Books on the topic 'Low loss dielectric materials'

Cravey, Robin L. W-band transmission measurements and X-band dielectric properties measurements for a radome material sample. National Aeronautics and Space Administration, Langley Research Center, 1997.

Cravey, Robin L. W-band transmission measurements and X-band dielectric properties measurements for a radome material sample. National Aeronautics and Space Administration, Langley Research Center, 1997.

Ree, Moonhor. Low-k nanoporous interdielectrics: Materials, thin film fabrications, structures and properties. Nova Science Publishers, 2010.

Symposium on Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics (2000 Phoenix, Ariz.). Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics: Proceedings of the international symposium. Edited by Mathad G. S, Rathore Harzara S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, Electrochemical Society Electrodeposition Division, and Electrochemical Society Meeting. Electrochemical Society, 2001.

International Symposium on Copper Interconnects, New Contact Metallurgies/Structures, and Low-k Interlevel Dielectrics II (2003 Orlando, Fla.). Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics II: Proceedings of the international symposium. Edited by Mathad G. S, Bakshi V, Electrochemical Society. Dielectric Science and Technology Division, Electrochemical Society Electronics Division, Electrochemical Society Electrodeposition Division, and Electrochemical Society Meeting. Electrochemical Society, 2003.

Maex, Karen. Materials, technology and reliability for advanced interconnects and low-k dielectrics: Symposium held April 23-27, 2000, San Fransico, California, U.S.A. Materials Research Society, 2001.

Symposium F, "Materials, Technology and Reliability of Low-K Dielectrics and Copper Interconnects" (2006 San Francisco, Calif.). Materials, technology and reliability of low-k dielectrics and copper interconnects: Symposium held April 18-21, 2006, San Francisco, California, U.S.A. Edited by Tsui Ting Y and Materials Research Society Meeting. Materials Research Society, 2006.

Symposium F, "Materials, Technology and Reliability of Low-K Dielectrics and Copper Interconnects" (2006 San Francisco, Calif.). Materials, technology and reliability of low-k dielectrics and copper interconnects: Symposium held April 18-21, 2006, San Francisco, California, U.S.A. Edited by Tsui Ting Y and Materials Research Society Meeting. Materials Research Society, 2006.

Symposium F, "Materials, Technology and Reliability of Low-K Dielectrics and Copper Interconnects" (2006 San Francisco, Calif.). Materials, technology and reliability of low-k dielectrics and copper interconnects: Symposium held April 18-21, 2006, San Francisco, California, U.S.A. Edited by Tsui Ting Y and Materials Research Society Meeting. Materials Research Society, 2006.

J, McKerrow Andrew, Materials Research Society Meeting, and Symposim on Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics (2003 : San Francisco, Calif.), eds. Materials, technology and reliability for advanced interconnects and low-k dielectrics, 2003: Symposium held April 21-25, 2003, San Francisco, California, U.S.A. Materials Research Society, 2003.

International Symposium on Thin Film Materials, Processes, and Reliability (2003 Paris, France). Thin film materials, processes, and reliability: Plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. Edited by Mathad G. S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Meeting. Electrochemical Society, 2003.

P, Hearn Chase, and Langley Research Center, eds. Low-loss coupling to dielectric resonators. National Aeronautics and Space Administration, Langley Research Center, 1991.

P, Hearn Chase, and Langley Research Center, eds. Low-loss coupling to dielectric resonators. National Aeronautics and Space Administration, Langley Research Center, 1991.

P, Hearn Chase, and Langley Research Center, eds. Low-loss coupling to dielectric resonators. National Aeronautics and Space Administration, Langley Research Center, 1991.

Nalwa, Hari Singh. Low and High Dielectric Constant Materials. Harcourt Brace College Publishers, 1999.

Nalwa, Hari Singh. Low and High Dielectric Constant Materials. Harcourt Brace College Publishers, 1999.

Hummel, John, Michael Mills, Shi-Qing Wang, Kazuhiko Endo, and Wei William Lee. Low-Dielectric Constant Materials V: Volume 565. University of Cambridge ESOL Examinations, 2014.

(Editor), Paul S. Ho, Jihperng Leu (Editor), and Wei William Lee (Editor), eds. Low Dielectric Constant Materials for IC Applications. Springer, 2002.

Rathore, H. S. Low & High Dielectric Constant Materials: Materials Science, Processing & Reliability Issues (Proceedings). Electrochemical Society, 1997.

Nalwa. Low and High Dielectric Constant Materials and Their Applications. Academic Pr, 1999.

Nalwa. Low and High Dielectric Constant Materials and Their Applications. Academic Pr, 1999.

Smith, Paul Anthony. Dielectric loss measurements at low temperatures using super conducting cavity resonators. 1989.

Frohlich, H. Theory of Dielectrics: Dielectric Constant and Dielectric Loss (Monographs on the Physics and Chemistry of Materials). Oxford University Press, USA, 1987.

