Relevant bibliographies by topics / Lithography hotspot detection

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Conference papers
  4. Reports

Academic literature on the topic 'Lithography hotspot detection'

Author: Grafiati
Published: 4 June 2021
Last updated: 5 February 2022

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Lithography hotspot detection.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "Lithography hotspot detection"

1

Shin, Moojoon, and Jee-Hyong Lee. "CNN Based Lithography Hotspot Detection." International Journal of Fuzzy Logic and Intelligent Systems 16, no. 3 (2016): 208–15. http://dx.doi.org/10.5391/ijfis.2016.16.3.208.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Xiao, Yindong, Xueqian Huang, and Ke Liu. "Model Transferability from ImageNet to Lithography Hotspot Detection." Journal of Electronic Testing 37, no. 1 (2021): 141–49. http://dx.doi.org/10.1007/s10836-021-05925-5.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Shin, Moojoon, and Jee-Hyong Lee. "Accurate lithography hotspot detection using deep convolutional neural networks." Journal of Micro/Nanolithography, MEMS, and MOEMS 15, no. 4 (2016): 043507. http://dx.doi.org/10.1117/1.jmm.15.4.043507.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Yang, Haoyu, Luyang Luo, Jing Su, Chenxi Lin, and Bei Yu. "Imbalance aware lithography hotspot detection: a deep learning approach." Journal of Micro/Nanolithography, MEMS, and MOEMS 16, no. 03 (2017): 1. http://dx.doi.org/10.1117/1.jmm.16.3.033504.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Chen, Jing, Yibo Lin, Yufeng Guo, Maolin Zhang, Mohamed Baker Alawieh, and David Z. Pan. "Lithography hotspot detection using a double inception module architecture." Journal of Micro/Nanolithography, MEMS, and MOEMS 18, no. 01 (2019): 1. http://dx.doi.org/10.1117/1.jmm.18.1.013507.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Wan-Yu Wen, Jin-Cheng Li, Sheng-Yuan Lin, Jing-Yi Chen, and Shih-Chieh Chang. "A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection." IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 33, no. 11 (2014): 1671–80. http://dx.doi.org/10.1109/tcad.2014.2351273.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

He, Xu, Yu Deng, Shizhe Zhou, Rui Li, Yao Wang, and Yang Guo. "Lithography Hotspot Detection with FFT-based Feature Extraction and Imbalanced Learning Rate." ACM Transactions on Design Automation of Electronic Systems 25, no. 2 (2020): 1–21. http://dx.doi.org/10.1145/3372044.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Duo Ding, J. A. Torres, and D. Z. Pan. "High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning." IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 30, no. 11 (2011): 1621–34. http://dx.doi.org/10.1109/tcad.2011.2164537.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Luo, K. s., Z. Shi, and Z. Geng. "Machine Learning Based Lithography Hotspot Detection with Sparse Feature Encoding and Hierarchical Pattern Classification." ECS Transactions 60, no. 1 (2014): 1179–84. http://dx.doi.org/10.1149/06001.1179ecst.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

XingYu, Zhou, and Yu YouLing. "Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network Generalized Euler'Constant Family." Journal of Microelectronic Manufacturing 1, no. 2 (2018): 1–8. http://dx.doi.org/10.33079/jomm.18010205.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Dissertations / Theses on the topic "Lithography hotspot detection"

1

Park, Jea Woo. "Lithography Hotspot Detection." PDXScholar, 2017. https://pdxscholar.library.pdx.edu/open_access_etds/3781.

Full text
Abstract:
The lithography process for chip manufacturing has been playing a critical role in keeping Moor's law alive. Even though the wavelength used for the process is bigger than actual device feature size, which makes it difficult to transfer layout patterns from the mask to wafer, lithographers have developed a various technique such as Resolution Enhancement Techniques (RETs), Multi-patterning, and Optical Proximity Correction (OPC) to overcome the sub-wavelength lithography gap. However, as feature size in chip design scales down further to a point where manufacturing constraints must be applied
APA, Harvard, Vancouver, ISO, and other styles
2

Chen, Jing-Yi, and 陳靜怡. "A Fuzzy Matching Model with Dimensionality Reduction for Lithography Hotspot Detection." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/42807077709782774592.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Yu, Yen-Ting, and 余彥廷. "A novel lithographic hotspot detection framework." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/06192899195124509523.

Full text
Abstract:
博士<br>國立交通大學<br>電子工程學系 電子研究所<br>103<br>In advanced process technology, the ever-growing sub-wavelength lithography gap causes unwanted shape distortions of the printed layout patterns. Although design rule checking (DRC) and reticle/resolution enhancement techniques (RET), such as optical proximity correction (OPC) and subresolution assist features (SRAF), can alleviate the printability problem, many regions on a layout may still be susceptible to lithography process. These problematic regions, so-called lithography hotspots, have to be detected and corrected before mask synthesis to guarantee
APA, Harvard, Vancouver, ISO, and other styles
4

Ding, Duo. "CAD for nanolithography and nanophotonics." Thesis, 2011. http://hdl.handle.net/2152/ETD-UT-2011-08-4030.

