Relevant bibliographies by topics / Magnetron Co-Sputtering

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  1. Journal articles
  2. Dissertations / Theses
  3. Book chapters
  4. Conference papers

Academic literature on the topic 'Magnetron Co-Sputtering'

Author: Grafiati
Published: 4 June 2021
Last updated: 26 July 2025

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Journal articles on the topic "Magnetron Co-Sputtering"

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Xie, Jian Sheng, Jin Hua Li, and Ping Luan. "Property Comparison of CuInSi Films Prepared by Multilayer Synthesized and Magnetron Co-Sputtering." Applied Mechanics and Materials 110-116 (October 2011): 3755–61. http://dx.doi.org/10.4028/www.scientific.net/amm.110-116.3755.

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Using magnetron sputtering technology, the CuInSi nanocomposite thin films were prepared by magnetron co-sputtering method and multilayer synthesized method respectively,and followed by annealing in N2 atmosphere at different temperatures. The structure of CuInSi nanocomposite films were detected by X-ray diffraction (XRD); X-ray diffraction studies of the annealed films indicate the presence of CuInSi, the peak of main crystal phase is at about 2θ=42.308°,meanwhile,there are In2O3 peak and other peaks in the XRD patterns of films. The morphology of the film surface was studied by SEM. The SEM
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Bai, Xiu Qin, and Jian Li. "Study on Low Temperature Deposition of TiN Films and their Tribological Properties." Advanced Materials Research 189-193 (February 2011): 925–30. http://dx.doi.org/10.4028/www.scientific.net/amr.189-193.925.

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The low temperature deposition principle of magnetron sputtering was discussed. Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) thin films on W18Cr4V high-speed steel substrates at low temperature. A series of experiments had been conducted to study the properties of TiN films. The experimental results showed that at the low temperature(<140 °C), magnetic sputtering can be used for the deposition of TiN film with compact, uniform and high nano-hardness, and their tribological properties were excellent, which co-determined by the film structure of low temperat
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Tranca, Denis E., Arcadie Sobetkii, Radu Hristu, et al. "Structural and Mechanical Properties of CrN Thin Films Deposited on Si Substrate by Using Magnetron Techniques." Coatings 13, no. 2 (2023): 219. http://dx.doi.org/10.3390/coatings13020219.

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Chromium nitride thin films are known for their good mechanical properties. We present the characteristics of ultrathin chromium nitride films under 400 nm thickness deposited on silicon substrates by direct current and high-power impulse magnetron sputtering techniques. The methods of investigation of the CrN films were scanning electron microscopy, atomic force microscopy, and nanoindentation. Qualitative and quantitative analyses were performed using AFM and SEM images by fractal dimension, surface roughness and gray-level co-occurrence matrix methods. Our results show that using magnetron
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Strnad, G., D. Biro, and I. Vida-Simiti. "Contributions to Processing of Self-Lubricated, Nanocomposite Wear Resistant Coatings by Reactive UM Magnetron Co-Sputtering." Advanced Materials Research 23 (October 2007): 197–200. http://dx.doi.org/10.4028/www.scientific.net/amr.23.197.

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Recently a great deal of attention has been devoted to sputtering technology for nanostructured coatings. Wear resistant nanocomposite coatings are very promising materials, which can be easily scaled up for industrial production. Therefore, reactive magnetron sputtering of alloy targets or co-sputtering of elemental metal targets are now intensively investigated. Present paper presents some results of our research work for optimization of tribological properties by definition of selected parameters for reactive sputtering process conditions of self-lubricated carbon doped TiAlN coating. Tailo
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Yang, Tim, Z. Q. Wang, Makoto Kohda, Takeshi Seki, Koki Takanashi, and Junsaku Nitta. "Perpendicular Magnetic Anisotropy in Pt/Co/AlO Trilayer Structures Depending on AlO Thickness and Fabrication Method." Key Engineering Materials 616 (June 2014): 247–51. http://dx.doi.org/10.4028/www.scientific.net/kem.616.247.

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We investigate the perpendicular magnetic anisotropy dependence on the AlO capping layer in Pt/Co/AlO films. AlO was deposited on Pt/Co films by RF magnetron sputtering and atomic layer deposition (ALD) with varying thickness. It is found that the prolonged deposition of thick AlO layers by RF magnetron sputtering causes significant damage to the Pt/Co underneath while AlO layers formed by ALD can be of arbitrary thickness with no damage to the magnetic properties of the films. The decline of the magnetic properties can be attributed to the method of AlO deposition for each process. In the RF
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Liu, Zhuang, Lin Zhu, Jing Lin, and Zhi Hui Sun. "Gas Barrier Properties of SiOX Films Deposited by RF Magnetron Co-Sputtering." Advanced Materials Research 284-286 (July 2011): 48–52. http://dx.doi.org/10.4028/www.scientific.net/amr.284-286.48.

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SiOx barrier films were deposited on poly (ethylene terephthalate) (PET) by radio frequency (RF) magnetron co-sputtering with double targets. The films deposited by co-sputtering were denser and smoother because different energy particles sputtering from double targets grew small islands to weaken shadowing effect which greatly reduce the interval gaps. The water vapor and oxygen transmission of SiOx films deposited by co-sputtering decreased to 0.31 cc/m2/day, 0.27 g/m2/24h respectively.
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Zhu, Guo, Baijun Xiao, Ganxin Chen, and Zhiyin Gan. "Study on the Deposition Uniformity of Triple-Target Magnetron Co-Sputtering System: Numerical Simulation and Experiment." Materials 15, no. 21 (2022): 7770. http://dx.doi.org/10.3390/ma15217770.

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The uniformity of magnetron-sputtered films can be evaluated using an analytical model whose key parameters, such as included angle cosine and distance between infinitesimal elements, are so far calculated based on targets-substrate geometric relation. This existing computation scheme is not applicable in a triple-target magnetron co-sputtering system with complex targets-substrate geometric relation. In this work, a computation method was proposed to calculate the deposition uniformity of a triple-target magnetron co-sputtering system based on the analytical model. In this method, the coordin
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Demczyk, B. G., and H. W. Estry. "X-ray photoelectron spectroscopy of annealed Co-Cr films." Proceedings, annual meeting, Electron Microscopy Society of America 49 (August 1991): 750–51. http://dx.doi.org/10.1017/s0424820100088063.

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Co-Cr thin films have been studied extensively as leading candidates for perpendicular recording media. The enhancement of the magnetic properties (saturation magnetization and coercivity) in rfsputtered Co-Cr films has been reported by several investigators. Concurrent work has revealed similar improvements in the magnetic properties of annealed Co-Cr films produced by magnetron sputtering. Honda et al. propose that compositional inhomogeneities in annealed films give rise to these properties changes. In this work, we have employed X-ray photoelectron spectroscopy (XPS) to investigate composi
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Liu, Jun, Zhi Gang Chen, Kai Bi, and Yue Min Wang. "Evaluation on Structure and Tribological Properties of Carbon Nitride Films Deposited on YG8 Carbide Alloy Substrates." Key Engineering Materials 492 (September 2011): 80–84. http://dx.doi.org/10.4028/www.scientific.net/kem.492.80.

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CNx films were deposited on YG8 carbide alloy (WC+8%Co) substrates by DC or RF magnetron sputtering. The composition, bonding state, adhesion, and tribological behavior of CNx films were researched. X-ray Photoelectron spectroscopy results showed that C-N, C=N and C≡N bond existed in CNx films. RF magnetron sputtering is in favor of the bonding of C and N, the adhesion and the wear resistance of CNx films. DC magnetron sputtering is in favor of lubricating ability of CNx films. Substrate bias has some effect on the bonding of C and N, the adhesion of the films, decrease of adhesive wear and th
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Xing, Zhuo, Hengyi Wu, Liang Wu, et al. "A multifunctional vanadium-doped cobalt oxide layer on silicon photoanodes for efficient and stable photoelectrochemical water oxidation." Journal of Materials Chemistry A 6, no. 42 (2018): 21167–77. http://dx.doi.org/10.1039/c8ta07552b.

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Dissertations / Theses on the topic "Magnetron Co-Sputtering"

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Gomes, Matheus Gamino. "Deposição de nano-grãos de Co em uma matriz de CoO/Al2O3 por Magnetron Sputtering." Universidade Federal de Santa Maria, 2007. http://repositorio.ufsm.br/handle/1/9175.

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Coordenação de Aperfeiçoamento de Pessoal de Nível Superior<br>Granular magnetic systems can be composed by magnetic particles or clusters with size of some nanometers. These magnetic nanoparticles present different magnetic order phases, as superparamagnetic, and they can be embedded in both, metallic or insulating matrix. These systems present several phenomena such as the giant magnetoresistance (GMR), tunnel magnetoresistance (TMR) and Coulomb blockade. That phenomena use to disappear when a small termal fluctuation is high enough to reverse the magnetization of the clusters leading the lo
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Schmidt, Rüdiger Matti [Verfasser], Matthias [Akademischer Betreuer] Wuttig, and P. [Akademischer Betreuer] Kelly. "Exploring the potential of serial magnetron co-sputtering / Rüdiger Matti Schmidt ; Matthias Wuttig, P. Kelly." Aachen : Universitätsbibliothek der RWTH Aachen, 2015. http://d-nb.info/1127590693/34.

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Aijaz, Asim. "Design and Characterisation of A SynchronousCo-Axuak Double Magnetron Sputtering System." Thesis, Linköping University, Department of Physics, Chemistry and Biology, 2009. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-19924.

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<p>High power impulse magnetron sputtering (HiPIMS) is a novel pulsed power technique. In HiPIMS, high power pulses are applied to the target for short duration with a low duty factor. It provides a high degree of ionization of the sputtered material (in some cases up to 90%) and a high plasma density (10<sup>19</sup> m<sup>-3</sup>) which results in densification of the grown films. Recently a large side-transport of the sputtered material has been discovered, meaning that the sputtered material is transported radially outwards, parallel to the cathode surface. In this research, we use this e
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Lai, Chung-Chuan. "Growth and Phase Stability of Titanium Aluminum Nitride Deposited by High Power Impulse Magnetron Sputtering." Thesis, Linköpings universitet, Plasma och beläggningsfysik, 2011. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-68922.

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In this work, we investigate the relation between the diffusion behavior of Ti1-xAlxN at elevated temperatures and the microstructure. Thinfilm samples are synthesized by reactive co-sputtering with two cathodes. One cathode equipped with Ti target is connected to a highpower impulse magnetron sputtering (HiPIMS) power supply, and the other cathode equipped with Al target is operated with a directcurrent power source. The spinodal decomposition of cubic metastable Ti1-xAlxN controlled by thermally activated diffusion is observe fordiffusion behavior. Various HiPIMS pulsing frequencies are used
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Dogan, Ilker. "Fabrication And Characterization Of Aluminum Oxide And Silicon/aluminum Oxide Films With Si Nanocrystals Formed By Magnetron Co-sputtering Technique." Master's thesis, METU, 2008. http://etd.lib.metu.edu.tr/upload/12609687/index.pdf.

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DC and RF magnetron co-sputtering techniques are one of the most suitable techniques in fabrication of thin films with different compositions. In this work, Al2O3 and Si/Al2O3 thin films were fabricated by using magnetron co-sputtering technique. For Al2O3 films, the stoichiometric, optical and crystallographic analyses were performed. For Si contained Al2O3 films, the formation conditions of Si nanocrystals were investigated. To do so, these thin films were sputtered on Si (100) substrates. Post annealing was done in order to clarify the evolution of Al2O3 matrix and Si nanocrystals at differ
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Chamorro, Coral William. "Microstructure, chemistry and optical properties in ZnO and ZnO-Au nanocomposite thin films grown by DC-reactive magnetron co-sputtering." Thesis, Université de Lorraine, 2014. http://www.theses.fr/2014LORR0253/document.

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Les matériaux composites peuvent présenter des propriétés qu'aucun des composants individuels ne présente. En outre, à l'échelle du nanomètre les nanocomposites peuvent présenter de nouvelles propriétés par rapport à l'état massif ou à des macrocomposites des mêmes composants en raison d’effets de confinement et d’effets quantiques liés à la taille. Les nanocomposites semi-conducteur/métal sont très intéressants en raison de leurs uniques propriétés catalytiques et opto-électroniques et la possibilité de les ajuster facilement. Ce travail de thèse étudie les interactions spécifiques et les pro
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Chamorro, Coral William Adolfo Verfasser], and Frank [Akademischer Betreuer] [Mücklich. "Microstructure, chemistry and optical properties in ZnO and ZnO-Au nanocomposite thin films grown by DC-reactive magnetron co-sputtering / William Adolfo Chamorro Coral ; Betreuer: Frank Mücklich." Saarbrücken : Saarländische Universitäts- und Landesbibliothek, 2015. http://d-nb.info/1136608052/34.

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Gencer, Imer Arife. "Si Nanocrystals In Sic Matrix And Infrared Spectroscopy Of In A Dielecric Matrix." Phd thesis, METU, 2010. http://etd.lib.metu.edu.tr/upload/3/12611778/index.pdf.

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This study focuses on various aspects of nanocrystals embedded in a dielectric matrix. In the first part of this work, a new approach with the use of Fourier Transform Infrared spectroscopy (FTIR) in the nanocrystal analysis was developed and presented. Si and Ge nanocrystals embedded in SiO2 matrix were mainly studied. This new approach is based on the analysis of structural variations of SiO2 matrix during the formation of semiconductor nanocrystlas. It is shown that the chemical and structural variations of the host matrix are directly related to the precipitation of nanocrystals in it. Thi
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Mahadeva, Sreekanth. "Magnetism in Band Gap Engineered Sputtered MgxZn(1-x)O Thin Films." Doctoral thesis, KTH, Materialteknologi, 2013. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-122488.

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This dissertation presents a comprehensive study of the intrinsic room temperature ferromagnetism, RTFM, in technologically important thin films of ZnO, MgO, Mg@ZnO, the so-called d0–magnets that do not contain any intrinsic magnetic elements. We also present the first report on magnetism in Mn doped MgO films fabricated by dc magnetron sputtering. We have just published (April 2013 ‘on-line’) a state of the art review entitled ‘p-type ZnO Theory, growth, properties, and devices’ in the prestigious journal ‘Progress in Materials Science’, summarizing the recent advances of the studies on p-typ
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Xu, Ziwen. "Phase transformation and properties of magnetron co-sputtered GeSi thin films." Click to view the E-thesis via HKUTO, 2008. http://sunzi.lib.hku.hk/hkuto/record/B39848772.

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Book chapters on the topic "Magnetron Co-Sputtering"

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Wuhrer, Richard, and Wing Yiu Yeung. "Magnetron Co-Sputtering of Nanostructured Chromium Aluminium Nitride Coatings." In Materials Science Forum. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-960-1.4001.

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Ma, Jianping, Jingjing Chen, and Jiayu Qi. "Preparation and characterization of Mo-doped In2O3 thin films with magnetron Co-sputtering." In Energy Revolution and Chemical Research. CRC Press, 2022. http://dx.doi.org/10.1201/9781003332657-98.

