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Relevant bibliographies by topics / Masks (electronics)

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Academic literature on the topic 'Masks (electronics)'

Author: Grafiati

Published: 4 June 2021

Last updated: 26 July 2024

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Journal articles on the topic "Masks (electronics)"

1

Wivanius, Nadhrah, Nur Sakinah Asaad, Heru Wijanarko, and Ira Zamzami. "DESIGN OF EXPERIMENT (DOE) LIQUID PHOTOIMAGEABLE SOLDER MASKS PCB PADA TEACHING FACTORY MANUFACTURING OF ELECTRONICS (TFME) POLITEKNIK NEGERI BATAM." JURNAL INTEGRASI 12, no. 1 (April 22, 2020): 55–63. http://dx.doi.org/10.30871/ji.v12i1.1987.

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Makalah ini mengkaji beberapa variabel untuk mencari paramater yang paling baik dalam proses pembuatan PCB. Kajian ini mengimplementasikan PCB dengan proses screen printing yang menggunakan aplikasi LPISM (Liquid Photoimageable Solder Masks). Dimana dalam prosesnya pelapisan PCB dilakukan dengan mengendalikan jumlah cairan solder masks dalam sekali pelapisan menggunakan parameter yang tepat menggunakan metode Design of Experiment (DoE). Metode DoE ini bertujuan untuk memperbaiki kualitas PCB dengan biaya seminimal mungkin. DoE pada LPISM diterapkan di Teaching Factory Manufaktur Elektronika Politeknik Negeri Batam dengan tujuan untuk melindungi jalur PCB agar tidak terhubung satu dan yang lainnya, memberikan takaran yang tepat, serta mengurangi penggunaan solder masks lamination. Sehingga, laboran di Teaching Factory, Politeknik Negeri Batam dapat memproduksi PCB yang menggunakan metode LPISM dengan kualitas sesuai standar. Dari hasil analisis, didapatkan sudut yang tepat untuk melakukan screen printing adalah antara 150 - 200 agar menghasilkan screen yang tidak rusak. Selain itu, proses oven dapat menipiskan solder masks hingga 70 – 80%. Sehingga dari hasil keseluruhan rangkaian percobaan, didapatkan data ke-24 yang dapat dijadikan rekomendasi karena telah sesuai dengan standar IPC-SM-840C, dengan hasil ketebalan solder masks yaitu 2,5 µm.

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Muluneh, Melaku, Bawul Kim, Gershon Buchsbaum, and David Issadore. "Miniaturized, multiplexed readout of droplet-based microfluidic assays using time-domain modulation." Lab Chip 14, no. 24 (2014): 4638–46. http://dx.doi.org/10.1039/c4lc00819g.

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We have developed a miniaturized fluorescence detection platform for droplet based assays that can monitor multiple channels using only a single photodetector and no lenses. To accomplish this, we take advantage of the high bandwidth of electronics and encode the signal from each channel using distinct micropatterned masks.

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Tomczyk, Mariusz, Paweł Kubik, and Witold Waliszewski. "Optimization of the Ablative Laser Cutting of Shadow Mask for Organic FET Electrode Fabrication." Electronics 9, no. 12 (December 18, 2020): 2184. http://dx.doi.org/10.3390/electronics9122184.

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This article presents an ablative method of cutting masks from ultra-thin metal foils using nanosecond laser pulses. As a source of laser radiation, a pulsed fiber laser with a wavelength of 1062 nm with the duration of pulses from 15 to 220 nanoseconds (ns), was used in the research. The masks were made of stainless-steel foil with thicknesses of 30 µm, 35 µm, and 120 µm. Channels of different lengths from 50 to 300 µm were tested. The possibilities and limitations of the presented method are described. The optimization of the cutting process parameters was performed using the experiment planning techniques. A static, determined complete two-level plan (SP/DC 24) was used. On the basis of the analysis of the test structures, we designed and produced precise shading masks used in the process of organic field effect transistor (OFET) electrode evaporation. The ablative method proved suitable to produce masks with canals of minimum lengths of 70 µm. It offers facile, fast, and economically viable shadow mask fabrication for organic electronics applications, which moreover might enable fast prototyping and circuit design.

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Kamali, Seyedeh Mahsa, Ehsan Arbabi, Hyounghan Kwon, and Andrei Faraon. "Metasurface-generated complex 3-dimensional optical fields for interference lithography." Proceedings of the National Academy of Sciences 116, no. 43 (October 7, 2019): 21379–84. http://dx.doi.org/10.1073/pnas.1908382116.

