Relevant bibliographies by topics / Magnetron Sputtern

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Academic literature on the topic 'Magnetron Sputtern'

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Published: 4 June 2021
Last updated: 1 February 2022

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Journal articles on the topic "Magnetron Sputtern"

1

Seyfert, Ulf, Ulrich Heisig, Götz Teschner, and Johannes Strümpfel. "40 Jahre industrielles Magnetron-Sputtern in Europa." Vakuum in Forschung und Praxis 27, no. 6 (December 2015): 21–26. http://dx.doi.org/10.1002/vipr.201500596.

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2

Gubisch, M., L. Spieß, H. Romanus, J. Schawohl, and Ch Knedlik. "Bias-Magnetron Sputtern von Wolframkarbid-Schichten auf Stahl." Materialwissenschaft und Werkstofftechnik 35, no. 10-11 (October 2004): 916–23. http://dx.doi.org/10.1002/mawe.200400812.

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3

Fahland, M., and V. Kirchhoff. "Puls Magnetron Sputtern von optischen Mehrlagenschichten auf Kunststofffolien." Vakuum in Forschung und Praxis 12, no. 4 (August 2000): 243–47. http://dx.doi.org/10.1002/1522-2454(200008)12:4<243::aid-vipr243>3.0.co;2-b.

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4

Wolke, Joop G. C., Jeroen J. J. P. van den Beucken, and John A. Jansen. "Growth Behavior of Rat Bone Marrow Cells on RF Magnetron Sputtered Bioglass- and Calcium Phosphate Coatings." Key Engineering Materials 361-363 (November 2007): 253–56. http://dx.doi.org/10.4028/www.scientific.net/kem.361-363.253.

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The RF magnetron sputter technique was used to deposit Bioglass (BG) and hydroxyapatite (HA) coatings onto titanium substrates. The aim of this study was evaluated the growth behavior of rat bone marrow cells of various deposited coatings. The EDS measurements demonstrated that the composition BG coating was changed during magnetron sputtering. The rat bone marrow derived osteoblast-like cells showed improved osteogenic response on crystalline magnetron sputtered HA coatings compared BG coatings. Scanning electron microscopical examination showed an extensive mineralization after 16 days of culture, while on the surface of the BG coating only a multilayer without mineralization could be observed.
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5

Gledhill, Steyer, Weiss, and Hildebrandt. "HiPIMS and DC Magnetron Sputter-Coated Silver Films for High-Temperature Durable Reflectors." Coatings 9, no. 10 (September 20, 2019): 593. http://dx.doi.org/10.3390/coatings9100593.

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High-temperature durable mirrors based on a protected silver sputter coating are attractive for secondary reflector applications in concentrated solar thermal power plants. In this paper, silver films are deposited by high-power impulse magnetron sputtering (HiPIMS) and standard direct current (DC) magnetron sputtering, either as exposed discretely deposited films or in-sequence-deposited thin film systems, where the silver is protected and embedded between adhesion and barrier layers. The unprotected silver films and equivalent protected silver thin film systems are compared and characterized as deposited and after 400 °C oven temperature exposure. The reflectance is measured and grazing incident X-ray diffraction (GIXRD) and scanning electron microscopy (SEM) pictures were taken. The HiPIMS silver film, sputtered with a peak current of 200 A and an approximately equivalent average power density to the DC magnetron sputtered silver, exhibits higher reflectance (and conductivity). Increasing the power density further, yields silver films with lower reflectance, correlating to a reduced grain size. In the protected silver film system, the reflectance does not improve, due to the presence of a less reflective top adhesion layer. The protected film system, with the 200 A HiPIMS, is, however, more durable at 400 °C than the DC magnetron sputtered equivalent.
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Fox, G. R., and P. A. Danai. "ZnO microtubes." Journal of Materials Research 9, no. 11 (November 1994): 2737–40. http://dx.doi.org/10.1557/jmr.1994.2737.

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Microtubes of ZnO have been produced using sputter coating and a fugitive phase technique. ZnO was sputtered onto polyester fibers by dc magnetron sputtering, and the polyester fiber fugitive phase was subsequently burned out by annealing in air or oxygen. Tubes with an inside diameter of 23 μm and a length of 3 cm were obtained. The 3 to 6 μm thick walls of the tubes exhibited a [002] radial texture.
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Šimůrka, Lukáš, Selen Erkan, and Tuncay Turutoglu. "Characterization of Silicon Nitride Thin Films on Glass." Defect and Diffusion Forum 368 (July 2016): 86–90. http://dx.doi.org/10.4028/www.scientific.net/ddf.368.86.

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The influence of process parameters on amorphous reactively sputtered silicon nitride thin films is reported in this study. The films were prepared with various argon and nitrogen flows, and sputter power in in-line horizontal coater by DC magnetron reactive sputtering from Si (10% Al) target. Refractive index and mechanical properties like residual stress, hardness and elastic modulus were studied. We show that process pressure has an important influence on mechanical properties of the sputtered film. On the other hand, the nitrogen content is the key factor for the optical properties of the films.
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8

Ruano, Manuel, Lidia Martínez, and Yves Huttel. "Investigation of the Working Parameters of a Single Magnetron of a Multiple Ion Cluster Source: Determination of the Relative Influence of the Parameters on the Size and Density of Nanoparticles." Dataset Papers in Science 2013 (August 18, 2013): 1–8. http://dx.doi.org/10.1155/2013/597023.

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Multiple Ion Cluster Source (MICS) is the new optimized route of a standard technique based on a sputtering gas aggregation source, the Ion Cluster Source. The single magnetron used in the standard Ion Cluster Source is replaced by three magnetrons inside the aggregation zone, and they are controlled individually in order to fabricate nanoparticles with the desired and tunable chemical composition. Apart from the working parameters of each magnetron, it is also reported that the relation between the working parameters of individual magnetrons is of prime importance for the control of both the size and density of the nanoparticles. The influences of fluxes of the sputtering gas applied to each magnetron, the total gas flux in the aggregation zone, the position in the aggregation zone of Ag magnetron, and the relative position of the magnetrons in the aggregation zone have been studied through the operation of one of the magnetrons loaded with a silver target.
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9

Julien, Mauger, and Hussain. "Sputtered LiCoO2 Cathode Materials for All-solid-state Thin-film Lithium Microbatteries." Materials 12, no. 17 (August 22, 2019): 2687. http://dx.doi.org/10.3390/ma12172687.

