Academic literature on the topic 'Material modifications by ion beam'

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Journal articles on the topic "Material modifications by ion beam"

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Feng, Y. C., X. G. Li, and S. T. Yang. "Electron beam evaporation broad beam metal ion source for material modifications." Review of Scientific Instruments 67, no. 3 (1996): 924–26. http://dx.doi.org/10.1063/1.1146773.

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Ramola, R. C., and Subhash Chandra. "Ion Beam Induced Modifications in Conducting Polymers." Defect and Diffusion Forum 341 (July 2013): 69–105. http://dx.doi.org/10.4028/www.scientific.net/ddf.341.69.

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High energy ion beam induced modifications in polymeric materials is of great interest from the point of view of characterization and development of various structures and filters. Due to potential use of conducting polymers in light weight rechargeable batteries, magnetic storage media, optical computers, molecular electronics, biological and thermal sensors, the impact of swift heavy ions for the changes in electrical, structural and optical properties of polymers is desirable. The high energy ion beam irradiation of polymer is a sensitive technique to enhance its electrical conductivity, st
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Dudnikov, Vadim, and Andrei Dudnikov. "Highly Efficient Small Anode Ion Source." Plasma 4, no. 2 (2021): 214–21. http://dx.doi.org/10.3390/plasma4020013.

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We describe some modifications to a Bernas-type ion source that improve the ion beam production efficiency and source operating lifetime. The ionization efficiency of a Bernas type ion source has been improved by using a small anode that is a thin rod, oriented along the magnetic field. The transverse electric field of the small anode causes the plasma to drift in the crossed ExB field to the emission slit. The cathode material recycling was optimized to increase the operating lifetime, and the wall potential optimized to suppress deposition of material and subsequent flake formation. A three-
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Iwase, Akihiro. "Modifications of Metallic and Inorganic Materials by Using Ion/Electron Beams." Quantum Beam Science 6, no. 1 (2021): 1. http://dx.doi.org/10.3390/qubs6010001.

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Abdul-Kader, A. M., and Andrzej Turos. "Ion Beam Induced Modifications of Biocompatible Polymer." Solid State Phenomena 239 (August 2015): 149–60. http://dx.doi.org/10.4028/www.scientific.net/ssp.239.149.

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Ion beam bombardment has shown great potential for improving the surface properties of polymers. In this paper, the ion beam-polymer interaction mechanisms are briefly discussed. The main objective of this research was to study the effects of H-ion beam on physico-chemical properties of Ultra-high-molecular-weight polyethylene (UHMWPE) as it is frequently used in biomedical applications. UHMWPE was bombarded with 65 keV H-ions to fluences ranging from 1x1014–2x1016 ions/cm2. Changes of surface layer composition produced by ion bombardment of UHMWPE samples were studied. The hydrogen release an
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Singh, Kritika, Surya Snata Rout, Christina Krywka, and Anton Davydok. "Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing." Materials 16, no. 22 (2023): 7220. http://dx.doi.org/10.3390/ma16227220.

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A focused ion beam scanning electron microscope (FIB-SEM) is a powerful tool that is routinely used for scale imaging from the micro- to nanometer scales, micromachining, prototyping, and metrology. In spite of the significant capabilities of a FIB-SEM, there are inherent artefacts (e.g., structural defects, chemical interactions and phase changes, ion implantation, and material redeposition) that are produced due to the interaction of Ga+ or other types of ions (e.g., Xe+, Ar+, O+, etc.) with the sample. In this study, we analyzed lattice distortion and ion implantation and subsequent materia
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Feng, Y. C., and S. P. Wong. "Low energy solid intense ion beams extracted by electron beam evaporation ion source for material modifications." Review of Scientific Instruments 69, no. 7 (1998): 2644–46. http://dx.doi.org/10.1063/1.1148992.

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Iqbal, Muhammad, J. I. Akhter, A. Qayyum, Y. Javed, M. Rafiq, and A. A. Khuram. "Surface Modification and Characterization of Bulk Amorphous Materials." Key Engineering Materials 510-511 (May 2012): 43–50. http://dx.doi.org/10.4028/www.scientific.net/kem.510-511.43.

