Relevant bibliographies by topics / Mo/Si In-terferential Mirror

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Academic literature on the topic 'Mo/Si In-terferential Mirror'

Author: Grafiati
Published: 28 May 2022
Last updated: 31 July 2025

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Journal articles on the topic "Mo/Si In-terferential Mirror"

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Зуев, С. Ю., Р. С. Плешков, В. Н. Полковников та ін. "Влияние барьерных слоев бериллия на свойства многослойных зеркал Mo/Si". Журнал технической физики 89, № 11 (2019): 1779. http://dx.doi.org/10.21883/jtf.2019.11.48344.130-19.

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The results of studies of multilayer Mo/Si mirrors with interlayer layers of B4C and Be in the vicinity of a wavelength of 13.5 nm are presented. It is shown that a four-component multilayer mirror of the Mo/Be/Si/B4C type exceeds the Mo/Si mirror by 2% and the Mo/Si/B4C mirror by 1.3%. This mirror also provides the highest spectral bandwidth at half-height (Δλ1/2 = 0.535 nm). An explanation of these effects is given.
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HOTTA, YOSHIFUMI, MINAJI FURUDATE, MASAKI YAMAMOTO, and MAKOTO WATANABE. "DESIGN AND FABRICATION OF MULTILAYER MIRRORS FOR He-II RADIATION." Surface Review and Letters 09, no. 01 (2002): 571–76. http://dx.doi.org/10.1142/s0218625x0200266x.

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Design, fabrication, and reflectance evaluation of multilayer mirrors for He-II radiation are described. Based on the available complex refractive indices of materials at the wavelength of 30.4 nm, Mg, Al, Si, Cr, and C were selected as small absorption material to be paired. Mo/Si and Sc found in previous works were also included. In referring to optimum design for the highest reflectance, multilayers of Al/Mg, Au/Mg, C/Mg, Sc/Mg, C/Si, Al/C, and Mo/Si were fabricated by ion-beam sputtering. The highest reflectance of 27% was observed by a 15-period Mg/Sc mirror.
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Liu, Xiangyue, Zhe Zhang, Hongxuan Song, et al. "Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask." Micromachines 14, no. 3 (2023): 526. http://dx.doi.org/10.3390/mi14030526.

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The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large, curved mirrors, shadow mask was a common method to precisely control the period thickness distribution. To investigate the effect of shadow mask on the microstructure of Mo/Si multilayers, we deposited a set of Mo/Si multilayers with and without the shadow mask on a curved substrate with aperture of 200 mm by direct current (DC) magnetron sputtering in this work. Grazi
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Yang, Song, Shujing Chen, and Chengyou Lin. "Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors." Journal of Synchrotron Radiation 28, no. 5 (2021): 1437–43. http://dx.doi.org/10.1107/s1600577521006913.

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The extreme ultraviolet (EUV) phase retarder is an important optical element for polarization analysis and conversion of EUV synchrotron radiation. In this paper, a linearly chirped Mo/Si multilayer mirror is used to design an EUV phase retarder. With increasing thickness variation of the chirped multilayer, the reflective phase retardation between s- and p-polarized light increases at first and then reaches its maximum value. When the bilayer number increases from 2 to 20, the maximum phase retardation for an EUV source with a photon energy of 90 eV increases from 5.97° to 245.10° for a linea
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Geng, Caiwei, Xiang Hao, and Peng Jiao. "Crystal structure of nitridobis(trimethylsilanolato)[1,1,1-trimethyl-N-(trimethylsilyl)silanaminato]molybdenum(VI)." Acta Crystallographica Section E Crystallographic Communications 71, no. 12 (2015): 1497–500. http://dx.doi.org/10.1107/s2056989015021192.