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This review article presents the literature survey on radio frequency (RF)-magnetron sputtered LiCoO2 thin films used as cathode materials in all-solid-state rechargeable lithium microbatteries. As the process parameters lead to a variety of texture and preferential orientation, the influence of the sputtering conditions on the deposition of LiCoO2 thin films are considered. The electrochemical performance is examined as a function of composition of the sputter Ar/O2 gas mixture, gas flow rate, pressure, nature of substrate, substrate temperature, deposition rate, and annealing temperature. The state-of-the-art of lithium microbatteries fabricated by the rf-sputtering method is also reported.
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10

ZHANG, Q., Q. M. MAO, J. Z. RUAN, Q. J. WANG, X. L. YANG, Z. J. ZHAO, H. L. SEET, and X. P. LI. "GIANT MAGNETO-IMPEDANCE EFFECT OF MAGNETRON SPUTTERED Ni80Fe20/Cu COMPOSITE WIRES." Surface Review and Letters 15, no. 06 (December 2008): 753–56. http://dx.doi.org/10.1142/s0218625x08011019.

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In this work, Ni 80 Fe 20/ Cu composite wires of length 50 mm, consisting a Cu core of diameter 100 μm, coated with a layer of Ni 80 Fe 20, were produced by RF magnetron sputtering. To obtain a uniform coating, the wires were spun during sputtering by a homemade system. The results showed that the spinning speed might affect the maximum MI ratio and the magnetic properties. The MI ratio of the sputtered wires increases with the wire spinning speed in the magnetron sputtering. The film thickness had a significant effect on the magnitude and the optimum frequency of the giant magneto-impedance effect. The maximum MI ratio can reach about 247.4% for the specimen with a Ni 80 Fe 20 coating thickness of 2.81 μm at 400 kHz. This large MI effect, obtained at such low frequency range, was correlated with the electromagnetic interaction between the inner core and the magnetic coating.
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Dissertations / Theses on the topic "Magnetron Sputtern"

1

Pflug, Andreas. "Simulation des reaktiven Magnetron-Sputterns /." Stuttgart : Fraunhofer-IRB-Verl, 2007. http://deposit.d-nb.de/cgi-bin/dokserv?id=2938746&prov=M&dok_var=1&dok_ext=htm.

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2

Cantelli, Valentina. "Growth, structure and magnetic properties of magnetron sputtered FePt thin films." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2010. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-27631.

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The L10 FePt phase belongs to the most promising hard ferromagnetic materials for high density recording media. The main challenges for thin FePt films are: (i) to lower the process temperature for the transition from the soft magnetic A1 to the hard magnetic L10 phase, (ii) to realize c-axes preferential oriented layers independently from the substrate nature and (iii) to control layer morphology supporting the formation of FePt - L10 self-organized isolated nanoislands towards an increase of the signal-to-noise ratio. In this study, dc magnetron sputtered FePt thin films on amorphous substrates were inve-stigated. The work is focalized on the correlation between structural and magnetic properties with respect to the influence of deposition parameters like growth mode (co-sputtering vs. layer – by - layer) and the variation of the deposition gas (Ar, Xe) or pressure (0.3 - 3 Pa). In low-pressure Ar discharges, high energetic particle impacts support vacancies formation during layer growth lowering the phase transition temperature to (320 +/- 20)°C. By reducing the particle kinetic energy in Xe discharges, highly (001) preferential oriented L10 - FePt films were obtained on a-SiO2 after vacuum annealing. L10 - FePt nano-island formation was supported by the introduction of an Ag matrix, or by random ballistic aggregation and atomic self shadowing realized by FePt depositions at very high pressure (3 Pa). The high coercivity (1.5 T) of granular, magnetic isotropic FePt layers, deposited in Ar discharges, was measured with SQUID magnetometer hysteresis loops. For non-granular films with (001) preferential orientation the coercivity decreased (0.6 T) together with an enhancement of the out-of- plane anisotropy. Nanoislands show a coercive field close to the values obtained for granular layers but exhibit an in-plane easy axis due to shape anisotropy effects. An extensive study with different synchrotron X-ray scattering techniques, mainly performed at the ESRF, BM-20 (ROBL-Beamline), pointed out the importance of in-situ investigations to clearly understand the kinetic mechanism of the A1 to L10 transition and ordering and to control FePt nanoclusters evolution.
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3

Weber, Jörn Christian [Verfasser]. "Reaktive Abscheidung von SiOxNy-Schichten durch Puls-Magnetron-Sputtern / Jörn Christian Weber." München : Verlag Dr. Hut, 2010. http://d-nb.info/1222187760/34.

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4

Güttler, Dominik. "An Investigation of Target Poisoning during Reactive Magnetron Sputtering." Doctoral thesis, Technische Universität Dresden, 2008. https://tud.qucosa.de/id/qucosa%3A23651.

