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Relevant bibliographies by topics / Modified chemical vapor deposition

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Academic literature on the topic 'Modified chemical vapor deposition'

Author: Grafiati

Published: 4 June 2021

Last updated: 13 February 2022

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Journal articles on the topic "Modified chemical vapor deposition"

1

Kurki, Jouko A. "Large modified chemical vapor deposition preform optimization." Optical Engineering 34, no. 9 (1995): 2532. http://dx.doi.org/10.1117/12.208084.

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Dong, L., J. Pinkstone, P. St J. Russell, and D. N. Payne. "Ultraviolet absorption in modified chemical vapor deposition preforms." Journal of the Optical Society of America B 11, no. 10 (1994): 2106. http://dx.doi.org/10.1364/josab.11.002106.

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Cheung, Catherine K. W., David F. Fletcher, and Geoffrey W. Barton. "Impact of chlorine dissociation for modified chemical vapor deposition." Journal of Non-Crystalline Solids 355, no. 13 (2009): 817–20. http://dx.doi.org/10.1016/j.jnoncrysol.2009.03.003.

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Yevnin, Maya, Gil Atar, Stanislav Campelj, et al. "Low-Loss Waveguides by Planar Modified Chemical Vapor Deposition." Journal of Lightwave Technology 38, no. 4 (2020): 792–96. http://dx.doi.org/10.1109/jlt.2019.2943494.

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Doupovec, J., and A. L. Yarin. "Nonsymmetrical modified chemical vapor deposition (N-MCVD) process (optical fibres)." Journal of Lightwave Technology 9, no. 6 (1991): 695–700. http://dx.doi.org/10.1109/50.81970.

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Serghini-Monim, S., P. R. Norton, and R. J. Puddephatt. "Chemical Vapor Deposition of Silver on Plasma-Modified Polyurethane Surfaces." Journal of Physical Chemistry B 101, no. 39 (1997): 7808–13. http://dx.doi.org/10.1021/jp9713827.

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Kim, Kyo-Seon, and Sotiris E. Pratsinis. "Manufacture of optical waveguide preforms by modified chemical vapor deposition." AIChE Journal 34, no. 6 (1988): 912–21. http://dx.doi.org/10.1002/aic.690340603.

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Kurki, Jouko A. "Soot-overcladding process for enlarging modified chemical vapor deposition preforms." Optical Engineering 34, no. 9 (1995): 2538. http://dx.doi.org/10.1117/12.208111.

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Mohammed Hafiz, O. K., and Anugrah Singh. "CFD simulation of laser enhanced modified chemical vapor deposition process." Chemical Engineering Research and Design 89, no. 6 (2011): 593–602. http://dx.doi.org/10.1016/j.cherd.2010.09.005.

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Cheung, Catherine K. W., David F. Fletcher, Geoff W. Barton, and Pam McNamara. "Simulation of particle transport and deposition in the modified chemical vapor deposition process." Journal of Non-Crystalline Solids 355, no. 4-5 (2009): 327–34. http://dx.doi.org/10.1016/j.jnoncrysol.2008.11.009.

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Dissertations / Theses on the topic "Modified chemical vapor deposition"

1

Romanos, Georgius E., Anastasios Labropoulos, and Nick Kanellopoulos. "Innovative methods for the characterization of ceramic nanofiltration membranes modified by TEOS/O3 chemical vapor deposition." Universitätsbibliothek Leipzig, 2016. http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-196648.

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Romanos, Georgius E., Anastasios Labropoulos, and Nick Kanellopoulos. "Innovative methods for the characterization of ceramic nanofiltration membranes modified by TEOS/O3 chemical vapor deposition." Diffusion fundamentals 2 (2005) 102, S. 1-2, 2005. https://ul.qucosa.de/id/qucosa%3A14440.

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SHINOHARA, Hisanori, Toshiki SUGAI, and Naoki KISHI. "Synthesis of Single- and Double-Wall Carbon Nanotubes by Gas Flow-Modified Catalyst-Supported Chemical Vapor Deposition." Institute of Electronics, Information and Communication Engineers, 2009. http://hdl.handle.net/2237/14982.

