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Relevant bibliographies by topics / Metal-Assisted chemical etching of silicon

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Academic literature on the topic 'Metal-Assisted chemical etching of silicon'

Author: Grafiati

Published: 1 March 2025

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Journal articles on the topic "Metal-Assisted chemical etching of silicon"

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Li, Yu Ping, Xiu Hua Chen, Wen Hui Ma, et al. "Research on Preparation of Porous Silicon Powders from Metallurgical Silicon Material." Materials Science Forum 847 (March 2016): 97–102. http://dx.doi.org/10.4028/www.scientific.net/msf.847.97.

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Stain etching, one step metal assisted chemical etching (1-MACE) and two-step metal assisted chemical etching (2-MACE) were used for preparing porous silicon powders (PSPs) based on metallurgical silicon powder. The influences of different oxidants species and concentrations on the structure of PSP were discussed. The results indicated that the different oxidant species has an important effect on the morphology and structure of PSP. In stain etching, there is still a challenge for fabricating PSP with uniform and controlled pore size structure. In contrast, metal-assisted chemical etching meth

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Cao, Dao Tran, Cao Tuan Anh, and Luong Truc Quynh Ngan. "Vertical-Aligned Silicon Nanowire Arrays with Strong Photoluminescence Fabricated by Metal-Assisted Electrochemical Etching." Journal of Nanoelectronics and Optoelectronics 15, no. 1 (2020): 127–35. http://dx.doi.org/10.1166/jno.2020.2684.

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Metal-assisted chemical etching of silicon is a commonly used method to fabricate vertical aligned silicon nanowire arrays. In this report we show that if in the above method the chemical etching is replaced by the electrochemical one, we can also produce silicon nanowire arrays, but with a special characteristic-extremely strong photoluminescence. Further research showed that the huge photoluminescence intensity of the silicon nanowire arrays made by metal-assisted electrochemical etching is related to the anodic oxidation of the silicon nanowires which has occurred during the electrochemical

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St John, Christopher, Christian L. Arrington, Jonathan Coleman, Mason Risley, and David Bruce Burckel. "Metasurface Optic Features Using Metal-Assisted Chemical Etching (MACE)." ECS Meeting Abstracts MA2024-02, no. 16 (2024): 1652. https://doi.org/10.1149/ma2024-02161652mtgabs.

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Metal-assisted chemical etching (MACE or MacEtch) is a versatile method for fabricating nano and micro-structured silicon (Si), which has garnered significant attention due to its potential applications in photovoltaics, sensors, and nanoelectronics. The process involves the oxidation of Si in the presence of a metal catalyst (typically noble metals like Au, Ag, or Pt) and a wet etch solution, usually comprising hydrofluoric acid (HF) and an oxidizing agent such as hydrogen peroxide (H2O2). Impressive work has already been completed in the two decades following the introduction of this method

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Zhang, Lansheng, Xiaoyang Chu, Feng Tian, Yang Xu, and Huan Hu. "Bio-Inspired Hierarchical Micro-/Nanostructures for Anti-Icing Solely Fabricated by Metal-Assisted Chemical Etching." Micromachines 13, no. 7 (2022): 1077. http://dx.doi.org/10.3390/mi13071077.

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We report a cost-effective and scalable methodology for producing a hierarchical micro-/nanostructured silicon surface solely by metal-assisted chemical etching. It involves two major processing steps of fabricating micropillars and nanowires separately. The process of producing micro-scale structures by masked metal-assisted chemical etching was optimized. Silicon nanowires were created on the micropillar’s surface via maskless metal-assisted chemical etching. The hierarchical micro-/nanostructured surface exhibits superhydrophobic properties with a high contact angle of ~156° and a low slidi

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Choi, Keorock, Yunwon Song, Ilwhan Oh, and Jungwoo Oh. "Catalyst feature independent metal-assisted chemical etching of silicon." RSC Advances 5, no. 93 (2015): 76128–32. http://dx.doi.org/10.1039/c5ra15745e.

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Li, Liyi, Colin M. Holmes, Jinho Hah, Owen J. Hildreth, and Ching P. Wong. "Uniform Metal-assisted Chemical Etching and the Stability of Catalysts." MRS Proceedings 1801 (2015): 1–8. http://dx.doi.org/10.1557/opl.2015.574.