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Bulk metallic glasses (BMGs) are well known for their promising properties. Surface properties can be further improved by using certain techniques such as electron beam melting (EBM), laser beam melting (LBM), ion irradiation, ion implantation and neutron irradiation. BMGs especially Zr-based BMGs have numerous applications as structural materials. In this manuscript, the results are presented on microstructural investigations and phase formations in Zr-based BMGs modified by using above mentioned techniques. Microstructure was studied by scanning electron microscopy (SEM). Phase analysis was
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Bahng, Jungbae, Yuncheol Kim, Young-woo Lee, et al. "Multi-filament ion source for uniform ion beam generation." Journal of Physics: Conference Series 2743, no. 1 (2024): 012054. http://dx.doi.org/10.1088/1742-6596/2743/1/012054.

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Abstract Ion beams are employed in various fields such as semiconductor manufacturing, surface modification and material science. The uniformity of ion beams is crucial in many applications, but conventional ion sources that use a single filament often limit the uniformity and intensity of the ion beam. This paper presents a study that aims to optimize a multi-filament ion source to enhance the uniformity of ion beams. The study includes a detailed explanation of the ion source components and design, methods for measuring ion beam uniformity with its experimental design, followed by results, a
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Hirayama, Y. "GaAs/AlGaAs material modifications induced by focused Ga ion beam implantation." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 6, no. 3 (1988): 1018. http://dx.doi.org/10.1116/1.584339.

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Dissertations / Theses on the topic "Material modifications by ion beam"

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Prosvetov, Alexey [Verfasser], Christina [Akademischer Betreuer] Trautmann, and Wolfgang [Akademischer Betreuer] Ensinger. "Ion-beam induced modifications of structural and thermophysical properties of graphite materials. / Alexey Prosvetov ; Christina Trautmann, Wolfgang Ensinger." Darmstadt : Universitäts- und Landesbibliothek Darmstadt, 2020. http://d-nb.info/1216627541/34.

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Sekula, Filip. "Technické úpravy a aplikace zařízení pro ozařování MeV ionty při tandemovém urychlovači v Uppsale." Master's thesis, Vysoké učení technické v Brně. Fakulta strojního inženýrství, 2021. http://www.nusl.cz/ntk/nusl-443884.

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V této práci je představeno zařízení pro ozařování MeV ionty při tandemovém urychlovači na univerzitě v Uppsale. Jsou podány základy teorie interakce iontů s pevnou látkou a modifikace materiálu pomocí iontů s vysokou energií. Zařízení tandemového urychlovače je popsáno počínaje generací iontů a konče dopadem iontů na vzorek v hlavní komoře zařízení pro iontové ozařování. Následně jsou detailně charakterizovány modifikace systému pro přesun vzorků a popsán princip jeho funkce. Pilotní aplikace upraveného systému v oblasti materiálových modifikací je prezentována na příkladu ozařování Ge kvanto
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Petrov, A., A. Alexandrov, E. Kralkina, P. Nekliudova, K. Vavilin, and V. Pavlov. "Advanced Ion and Plasma Sources for Materials Surface Engineering." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35409.

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The paper presents the results of the authors many year work in the field of ion&plasma sources development. The families of DC and RF ion and plasma sources are described. The results of ion&plasma sources utilization in materials surface modification technologies are discussed. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35409
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Delgado, Adriana de Oliveira. "Processos de modificação molecular em polímeros irradiados com feixe de íons." Universidade de São Paulo, 2012. http://www.teses.usp.br/teses/disponiveis/43/43134/tde-29032012-092529/.

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Diante da crescente necessidade de materiais com melhores propriedades para aplicações nos diversos campos da ciência e da tecnologia, a irradiação com feixes iônicos mostra-se como uma importante ferramenta de modicação de materiais. A irradiação de polímeros, em especial, fornece sempre novas perspectivas de aplicabilidade para esses materiais. Diante disso, o presente trabalho tem como objetivo estudar quais são e como ocorrem os processos de modicação de polímeros irradiados com feixes de íons de alta energia. Para essa investigação, amostras de politetrauoroetileno (PTFE) e poli éter éter
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Roshchupkina, Olga. "Ion beam induced structural modifications in nano-crystalline permalloy thin films." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2013. http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-114158.

