Books on the topic 'Low-k dielectric thin films'
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Ree, Moonhor. Low-k nanoporous interdielectrics: Materials, thin film fabrications, structures and properties. Nova Science Publishers, 2010.
Find full textInternational Symposium on Thin Film Materials, Processes, and Reliability (2003 Paris, France). Thin film materials, processes, and reliability: Plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. Edited by Mathad G. S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2003.
Find full textSymposium on Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics (2000 Phoenix, Ariz.). Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics: Proceedings of the international symposium. Edited by Mathad G. S, Rathore Harzara S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, Electrochemical Society Electrodeposition Division, and Electrochemical Society Meeting. Electrochemical Society, 2001.
Find full textInternational Symposium on Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics II (2003 Orlando, Fla.). Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics II: Proceedings of the international symposium. Edited by Mathad G. S, Bakshi V, Electrochemical Society. Dielectric Science and Technology Division, Electrochemical Society Electronics Division, Electrochemical Society Electrodeposition Division, and Electrochemical Society Meeting. Electrochemical Society, 2003.
Find full textSymposium F, "Materials, Technology and Reliability of Low-K Dielectrics and Copper Interconnects" (2006 San Francisco, Calif.). Materials, technology and reliability of low-k dielectrics and copper interconnects: Symposium held April 18-21, 2006, San Francisco, California, U.S.A. Edited by Tsui Ting Y and Materials Research Society Meeting. Materials Research Society, 2006.
Find full textSymposium F, "Materials, Technology and Reliability of Low-K Dielectrics and Copper Interconnects" (2006 San Francisco, Calif.). Materials, technology and reliability of low-k dielectrics and copper interconnects: Symposium held April 18-21, 2006, San Francisco, California, U.S.A. Edited by Tsui Ting Y and Materials Research Society Meeting. Materials Research Society, 2006.
Find full textSymposium F, "Materials, Technology and Reliability of Low-K Dielectrics and Copper Interconnects" (2006 San Francisco, Calif.). Materials, technology and reliability of low-k dielectrics and copper interconnects: Symposium held April 18-21, 2006, San Francisco, California, U.S.A. Edited by Tsui Ting Y and Materials Research Society Meeting. Materials Research Society, 2006.
Find full textJ, McKerrow Andrew, Materials Research Society Meeting, and Symposim on Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics (2003 : San Francisco, Calif.), eds. Materials, technology and reliability for advanced interconnects and low-k dielectrics, 2003: Symposium held April 21-25, 2003, San Francisco, California, U.S.A. Materials Research Society, 2003.
Find full textMaex, Karen. Materials, technology and reliability for advanced interconnects and low-k dielectrics: Symposium held April 23-27, 2000, San Fransico, California, U.S.A. Materials Research Society, 2001.
Find full textOgawa, S., K. Maex, G. S. Oehrlein, J. T. Wetzel, and Y. C. Joo. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics: Volume 612. University of Cambridge ESOL Examinations, 2014.
Find full textLow and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues, Proceedings. Electrochemical Society, 2000.
Find full textJ, Lododa Mark, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues (5th : 2000 : Toronto, Ont.), eds. Low and high dielectric constant materials: Materials science, processing, and reliability issues : proceedings of the fifth international symposium. Electrochemical Society, Inc., 2000.
Find full textElectrochemical Society. Dielectric Science and Technology Division (Corporate Author), Electrochemical Society Electronics Division (Corporate Author), and Rajendra Singh (Editor), eds. Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues and Thin Film Materials for Advanced Packaging Technologies ... (Electrochemical Society), V. 99-7.). Electrochemical Society, 1999.
Find full text1946-, Singh Rajendra, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues (4th : 1999 : Seattle, Wash.), and International Symposium on Thin Film Materials for Advanced Packaging (2nd : 1999 : Seattle, Wash.), eds. Low and high dielectric constant materials: Materials science, processing, and reliability issues : proceedings of the fourth international symposium : and, thin film materials for advanced packaging technologies : proceedings of the second international symposium. Electrochemical Society, Inc., 2000.
Find full textF, Van Keuls, Miranda F. A, and Lewis Research Center, eds. A novel K-band tunable microstrip bandpass filter using a thin film HTS/ferroelectric/dielectric multilayer configuration. National Aeronautics and Space Administration, Lewis Research Center, 1998.
Find full textF, Van Keuls, Miranda F. A, and Lewis Research Center, eds. A novel K-band tunable microstrip bandpass filter using a thin film HTS/ferroelectric/dielectric multilayer configuration. National Aeronautics and Space Administration, Lewis Research Center, 1998.
Find full textA novel K-band tunable microstrip bandpass filter using a thin film HTS/ferroelectric/dielectric multilayer configuration. National Aeronautics and Space Administration, Lewis Research Center, 1998.
Find full textF, Van Keuls, Miranda F. A, and Lewis Research Center, eds. A novel K-band tunable microstrip bandpass filter using a thin film HTS/ferroelectric/dielectric multilayer configuration. National Aeronautics and Space Administration, Lewis Research Center, 1998.
Find full text(Editor), A. J. McKerrow, J. Leu (Editor), and O. Kraft (Editor), eds. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics--2003: Volume 766. Materials Research Society, 2003.
Find full textCarter, R. J., C. S. Hau-Riege, G. M. Kloster, T. M. Lu, and S. E. Schulz. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004. University of Cambridge ESOL Examinations, 2014.
Find full textCarter, R. J. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics--2004: Symposium Held April 13-15, 2004, San Francisco, Califor. Materials Research Society, 2004.
Find full text1948-, Carter R. J., Materials Research Society Meeting, and Symposim on Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics (2004 : San Francisco, Calif.), eds. Materials, technology, and reliability for advanced interconnects and low-k dielectrics--2004: Symposium held April 13-15, 2004, San Francisco, California, U.S.A. Materials Research Society, 2004.
Find full text(Editor), G. S. Oehrlein, K. Maex (Editor), Y. C. Joo (Editor), S. Ogawa (Editor), and Jeffrey T. Wetzel (Editor), eds. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics: Proceedings of Symposium Helt April 23-27, 2000, San Francisco, California U.S.A. Materials Research Society, 2001.
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