Journal articles: 'Magnetron Sputtern'

1

Seyfert, Ulf, Ulrich Heisig, Götz Teschner, and Johannes Strümpfel. "40 Jahre industrielles Magnetron-Sputtern in Europa." Vakuum in Forschung und Praxis 27, no. 6 (December 2015): 21–26. http://dx.doi.org/10.1002/vipr.201500596.

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Gubisch, M., L. Spieß, H. Romanus, J. Schawohl, and Ch Knedlik. "Bias-Magnetron Sputtern von Wolframkarbid-Schichten auf Stahl." Materialwissenschaft und Werkstofftechnik 35, no. 10-11 (October 2004): 916–23. http://dx.doi.org/10.1002/mawe.200400812.

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Fahland, M., and V. Kirchhoff. "Puls Magnetron Sputtern von optischen Mehrlagenschichten auf Kunststofffolien." Vakuum in Forschung und Praxis 12, no. 4 (August 2000): 243–47. http://dx.doi.org/10.1002/1522-2454(200008)12:4<243::aid-vipr243>3.0.co;2-b.

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Wolke, Joop G. C., Jeroen J. J. P. van den Beucken, and John A. Jansen. "Growth Behavior of Rat Bone Marrow Cells on RF Magnetron Sputtered Bioglass- and Calcium Phosphate Coatings." Key Engineering Materials 361-363 (November 2007): 253–56. http://dx.doi.org/10.4028/www.scientific.net/kem.361-363.253.

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The RF magnetron sputter technique was used to deposit Bioglass (BG) and hydroxyapatite (HA) coatings onto titanium substrates. The aim of this study was evaluated the growth behavior of rat bone marrow cells of various deposited coatings. The EDS measurements demonstrated that the composition BG coating was changed during magnetron sputtering. The rat bone marrow derived osteoblast-like cells showed improved osteogenic response on crystalline magnetron sputtered HA coatings compared BG coatings. Scanning electron microscopical examination showed an extensive mineralization after 16 days of culture, while on the surface of the BG coating only a multilayer without mineralization could be observed.

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Gledhill, Steyer, Weiss, and Hildebrandt. "HiPIMS and DC Magnetron Sputter-Coated Silver Films for High-Temperature Durable Reflectors." Coatings 9, no. 10 (September 20, 2019): 593. http://dx.doi.org/10.3390/coatings9100593.

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High-temperature durable mirrors based on a protected silver sputter coating are attractive for secondary reflector applications in concentrated solar thermal power plants. In this paper, silver films are deposited by high-power impulse magnetron sputtering (HiPIMS) and standard direct current (DC) magnetron sputtering, either as exposed discretely deposited films or in-sequence-deposited thin film systems, where the silver is protected and embedded between adhesion and barrier layers. The unprotected silver films and equivalent protected silver thin film systems are compared and characterized as deposited and after 400 °C oven temperature exposure. The reflectance is measured and grazing incident X-ray diffraction (GIXRD) and scanning electron microscopy (SEM) pictures were taken. The HiPIMS silver film, sputtered with a peak current of 200 A and an approximately equivalent average power density to the DC magnetron sputtered silver, exhibits higher reflectance (and conductivity). Increasing the power density further, yields silver films with lower reflectance, correlating to a reduced grain size. In the protected silver film system, the reflectance does not improve, due to the presence of a less reflective top adhesion layer. The protected film system, with the 200 A HiPIMS, is, however, more durable at 400 °C than the DC magnetron sputtered equivalent.

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Fox, G. R., and P. A. Danai. "ZnO microtubes." Journal of Materials Research 9, no. 11 (November 1994): 2737–40. http://dx.doi.org/10.1557/jmr.1994.2737.

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Microtubes of ZnO have been produced using sputter coating and a fugitive phase technique. ZnO was sputtered onto polyester fibers by dc magnetron sputtering, and the polyester fiber fugitive phase was subsequently burned out by annealing in air or oxygen. Tubes with an inside diameter of 23 μm and a length of 3 cm were obtained. The 3 to 6 μm thick walls of the tubes exhibited a [002] radial texture.

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Šimůrka, Lukáš, Selen Erkan, and Tuncay Turutoglu. "Characterization of Silicon Nitride Thin Films on Glass." Defect and Diffusion Forum 368 (July 2016): 86–90. http://dx.doi.org/10.4028/www.scientific.net/ddf.368.86.

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The influence of process parameters on amorphous reactively sputtered silicon nitride thin films is reported in this study. The films were prepared with various argon and nitrogen flows, and sputter power in in-line horizontal coater by DC magnetron reactive sputtering from Si (10% Al) target. Refractive index and mechanical properties like residual stress, hardness and elastic modulus were studied. We show that process pressure has an important influence on mechanical properties of the sputtered film. On the other hand, the nitrogen content is the key factor for the optical properties of the films.

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Ruano, Manuel, Lidia Martínez, and Yves Huttel. "Investigation of the Working Parameters of a Single Magnetron of a Multiple Ion Cluster Source: Determination of the Relative Influence of the Parameters on the Size and Density of Nanoparticles." Dataset Papers in Science 2013 (August 18, 2013): 1–8. http://dx.doi.org/10.1155/2013/597023.

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Multiple Ion Cluster Source (MICS) is the new optimized route of a standard technique based on a sputtering gas aggregation source, the Ion Cluster Source. The single magnetron used in the standard Ion Cluster Source is replaced by three magnetrons inside the aggregation zone, and they are controlled individually in order to fabricate nanoparticles with the desired and tunable chemical composition. Apart from the working parameters of each magnetron, it is also reported that the relation between the working parameters of individual magnetrons is of prime importance for the control of both the size and density of the nanoparticles. The influences of fluxes of the sputtering gas applied to each magnetron, the total gas flux in the aggregation zone, the position in the aggregation zone of Ag magnetron, and the relative position of the magnetrons in the aggregation zone have been studied through the operation of one of the magnetrons loaded with a silver target.