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In the last years, there is a rise of interest in investigation and fabrication of nanometer sized magnetic structures due to their various applications (e.g. for data storage or micro sensors). Over the last several decades ion beam implantation became an important tool for the modification of materials and in particular for the manipulation of magnetic properties. Nanopatterning and implantation can be done simultaneously using focused-ion beam (FIB) techniques. FIB implantation and standard ion implantation differ in their beam current densities by 7 orders of magnitude. This difference can
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Luttrell, Timothy. "Photocatalysis and Grazing-Ion Beam Surface Modifications of Planar TiO2 Model Systems." Scholar Commons, 2014. https://scholarcommons.usf.edu/etd/5064.

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This dissertation is related to the understanding of catalytic reactions of metal oxides. For several decades, the surfaces and bulk of materials have been probed to determine additional properties that relate to photocatalytic applications. This investigation furthers these efforts by the (a) modification of a metal oxide surface to isolate known influences of chemical properties and (b) proposing and utilizing a novel methodology for attribution of photocatalytic activity to a discernable influence. For the first effort, by effectively utilizing a known technique for a new application on a m
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Hafermann, Martin [Verfasser], Carsten [Gutachter] Ronning, Thomas [Gutachter] Taubner, and Thomas [Gutachter] Zentgraf. "Ion beam modification of phase-change materials for optical applications / Martin Hafermann ; Gutachter: Carsten Ronning, Thomas Taubner, Thomas Zentgraf." Jena : Friedrich-Schiller-Universität Jena, 2021. http://d-nb.info/1233353144/34.

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Strobel, Matthias. "Modeling and computer simulation of ion beam synthesis of nanostructures." Doctoral thesis, [S.l.] : [s.n.], 1999. http://deposit.ddb.de/cgi-bin/dokserv?idn=963546481.

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Illing, Cyprian A. W. "Chemical Mechanisms and Microstructural Modification of Alloy Surface Activation for Low-Temperature Carburization." Case Western Reserve University School of Graduate Studies / OhioLINK, 2018. http://rave.ohiolink.edu/etdc/view?acc_num=case1521753968828438.

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Orso, Steffen. "Structural and mechanical investigations of biological materials using a Focussed Ion Beam microscope." [S.l. : s.n.], 2005. http://nbn-resolving.de/urn:nbn:de:bsz:93-opus-27175.

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Books on the topic "Material modifications by ion beam"

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Kelly, Roger, and M. Fernanda Silva, eds. Materials Modification by High-fluence Ion Beams. Springer Netherlands, 1988. http://dx.doi.org/10.1007/978-94-009-1267-0.

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NATO Advanced Study Institute on Materials Modification by High-fluence Ion Beams (1987 Viana do Castelo, Portugal). Materials modification by high-fluence ion beams. Kluwer Academic Publishers, 1989.

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Kelly, Roger. Materials Modification by High-fluence Ion Beams. Springer Netherlands, 1988.

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International Conference on Ion Beam Modification of Materials (5th 1986 Catania). Ion beam modification of materials: Proceedings ofthe fifth International Conference on Ion Beam Modification of Materials, Catania, Italy,9-13 june 1986. Edited by Campisano S. U. North Holland, 1987.

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International Conference on Ion Beam Modification of Materials (9th 1995 Canberra, A.C.T.). Ion beam modification of materials: Proceedings of the ninth International Conference on Ion Beam Modification of Materials, Canberra, Australia, 5-10 February, 1995. Edited by Williams James S. 1948-, Elliman R. G, and Ridgway M. C. Elsevier Science, 1996.

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International Conference on Ion Beam Modification of Materials (8th 1992 Heidelberg, Germany). Ion beam modification of materials: Proceedings of the Eighth International Conference on Ion Beam Modification of Materials, Heidelberg, Germany, 7-11 September 1992. Edited by Kalbitzer S, Meyer Otto, and Wolf G. K. North-Holland, 1993.