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In the title compound, [Mo(C6H18NSi2)(C3H9OSi)2N], the MoVIcation is located on a mirror plane and is coordinated by a nitride anion, a 1,1,1-trimethyl-N-(trimethylsilyl)silanaminate anion and two trimethylsilanolate anions in a distorted tetrahedral geometry; the N atom and two Si atoms of the 1,1,1-trimethyl-N-(trimethylsilyl)silanaminato anionic ligand are also located on the mirror plane. The Mo[triple-bond]N bond length of 1.633 (6) Å is much shorter than the Mo—N single-bond length of 1.934 (7) Å. No hydrogen bonding is observed in the crystal structure.
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陈锐, 陈锐, 王风丽 王风丽, 王占山 王占山, Rui Chen Rui Chen, Fengli Wang Fengli Wang, and and Zhanshan Wang and Zhanshan Wang. "Design of chirped Mo/Si multilayer mirror in the extreme ultraviolet region." Chinese Optics Letters 6, no. 4 (2008): 310–12. http://dx.doi.org/10.3788/col20080604.0310.

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Mekaru, Harutaka, Tsuneo Urisu, Yoshiyuki Tsusaka, Shin Masui, Eijiro Toyota, and Hisataka Takenaka. "Design and performance of a multilayered mirror monochromator in the low-energy region of the VUV." Journal of Synchrotron Radiation 5, no. 3 (1998): 714–15. http://dx.doi.org/10.1107/s0909049598000466.

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For the energy region from tens to hundreds of electron volts, the multilayered mirror (MLM) monochromator has never been realized due to the difficulty of reducing the background noise of the total reflection component, in spite of its usefulness in synchrotron radiation experiments. In this work, a double-crystal-type MLM monochromator equipped with a thin-film filter has been designed on the basis of trial fabrication of the mirror-driving system and of Mo/Si and Mo/C MLMs; its performance has been evaluated by calculating its output photon flux. It is shown that by using the MLMs at low in
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Чхало, Н. И., М. В. Зорина, И. В. Малышев та ін. "Бериллий как материал для термостойких рентгеновских зеркал". Журнал технической физики 89, № 11 (2019): 1686. http://dx.doi.org/10.21883/jtf.2019.11.48329.134-19.

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AbstractThermophysical and mechanical characteristics of beryllium are compared with the corresponding characteristics of promising materials that are used for fabrication of precision mirrors working under high-intensity electromagnetic irradiation. Advantages and prospects for application of beryllium in the third- and fourth-generation synchrotrons are discussed. An original method for fabrication of ultrasmooth surfaces of beryllium substrates is presented, and limiting roughnesses are reported. Reflectances at a wavelength of 13.5 nm are determined for a multilayer Mo/Si mirror deposited
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Chen, Rui. "Design of chirped Mo/Si multilayer mirror in the extreme ultraviolet region." Chinese Optics Letters 6, no. 4 (2008): 310. http://dx.doi.org/10.3788/col08040310.

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Gronsky, R., and J. Punglia. "High-resolution electron microscopy study of a Si-Mo x-ray mirror." Proceedings, annual meeting, Electron Microscopy Society of America 45 (August 1987): 400–401. http://dx.doi.org/10.1017/s0424820100126792.

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The science of x-ray optics has undergone rapid growth in recent years, spurned by the availability of high intensity light sources with tunable optical characteristics in the XUV spectral region which includes soft x-rays and ultraviolet radiation. The development of optical elements for use with XUV radiation has followed a parallel path of development with most recent emphasis being placed upon multilayer coatings that enhance the reflectivity of x-ray mirrors and at the same time provide spectral selectivity. In their simplest form, these coatings consist of alternating thin layers of two
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Dissertations / Theses on the topic "Mo/Si In-terferential Mirror"

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Tolstoguzov, A., B. Ber, P. Chapon, and M. N. Drozdov. "Depth Profiling of Multilayer Mo/Si Nanostructures." Thesis, Sumy State University, 2013. http://essuir.sumdu.edu.ua/handle/123456789/35262.