Full text
Abstract:
As the semiconductor technology roadmap further extends, the development of next generation silicon systems becomes critically challenged. On the one hand, design and manufacturing closures become much more difficult due to the widening gap between the increasing integration density and the limited manufacturing capability. As a result, manufacturability issues become more and more critically challenged in the design of reliable silicon systems. On the other hand, the continuous scaling of feature size imposes critical issues on traditional interconnect materials (Cu/Low-K dielectrics) due to
APA, Harvard, Vancouver, ISO, and other styles
5

Lin, Geng-He, and 林耕禾. "A Novel Lithographic Hotspot Detection Framework Using Multiple Machine Learning Kernels." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/46577474509677443619.

Full text
Abstract:
碩士<br>國立交通大學<br>電子工程學系 電子研究所<br>101<br>Because of the widening sub-wavelength lithography gap in advanced fabrication technology, lithography hotspot detection has become an essential task in design for manufacturability. Current state-of-the-art works unite pattern matching and machine learning engines. Unlike them, we fully exploit the strengths of machine learning using delicate techniques. We propose a novel lithographic hotspot detection framework using multiple machine learning kernels. By combing topological classification and critical feature extraction, our hotspot detection framework
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "Lithography hotspot detection"

1

Zhang, Hang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, and Bei Yu. "Bilinear Lithography Hotspot Detection." In ISPD '17: International Symposium on Physical Design. ACM, 2017. http://dx.doi.org/10.1145/3036669.3036673.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Rezk, Peter, and Wael ElManhawy. "Fast process-hotspot detection using compressed patterns." In SPIE Advanced Lithography, edited by Michael L. Rieger. SPIE, 2011. http://dx.doi.org/10.1117/12.879548.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Yindong, Xiao, and Huang Xueqian. "Learning lithography hotspot detection from ImageNet." In 2019 14th IEEE International Conference on Electronic Measurement & Instruments (ICEMI). IEEE, 2019. http://dx.doi.org/10.1109/icemi46757.2019.9101673.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Kimura, Taiki, Tetsuaki Matsunawa, Shigeki Nojima, and David Z. Pan. "Hybrid hotspot detection using regression model and lithography simulation." In SPIE Advanced Lithography, edited by Luigi Capodieci and Jason P. Cain. SPIE, 2016. http://dx.doi.org/10.1117/12.2219318.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Yang, Haoyu, Luyang Luo, Jing Su, Chenxi Lin, and Bei Yu. "Imbalance aware lithography hotspot detection: a deep learning approach." In SPIE Advanced Lithography, edited by Luigi Capodieci and Jason P. Cain. SPIE, 2017. http://dx.doi.org/10.1117/12.2258374.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Matsunawa, Tetsuaki, Taiki Kimura, and Shigeki Nojima. "Lithography hotspot candidate detection using coherence map." In Design-Process-Technology Co-optimization for Manufacturability XIII, edited by Jason P. Cain and Chi-Min Yuan. SPIE, 2019. http://dx.doi.org/10.1117/12.2515664.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Hui, Colin, Xian Bin Wang, Haigou Huang, et al. "Hotspot detection and design recommendation using silicon calibrated CMP model." In SPIE Advanced Lithography, edited by Vivek K. Singh and Michael L. Rieger. SPIE, 2009. http://dx.doi.org/10.1117/12.816556.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Kang, Jae-Hyun, Naya Ha, Joo-Hyun Park, et al. "Thickness-aware LFD for the hotspot detection induced by topology." In SPIE Advanced Lithography, edited by Mark E. Mason. SPIE, 2012. http://dx.doi.org/10.1117/12.917998.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Park, Jinho, NamJae Kim, Jae-hyun Kang, et al. "High coverage of litho hotspot detection by weak pattern scoring." In SPIE Advanced Lithography, edited by John L. Sturtevant and Luigi Capodieci. SPIE, 2015. http://dx.doi.org/10.1117/12.2087473.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Yang, Haoyu, Yajun Lin, Bei Yu, and Evangeline F. Y. Young. "Lithography hotspot detection: From shallow to deep learning." In 2017 30th IEEE International System-on-Chip Conference (SOCC). IEEE, 2017. http://dx.doi.org/10.1109/socc.2017.8226047.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Reports on the topic "Lithography hotspot detection"

1

Park, Jea. Lithography Hotspot Detection. Portland State University Library, 2000. http://dx.doi.org/10.15760/etd.5665.

Full text
APA, Harvard, Vancouver, ISO, and other styles
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography