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Relevant bibliographies by topics / Lithography / Dissertations / Theses

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Dissertations / Theses on the topic 'Lithography'

Author: Grafiati

Published: 4 June 2021

Last updated: 25 July 2025

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1

Benoit-Renault, Viviane. "La lithographie en Bretagne (1819-1914)." Thesis, Paris 4, 2014. http://www.theses.fr/2014PA040217.

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Dans l’histoire de l’estampe, l’étude de la lithographie en province a longtemps été négligée et les premierstravaux fondateurs datent seulement d’une quarantaine d’années. L’objet de cette thèse en histoire de l’art est decombler cette lacune en analysant, dans un esprit d’interdisciplinarité ouvert à l’histoire économique et sociale, lalithographie en Bretagne historique de 1819 à 1914.Cette recherche s’appuie d’abord sur l’étude de l’imprimerie lithographique. Après un panorama généralsur l’évolution du nombre d’ateliers et leur répartition géographique, les centres lithographiques principa

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2

Hauser, Hubert [Verfasser], and Holger [Akademischer Betreuer] Reinecke. "Nanoimprint lithography for solar cell texturisation = Nanoimprint Lithographie fuer die Solarzellentexturierung." Freiburg : Universität, 2013. http://d-nb.info/1123476160/34.

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3

Zheng, Zijian. "Soft lithography and nanoimprint lithography for applications in polymer electronics." Thesis, University of Cambridge, 2007. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.613415.

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4

Kandulski, Witold. "Shadow nanosphere lithography." [S.l.] : [s.n.], 2007. http://deposit.ddb.de/cgi-bin/dokserv?idn=985533013.

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5

Musgraves, J. David. "Maskless Projection Lithography." Scholarship @ Claremont, 2003. http://scholarship.claremont.edu/pomona_theses/17.

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Photolithography is a key element of the modem integrated circuit process. It is photolithography, combined with metal deposition, that allows a three dimensional circuit to be built up on a two dimensional surface. Since it is such an important part of the semiconductor manufacturing industry, a massive base of research in this area already exists. The problem with this pre-existing research is that it is geared solely toward industrial purposes, as opposed to more academic research areas. The goal of my research is to move this industrial process into the academic setting of Pomom Coll

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6

Schmidt, Aaron Jerome 1979. "Contact thermal lithography." Thesis, Massachusetts Institute of Technology, 2004. http://hdl.handle.net/1721.1/27116.

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Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2004.<br>Includes bibliographical references (p. 65-67).<br>Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used in the exposure process, thermal lithography is limited by a thermal diffusion length scale and the geometry of the situation. In this thesis the basic principles of thermal lithography are presented. A traditional chrome-glass photo

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7

Brodsky, Colin John. "Graft polymerization lithography." Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3024998.

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8

Baker, Mark. "Metastable Atom Lithography." Thesis, Griffith University, 2008. http://hdl.handle.net/10072/365477.

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This thesis describes the development of a rare gas metastable atomic beam apparatus, and its application to atom lithography. The principal component of the apparatus is the supersonic DC discharge source. The source parameters, such as operating pressure, skimmer distance, discharge current and nozzle shape were optimised to generate a bright beam of excited state metastable neon and argon, with typical flux of 5×10¹? atoms sr?¹ and 3×10¹? atoms sr?¹ respectively. This apparatus was used to investigate the pattern formation of self assembled monolayer (SAM) resists prepared on Au/Si samples

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9

Park, Jea Woo. "Lithography Hotspot Detection." PDXScholar, 2017. https://pdxscholar.library.pdx.edu/open_access_etds/3781.

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The lithography process for chip manufacturing has been playing a critical role in keeping Moor's law alive. Even though the wavelength used for the process is bigger than actual device feature size, which makes it difficult to transfer layout patterns from the mask to wafer, lithographers have developed a various technique such as Resolution Enhancement Techniques (RETs), Multi-patterning, and Optical Proximity Correction (OPC) to overcome the sub-wavelength lithography gap. However, as feature size in chip design scales down further to a point where manufacturing constraints must be applied

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10

Meyers, Bernard C. "Nagual interpretations /." Online version of thesis, 1990. http://hdl.handle.net/1850/10953.

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11

Chen, Ying. "PATTERNING ELASTOMER, THERMOPLASTICS AND SHAPE MEMORYMATERIAL BY UVO LITHOGRAPHY AND SOFT LITHOGRAPHY." University of Akron / OhioLINK, 2017. http://rave.ohiolink.edu/etdc/view?acc_num=akron1491264216402058.

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12

Colburn, Matthew Earl. "Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithography /." Access restricted to users with UT Austin EID Full text (PDF) from UMI/Dissertation Abstracts International, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3025205.

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13

Kim, Hyung-Jun. "Automation of soft lithography." Thesis, Massachusetts Institute of Technology, 2006. http://hdl.handle.net/1721.1/38290.

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Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2006.<br>Includes bibliographical references (leaves 79-82).<br>This dissertation is a final documentation of the project whose goal is demonstrating manufacturability of soft lithography. Specifically, our target is creating micron scale patterns of resists on a 3 square inch, relatively large area in case of soft lithography, flexible substrate using microcontact printing in order to forming electronic circuit patterns for flexible displays. At first, the general principles and characteristics of soft l

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14

Tsai, Hsin-Yu Sidney. "Absorbance modulation optical lithography." Thesis, Massachusetts Institute of Technology, 2007. http://hdl.handle.net/1721.1/42253.

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Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2007.<br>This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.<br>Includes bibliographical references (p. 91-94).<br>In this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed p

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15

Rius, Suñé Gemma. "Electron beam lithography for Nanofabrication." Doctoral thesis, Universitat Autònoma de Barcelona, 2008. http://hdl.handle.net/10803/3404.

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La litografía por haz de electrones (Electron Beam Lithography, EBL) se ha consolidado como una de las técnicas más eficaces que permiten definir motivos en el rango nanométrico. Su implantación ha permitido la nanofabricación de estructuras y dispositivos para su uso en el campo de la nanotecnología y la nanociencia.<br/>La EBL se basa en la definición de motivos submicrónicos mediante el rastreo de un haz energético de electrones sobre una resina. La naturaleza de los electrones y el desarrollo the haces extremadamente finos y su control preciso establecen la plataforma ideal para los requer

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16

Harris, Lee George. "Physicochemical lithography of functional nanolayers." Thesis, Durham University, 2006. http://etheses.dur.ac.uk/9358/.

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To further understand the biological interactions that govern our daily lives it is essential to develop new techniques for the robust tethering of immobilized bio-molecules to substrates for applications such as bio-mimicry, diagnostics, and durability as well as further self assembly. Current technologies devised for this purpose include the functionalization and lithography of Langmuir-Blodgett films, self-assembled monolayers and spin-coated layers. Whilst these methods provide suitable surfaces, they suffer from being substrate dependent and inappropriate for complex 3D-geometries, thus p

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17

Hubbard, Graham John. "Nanoimprint lithography using disposable masters." Thesis, University of Bath, 2011. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.576992.

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A novel imprint process, called Disposable Master Technology has been developed using disposable masters replicated from nickel masters using roll-to-roll printing. The disposable masters consist of a polyester terephthalate film coated with a photosensitive resin containing the inverse structure of the nickel master. The use of hydrophobic and oleophobic additives was found to improve release after imprinting. This has enabled structures of deeply submicron periodicity to be imprinted on silicon wafers up to 4" diameter with good reproducibility. Resist systems have been developed based on ur

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18

Konijn, Mark. "Multilevel Nanoengineering for Imprint Lithography." Thesis, University of Canterbury. Electrical and Computer Engineering, 2005. http://hdl.handle.net/10092/1071.