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Objective of the present work is a broad investigation of the so called &quot;target poisoning&quot; during magnetron deposition of TiN in an Ar/N2 atmosphere. Investigations include realtime in-situ ion beam analysis of nitrogen incorporation at the Ti sputter target during the deposition process and the analysis of particle uxes towards and from the target by means of energy resolved mass spectrometry. For experiments a planar, circular DC magnetron, equipped with a 2 inch titanium target was installed in an ultrahigh vacuum chamber which was attached to the beam line system of a 5 MV tandem accelerator. A manipulator allows to move the magnetron vertically and thereby the lateral investigation of the target surface. During magnetron operation the inert and reactive gas flow were adjusted using mass flow controllers resulting in an operating pressure of about 0.3 Pa. The argon flow was fixed, whereas the nitrogen flow was varied to realize different states of target poisoning. In a fi?rst step the mass spectrometer was used to verify and measure basic plasma properties e.g. the residual gas composition, the behavior of reactive gas partial pressure, the plasma potential and the dissociation degree of reactive gas molecules. Based on the non-uniform appearance of the magnetron discharge further measurements were performed in order to discuss the role of varying particle fluxes across the target during the poisoning process. Energy and yield of sputtered particles were analyzed laterally resolved, which allows to describe the surface composition of the target. The energy resolving mass spectrometer was placed at substrate position and the target surface was scanned by changing the magnetron position correspondingly. It was found, that the obtained energy distributions (EDF) of sputtered particles are influenced by their origin, showing signi?ficant differences between the center and the erosion zone of the target. These results are interpreted in terms of laterally different states of target poisoning, which results in a variation of the surface binding energy. Consequently the observed energy shift of the EDF indicates the metallic or already poisoned fraction on target surface. Furthermore the EDF's obtained in reactive sputtering mode are broadened. Thus a superposition of two components, which correspond to the metallic and compound fractions of the surface, is assumed. The conclusion of this treatment is an discrete variation of surface binding energy during the transition from metallic to compound target composition. The reactive gas target coverage as derived from the sputtered energy distributions is in reasonable agreement with predictions from model calculations. The target uptake of nitrogen was determined by means of ion beam analysis using the 14N(d, )12C nuclear reaction. Measurements at varying nitrogen gas flow directly demonstrate the poisoning eff?ect. The reactive gas uptake saturates at a maximum nitrogen areal density of about 1.1016 cm-2 which corresponds to the stoichiometric limit of a 3 nm TiN layer. At sufficiently low reactive gas flow a scan across the target surface discloses a pronounced lateral variation of target poisoning, with a lower areal density in the target race track compared to the target center and edge. Again the findings are reproduced by model calculations, which confirm that the balance of reactive gas injection and sputter erosion is shifted towards erosion in the race track. Accomplished computer simulations of the reactive sputtering process are similar to Berg's well known model. Though based on experimental findings the algorithm was extended to an analytical two layer model which includes the adsorption of reactive gas as well as its different kinds of implantation. A distribution of ion current density across the target diameter is introduced, which allows a more detailed characterization of the processes at the surface. Experimental results and computer simulation have shown that at sufficiently low reactive gas flow, metallic and compound fractions may exist together on the target surface, which is in contradiction to previous simulations, where a homogeneous reactive gas coverage is assumed. Based on the results the dominant mechanisms of nitrogen incorporation at different target locations and at varying reactive gas admixture were identified.
Gegenstand der Arbeit ist die Untersuchung der Targetvergiftung beim reaktiven Magnetronsputtern von TiN in Argon-Sticksoff Atmosphäre. Die Untersuchungen beinhalten die Echtzeit in-situ Ionenstrahlanalyse des Stickstoffeinbaus in das Titantarget während des Depositionsprozesses sowie die Analyse der Teilchenflüsse vom – und hin zum Sputtertarget mittels energieaufgelöster Massenspektrometrie. Das Magnetron wurde in einer Vakuumkammer installiert, welche an die Beamline des 5 MV Tandembeschleunigers angeschlossen war. Die Position des Magnetrons konnte mittels eines Manipulator verändert werden, was die laterale Untersuchung der Targetoberfläche ermöglichte. Während des Magnetronbetriebes wurde der Argonfluss in die Kammer konstant gehalten, während der Stickstofffluss variiert wurde um verschiedene Ausprägungen der Targetvergiftung zu erreichen. In einem ersten Schritt wurden die Eigenschaften des Plasmas, z.B. die Zusammensetzung des Sputtergases, das Verhalten des Reaktivgaspartialdruckes, das Plasmapotenzial und der Dissoziationsgrad der Reaktivgasmoleküle im Plasma, mit dem Massenspektrometer ermittelt. Aufgrund der ungleichmäßigen Gasentladung vor dem Magnetrontarget, wurden auch lateral variierende Teilchenflüssen und eine ungleichmäßige Targetvergiftung angenommen. Die Energie und die Ausbeute von gesputterten Teilchen wurde deshalb lateral aufgelöst untersucht. Das Massenspektrometer wurde zu diesem Zweck am Ort des Substrates positioniert und die Targetoberfläche konnte gescannt werden indem die Magnetronposition verändert wurde. Die so aufgenommenen Energieverteilungen der gesputterten Teilchen zeigen eine räumliche Abhängigkeit. Teilchen die aus dem Targetzentrum stammen unterscheiden sich hinsichtlich ihrer Energie signifikant von den Teilchen die in der Target-Erosionszone gesputtert werden. Dieses Resultat zeigt die ungleichmäßige Targetvergiftung, wodurch es zu einer Veränderung der Oberflächenbindungsenergie kommt. Über die Verschiebung in der Energieverteilung lässt sich somit der Zustand der Targetoberfläche beschreiben. Diese experimentellen Ergebnisse zeigen Übereinstimmung mit den Ergebnissen der Modellrechnungen. Der Stickstoffgehalt des Targets wurde weiterhin mittels Ionenstrahlanalyse (NRA) bestimmt. Messungen bei verschiedenen Stickstoffflüssen demonstrieren direkt die Vergiftung des Targets. Die maximale Stickstoffkonzentration sättigt bei einem Wert, der dem Stickstoffgehalt in einer ca. 3 nm dicken Titannitridschicht entspricht. Bei ausreichend niedrigem Stickstofffluss zeigt die Messung quer über den Targetdurchmesser eine Variation im Stickstoffgehalt. Die Stickstoffkonzentration in der Erosionszone ist deutlich geringer als im Targetzentrum oder am Targetrand. Die Resultate wurden wiederum durch Modellrechnungen bestätigt. Die durchgeführten Computersimulationen basieren auf Sören Bergs Modell des reaktiven Sputterprozesses. Der Algorithmus wurde jedoch auf der Basis der experimentellen Ergebnisse erweitert. Das Modell beinhaltet nun Mechanismen des Reaktivgaseinbaus in das Target, wie Adsorption, Implantation und Recoilimplantation. Des Weiteren wurde die Ionenstromverteilung als Funktion des Targetdurchmessers in das Modell aufgenommen, was eine detailliertere Beschreibung des Prozesses ermöglicht. Die experimentellen Ergebnisse und die Resultate der Computersimulation zeigen, dass bei niedrigen Reaktivgasflüssen metallische und vergiftete Bereiche auf der Targetoberfläche gemeinsam existieren. Das ist im Widerspruch zu älteren Simulationen, in denen von einer homogenen Targetbedeckung durch das Reaktivgas ausgegangen wird. Basierend auf den Ergebnissen wurden die dominierenden Mechanismen des Reaktivgaseinbaus in das Sputtertarget, in Abhängigkeit von der Position und von der Sputtergaszusammensetzung, identifiziert.
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5

Güttler, Dominik. "An Investigation of Target Poisoning during Reactive Magnetron Sputtering." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2009. http://nbn-resolving.de/urn:nbn:de:bsz:14-ds-1240493527858-26662.