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Julien, Mauger, and Hussain. "Sputtered LiCoO2 Cathode Materials for All-solid-state Thin-film Lithium Microbatteries." Materials 12, no. 17 (August 22, 2019): 2687. http://dx.doi.org/10.3390/ma12172687.

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This review article presents the literature survey on radio frequency (RF)-magnetron sputtered LiCoO2 thin films used as cathode materials in all-solid-state rechargeable lithium microbatteries. As the process parameters lead to a variety of texture and preferential orientation, the influence of the sputtering conditions on the deposition of LiCoO2 thin films are considered. The electrochemical performance is examined as a function of composition of the sputter Ar/O2 gas mixture, gas flow rate, pressure, nature of substrate, substrate temperature, deposition rate, and annealing temperature. The state-of-the-art of lithium microbatteries fabricated by the rf-sputtering method is also reported.

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ZHANG, Q., Q. M. MAO, J. Z. RUAN, Q. J. WANG, X. L. YANG, Z. J. ZHAO, H. L. SEET, and X. P. LI. "GIANT MAGNETO-IMPEDANCE EFFECT OF MAGNETRON SPUTTERED Ni80Fe20/Cu COMPOSITE WIRES." Surface Review and Letters 15, no. 06 (December 2008): 753–56. http://dx.doi.org/10.1142/s0218625x08011019.

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In this work, Ni 80 Fe 20/ Cu composite wires of length 50 mm, consisting a Cu core of diameter 100 μm, coated with a layer of Ni 80 Fe 20, were produced by RF magnetron sputtering. To obtain a uniform coating, the wires were spun during sputtering by a homemade system. The results showed that the spinning speed might affect the maximum MI ratio and the magnetic properties. The MI ratio of the sputtered wires increases with the wire spinning speed in the magnetron sputtering. The film thickness had a significant effect on the magnitude and the optimum frequency of the giant magneto-impedance effect. The maximum MI ratio can reach about 247.4% for the specimen with a Ni 80 Fe 20 coating thickness of 2.81 μm at 400 kHz. This large MI effect, obtained at such low frequency range, was correlated with the electromagnetic interaction between the inner core and the magnetic coating.

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11

Westwood, W. D. "Sputter Deposition Processes." MRS Bulletin 13, no. 12 (December 1988): 46–51. http://dx.doi.org/10.1557/s0883769400063697.

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Deposition of films by sputtering was observed first in 1852 by Grove. The technique was in general use through the 1920s for preparing reflective coatings and other thin film samples. Western Electric deposited gold on wax masters for phonograph recordings. The improvement in diffusion pump technology at that time caused thermal evaporation deposition to replace sputtering.Not till the 1950s did sputter deposition reappear… Bell Laboratories developed tantalum hybrid circuit technology using sputter deposition. Besides depositing Ta, they created a new material, Ta2N, by reactively sputtering tantalum in gas mixtures of argon and N2. Since then, these two methods, sputtering of metals and alloys and reactive sputtering of compounds, have been investigated for many applications of thin film materials.Although the general aspects of the methods have changed little in the past 30 years, the implementations have changed significantly, particularly since the introduction of magnetron systems in the 1970s. This review will concentrate mainly on these flexible, high rate magnetron deposition systems.The term sputtering actually applies to the physical processes by which atoms are removed from a material. Momentum is transferred from an incident, energetic particle, usually in the form of an ion, to atoms of the target material. A large number of these atoms are displaced from their normal sites in the crystal lattice, producing a disordered structure that also contains some of the incident particles, which are implanted. Some of the target atoms are displaced from the surface; if they have enough energy, they escape from the target as sputtered atoms.

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12

Hoon, Jian Wei, Kah Yoong Chan, and Cheng Yang Low. "Fabrication and Characterization of RF Magnetron Sputtered Silicon Oxide Films." Advanced Materials Research 970 (June 2014): 102–5. http://dx.doi.org/10.4028/www.scientific.net/amr.970.102.

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In this work, silicon dioxide (SiO2) films were fabricated on indium tin oxide (ITO) coated glass substrates by radio frequency (RF) magnetron sputtering deposition technique. The deposition rate of the magnetron sputtered SiO2 films was investigated. The SiO2 films were characterized with the atomic force microscopy (AFM) for their surface topology. In addition, the electrical insulating strength of the magnetron sputtered SiO2 was examined.

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13

CHEN, D. L., Z. J. ZHAO, L. JIANG, J. Z. RUAN, and X. L. YANG. "EFFECT OF ROTATING DIRECTION AND INTERVAL ON GIANT MAGNETO-IMPEDANCE OF SPUTTERED Ni80Fe20/Cu COMPOSITE WIRES." Surface Review and Letters 18, no. 06 (December 2011): 223–27. http://dx.doi.org/10.1142/s0218625x11014618.

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In this paper, a new method for fabricating Ni80Fe20/Cu composite wires is presented. A series of samples were prepared by alternating the rotating direction of the Cu wire during RF magnetron sputtering. In order to keep the overall coating thickness of all the samples constant, the alternating intervals and rotating period of each sample during sputtering were varied. As the rotating period increased, the samples showed different magneto-impedance profiles. Experimental results indicated that there was a critical thickness for single sputtered layer which the MI ratio was significantly enhanced at a relatively low driven current frequency. Qualitative discussion on these phenomena was explained in terms of exchange interaction and electromagnetic interactions.

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14

Shieh, H. P. D., M. H. Kryder, and J. W. Lee. "Effects of bias-sputtering on magnetron-sputtered magneto-optical recording media." IEEE Transactions on Magnetics 24, no. 6 (1988): 2446–48. http://dx.doi.org/10.1109/20.92136.

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15

Wang, Fengyi, Haitao Zhao, Jie Liang, Tingshuai Li, Yongsong Luo, Siyu Lu, Xifeng Shi, Baozhan Zheng, Juan Du, and Xuping Sun. "Magnetron sputtering enabled synthesis of nanostructured materials for electrochemical energy storage." Journal of Materials Chemistry A 8, no. 39 (2020): 20260–85. http://dx.doi.org/10.1039/d0ta07644a.

