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Journal articles on the topic 'Mo/Si In-terferential Mirror'

Author: Grafiati
Published: 28 May 2022
Last updated: 31 July 2025

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1

Зуев, С. Ю., Р. С. Плешков, В. Н. Полковников та ін. "Влияние барьерных слоев бериллия на свойства многослойных зеркал Mo/Si". Журнал технической физики 89, № 11 (2019): 1779. http://dx.doi.org/10.21883/jtf.2019.11.48344.130-19.

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The results of studies of multilayer Mo/Si mirrors with interlayer layers of B4C and Be in the vicinity of a wavelength of 13.5 nm are presented. It is shown that a four-component multilayer mirror of the Mo/Be/Si/B4C type exceeds the Mo/Si mirror by 2% and the Mo/Si/B4C mirror by 1.3%. This mirror also provides the highest spectral bandwidth at half-height (Δλ1/2 = 0.535 nm). An explanation of these effects is given.
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2

HOTTA, YOSHIFUMI, MINAJI FURUDATE, MASAKI YAMAMOTO, and MAKOTO WATANABE. "DESIGN AND FABRICATION OF MULTILAYER MIRRORS FOR He-II RADIATION." Surface Review and Letters 09, no. 01 (2002): 571–76. http://dx.doi.org/10.1142/s0218625x0200266x.

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Design, fabrication, and reflectance evaluation of multilayer mirrors for He-II radiation are described. Based on the available complex refractive indices of materials at the wavelength of 30.4 nm, Mg, Al, Si, Cr, and C were selected as small absorption material to be paired. Mo/Si and Sc found in previous works were also included. In referring to optimum design for the highest reflectance, multilayers of Al/Mg, Au/Mg, C/Mg, Sc/Mg, C/Si, Al/C, and Mo/Si were fabricated by ion-beam sputtering. The highest reflectance of 27% was observed by a 15-period Mg/Sc mirror.
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3

Liu, Xiangyue, Zhe Zhang, Hongxuan Song, et al. "Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask." Micromachines 14, no. 3 (2023): 526. http://dx.doi.org/10.3390/mi14030526.

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The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large, curved mirrors, shadow mask was a common method to precisely control the period thickness distribution. To investigate the effect of shadow mask on the microstructure of Mo/Si multilayers, we deposited a set of Mo/Si multilayers with and without the shadow mask on a curved substrate with aperture of 200 mm by direct current (DC) magnetron sputtering in this work. Grazi
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4

Yang, Song, Shujing Chen, and Chengyou Lin. "Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors." Journal of Synchrotron Radiation 28, no. 5 (2021): 1437–43. http://dx.doi.org/10.1107/s1600577521006913.

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The extreme ultraviolet (EUV) phase retarder is an important optical element for polarization analysis and conversion of EUV synchrotron radiation. In this paper, a linearly chirped Mo/Si multilayer mirror is used to design an EUV phase retarder. With increasing thickness variation of the chirped multilayer, the reflective phase retardation between s- and p-polarized light increases at first and then reaches its maximum value. When the bilayer number increases from 2 to 20, the maximum phase retardation for an EUV source with a photon energy of 90 eV increases from 5.97° to 245.10° for a linea
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5

Geng, Caiwei, Xiang Hao, and Peng Jiao. "Crystal structure of nitridobis(trimethylsilanolato)[1,1,1-trimethyl-N-(trimethylsilyl)silanaminato]molybdenum(VI)." Acta Crystallographica Section E Crystallographic Communications 71, no. 12 (2015): 1497–500. http://dx.doi.org/10.1107/s2056989015021192.

