Relevant bibliographies by topics / Lithography

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Lithography'

Author: Grafiati
Published: 4 June 2021
Last updated: 25 July 2025

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Journal articles on the topic "Lithography"

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Vandаlovskyi, V. "Artistic and technical features of the lithographic manner mixed technique." Research and methodological works of the National Academy of Visual Arts and Architecture, no. 27 (February 27, 2019): 92–98. http://dx.doi.org/10.33838/naoma.27.2018.92-98.

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Nowadays the problem of improving the artistic and technical features of the lithographic manner of mixed technique has matured already. The author of this study expanded and supplemented the ways of combining a variety of manners of lithographic techniques through practical experiments to achieve positive results in this area. Mixed technique is one of the types of lithography, in which a certain combination of lithographic manners engraving on stone with pencil, blurring ink, root paper, color lithography is used on one stone depending on the intent of the author, his artistic taste and poss
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Basu, Prithvi, Jyoti Verma, Vishnuram Abhinav, Ratneshwar Kumar Ratnesh, Yogesh Kumar Singla, and Vibhor Kumar. "Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication." International Journal of Molecular Sciences 26, no. 7 (2025): 3027. https://doi.org/10.3390/ijms26073027.

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Lithography is crucial to semiconductor manufacturing, enabling the production of smaller, more powerful electronic devices. This review explores the evolution, principles, and advancements of key lithography techniques, including extreme ultraviolet (EUV) lithography, electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL), and nanoimprint lithography (NIL). Each method is analyzed based on its working principles, resolution, resist materials, and applications. EUV lithography, with sub-10 nm resolution, is vital for extending Moore’s Law, leveraging high-NA optic
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Kwon, B., and Jong H. Kim. "Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds." Journal of Nanoscience 2016 (June 22, 2016): 1–12. http://dx.doi.org/10.1155/2016/6571297.

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Nanoimprint lithography has attracted considerable attention in academic and industrial fields as one of the most prominent lithographic techniques for the fabrication of the nanoscale devices. Effectively controllable shapes of fabricated elements, extremely high resolution, and cost-effectiveness of this especial lithographic system have shown unlimited potential to be utilized for practical applications. In the past decade, many different lithographic techniques have been developed such as electron beam lithography, photolithography, and nanoimprint lithography. Among them, nanoimprint lith
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Wen, Zaoxia, Xingyu Liu, Wenxiu Chen, et al. "Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems." Polymers 16, no. 6 (2024): 846. http://dx.doi.org/10.3390/polym16060846.

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This paper offers a comprehensive overview of the polyhedral oligomeric silsesquioxane (POSS) and POSS-based composites within the realm of photoresist resin. The study involves a systematic exploration and discussion of the contributions made by POSS across various lithographic systems, with specific emphasis on critical parameters such as film formation, sensitivity, resolution, solubility, and edge roughness. These lithographic systems encompass X-ray lithography (XRL), deep ultraviolet nanoimprint lithography (DUV-NIL), extreme ultraviolet lithography (EUV), and guided self-assembled litho
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Lund, Sarah E. "Fossils: Lithography’s Porous Time and Eugène Delacroix’s Faust Marginalia." Nineteenth Century Studies 35 (November 2023): 1–32. http://dx.doi.org/10.5325/ninecentstud.35.0001.

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Abstract The new printing technique of lithography, which flourished in the early nineteenth century, has been examined for its connections to Romantic ideals of artistic subjectivity, to the liberal press, and to a boom in visual media. This article centers lithography’s unique materiality to investigate the significance of its new technique—its use of limestone—that establishes compelling connections to natural history and new conceptions of time. Eugène Delacroix’s (1798–1863) unruly marginalia, which populate the borders of the first printer’s proofs of his 1828 lithographic illustrations
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Prakoso, Emmanuel Putro, Inovensius Hugo Bima Wicaksana, Nick Soedarso, and Rina Carina. "TEKNIK CETAK DATAR KITCHEN LITHOGRAPY SEBAGAI MEDIA EKSPRESI DESAIN PADA METODE REPRODUKSI GRAFIKA." Jurnal Dimensi DKV Seni Rupa dan Desain 4, no. 2 (2019): 155. http://dx.doi.org/10.25105/jdd.v4i2.5888.