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This review summarizes the research progress of magnetron sputtered nanostructured electrode materials for EES, providing illustrations of how to rationally design and optimize electrode materials via magnetron sputtering technology.

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16

Bartsch, Heike, Rolf Grieseler, Jose Mánuel, Jörg Pezoldt, and Jens Müller. "Magnetron Sputtered AlN Layers on LTCC Multilayer and Silicon Substrates." Coatings 8, no. 8 (August 18, 2018): 289. http://dx.doi.org/10.3390/coatings8080289.

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This work compares the deposition of aluminum nitride by magnetron sputtering on silicon to multilayer ceramic substrates. The variation of sputter parameters in a wide range following a fractional factorial experimental design generates diverse crystallographic properties of the layers. Crystal growth, composition, and stress are distinguished because of substrate morphology and thermal conditions. The best c-axis orientation of aluminum nitride emerges on ceramic substrates at a heater temperature of 150 °C and sputter power of 400 W. Layers deposited on ceramic show stronger c-axis texture than those deposited on silicon due to higher surface temperature. The nucleation differs significantly dependent on the substrate. It is demonstrated that a ceramic substrate material with an adapted coefficient of thermal expansion to aluminum nitride allows reducing the layer stress considerably, independent on process temperature. Layers sputtered on silicon partly peeled off, while they adhere well on ceramic without crack formation. Direct deposition on ceramic enables thus the development of optimized layers, avoiding restrictions by stress compensating needs affecting functional properties.

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17

Bai, Tao, and Qing Lian Zhang. "The Effects of the Sputter-Etching Power on the Formation of Conical Protrusions on the Surface of SUS304 Stainless Steel." Applied Mechanics and Materials 164 (April 2012): 276–79. http://dx.doi.org/10.4028/www.scientific.net/amm.164.276.

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SUS304 stainless steel samples were sputter-etched by a radio frequency (RF) magnetron sputtering apparatus. Correlation between the formation of conical protrusions on the steel surface and sputter power was discussed. The results show that the conical protrusion precipitates both uniformly and densely on the surface with the power being 600W, the anode-to-substrate distance being 50mm, the argon gas flow ratio being 50sccm and the sputter-etching time being 6h. The roughness of the samples sputter-etched at various sputtering powers for 6h was analyzed. According to the results, sputter-etching brings about the development of surface roughness, which in turn may affect the sputter-etching process

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18

Na, Dong-Myong, Young-Bok Kim, and Jin-Seong Park. "The characteristics of Pt thin films prepared by DC magnetron sputter." Journal of Sensor Science and Technology 16, no. 2 (March 31, 2007): 159–64. http://dx.doi.org/10.5369/jsst.2007.16.2.159.

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19

Park, Ju-Hoon, Bong-Soo Kim, and Byung-Hoon Kim. "Characterizations of Characterizations of Tio2thin films with atmosphere control of the RF magnetron sputtering." Journal of the Korean Crystal Growth and Crystal Technology 21, no. 2 (April 30, 2011): 65–69. http://dx.doi.org/10.6111/jkcgct.2011.21.2.065.

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Yan, Nu, and Xiao Chen Xiong. "Influence of Magnetron Sputtering Parameters on Surface Properties of TiN-Coated Bearing Steel." Advanced Materials Research 785-786 (September 2013): 970–73. http://dx.doi.org/10.4028/www.scientific.net/amr.785-786.970.

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In order to investigate the influence of magnetron sputtering parameters on surface properties, hardness and friction tests were carried out for TiN-coated bearing steel sputtered under different deposition times varied from 5 to 30 minutes. Hardness of coated specimens was increased by magnetron sputtered and markedly affected by deposition time. Coated TiN thin films on the surface can also effectively improve the friction properties of the bearing steels. The deposition times from 5 to 10 minutes is the most suitable condition to improve the surface friction properties and hardness for bearing steel under the sputtering power with 200W.

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21

Gao, Zhengyuan, Dong Yang, Chengjin Sun, Lianteng Du, Xiang Zhang, and Zhiguo An. "The Corrosion Resistance of Al Film on AZ31 Magnesium Alloys by Magnetron Sputtering." Metals 11, no. 10 (September 25, 2021): 1522. http://dx.doi.org/10.3390/met11101522.

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Nano Al films were prepared on AZ31 magnesium alloy samples by DC magnetron sputtering. The effects of sputtering power on the microstructure and corrosion resistance of the Al film were investigated. The results show that the surface of aluminum film is dense and polycrystalline state, and it is oriented along the Al (111) crystal plane. The grain size of Al film first increases and then decreases with the increase of sputtering power. When the sputtering power exceeds 100 W, there is no insignificant effect on the orientation of the Al crystals and the corrosion current density of the samples with Al film are reduced by two orders of magnitude. The corrosion resistance of the magnesium alloy samples with the Al film magnetron sputtered varies with the sputtering power. Compared with low sputtering power, the Al film sputtered by high power has the most excellent corrosion resistance, but too high sputtering power will lead to micro cracks on the Al film, which will adversely affect the corrosion resistance.

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22

Bogdanov, R. V., and O. M. Kostiukevych. "Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion." Materials Science-Poland 33, no. 1 (March 1, 2015): 82–94. http://dx.doi.org/10.1515/msp-2015-0001.

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AbstractA computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas) confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

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Posadowski, Witold, Artur Wiatrowski, and Grzegorz Kapka. "Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide." Materials Science-Poland 36, no. 1 (May 18, 2018): 69–74. http://dx.doi.org/10.1515/msp-2017-0092.

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Abstract Magnetron sputtered nickel and nickel oxide films have been studied for various applications. We may find, among others, these films in electrochromic display devices, in resistive type gas sensors, as metal electrodes in electronic devices, in solar thermal absorbers. Pure nickel films deposited using PVD technique possess good corrosion and wear resistant properties. Magnetron sputtering has several advantages in film deposition (in comparison to other methods) such as relatively low heating temperature of the deposited substrate during sputtering process, high energy of sputtered atoms (about 10 eV) at the substrate, which influences positively the films adhesion. From application point of view, the most valuable feature of these films is the possibility of scaling target dimensions, which makes feasible the deposition on a several square meter surfaces. The improvement of magnetron sputtering devices design may influence positively the optimization of the deposition technology and its efficiency. The thin nickel and nickel oxide films were prepared by pulsed magnetron sputtering using original type WMK magnetron device. Ni (99.9 %) has been used as a sputtering target of 100 mm in diameter and different thicknesses (3 mm, 5 mm, and 6 mm). The distance between the substrate and target was the same in all experiments and equal to 120 mm. Argon and oxygen gases were introduced during the reactive process through needle gas valves at a total pressure of 0.4 Pa. The sputtering power, sputtering pressure and oxygen partial pressure have been used as technological knobs for deposition processes. The helpful tool for controlling the pulsed magnetron sputtering process was the original parameter of supply (so called circulating power). Results from our experiments showed that the deposition of Ni films is possible even from targets of 6 mm thickness. Deposition rate increased proportionally with the sputtering power. The aim of this work is to use the acquired expertise to develop an efficient technology of thin nickel oxide layers for electrochromic systems.

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Zhong, Wei, Sunbin Deng, Kai Wang, Guijun Li, Guoyuan Li, Rongsheng Chen, and Hoi-Sing Kwok. "Feasible Route for a Large Area Few-Layer MoS2 with Magnetron Sputtering." Nanomaterials 8, no. 8 (August 3, 2018): 590. http://dx.doi.org/10.3390/nano8080590.

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In this article, we report continuous and large-area molybdenum disulfide (MoS2) growth on a SiO2/Si substrate by radio frequency magnetron sputtering (RFMS) combined with sulfurization. The MoS2 film was synthesized using a two-step method. In the first step, a thin MoS2 film was deposited by radio frequency (RF) magnetron sputtering at 400 °C with different sputtering powers. Following, the as-sputtered MoS2 film was further subjected to the sulfurization process at 600 °C for 60 min. Sputtering combined with sulfurization is a viable route for large-area few-layer MoS2 by controlling the radio-frequency magnetron sputtering power. A relatively simple growth strategy is demonstrated here that simultaneously enhances thin film quality physically and chemically. Few-layers of MoS2 are established using Raman spectroscopy, X-ray diffractometer, high-resolution field emission transmission electron microscope, and X-ray photoelectron spectroscopy measurements. Spectroscopic and microscopic results reveal that these MoS2 layers are of low disorder and well crystallized. Moreover, high quality few-layered MoS2 on a large-area can be achieved by controlling the radio-frequency magnetron sputtering power.

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Xu, Fan, Nancy J. Dudney, Gabriel M. Veith, Yoongu Kim, Can Erdonmez, Wei Lai, and Yet-Ming Chiang. "Properties of lithium phosphorus oxynitride (Lipon) for 3D solid-state lithium batteries." Journal of Materials Research 25, no. 8 (August 2010): 1507–15. http://dx.doi.org/10.1557/jmr.2010.0193.

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The thin film electrolyte known as Lipon (lithium phosphorous oxynitride) has proven successful for planar thin film battery applications. Here, the sputter deposition of the amorphous LiPON electrolyte onto more complex 3D structures is examined. The 3D structures include off-axis alignment of planar substrates and also 10–100 μm arrays of pores, columns, and grooves. For magnetron sputtering in N2 gas at 2.6 Pa, the Lipon film deposition is not restricted to be line-of-sight to the target, but forms conformal and dense films over the 3D and off-axis substrates. The deposition rate decreases for areas and grooves that are less accessible by the sputtered flux. The composition varies, but remains within the range that gives sufficient Li+ ionic conductivity, 2 ± 1 μS/cm.

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WANG, YINFENG, ANPING LIU, XUEHENG YANG, and XIAOPING SU. "STUDY ON MICROSTRUCTURE AND PROPERTY OF Pt-DOPED WO3 FILMS." International Journal of Modern Physics B 21, no. 18n19 (July 30, 2007): 3489–92. http://dx.doi.org/10.1142/s0217979207044809.

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We have prepared Pt -doped WO 3 composite films by sol-gel compounding and DC reactive magnetron sputtering respectively. Spectra change process according to the absorbing hydrogen time has been characterized by UV-VIS, X-ray diffraction spectra of two kinds of samples have been studied in this paper, and the crystallization temperature of film has been observed at the same time. As a result, both two WO 3 composite films are better sensitive to hydrogen by Pt -doping and the Pt sputtered sol-gel film has faster response to hydrogen than the Pt sputtered film by DC reactive magnetron sputtering, but the changes of luminousness are almost equal for two films.

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Song, Yuan Qiang, Huai Wu Zhang, Ying Li Liu, Yuan Xun Li, and Qi Ye Wen. "Magnetic and Magneto-Optical Properties of Sputtered Co-CeO₂ Thin Films on Al₂O₃ (0001) Substrates with (100) Orientation." Materials Science Forum 687 (June 2011): 117–21. http://dx.doi.org/10.4028/www.scientific.net/msf.687.117.

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Diluted magnetically doped CeO2 films is an attractive dilute magnetic oxide which would facilitate the practical realization of spintronic devices and may also be used to explore novel magneto-optical applications. In this experiments, 3 at% cobalt-doped CeO2 films with the stoichiometry of Ce0.97Co0.03O2-δ (CCO) were deposited by magnetron sputtering methods on Al2O3 (0001) substrates. The structural, magnetic, and magneto-optical properties were investigated. The results indicate that CCO films with CeO2 (100) orientation can readily be obtained via magnetron sputtering on Al2O3 (0001) substrates. Films are ferromagnetic at room temperature, which is anisotropic with an out-of-plane magnetization easy axis. Magneto-optical measurements exhibit a giant Faraday rotation of about 4800 deg/cm at 650 nm wavelength in out-of-plane direction. The excellent room-temperature ferromagnetism and the giant Faraday rotation in CCO films show highly potential applications in novel magneto-optical devices as well as in spintronics.

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Bai, Tao, and Qing Lian Zhang. "The Effects of the Sputter-Etching Parameters on the Formation of Conical Protrusions on the Surface of SUS304 Stainless Steel." Advanced Materials Research 535-537 (June 2012): 764–67. http://dx.doi.org/10.4028/www.scientific.net/amr.535-537.764.

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SUS304 stainless steel samples were sputter-etched by a radio frequency (RF) magnetron sputtering apparatus. Correlations between the formation of conical protrusions on the steel surface and sputter parameters, such as sputter power, anode-to-substrate distance, argon gas flow ratio and sputter-etching time were discussed. The results show that the conical protrusion precipitates both uniformly and densely on the surface with the power being 600W, the anode-to-substrate distance being 50mm, the argon gas flow ratio being 50sccm and the sputter-etching time being 6h.

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29

Yang, Tim, Z. Q. Wang, Makoto Kohda, Takeshi Seki, Koki Takanashi, and Junsaku Nitta. "Perpendicular Magnetic Anisotropy in Pt/Co/AlO Trilayer Structures Depending on AlO Thickness and Fabrication Method." Key Engineering Materials 616 (June 2014): 247–51. http://dx.doi.org/10.4028/www.scientific.net/kem.616.247.

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We investigate the perpendicular magnetic anisotropy dependence on the AlO capping layer in Pt/Co/AlO films. AlO was deposited on Pt/Co films by RF magnetron sputtering and atomic layer deposition (ALD) with varying thickness. It is found that the prolonged deposition of thick AlO layers by RF magnetron sputtering causes significant damage to the Pt/Co underneath while AlO layers formed by ALD can be of arbitrary thickness with no damage to the magnetic properties of the films. The decline of the magnetic properties can be attributed to the method of AlO deposition for each process. In the RF magnetron sputtering, AlO atoms with high kinetic energy are ejected from a sputter target resulting in the degradation of Pt/Co films, while the process of deposition of AlO by ALD is governed by a series of chemically reactive condensations allowing for arbitrary deposition thickness of AlO.

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Hoon, Jian Wei, Kah Yoong Chan, and Cheng Yang Low. "XRD Investigations on Film Thickness and Substrate Temperature Effects of DC Magnetron Sputtered ZnO Films." Advanced Materials Research 845 (December 2013): 241–45. http://dx.doi.org/10.4028/www.scientific.net/amr.845.241.

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In this paper, direct current plasma magnetron sputter deposition technique was employed to deposit zinc oxide (ZnO) films on glass substrates. The magnetron sputtering process parameters including film thickness and substrate temperature were investigated. The crystallite sizes of the ZnO films were extracted from the measured X-ray diffraction patterns. The correlation of the crystallite size of the ZnO films with the film thickness and the substrate temperature will be discussed in this paper.

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Jin, Chun Long, Ha Na Shim, Eou Sik Cho, and Sang Jik Kwon. "Effect of Pulsed-DC Power on the Zinc Oxide Window Layer of CIGS Solar Cells Deposited by In-Line Sputtering Methods." Advanced Materials Research 805-806 (September 2013): 131–35. http://dx.doi.org/10.4028/www.scientific.net/amr.805-806.131.

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Zinc oxide (ZnO) thin film was deposited on the glass substrate and cadmium-sulfide (CdS) thin film at room temperature by using an in-line pulsed-DC magnetron sputtering system. The sputtering process was carried out at various pulsed-DC power and radio frequency (RF) power from 400 W to 1 kW. From the thickness of the sputtered ZnO films, it was possible to obtain much higher deposition rate in case of pulsed-DC sputtering than RF sputtering. However, for both pulsed-DC sputtered and RF sputtered ZnO films, the similar results were obtained in case of the energy band gaps and the structural characteristics such as adhesion to CdS. From the results, the ZnO films sputtered by pulsed-DC power are expected to be used in the fabrication process instead of RF power.

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Wang, Li Feng, Ze Yan Wu, and Zhi Jun Meng. "Magnetron Sputtering Yield and Relative Factors." Advanced Materials Research 361-363 (October 2011): 1655–63. http://dx.doi.org/10.4028/www.scientific.net/amr.361-363.1655.

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In this work, we mainly summarize the influence of the ion bombardment cathode (target) and relative factors of magnetron sputtering yield in production thin film. Magnetron sputter deposition permits a much wider selection of film materials, produces films with higher purity and better controlled composition, provides films with greater adhesive strength and homogeneity, and permits better control of deposit thickness. Unlike most other work described about sputtering yield, sputtering for thin-film production is performed using the plasma rather than a focused ion beam. When an ion with the energy hits a surface of the target, a small fraction of the energy and momentum of the incoming ion will, through lattice collisions, be reversed and may cause ejection of surface atoms (sputtering). The average number of the atoms ejected from the cathode surface per incident ion is called the sputtering yield. The sputtering yield varies with the target material, the kind of impinging ion, and the energy of that ion. At a given ion energy, The sputtering yield increases with increasing angle of incidence up to a maximum at an angle between 55 ° and 85 ° with respect to the surface normal [1, 3].

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Mishra, Brajendra, J. J. Moore, Jian Liang Lin, and W. D. Sproul. "Advances in Thin Film Technology through the Application of Modulated Pulse Power Sputtering." Materials Science Forum 638-642 (January 2010): 208–13. http://dx.doi.org/10.4028/www.scientific.net/msf.638-642.208.

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High power pulsed magnetron sputtering (HPPMS) is an emerging thin film deposition technology that generate high ionization plasma by applying a very large amount of peak power to a sputtering target for a short period of time. HPPMS is also known as High Power Impulse Magnetron Sputtering (HiPIMS). However, HPPMS/HiPIMS exhibits decreased deposition rate as compared to continuous dc magnetron sputtering. Modulated pulse power (MPP) magnetron sputtering is an alternative HPPIMS deposition technique that overcomes the rate loss problem while still achieving a high degree of ionization of the sputtered material. In the present work, the principles and some important characteristics of MPP technology were presented. Technical examples of CrN coatings were deposited using MPP and continuous dc sources. The positive ion mass distributions were characterized using an electrostatic quadrupole plasma mass spectrometer. The structure and properties of MPP and dc CrN coatings were characterized using x-ray diffraction, scanning electron microscopy, nanoindentation tests, and ball-on-disc wear test. It was found that the MPP CrN coating exhibits denser microstructure and improved mechanical and tribological properties as compared to the dc CrN coating.

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Wolke, Joop G. C., E. Vandenbulcke, B. van Oirschot, and John A. Jansen. "A Study to the Surface Characteristics of RF Magnetron Sputtered Bioglass - and Calcium Phosphate Coatings." Key Engineering Materials 284-286 (April 2005): 187–90. http://dx.doi.org/10.4028/www.scientific.net/kem.284-286.187.

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The RF magnetron sputter technique was used to deposit Bioglass (BG) and hydroxyapatite (HA) coatings onto titanium substrates. In the current study, the physico-chemical and dissolution properties of various deposited coatings were investigated. X-ray diffraction demonstrated that the as-sputtered coatings had an amorphous structure, a heattreatment for 2 hours at 600°C changed only the HA coating into a crystalline apatite structure. Dissolution experiments demonstrated that all the amorphous coatings dissolved during the incubation for 4 weeks in simulated body fluid, while all the heattreated sputter coatings were still maintained. In contrast with the HA heattreated sputter coatings all the bioglass containing sputter coatings showed the formation of a crystalline apatite phase. Scanning electron microscopical examination of the sputtered coatings demonstrated that on all the heattreated BG/HG sputter coating a thick CaP precipitate was formed, while on the BG sputter coating occasionally a globular precipitate was observed.

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Burmakov, Aliaksandr P., Vasiliy N. Kuleshov, and Alexei V. Stoliarov. "Combined magnetron-laser deposition of titanium oxide thin-film plasmonic structures with silver nanoparticles." Journal of the Belarusian State University. Physics, no. 1 (January 31, 2020): 54–59. http://dx.doi.org/10.33581/2520-2243-2020-1-54-59.

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In this work, we consider a method for producing film structures, which are a dielectric matrix with nanosized metal particles in it. The technique is implemented by the simultaneous use of magnetron sputtering and pulsed laser deposition. As a dielectric matrix, TiO2 films formed by magnetron sputtering are used. Metallic Ag particles were deposited from an erosive laser stream. The conditions for the implementation of the technique are presented: the relative position of the magnetron, laser target, and substrate; characteristics of laser radiation; magnetron discharge parameters; pressure and composition of the gaseous medium. Using the methods of spectrophotometry, scanning electron microscopy and atomic force microscopy, the optical and structural characteristics of coatings are determined. The coating thickness was determined, the prevailing particle size and their surface density were estimated. A significant effect of the frequency of laser pulses on the absorption and transmission of the plasmon surface resonance band, as well as the presence in the film structure of small-sized particles of the cathode material of the magnetron sputter, is established.

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Zenkin, Sergei, Fedor Konusov, Aleksandr Lauk, Denis Zelentsov, and Stanislav Demchenko. "Structure, Mechanical and Optical Properties of Silicon-Rich Al–Si–N Films Prepared by High Power Impulse Magnetron Sputtering." Coatings 9, no. 1 (January 17, 2019): 53. http://dx.doi.org/10.3390/coatings9010053.

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This article reports on the influence of the sputtering parameters (discharge voltage, average target power density) of a high power impulse magnetron discharge (HiPIMS) on the structure, mechanical and optical properties of silicon-rich Al–Si–N films. We show that with the change of a discharge target power density in the range of 30–120 W/cm2, the hardness of the sputtered Al–Si–N films nonlinearly changes in the range of 22–29 GPa, while the concentration of the absorption centers changes in the range of 1018–1020/cm3. The optical spectra of the HiPIMS sputtered films are completely different from the Al–Si–N films prepared by a direct current magnetron sputtering, with an absence of “monoenergetic” optical absorption centers, which are attributed to point defects.

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Lindsey, E. F., C. W. Price, E. L. Pierce, and E. J. Hsieh. "SEM analysis of DC magnetron sputtered beryllium films." Proceedings, annual meeting, Electron Microscopy Society of America 46 (1988): 960–61. http://dx.doi.org/10.1017/s0424820100106867.

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Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

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Grammatikopoulos, Panagiotis, Joseph Kioseoglou, Antony Galea, Jerome Vernieres, Maria Benelmekki, Rosa E. Diaz, and Mukhles Sowwan. "Kinetic trapping through coalescence and the formation of patterned Ag–Cu nanoparticles." Nanoscale 8, no. 18 (2016): 9780–90. http://dx.doi.org/10.1039/c5nr08256k.

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In recent years, due to its inherent flexibility, magnetron-sputtering has been widely used to synthesise bi-metallic nanoparticles (NPs) via subsequent inert-gas cooling and gas-phase condensation of the sputtered atomic vapour.

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Dong, Dongmei, Wenwen Wang, Guobo Dong, Fan Zhang, Hang Yu, Yingchun He, and Xungang Diao. "Improved performance of co-sputtered Ni–Ti oxide films for all-solid-state electrochromic devices." RSC Advances 6, no. 112 (2016): 111148–60. http://dx.doi.org/10.1039/c6ra21961f.

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Thin films of Ni–Ti oxide were co-sputtered by reactive direct current magnetron sputtering and their structures, morphologies, and compositions were investigated by X-ray diffraction, atomic force microscopy and X-ray photo-electron spectroscopy.

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Kumari, Prity, and Peter Majewski. "Adsorption of Albumin on Silica Surfaces Modified by Silver and Copper Nanoparticles." Journal of Nanomaterials 2013 (2013): 1–7. http://dx.doi.org/10.1155/2013/839016.