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In the title compound, [Mo(C6H18NSi2)(C3H9OSi)2N], the MoVIcation is located on a mirror plane and is coordinated by a nitride anion, a 1,1,1-trimethyl-N-(trimethylsilyl)silanaminate anion and two trimethylsilanolate anions in a distorted tetrahedral geometry; the N atom and two Si atoms of the 1,1,1-trimethyl-N-(trimethylsilyl)silanaminato anionic ligand are also located on the mirror plane. The Mo[triple-bond]N bond length of 1.633 (6) Å is much shorter than the Mo—N single-bond length of 1.934 (7) Å. No hydrogen bonding is observed in the crystal structure.
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6

陈锐, 陈锐, 王风丽 王风丽, 王占山 王占山, Rui Chen Rui Chen, Fengli Wang Fengli Wang, and and Zhanshan Wang and Zhanshan Wang. "Design of chirped Mo/Si multilayer mirror in the extreme ultraviolet region." Chinese Optics Letters 6, no. 4 (2008): 310–12. http://dx.doi.org/10.3788/col20080604.0310.

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7

Mekaru, Harutaka, Tsuneo Urisu, Yoshiyuki Tsusaka, Shin Masui, Eijiro Toyota, and Hisataka Takenaka. "Design and performance of a multilayered mirror monochromator in the low-energy region of the VUV." Journal of Synchrotron Radiation 5, no. 3 (1998): 714–15. http://dx.doi.org/10.1107/s0909049598000466.

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For the energy region from tens to hundreds of electron volts, the multilayered mirror (MLM) monochromator has never been realized due to the difficulty of reducing the background noise of the total reflection component, in spite of its usefulness in synchrotron radiation experiments. In this work, a double-crystal-type MLM monochromator equipped with a thin-film filter has been designed on the basis of trial fabrication of the mirror-driving system and of Mo/Si and Mo/C MLMs; its performance has been evaluated by calculating its output photon flux. It is shown that by using the MLMs at low in
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8

Чхало, Н. И., М. В. Зорина, И. В. Малышев та ін. "Бериллий как материал для термостойких рентгеновских зеркал". Журнал технической физики 89, № 11 (2019): 1686. http://dx.doi.org/10.21883/jtf.2019.11.48329.134-19.

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AbstractThermophysical and mechanical characteristics of beryllium are compared with the corresponding characteristics of promising materials that are used for fabrication of precision mirrors working under high-intensity electromagnetic irradiation. Advantages and prospects for application of beryllium in the third- and fourth-generation synchrotrons are discussed. An original method for fabrication of ultrasmooth surfaces of beryllium substrates is presented, and limiting roughnesses are reported. Reflectances at a wavelength of 13.5 nm are determined for a multilayer Mo/Si mirror deposited
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9

Chen, Rui. "Design of chirped Mo/Si multilayer mirror in the extreme ultraviolet region." Chinese Optics Letters 6, no. 4 (2008): 310. http://dx.doi.org/10.3788/col08040310.

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10

Gronsky, R., and J. Punglia. "High-resolution electron microscopy study of a Si-Mo x-ray mirror." Proceedings, annual meeting, Electron Microscopy Society of America 45 (August 1987): 400–401. http://dx.doi.org/10.1017/s0424820100126792.

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The science of x-ray optics has undergone rapid growth in recent years, spurned by the availability of high intensity light sources with tunable optical characteristics in the XUV spectral region which includes soft x-rays and ultraviolet radiation. The development of optical elements for use with XUV radiation has followed a parallel path of development with most recent emphasis being placed upon multilayer coatings that enhance the reflectivity of x-ray mirrors and at the same time provide spectral selectivity. In their simplest form, these coatings consist of alternating thin layers of two
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11

Wang, Fengli, Lei Liu, Wei Duan, et al. "Reflective phase shift measurement of the Mo/Si multilayer mirror in extreme ultraviolet region." Optik 124, no. 21 (2013): 5003–6. http://dx.doi.org/10.1016/j.ijleo.2013.03.088.

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12

Sakhonenkov, Sergei S., Elena O. Filatova, Aidar U. Gaisin, et al. "Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/Si multilayer systems." Physical Chemistry Chemical Physics 21, no. 45 (2019): 25002–10. http://dx.doi.org/10.1039/c9cp04582a.

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13

Juranic, Pavle, Kai Tiedtke, Shigeki Owada, et al. "Transmission measurement at the Bernina branch of the Aramis Beamline of SwissFEL." Journal of Synchrotron Radiation 26, no. 6 (2019): 2081–85. http://dx.doi.org/10.1107/s1600577519013237.

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The transmission of the optical components of the Bernina branch of the Aramis beamline at SwissFEL has been measured with an X-ray gas monitor from DESY and compared with a PSI gas detector upstream of the optical components. The transmission efficiencies of the Mo, Si and SiC mirror coatings of the Aramis beamline and the various other in-beam components were evaluated and compared with theoretical calculations, showing an agreement of 6% or better in all cases. The experiment has also shown the efficacy of the high-harmonic rejection mirrors at the Bernina branch of the Aramis beamline at S
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14

Zhang, Zhe, Runze Qi, Yiyun Yao, et al. "Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique." Coatings 9, no. 12 (2019): 851. http://dx.doi.org/10.3390/coatings9120851.

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In this work, a masking technique was used to improve the thickness uniformity of a Mo/Si multilayer deposited on a curved spherical mirror by direct current (DC) magnetron sputtering with planetary rotation stages. The clear aperture of the mirror was 125 mm with a radius of curvature equal to 143.82 mm. Two different shadow masks were prepared; one was flat and the other was oblique. When using the flat mask, the non-uniformity considerably increased owing to the relatively large gap between the mask and substrate. The deviation between the designed and measured layer thickness and non-unifo
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15

Shevelev, M. V., S. R. Uglov, and A. V. Vukolov. "Spectrum of coherent VUV radiation generated by 5.7 MeV electrons in a multilayer X-ray mirror." Journal of Instrumentation 19, no. 04 (2024): C04049. http://dx.doi.org/10.1088/1748-0221/19/04/c04049.

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Abstract The spectral and angular properties of diffracted transition radiation (DTR) and parametric radiation (PXR) in the ultrasoft X-ray region generated by the periodic structure upon interaction with a relativistic electron beam with energy of 5.7 MeV are numerically studied using a sample of the periodic structure [Mo/Si]50, known as a multilayer X-ray mirror. Based on calculations, an experimental approach is proposed to separate and identify the contributions of PXR and DTR. The ultrasoft X-ray radiation can be used to eliminate coherent effects occurring in the optical range when diag
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16

Wang, Feng-li, Lei Liu, Wen-bin Li, et al. "Design of the chirped Mo/Si multilayer mirror with SiC capping layer in extreme ultraviolet region." Optik 123, no. 24 (2012): 2222–25. http://dx.doi.org/10.1016/j.ijleo.2011.10.036.

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17

Schirmann, D., J. L. Bocher, J. P. Le Breton, A. Mens, and R. Sauneuf. "Progress in UV soft X-ray imaging." Laser and Particle Beams 10, no. 4 (1992): 827–39. http://dx.doi.org/10.1017/s026303460000478x.

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Soft X-ray imaging detection is usually made by using 101–01, 101–07, or SA1 Kodak films. Recent progress in thinned CCD fabrication allows us now to replace films by thinned CCDs to detect UV soft X-ray light with an enhanced sensitivity. We developed a thinned CCD system, and to demonstrate its applicability to replace photographic films we tested it behind a broad spectral range soft X-ray transmission grating spectrometer and a soft X-ray Mo/Si multilayer mirror telescope. Soft X-ray spectra and soft X-ray pictures of laser-created plasma are presented using the
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18

Makhotkin, Igor A., Ryszard Sobierajski, Jaromir Chalupský, et al. "Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold." Journal of Synchrotron Radiation 25, no. 1 (2018): 77–84. http://dx.doi.org/10.1107/s1600577517017362.

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The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si period
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19

Uglov, Sergey R., Leonid G. Sukhikh, Artem V. Vukolov, and Ivan R. Fateev. "Angular Distributions of EUV Generated by Electrons with 5.7 MeV Energy in a Multilayer Mo/Si Structure." Advanced Materials Research 1084 (January 2015): 280–84. http://dx.doi.org/10.4028/www.scientific.net/amr.1084.280.

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The article considers the dynamics of the changes in the intensity and shape of the angular distributions of the backward transition radiation and quasi-monochromatic radiation emitted by the periodic structure of a multilayer mirror in a vacuum ultraviolet region for electrons with the energy of 5.7 MeV, depending on the orientation of the target. It has been shown that the dynamics of the changes in the intensity and shape of the angular distributions of the backward transition radiation and those of the periodic structure radiation observed after directing the radiation through an absorptio
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20

Namba, Shinichi, Jiahao Wang, Hikari Ohiro, et al. "Enhancement of Gain Coefficient of Li-like Ion 3d-4f Soft X-ray Laser Oscillation by a Single Resonator." Atoms 10, no. 4 (2022): 128. http://dx.doi.org/10.3390/atoms10040128.

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A recombination plasma soft X-ray laser that is associated with Li-like Aluminum ion Al10+ 3d-4f transition (wavelength: 15.47 nm) was investigated to increase the gain coefficient. By optimizing the time interval of the 16-pulse train, higher-density plasma with a low temperature could be generated, and thus, we obtained the gain coefficient of 9.84 cm−1 at the pump laser pulse energy which was as low as 3 J. To further enhance the X-ray laser output energy, the single resonator which was installed by using a Mo/Si multilayer mirror that has a high reflectivity of 0.45 at 15.5 nm, and the X-r
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21

Wang, S. C., E. Zoethout, M. van Kampen, and T. W. Morgan. "Surface-limited deuterium uptake of Ru films under plasma exposure." Journal of Applied Physics 132, no. 22 (2022): 225903. http://dx.doi.org/10.1063/5.0126412.

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Blister formation has been an emerging research topic for extreme ultraviolet (EUV) mirrors exposed to hydrogen plasmas. Similar to plasma-facing materials in nuclear fusion reactors, it has been reported that blister formation in EUV mirrors is initiated by hydrogen uptake due to hydrogen ion or atom bombardment. However, the research so far has focused on Mo/Si multilayers exposed to only hydrogen ions or atoms, while the EUV mirror typically has a Ru capping layer facing hydrogen plasmas. We present experimental work to measure plasma-induced hydrogen uptake of Ru films. We bombarded our de
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22

Meftakhutdinov, Ruslan M., and Renat T. Sibatov. "Janus Type Monolayers of S-MoSiN2 Family and Van Der Waals Heterostructures with Graphene: DFT-Based Study." Nanomaterials 12, no. 21 (2022): 3904. http://dx.doi.org/10.3390/nano12213904.

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Novel representative 2D materials of the Janus type family X-M-ZN2 are studied. These materials are hybrids of a transition metal dichalcogenide and a material from the MoSi2N4 family, and they were constructed and optimized from the MoSi2N4 monolayer by the substitution of SiN2 group on one side by chalcogen atoms (sulfur, selenium, or tellurium), and possibly replacing molybdenum (Mo) to tungsten (W) and/or silicon (Si) to germanium (Ge). The stability of novel materials is evaluated by calculating phonon spectra and binding energies. Mechanical, electronic, and optical characteristics are c
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23

Jeng, U.-Ser, Chiu Hun Su, Chun-Jen Su, et al. "A small/wide-angle X-ray scattering instrument for structural characterization of air–liquid interfaces, thin films and bulk specimens." Journal of Applied Crystallography 43, no. 1 (2009): 110–21. http://dx.doi.org/10.1107/s0021889809043271.

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At the National Synchrotron Radiation Research Center, a small/wide-angle X-ray scattering (SAXS/WAXS) instrument has been installed at the BL23A beamline with a superconducting wiggler insertion device. This beamline is equipped with double Si(111) crystal and double Mo/B4C multilayer monochromators, and an Si-based plane mirror that can selectively deflect the beam downwards for grazing-incidence SAXS (GISAXS) studies of air–liquid or liquid–liquid interfaces. The SAXS/WAXS instrument, situated in an experimental hutch, comprises collimation, sample and post-sample stages. Pinholes and slits
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24

Sigov, A. S., O. A. Minaeva, S. I. Anevsky, A. M. Lebedev, and R. V. Minaev. "Metrological studies of the characteristics of multilayer surface coatings using synchrotron radiation." Russian Technological Journal 9, no. 1 (2021): 38–47. http://dx.doi.org/10.32362/2500-316x-2021-9-1-38-47.

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The investigations of multilayer surface nanostructures characteristics was performed with synchrotron radiation sources, characterized by an intensive, calculated continuum. It plays an important role in nanoelectronics metrological base. The main research were carried out at electron storage rings «Siberia-1» (Kurchatov Institute) and MLS (PTB, Berlin) with low electron energy, in a wide wavelength range, including visible range, AUV, VU, EUV and to exclude the X-ray radiation influence. The methods of the radiometers, photodiodes, filters and multilayer mirrors characteristics measurements
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25

Vainer, Yu A., S. A. Garakhin, V. N. Polkovnikov, et al. "Microstructure and Density of Mo Films in Multilayer Mo/Si Mirrors." Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques 13, no. 1 (2019): 8–13. http://dx.doi.org/10.1134/s1027451019010208.

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26

Voorma, H. J., E. Louis, N. B. Koster, and F. Bijkerk. "Temperature induced diffusion in Mo/Si multilayer mirrors." Journal of Applied Physics 83, no. 9 (1998): 4700–4708. http://dx.doi.org/10.1063/1.367258.

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27

Valkovskiy, G. A., M. V. Baidakova, P. N. Brunkov, S. G. Konnikov, M. A. Yagovkina, and Ju M. Zadiranov. "Study of roughness in multilayer Mo–Si mirrors." physica status solidi (a) 208, no. 11 (2011): 2623–28. http://dx.doi.org/10.1002/pssa.201184274.

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28

Aquila, A. L., F. Salmassi, F. Dollar, Y. Liu, and E. Gullikson. "Developments in realistic design for aperiodic Mo/Si multilayer mirrors." Optics Express 14, no. 21 (2006): 10073. http://dx.doi.org/10.1364/oe.14.010073.

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29

Барышева, М. М., С. А. Гарахин, С. Ю. Зуев та ін. "Оптимизация состава, синтез и изучение широкополосных многослойных зеркал для ЭУФ диапазона". Журнал технической физики 89, № 11 (2019): 1763. http://dx.doi.org/10.21883/jtf.2019.11.48341.116-19.

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The article is devoted to the development, fabrication and analysis of broadband Mo/Si and Mo/Be stack-design multilayer mirrors for the wavelength ranges of 11.1-13.8, 17–21 and 28–33 nm. It is shown that for these structures smooth reflection curves can be achieved in a small number of corrections of the technological process.
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30

Freitag, J. M., and B. M. Clemens. "Stress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors." Applied Physics Letters 73, no. 1 (1998): 43–45. http://dx.doi.org/10.1063/1.121717.

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31

Kumar, Niranjan, Aleksey V. Nezhdanov, Sergey A. Garakhin, et al. "Investigation of transverse optical phonon of thin Si films embedded in periodic Mo/Si and W/Si multilayer mirrors." Surfaces and Interfaces 25 (August 2021): 101270. http://dx.doi.org/10.1016/j.surfin.2021.101270.

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32

Montcalm, Claude. "Reduction of residual stress in extreme ultraviolet Mo/Si multilayer mirrors with postdeposition thermal treatments." Optical Engineering 40, no. 3 (2001): 469. http://dx.doi.org/10.1117/1.1346584.

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Faradzhev, Nadir S., Boris V. Yakshinskiy, Elena Starodub, et al. "Resonance effects in photoemission from TiO2-capped Mo/Si multilayer mirrors for extreme ultraviolet applications." Journal of Applied Physics 109, no. 8 (2011): 083112. http://dx.doi.org/10.1063/1.3575319.

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34

Rao, P. N., Maheswar Nayak, G. S. Lodha, et al. "Fabrication and Evaluation of Large Area Mo/Si Soft X-Ray Multilayer Mirrors at Indus SR Facilities." Advances in Optical Technologies 2012 (August 15, 2012): 1–8. http://dx.doi.org/10.1155/2012/976868.

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Large area Mo/Si multilayer (ML) mirrors with high reflectivity are fabricated using magnetron sputtering deposition system. Thin film growth is optimized for film roughness, density, and interface quality by changing process parameters through fabrication of thin films. Mo/Si MLs are fabricated with varying thickness ratio, number of layer pairs, and periodicity from 0.3 to 0.45, 5 to 65, and 40 to 100 Å, respectively. The samples are characterized using hard X-ray reflectivity and transmission electron microscopy. Soft X-ray performance tests of MLs are done by soft X-ray reflectivity using
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35

Sundermann, M., J. Hartwich, K. Rott, et al. "Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STM lithography in self-assembled monolayers." Surface Science 454-456 (May 2000): 1104–9. http://dx.doi.org/10.1016/s0039-6028(00)00208-9.

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36

Saedi, M., C. Sfiligoj, J. Verhoeven, and J. W. M. Frenken. "Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications." Applied Surface Science 507 (March 2020): 144951. http://dx.doi.org/10.1016/j.apsusc.2019.144951.

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37

Smertin, R. M., S. Yu Zuev, V. N. Polkovnikov, and N. I. Chkhalo. "Stress-Free Highly Reflective Multilayer Mo/Be/Si Mirrors for Operation in the Vicinity of the Wavelength 13.5 nm." Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques 17, S1 (2023): S239—S243. http://dx.doi.org/10.1134/s1027451023070492.

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38

Zwicker, Andrew P., Sean P. Regan, Michael Finkenthal та ін. "Peak reflectivity measurements of W/C, Mo/Si, and Mo/B_4C multilayer mirrors in the 8–190-Å range using both Kα line and synchrotron radiation". Applied Optics 29, № 25 (1990): 3694. http://dx.doi.org/10.1364/ao.29.003694.

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39

Muramatsu, Yasuji, Hisataka Takenaka, Yuko Ueno, Eric M. Gullikson, and Rupert C. C. Perera. "Chemical bonding state analysis of silicon carbide layers in Mo/SiC/Si multilayer mirrors by soft x-ray emission and absorption spectroscopy." Applied Physics Letters 77, no. 17 (2000): 2653–55. http://dx.doi.org/10.1063/1.1318231.

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40

Frolov, Oleksandr, Karel Kolacek, Jiri Schmidt, and Jaroslav Straus. "EUV radiation from nitrogen capillary discharge." International Journal of Modern Physics: Conference Series 32 (January 2014): 1460329. http://dx.doi.org/10.1142/s2010194514603299.

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In the last decade EUV sources attract interest from researchers over the world. One of the main motivations is EUV lithography, which could lead to further miniaturization in electronics. Nitrogen recombination laser at wavelength of 13.4 nm based on capillary discharge Z-pinch configuration could be used in experiments with testing of resolution of photoresist for EUV lithography (close to wavelength of 13.5 nm Si/Mo multilayer mirrors have a high reflectivity at normal incidence angles). In this work, pinching of nitrogen-filled capillary discharge is studied for the development of EUV lase
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41

Bayer, Armin, Frank Barkusky, Stefan Döring, Peter Großmann, and Klaus Mann. "Applications of Compact Laser-Driven EUV/XUV Plasma Sources." X-Ray Optics and Instrumentation 2010 (December 19, 2010): 1–9. http://dx.doi.org/10.1155/2010/687496.

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We present an overview on the EUV/XUV activities of the Laser-Laboratorium Göttingen based on table-top laser-produced plasma (LPP) sources. As target materials, gaseous jets of noble gases or solid Gold are employed. In order to obtain high EUV fluence, a Schwarzschild objective consisting of two spherical mirrors with Mo/Si multilayer coatings is adapted to the source. By demagnified (10x) imaging of the Au plasma, an EUV spot with a maximum energy density of ∼1.3 J/cm2 is generated (3 μm diameter, pulse duration 8.8 ns). First applications of this system reveal its potential for high-resolu
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42

Carmona-Cejas, José Manuel, Teona Mirea, Jesús Nieto, Jimena Olivares, Valery Felmetsger, and Marta Clement. "Homogeneity and Thermal Stability of Sputtered Al0.7Sc0.3N Thin Films." Materials 16, no. 6 (2023): 2169. http://dx.doi.org/10.3390/ma16062169.

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This work presents a study on the homogeneity and thermal stability of Al0.7Sc0.3N films sputtered from Al-Sc segmented targets. The films are sputtered on Si substrates to assess their structural properties and on SiO2/Mo-based stacked acoustic mirrors to derive their piezoelectric activity from the frequency response of acoustic resonators. Post-deposition annealing at temperatures up to 700 °C in a vacuum are carried out to test the stability of the Al0.7Sc0.3N films and their suitability to operate at high temperatures. Despite the relatively constant radial composition of the films reveal
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43

Wang, Chih-Chung, Chao-Te Lee, HungPin Chen, and Jia-Han Li. "High-Reflective Cylindrical-Nanostructure Multilayer Mirrors for Extreme Ultraviolet Radiation." Physica Scripta, January 30, 2025. https://doi.org/10.1088/1402-4896/adb082.

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Abstract Extreme ultraviolet (EUV) is used in current semiconductor fabrication processes, and molybdenum (Mo) and silicon (Si) multilayers are often used for reflection mirrors. We propose hybrid structure multilayers that utilize cylindrical Mo and Si with vacuum space in each layer, and we call it cylindrical-nanostructure multilayer mirror which can be fabricated by current semiconductor processes. This practicality of our design is a crucial factor, as it leads to an increase in the refractive index and a decrease in the extinction coefficient in each layer, and it results in an enhanceme
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44

Nguyen, Khanh, Eric Gullikson, and James Underwood. "Top Layer Oxidation In Mo/SI Multilayer X-Ray Mirror." MRS Proceedings 306 (1993). http://dx.doi.org/10.1557/proc-306-135.

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AbstractReflectivity of Mo/Si multilayer x-ray mirrors with molybdenum as the top layer decreased over time when stored in air due to oxidation of the top Mo layer to MoO3 and MoO2. High reflectivity can be maintained by having silicon as the top layer. In fact, reflectivity of Si-top multilayer coatings increase slightly during the first few days after deposition.
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45

Lu, Kuan-Wei, Kuan-Yu Ko, Ai-Ling Shih, Duy Thanh Cu, Meng-Chi Li, and Chien-Chen Kuo. "The Effect of Hydrogen Ion Bombardment on the Capping Layers of Extreme Ultraviolet Mirrors." Materials Research Express, April 7, 2025. https://doi.org/10.1088/2053-1591/adca00.

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Abstract Extreme ultraviolet (EUV) mirrors demand exceptionally high reflectivity, but contamination from carbon, tin, oxide layers, and etching debris during use can degrade their performance and reduce production yields. Hydrogen ion bombardment is commonly employed for surface cleaning; however, prolonged bombardment may induce surface blistering, damaging the mirrors and decreasing reflectivity. This study investigates the behaviour of EUV mirror coatings under hydrogen ion bombardment. Multilayer B4C/Mo/B4C/Si coatings were deposited on Si substrates using ion beam sputtering with fixed i
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46

Lo, Jen-Iu, Yu-Chain Peng, Hsiao-Chi Lu, Ton-Rong Tseng, and Bing-Ming Cheng. "Monitoring the Temperature of a Mo/Si Mirror with Photoluminescence in Extreme-Ultraviolet Lithography." ACS Applied Electronic Materials, July 13, 2022. http://dx.doi.org/10.1021/acsaelm.2c00347.

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47

Ogita, Yoh-Ichiro, and Yuichiro Gan-nen. "Silicon Wafer Subsurface Characterization with UV/Millimeter-Wave Technique." MRS Proceedings 631 (2000). http://dx.doi.org/10.1557/proc-631-aa2.5.

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ABSTRACTIn subsurface characterization for Si wafers using a photoconductivity technique with a ultra-violet photoexcitation and millimeter wave reflection, high sensitivity technique for100 GHz was discussed experimentally and theoretically. The technique detected photoconductivity decays measured for p/p+ and n/n+ epitaxial wafers. The epilayer contaminated with Mo and Fe was characterized by the technique. Photoconductivity amplitude (PCA) intensity measured for as-polished Si wafers in commercial use after removing the subsurface by SC1 cleanings well reflected the behavior of removal of s
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48

Durkan, Stephen M., Lazaros Varvarezos, Aoife P. B. Butler, et al. "Temporal and spatial characteristics of a 13.6 nm EUV light source." Measurement Science and Technology, February 6, 2025. https://doi.org/10.1088/1361-6501/adb323.

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Abstract Spatial and temporal characteristics of a table-top scale laser produced plasma formed on the surface of a tungsten target are reported. The emitted radiation was spectrally filtered to a narrow band of ca. 1 nm (FWHM) centred on a wavelength of 13.6 nm using a combination of Zr thin film transmission filters and a Mo-Si multilayer mirror (MLM). The temporal profile of the 13.6 nm flux was measured for different laser fluences while the spatial profile of the emission was sampled in one region using a back illuminated CCD, both done with the aid of a flat MLM. The emitting plasma was
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49

Shastry, S. K., and J. Hefter. "Nucleation and Growth Processes in OMCVD of GaAs." MRS Proceedings 94 (1987). http://dx.doi.org/10.1557/proc-94-33.

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ABSTRACTThe initial stages of GaAs growth on mirror-polished metal (W, Mo), semiconductor (Si, GaAs), and insulator (alumina) substrates have been experimentally studied in the organometallic chemical vapor deposition (OMCVD) process. Growth on the metallic substrates is often polycrystalline and nonepitaxial, while epitaxial GaAs layers with preferred orientations can be grown relatively easily on the nonmetallic substrates. The rate of nucleation of GaAs on all the substrates is found to increase with increasing arsine flow rate and with decreasing growth temperature. Our experimental result
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50

Kouge, Kouichiro, Kentaro Tomita, Junya Hotta, et al. "Feasibility study on reactive ion etching occurrence in EUV-induced photoionized hydrogen plasmas based on electron temperature and electron density measurements." Japanese Journal of Applied Physics, March 11, 2022. http://dx.doi.org/10.35848/1347-4065/ac5d25.

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Abstract Temporal evolutions of electron temperature (T e) and electron density (n e) of photoionized hydrogen plasmas, which were induced by radiation from laser-produced Sn-plasma EUV sources, were measured using the Laser Thomson Scattering (LTS) technique. Measured T e and n e ranged from 0.5–2.5 eV and 1016–1018 m-3, respectively, for hydrogen pressures of 50–400 Pa. The T e of this EUV-induced hydrogen plasma decayed with the thermal relaxation time between electrons and gases. The maximum value of T e in the time variation depended on hydrogen pressure. The lower the pressure, the highe
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