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International Conference on Ion Beam Modification of Materials (7th 1990 Knoxville, Tenn.). Ion beam modification of materials: Proceedings of the Seventh International Conference on Ion Beam Modification of Materials, Knoxville, TN, USA, 9-14 September 1990. Edited by Withrow S. P and Poker D. B. North-Holland, 1991.

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Szycher, M. Biomaterials for the 1990s: Polyurethanes, silicones and ion beam modification techniques. K & M Co., 1990.

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E, Harper James M., Materials Research Society, and Symposium on Low Energy Ion Beam and Plasma Modification of Materials (1991 : Anaheim, Calif.), eds. Low energy ion beam and plasma modification of materials: Symposium held April 30-May 2, 1991, Anaheim, California, U.S.A. Materials Research Society, 1991.

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1955-, Gibson Ursula Jane, White Alice E, and Pronko Peter P, eds. Materials modification and growth using Ion beams: Symposium held April 21-23, 1987, Anaheim, California, U.S.A. Materials Research Society, 1987.

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Book chapters on the topic "Material modifications by ion beam"

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Roccaforte, Fabrizio, Filippo Giannazzo, Corrado Bongiorno, Sebania Libertino, Francesco La Via, and Vito Raineri. "Ion-Beam Induced Modifications of Titanium Schottky Barrier on 4H-SiC." In Materials Science Forum. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-963-6.729.

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Kholmetskii, A. L., V. V. Uglov, V. V. Khodasevich, et al. "Modification of Steel Surfaces Following Plasma and Ion Beam Implantation Investigated by Means of Cems." In Material Research in Atomic Scale by Mössbauer Spectroscopy. Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-010-0151-9_7.

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Iwaki, Masaya. "Ion Beam Modification of Carbon Materials." In Solid State Phenomena. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/3-908451-12-4.107.

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Yamada, I., J. Matsuo, Z. Insepov, and M. Akizuki. "Surface modifications by gas cluster ion beams." In Ion Beam Modification of Materials. Elsevier, 1996. http://dx.doi.org/10.1016/b978-0-444-82334-2.50035-6.

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Lipp, S., L. Frey, G. Franz, E. Demm, S. Petersen, and H. Ryssel. "Local material removal by focused ion beam milling and etching." In Ion Beam Modification of Materials. Elsevier, 1996. http://dx.doi.org/10.1016/b978-0-444-82334-2.50117-9.

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Tolopa, Alexander M., and Pan Tamek. "Application of TAMEK vacuum arc ion source for material modification." In Ion Beam Modification of Materials. Elsevier, 1996. http://dx.doi.org/10.1016/b978-0-444-82334-2.50224-0.

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Boutard, D., and B. Berthier. "Irradiation-induced modifications in metal-silicon interfaces under MeV focused helium beam." In Ion Beam Modification of Materials. Elsevier, 1996. http://dx.doi.org/10.1016/b978-0-444-82334-2.50225-2.

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Sasase, M., T. Yamaki, K. Miyake, I. Takano, and S. Isobe. "Formation of TiO2 Films as a Photocatalytic Material by Ion Beam Assisted Reactive Deposition Method – TDS Study of Ar Atom Incorporation in the TiO2 Films." In Ion Beam Modification of Materials. Elsevier, 1996. http://dx.doi.org/10.1016/b978-0-444-82334-2.50137-4.

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Yasui, Toshiaki, Miki Hiramatsu, Hirokazu Tahara, Ken-ichi Onoe, Yasuji Tsubakishita, and Takao Yoshikawa. "DEVELOPMENT OF A REENTRANT-CAVITY-TYPE ELECTRON CYCLOTRON RESONANCE (ECR) ION SOURCE AND ITS APPLICATIONS FOR MATERIAL PROCESSING." In Laser and Ion Beam Modification of Materials. Elsevier, 1994. http://dx.doi.org/10.1016/b978-0-444-81994-9.50025-7.

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Zhang, Zhigang, and Takashi Yagi. "KrF laser source with variable pulse width for material processing." In Laser and Ion Beam Modification of Materials. Elsevier, 1994. http://dx.doi.org/10.1016/b978-0-444-81994-9.50067-1.