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The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increasingly difficult and expensive. Extreme ultra-violet lithography is an alternate method that has the potential to provide feature sizes down to 30 nm, however, it will come at an even greater cost. Nanoimprint lithography (NIL) is another lithographic technique which is promising to provide very high resolutions at a relatively low cost. Imprinting works by using a mold with a surface patterned with the required nano structures and pressing it into a substrate coated with a deformable polymer. D

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19

Young, Richard James Hendley. "Electroluminescent devices via soft lithography." Thesis, Brunel University, 2017. http://bura.brunel.ac.uk/handle/2438/17139.

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This thesis provides a compendium for the use of microcontact printing in fabricating electrical devices. Work has been undertaken to examine the use of soft lithographic techniques for employment in electronic manufacture. This thesis focusses on the use of high electric field generators as a means to producing electroluminescent devices. These devices provide a quantifiable output in the form of light. Analysis of the electrical performance of electrode structures can be determined by their success at producing light. A prospective reduction in driving voltage would deem these devices more e

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20

Farhoud, Maya S. (Maya Sami). "Interferometric lithography and selected applications." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/10457.

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21

Liu, Dixi. "NEMS by sidewall transfer lithography." Thesis, Imperial College London, 2015. http://hdl.handle.net/10044/1/31868.

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A batch fabrication process for nano-electro-mechanical systems (NEMS) based on sidewall transfer lithography (STL) is developed and demonstrated. The STL is used to form nanoscale flexible silicon suspensions entirely by conventional lithography. A two-step process is designed for single-layer STL to fabricate simple electrothermal actuators, while a three-step process is designed to allow nanoscale features intersecting with each other for more complicated device lay-outs. Fabricated nanoscale features has a minimum in-plane width of approx. 100nm and a high aspect ratio of 50 : 1. Combined

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22

Yao, Peng. "Developing three-dimensional lithography and chemical lithography for applications on micro/nano photonics and electronics." Access to citation, abstract and download form provided by ProQuest Information and Learning Company; downloadable PDF file, 206 p, 2007. http://proquest.umi.com/pqdweb?did=1397913021&sid=11&Fmt=2&clientId=8331&RQT=309&VName=PQD.

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23

Heard, P. J. "Applications of scanning ion beam lithography." Thesis, University of Cambridge, 1985. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.372653.

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24

Yang, Yugu. "Feedback Control for Electron Beam Lithography." UKnowledge, 2012. http://uknowledge.uky.edu/ece_etds/9.

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Scanning-electron-beam lithography (SEBL) is the primary technology to generate arbitrary features at the nano-scale. However, pattern placement accuracy still remains poor compared to its resolution due to the open-loop nature of SEBL systems. Vibration, stray electromagnetic fields, deflection distortion and hysteresis, substrate charging, and other factors prevent the electron-beam from reaching its target position and one has no way to determine the actual beam position during patterning with conventional systems. To improve the pattern placement accuracy, spatial-phase-locked electron-bea

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25

FILHO, HENRIQUE DUARTE DA FONSECA. "METALLIC NANOSTRUCTURE FABRICATION BY AFM LITHOGRAPHY." PONTIFÍCIA UNIVERSIDADE CATÓLICA DO RIO DE JANEIRO, 2004. http://www.maxwell.vrac.puc-rio.br/Busca_etds.php?strSecao=resultado&nrSeq=6061@1.

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COORDENAÇÃO DE APERFEIÇOAMENTO DO PESSOAL DE ENSINO SUPERIOR<br>Nesta dissertação de mestrado, nós desenvolvemos um processo de litografia baseado na técnica de microscopia de força atômica. O estudo do processo de litografia aqui utilizado inicia-se com a deposição e caracterização de filmes finos de sulfeto de arsênio amorfo (a-As2S3) em substratos de silício e a deposição de uma camada metálica de alumínio, utilizada como máscara, sobre a superfície do a-As2S3. O microscópio de força atômica é utilizado para escrever os padrões de forma controlada na camada metálica, e para tal, a in

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26

Dongxu, Yang. "Novel resists for next generation lithography." Thesis, University of Birmingham, 2016. http://etheses.bham.ac.uk//id/eprint/6532/.

