Books on the topic 'Masks (electronics)'

Naoaki, Aizaki, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, and Society of Photo-optical Instrumentation Engineers. Japan Chapter., eds. Photomask and X-ray mask technology IV: 17-18 April, 1997, Kawasaki, Japan. Bellingham, Washington: SPIE, 1997.

Hideo, Yoshihara, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers. Japan Chapter., eds. Photomask and X-ray mask technology III: 18-19 April, 1996, Kawasaki City, Kanagawa, Japan. Bellingham, Wash: SPIE, 1996.

Naoaki, Aizaki, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and X-ray mask technology V: 9-10 April, 1998, Kawasaki, Japan. Bellingham, Washington: SPIE, 1998.

Maurer, Wilhelm, and M. Warren Montgomery. Photomask technology 2010: 13-16 September 2010, Monterey, California, United States. Bellingham, Wash: Society of Photo-optical Instrumentation Engineers, 2010.

Symposium, on Photomask Technology (29th 2009 Monterey Calif ). Photomask technology 2009: 14-17 September 2009, Monterey, California, United States. Bellingham, Wash: SPIE, 2009.

J, Grenon Brian, Kimmel Kurt R, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 22nd Annual BACUS Symposium on Photomask Technology: 1-4 October, 2002, Monterey, California, USA. Bellingham, Wash: SPIE, 2002.

Uwe, Behringer, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik., Forschungszentrum Karlsruhe. Institute for Microstructure Technology., and Society of Photo-optical Instrumentation Engineers., eds. 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents: 15-16 November 1999, Munich, Germany. Bellingham, Wash: SPIE, 2000.

Maurer, Wilhelm, and Frank E. Abboud. Photomask technology 2011: 19-22 September 2011, Monterey, California, United States. Edited by BACUS (Technical group) and SPIE (Society). Bellingham, Wash: SPIE, 2011.

T, Dao Giang, Grenon Brian J, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. 21st Annual BACUS Symposium on Photomask Technology: 3-5 October 2001, Monterey, [California] USA. Bellingham, Wash: SPIE, 2002.

W, Behringer Uwe F., VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik., and Society of Photo-optical Instrumentation Engineers., eds. 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents: Proceedings : 13-14 November 2000, Munich, Germany. Bellingham, Washington: SPIE, 2001.

Konishi, Toshio. Photomask and next-generation lithography mask technology XVIII: 13-15 April 2011. Bellingham: SPIE, 2011.

Hiroyoshi, Tanabe, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Semiconductor Equipment and Materials International (Japan), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology X: 16-18 April, 2003, Yokohama, Japan. Bellingham, Wash: SPIE, 2003.

Hiraoki, Morimoto, Photomask Japan, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers., Ōyō Butsuri Gakkai, Seimitsu Kōgakkai, Denki Gakkai (1888), and Semiconductor Equipment and Materials International (Japan), eds. Photomask and next-generation lithography mask technology VII: 12-13 April 2000, Yokohama, Japan. Bellingham, Wash., USA: SPIE, 2000.

Hidehiro, Watanabe, Photomask Japan, BACUS (Technical group), and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology XIV: 17-19 April 2007, Yokohama, Japan. Bellingham, Wash: SPIE, 2007.

Morihisa, Hoga, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology XIII: 18-20 April, 2006, Yokohama, Japan. Bellingham, Wash: SPIE, 2006.

Hiraoki, Morimoto, Photomask Japan, BACUS (Technical group), and Ōyō Butsuri Gakkai, eds. Photomask and X-ray mask technology VI: 13-14 April, 1999, Yokohama, Japan. Bellingham, Wash., USA: SPIE, 1999.

Symposium on Microlithography (10th 1990 Sunnyvale, Calif.). 10th Annual Symposium on Microlithography: Proceedings : September 26-27, 1990, Sunnyvale Hilton, Sunnyvale, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1991.

(Firm), Bacus International, and Society of Photo-optical Instrumentation Engineers., eds. 10th annual Symposium on Microlithography: September 26-27, 1990, Sunnyvale Hilton, Sunnyvale, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1991.

Office, Library of Congress Copyright. Federal statutory protection for mask works. [Washington, DC] (101 Independence Ave., SE, Washington 20559-6000): U.S. Copyright Office, 2004.

Library of Congress. Copyright Office. Federal statutory protection for mask works. [Washington, D.C.] (101 Independence Ave., SE, Washington 20559-6000): [Library of Congress, Copyright Office], 1998.

International, Symposium on Patterning Science and Technology (1st 1989 Hollywood Fla ). Proceedings of the Symposium on Patterning Science and Technology. Pennington, NJ (10 S. Main St., Pennington 08534-2896): Electrochemical Society, 1990.

L, Stover Harry, ed. Selected papers on optical microlithography. Bellingham, Wash: SPIE Optical Engineering Press, 1992.

O, Patterson David, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV: 28 February-1 March 1994, San Jose, California. Bellingham, Wash: SPIE, 1994.

International Symposium on Electrochemical Microfabrication (1st 1991 Phoenix, Ariz.). Proceedings of the First International Symposium on Electrochemical Microfabrication. Pennington, NJ: Electrochemical Society, 1992.