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Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands out for its potential to fabricate complex structures at fast speeds. However, the interference lithography masks demonstrated generally suffer from limitations in terms of the patterns that can be generated. To overcome some of these limitations, here we propose the metasurface-mask–assisted 3D nanofabrication which provides great freedom in patterning various periodic structures. To showcase the versatility of this platform, we design metasurface masks that generate exotic periodic lattices like gyroid, rotated cubic, and diamond structures. As a proof of concept, we experimentally demonstrate a diffractive element that can generate the diamond lattice.

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Romankiw, L. T. "A path: from electroplating through lithographic masks in electronics to LIGA in MEMS." Electrochimica Acta 42, no. 20-22 (January 1997): 2985–3005. http://dx.doi.org/10.1016/s0013-4686(97)00146-1.

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6

Elassy, Akau, Shiroma, Seo, and Ohta. "Low-Cost Rapid Fabrication of Conformal Liquid-Metal Patterns." Applied Sciences 9, no. 8 (April 15, 2019): 1565. http://dx.doi.org/10.3390/app9081565.

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Patterned conformal conductive structures are used to realize flexible electronics for applications such as electronic skin, communication devices, and sensors. Thus, there is a demand for low-cost rapid fabrication techniques for flexible and stretchable conductors. Spray-coating of liquid metals is a prototyping method that is compatible with elastic substrates. In this work, UV-curable and polyimide masks were used to pattern sprayed liquid metal (LM). The effect of the spraying parameters on the thickness and conductivity of the LM was characterized. A minimum LM linewidth of 48 µm was achieved, along with a minimum gap width of 34 µm. A LM patch antenna and transmission line, which can potentially be used for communication systems, were demonstrated using this fabrication process.

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Vilà, Anna, Alberto Gomez, Luis Portilla, Marti Cirici, and Juan Ramon Morante. "Metal oxides as functional semiconductors. An inkjet approach." MRS Proceedings 1552 (2013): 45–50. http://dx.doi.org/10.1557/opl.2013.741.

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ABSTRACTInkjet printing provides an interesting technology for electronic devices, as it is a versatile minimum-waste cost-effective technique for direct writing on almost every surface without need of masks or sacrificial layers. Among the fields in which it has been tested, transparent and flexible electronics offer a variety of applications ranging from large-area roll-toroll (such as OLEDs for lighting or solar cells) to small low-consumption biocompatible devices such as biosensors.This work aims to present some advances in the field of semiconductors synthesized by sol-gel and patterned by inkjet printing. Chemical routes are used to obtain suitable inks, based on salts of Ga, In, Zn, Cu and Sn and solvents as methoxyethanol. Inkjet printing provides thin layers 20-300nm thick, with morphology strongly depending on the materials. Different thermal treatments are tested, and some chemical and optical characterization of the obtained layers allows optimizing the technology for each material.The effectiveness of the inks and the technique is demonstrated by the electronic behavior of thin-film transistors fabricated by the proposed technology. The different devices are compared, suggesting the properties of the different materials analyzed, as a step ahead in the development of a complete logic for such promising applications of the flexible electronics.

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Kuglics, Lajos, Attila Géczy, Karel Dusek, David Busek, and Balázs Illés. "Personal Air-Quality Monitoring with Sensor-Based Wireless Internet-of-Things Electronics Embedded in Protective Face Masks." Sensors 24, no. 8 (April 18, 2024): 2601. http://dx.doi.org/10.3390/s24082601.

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In this paper, the design and research of a sensor-based personal air-quality monitoring device are presented, which is retrofitted into different personal protective face masks. Due to its small size and low power consumption, the device can be integrated into and applied in practical urban usage. We present our research and the development of the sensor node based on a BME680-type environmental sensor cluster with a wireless IoT (Internet of Things)-capable central unit and overall low power consumption. The integration of the sensor node was investigated with traditional medical masks and a professional FFP2-type mask. The filtering efficiency after embedding was validated with a head model and a particle counter. We found that the professional mask withstood the embedding without losing the protective filtering aspect. We compared the inner and outer sensor data and investigated the temperature, pressure, humidity, and AQI (Air Quality Index) relations with possible sensor data-fusion options. The novelty is increased with the dual-sensor layout (inward and outward). It was found that efficient respiration monitoring is achievable with the device. With the analysis of the recorded data, characteristic signals were identified in an urban environment, enabling urban altimetry and urban zone detection. The results promote smart city concepts and help in endeavors related to SDGs (Sustainable Development Goals) 3 and 11.

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ROMANKIW, L. T. "ChemInform Abstract: A Path: From Electroplating Through Lithographic Masks in Electronics to LIGA in MEMS." ChemInform 28, no. 48 (August 2, 2010): no. http://dx.doi.org/10.1002/chin.199748341.

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Lauer, Scott, Whitten Little, Thomas Ambrose, Jeff Conrad, and Tim Cowen. "Precision Patterned Thin Films without Photolithography: Additive Manufacturing of Printed Electronics." International Symposium on Microelectronics 2013, no. 1 (January 1, 2013): 000927–31. http://dx.doi.org/10.4071/isom-2013-thp55.

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Additive manufacturing is the application of layer manufacturing techniques to fabricate microelectronic products. These techniques differentiate themselves from incumbent technologies in that they only add material to build the device and are an alternative to subtractive technologies such as lithography that globally coat layers and then etch-away unrequired materials. In this paper we discuss an additive technology that performs material evaporation through shadow masks. This process has shown significant potential for the fabrication of chip packaging, microelectronic devices and circuitry; specifically, high density interposers, fine conductor lines and embedded components such as capacitors, resistors, and transistors. The process is compatible with a number of both rigid and flexible substrates and deposition materials. Examples of devices and lines that have been manufactured by this technique are shown and discussed. Preliminary test data shows line / space resolution that has reached 5 / 20 microns and better.

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Dissertations / Theses on the topic "Masks (electronics)"

1

Bay, Christoph. "Dynamic holographic masks for adaptive optical lithography." Thesis, University of Cambridge, 2012. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.609954.

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George, Jonathan Keith. "Polar Synthetic Imaging| Single Pixel Imaging with Rotating Spiral Masks." Thesis, The George Washington University, 2014. http://pqdtopen.proquest.com/#viewpdf?dispub=1566270.

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The use of spiral masks placed in front of a single pixel and rotated in time is investigated as a method of single pixel imaging. Single pixel imaging allows an image to be reconstructed from samples of a single pixel over time. This sampling has traditionally been accomplished with liquid crystal arrays or digital micromirror devices. A set of rotating spiral masks in the aperture offer an alternative solution that may reduce complexity and cost for some imaging applications.

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Rathsack, Benjamen Michael. "Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition." Access restricted to users with UT Austin EID, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3035170.

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Ma, Xu. "Generalized inverse lithography methods for phase-shifting mask design." Access to citation, abstract and download form provided by ProQuest Information and Learning Company; downloadable PDF file, 38 p, 2007. http://proquest.umi.com/pqdweb?did=1338919391&sid=3&Fmt=2&clientId=8331&RQT=309&VName=PQD.

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Levin, Marcy E. "The use of edge gradient analysis on chrome and emulsion photomasks to determine modulation transfer functions /." Online version of thesis, 1985. http://hdl.handle.net/1850/10148.

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Agrawal, Ankur. "Development and characterization of advanced electron beam resists." Diss., Georgia Institute of Technology, 2003. http://hdl.handle.net/1853/34054.

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Cheshmehkani, Ameneh. "Design and synthesis of molecular resists for high resolution patterning performance." Thesis, Georgia Institute of Technology, 2013. http://hdl.handle.net/1853/50286.

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In this thesis, different approaches in synthesizing molecular resist are examined, and structure-property relations for the molecular resist properties are studied. This allows for design of resists that could be studied further as either negative or positive tone resists in photolithography. A series of compounds having different number of acrylate moiety, and different backbones were investigated for photoresist application. Thermal curing of acrylate compounds in organic solvent was also examined. Film shrinkage, as well as auto-polymerization was observed for these compounds that make them unsuitable as photoresist material. Furthermore, calix[4]resorcinarenes (C4MR) was chosen as backbone, and the functional groups was selected as oxetane and epoxy. Full functionalized C4MR compounds with oxetane, epoxy and allyl were synthesized. Variable-temperature NMR of C4MR-8Allyl was studied in order to get a better understanding of the structure’s conformers. Energy barrier of exchange (ΔG#) was determined from coalescence temperatures, and was 57.4 KJ/mol for aromatic and vinyl hydrogens and 62.1 KJ/mol for allylic hydrogens.

