Books on the topic 'Magnetron Sputtern'

Güttler, Dominik. Echtzeit-in-situ-Messung der Oberflächenbelegung einer Magnetron-Kathode bei der reaktiven Sputter-Abscheidung. Dresden: Forschungszentrum Rossendorf, 2004.

Parry, Michael Andrew. An investigation of neodymium iron boron thin films produced by magnetron sputtering and pulsed laser ablation. Birmingham: University of Birmingham, 2001.

Monaghan, Dermot. High rate unbalanced magnetron sputtering of thick films of ultra-fine grained OFHC copper and copper alloys. Salford: University of Salford, 1993.

Magnetron Sputtering [Working Title]. IntechOpen, 2018. http://dx.doi.org/10.5772/intechopen.74092.

Spencer, Alaric Graham. High rate reactive magnetron sputtering. 1989.

High Power Impulse Magnetron Sputtering. Elsevier, 2020. http://dx.doi.org/10.1016/c2016-0-02463-4.

Advanced Strategies in Thin Film Engineering by Magnetron Sputtering. MDPI, 2020. http://dx.doi.org/10.3390/books978-3-03936-430-5.

Olsson, Maryam Kharrazi. High-Rate Reactive Magnetron Sputter Deposition and Characterization of Metal Oxide Films. Uppsala Universitet, 2000.

Talivaldis, Spalvins, Lewis Research Center, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Division., eds. Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films. [Washington, D.C.]: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Division, 1990.

Bishop, C. A. The deposition of coatings on to polymer substrates by planar magnetron sputtering. 1986.

H, Arenz, ed. The deposition of amorphous silicon films by the technique of magnetron sputtering. Luxembourg: Commissionof the European Communities, 1988.

Hall, Gareth William. Control of the properties of semiconducting thin films deposited using magnetron sputtering. 1993.

Arenz, H. The Deposition of Amorphous Silicon Films by the Technique of Magnetron Sputtering (Energy). European Communities / Union (EUR-OP/OOPEC/OPOCE), 1988.

DC Magnetron Reactive Sputtering of Low Stress AlN Piezoelectric Thin Films for MEMS Application. Storming Media, 1999.

Warner, Edward Steven. Modification of the properties of D.C. magnetron sputtered magnetic thin films by self-bias. 1991.

Safi, Iyad. A study of reactive magnetron sputtering of alloy transparent conducting oxides from elemental targets. 1997.

J, Waters William, Soltis Richard, and United States. National Aeronautics and Space Administration., eds. MS212-A homogeneous sputtered solid lubricant coating for use to 800⁰C. [Washington, DC]: National Aeronautics and Space Administration, 1997.

J, Waters William, Soltis Richard, and United States. National Aeronautics and Space Administration., eds. MS212-A homogeneous sputtered solid lubricant coating for use to 800⁰C. [Washington, DC]: National Aeronautics and Space Administration, 1997.

J, Waters William, Soltis Richard, and United States. National Aeronautics and Space Administration., eds. MS212-A homogeneous sputtered solid lubricant coating for use to 800⁰C. [Washington, DC]: National Aeronautics and Space Administration, 1997.

Evaluation of the effect of microalloying on cleavage of monocrystalline NiAl using a miniaturized disk-bend test: Summary of research for the period March 1, 1992 to March 6, 1996; National Aeronautics and Space Administration, grant no. NAG 3-1325. [Washington, DC: National Aeronautics and Space Administration, 1997.

Carreri, Felipe de Campos. Investigation of Industrially-Suited Processes for Deposition of Oxide Thin Films by High Power Impulse Magnetron Sputtering. Fraunhofer IRB Verlag, 2018.

United States. National Aeronautics and Space Administration., ed. Final report to NASA Marshall Space Flight Center on the study of low temperature unbalanced magnetron deposition of hard, wear-resistant coatings for liquid-film bearing applications: Contract number NAG8-1020. [Washington, DC: National Aeronautics and Space Administration, 1996.