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Objective of the present work is a broad investigation of the so called &quot;target poisoning&quot; during magnetron deposition of TiN in an Ar/N2 atmosphere. Investigations include realtime in-situ ion beam analysis of nitrogen incorporation at the Ti sputter target during the deposition process and the analysis of particle uxes towards and from the target by means of energy resolved mass spectrometry. For experiments a planar, circular DC magnetron, equipped with a 2 inch titanium target was installed in an ultrahigh vacuum chamber which was attached to the beam line system of a 5 MV tandem accelerator. A manipulator allows to move the magnetron vertically and thereby the lateral investigation of the target surface. During magnetron operation the inert and reactive gas flow were adjusted using mass flow controllers resulting in an operating pressure of about 0.3 Pa. The argon flow was fixed, whereas the nitrogen flow was varied to realize different states of target poisoning. In a fi?rst step the mass spectrometer was used to verify and measure basic plasma properties e.g. the residual gas composition, the behavior of reactive gas partial pressure, the plasma potential and the dissociation degree of reactive gas molecules. Based on the non-uniform appearance of the magnetron discharge further measurements were performed in order to discuss the role of varying particle fluxes across the target during the poisoning process. Energy and yield of sputtered particles were analyzed laterally resolved, which allows to describe the surface composition of the target. The energy resolving mass spectrometer was placed at substrate position and the target surface was scanned by changing the magnetron position correspondingly. It was found, that the obtained energy distributions (EDF) of sputtered particles are influenced by their origin, showing signi?ficant differences between the center and the erosion zone of the target. These results are interpreted in terms of laterally different states of target poisoning, which results in a variation of the surface binding energy. Consequently the observed energy shift of the EDF indicates the metallic or already poisoned fraction on target surface. Furthermore the EDF's obtained in reactive sputtering mode are broadened. Thus a superposition of two components, which correspond to the metallic and compound fractions of the surface, is assumed. The conclusion of this treatment is an discrete variation of surface binding energy during the transition from metallic to compound target composition. The reactive gas target coverage as derived from the sputtered energy distributions is in reasonable agreement with predictions from model calculations. The target uptake of nitrogen was determined by means of ion beam analysis using the 14N(d, )12C nuclear reaction. Measurements at varying nitrogen gas flow directly demonstrate the poisoning eff?ect. The reactive gas uptake saturates at a maximum nitrogen areal density of about 1.1016 cm-2 which corresponds to the stoichiometric limit of a 3 nm TiN layer. At sufficiently low reactive gas flow a scan across the target surface discloses a pronounced lateral variation of target poisoning, with a lower areal density in the target race track compared to the target center and edge. Again the findings are reproduced by model calculations, which confirm that the balance of reactive gas injection and sputter erosion is shifted towards erosion in the race track. Accomplished computer simulations of the reactive sputtering process are similar to Berg's well known model. Though based on experimental findings the algorithm was extended to an analytical two layer model which includes the adsorption of reactive gas as well as its different kinds of implantation. A distribution of ion current density across the target diameter is introduced, which allows a more detailed characterization of the processes at the surface. Experimental results and computer simulation have shown that at sufficiently low reactive gas flow, metallic and compound fractions may exist together on the target surface, which is in contradiction to previous simulations, where a homogeneous reactive gas coverage is assumed. Based on the results the dominant mechanisms of nitrogen incorporation at different target locations and at varying reactive gas admixture were identified
Gegenstand der Arbeit ist die Untersuchung der Targetvergiftung beim reaktiven Magnetronsputtern von TiN in Argon-Sticksoff Atmosphäre. Die Untersuchungen beinhalten die Echtzeit in-situ Ionenstrahlanalyse des Stickstoffeinbaus in das Titantarget während des Depositionsprozesses sowie die Analyse der Teilchenflüsse vom – und hin zum Sputtertarget mittels energieaufgelöster Massenspektrometrie. Das Magnetron wurde in einer Vakuumkammer installiert, welche an die Beamline des 5 MV Tandembeschleunigers angeschlossen war. Die Position des Magnetrons konnte mittels eines Manipulator verändert werden, was die laterale Untersuchung der Targetoberfläche ermöglichte. Während des Magnetronbetriebes wurde der Argonfluss in die Kammer konstant gehalten, während der Stickstofffluss variiert wurde um verschiedene Ausprägungen der Targetvergiftung zu erreichen. In einem ersten Schritt wurden die Eigenschaften des Plasmas, z.B. die Zusammensetzung des Sputtergases, das Verhalten des Reaktivgaspartialdruckes, das Plasmapotenzial und der Dissoziationsgrad der Reaktivgasmoleküle im Plasma, mit dem Massenspektrometer ermittelt. Aufgrund der ungleichmäßigen Gasentladung vor dem Magnetrontarget, wurden auch lateral variierende Teilchenflüssen und eine ungleichmäßige Targetvergiftung angenommen. Die Energie und die Ausbeute von gesputterten Teilchen wurde deshalb lateral aufgelöst untersucht. Das Massenspektrometer wurde zu diesem Zweck am Ort des Substrates positioniert und die Targetoberfläche konnte gescannt werden indem die Magnetronposition verändert wurde. Die so aufgenommenen Energieverteilungen der gesputterten Teilchen zeigen eine räumliche Abhängigkeit. Teilchen die aus dem Targetzentrum stammen unterscheiden sich hinsichtlich ihrer Energie signifikant von den Teilchen die in der Target-Erosionszone gesputtert werden. Dieses Resultat zeigt die ungleichmäßige Targetvergiftung, wodurch es zu einer Veränderung der Oberflächenbindungsenergie kommt. Über die Verschiebung in der Energieverteilung lässt sich somit der Zustand der Targetoberfläche beschreiben. Diese experimentellen Ergebnisse zeigen Übereinstimmung mit den Ergebnissen der Modellrechnungen. Der Stickstoffgehalt des Targets wurde weiterhin mittels Ionenstrahlanalyse (NRA) bestimmt. Messungen bei verschiedenen Stickstoffflüssen demonstrieren direkt die Vergiftung des Targets. Die maximale Stickstoffkonzentration sättigt bei einem Wert, der dem Stickstoffgehalt in einer ca. 3 nm dicken Titannitridschicht entspricht. Bei ausreichend niedrigem Stickstofffluss zeigt die Messung quer über den Targetdurchmesser eine Variation im Stickstoffgehalt. Die Stickstoffkonzentration in der Erosionszone ist deutlich geringer als im Targetzentrum oder am Targetrand. Die Resultate wurden wiederum durch Modellrechnungen bestätigt. Die durchgeführten Computersimulationen basieren auf Sören Bergs Modell des reaktiven Sputterprozesses. Der Algorithmus wurde jedoch auf der Basis der experimentellen Ergebnisse erweitert. Das Modell beinhaltet nun Mechanismen des Reaktivgaseinbaus in das Target, wie Adsorption, Implantation und Recoilimplantation. Des Weiteren wurde die Ionenstromverteilung als Funktion des Targetdurchmessers in das Modell aufgenommen, was eine detailliertere Beschreibung des Prozesses ermöglicht. Die experimentellen Ergebnisse und die Resultate der Computersimulation zeigen, dass bei niedrigen Reaktivgasflüssen metallische und vergiftete Bereiche auf der Targetoberfläche gemeinsam existieren. Das ist im Widerspruch zu älteren Simulationen, in denen von einer homogenen Targetbedeckung durch das Reaktivgas ausgegangen wird. Basierend auf den Ergebnissen wurden die dominierenden Mechanismen des Reaktivgaseinbaus in das Sputtertarget, in Abhängigkeit von der Position und von der Sputtergaszusammensetzung, identifiziert
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Dietzel, Yvette. "Beschichtung von textilen Flächen mit den PVD-Technologien reaktives Vakuumbogen-Verdampfen und reaktives Magnetron-Sputtern : PVD-Beschichtung von textilen Flächen." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2004. http://nbn-resolving.de/urn:nbn:de:swb:14-1103790814484-00373.