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Mishra, Ritwik. "Photoresist development on SiC and its use as an etch mask for SiC plasma etch." Thesis, Mississippi State : Mississippi State University, 2002. http://library.msstate.edu/etd/show.asp?etd=etd-06162002-205803.

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Sinha, Ashwini K. "Design and Characterization of Materials and Processes for Area Selective Atomic Layer Deposition." Diss., Georgia Institute of Technology, 2006. http://hdl.handle.net/1853/19736.

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Area selective atomic layer deposition (ASALD) is demonstrated to be a promising route to perform direct patterned deposition. In particular, methods to modify (or mask) the surface and process parameters to perform selective deposition of titanium dioxide have been developed and investigated in detail. Results indicated that self assembled monolayer based masking methodology posses significant limitations due to challenges associated with obtaining defect free monolayer and absence of traditional patterning techniques. On the other hand, polymer films based masking methodology offer a better alternative to perform ASALD. A number of factors that must be considered in designing a successful ASALD process based on polymer films were identified. These include: reactivity of polymer with ALD precursor, diffusion of ALD precursors through polymer mask and remnant precursor content in the polymer film during ALD cycling. Investigations suggested that ALD nucleation can be successfully blocked on polymer films that do not contain direct OH sites in their backbone. It was observed that sorption of water in the polymer film does not pose a serious limitation however; metal precursor diffusion through the polymer mask was identified as a critical parameter in determining the minimum required masking layer thickness for a successful ASALD process. In addition, a novel ASALD-based top surface imaging (TSI) technique has been developed. The ASALD-TSI process has demonstrated sharp contrast (etch barrier deposition vs exposure dose) and therefore offers the potential to overcome many of the challenges experienced with conventional TSI schemes.

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Alabi, Taiwo Raphael. "Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales." Diss., Georgia Institute of Technology, 2013. http://hdl.handle.net/1853/51709.

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Silicon and silicon-based materials have been investigated for the fabrication of electronic, optoelectronic, solar, and structural/mechanical devices. To enable the continuous use of silicon-based materials for next generation device applications, new and inexpensive ways of fabricating features of silicon, and silica-based materials are needed. This dissertation investigates: 1) novel techniques for the fabrication of silica and silicon nanofeatures with potential application in the electronics and optoelectronics industry; 2) new designs of photomodifiable material systems (resists) for maskless patterning of silica filled composites for structural/mechanical applications. Sub-micron and nano-scaled features were fabricated onto silicon and silicon oxide substrates using a technique combining block copolymers and laser interference ablation. The sacrificial block copolymers are loaded with metallic salt precursors and patterned with a UV laser to generate device-oriented nanofeatures. New photopolymerizable material systems (negative tone resists) were developed based on curcumin photosensitizer and an epoxy-acrylate, vinylether, and vinylether-acrylate silica¬-loaded material systems. The cationic and radical mechanisms employed by the monomeric systems under a high vapor pressure mercury lamp source were investigated with several materials characterization techniques.

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Books on the topic "Masks (electronics)"

1

Naoaki, Aizaki, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, and Society of Photo-optical Instrumentation Engineers. Japan Chapter., eds. Photomask and X-ray mask technology IV: 17-18 April, 1997, Kawasaki, Japan. Bellingham, Washington: SPIE, 1997.

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Hideo, Yoshihara, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers. Japan Chapter., eds. Photomask and X-ray mask technology III: 18-19 April, 1996, Kawasaki City, Kanagawa, Japan. Bellingham, Wash: SPIE, 1996.

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3

Naoaki, Aizaki, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and X-ray mask technology V: 9-10 April, 1998, Kawasaki, Japan. Bellingham, Washington: SPIE, 1998.

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4

Maurer, Wilhelm, and M. Warren Montgomery. Photomask technology 2010: 13-16 September 2010, Monterey, California, United States. Bellingham, Wash: Society of Photo-optical Instrumentation Engineers, 2010.

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Symposium, on Photomask Technology (29th 2009 Monterey Calif ). Photomask technology 2009: 14-17 September 2009, Monterey, California, United States. Bellingham, Wash: SPIE, 2009.

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6

J, Grenon Brian, Kimmel Kurt R, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 22nd Annual BACUS Symposium on Photomask Technology: 1-4 October, 2002, Monterey, California, USA. Bellingham, Wash: SPIE, 2002.