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Yoshikawa, Naruo. "The chemical and photochemical reactivity of modified and unmodified high area titania surfaces." Thesis, University of Southampton, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.343010.

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Niiranen, Pentti. "Electrically Modified Quartz Crystal Microbalance to Study Surface Chemistry Using Plasma Electrons as Reducing Agents." Thesis, Linköpings universitet, Kemi, 2021. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-176607.

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Metallic films are important in various applications, such as electric devices where it can act as contacts. In electrical devices, the substrate typically consists of silicon dioxide (SiO2) which is a temperature-sensitive substrate. Therefore, plasma enhanced chemical vapor deposition (PECVD) are better suited than thermally activated chemical vapor deposition (CVD). Depositing metallic films with PECVD demands co-reactants that act as reducing agents. However, these are not well-studied and do not always have the power enough to perform the reduction reaction for metals. Recently it has bee

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Haberer, Elaine D. (Elaine Denise) 1975. "Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool." Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/8992.

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Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1998.<br>Includes bibliographical references (p. 77-79).<br>The interlayer dielectric plays an important role in multilevel integration. Material choice, processing, and contamination greatly impact the performance of the layer. In this study, particle generation, deposition, and adhesion mechanisms are reviewed. In particular, four important sources of interlayer dielectric particle contamination were investigated: the cleanroom environment, improper wafer handling, the backside of the wafer, and

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Karaman, Mustafa. "Chemical Vapor Deposition Of Boron Carbide." Phd thesis, METU, 2007. http://etd.lib.metu.edu.tr/upload/3/12608778/index.pdf.

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Boron carbide was produced on tungsten substrate in a dual impinging-jet CVD reactor from a gas mixture of BCl3, CH4, and H2. The experimental setup was designed to minimise the effect of mass transfer on reaction kinetics, which, together with the on-line analysis of the reactor effluent by FTIR, allowed a detailed kinetic investigation possible. The phase and morphology studies of the products were made by XPS, XRD,micro hardness and SEM methods. XPS analysis showed the existence of chemical states attributed to the boron carbide phase, together with the existence of oxy-boron carbide speci

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Pickering, Elliot. "Chemical vapor deposition of Ti₃SiC₂." Thesis, Georgia Institute of Technology, 1998. http://hdl.handle.net/1853/19463.

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Barua, Himel Barua. "COMPUTATIONAL MODELING OF CHEMICAL VAPOR DEPOSITION." University of Akron / OhioLINK, 2016. http://rave.ohiolink.edu/etdc/view?acc_num=akron1469721885.

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Sukkaew, Pitsiri. "A Quantum Chemical Exploration of SiC Chemical Vapor Deposition." Doctoral thesis, Linköpings universitet, Halvledarmaterial, 2017. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-133941.

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SiC is a wide bandgap semiconductor with many attractive properties. It hasattracted particular attentions in the areas of power and sensor devices as wellas biomedical and biosensor applications. This is owing to its properties suchas large bandgap, high breakdown electric field, high thermal conductivitiesand chemically robustness. Typically, SiC homoepitaxial layers are grownusing the chemical vapor deposition (CVD) technique. Experimental studiesof SiC CVD have been limited to post-process measuring of the layer ratherthan in situ measurements. In most cases, the observations are presented

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Books on the topic "Modified chemical vapor deposition"

1

Sivaram, Srinivasan. Chemical Vapor Deposition. Springer US, 1995. http://dx.doi.org/10.1007/978-1-4757-4751-5.

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Fortin, Jeffrey B., and Toh-Ming Lu. Chemical Vapor Deposition Polymerization. Springer US, 2004. http://dx.doi.org/10.1007/978-1-4757-3901-5.

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O, Pierson Hugh, ed. Handbook of chemical vapor deposition. 2nd ed. Noyes Publications, 1999.