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A round-robin characterization is reported on the sputter depth profiling of [60(3.0 nm Mo/ 0.3 nm B4C/ 3.7 nm Si)] and [60  (3.5 nm Mo/ 3.5 nm Si)] stacks deposited on Si (111). Two different commercial secondary ion mass spectrometers with time-of-flight and magnetic-sector analyzers and a pulsed radio frequency glow discharge optical emission spectrometer were used. The pros and cons of each instrumental approach are discussed. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35262
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Conference papers on the topic "Mo/Si In-terferential Mirror"

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Louis, E., H. J. Voorma, N. B. Koster, et al. "Dependence of optimal deposition temperature of Mo/Si multilayer mirrors on the Mo/Si thickness ratio." In Physics of X-Ray Multilayer Structures. Optica Publishing Group, 1994. http://dx.doi.org/10.1364/pxrayms.1994.mc.6.

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The increasing reflectivity of multilayer mirrors has made the use of reflective soft x-ray optical systems, e.g. in soft x-ray microscopy and soft x-ray projection lithography [1,2] possible. However, the use of multi-mirror systems [3] in industrial applications can only be successful if such a system has sufficient throughput. It is therefore necessary to optimize the reflectivity to the highest value possible.
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Sasaki, W., K. Kurosawa, Y. Uehara, et al. "Highly damage-resistant cavity mirrors in vacuum to extreme UV high power lasers." In OSA Annual Meeting. Optica Publishing Group, 1986. http://dx.doi.org/10.1364/oam.1986.mbb6.

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Optical damage is a serious problem in highpower operation of short-wavelength lasers. Using a high-power argon excimer laser with a MgF2 output mirror of 70% transmittance, we are investigating the feasibility of various materials for the cavity mirrors. SiO2 glass, Si single crystal, and Mo single crystal have great potential in short-wavelength lasers. At 126 nm, the measured reflectivities were 80% for MgF2/AI of a conventional mirror, 14% for SiO2, 20% for Si, and 17% for Mo. These values were different from the reflectivities calculated by reported optical constants. The scattering loss
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MacGowan, B. J., S. Mrowka, T. Barbee, et al. "Investigation of the effect of large x-ray fluences on multilayer structures." In Physics of X-Ray Multilayer Structures. Optica Publishing Group, 1992. http://dx.doi.org/10.1364/pxrayms.1992.mc1.

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The use of multilayer mirrors in x-ray laser cavities is complicated by extremely intense optical and x-ray pulses that damage the multilayer mirror before it has done its job. The issue of damage of the mirror by x-ray emission from the plasma amplifier has been studied experimentally using short duration (500 psec) bursts of soft x-rays from a laser produced Au plasma. Different damage/failure mechanisms have been observed and identified for Mo/Si, MoSi2/Si, W/C, WC/C and Cr3C2/C multilayers and damage thresholds quantified. The effect of the x-ray flux on the peak mirror reflectivity togeth
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Wang, Chih-Chung, Chao-Te Lee, and Jia-Han Li. "Lamellar Columns Photonic Crystal Mirror with High Reflectivity for Extreme-Ultraviolet Radiation." In JSAP-Optica Joint Symposia. Optica Publishing Group, 2023. http://dx.doi.org/10.1364/jsapo.2023.19a_a602_4.

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For the applications in the extreme ultraviolet (EUV) region, early research [1] revealed that the suitable design of multilayer mirrors with a wavelength of 5 to 50 nm can increase the reflectivity. Li et al. have done related research on Mo/Si multilayer films and proposed vacuum voids mixing in the Si layer can be used to increase the reflectivity for EUV radiation [2]. It is found that the higher proportion of vacuum voids, the higher reflectivity can be obtained from 73.43% for no vacuum voids to 83.24% for full vacuum voids. According to [2], the reflectivity can be effectively improved
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Underwood, J. H., E. M. Gullikson, Waiman Ng, Avijit Ray-Chaudhuri, and Franco Cerrina. "Effect of Contamination and Oxide Layers on Scattering and Reflectivity of Multilayer Mirrors." In Extreme Ultraviolet Lithography. Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.ec.61.