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Silver and copper nanoparticles, respectively, were produced on glass slides via magnetron sputtering. The experiments show that with magnetron sputtering the size and concentration of the nanoparticles can be easily controlled via sputter time and plasma power. Silver nanoparticles grow much faster than copper nanoparticles, which also require higher plasma power for their synthesis. Exposed to albumin solution, the glass slides with silver nanoparticles clearly show a delay in albumin attachment compared to pure glass slides. Glass slides with copper nanoparticles show a slight attachment of albumin even after 3 h of exposure. However, the albumin concentration on the surface of the glass slides was much smaller compared to pure glass slides and did not increase within 24 h.

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Slavcheva, E., G. Ganske, and U. Schnakenberg. "Sputtered Pd as Hydrogen Storage for a Chip-Integrated Microenergy System." Scientific World Journal 2014 (2014): 1–7. http://dx.doi.org/10.1155/2014/146126.

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The work presents a research on preparation and physical and electrochemical characterisation of dc magnetron sputtered Pd films envisaged for application as hydrogen storage in a chip-integrated hydrogen microenergy system. The influence of the changes in the sputtering pressure on the surface structure, morphology, and roughness was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AMF). The electrochemical activity towards hydrogen adsorption/desorption and formation of PdH were investigated in 0.5 M H2SO4using the methods of cyclic voltammetry and galvanostatic polarisation. The changes in the electrical properties of the films as a function of the sputtering pressure and the level of hydrogenation were evaluated before and immediately after the electrochemical charging tests, using a four-probe technique. The research resulted in establishment of optimal sputter regime, ensuring fully reproducible Pd layers with highly developed surface, moderate porosity, and mechanical stability. Selected samples were integrated as hydrogen storage in a newly developed unitized microenergy system and tested in charging (water electrolysis) and discharging (fuel cell) operative mode at ambient conditions demonstrating a stable recycling performance.

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Khopin, P. N. "The Efficiency of Tribocoupling with МоS2-Based Solid Lubricant Coatings Using Magnetron and Suspension Sputtering." Proceedings of Higher Educational Institutions. Маchine Building, no. 9 (714) (September 2019): 96–104. http://dx.doi.org/10.18698/0536-1044-2019-9-96-104.

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An analysis of studies conducted under vacuum conditions revealed that MoS2-based solid lubricant coatings applied to a titanium base using magnetron sputtering was virtually unusable. It was established that satisfactory working capacity of the considered couplings could be achieved by preliminary treatment of the base, that is by galvanic chrome plating and nickel plating. It was shown that life of a coupling with solid lubricant coatings sputtered using the magnetron method on a ceramic base was higher than those sputtered on a metal base. However, starting from the middle of operational life, temporary “surges” in the coefficient of friction occurred and subsequently stabilized. The life of coatings sputtered using the magnetron method was 2.51 times lower than that of a coupling with coatings of the BNII NP 212 type obtained using the suspension method, and 3.65 times lower than that of similar types by foreign manufacturers. The coefficient of friction for the considered couplings under vacuum conditions varied from 0.02 to 0.07.

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Wang, Hong Bin, Ying Ting Luo, Feng Li, Hong Tu Song, Zhen Wu, and Xiong Li. "Fiber Bragg Grating Hydrogen Sensor Based on Magnetron Sputtering." Applied Mechanics and Materials 738-739 (March 2015): 3–6. http://dx.doi.org/10.4028/www.scientific.net/amm.738-739.3.

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This paper presents the development and fabrication of fiber Bragg grating hydrogen sensor by using magnetron sputtering method to overcome the problem of hydrogen embrittlement.With compact, smooth and high quality thin films deposited by magnetron sputtering, two layers have been sputtered around the fiber cladding: titanium (Ti) layer (20nm) and palladium (Pd) layer (500nm). Between the two layers, Ti is acted as adhesive coatings to ensure connection between fiber and Pd film. Finally, the performance of the developed FBG hydrogen sensor was tested in the laboratory under low hydrogen concentration. The results prove that the fabricated hydrogen sensor has a high sensitivity of 22.67pm/%H2.

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Sonoda, Tsutomu, and Kiyotaka Katou. "Coating of Granular Polymeric Spacers with Copper by Sputter-Deposition for Enhancing Cell Wall Structure of Sintered Highly Porous Aluminum Materials." Materials Science Forum 660-661 (October 2010): 432–36. http://dx.doi.org/10.4028/www.scientific.net/msf.660-661.432.

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The deposition of copper onto acrylic resin powder in its self-convective motion by magnetron DC sputtering was examined in order to prepare granular polymeric spacers coated with the metal, aiming at enhancing the cell wall structure of sintered highly porous aluminum materials. The fabrication of sintered highly porous aluminum materials was carried out in an ordinary powder metallurgy processing combined with a space-holder method with the polymer-copper binary spacer granules prepared by powder-coating using the sputter-deposition technique. The effects of the sputter-deposition of copper onto the spherical polymeric spacers on cell structures of the sintered porous compacts were investigated. According to optical observations, it was found that the sputtered copper could be uniformly and adherently deposited onto the surface of the acrylic granules. According to EPMA analysis on the cross-section on a sintered porous compact, it was found that Cu atoms were distributed at the vicinity of its cell walls, concluding that cell wall structures could be enhanced by this processing. Therefore it was expected that the compressive properties of the sintered highly porous aluminum materials were also improved by this powder coating process.

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Wasim, Muhammad, Muhammad Rafique Khan, Muhammad Mushtaq, Awais Naeem, Mengchen Han, and Qufu Wei. "Surface Modification of Bacterial Cellulose by Copper and Zinc Oxide Sputter Coating for UV-Resistance/Antistatic/Antibacterial Characteristics." Coatings 10, no. 4 (April 7, 2020): 364. http://dx.doi.org/10.3390/coatings10040364.