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Dobkin, Daniel M. Principles of Chemical Vapor Deposition. Springer Netherlands, 2003.

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Dobkin, Daniel M., and Michael K. Zuraw. Principles of Chemical Vapor Deposition. Springer Netherlands, 2003. http://dx.doi.org/10.1007/978-94-017-0369-7.

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Gesheva, K. A. Chemical vapor deposition (CVD) technology. Nova Science Publishers, 2008.

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7

Magneto luminous chemical vapor deposition. Taylor & Francis, 2011.

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8

K, Zuraw Michael, ed. Principles of chemical vapor deposition. Kluwer Academic Publishers, 2003.

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Luminous chemical vapor deposition and interface engineering. Marcel Dekker, 2005.

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Miyoshi, Kazuhisa. Chemical-vapor-deposited diamond film. National Aeronautics and Space Administration, Lewis Research Center, 1999.

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Book chapters on the topic "Modified chemical vapor deposition"

1

Morse, T. F., A. Kilian, and L. Reinhart. "A High Temperature Sol-Gel Process for Glass Formation: Aerosol Doping in Modified Chemical Vapor Deposition." In Sol-Gel Optics. Springer US, 1994. http://dx.doi.org/10.1007/978-1-4615-2750-3_7.

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Lau, Kenneth K. S. "Chemical Vapor Deposition." In Medical Coatings and Deposition Technologies. John Wiley & Sons, Inc., 2016. http://dx.doi.org/10.1002/9781119308713.ch11.

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Jensen, Klavs F. "Chemical Vapor Deposition." In Advances in Chemistry. American Chemical Society, 1989. http://dx.doi.org/10.1021/ba-1989-0221.ch005.

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Aardahl, C. L., and J. W. Rogers. "Chemical Vapor Deposition." In Inorganic Reactions and Methods. John Wiley & Sons, Inc., 2007. http://dx.doi.org/10.1002/9780470145333.ch46.

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Nagasawa, Hiroki, and Toshinori Tsuru. "Chemical Vapor Deposition." In Encyclopedia of Membranes. Springer Berlin Heidelberg, 2016. http://dx.doi.org/10.1007/978-3-662-44324-8_1425.

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Nagasawa, Hiroki, and Toshinori Tsuru. "Chemical Vapor Deposition." In Encyclopedia of Membranes. Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-642-40872-4_1425-1.

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Kern, Werner. "Chemical Vapor Deposition." In Microelectronic Materials and Processes. Springer Netherlands, 1989. http://dx.doi.org/10.1007/978-94-009-0917-5_5.

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Katsui, Hirokazu, and Takashi Goto. "Chemical Vapor Deposition." In Multi-dimensional Additive Manufacturing. Springer Singapore, 2020. http://dx.doi.org/10.1007/978-981-15-7910-3_6.

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Sivaram, Srinivasan. "Introduction." In Chemical Vapor Deposition. Springer US, 1995. http://dx.doi.org/10.1007/978-1-4757-4751-5_1.

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Sivaram, Srinivasan. "CVD of Semiconductors." In Chemical Vapor Deposition. Springer US, 1995. http://dx.doi.org/10.1007/978-1-4757-4751-5_10.

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Conference papers on the topic "Modified chemical vapor deposition"

1

DIGIOVANNI, D. J., T. F. MORSE, and J. W. CIPOLLA, JR. "Phosphorus Incorporation in modified chemical vapor deposition." In Optical Fiber Communication Conference. OSA, 1988. http://dx.doi.org/10.1364/ofc.1988.wq11.

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Miller, A. E., R. L. Opila, and M. F. Yan. "Ultranegative delta cladding for modified chemical vapor deposition." In OFC '96 - Conference on Optical Fiber Communication. IEEE, 1996. http://dx.doi.org/10.1109/ofc.1996.907638.

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O'connor, P. B., James W. Fleming, R. M. Atkins, and V. R. Raju. "Plasma-enhanced modified chemical vapor deposition; a versatile high-rate process." In Optical Fiber Communication Conference. OSA, 1985. http://dx.doi.org/10.1364/ofc.1985.wh4.