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ABSTRACTRecently, metal-assisted chemical etching (MaCE) has been demonstrated as a promising technology in fabrication of uniform high-aspect-ratio (HAR) micro- and nanostructures on silicon substrates. In this work, MaCE experiments on 2 μm-wide line patterns were conducted using Au or Ag as catalysts. The performance of the two catalysts show sharp contrast. In MaCE with Au, a HAR trench was formed with uniform geometry and vertical sidewall. In MaCE with Ag, shallow and tapered etching profiles were observed, which resembled the results from isotropic etching. The sidewall tapering phenome

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Berezhanskyi, Ye I., S. I. Nichkalo, V. Yu Yerokhov, and A. A. Druzhynin. "Nanotexturing of Silicon by Metal-Assisted Chemical Etching." Фізика і хімія твердого тіла 16, no. 1 (2015): 140–44. http://dx.doi.org/10.15330/pcss.16.1.140-144.

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This paper describes the method of metal assisted chemical etching (MacEtch) as an efficient approach for structuring the silicon surface with the ability to manage effectively the geometric parameters of the structures and their distribution on the surface of substrate. The surface texturing technology was presented and the structured silicon surfaces with regular and irregular types of surfaces have been obtained. This technology can be used for nanotexturing of the surface of silicon photovoltaic converters. The model of photovoltaic converter based on the crater-textured silicon surface wi

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Yang, Xiaoyu, Ling Tong, Lin Wu, et al. "Research progress of silicon nanostructures prepared by electrochemical etching based on galvanic cells." Journal of Physics: Conference Series 2076, no. 1 (2021): 012117. http://dx.doi.org/10.1088/1742-6596/2076/1/012117.

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Abstract Metal-assisted etching of silicon in HF aqueous solution has attracted widespread attention due to its potential applications in electronics, photonics, renewable energy, and biotechnology. In this paper, the basic process and mechanism of metal assisted electrochemical etching of silicon in vapor or liquid atmosphere based on galvanic cells are reviewed. This paper focuses on the use of gas-phase oxidants O2 and H2O2 instead of liquid phase oxidants Fe(NO3)3 and H2O2 to catalyze the etching of silicon in the vapor atmosphere of HF aqueous solution. The mechanism of substrate enhanced

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Lai, Chang Quan, Wen Zheng, W. K. Choi, and Carl V. Thompson. "Metal assisted anodic etching of silicon." Nanoscale 7, no. 25 (2015): 11123–34. http://dx.doi.org/10.1039/c5nr01916h.

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Metal assisted anodic etching (MAAE) of Si was studied to compare the effects of hole generation at Au/Si interfaces and electrolyte/Si interfaces, and investigate the effects that electronic and chemical processes have on the nanostructures formed.

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Iatsunskyi, Igor, Valentin Smyntyna, Nykolai Pavlenko, and Olga Sviridova. "Peculiarities of Photoluminescence in Porous Silicon Prepared by Metal-Assisted Chemical Etching." ISRN Optics 2012 (November 1, 2012): 1–6. http://dx.doi.org/10.5402/2012/958412.

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Photoluminescent (PL) porous layers were formed on p-type silicon by a metal-assisted chemical etching method using H2O2 as an oxidizing agent. Silver particles were deposited on the (100) Si surface prior to immersion in a solution of HF and H2O2. The morphology of the porous silicon (PS) layer formed by this method was investigated by atomic force microscopy (AFM). Depending on the metal-assisted chemical etching conditions, the macro- or microporous structures could be formed. Luminescence from metal-assisted chemically etched layers was measured. It was found that the PL intensity increase

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Dissertations / Theses on the topic "Metal-Assisted chemical etching of silicon"

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MAGAGNA, STEFANO. "Thermoelectric nanostructured silicon obtained by Metal-assisted Chemical Etching." Doctoral thesis, Università degli Studi di Milano-Bicocca, 2021. http://hdl.handle.net/10281/312087.

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Il mio progetto di tesi prevede la preparazione di materiali a base di nanofili di silicio, sfruttando una via sintetica in soluzione: il Metal-assisted Chemical Etching (MaCE). La tecnica prevede l’immersione del substrato monoscristallino <100> di Silicio in una soluzione di acido fluoridrico, contenente una sorgente di ioni Ag+ (AgNO3). Il processo consiste sostanzialmente nell’ossidazione localizzata del Silicio, catalizzata dagli ioni Ag+; l’ossido di Silicio così formato viene successivamente disciolto dal HF presente in soluzione, permettendo la formazione di nanofili per etching

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Magagna, Stefano. "Thermoelectric nanostructured silicon obtained by metal-assisted chemical etching." Electronic Thesis or Diss., Aix-Marseille, 2021. http://www.theses.fr/2021AIXM0166.