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Conference papers on the topic "Material modifications by ion beam"

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Spektor, G., D. Carlson, Z. Newman, et al. "Ion-beam-sputtered silica-tantala alloys for nanophotonics." In Optical Interference Coatings. Optica Publishing Group, 2025. https://doi.org/10.1364/oic.2025.mc.6.

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We present a nanophotonic platform of ion-beam-sputtered silica–tantala alloys, where compositional tuning tailors the material linear and nonlinear optical properties, enabling low-loss waveguides for the near-infrared and visible while significantly enhancing the flexibility of photonic design.
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Poleshchenko, Konstantin, Dmitry Korotaev, Elena Ivanova, Andrey Teploukhov, and Vyacheslav Churankin. "Modification of structure and physical-mechanical properties of tool hard alloys with coatings by high-power ion beams." In Fourth International Conference on Optics, Computer Applications, and Materials Science (CMSD-IV 2024), edited by Arthur Gibadullin and Ramazon Abdullozoda. SPIE, 2025. https://doi.org/10.1117/12.3060657.

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Ray, Valery, Ali Hadjikhani, Joseph Favata, Seyedeh Ahmadi, and Sina Shahbazmohamadi. "Further Inquiry into Xe Primary Ion Species for Circuit Edit Application." In ISTFA 2017. ASM International, 2017. http://dx.doi.org/10.31399/asm.cp.istfa2017p0251.

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Abstract Widespread adoption and significant developments in Focused Ion Beam technology has made FIB/SEM instrumentation a commonplace sample preparation tool. Fundamental limitations inherent to Ga ion species complicate usage of Ga+ FIB instruments for the modification of semiconductor devices on advanced technology nodes. Said limitations are fueling interest in exploring alternative primary species and ion beam technologies for circuit edit applications. Exploratory tests of etching typical semiconductor materials with Xe ion beams generated from two plasma ion sources confirmed advantage
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Voitsekhovskii, Aleksander V., Andrej P. Kokhanenko, Yu A. Denisov, D. A. Oucherenko, Gennady E. Remnev, and Mikhail S. Opekunov. "High-power pulse-electron beam modification and ion implantation of Hg1-xCdxTe epitaxial structures." In Material Science and Material Properties for Infrared Optoelectronics, edited by Fiodor F. Sizov and Vladimir V. Tetyorkin. SPIE, 1997. http://dx.doi.org/10.1117/12.280460.

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Bender, H. J., and R. A. Donaton. "Focused Ion Beam Analysis of Low-K Dielectrics." In ISTFA 2000. ASM International, 2000. http://dx.doi.org/10.31399/asm.cp.istfa2000p0397.

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Abstract The characteristics of an organic low-k dielectric during investigation by focused ion beam (FIB) are discussed for the different FIB application modes: cross-section imaging, specimen preparation for transmission electron microscopy, and via milling for device modification. It is shown that the material is more stable under the ion beam than under the electron beam in the scanning electron microscope (SEM) or in the transmission electron microscope (TEM). The milling of the material by H2O vapor assistance is strongly enhanced. Also by applying XeF2 etching an enhanced milling rate c
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Bethke, D. "IC Design Modification Using Laser Assisted Organometal Deposition." In ISTFA 1997. ASM International, 1997. http://dx.doi.org/10.31399/asm.cp.istfa1997p0231.

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Abstract This paper explains how laser assisted deposition used in combination with focused ion beam (FIB) milling reduces turnaround time for complex circuit modifications. It presents the results of three case studies, characterizing the process and the effect of various processing parameters. The first case involves the creation of a low resistance path between internal signal lines using only laser techniques; the second case demonstrates the use of laser deposition to route interconnects, millimeters in length, between two complex FIB modifications; and the third case is designed to repro
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Herschbein, Steven B., Kyle M. Winter, Carmelo F. Scrudato, Brian L. Yates, Edward S. Hermann, and John Carulli. "FinFET Transistor Output Drive Performance Modification by Focused Ion Beam (FIB) Chip Circuit Editing." In ISTFA 2020. ASM International, 2020. http://dx.doi.org/10.31399/asm.cp.istfa2020p0122.