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<p>Abstract</p><p><br />The Kitchen Lithography Flat Printing Technique as Design Expression Media on Graphic Reproduction Method. The lack of media innovation in lithography flat printing techniques has resulted in the process being identical to the use of limestone stones as a reference for images, while the existence of these stones is quite difficult to obtainand quite rare in Indonesia. This has resulted in fewer and fewer artists and designers<br />who are using the lithography technique in the design world. The use of aluminum foilpaper which can be reacted
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Researcher. "COMPREHENSIVE ANALYSIS OF NANOSCALE FABRICATION TECHNIQUES FOR SEMICONDUCTOR DEVICES WITH EMPHASIS ON LITHOGRAPHIC INNOVATIONS AND QUANTUM DOT INTEGRATION." International Journal of Semiconductor Science (IJSS) 3, no. 1 (2025): 1–6. https://doi.org/10.5281/zenodo.14753456.

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Nanoscale fabrication is a cornerstone of semiconductor device advancement, enabling the miniaturization and enhanced functionality of modern electronics. This paper provides a comprehensive analysis of nanoscale fabrication techniques, focusing on lithographic innovations and the integration of quantum dots (QDs) as active components. Key lithographic methods, including EUV lithography and nanoimprint lithography, are compared, and the unique properties and applications of quantum dots in semiconductor devices are discussed. A review of recent literature highlights the interplay between advan
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Wu, Yu, and Zihao Xiao. "The Recent Progress of Lithography Machine and the State-of-art Facilities." Highlights in Science, Engineering and Technology 5 (July 7, 2022): 155–65. http://dx.doi.org/10.54097/hset.v5i.737.

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With the rapid development of industrial intelligent manufacturing and electronic information technology, the importance of integrated circuits has grown fast. Photolithography, as the core technology of integrated circuit industry, has become a key research target for researchers all over the world. In this paper, we provide a brief introduction to photolithography as well as an outlook on the future development direction. Firstly, the key metric of lithography system, which is resolution, and how it relates to lithographic performance is analyzed. Secondly, some exposure methods developed on
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Voznyuk G. V., Grigorenko I. N., Mitrofanov M. I., Nikolaev V. V., and Evtikhiev V. P. "Subwave textured surfaces for the radiation coupling from the waveguide." Technical Physics Letters 48, no. 3 (2022): 76. http://dx.doi.org/10.21883/tpl.2022.03.52896.19103.

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The paper presents a procedure for creating on GaAs(100) substrates textured surfaces by ion-beam etching with a focused beam. The possibility of flexibly controlling the shape and profile of the formed submicron elements of textured media is shown; this will later allow formation of textured surfaces of almost any complexity for realizing the surface radiation coupling from the waveguide. Original lithographic masks were developed, and 3D lithography was accomplished. The obtained lithographic patterns were controlled by the methods of optical, electron and atomic force microscopy. Keywords:
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Sharma, Ekta, Reena Rathi, Jaya Misharwal, et al. "Evolution in Lithography Techniques: Microlithography to Nanolithography." Nanomaterials 12, no. 16 (2022): 2754. http://dx.doi.org/10.3390/nano12162754.

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In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily. Different types of temperature sensors, biosensors, photosensors, etc., have been developed to meet the necessities of people. All these devices have chips inside them fabricated using diodes, transistors, logic gates, and ICs. The patterning of the substrate which is used for the further development of these devices is done with the help of a technique known as lithography. In the prese
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Dissertations / Theses on the topic "Lithography"

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Benoit-Renault, Viviane. "La lithographie en Bretagne (1819-1914)." Thesis, Paris 4, 2014. http://www.theses.fr/2014PA040217.

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Dans l’histoire de l’estampe, l’étude de la lithographie en province a longtemps été négligée et les premierstravaux fondateurs datent seulement d’une quarantaine d’années. L’objet de cette thèse en histoire de l’art est decombler cette lacune en analysant, dans un esprit d’interdisciplinarité ouvert à l’histoire économique et sociale, lalithographie en Bretagne historique de 1819 à 1914.Cette recherche s’appuie d’abord sur l’étude de l’imprimerie lithographique. Après un panorama généralsur l’évolution du nombre d’ateliers et leur répartition géographique, les centres lithographiques principa
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Hauser, Hubert [Verfasser], and Holger [Akademischer Betreuer] Reinecke. "Nanoimprint lithography for solar cell texturisation = Nanoimprint Lithographie fuer die Solarzellentexturierung." Freiburg : Universität, 2013. http://d-nb.info/1123476160/34.

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Zheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics." Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.

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Kandulski, Witold. "Shadow nanosphere lithography." [S.l.] : [s.n.], 2007. http://deposit.ddb.de/cgi-bin/dokserv?idn=985533013.

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Musgraves, J. David. "Maskless Projection Lithography." Scholarship @ Claremont, 2003. http://scholarship.claremont.edu/pomona_theses/17.

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Photolithography is a key element of the modem integrated circuit process. It is photolithography, combined with metal deposition, that allows a three dimensional circuit to be built up on a two dimensional surface. Since it is such an important part of the semiconductor manufacturing industry, a massive base of research in this area already exists. The problem with this pre-existing research is that it is geared solely toward industrial purposes, as opposed to more academic research areas. The goal of my research is to move this industrial process into the academic setting of Pomom Coll
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Schmidt, Aaron Jerome 1979. "Contact thermal lithography." Thesis, Massachusetts Institute of Technology, 2004. http://hdl.handle.net/1721.1/27116.

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Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2004.<br>Includes bibliographical references (p. 65-67).<br>Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used in the exposure process, thermal lithography is limited by a thermal diffusion length scale and the geometry of the situation. In this thesis the basic principles of thermal lithography are presented. A traditional chrome-glass photo
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Brodsky, Colin John. "Graft polymerization lithography." Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3024998.

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Baker, Mark. "Metastable Atom Lithography." Thesis, Griffith University, 2008. http://hdl.handle.net/10072/365477.

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This thesis describes the development of a rare gas metastable atomic beam apparatus, and its application to atom lithography. The principal component of the apparatus is the supersonic DC discharge source. The source parameters, such as operating pressure, skimmer distance, discharge current and nozzle shape were optimised to generate a bright beam of excited state metastable neon and argon, with typical flux of 5×10¹? atoms sr?¹ and 3×10¹? atoms sr?¹ respectively. This apparatus was used to investigate the pattern formation of self assembled monolayer (SAM) resists prepared on Au/Si samples
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Park, Jea Woo. "Lithography Hotspot Detection." PDXScholar, 2017. https://pdxscholar.library.pdx.edu/open_access_etds/3781.

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The lithography process for chip manufacturing has been playing a critical role in keeping Moor's law alive. Even though the wavelength used for the process is bigger than actual device feature size, which makes it difficult to transfer layout patterns from the mask to wafer, lithographers have developed a various technique such as Resolution Enhancement Techniques (RETs), Multi-patterning, and Optical Proximity Correction (OPC) to overcome the sub-wavelength lithography gap. However, as feature size in chip design scales down further to a point where manufacturing constraints must be applied
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Meyers, Bernard C. "Nagual interpretations /." Online version of thesis, 1990. http://hdl.handle.net/1850/10953.

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Books on the topic "Lithography"

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Landis, Stefan, ed. Lithography. John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118557662.

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Shappo, Aleksandr. Lithography. Shappo.org, 2016.

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Brighton, University Of. Lithography. University of Brighton, 1993.

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Sotomayor Torres, Clivia M., ed. Alternative Lithography. Springer US, 2003. http://dx.doi.org/10.1007/978-1-4419-9204-8.

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Stampfl, Jürgen, Robert Liska, and Aleksandr Ovsianikov, eds. Multiphoton Lithography. Wiley-VCH Verlag GmbH & Co. KGaA, 2016. http://dx.doi.org/10.1002/9783527682676.

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Ma, Xu, and Gonzalo R. Arce. Computational Lithography. John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470618943.

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Moreau, Wayne M. Semiconductor Lithography. Springer US, 1988. http://dx.doi.org/10.1007/978-1-4613-0885-0.

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Ozel, Tuncay. Coaxial Lithography. Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-45414-6.

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Landis, Stefan, ed. Nano-Lithography. John Wiley & Sons, Inc., 2013. http://dx.doi.org/10.1002/9781118622582.

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R, Arce Gonzalo, ed. Computational lithography. Wiley, 2010.

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Book chapters on the topic "Lithography"

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Anner, George E. "Lithography." In Planar Processing Primer. Springer Netherlands, 1990. http://dx.doi.org/10.1007/978-94-009-0441-5_11.