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Mon projet de thèse implique la préparation de matériaux à base de nanofils de silicium, exploitant la solution de manière synthétique : gravure chimique assistée par métal (MaCE). J'ai pu pleinement caractériser depuis le point de vue morphologique des différents nanofils obtenus à partir de substrats à différentes concentrations de dopants, différentes espèces de dopants. La température d'attaque, ainsi que la concentration d'Ag + dans la solution. Les résultats autorisent à ouvrir une réflexion et une théorie avancée sur différents aspects de gravure, du transfert électronique de la localis

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Ngqoloda, Siphelo. "Vertically aligned silicon nanowires synthesised by metal assisted chemical etching for photovoltaic applications." University of the Western Cape, 2015. http://hdl.handle.net/11394/4872.

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>Magister Scientiae - MSc<br>One-dimensional silicon nanowires (SiNWs) are promising building blocks for solar cells as they provide a controlled, vectorial transport route for photo-generated charge carriers in the device as well as providing anti-reflection for incoming light. Two major approaches are followed to synthesise SiNWs, namely the bottom-up approach during vapour-liquid-solid mechanism which employs chemical vapour deposition techniques. The other method is the top-down approach via metal assisted chemical etching (MaCE). MaCE provides a simple, inexpensive and repeatable process

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Hildreth, Owen James. "Development of metal-assisted chemical etching as a 3D nanofabrication platform." Diss., Georgia Institute of Technology, 2012. http://hdl.handle.net/1853/49011.

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The considerable interest in nanomaterials and nanotechnology over the last decade is attributed to Industry's desire for lower cost, more sophisticated devices and the opportunity that nanotechnology presents for scientists to explore the fundamental properties of nature at near atomic levels. In pursuit of these goals, researchers around the world have worked to both perfect existing technologies and also develop new nano-fabrication methods; however, no technique exists that is capable of producing complex, 2D and 3D nano-sized features of arbitrary shape, with smooth walls, and at low cost

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Khanyile, Sfiso Zwelisha. "Silicon nanowires by metal-assisted chemical etching and its incorporation into hybrid solar cells." University of Western Cape, 2021. http://hdl.handle.net/11394/8340.

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Philosophiae Doctor - PhD<br>The rapid increase in global energy demand in recent decades coupled with the adverse environmental impact of conventional fuels has led to a high demand for alternative energy sources that are sustainable and efficient. Renewable solar energy technologies have received huge attention in recent decades with the aim of producing highly efficient, safe, flexible and robust solar cells to withstand harsh weather conditions. c-Si has been the material of choice in the development of conventional inorganic solar cells owing to it superior properties, abundance and highe

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Zheng, Wen Ph D. Massachusetts Institute of Technology. "Fabrication of capacitors based on silicon nanowire arrays generated by metal-assisted wet chemical etching." Thesis, Massachusetts Institute of Technology, 2016. http://hdl.handle.net/1721.1/104114.

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Thesis: Ph. D., Massachusetts Institute of Technology, Department of Materials Science and Engineering, 2016.<br>This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.<br>Cataloged from student-submitted PDF version of thesis.<br>Includes bibliographical references (pages 170-177).<br>Capacitors with high capacitance density (capacitance per footprint area) have potential applications in autonomous microsystems that harvest energy from the environment, as they can store and release energy at high rates.

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Xu, Ying. "Fabrication and Characterization of Photodiodes for Silicon Nanowire Applications and Backside Illumination." University of Dayton / OhioLINK, 2015. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1446313926.

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Мадан, Роман Григорович. "Фотоперетворювачі на основі наноструктурованого кремнію". Bachelor's thesis, КПІ ім. Ігоря Сікорського, 2019. https://ela.kpi.ua/handle/123456789/28855.

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Робота складається з 55 сторінок, 4 розділів та містить 35 ілюстрацій, 24 таблиці та 19 джерел в переліку посилань. Актуальність теми – інтерес до створення гібридних органічних та неорганічних фотоперетворювачів, що мають більш низьку вартість, ніж традиційні. Метою роботи є дослідження вольт-амперних характеристик фотоперетворювачів. Порівняння характеристик пористого кремнію, отриманого за різного часу травлення. Об’єкт дослідження – фотоперетворювачі на основі наноструктурованого кремнію. Предмет дослідження – методи одержання та морфологія наноструктурованого шару оксиду індію й оло

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Togonal, Alienor. "Silicon Nanowires for Photovoltaics : from the Material to the Device." Thesis, Université Paris-Saclay (ComUE), 2016. http://www.theses.fr/2016SACLX032/document.

