Books on the topic 'Lithography, Electron beam'
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Hahmann, Peter. Electron-beam lithography contributions from Jena. Verlag Vopelius, 2014.
Gu, Wenqi. Dian zi shu bao guang wei na jia gong ji shu. Beijing gong ye da xue chu ban she, 2004.
International Symposium on Electron, Ion, and Photon Beams (2nd 1984 Tarrytown, N.Y.). Proceedings of the 1984 International Symposium on Electron, Ion, and Photon Beams, 29 May-1 June, 1984, Westchester Marriott Hotel, Tarrytown, New York. Edited by Kelly J, American Vacuum Society, and American Institute of Physics. Published for the American Vacuum Society by the American Institute of Physics, 1985.
Popov, V. K. Raschet i proektirovanie ustroĭstv ėlektronnoĭ i ionnoĭ litografii. "Radio i svi͡a︡zʹ", 1985.
D, Blais Phillip, and International Society for Hybrid Microelectronics., eds. Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V: 11-12 March, 1986, Santa Clara, California. SPIE--the International Society for Optical Engineering, 1986.
J, Resnick Douglas, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam technology: Submicrometer lithographies IX : 7-8 March 1990, San Jose, California. SPIE--the International Society for Optical Engineering, 1990.
International Symposium on Nanometer Structure Electronics (1984 Toyonaka, Osaka University). Nanometer structure electronics: An investigation of the future of micro-electronics : proceedings of the International Symposium on Nanometer Structure Electronics, April 16-18, 1984 Osaka University, Toyonaka, Japan. Ohm, 1985.
K, Marrian Christie R., ed. Technology of proximal probe lithography. SPIE Optical Engineering Press, 1993.
1946-, Peckerar Martin Charles, and Society of Photo-optical Instrumentation Engineers., eds. Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing: 6-7 March 1991, San Jose, California. SPIE, 1991.
D, Blais Phillip, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V: 11-12 March 1986, Santa Clara, California. SPIE--the International Society for Optical Engineering, 1986.
M, Warlaumont John, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V: 20-21 February 1995, Santa Clara, California. SPIE, 1995.
E, Seeger David, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and SEMATECH (Organization), eds. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI: 11-13 March 1996, Santa Clara, California. SPIE, 1996.
Liebmann, Lars W. Design technology co-optimization in the era of sub-resolution IC scaling. SPIE, 2016.
O, Patterson David, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV: 28 February-1 March 1994, San Jose, California. SPIE, 1994.
International Workshop on X-ray and Extreme Ultraviolet Lithography (1997 Yokohama, Japan). Digest of papers, XEL '1997: 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, July 13-15, 1997, Pacifico Yokohama, Yokohama. Japan Society for the Promotion of Sciences?, 1997.
O, Patterson David, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III: 1-2 March 1993, San Jose, California. The Society, 1993.
1946-, Peckerar Martin Charles, and Society of Photo-optical Instrumentation Engineers., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II: 8-9 March 1992, San Jose, California. SPIE, 1992.
S, Khokle W., ed. Patterning of material layers in submicron region. J. Wiley, 1993.
Ann, MacDonald Carolyn, and Society of Photo-optical Instrumentation Engineers., eds. EUV, X-ray, and neutron optics and sources: 21-23 July 1999, Denver, Colorado. SPIE, 1999.
Gurung, Raju. Computer visualisation and proximity effect correction for submicron electron beam lithography. University of Manchester, 1995.
Fretwell, Tracey Ann. Monte Carlo simulation of energy intensity distributions for electron beam lithography. University of Manchester, 1995.
E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. SPIE, 1997.
Scott, Mackay R., Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VIII: 24-26 February, 2004, Santa Clara, California, USA. SPIE, 2004.
L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. SPIE, 2003.
Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. SPIE, 2000.
Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International, eds. Emerging lithographic technologies III: 15-17 March, 1999, Santa Clara, California. SPIE, 1999.
Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. SPIE, 2001.
Fontaine, Bruno M. La, and F. M. Schellenberg. Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States. Edited by SPIE (Society) and International SEMATECH. SPIE, 2009.
Herr, Daniel J. C. Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States. Edited by SPIE (Society) and SEMATECH (Organization). SPIE, 2010.
Resnick, Douglas J., and William Man-Wai Tong. Alternative lithographic technologies IV: 13-16 February 2012, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2012.
Herr, Daniel J. C. Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). SPIE, 2011.
Yen, Anthony, Alek C. Chen, and Burn Lin. Lithography Asia 2008: 4-6 November 2008, Taipei, Taiwan. Edited by SPIE (Society) and Taiwan Semiconductor Industry Association. SPIE, 2008.
A, Tseng A., ed. Nanofabrication: Fundamentals and applications. World Scientific, 2008.
A, Tseng A., ed. Nanofabrication: Fundamentals and applications. World Scientific, 2008.
Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and SEMATECH (Organization), eds. Emerging lithographic technologies II: 23-25 February 1998, Santa Clara, California. SPIE, 1998.
Jaroslav, Králíček, and Zachoval Jaromír, eds. Resists in microlithography and printing. 2nd ed. Elsevier, 1993.
1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. SPIE, 2007.
1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. SPIE, 2007.
1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and International SEMATECH, eds. Emerging lithographic technologies X: 21-23 February, 2006, San Jose, California, USA. SPIE, 2006.
Cooley, Graham Edward. An electron beam lithographic route to polyacetylene via poly(vinylchloride). Brunel University, 1989.
The physics of submicron lithography. Plenum Press, 1992.
Dian zi shu sao miao pu guang ji shu. Yu hang chu ban she, 1985.
Yanof, Arnold W. Electron-Beam, X Ray, and Ion-Beam Technology; Submicrometer Lithographics VII (Proceedings of SPIE--the International Society for Optical Engineering). Society of Photo Optical, 1988.
Lin, Qinghuang. Advances in Resist Technology and Processing XXIII: 20-22 February, 2006. SPIE, 2006.
Mackay, R. Scott. Emerging Lithographic Technologies 9. SPIE-International Society for Optical Engine, 2005.
Emerging Lithographic Techniques VI. SPIE Society of Photo-Optical Instrumentation Engi, 2002.
Schellenberg, Frank. Emerging Lithographic Technologies XII: 26-28 February 2008, San Jose, California, USA. SPIE, 2008.
Nanofabrication: Fundamentals and Applications. World Scientific Publishing Company, 2008.
Nanofabrication: Fundamentals and Applications. World Scientific Publishing Company, 2007.
Wiederrecht, Gary. Handbook of Nanofabrication. Elsevier Science & Technology Books, 2010.