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With progress in the semiconductor industry, transistor density on a single computer chip has increased dramatically. This has resulted in a continuous shrinkage of the minimum feature size printed through microlithography technology. Resist, as the pattern recording medium of such printing, has been extensively studied to achieve higher resolution, higher sensitivity and lower line edge roughness. For decades this has been realized through chemical amplification. With the feature size continuously shrinking and the energy of exposure source therefore exceeding the resist ionization threshold,

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27

Bong, Ki Wan. "Advanced flow lithography and barcoded particles." Thesis, Massachusetts Institute of Technology, 2012. http://hdl.handle.net/1721.1/76479.

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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2012.<br>Cataloged from PDF version of thesis.<br>Includes bibliographical references (p. 120-138).<br>Anisotropic multifunctional particles have drawn much attention, leading to wide ranges of applications from biomedical areas to electronics. Despite their enormous potentials, particles with geometrically and chemically complex patterns are not widely used because existing methodologies have limitations in large scale, facile production and suffer from constraints of functionality and morphology. For examp

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28

Paudel, Trilochan. "Nanosphere Lithography for Nano Optical Applications." Thesis, Boston College, 2011. http://hdl.handle.net/2345/3155.

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Thesis advisor: Zhifeng Ren<br>Thesis advisor: Krzysztof Kempa<br>Many different techniques are available to create nanopatterns in nanoscale devices. However, a few are flexible and inexpensive enough to be practical in the nanotechnology. Here, we study the nanosphere lithography (NSL) based on a self-assembly of microspheres. Using this technique, we have developed various patterns in metallic films, ranging from honeycomb arrays of "quasi-triangles" to circular holes. These various patterns have been used subsequently either as nano-optical structures directly, with remarkable optical and

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29

Kim, Hyunsu. "Interference lithography with extreme ultraviolet light." Thesis, University of Southampton, 2016. https://eprints.soton.ac.uk/410353/.

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In photolithography, increasing pattern density is a key issue for development of semiconductor devices. Extreme ultraviolet (EUV) radiation is the next generation light source for overcoming the resolution limit of conventional photolithography in order to obtain nanostructures of higher density. In this thesis, we focus on investigating resolution limits of interference patterns produced by EUV radiation. Optical properties of interference fringes obtained using different types of compact EUV sources are studied with regard to increasing pattern density. Rigorous simulations of optical wave

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30

Mack, Chris Alan. "Modeling solvent effects in optical lithography /." Digital version accessible at:, 1998. http://wwwlib.umi.com/cr/utexas/main.

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31

Dedman, Emma Ruth. "Characterisation of photonic crystals fabricated by holographic lithography." Thesis, University of Oxford, 2004. http://ora.ox.ac.uk/objects/uuid:35f8c1da-fca7-4086-aab3-fdda5ce346c6.

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Holographic lithography is a new technique developed for the fabrication of threedimensional photonic crystals in polymer. Four coherent laser beams are interfered to generate a three-dimensionally periodic interference pattern in a film of photoresist. Subsequent processing steps render a three-dimensional photonic crystal, whose structure is commensurate with the original interference pattern. Two interference patterns are discussed in detail: a face-centred cubic pattern with a conventional lattice constant of 922nm in air and a face-centred cubic pattern with a conventional cube side of 39

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Mehrotra, Prateek. "High Aspect Ratio Lithographic Imaging at Ultra-high Numerical Apertures: Evanescent Interference Lithography with Resonant Reflector Underlayers." Thesis, University of Canterbury. Electrical and Computer Engineering, 2012. http://hdl.handle.net/10092/6935.

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A near-field technique known as evanescent interferometric lithography allows for high resolution imaging. However its primary limitation is that the image exponentially decays within the photoresist due to physical limits. This thesis aims to overcome this limitation and presents a method to considerably enhance the depth of focus of images created using evanescent interferometric lithography by using a material underlay beneath the photoresist. A key enabler of this is the understanding that evanescent fields couple to surface states and operating within proximity of a resonance, the streng

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Rommel, Marcus [Verfasser], and Jürgen [Akademischer Betreuer] Weis. "High resolution electron beam lithography : an improved understanding of a versatile lithography technique / Marcus Rommel ; Betreuer: Jürgen Weis." Stuttgart : Universitätsbibliothek der Universität Stuttgart, 2018. http://d-nb.info/1162893567/34.