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7

Uwe, Behringer, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik., Forschungszentrum Karlsruhe. Institute for Microstructure Technology., and Society of Photo-optical Instrumentation Engineers., eds. 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents: 15-16 November 1999, Munich, Germany. Bellingham, Wash: SPIE, 2000.

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Maurer, Wilhelm, and Frank E. Abboud. Photomask technology 2011: 19-22 September 2011, Monterey, California, United States. Edited by BACUS (Technical group) and SPIE (Society). Bellingham, Wash: SPIE, 2011.

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9

T, Dao Giang, Grenon Brian J, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 21st Annual BACUS Symposium on Photomask Technology: 3-5 October 2001, Monterey, [California] USA. Bellingham, Wash: SPIE, 2002.

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10

W, Behringer Uwe F., VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik., and Society of Photo-optical Instrumentation Engineers., eds. 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents: Proceedings : 13-14 November 2000, Munich, Germany. Bellingham, Washington: SPIE, 2001.

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Book chapters on the topic "Masks (electronics)"

1

Gupta, S. V. "Testing of Electronic Balances." In Mass Metrology, 149–69. Berlin, Heidelberg: Springer Berlin Heidelberg, 2011. http://dx.doi.org/10.1007/978-3-642-23412-5_7.

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Gupta, S. V. "Testing of Electronic Balances." In Mass Metrology, 159–80. Cham: Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-12465-6_7.

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Gupta, S. V. "Electronic Balances and Effect of Gravity." In Mass Metrology, 65–88. Berlin, Heidelberg: Springer Berlin Heidelberg, 2011. http://dx.doi.org/10.1007/978-3-642-23412-5_4.

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Gupta, S. V. "Electronic Balances and Effect of Gravity." In Mass Metrology, 69–95. Cham: Springer International Publishing, 2019. http://dx.doi.org/10.1007/978-3-030-12465-6_4.

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Smith, F. Leslie, John W. Wright, and David H. Ostroff. "Electronic Mass Communication Law." In Perspectives on Radio and Television, 387–97. 4th ed. New York: Routledge, 2023. http://dx.doi.org/10.4324/9781003417897-17.

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Smith, F. Leslie, John W. Wright, and David H. Ostroff. "Electronic Mass Media Networks." In Perspectives on Radio and Television, 547–65. 4th ed. New York: Routledge, 2023. http://dx.doi.org/10.4324/9781003417897-25.

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Smith, F. Leslie, John W. Wright, and David H. Ostroff. "Electronic Mass Media News." In Perspectives on Radio and Television, 244–74. 4th ed. New York: Routledge, 2023. http://dx.doi.org/10.4324/9781003417897-10.

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Pau, L. F. "Mask Repair and Inspection." In Computer Vision for Electronics Manufacturing, 117–25. Boston, MA: Springer US, 1990. http://dx.doi.org/10.1007/978-1-4613-0507-1_8.

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Reichwald, Ralf, and Frank T. Piller. "Mass Customization-Konzepte im Electronic Business." In Handbuch Electronic Business, 359–82. Wiesbaden: Gabler Verlag, 2000. http://dx.doi.org/10.1007/978-3-322-92969-3_15.

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Reichwald, Ralf, and Frank T. Piller. "Mass Customization-Konzepte im Electronic Business." In Handbuch Electronic Business, 469–93. Wiesbaden: Gabler Verlag, 2002. http://dx.doi.org/10.1007/978-3-322-96349-9_19.

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Conference papers on the topic "Masks (electronics)"

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Angelova, Radostina A., Daniela Sofronova, Maria Dimova, Yavor Sofronov, Rositsa Velichkova, Peter Stankov, Detelin Markov, and Iskra Simova. "Heat transfer through protective face masks and respirators." In INTERNATIONAL CONFERENCE ON ELECTRONICS, ENGINEERING PHYSICS, AND EARTH SCIENCE. AIP Publishing, 2024. http://dx.doi.org/10.1063/5.0194778.

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Angelova, Radostina A., Sergey Mijorski, Peter Stankov, Daniela Sofronova, Rositsa Velichkova, Iskra Simova, and Detelin Markov. "Numerical simulation of the air permeability of protective face masks." In INTERNATIONAL CONFERENCE ON ELECTRONICS, ENGINEERING PHYSICS, AND EARTH SCIENCE. AIP Publishing, 2024. http://dx.doi.org/10.1063/5.0194777.