James, Baker-Jarvis, and National Institute of Standards and Technology (U.S.), eds. Dielectric and conductor-loss characterization and measurements on electronic packaging materials. U.S. Dept. of Commerce, National Institute of Standards and Technology, 2001.

Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues, Proceedings. Electrochemical Society, 2000.

1954-, Nalwa Hari Singh, ed. Handbook of low and high dielectric constant materials and their applications. Academic Press, 1999.

L, Tiemsin Pacita, and Langley Research Center, eds. W-band transmission measurements and X-band dielectric properties measurements for a radome material sample. National Aeronautics and Space Administration, Langley Research Center, 1997.

J, Lododa Mark, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues (5th : 2000 : Toronto, Ont.), eds. Low and high dielectric constant materials: Materials science, processing, and reliability issues : proceedings of the fifth international symposium. Electrochemical Society, Inc., 2000.

André, Lagendijk, ed. Low-dielectric constant materials II: Symposium held December 2-3, 1996, Boston, Massachusetts, U.S.A. Materials Research Society, 1997.

Low-dielectric constant materials III: Symposium held April 1-4, 1997, San Francisco, California, U.S.A. Materials Research Society, 1997.

Electrochemical Society. Dielectric Science and Technology Division (Corporate Author), Electrochemical Society Electronics Division (Corporate Author), and Rajendra Singh (Editor), eds. Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues and Thin Film Materials for Advanced Packaging Technologies ... (Electrochemical Society), V. 99-7.). Electrochemical Society, 1999.

ʼien, Chiang Ch, ed. Low-dielectric constant materials IV: Symposium held April 14-16, 1998, San Francisco, California, U.S.A. Materials Research Society, 1998.

Low-dielectric constant materials V: Symposium held April 5-8, 1999, San Francisco, California, U.S.A. Materials Research Society, 1999.

(Editor), A. J. McKerrow, J. Leu (Editor), and O. Kraft (Editor), eds. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics--2003: Volume 766. Materials Research Society, 2003.

Carter, R. J., C. S. Hau-Riege, G. M. Kloster, T. M. Lu, and S. E. Schulz. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004. University of Cambridge ESOL Examinations, 2014.

DIELECTRIC AND CONDUCTOR-LOSS CHARACTERIZATION AND MEASUREMENTS ON ELECTRONIC PACKAGING MATERIALS... NIST TECHNICAL NOTE 1520... U.S. DEPART. s.n., 2002.

National Institute of Standards and Technology (U.S.), ed. DIELECTRIC AND CONDUCTOR-LOSS CHARACTERIZATION AND MEASUREMENTS ON ELECTRONIC PACKAGING MATERIALS... NIST TECHNICAL NOTE 1520... U.S. DEPART. s.n., 2002.

National Institute of Standards and Technology (U.S.), ed. DIELECTRIC AND CONDUCTOR-LOSS CHARACTERIZATION AND MEASUREMENTS ON ELECTRONIC PACKAGING MATERIALS... NIST TECHNICAL NOTE 1520... U.S. DEPART. s.n., 2002.

Lu, T. M. Low-Dielectric Constant Materials IV: Symposium Held April 14-16, 1998, San Francisco, California, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 1998.

1946-, Singh Rajendra, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing, and Reliability Issues (4th : 1999 : Seattle, Wash.), and International Symposium on Thin Film Materials for Advanced Packaging (2nd : 1999 : Seattle, Wash.), eds. Low and high dielectric constant materials: Materials science, processing, and reliability issues : proceedings of the fourth international symposium : and, thin film materials for advanced packaging technologies : proceedings of the second international symposium. Electrochemical Society, Inc., 2000.

(Editor), Andre Lagendijk, Helmuth Treichel (Editor), Kevin J. Uram (Editor), and Anthony C. Jones (Editor), eds. Low-Dielectric Constant Materials II: Symposium Held December 2-3, 1996, Boston, Massachusetts, U.S.A. (Materials Research Society Symposia Proceedings, V. 443.). Materials Research Society, 1997.

Francisco, California) Materials Research Society Meeting (1999 San. Low-Dielectric Constant Materials V: Symposium Held April 5 - 9, 1999, San Francisco, California, U.S.A (Materials Research Society Symposia Proceedings, V. 565.). Materials Research Society, 2000.

(Editor), Carlye Case, Paul Kohn (Editor), Takamaro Kikkawa (Editor), and Wei William Lee (Editor), eds. Low-Dielectric Constant Materials III: Symposium Held April 1-4, 1997, San Francisco, California, U.S.A (Materials Research Society Symposium Proceedings, V. 476). Materials Research Society, 1997.

(Editor), G. S. Oehrlein, K. Maex (Editor), Y. C. Joo (Editor), S. Ogawa (Editor), and Jeffrey T. Wetzel (Editor), eds. Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics: Proceedings of Symposium Helt April 23-27, 2000, San Francisco, California U.S.A. Materials Research Society, 2001.