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Les cellules solaires à base de nanofils de silicium offrent une alternative intéressante pour la réalisation de panneaux photovoltaïques à haut rendement et à faible coût. Elles bénéficient notamment des excellentes propriétés optiques des nanofils qui forment une surface à très faible réflectivité tout en piégeant efficacement la lumière. Dans cette thèse, nous utilisons et améliorons une méthode de gravure chimique peu coûteuse et industrialisable pour la fabrication de forêts de nanofils de silicium. En adaptant la mouillabilité du substrat et des nanofils, nous avons remédié au problème d

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Мадан, Роман Григорович. "Органо-неорганічні гібриди на основі меланіну". Master's thesis, КПІ ім. Ігоря Сікорського, 2020. https://ela.kpi.ua/handle/123456789/38762.

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Актуальність теми – інтерес до створення гібридних органічних та неорганічних тонкоплівкових сонячних елементів, що мають більш низьку вартість, ніж традиційні сонячні елементи. Метою роботи є визначення оптимальних технологічних умов створення органічно-неорганічних структур для фотовольтаїчного застосування. Предмет дослідження – органо-неорганічні структури на основі кремнію та меланіну.<br>The relevance of the topic is the interest in creating hybrid organic and inorganic thin-film solar cells, which have a lower cost than traditional solar cells. The aim of the work is to determine the

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Books on the topic "Metal-Assisted chemical etching of silicon"

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Micro- and Nano-Fabrication by Metal Assisted Chemical Etching. MDPI, 2021. http://dx.doi.org/10.3390/books978-3-03943-846-4.

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Micro- and Nano-Fabrication by Metal Assisted Chemical Etching. Mdpi AG, 2021.

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Micromachining using electrochemical discharge phenomenon: Fundamentals and application of spark assisted chemical engraving. W. Andrew, 2009.

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Book chapters on the topic "Metal-Assisted chemical etching of silicon"

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Lee, Seyeong, Dong-Hee Kang, Seong-Min Kim, and Myung-Han Yoon. "Vertical silicon nanostructures via metal-assisted chemical etching." In Silicon Nanomaterials Sourcebook. CRC Press, 2017. http://dx.doi.org/10.4324/9781315153551-8.

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Toan, Nguyen Van, and Takahito Ono. "Capacitive Silicon Resonators with Narrow Gaps Formed by Metal-Assisted Chemical Etching." In Capacitive Silicon Resonators. CRC Press, 2019. http://dx.doi.org/10.1201/9780429266010-7.

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Ivanov, B., D. Philipov, V. Shanov, and G. Peev. "Laser Induced Chemical Etching of Silicon with SF6 Using a Copper Bromide Vapour Laser." In Pulsed Metal Vapour Lasers. Springer Netherlands, 1996. http://dx.doi.org/10.1007/978-94-009-1669-2_41.

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Sharma, Virender, Abhishek Verma, Vinod Kumar Jain, and Daisy Verma. "Antireflection Properties of Multi-crystalline Black Silicon with Acid Textured Surfaces Using Two Step Metal Assisted Chemical Etching." In Springer Proceedings in Physics. Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-29096-6_3.

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Hadjersi, T., N. Gabouze, A. Ababou, et al. "Metal-Assisted Chemical Etching of Multicrystalline Silicon in HF/ Na₂S₂O₈ Produces Porous Silicon." In Materials Science Forum. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-962-8.139.

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Lévy-Clément, Claude. "Porous Silicon Formation by Metal Nanoparticle-Assisted Etching." In Handbook of Porous Silicon. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-04508-5_5-1.

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Lévy-Clément, Claude. "Porous Silicon Formation by Metal Nanoparticle-Assisted Etching." In Handbook of Porous Silicon. Springer International Publishing, 2014. http://dx.doi.org/10.1007/978-3-319-05744-6_5.

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Lévy-Clément, Claude. "Porous Silicon Formation by Metal Nanoparticle-Assisted Etching." In Handbook of Porous Silicon. Springer International Publishing, 2018. http://dx.doi.org/10.1007/978-3-319-71381-6_5.