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Veendrick, Harry. "Lithography." In Bits on Chips. Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-319-76096-4_9.

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Kim, Dae-Eun, and In-Ha Sung. "Lithography." In Encyclopedia of Tribology. Springer US, 2013. http://dx.doi.org/10.1007/978-0-387-92897-5_1051.

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El-Kareh, Badih. "Lithography." In Fundamentals of Semiconductor Processing Technology. Springer US, 1995. http://dx.doi.org/10.1007/978-1-4615-2209-6_4.

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Morita, Hiroshi. "Lithography." In Computer Simulation of Polymeric Materials. Springer Singapore, 2016. http://dx.doi.org/10.1007/978-981-10-0815-3_29.

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Widmann, Dietrich, Hermann Mader, Hans Friedrich, Walter Heywang, and Rudolf Müller. "Lithography." In Technology of Integrated Circuits. Springer Berlin Heidelberg, 2000. http://dx.doi.org/10.1007/978-3-662-04160-4_4.

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Gooch, Jan W. "Lithography." In Encyclopedic Dictionary of Polymers. Springer New York, 2011. http://dx.doi.org/10.1007/978-1-4419-6247-8_6976.

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Sarangan, Andrew. "Lithography." In Nanofabrication. CRC Press, 2016. http://dx.doi.org/10.1201/9781315370514-6.

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Hilleringmann, Ulrich. "Lithography." In Silicon Semiconductor Technology. Springer Fachmedien Wiesbaden, 2023. http://dx.doi.org/10.1007/978-3-658-41041-4_4.

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Gatzen, Hans H., Volker Saile, and Jürg Leuthold. "Lithography." In Micro and Nano Fabrication. Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-662-44395-8_6.

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Conference papers on the topic "Lithography"

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Vallee, Christophe, Nicolas Pinos Maldonado, R. Robert, et al. "ASD from lithography replacement to lithography enhancement." In Advanced Etch Technology and Process Integration for Nanopatterning XIV, edited by Efrain Altamirano-Sánchez and Nihar Mohanty. SPIE, 2025. https://doi.org/10.1117/12.3056724.

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Tsai, Chi-Ming, Thomas L. Laidig, and Jang Fung Chen. "Digital lithography." In Optical and EUV Nanolithography XXXVIII, edited by Martin Burkhardt and Claire van Lare. SPIE, 2025. https://doi.org/10.1117/12.3046576.

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Lum, Bernice M., Andrew R. Neureuther, and Glenn D. Kubiak. "Modeling Soft X-Ray Projection Lithography." In Soft X-Ray Projection Lithography. Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.10.

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Resist models to support resist line-edge profile simulation are being developed for soft x-ray projection lithography. Models for resist expos니re, post-exposure bake kinetics, and dissolution surface etching as well as exposure tool imaging are key to balancing tradeoffs between lithographic materials and exposure systems. The SAMPLE lithography simulation program is well suited for supporting the development of this new soft x- ray projection lithography technology once the materials and imaging models are extended.
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Voelkel, Reinhard, Uwe Vogler, Arianna Bramati, et al. "Lithographic process window optimization for mask aligner proximity lithography." In SPIE Advanced Lithography, edited by Kafai Lai and Andreas Erdmann. SPIE, 2014. http://dx.doi.org/10.1117/12.2046332.

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McCallum, Martin. "Some lithographic limits of back end lithography." In Microelectronic and MEMS Technologies, edited by Chris A. Mack and Tom Stevenson. SPIE, 2001. http://dx.doi.org/10.1117/12.425217.

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Sasian, Jose M. "New developments in the design of ring field projection cameras for EUV lithography." In International Optical Design Conference. Optica Publishing Group, 1998. http://dx.doi.org/10.1364/iodc.1998.lthd.1.

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One important approach toward producing 0.1 micrometer lithographic features is EUV lithography. This technology requires ring-field reflective projection cameras to produce well corrected aerial images over a 1 x 26 mm arc field. Since the creation and application of the concept of ring field for lithographic systems little more has been published about the characteristics of such systems and their interesting attributes. The effects of smile vignetting, optical surface description choice, and quasi-ring field symmetry are examples that deserve a broader discussion. The presentation will addr
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Hawryluk, A. M., D. R. Kania, P. Celliers, et al. "EUV Reticle Pattern Repair Experiments using 10 KeV Neon Ions." In Extreme Ultraviolet Lithography. Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.rmm.204.