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34

Shi, Shichang. "Lithography : friendly routing via forbidden pitch avoidance /." View the Table of Contents & Abstract, 2004. http://sunzi.lib.hku.hk/hkuto/record/B30469636.

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35

Hansson, Björn. "Laser-Plasma Sources for Extreme-Ultraviolet Lithography." Doctoral thesis, KTH, Physics, 2003. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-3677.

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<p>This thesis describes the development and characterizationof a liquidxenon- jet laser-plasma source forextreme-ultraviolet (EUV) radiation. It is shown how thissource may be suitable for production-scale EUV lithography(EUVL).</p><p>EUVL is one of the main candidates to succeeddeep-ultraviolet (DUV) lithography for large-scalemanufacturing of integrated circuits (IC). However, a majorobstacle towards the realization of EUVL is the currentunavailability of a source meeting the tough requirements onespecially power and cleanliness for operation in an EUVLstepper. The liquid-xenon-jet laser-pl

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Hoskins, Trevor P. J. II. "Characterization of Substituted Polynorbornenes for Advanced Lithography." Diss., Georgia Institute of Technology, 2005. http://hdl.handle.net/1853/8727.

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A fundamental characterization of hexafluoroalcohol substituted polynorbornene (HFAPNB) was completed to improve the final photoresist formulation using these materials. In this work, it was found that the dissolution behavior of these materials was controlled by the ability of polymer chains to form hydrogen bonds. This ability to form interchain hydrogen bonds was affected by stereochemical changes in the polynorbornene backbone as molecular weights increase. These observed changes in backbone polynorbornene stereochemistry were accurately modeled using the "helix-kink" theory, first describ

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37

Vallejo, Rogelio Murillo. "Magnetic media patterned by laser interference lithography." Enschede : University of Twente [Host], 2006. http://doc.utwente.nl/55932.

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Lee, Fung Ying. "Fabrication of nanoparticle arrays by holographic lithography /." View abstract or full-text, 2007. http://library.ust.hk/cgi/db/thesis.pl?PHYS%202007%20LEE.

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39

Gleason, Russell. "Nanosphere lithography applied to magnetic thin films." Thesis, California State University, Long Beach, 2013. http://pqdtopen.proquest.com/#viewpdf?dispub=1524199.

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<p> Magnetic nanostructures have widespread applications in many areas of physics and engineering, and nanosphere lithography has recently emerged as promising tool for the fabrication of such nanostructures. The goal of this research is to explore the magnetic properties of a thin film of ferromagnetic material deposited onto a hexagonally close-packed monolayer array of polystyrene nanospheres, and how they differ from the magnetic properties of a typical flat thin film. The first portion of this research focuses on determining the optimum conditions for depositing a monolayer of nanospheres

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40

Watson, Scott M. D. "Scanning probe lithography of chemically functionalised surfaces." Thesis, Durham University, 2008. http://etheses.dur.ac.uk/2055/.

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A facile route to the production of highly uniform, ultra-thin metal oxide films has-been demonstrated using a combination of self-assembly and Langmuir-Blodgett techniques. Initial modification of a Si/SiO(_2) substrate through self-assembly of an octadecylsiloxane monolayer provides a hydrophobic surface suitable for the "tail down" deposition of a Langmuir-Blodgett monolayer of octadecylphosphonic acid, giving. The resulting –PO(_3)H(_2) functionalised film provides a suitable surface for binding of metal ions (e.g. Zr(^4+), Hf(^4+), Mg(^2+)). The tendency of these metal species to form pol

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He, X. "Nanoimprint lithography for applications in photovoltaic devices." Thesis, University of Cambridge, 2010. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.603915.