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Lopez, J. P., J. A. Rodrigo, D. Jimenez, and J. M. Menendez. "Definition of masks related to psychovisual features for Video Quality Assessment." In 2015 IEEE International Symposium on Consumer Electronics (ISCE). IEEE, 2015. http://dx.doi.org/10.1109/isce.2015.7177767.

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Revin, L. S., A. L. Pankratov, A. V. Chiginev, D. V. Masterov, A. E. Parafin, and S. A. Pavlov. "Synchronous Regimes in YBCO Long Josephson Junctions Fabricated by Preliminary Topology Masks." In 2017 16th International Superconductive Electronics Conference (ISEC). IEEE, 2017. http://dx.doi.org/10.1109/isec.2017.8314206.

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Ding, Jian-Jiun, Jen-Chieh Cheng, Xian-Cheng Lu, Sheng-Feng Tsai, Hsin-Ju Li, Hung-Chi Liu, Yang-Jyun Liou, and Cho-Ying Huang. "SVM-Based Root Identification Algorithm Using Ridge Features and Eroded Masks." In 2020 IEEE International Conference on Consumer Electronics - Taiwan (ICCE-Taiwan). IEEE, 2020. http://dx.doi.org/10.1109/icce-taiwan49838.2020.9258059.

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Wiem, Belhedi, Ben Messaoud Mohamed Anouar, and Bouzid Aicha. "Time-frequency masks for monaural speech separation: A comparative review." In 2016 7th International Conference on Sciences of Electronics, Technologies of Information and Telecommunications (SETIT). IEEE, 2016. http://dx.doi.org/10.1109/setit.2016.7939911.

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Mai, T. A., and B. Richerzhagen. "High precision and high speed cutting of 4th generation OLED masks with LaserMicroJet®." In 2007 Quantum Electronics and Laser Science Conference. IEEE, 2007. http://dx.doi.org/10.1109/qels.2007.4431521.

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Gopinath, Shivasubramanian, and Vijayakumar Anand. "Modulating Axial Resolutions of Scenes Recorded Incoherently Using Cubic Phase Masks by Chaos-Engineering." In 2023 International Conference on Next Generation Electronics (NEleX). IEEE, 2023. http://dx.doi.org/10.1109/nelex59773.2023.10421312.

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Hui Zhao, Hongwei Yi, and Yingcai Li. "Influences of sinusoidal component on typical phase masks used to realize wave-front coding technique." In 2011 International Conference on Electronics and Optoelectronics (ICEOE). IEEE, 2011. http://dx.doi.org/10.1109/iceoe.2011.6013059.

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Yu, Mufan, Shanshan Zou, Ailing Jia, and Xiangzhang Cheng. "Recognition of the standardization of wearing masks during the epidemic of COVID-19." In 2021 IEEE Asia-Pacific Conference on Image Processing, Electronics and Computers (IPEC). IEEE, 2021. http://dx.doi.org/10.1109/ipec51340.2021.9421236.

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Reports on the topic "Masks (electronics)"

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Teitsma and Shuttleworth. PR-004-03127-R01 Gas Coupled Ultrasonic Pipeline Inspection. Chantilly, Virginia: Pipeline Research Council International, Inc. (PRCI), January 2008. http://dx.doi.org/10.55274/r0010897.

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The gas coupled ultrasonics (GCUS) project aims to develop a method for inspecting gas pipelines using a modification of the standard ultrasonic method that does not require a liquid couplant. Ultrasonic inspection is the highest accuracy inspection method readily available for measuring remaining wall thickness and measures it directly rather than inferring it from measurements of metal loss as occurs with other methods, for example MFL. Traditional ultrasonic methods require a liquid couplant between the transducer and the wall that, although it has been done, requires the unwanted introduction of a liquid in a gas pipeline for gas pipeline inspection. The problem with using gas as a couplant is that, even at high pressure, very little ultrasonic energy is transmitted into the pipe wall, most of it being reflected back to the transducer. The result is a huge signal from the front wall that masks the tiny signals from the back wall unless the transducer is highly damped, causing rapid ring down. Early requirements for a successful transducer were 80 dB ring down in 2 microseconds and electronics that could handle a dynamic range of 120 dB.

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2

Sukys, Raimundas, and J. S. Rochefort. Control Electronics for an Ion Mass Filter in the Lower Ionosphere Payload Development Program. Fort Belvoir, VA: Defense Technical Information Center, September 1985. http://dx.doi.org/10.21236/ada175439.