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Gegenstand der wissenschaftlichen Arbeit ist der technologische Nachweis für die Erzeugbarkeit haftfester metallischer und keramischer Schichten auf textilen Flächengebilden mit den PVD-Technologien reaktives Magnetron-Sputtern und reaktives Vakuumbogen-Verdampfen. Basis für die Realisierung der experimentellen Untersuchungen sind sowohl vorhandene industrielle PVD-Beschichtungsanlagen, die im Batchbetrieb arbeiten, als auch Rollcoater als Bindeglied zwischen einer Labor- und einer Industrieanlage. Kern des Vorhabens sind umfangreiche Batchbeschichtungen auf Basis einer breit angelegten Experimentalmatrix bezüglich Substrat- und Schichtauswahl. Gängige Targetmaterialien sind Kupfer, Aluminium und Silber. Um zu zeigen, dass über das thermische Bedampfen hinaus neue Schichten und Schichtsysteme auf textilen Faserstoffen abgeschieden werden können, wurden zusätzlich die Targetmaterialien Titan und Zirkonium in die Untersuchungen einbezogen. Zur Herstellung sowohl metallischer als auch keramischer Schichten wird neben den technologischen Parametern Beschichtungszeit und Schichtmaterial der Reaktivgasfluss variiert. Als Substrate kamen zwei leichtgewichtige PA 6.6-Gewebe mit unterschiedlicher Bindung, ein kalanderverfestigter Vliesstoff aus PES und ein Spinnvliesstoff aus Kern-Mantel-Fasern mit einem PA 6 Mantel zum Einsatz. Zur Verbesserung der Schichthaftungen wurden Versuche zur Vorbehandlung mittels Plasmabehandlung in Argon und Sauerstoff, mit Gasphasenfluorierung sowie HMDSO-Behandlung mit einem PA 6.6-Gewebe durchgeführt. Im Anschluss an die Vorbehandlung wurden die Proben mit Titan und Titannitrid metallisiert. Die Charakterisierung der Substrat-Schicht-Verbunde erfolgt hinsichtlich - der chemischen Zusammensetzungen der Schichten mittels ESCA (Electron Spectroscopy for Chemical Analysis), - der Schichtstrukturen und Fasermorphologien mittels Rasterelektronenmikroskopie, - der E-Moduln an Referenzprobekörpern aus Edelstahl mittels Härtemessung, - der Schichthaftungen durch Waschversuche, Martindale-Scheuertest, Peel-Test und - der funktionellen Schichteigenschaften wie Oberflächenwiderstände, elektromagnetische Schirmdämpfung, Wärmedämmeigenschaften Im Ergebnis der experimentellen Untersuchungen werden grundlegende Erkenntnisse zum Einfluss der PVD-Technologien und der Prozessparameter auf genannte Schicht- und Fasereigenschaften aufgezeigt. Des Weiteren werden die Zusammenhänge zwischen Schichtstruktur, Fasermorphologie und Schichthaftung dargelegt. Aus den Ergebnissen werden Schlussfolgerungen für eine gezielte industrielle Anwendung und Vorschläge für weiterführende wissenschaftliche Arbeiten abgeleitet. Die PVD-Verfahren werden bezüglich ihrer Eignung für die Textilbeschichtung bewertet
Subject of the scientific study is the technological proof for the possibility to generate well adherent metallic and ceramic layers on textile fabrics with the PVD technologies reactive magnetron sputtering and reactive arc evaporation. Basis for the experimental investigations were both an industrial PVD coating device of the batch-type and a roll-coater which is a connective link between a laboratory and an industrial coating device. Extensive batch coatings on basis of a broadly applied experimental matrix in terms of the choice of the substrate and layer material are basis of the project. Usual target materials were copper, aluminium and silver. Additionally, the target materials titanium and zirconium were included in the investigations in order to show that new layers and layer systems can be deposited on textile fabrics by means of the investigated PVD technologies in comparison with thermal evaporation. Apart from the technological parameters coating time and layer material, the reactive gas flow were varied to deposit both metallic and ceramic layers. Substrates used in this study were lightweight Pa 6.6 fabrics with different weaves of the fabric, a calender bonded nonwoven of PES and a spunbonded nonwoven consisting of sheath-core fibers of PES (sheath) and Pa 6 (core). In order to improve the adhesion of layers, different pretreatments of the PA 66 fabric were carried out by means of plasma treatment with argon and oxygen, gas phase fluorination and treatment with HMDSO respectively. Subsequently, the pretreated samples were metallized with titanium and titanium nitride. The characterisation of the substrate layer combinations were carried out regarding - the chemical compositions of the layers by means of ESCA (Electron Spectroscopy for Chemical Analysis), - the layer structures and fiber morphologies by means of raster electron microscopy, - the modulus of elasticity on reference specimens consisting of stainless steel by means of hardness measurement, - the layer adhesion by wash tests, Martindale abrasion test, peel tests and - the functional layer characteristics such as surface resistances, electromagnetic shielding, heat insulating characteristics In the result of the experimental investigations, extensive knowledge to the influence of the PVD technologies and process parameters on layer and fiber characteristics are presented. Furthermore, the correlation of layer structure, fiber morphology and layer adhesion are explained. Conclusions for a selective industrial application and suggestions for further scientific investigations are derived from the results. The PVD procedures are evaluated concerning their suitability for the coating of textiles
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Dießelberg, Marc [Verfasser]. "Herstellung von reibungsarmen amorphen Kohlenstoffschichten mittels reaktivem Magnetron-Sputtern und Analyse deren tribologischer Eigenschaften / Marc Dießelberg." Aachen : Shaker, 2007. http://d-nb.info/1166511634/34.

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Vogel, Michael [Verfasser]. "Herstellung von Aluminiumnitrid Dünnschichten mittels Magnetron Sputtern auf Diamant für potentielle Pseudo-Surface-Acoustic-Wave-Anwendungen / Michael Vogel." Siegen : Universitätsbibliothek der Universität Siegen, 2016. http://d-nb.info/1119808421/34.

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Kaune, Gunar. "Röntgenografische Charakterisierung von Indium-Zinn-Oxid-Dünnschichten." Master's thesis, Universitätsbibliothek Chemnitz, 2006. http://nbn-resolving.de/urn:nbn:de:swb:ch1-200600032.

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Mittels reaktivem Magnetron-Sputtern hergestellte Indium-Zinn-Oxid-Dünnschichten wurden mit den Methoden der Röntgendiffraktometrie und Röntgenreflektometrie charakterisiert. Es konnte gezeigt werden, dass die Wahl des Arbeitspunktes bei der Schichtabscheidung erheblichen Einfluss auf Kristallitorientierung, Gitterkonstante und Größe der Schichtspannung hat. Zusätzlich wurden mittels des Langford-Verfahrens Korngröße und Mikrospannungen bestimmt. Im Rahmen der röntgenografischen Spannungsmessung zeigten sich nichtlineare Verläufe der Dehnung über sin²Ψ, die mit dem Kornwechselwirkungsmodell nach Vook und Witt erklärt werden.
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Neubert, Marcel. "Die Rolle des Sauerstoffanteils in Titandioxid bei Tantal-Dotierung zur Verwendung als transparentes leitfähiges Oxid." Doctoral thesis, Universitätsbibliothek Chemnitz, 2016. http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-197922.

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Im Fokus der vorliegenden Arbeit lag die Untersuchung polykristalliner TiO2:Ta-Schichten, hergestellt mittels Gleichstrom-Magnetron-Sputtern durch Verwendung reduzierter keramischer Targets und anschließender thermischer Nachbehandlung im Vakuum der zunächst nichtleitfähigen amorphen Precursorschichten. Es wurden die physikalischen Zusammenhänge, welche die strukturellen, elektrischen und optischen Eigenschaften der kristallinen TiO2:Ta-Schichten beeinflussen analysiert und dabei eine empfindliche Abhängigkeit vom Sauerstofffluss während der Abscheidung festgestellt. Es zeigte sich, dass die Verringerung der kinetischen Energie der Plasmateilchen beim Magnetron-Sputtern durch die Erhöhung des Gesamtdruckes vorteilhaft ist, um das Wachstum des gegenüber Rutil besser leitfähigen Anatas in Verbindung mit dem für niedrige Widerstände notwendigen Sauerstoffdefizit zu realisieren. Bei einem Gesamtdruck von 2 Pa abgeschiedene polykristalline TiO2:Ta-Schichten haben einen spezifischen Widerstand von 1,5·10-3 Ωcm, eine hohe Ladungsträgermobilität (≈8 cm2V-1s-1) und einen geringen Extinktionskoeffizienten von 0,006. Die Abhängigkeit des elektrischen Widerstandes vom Sauerstoffdefizit in der TiO2:Ta-Schicht wurde unter dem Gesichtspunkt der Ladungsträgeraktivierung sowie der Bildung von Ti-Fehlstellen diskutiert, welche vermutlich zur Kompensation und Lokalisierung von freien Elektronen beitragen. Darüber hinaus wurde zur effizienteren Gestaltung der thermischen Nachbehandlung die konventionelle Vakuumtemperung erstmalig erfolgreich durch die Blitzlampentemperung ersetzt
The work is focused on understanding the physical processes responsible for the modification of the structural, electrical and optical properties of polycrystalline TiO2:Ta films formed by vacuum annealing of initially not conductive amorphous films deposited by direct current magnetron sputtering. It is shown that the oxygen deficiency of amorphous and annealed TiO2:Ta films, respectively, is critical to achieve low resistivity and high optical transmittance of the crystalline films. Increasing the total pressure during magnetron sputter deposition is shown to be beneficial to achieve the desired oxygen deficient anatase growth, which is discussed in terms of energetic particle bombardment. Polycrystalline anatase TiO2:Ta films of low electrical resistivity (1,5·10-3 Ωcm), high free electron mobility (≈8 cm2V-1s-1), and low extinction (0,006) are obtained in this way at a total pressure of 2 Pa. The dependence of the polycrystalline film electrical properties on the oxygen content is discussed in terms of Ta dopant electrical activation as well as transport limiting processes taking into account the formation of Ti-vacancies. In addition, the conventional vacuum annealing has been successfully substituted by the flash lamp annealing in the millisecond range
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Books on the topic "Magnetron Sputtern"

1

Güttler, Dominik. Echtzeit-in-situ-Messung der Oberflächenbelegung einer Magnetron-Kathode bei der reaktiven Sputter-Abscheidung. Dresden: Forschungszentrum Rossendorf, 2004.

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Parry, Michael Andrew. An investigation of neodymium iron boron thin films produced by magnetron sputtering and pulsed laser ablation. Birmingham: University of Birmingham, 2001.

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Monaghan, Dermot. High rate unbalanced magnetron sputtering of thick films of ultra-fine grained OFHC copper and copper alloys. Salford: University of Salford, 1993.

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Magnetron Sputtering [Working Title]. IntechOpen, 2018. http://dx.doi.org/10.5772/intechopen.74092.

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Spencer, Alaric Graham. High rate reactive magnetron sputtering. 1989.

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High Power Impulse Magnetron Sputtering. Elsevier, 2020. http://dx.doi.org/10.1016/c2016-0-02463-4.

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Advanced Strategies in Thin Film Engineering by Magnetron Sputtering. MDPI, 2020. http://dx.doi.org/10.3390/books978-3-03936-430-5.

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Olsson, Maryam Kharrazi. High-Rate Reactive Magnetron Sputter Deposition and Characterization of Metal Oxide Films. Uppsala Universitet, 2000.

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Talivaldis, Spalvins, Lewis Research Center, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Division., eds. Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films. [Washington, D.C.]: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Division, 1990.

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Bishop, C. A. The deposition of coatings on to polymer substrates by planar magnetron sputtering. 1986.

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Book chapters on the topic "Magnetron Sputtern"

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Juarez-Martinez, Gabriela, Alessandro Chiolerio, Paolo Allia, Martino Poggio, Christian L. Degen, Li Zhang, Bradley J. Nelson, et al. "Magnetron Sputtering." In Encyclopedia of Nanotechnology, 1275. Dordrecht: Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100376.

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Bogaerts, Annemie, Ivan Kolev, and Guy Buyle. "Modeling of the Magnetron Discharge." In Reactive Sputter Deposition, 61–130. Berlin, Heidelberg: Springer Berlin Heidelberg, 2008. http://dx.doi.org/10.1007/978-3-540-76664-3_3.

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Braun, Manuel. "Magnetron Sputtering Technique." In Handbook of Manufacturing Engineering and Technology, 1–25. London: Springer London, 2013. http://dx.doi.org/10.1007/978-1-4471-4976-7_28-9.

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Braun, Manuel. "Magnetron Sputtering Technique." In Handbook of Manufacturing Engineering and Technology, 2929–57. London: Springer London, 2014. http://dx.doi.org/10.1007/978-1-4471-4670-4_28.

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Kupfer, H., and F. Richter. "Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect." In Reactive Sputter Deposition, 337–66. Berlin, Heidelberg: Springer Berlin Heidelberg, 2008. http://dx.doi.org/10.1007/978-3-540-76664-3_10.

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Konstantinidis, Stephanos, F. Gaboriau, M. Gaillard, M. Hecq, and A. Ricard. "Optical Plasma Diagnostics During Reactive Magnetron Sputtering." In Reactive Sputter Deposition, 301–35. Berlin, Heidelberg: Springer Berlin Heidelberg, 2008. http://dx.doi.org/10.1007/978-3-540-76664-3_9.

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Granqvist, C. G. "Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering." In Reactive Sputter Deposition, 485–95. Berlin, Heidelberg: Springer Berlin Heidelberg, 2008. http://dx.doi.org/10.1007/978-3-540-76664-3_13.

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Depla, Diederik, Stijn Mahieu, and Roger De Gryse. "Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering." In Reactive Sputter Deposition, 153–97. Berlin, Heidelberg: Springer Berlin Heidelberg, 2008. http://dx.doi.org/10.1007/978-3-540-76664-3_5.

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Ekpe, Samuel D., and Steven K. Dew. "Energy Deposition at the Substrate in a Magnetron Sputtering System." In Reactive Sputter Deposition, 229–54. Berlin, Heidelberg: Springer Berlin Heidelberg, 2008. http://dx.doi.org/10.1007/978-3-540-76664-3_7.

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Ramos, Marco César Maicas, and María del Mar Sanz Lluch. "High-Flux DC Magnetron Sputtering." In Gas-Phase Synthesis of Nanoparticles, 137–54. Weinheim, Germany: Wiley-VCH Verlag GmbH & Co. KGaA, 2017. http://dx.doi.org/10.1002/9783527698417.ch8.

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Conference papers on the topic "Magnetron Sputtern"

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Abou-Hanna, Jeries, John Carlson, and Jose´ Lozano. "Chemistry Consistency Analysis of Tungsten-Doped Diamond-Like Carbon (DLC) Coatings." In ASME 2005 International Mechanical Engineering Congress and Exposition. ASMEDC, 2005. http://dx.doi.org/10.1115/imece2005-79136.

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Tungsten-doped diamond-like carbon (DLC) coatings have been magnetron sputtered onto 52100 steel with chromium and chromium/tungsten carbide dual interlayers using a Hauzer Techno Coating HTC 1200 4 UBM unbalanced magnetron deposition system. Internal fixturing to the deposition chamber rotates parts to be coated with a two degree of freedom system. By design, at certain intervals during the deposition, the acetylene flow is linearly altered to change film characteristics throughout the film. AES sputter depth profiling analysis shows that the fixture rotational system, designed to uniformly coat parts, causes localized chemistry variations in the coating. For a given location, the AES depth profile also clearly documents the intervals when acetylene flow was constant and when the flow was ramped.
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Sonoda, T., A. Watazu, J. Zhu, W. Shi, A. Kamiya, K. Kato, and T. Asahina. "Enhanced Industrial Applicability of Aluminum Alloy by Coating Technique With Titanium/Carbon Compositionally Gradient Film Using Magnetron Co-Sputtering." In ASME 2002 International Mechanical Engineering Congress and Exposition. ASMEDC, 2002. http://dx.doi.org/10.1115/imece2002-39382.

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Coating of Aluminium alloy substrates with Ti/C compositionally gradient films was examined by magnetron sputtering, in order to improve not only the abrasion resistance of the alloy but also the adhesion between the deposited film and the alloy substrate with preserving the high hardness of such ceramic coatings. The Ti/C compositionally gradient films were deposited by co-sputtering of 2 sputter cathodes which had a pure titanium target and a titanium carbide target respectively, and their compositionally gradient was realized by varying continuously the electric power supplied to each sputter cathode. Under visual observation, the obtained Ti/C compositionally gradient films appeared to be uniform and adhesive. According to AES in-depth profiles, the carbon (C) concentration in the film gradually decreased in depth direction from trhe surface toward the substrate, confirming that a Ti/C compositionally gradient film had formed on the alloy substrate. On the basis of XRD, it was found that titanium carbide and α-titanium phases were formed in the gradient film. Furthermore the Vickers hardness of the film reached over Hv=2600. Therefore the abrasion resistance of the alloy and the adhesion of the hard coatings were expected to be improved by this method.
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Baik, Jae-Sang, and Youn-Jea Kim. "A Study on the Heat Transfer Enhancement in Magnetron Sputtering System." In ASME/JSME 2007 Thermal Engineering Heat Transfer Summer Conference collocated with the ASME 2007 InterPACK Conference. ASMEDC, 2007. http://dx.doi.org/10.1115/ht2007-32182.

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Magnetron sputtering systems have been widely used in the field of thin film technologies, such as making ultra-thin semiconductors, metal films, etc. The feature of magnetron sputtering system is used high voltage and electric current as the power of system. The energy is converted to heat which must be removed by the appropriate cooling system. Otherwise, it may damage the target, the magnets, and the substrate as well. Also, the current trend of magnetron sputtering is towards that with larger size of target, which can improve the efficiency. Consequently, heat transfer of magnetron sputtering system becomes complex and needs to develop more efficient cooling system. The main parameters affecting the cooling performance are the flow path of cooling water and flow rate. In this study, we investigated the characteristics of cooling effect with various flow paths of cooling water and flow rates. Using a commercial code, FLUENT, which uses FVM (Finite Volume Method) and SIMPLE algorithm, the governing equations have been solved for the pressure, mass flow rate, and temperature distributions in the magnetron sputtering system.
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Tanabe, Hirotaka, Yoshio Miyoshi, Tohru Takamatsu, Hitoshi Awano, and Takaaki Yamano. "Effect of Sputtering Gas Pressure and Bias Voltage on Mechanical Properties of TiN Coating Deposited by DC Magnetron Sputtering." In ASME/JSME 2004 Pressure Vessels and Piping Conference. ASMEDC, 2004. http://dx.doi.org/10.1115/pvp2004-2826.

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The mechanical properties of TiN films deposited on carbon steel JIS S45C by reactive dc magnetron sputtering under three sputtering gas pressures, 0.5Pa, 0.8Pa, and 1.76Pa were investigated. The residual stress once increased and then decreased with increasing bias voltage at 0.5Pa and 0.8Pa, but increased monotonously at 1.76Pa. These variations could be explained by the variations of the bombarding energy of a sputtered ion at each gas pressure. The variations of hardness and toughness correlated with the variation of residual stress. The variation of adhesive strength also could be explained by the variation of the bombarding energy with a model proposed in this study. A specific wear rate was also investigated, and it was found that to increase not only the hardness but also the adhesive strength is necessary to improve the wear resistance of TiN films.
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Yung, K. P., J. Wei, and B. K. Tay. "Growth of Carbon Nanotubes on Metal Containing Amorphous Carbon (A-C:M) Films." In ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-41768.

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In this study, carbon nanotubes were grown from metal containing amorphous carbon (a-C:M). a-C:M were deposited by two different techniques: RF magnetron sputtering and filtered cathodic vacuum arc (FCVA). X-ray diffraction (XRD) and atomic force microscopy (AFM) were deployed to analyze the chemical structure and morphology of the catalyst layers, respectively. The morphology of the carbon nanotubes growth was studied under Scanning electron microscopy (SEM). It was found that carbon nanotubes growth from sputtered a-C:Fe film are random orientated, while the nanotubes from FCVA a-C:M are well-aligned. SEM and AFM studies also show that the diameter of the nanotubes grown on sputtered a-C:Fe film is proportional to that of the annealed catalyst particles grain size. However, the diameter of the nanotubes from FCVA a-C:Fe film was found to be much smaller than the grain size of the catalyst particles.
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"High-Efficiency Magnetron Sputtered Tungsten Oxide Thin-Film Electrochromics with Neon Sputtering." In SVC TechCon 2016. Society of Vacuum Coaters, 2016. http://dx.doi.org/10.14332/svc16.proc.0065.

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Cheruvu, N. Sastry, Ronghua Wei, and David W. Gandy. "Oxidation Behavior of Sputter Deposited Nanocrystalline and Conventional Plasma Sprayed MCrAl(Y) Coatings." In ASME Turbo Expo 2010: Power for Land, Sea, and Air. ASMEDC, 2010. http://dx.doi.org/10.1115/gt2010-22645.

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The MCrAl-type coatings with, or without, yttrium are widely used for oxidation and/or hot corrosion protection of hot section components of gas turbine engines. Recently, there has been great interest in developing nano or microcrystalline coatings since these coatings offer excellent oxidation and corrosion resistance compared to the conventional coatings. Cyclic oxidation and microstructral degradadation behavior of sputter deposited nanocrystalline Ni-20Cr-10Al coating has been investigated at 1010°C. The coating was deposited on Haynes 230 samples using a magnetron sputtering technique. This technique produced a coating with a grain size of ∼9 nm. The cyclic oxidation results showed that the sputter deposited Ni-20Cr-10Al coating exhibited better oxidation resistance in terms of weight loss kinetics compared to the conventional plasma-sprayed NiCoCrAlY and PWA 286 coatings. The Al content in the nanocrystalline coating was consumed in a relatively short time due to inward and outward diffusion of Al. The accelerated consumption of Al was presumably due to enhanced grain boundary diffusion resulting from the ultra-fine grain structure in the coating. Variation of oxide-scale spallation resistance during thermal cycling, internal oxidation of the coatings, and the rate of Al consumption due to inward and outward diffusion of Al between the nanocrystalline and plasma sprayed coatings is presented.
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Heintze, Moritz. "Dual Magnetron Sputtering – Sputter Rate and Efficiency for Different Power Supply Designs and Frequencies." In 62nd Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2019. http://dx.doi.org/10.14332/svc19.proc.0073.

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Hexin, Luan, Zhuang Daming, and Liu Jiang. "Effects of Annealing on CuInGaSe2 Solar Cell Prepared by Magnetron Sputtering." In ASME 2011 International Mechanical Engineering Congress and Exposition. ASMEDC, 2011. http://dx.doi.org/10.1115/imece2011-62458.

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CuInxGa1−xSe2 (CIGSe) thin films have been deposited by magnetron sputtering from a CIGSe target and annealed in Se (Selenium) vapor atmosphere. Scanning Electron Microscope (SEM), X-Ray Diffraction (XRD), Raman, X-ray Fluorescence (XRF), Hall tester were used to observe and analyze the compositions, microstructures, surface morphologies and electronic properties of the films. After annealing, the performance of CIGSe films can be improved. The crystalline quality and electronic properties of annealed CIGSe films changed when the annealing temperature increases up to 350°C. CIGSe film with single chalcopyrite structure can be obtained when annealing temperature increases up to 400°C for 120 minutes. Se could be added into the thin films while annealing in Se vapor atmosphere. Cu-Se phase forms at the beginning of annealing and decreased with the increase of annealing time. In this work a cell with efficiency of 7.69% based on the sputtered and annealed CIGSe absorber was obtained.
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Yin, Jiancheng, Shifeng Yu, Shuyu Wang, Ming Lu, and Lei Zuo. "Design and Fabrication of Flexible Differential Scanning Nanocalorimeter." In ASME 2014 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. American Society of Mechanical Engineers, 2014. http://dx.doi.org/10.1115/detc2014-34705.

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This paper discussed about the design and fabrication process of flexible MEMS based Differential Scanning Calorimeter that greatly enhanced the detection limit and accuracy that allowed for evaluation of molecular interaction. The design utilized polyimide to significantly reduce thermal conduction by hundreds of times than traditional used substrate material. Preliminary fabrication result had successfully demonstrated the polyimide membrane can be firmly adhesive on the wafer during fabrication and easily peeled off from the rigid substrate after the process. Temperature sensing material, VOx was prepared by DC magnetron sputter of sintered vanadium target with O2 flow during the sputtering. Deposition conditions such as the O2 flow rate’s influence on the electrical resistivity and temperature coefficient resistance was investigated. The results fully showed that the material prepared by the method has satisfactory performance to be used as thermistor in the calorimeter. Also, research about thermal analysis of the system further guided and confirmed the feasibility of the design.
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Reports on the topic "Magnetron Sputtern"

1

Laube, Samuel J., and Jeffery J. Heyob. Magnetron Sputtered Pulsed Laser Deposition Scale Up. Fort Belvoir, VA: Defense Technical Information Center, August 2003. http://dx.doi.org/10.21236/ada422887.

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L.H. Ouyang, D.L. Rode, T. Zulkifli, B. Abraham-Shrauner, N. Lewis, and M.R. Freeman. GaAs Films Prepared by RF-Magnetron Sputtering. Office of Scientific and Technical Information (OSTI), August 2001. http://dx.doi.org/10.2172/821684.

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Beatty, John H., Paul J. Huang, Constantine G. Fountzoulas, and John V. Kelly. Tribological Evaluation of Magnetron-Sputtered Coating for Military Applications. Fort Belvoir, VA: Defense Technical Information Center, February 1999. http://dx.doi.org/10.21236/ada360673.

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Tzeng, Yonhua, and Hongbin Zhu. Electron Assisted Deposition of Cubic Boron Nitride by RF Magnetron Sputtering. Fort Belvoir, VA: Defense Technical Information Center, April 1999. http://dx.doi.org/10.21236/ada362770.

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D.N. Ruzic, M.J. Goeckner, Samuel A. Cohen, and Zhehui Wang. Nitrogen Atom Energy Distributions in a Hollow-cathode Planar Sputtering Magnetron. Office of Scientific and Technical Information (OSTI), June 1999. http://dx.doi.org/10.2172/8184.

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Bajt, S., J. Alameda, S. Baker, and J. Taylor. Growth of thick, crystalline material using dc-magnetron sputtering in Mag1 deposition chamber. Office of Scientific and Technical Information (OSTI), November 2005. http://dx.doi.org/10.2172/883838.

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Mortazawi, Amir, and Victor Lee. Magnetron Sputtering System for Novel Intrinsically Switchable Thin Film Ferroelectric Resonators and Filters. Fort Belvoir, VA: Defense Technical Information Center, August 2012. http://dx.doi.org/10.21236/ada580741.

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8

Walton, C., G. Gilmer, A. Wemhoff, and L. Zepeda-Ruiz. Full-Process Computer Model of Magnetron Sputter, Part I: Test Existing State-of-Art Components. Office of Scientific and Technical Information (OSTI), September 2007. http://dx.doi.org/10.2172/922114.

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9

Prater, W. Microstructural Comparisons of Ultra-Thin Cu Films Deposited by Ion-Beam and dc-Magnetron Sputtering. Office of Scientific and Technical Information (OSTI), November 2004. http://dx.doi.org/10.2172/839624.

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Green, K. M. Determination of ionization fraction and plasma potential in a dc magnetron sputtering system using a quartz crystal microbalance and a gridded energy analyzer. Office of Scientific and Technical Information (OSTI), January 1997. http://dx.doi.org/10.2172/531049.

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