2007.

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Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. SPIE, 2001.

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Fontaine, Bruno M. La, and F. M. Schellenberg. Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States. Edited by SPIE (Society) and International SEMATECH. SPIE, 2009.

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Herr, Daniel J. C. Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States. Edited by SPIE (Society) and SEMATECH (Organization). SPIE, 2010.

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Resnick, Douglas J., and William Man-Wai Tong. Alternative lithographic technologies IV: 13-16 February 2012, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2012.

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Herr, Daniel J. C. Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2011.

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Lin, Burn Jeng. Optical lithography: Here is why. SPIE, 2009.

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Book chapters on the topic "Lithographic applications"

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McCarley, Robin L., Melani G. Sullivan, Stanton Ching, Yining Zhang, and Royce W. Murray. "Lithographic and Related Microelectrode Fabrication Techniques." In Microelectrodes: Theory and Applications. Springer Netherlands, 1991. http://dx.doi.org/10.1007/978-94-011-3210-7_12.

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Cheng, Alison Y., Scott B. Clendenning, and Ian Manners. "Lithographic Applications of Highly Metallized Polyferrocenylsilanes." In Macromolecules Containing Metal and Metal-Like Elements. John Wiley & Sons, Inc., 2005. http://dx.doi.org/10.1002/0471747319.ch2.

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HIRAOKA, H. "Functionally Substituted Novolak Resins: Lithographic Applications, Radiation Chemistry, and Photooxidation." In ACS Symposium Series. American Chemical Society, 1985. http://dx.doi.org/10.1021/bk-1984-0266.ch017.

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Castronovo, Matteo, and Denis Scaini. "The Atomic Force Microscopy as a Lithographic Tool: Nanografting of DNA Nanostructures for Biosensing Applications." In DNA Nanotechnology. Humana Press, 2011. http://dx.doi.org/10.1007/978-1-61779-142-0_15.

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Montelius, Lars, and Babak Heidari. "Biotechnology Applications of NIL." In Alternative Lithography. Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8_16.

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Seekamp, J. "Optical Applications of Nanoimprint Lithography." In Alternative Lithography. Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8_15.

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Otuka, Adriano J. G., Vinicius Tribuzi, Daniel S. Correa, and Cleber R. Mendonça. "Three-Dimensional Microstructures for Biological Applications." In Multiphoton Lithography. Wiley-VCH Verlag GmbH & Co. KGaA, 2016. http://dx.doi.org/10.1002/9783527682676.ch14.

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Chen, Y., M. Natali, S. P. Li, and A. Lebib. "Application of Nanoimprint Lithography in Magnetism." In Alternative Lithography. Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8_13.

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Schmidt, Georg, Tatjana Borzenko, Massimo Tormen, Volkmar Hock, and Laurens W. Molenkamp. "Application of Microcontact Printing and Nanoimprint Lithography." In Alternative Lithography. Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8_14.

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Schumm, Benjamin, and Stefan Kaskel. "Nanoimprint Lithography for Photovoltaic Applications." In Solar Cell Nanotechnology. John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118845721.ch7.

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Conference papers on the topic "Lithographic applications"

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Tirelli, S., E. Corti, E. Duda, et al. "Lithographic Aperture VCSELs Enabling Beyond 100G Datacom Applications." In Optical Fiber Communication Conference. Optica Publishing Group, 2024. http://dx.doi.org/10.1364/ofc.2024.m2d.1.

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This paper reports the first demonstration of lithographic aperture VCSELs with bandwidth above 29 GHz. Large-signal measurements and preliminary lifetime data are reported, putting forward lithographic aperture as an enabling technology for applications beyond 100G.
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Woo Lee, Hong Jin Fan, Marin Alexe, et al. "Metal nanotube membranes and their lithographic applications." In 2006 IEEE Nanotechnology Materials and Devices Conference. IEEE, 2006. http://dx.doi.org/10.1109/nmdc.2006.4388876.

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Zhu, Hongwei, Tingwen Xing, and Zexiang Chen. "Dynamic compensation for the lithographic object lens." In SPIE Optical Engineering + Applications, edited by José Sasián and Richard N. Youngworth. SPIE, 2014. http://dx.doi.org/10.1117/12.2060302.

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Li, M., X. Yang, N. Cox, J. Beadsworth, and D. Deppe. "Record Low Differential Resistance Using Lithographic VCSELs." In CLEO: Applications and Technology. OSA, 2016. http://dx.doi.org/10.1364/cleo_at.2016.jth2a.49.

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Wang, Tianji, Yaotang Li, Shining Yang, Shaowu Fan, Shichao Zhang, and Huanrong Wen. "Fractal in laser lithographic digital hologram." In 1998 International Conference on Applications of Photonic Technology, edited by George A. Lampropoulos and Roger A. Lessard. SPIE, 1998. http://dx.doi.org/10.1117/12.328694.

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Oinuma, Ryoji, and Frederick Best. "Evaporative modeling for idealized lithographic pores." In SPACE TECHNOLOGY AND APPLICATIONS INTERNATIONAL FORUM- STAIF 2002. AIP, 2002. http://dx.doi.org/10.1063/1.1449704.

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Xu, Shuang, Gongfa Li, Bo Tao, and Yongxing Guo. "Polarization aberration measurement of lithographic tools." In Optical Metrology and Inspection for Industrial Applications V, edited by Sen Han, Toru Yoshizawa, and Song Zhang. SPIE, 2018. http://dx.doi.org/10.1117/12.2500778.

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Yasar, Ozlem, Michael Dinh, Shih-Feng Lan, and Binil Starly. "Fabrication of Micropatterned Hydrogels Using Maskless Photopolymerization for Tissue Engineering Applications." In ASME 2008 Summer Bioengineering Conference. American Society of Mechanical Engineers, 2008. http://dx.doi.org/10.1115/sbc2008-192377.

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The fabrication of tissue scaffolds/constructs has seen tremendous advancements over the past decade primarily due to the application of layered manufacturing based technologies from the rapid prototyping industry. Molding, printing and deposition technologies have enabled researchers to spatially control scaffold micro and macro structural features through the use of soft lithography solid freeform fabrication. These techniques have produced patterned scaffolds with desired mechanical and biological properties to mimic the natural tissue microenvironment. Soft lithographic techniques have pro
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Rea, Edward C., Andrea Caprara, Colin Seaton, and Yefim Kil. "198-nm cw laser source for lithographic applications." In ICALEO® 2003: 22nd International Congress on Laser Materials Processing and Laser Microfabrication. Laser Institute of America, 2003. http://dx.doi.org/10.2351/1.5060137.

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Zeitner, Uwe D., Tina Weichelt, Yannick Bourgin, and Robert Kinder. "Alternative high-resolution lithographic technologies for optical applications." In SPIE Advanced Lithography, edited by Andreas Erdmann and Jongwook Kye. SPIE, 2016. http://dx.doi.org/10.1117/12.2222028.

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Reports on the topic "Lithographic applications"

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Kuang, Ping. A new architecture as transparent electrodes for solar and IR applications based on photonic structures via soft lithography. Office of Scientific and Technical Information (OSTI), 2011. http://dx.doi.org/10.2172/1029554.

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