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Any potential lithography must demonstrate an industrially-compatable reticle pattern repair process before the lithographic process can be seriously considered for production. Repair of clear defects on EUV reticles (i.e., regions on the mask which are reflective and should be non-reflective) requires the deposition of a thin layer of absorbing material. This process has been demonstrated in commercially available tools which were originally developed to repair proximity-print x-ray lithography masks. However, the repair of opaque defects (i.e., the recovery of reflectivity from regions on th
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Trucano, Timothy G., Dennis E. Grady, Richard E. Olson, and Archie Farnsworth. "Computational Analysis of Debris Formation in SXPL Laser-Plasma Sources." In Soft X-Ray Projection Lithography. Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tud.12.

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Laser generated extreme ultraviolet sources applicable to soft x-ray projection lithography (SXPL) are undermined by target debris formation. This debris, in the form of vapor and condensed ejecta, can coat and damage the optical systems that direct and focus the emitted radiation for the lithographic application [1]. The purpose of this paper is to present ongoing work to develop a computational methodology for understanding and predicting the debris formation process in these laser sources.
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Sweatt, William C. "High Efficiency Condenser Design for Illuminating a Ring Field." In Soft X-Ray Projection Lithography. Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.mb.5.

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This condenser couples a small, incoherent source into the 60° ring-field of a camera designed for projection lithography. Quasi-Köhler illumination uniformly illuminates the whole field and a degree of partial coherence is achieved (σ≈0.8). This design was conceived with a soft-X-ray laser-plasma source in mind; hence, it is all reflective. However, it would also be suitable for any other lithographic system employing a small, bright source.
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Hawryluk, Andrew M. "Reflection Masks for Soft X-Ray Projection Lithography." In Soft X-Ray Projection Lithography. Optica Publishing Group, 1991. http://dx.doi.org/10.1364/sxray.1991.fc2.

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Soft X-ray projection lithography (SXPL) may be used to fabricate high resolution structures for future integrated circuit devices but will require an al1-reflecting optical system with &lt; 100 nm resolution and &lt; 10 nm image distortion over large fields-of-view. In conventional designs, the lithographic, tool for SXPL is envisioned as a "ring-field" scanning system with multiple (3-5), possibly aspheric, imaging optics fabricated to ~&lt;1 nm figure precisian. Conventional system designs will use a reflection mask.
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Reports on the topic "Lithography"

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Park, Jea. Lithography Hotspot Detection. Portland State University Library, 2000. http://dx.doi.org/10.15760/etd.5665.

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Lewis, Aaron. Wavelength Independent Optical Lithography. Defense Technical Information Center, 1986. http://dx.doi.org/10.21236/ada171935.

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Ji, Qing. Maskless, resistless ion beam lithography. Office of Scientific and Technical Information (OSTI), 2003. http://dx.doi.org/10.2172/809301.

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Zotter, Beth. Holographic Lithography for Industrial Nanomanufacturing. Office of Scientific and Technical Information (OSTI), 2020. http://dx.doi.org/10.2172/1614764.

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Browning, R., and R. F. Pease. Low Voltage Electron Beam Lithography. Defense Technical Information Center, 1994. http://dx.doi.org/10.21236/ada281046.

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NAVAL RESEARCH LAB WASHINGTON DC. Low Voltage Electron Beam Lithography. Defense Technical Information Center, 1995. http://dx.doi.org/10.21236/ada293396.

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Liu, Weidong. Low Voltage Electron Beam Lithography. Defense Technical Information Center, 1995. http://dx.doi.org/10.21236/ada296625.

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Browning, R., and R. F. Pease. Low Voltage Electron Beam Lithography. Defense Technical Information Center, 1992. http://dx.doi.org/10.21236/ada263360.

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Browning, R., and R. F. Pease. Low Voltage Electron Beam Lithography. Defense Technical Information Center, 1993. http://dx.doi.org/10.21236/ada265358.

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Cramer, Corson, Alicia Raftery, and Andrew Nelson. Lithography-based Ceramics Manufacturing Technologies. Office of Scientific and Technical Information (OSTI), 2019. http://dx.doi.org/10.2172/1659632.

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