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Previously we reported that when molybdenum is deposited as the top layer of a molybdenum-silicon multilayer mirror, the reflectivity for normal incidence reflection at 130 Å or longer wavelengths decreases with time if the mirror is exposed to air. This effect results from progressive oxidation of the top Mo layer. We have additionally found that the decreased reflectivity is accompanied by strong scattering from the oxide layer, which expands and buckles during the oxidation process. The strong scattering reduces the image contrast and signal/background in imaging experiments using Mo/Si coa
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Eder, D. C., B. J. MacGowan, L. B. DaSilva, S. Mrowka, and T. Barbee. "Modeling of Multilayer Mirror Damage by a Short Pulse of X-Rays." In Physics of X-Ray Multilayer Structures. Optica Publishing Group, 1992. http://dx.doi.org/10.1364/pxrayms.1992.tha5.

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Multilayer mirrors can have a dramatic reduction in reflectivity as a result of large optical and x-ray fluxes incident on the surface of the mirror. We consider the effect of a short pulse of x-rays on the reflectivity of a variety of mirrors including W/C, WC/C, Cr3C2/C, Mo/Si, and MoSi2/Si multilayers. We use the measured x-ray spectrum from a gold target heated by a 0.5 ns laser for the case of no filter between the gold and the mirror and when various low energy filters are used. One tool we use to determine the reduction in reflectivity is a multilayer damage code ROMULS.1 We have modifi
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Li, Yun-peng, Bo Chen, Fei He, et al. "In-situ and real time stress of 30.4 nm Mo/Si multilayer mirror for the moon-based EUV Camera." In International Symposium on Optoelectronic Technology and Application 2014, edited by Guofan Jin, Songlin Zhuang, and Jennifer Liu. SPIE, 2014. http://dx.doi.org/10.1117/12.2073023.

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Torres, David S., Christopher M. DePriest, and Martin Richardson. "A debris-less laser-plasma source for EUV and XUV generation." In Applications of High Field and Short Wavelength Sources. Optica Publishing Group, 1997. http://dx.doi.org/10.1364/hfsw.1997.the46.

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We have previously reported the development of a laser plasma EUV source, using mass-limited water droplets, based on the 13 nm and 11.6 nm O5+ lines, for EUV projection lithography [1]. The spectrum from this source is shown in Fig. 1. A vital feature of this approach [2 ,3 ] is the incorporation of a target limited in mass to the minimum number of EUV atomic radiators required. This feature has advantages for EUV lithography and other applications in minimizing the collateral debris and allowing for continuous operation without the need for periodic maintenance of the optics or target materi
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Tichenor, D. A., G. D. Kubiak, M. E. Malinowski, et al. "A 10× Schwarzschild system for soft-x-ray projection lithography." In OSA Annual Meeting. Optica Publishing Group, 1993. http://dx.doi.org/10.1364/oam.1993.myy.7.

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A 10× reduction Schwarzschild system is being developed for projection imaging at 13 nm wavelength. The optical design is optimized over a 0.4 mm field of view in the image field using 0.1 µm design rules. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. Multiple primary and secondary elements were fabricated, matched and clocked to minimized the effects of small figure errors on imaging performance. The system is illuminated using soft x-rays emitted from a laser plasma source and collected by an ellipsoidal condenser. A 45° turning mirror is
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Takenaka, Hisataka, Tomoaki Kawamura, Yoshikazu Ishii, Tsuneyuki Haga, and Hiroo Kinoshita. "Evaluation of Mo-Based Multilayer EUV Mirrors." In Extreme Ultraviolet Lithography. Optica Publishing Group, 1994. http://dx.doi.org/10.1364/eul.1994.ec.26.

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The soft x-ray reflectivities and the effects of thermal annealing on both reflectivity and on the layered structures of Mo-based multilayers, such as Mo/Si, Mo/SiC, Mo/C, Mo/B, Mo/BN, Mo/B4C, MoSi2/Si and Mo5Si3/Si were evaluated. The Cu-Kα x-ray and soft x-ray reflectivities of the Mo/Si and Mo/B multilayers markedly decrease after annealing above 400°C. On the other hand, the reflectivities of the other Mo-based multilayers decrease only slightly for annealing temperatures up to 700°C. TEM observation reveals markedly less thermally induced deterioration in Mo/SiC, Mo/C, Mo/BN, M0/B4C, MoSi
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