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Abstract Focused Ion Beam (FIB) chip circuit editing is a well-established highly specialized laboratory technique for making direct changes to the functionality of integrated circuits. A precisely tuned and placed ion beam in conjunction with process gases selectively uncovers internal circuitry, create functional changes in devices or the copper wiring pattern, and reseals the chip surface. When executed within reasonable limits, the revised circuit logic functions essentially the same as if the changes were instead made to the photomasks used to fabricate the chip. The results of the intend
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Mulholland, Matthew M., Ahmed A. Helmy, and Anthony V. Dao. "Pulse Laser Ablation Techniques for IC Package Substrate Modifications and Validation." In ISTFA 2016. ASM International, 2016. http://dx.doi.org/10.31399/asm.cp.istfa2016p0204.

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Abstract Post silicon validation techniques specifically Focused Ion Beam (FIB) circuit editing and Failure Analysis (FA) require sample preparation on Integrated Circuits (IC). Although these preparation techniques are typically done globally across the encapsulated and silicon packaging materials, in some scenarios with tight mechanical or thermal boundary conditions, only a local approach can be attempted for the analysis. This local approach to access the underlying features, such as circuits, solder bumps, and electrical traces can be divided into two modification approaches. The back sid
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Zhang, S. J., L. Chen, A. V. Stepanov, et al. "Irradiation effect of intense pulsed ion beam on (TiZrNbTaCr)C." In 8th International Congress on Energy Fluxes and Radiation Effects. Crossref, 2022. http://dx.doi.org/10.56761/efre2022.s1-o-051301.

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Intense pulsed ion beam (IPIB), featured with pulsed high-power density, has been widely used in the modification of materials. The influence of IPIB irradiation on surface microstructure and phase structure of (TiZrNbTaCr)C ceramics was investigated in this work. Experiments were carried out using TEMP-4M accelerator with peak accelerating voltage, current density, and pulse duration (FWHM) of 220 kV, 150 A/cm2, and 80 ns respectively. Atomic force microscope (AFM), scanning electron microscope and Energy-dispersive X-ray spectroscopy (SEM-EDS), as well as X-ray diffraction (XRD) were used to
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Ray, Valery. "High Aspect Ratio via Milling Endpoint Phenomena in Focused Ion Beam Modification of Integrated Circuits." In ISTFA 2004. ASM International, 2004. http://dx.doi.org/10.31399/asm.cp.istfa2004p0658.

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Abstract Precision detection of endpoint after the milling has reached targeted conductor during circuit modification by focused ion beam system is important. While the sensitivity of the endpoint detection can be enhanced by improved secondary electron collection and sample absorbed current monitoring, a detailed understanding of the endpoint signal distribution within a high aspect ratio (HAR) via is of great interest. This article presents an alternative model of HAR via milling endpointing mechanism in which a phenomenon of spatial distribution of the endpoint information within the HAR vi
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Reports on the topic "Material modifications by ion beam"

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Bystritskii, V. Modification of Material Surface Using Plasma-Enhanced Ion Beams. Defense Technical Information Center, 1998. http://dx.doi.org/10.21236/ada347696.

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RENK, TIMOTHY J., PAULA P. PROVENCIO, PAUL G. CLEM, SOMURI V. PRASAD, and M. O. THOMPSON. Use of Intense Ion Beams for Surface Modification and Creation of New Materials. Office of Scientific and Technical Information (OSTI), 2002. http://dx.doi.org/10.2172/808612.

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More, R. M., J. J. Barnard, F. M. Bieniosek, E. Henestroza, S. M. Lidia, and P. A. Ni. HEAVY ION FUSION SCIENCE VIRTUAL NATIONAL LABORATORY2nd QUARTER 2010 MILESTONE REPORTDevelop the theory connecting pyrometer and streak camera spectrometer data to the material properties of beam heatedtargets and compare to the data. Office of Scientific and Technical Information (OSTI), 2010. http://dx.doi.org/10.2172/983163.

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