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NARYKOVA, N. A., S. V. KHATAGOVA, and Yu R. PEREPELITSYNA. PEJORATIVE WORDS IN GERMAN MASS-MEDIA IN NOMINATIONS OF POLITICIANS. Science and Innovation Center Publishing House, April 2022. http://dx.doi.org/10.12731/2077-1770-2021-14-1-3-57-68.

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One of the main functions of mass media is influence on public opinion. So emotionally-painted lexical means are widely used in mass media in relation to leading politicians who are the centre of political arena. They are exposed to the frequent criticism, a negative estimation. The present article is devoted to the consideration of pejorative lexicon which is applied in nominations for heads of states. An empirical material of research were electronic newspapers and editions: Der Spiegel, Die Zeit, Sueddeutsche Zeitung, Der Tagesspiegel, taz, Die Welt, Gegenblende. As the basic methods of research are the following: the componental analysis, the lexico-semantic analysis, the stylistic analysis. The result of research revealed, that in German mass media there is a significant amount of persons names pejorative colouring. They express censure, disrespect, sneer, hatred, antipathy, condemnation, mistrust and so on. There main word-formations for persons nominations are composition, a derivation with using of suffixes and subsuffixes, attributive word-combinations, metaphorically-metonymical way. The materials of the research work can be used in the course of learning German language, at the practical training in oral speech, and also in the course of lexicology, general and aspect lexicography.

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Taylor, James, and Cheryl Smith. The electronic balance and some gravimetric applications (the density of solids and liquids, pycnometry and mass). Gaithersburg, MD: National Institute of Standards and Technology, 1994. http://dx.doi.org/10.6028/nist.ir.5375.

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Daibog, E. I., S. W. Kahler, and V. G. Stolpovskii. Study of the Relationship Between Coronal Mass Ejections and Energetic Electrons in Interplanetary Space,. Fort Belvoir, VA: Defense Technical Information Center, December 1996. http://dx.doi.org/10.21236/ada319277.

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Aubert, B. A Measurement of the Total Width, the Electronic Width, and the Mass of the Upsilon (10580) Resonance. Office of Scientific and Technical Information (OSTI), May 2004. http://dx.doi.org/10.2172/826925.

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Wagner, Gregor. A Measurement of the Total Width, the Electronic Width and the Mass of the Upsilon(10580) Resonance. Office of Scientific and Technical Information (OSTI), August 2003. http://dx.doi.org/10.2172/815249.

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Oh, Ju Hyun, Aimee Martinez, Huaixuan Cao, Garrett George, Jared Cobb, Poonam Sharma, Lauren Fassero, et al. Radio frequency heating of washable conductive textiles for bacteria and virus inactivation. Engineer Research and Development Center (U.S.), January 2024. http://dx.doi.org/10.21079/11681/48060.

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The ongoing COVID-19 pandemic has increased the use of single-use medical fabrics such as surgical masks, respirators, and other personal protective equipment (PPE), which have faced worldwide supply chain shortages. Reusable PPE is desirable in light of such shortages; however, the use of reusable PPE is largely restricted by the difficulty of rapid sterilization. In this work, we demonstrate successful bacterial and viral inactivation through remote and rapid radio frequency (RF) heating of conductive textiles. The RF heating behavior of conductive polymer-coated fabrics was measured for several different fabrics and coating compositions. Next, to determine the robustness and repeatability of this heating response, we investigated the textile’s RF heating response after multiple detergent washes. Finally, we show a rapid reduction of bacteria and virus by RF heating our conductive fabric. 99.9% of methicillin-resistant Staphylococcus aureus (MRSA) was removed from our conductive fabrics after only 10 min of RF heating; human cytomegalovirus (HCMV) was completely sterilized after 5 min of RF heating. These results demonstrate that RF heating conductive polymercoated fabrics offer new opportunities for applications of conductive textiles in the medical and/or electronic fields.

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Kulik, Yaroslav. Measurement of the $W$ boson mass using electrons at the edge of $D^0$ central calorimeter modules. Office of Scientific and Technical Information (OSTI), August 2001. http://dx.doi.org/10.2172/1421391.

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Crowne, Frank J. Derivation of Effective-Mass Expressions for Electrons and Holes in the Anisotropic Multiband Semimetals Ar, Sb, and Bi. Fort Belvoir, VA: Defense Technical Information Center, August 2000. http://dx.doi.org/10.21236/ada381337.

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