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This thesis describes efforts to achieve an idealized architecture and to characterize the transport in polymer-based PV devices, by employing novel nanoimprint techniques. First, a novel double-imprinting process is described, which allows the fabrication of ideally structured “polymer-polymer” and “polymer-small molecule” heterojunctions, with any composition. The dimensions of both phases can be independently tailored to match the respective exciton diffusion length in either phase PV devices with extremely high densities (up to 10<sup>14</sup>/mm<sup>2</sup>) of interpenetrating nanoscale

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Shi, Shichang, and 石世長. "Lithography: friendly routing via forbidden pitch avoidance." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2004. http://hub.hku.hk/bib/B44570168.

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Li, Jia, and 李佳. "Computational imaging technologies for optical lithography extension." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2014. http://hdl.handle.net/10722/206757.

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With the development and production of integrated circuits at the 22nm node, optical lithography faces increasing challenges to keep up with the specifications on its performance along various metrics, such as pattern fidelity and process window. The past few years saw the emergence of source mask optimization (SMO) as an important technique in computational lithography, which allows lithographers to rise to the challenges by exploiting a larger design space on both mask and illumination configuration, and integrates with methods such as inverse imaging. Yet, many methods that are used to tack

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Colburn, Matthew Earl 1974. "Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithograph." 2001. http://hdl.handle.net/2152/10298.

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Wang, Yun Wen, and 王韻雯. "Study of Achromatic Interference Lithography Technology Used in Large-Area Lithography." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/e83jpf.

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CHUANG, CHING MIN, and 莊清閔. "Improved Lithography Resolution by Varying I-LINE Optical Lithography Numerical Aperture." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/41063964861734146495.

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碩士<br>長庚大學<br>電子工程學系<br>100<br>DRAM (Dynamic Random-Access Memory) is required for larger and larger capacity memory chips with the progress of technology. The IC (Integrated Circuit) manufacturers certainly want to make a largest memory capacity with small wafer size. All they have to do is reducing cost by decreasing the feature size for reaching the requirement of advanced DRAM in next generation. In this study, a process step of via hole was researched. The maximum resolution of window target is 335 nm (CD PATTEM) by KrF (248 nm). However, I-Line wavelength is 365 nm, still can not reach t

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Yi-MingLin and 林奕名. "Extreme ultraviolet interferometric lithography - fabrication of transmission grating by using nanoimprint lithography." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/12689475218057827616.

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48

Tuffli, Andrea Lynne. "Imaging in EUV lithography." 1998. http://catalog.hathitrust.org/api/volumes/oclc/39618084.html.

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Thesis (M.S.)--University of Wisconsin--Madison, 1998.<br>Typescript. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 71-75).

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Lin, Chien-Hung, and 林建宏. "Ultrasonic Nanoimprint Lithography Technology." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/72340773981514108296.

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博士<br>國立清華大學<br>微機電工程研究所<br>95<br>In this study, we report an ultrasonic nanoimprint lithography (U-NIL) method which can overcome the drawbacks of energy consumption and long process time occurred in conventional NIL methods. Instead of using heaters in conventional NIL, the proposed U-NIL employs an ultrasonic source located on the top of mold to generate high frequency vibration causing the increase of temperature to soften and to melt the thermoplastic polymer. The ultrasonic source is induced by the transducer consisting of a number of piezoelectric ceramic discs, sandwiched between two a

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Lin, Ting-Hsu, and 林庭旭. "Development of Dielectrophoretic Lithography." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/86680491845025442508.

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碩士<br>國立交通大學<br>奈米科技研究所<br>98<br>Because the lithography technique is progressing continuously, the dimension of transistor device is getting smaller. Recently, development of traditional optical lithography technique is reaching the limit, and it's not practical to have an advanced optical lithography system with shorter light wavelength. Hence the researchers keep investigating the new way for next generation lithography. There are many methods have been demonstrated. In this thesis, we propose a new forming technique controlling UV curable liquid by applying an electric field and than solid

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