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Eisenmenger-Sittner, C., H. Bangert, A. Bergauer, and W. Bauer. "Co-Deposition by Magnetron Sputtering as Promising Method to Produce Wear Reducing Multi Component Coatings." In Protective Coatings and Thin Films. Springer Netherlands, 1997. http://dx.doi.org/10.1007/978-94-011-5644-8_4.

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Sonoda, Tsutomu, Akira Watazu, Kiyotaka Katou, Takahiko Yamada, and Tadashi Asahina. "Surface Modification of Aluminum Alloy with Ti/C Compositionally Gradient Film by Magnetron Co-sputtering." In Surface Modification Technologies XVIII: Proceedings of the Eighteenth International Conference on Surface Modification Technologies Held in Dijon, France November 15-17, 2004: v. 18, 18th ed. CRC Press, 2023. http://dx.doi.org/10.1201/9781003423874-69.

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Strnad, G., D. Biro, and I. Vida-Simiti. "Contributions to Processing of Self-Lubricated, Nanocomposite Wear Resistant Coatings by Reactive UM Magnetron Co-Sputtering." In Materials and Technologies. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-460-x.197.

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Zhou, Ji Cheng, and Jian Wu Yan. "Microstructure and Electrical Properties of Nano Ni-Cr Thin-Films Fabricated by Magnetron Co-Sputtering Techniques." In Materials Science Forum. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-462-6.1201.

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García-González, L., J. Morales-Hernández, F. J. Espinoza-Beltrán, J. Muñoz-Saldaña, T. Scholz, and Gerold A. Schneider. "Thermal Stability, Structure and Mechanical Properties of TiSiN Coatings Prepared by Reactive DC Magnetron Co-Sputtering." In Materials Science Forum. Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/0-87849-993-8.93.

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Liu, Zhuang, Lin Zhu, Hanlin Yang, Jiang Chang, and Wenping Cao. "SiO x /TiO y /C z H t Composite Coatings Prepared by Magnetron Co-sputtering on Substrate Paper." In Lecture Notes in Electrical Engineering. Springer Singapore, 2018. http://dx.doi.org/10.1007/978-981-10-7629-9_72.

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Son, Chang Sik, Jae Sung Hur, Byoung Hoon Lee, et al. "Multi-Component ZnO-In2O3-SnO2Thin Films Deposited by RF Magnetron Co-Sputtering." In Solid State Phenomena. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/3-908451-31-0.119.

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Chen, Xiao Bai, Hong Qiu, Hao Qian, et al. "Effect of Annealing Temperature on Characteristics of Ni76Fe24 Films Deposited on SiO2/Si(100) by DC Magnetron Co-Sputtering." In Materials Science Forum. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-960-1.3725.

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Conference papers on the topic "Magnetron Co-Sputtering"

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Wei, Ronghua, Marta A. Jakab, Kent Coulter, and A. M. Abd El-Rahman. "Plasma Surface Engineering of Materials for Corrosion Protection." In CORROSION 2010. NACE International, 2010. https://doi.org/10.5006/c2010-10261.

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Abstract The surface of a component is very critical to maintain the proper functions when it is directly exposed to a very harsh environment. Various commercial treatments are available to enhance the surface properties including heat treatment and painting. For over a half of a century, plasmas have been studied for enhancing the surface properties of materials, and in some areas plasma surface engineering is applied to industrial components. In this paper, we will discuss the latest research in this area and various technologies with the emphasis on materials corrosion protection. SwRI has
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Pokora, Patrycja, Damian Wojcieszak, Malwina Sikora, Szymon Kiełczawa, and Paweł Chodasewicz. "Influence of Co-content on optical and structural properties of amorphous (T,Co)Ox thin-film coatings." In Optical Interference Coatings. Optica Publishing Group, 2022. http://dx.doi.org/10.1364/oic.2022.td.10.

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Non-stoichiometric (Ti,Co)Ox coatings were prepared by gas impulse magnetron sputtering. Impulse ignited Ar:O2 plasma with low oxygen content (6%) resulted in amorphous and semiconducting coatings which transparency dependent from Co-content.
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Aspanut, Z., C. K. Wah, C. S. Kong, et al. "Fabrication and characterization of co-sputtering Au/SiO2 thin films prepared by RF magnetron sputtering." In 2010 IEEE 3rd International Nanoelectronics Conference (INEC). IEEE, 2010. http://dx.doi.org/10.1109/inec.2010.5425097.

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Kotrla, Magdalena, Jan Gutwirth, Petr Janíček, et al. "Fabrication and characterization of Sb-Te based thin films containing gallium." In Integrated Photonics Research, Silicon and Nanophotonics. Optica Publishing Group, 2023. http://dx.doi.org/10.1364/iprsn.2023.jtu4a.3.

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Pei, Yili, Ping Wu, Xianfei Li, Murad A. Khaskheli, Sen Chen, and Shiping Zhang. "Sputtering Power on Electrical Characteristics of Er,Ti Co-Doped HfO2 Films." In ASME 2011 International Mechanical Engineering Congress and Exposition. ASMEDC, 2011. http://dx.doi.org/10.1115/imece2011-65160.

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Er,Ti co-doped HfO2 films, as candidate of the gate dielectric material for CMOS technology, were deposited on n-Si (100) by radio frequency magnetron sputtering. The dielectric characteristics of the films were compared with different sputtering powers. The surface morphology of HfTiErO was observed by atomic force microscopy (AFM). The thickness of the films was determined by SGC-10 film calibrator. The results show that the growth rate nearly has a linear increase with the sputtering power rising, the film with sputtering power 40W, 100W or 120W has better surface topography, the sputtering
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Murphy, Neil, Lirong Sun, and John T. Grant. "Modeling and simulation of reactive magnetron co-sputtering for mixed oxide coatings." In Optical Interference Coatings. OSA, 2016. http://dx.doi.org/10.1364/oic.2016.wb.6.

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Domaradzki, Jaroslaw, Michal Mazur, Damian Wojcieszak, Artur Wiatrowski, and Ewa Mankowska. "Analysis of optical properties of transparent (Ti,Cu)Ox gradient thin film." In Optical Interference Coatings. Optica Publishing Group, 2022. http://dx.doi.org/10.1364/oic.2022.td.5.

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Performed reverse engineering analysis showed the complex dependence of the optical properties on the material composition and the microstructure properties of the (Ti,Cu)Ox gradient thin film prepared using multi-magnetron co-sputtering.
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Sun, Lirong, John G. Jones, and Peter R. Stevenson. "Tuning the Optical Properties of Niobium-doped ZnO Films." In Optical Interference Coatings. Optica Publishing Group, 2022. http://dx.doi.org/10.1364/oic.2022.td.4.

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Nb-doped ZnO (NZO) thin films were prepared using reactive magnetron co-sputtering of Nb and Zn sources. Tailoring the infrared optical properties of NZO films can be achieved and applied for desired optical coating applications.
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Peng, Ssu-Hsiang, Chien-Cheng Kuo, Meng-Chi Li, Shu-Hui Tsai, and Cheng-Chung Lee. "Nb-doped TiO 2 transparent conducting coating by pulsed DC magnetron co-sputtering." In SPIE Optical Engineering + Applications, edited by R. Barry Johnson, Virendra N. Mahajan, and Simon Thibault. SPIE, 2010. http://dx.doi.org/10.1117/12.860483.

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Min Yuan, Li-Chun Pu, Wen-Lin Feng, and Peng Chen. "Growth of Co thin films by magnetron sputtering method and its performance analysis." In 2011 International Conference on Electronics and Optoelectronics (ICEOE). IEEE, 2011. http://dx.doi.org/10.1109/iceoe.2011.6013252.

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