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In our study, the surface of bacterial cellulose was successively modified by copper and zinc oxide nanoparticles using direct current (DC) magnetron sputtering and radio frequency (RF) reactive sputter coating techniques. The target materials, copper and zinc, were 99.99% pure and used in the presence of argon (Ar) gas, while zinc nanoparticles were sputtered in the presence of oxygen gas to make zinc oxide nanoparticles. The as-prepared bacterial cellulose/copper/zinc oxide nanocomposite has good ultraviolet resistance, anti-static and antibacterial characteristics. The surface morphology and chemical composition of the nanocomposite were examined by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and energy-dispersive X-ray spectroscopic (EDS) techniques. The prepared bacterial cellulose/copper/zinc oxide nanocomposite illustrates excellent ultraviolet resistance (T.UVA%; 0.16 ± 0.02, T.UVB%; 0.07 ± 0.01, ultraviolet protection factor (UPF); 1850.33 ± 2.12), antistatic behavior (S.H.P; 51.50 ± 4.10, I.E. V; 349.33 ± 6.02) and antibacterial behavior (Escherichia coli; 98.45%, Staphylococcus aureus; 98.11%). Our nanocomposite prepared by sputter coating method could be a promising and effective candidate for ultraviolet resistance, antistatic and antibacterial in term of functional, technical, medical and in many daily life applications.

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Shalygina, Elena E., G. V. Maximova, M. A. Komarova, A. N. Shalygin, and L. V. Kozlovskii. "Magneto-Optical Investigation of Thin-Film Magnetic Systems." Solid State Phenomena 152-153 (April 2009): 253–56. http://dx.doi.org/10.4028/www.scientific.net/ssp.152-153.253.

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Results on the investigation of magnetic and magneto-optical properties of nanocrystalline Fe/Zr and Fe/Zr, Mo/Fe thin-film systems are presented. The examined samples were prepared by DC magnetron sputtering technique. The structural investigations of the samples were performed by X-ray diffraction analysis. The hysteresis loops and spectral dependencies of the transverse Kerr effect were measured employing the magneto-optical magnetometer and the magneto-optical spectrometer, respectively. The influence of the Zr and Mo layer thickness on the magnetic and magneto-optical properties of the examined samples was observed.

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Poolcharuansin, Phitsanu, Artit Chingsungnoen, Nitisak Pasaja, and James Bradley. "An Inverted Magnetron Operating in HiPIMS Mode." Plasma 1, no. 2 (November 27, 2018): 277–84. http://dx.doi.org/10.3390/plasma1020024.

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An ionized physical vapor deposition technique for thin ferromagnetic films is proposed. The technique is based on high power impulse magnetron sputtering (HiPIMS) with positive discharge polarity. A gapped-target was employed as the cathode of the magnetron. By applying positive HiPIMS pulses to the anode, sputtered particles inside the magnetron source were ionized and extracted through the gap. Using a discharge current with a peak of about 13 A, an ion flux in the order of 1021 m−2s−1 was obtained at a distance of 45 mm from the magnetron. In addition, deposition rates of up to 1.1 Å/s for nickel films were achieved using a 30 Hz repetition rate and 300 µs pulse width.

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Budi, Esmar, M. Mohd Razali, and A. R. Md Nizam. "SURFACE MORPHOLOGY OF SPUTTERED TITANIUM-ALUMINUM-NITRIDE COATINGS." Spektra: Jurnal Fisika dan Aplikasinya 5, no. 1 (April 30, 2020): 79–86. http://dx.doi.org/10.21009/spektra.051.09.

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A study on the surface morphology of sputtered TiAlN coatings is presented. The coatings were deposited by DC magnetron sputtering on tungsten carbide insert tools. The surface morphology was characterized by using Atomic Force Microscopy (AFM), and the surface roughness was indicated by RMS roughness value. It was observed that the TiAlN coating surface morphology was rough as the negative substrate bias and nitrogen flow rate are increased. The evolution of the sputtered TiAlN coatings surface morphology was due to the competition between particle diffusion and re-scattering effect during the sputtering process. At high negative substrate bias and nitrogen flow rate, the re-scattering effect was prominent, leading to the high roughness of the sputtered TiAlN coating surface.

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Zhang, Ning, Chun Hong Zhang, and Ying Huai Qiang. "Property Study on High-Speed Steel Deposited TiN Coatings by Magnetron Sputter Ion Plating." Applied Mechanics and Materials 275-277 (January 2013): 1866–69. http://dx.doi.org/10.4028/www.scientific.net/amm.275-277.1866.

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TiN coatings were deposited by Magnetron Sputter Ion Plating (MSIP) on the surface of high-speed steel W18Cr4V.The microstructure,coating thickness, micro-hardness and wear resistance of surface modification sample were investigated by the D/MAX-ⅢB X-ray diffraction tester, the coating thickness tester, the HV-1000 micro-sclerometer,the LKDM－2000 friction and wear tester,the S-3000N scaning electron microscopy.The influence of sputtering time,N2 partial pressures and sputtering current on the microstructure,coating thickness, micro-hardness and wear resistance of TiN coatings were also analysed.The best synthesis performance sputtering coatings of technologic scheme was established.

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Hong, Zhen, Alexandre Mello, L. Luan, Marcos Farina, L. R. Andrade, C. L. Ferreira, S. Paik, et al. "Characterization of Crystalline Hydroxyapatite Thin Coatings for Biomedical Applications." Key Engineering Materials 330-332 (February 2007): 525–28. http://dx.doi.org/10.4028/www.scientific.net/kem.330-332.525.

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Crystalline hydroxyapatite thin coatings have been prepared using a novel opposing RF magnetron sputtering approach at room temperature. X-ray diffraction (XRD) analysis shows that all the principal peaks are attributable to HA, and the as-deposited HA coatings are made up of crystallites in the size range of 50-100nm. Fourier transform infrared spectroscopy (FTIR) studies reveal the existence of phosphate, carbonate and hydroxyl groups, suggesting that HA coatings are carbonated. Finally, in vitro cell culture experiments have demonstrated that murine osteoblast cells attach and grow well on the as-sputtered coatings. These results encourage further studies of hydroxyapatite thin coatings prepared by the opposing RF magnetron sputtering approach as a promising candidate for next-generation bioimplant materials.

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Journal articles on the topic 'Magnetron Sputtern'

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