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Hildreth, Owen, and C. P. Wong. "Nano-metal-Assisted Chemical Etching for Fabricating Semiconductor and Optoelectronic Devices." In Materials for Advanced Packaging. Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-45098-8_21.

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Irreraa, Alessia, Giorgia Franzòb, Barbara Fazioa, et al. "Chapter 6 Room Temperature Light Emission from Silicon Nanowires Fabricated by a Metal-Assisted Wet Etching Process." In Silicon Nanophotonics: Basic Principles, Present Status, and Perspectives, 2nd Ed. Pan Stanford Publishing Pte. Ltd., 2016. http://dx.doi.org/10.1201/9781315364797-7.

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Conference papers on the topic "Metal-Assisted chemical etching of silicon"

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Cho, Hyein, Yebin Ahn, Sang Beom Hong, et al. "Advanced Metal-Assisted Chemical Etching Using HF Vapor and Ozone for MEMS Process." In 2024 IEEE International Electron Devices Meeting (IEDM). IEEE, 2024. https://doi.org/10.1109/iedm50854.2024.10873380.

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Xu, Hongbo, Jianqiang Wang, Hongyun Zhao, and Mingyu Li. "Silicon Vias Fabricatied by Metal-Assisted Chemical Etching." In 2020 21st International Conference on Electronic Packaging Technology (ICEPT). IEEE, 2020. http://dx.doi.org/10.1109/icept50128.2020.9202901.

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Koval, Viktoriia, Yuriy Yakymenko, Anatoliy Ivashchuk, et al. "Metal-Assisted Chemical Etching of Silicon for Photovoltaic Application." In 2019 IEEE 39th International Conference on Electronics and Nanotechnology (ELNANO). IEEE, 2019. http://dx.doi.org/10.1109/elnano.2019.8783506.

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Toan, N. V., M. Toda, and T. Ono. "High aspect silicon structures using metal assisted chemical etching." In 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO). IEEE, 2016. http://dx.doi.org/10.1109/nano.2016.7751348.

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Xu, Ying, Chuan Ni, and Andrew Sarangan. "Silicon nanowire photodetectors made by metal-assisted chemical etching." In SPIE Nanoscience + Engineering, edited by Eva M. Campo, Elizabeth A. Dobisz, and Louay A. Eldada. SPIE, 2016. http://dx.doi.org/10.1117/12.2238480.

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Jana, S., and S. R. Bhattacharyya. "Metal assisted chemical etching for light emitting silicon nanowires." In PROCEEDING OF INTERNATIONAL CONFERENCE ON RECENT TRENDS IN APPLIED PHYSICS AND MATERIAL SCIENCE: RAM 2013. AIP, 2013. http://dx.doi.org/10.1063/1.4810212.

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Song-Ting Yang, Chien-Ting Liu, Subramani Thiyagu, Chen-Chih Hsueh, and Ching-Fuh Lin. "Fabrication of Silicon thin film by metal-assisted chemical etching." In 2014 IEEE 14th International Conference on Nanotechnology (IEEE-NANO). IEEE, 2014. http://dx.doi.org/10.1109/nano.2014.6967974.

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Li, Xiaopeng, Alexander Sprafke, Stefan Schweizer, and Ralf B. Wehrspohn. "Purifying metallurgical silicon to solar grade silicon by metal-assisted chemical etching." In Freeform Optics. OSA, 2013. http://dx.doi.org/10.1364/freeform.2013.jm3a.8.

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Iatsunskyi, Igor, Stefan Jurga, Valentyn Smyntyna, Mykolai Pavlenko, Valeriy Myndrul, and Anastasia Zaleska. "Raman spectroscopy of nanostructured silicon fabricated by metal-assisted chemical etching." In SPIE Photonics Europe, edited by Christophe Gorecki, Anand K. Asundi, and Wolfgang Osten. SPIE, 2014. http://dx.doi.org/10.1117/12.2051489.

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Smyntyna, V. A., I. R. Iatsunskyi, O. V. Sviridova, and N. N. Pavlenko. "Photoluminescence Properties of Nanostructured Silicon Fabricated by Metal-assisted Chemical Etching." In Frontiers in Optics. OSA, 2012. http://dx.doi.org/10.1364/fio.2012.ftu1a.6.

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Reports on the topic "Metal-Assisted chemical etching of silicon"

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Ervin, Matthew H., and Brian Isaacson. Same-Side Platinum Electrodes for Metal Assisted Etching of Porous Silicon. Defense Technical Information Center, 2015. http://dx.doi.org/10.21236/ada623559.

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