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Books on the topic 'Lithographic applications'

Author: Grafiati
Published: 9 March 2023
Last updated: 31 July 2025

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1

E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. SPIE, 1997.

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2

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. SPIE, 2000.

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3

L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. SPIE, 2003.

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4

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. SPIE, 2007.

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5

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. SPIE, 2001.

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6

Fontaine, Bruno M. La, and F. M. Schellenberg. Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States. Edited by SPIE (Society) and International SEMATECH. SPIE, 2009.

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7

Herr, Daniel J. C. Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States. Edited by SPIE (Society) and SEMATECH (Organization). SPIE, 2010.

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8

Resnick, Douglas J., and William Man-Wai Tong. Alternative lithographic technologies IV: 13-16 February 2012, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2012.

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9

Herr, Daniel J. C. Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2011.

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10

Lin, Burn Jeng. Optical lithography: Here is why. SPIE, 2009.

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11

Lin, Burn Jeng. Optical lithography: Here is why. SPIE, 2009.

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12

Okoroanyanwu, Uzodinma. Molecular theory of lithography. SPIE, 2015.

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13

Mack, Chris A. Principles of optical lithography: The science of microfabrication. Wiley, 2007.

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14

America, Optical Society of, ed. Extreme ultraviolet lithography: Summaries of papers presented at the topical meeting, Extreme Ultraviolet Lithography, September 19-21, 1994, Monterey, California. The Society, 1994.

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15

(1989), Ernst-Abbe Colloquium Jena. Proceedings. Friedrich-Schiller-Universität Jena, 1989.

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16

Filatov, D. O. Two-dimensional periodic nanoscale patterning of solid surfaces by four-beam standing wave excimer laser lithography. Nova Science Pub. Inc., 2010.

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17

International Workshop on X-ray and Extreme Ultraviolet Lithography (1997 Yokohama, Japan). Digest of papers, XEL '1997: 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, July 13-15, 1997, Pacifico Yokohama, Yokohama. Japan Society for the Promotion of Sciences?, 1997.

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18

A, Tseng A., ed. Nanofabrication: Fundamentals and applications. World Scientific, 2008.

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19

A, Tseng A., ed. Nanofabrication: Fundamentals and applications. World Scientific, 2008.

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20

Yen, Anthony, Alek C. Chen, and Burn Lin. Lithography Asia 2008: 4-6 November 2008, Taipei, Taiwan. Edited by SPIE (Society) and Taiwan Semiconductor Industry Association. SPIE, 2008.

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21

D, Kubiak Glenn, Kania Don R, and Optical Society of America, eds. Extreme ultraviolet lithography: From the topical meeting, May 1-3, 1996, Boston, Massachusetts. The Society, 1996.

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22

Fontaine, Bruno M. La. Extreme ultraviolet (EUV) lithography: 22-25 February 2010, San Jose, California, United States. SPIE, 2010.

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23

Fontaine, Bruno M. La, and Patrick P. Naulleau. Extreme ultraviolet (EUV) lithography II: 28 February-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2011.

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24

1930-, Zernike Frits, Attwood David T, and Optical Society of America, eds. OSA proceedings on extreme ultraviolet lithography: Proceedings of the topical meeting, September 19-21, 1994, Monterey, California. The Society, 1995.

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25

Arrowsmith, David John. Electrolytic processes on surfaces: Contributions to electrolytic polishing, anodizing, adhesion, colar, lithography and electronic applications. Aston University. Department of Mechanical and Production Engineering, 1988.

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26

Mancini, Derrick C. Synchrotron radiation technology: Spectroscopic studies of its application to lithography and deposition, and the evaluation, modeling, and design of beamline instrumentation. Acta Universitatis Upsaliensis, 1994.

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27

M, Khounsary Ali, Dinger Udo, Ota Kazuya, and Society of Photo-optical Instrumentation Engineers., eds. Advances in mirror technology for X-ray, EUV lithography, laser and other applications II: 5 August, 2004, Denver, Colorado, USA. SPIE, 2004.

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28

M, Khounsary Ali, Dinger Udo, Ota Kazuya, and Society of Photo-optical Instrumentation Engineers., eds. Advances in mirror technology for X-ray, EUV lithography, laser and other applications: 7-8 August 2003, San Diego, California, USA. SPIE, 2004.

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29

Kazuaki, Suzuki, and Smith Bruce W. 1959-, eds. Microlithography: Science and technology. 2nd ed. CRC Press, 2007.

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30

Mackay, R. Scott. Emerging Lithographic Technologies 9. SPIE-International Society for Optical Engine, 2005.

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31

Trybula, Walt, and Ampere A. Tseng. Emerging Lithographic Technologies for Nanopatterning. Taylor & Francis Group, 2010.

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32

Trybula, Walt, and Ampere A. Tseng. Emerging Lithographic Technologies for Nanopatterning. Taylor & Francis Group, 2010.

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33

(Editor), Ampere A. Tseng, and Walt Trybula (Editor), eds. Emerging Lithographic Technologies for Nanopatterning. CRC, 2008.

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34

Schellenberg, Frank. Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. SPIE, 2008.

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35

Development of a low-debris laser driven soft x-ray source for lithographic applications. Imperial College London, 2016.

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36

Development of a low-debris laser driven soft x-ray source for lithographic applications. Imperial College London, 2016.

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37

Bakshi, Vivek. EUV Lithography. Wiley & Sons, Incorporated, John, 2008.

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38

EUV lithography. SPIE, 2007.

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39

Euv Lithography. Society of Photo Optical, 2018.

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40

Mühlberger, Michael, ed. Nanoimprint Lithography Technology and Applications. MDPI, 2022. http://dx.doi.org/10.3390/books978-3-0365-4481-6.

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41

Bardea, Amos. Magneto-Lithography: Foundations and Applications. Wiley & Sons, Limited, John, 2014.

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42

Papadopoulos, Christo. Nanofabrication: Principles and Applications. Springer London, Limited, 2016.

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43

Bakshi, Vivek. EUV Sources for Lithography. SPIE, 2006.

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44

EUV sources for lithography. SPIE Press, 2006.

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45

Miyauchi, Akihiro. Nanoimprinting and Its Applications. Jenny Stanford Publishing, 2019.

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46

Miyauchi, Akihiro. Nanoimprinting and Its Applications. Jenny Stanford Publishing, 2019.

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47

Liska, Robert, Aleksandr Ovsianikov, and Jürgen Stampfl. Multiphoton Lithography: Techniques, Materials and Applications. Wiley-VCH Verlag GmbH, 2016.

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48

Liska, Robert, Aleksandr Ovsianikov, and J�rgen Stampfl. Multiphoton Lithography: Techniques, Materials, and Applications. Wiley & Sons, Incorporated, John, 2016.

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49

Liska, Robert, Aleksandr Ovsianikov, and J�rgen Stampfl. Multiphoton Lithography: Techniques, Materials, and Applications. Wiley & Sons, Incorporated, John, 2016.

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50

Liska, Robert, Aleksandr Ovsianikov, and J�rgen Stampfl. Multiphoton Lithography: Techniques, Materials, and Applications. Wiley & Sons, Incorporated, John, 2016.

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