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and International SEMATECH, eds. Emerging lithographic technologies X: 21-23 February, 2006, San Jose, California, USA. Bellingham, Wash: SPIE, 2006.

S, Khokle W., ed. Patterning of material layers in submicron region. New York: J. Wiley, 1993.

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

1969-, Lercel Michael J., Society of Photo-optical Instrumentation Engineers., and SEMATECH (Organization), eds. Emerging lithographic technologies XI: 27 February- 1 March 2007, San Jose, California, USA. Bellingham, Wash: SPIE, 2007.

Hiroichi, Kawahira, Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, and Society of Photo-optical Instrumentation Engineers., eds. Photomask and next-generation lithography mask technology VIII: 25-27 April 2001, Yokohama, Japan. Bellingham, Wash: SPIE, 2001.

Hosono, Kunihiro. Photomask and next-generation lithography mask technology XVII: 13-15 April 2010, Yokohama, Japan. Bellingham, Wash: SPIE, 2010.

Hosono, Kunihiro. Photomask and next-generation lithography mask technology XVI: 8-10 April 2009, Yokohama, Japan. Edited by Photomask Japan, BACUS (Technical group), and SPIE (Society). Bellingham, Wash: SPIE, 2009.

Hosono, Kunihiro. Photomask and next-generation lithography mask technology XVII: 13-15 April 2010, Yokohama, Japan. Edited by SPIE (Society) and Photomask Japan. Bellingham, Wash: SPIE, 2010.

L, Engelstad Roxann, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VII: 25-27 February, 2003, Santa Clara, California, USA. Bellingham, Wash: SPIE, 2003.

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies IV: 28 February-1 March, 2000, Santa Clara, USA. Bellingham, Wash: SPIE, 2000.

Yuli, Vladimirsky, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International, eds. Emerging lithographic technologies III: 15-17 March, 1999, Santa Clara, California. Bellingham, Wash: SPIE, 1999.

Ann, Dobisz Elizabeth, Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International, and International SEMATECH, eds. Emerging lithographic technologies V: 27 February-1 March, 2001, Santa Clara, [California], USA. Bellingham, Wash: SPIE, 2001.

Willard, Conley, Semiconductor Equipment and Materials International., and Society of Photo-Optical Instrumentation Engineers., eds. Technologies for microlithography manufacturing: 11 July 1995, San Francisco, California. Mountain View, Calif., USA: Semiconductor Equipment and Materials International, 1995.

Okoroanyanwu, Uzodinma. Molecular theory of lithography. Bellingham, Washington, USA: SPIE, 2015.

Yōichi, Takehana, and Hōga Morihisa, eds. Fotomasuku: Denshi buhin seizō no kikan gijutsu = Photomask technology. Tōkyō: Tōkyō Denki Daigaku Shuppankyoku, 2011.

E, Seeger David, and Society of Photo-optical Instrumentation Engineers., eds. Emerging lithographic technologies: 10-11 March 1997, Santa Clara, California. Bellingham, Wash: SPIE, 1997.

Scott, Mackay R., Society of Photo-optical Instrumentation Engineers., Semiconductor Equipment and Materials International., and International SEMATECH, eds. Emerging lithographic technologies VIII: 24-26 February, 2004, Santa Clara, California, USA. Bellingham, Wash., USA: SPIE, 2004.

International Conference on Simulation and Design of Microsystems and Microstructures (1st 1995 Southampton, England). Simulation and design of microsystems and microstructures. Edited by Adey R. A, Lahrmann A, and Lessmöllmann C. Southampton: Computational Mechanics Publications, 1995.

A, Brunner Timothy, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Optical/laser microlithography VIII: 22-24 February 1995, Santa Clara, California. Bellingham, Wash: SPIE, 1995.

Etching in microsystem technology. Weinheim: Wiley-VCH, 1999.

International Symposium on Electrochemical Microfabrication (2nd 1994 Miami Beach, Fla.). Proceedings of the Second International Symposium on Electrochemical Microfabrication. Edited by Datta Madhav, Sheppard Keith, Dukovic John O, and Electrochemical Society Electrodeposition Division. Pennington, NJ: Electrochemical Society, 1995.

Fontaine, Bruno M. La, and F. M. Schellenberg. Alternative lithographic technologies: 24-26 February 2009, San Jose, California, United States. Edited by SPIE (Society) and International SEMATECH. Bellingham, Wash: SPIE, 2009.

Herr, Daniel J. C. Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States. Edited by SPIE (Society) and SEMATECH (Organization). Bellingham, Wash: SPIE, 2010.

Resnick, Douglas J., and William Man-Wai Tong. Alternative lithographic technologies IV: 13-16 February 2012, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Washington: SPIE, 2012.

Herr, Daniel J. C. Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States. Edited by SPIE (Society). Bellingham, Wash: SPIE, 2011.

M, Warlaumont John, Society of Photo-optical Instrumentation Engineers., and Semiconductor Equipment and Materials International., eds. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V: 20-21 February 1995, Santa Clara, California. Bellingham, Wash., USA: SPIE, 1995.