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4

Wang, Biao, Lu Pang, and Jun Liu. "Single mode 2.4kW part-doped ytterbium fiber fabricated by modified chemical vapor deposition technique." In Second Target Recognition and Artificial Intelligence Summit Forum, edited by Tianran Wang, Tianyou Chai, Huitao Fan, and Qifeng Yu. SPIE, 2020. http://dx.doi.org/10.1117/12.2551991.

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Strakov, Hristo, Vasileios Papageorgiou, Renato Bonetti, Val Lieberman, and Audie Scott. "Advanced Chemical Vapor Aluminizing Technology: Co-Deposition Process and Doped Aluminized Coatings." In ASME Turbo Expo 2012: Turbine Technical Conference and Exposition. American Society of Mechanical Engineers, 2012. http://dx.doi.org/10.1115/gt2012-70135.

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Chemical Vapor Aluminizing (CVA) is used for more than 20 years to protect blades and vanes in the hot section of aero- and land based turbines against oxidation and hot corrosion [1]. Modern CVA is an advanced process capable of controlled alloying the coating with additional elements using metal chlorides and tight control of the coating composition. CVA processes offer a number of advantages over conventional pack and above-the-pack cementation. This paper deals with the industrial CVA technology to produce multi-component coatings using different metal chloride generating devices. Specific

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Choi, Mansoo, and Kyung-Soon Park. "Analysis of the effects of traversing torch and deposited layer thickness on particle deposition in the modified chemical vapor deposition process." In International Symposium on Optoelectronics in Computers, Communications, and Control, edited by GouChung Chi and Chi-Shain Hong. SPIE, 1992. http://dx.doi.org/10.1117/12.131253.

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Smith, J. S., and D. H. Boone. "Platinum Modified Aluminides-Present Status." In ASME 1990 International Gas Turbine and Aeroengine Congress and Exposition. American Society of Mechanical Engineers, 1990. http://dx.doi.org/10.1115/90-gt-319.

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Since their development in the early 1970’s, platinum modified aluminide diffusion coatings have been recognized for their superior oxidation and hot corrosion resistance on nickel based superalloys. More recently, advances in gas phase aluminizing have been utilized to afford coating protection to the internal as well as external surfaces of hollow gas turbine airfoils. This paper presents a brief review of the development history of the platinum aluminide coating system and discusses the various coating morphologies observed. The results of recent work in applying the low pressure chemical v

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Conner, Jeffrey A., David A. Moore, and Roger D. Wustman. "Evaluation of Simple Aluminide and Platinum Modified Aluminide Coatings on High Pressure Turbine Blades After Factory Engine Testing." In ASME 1991 International Gas Turbine and Aeroengine Congress and Exposition. American Society of Mechanical Engineers, 1991. http://dx.doi.org/10.1115/91-gt-379.

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This paper presents results from recent factory engine testing of simple aluminide coatings produced using pack cementation processes and platinum modified aluminide coatings produced using both pack cementation and chemical vapor deposition processes. These coatings were evaluated on DS nickel base superalloy high pressure turbine blades in a commercial high bypass turbofan engine. Operating conditions were such that turbine inlet air contained up to 3 ppb of sodium. Details of the factory engine testing, coating selection and application, and environmental protection provided by the coatings

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Connor, Jeffrey A. "Evaluation of Simple Aluminide and Platinum Modified Aluminide Coatings on High Pressure Turbine Blades After Factory Engine Testing-Round II." In ASME 1992 International Gas Turbine and Aeroengine Congress and Exposition. American Society of Mechanical Engineers, 1992. http://dx.doi.org/10.1115/92-gt-140.

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This paper presents results of factory engine testing of simple aluminide and platinum modified aluminide coatings. Simple aluminide coatings were produced using pack cementation processes. Platinum modified aluminide coatings were produced using three aluminiding processes; pack cementation, above-the-pack or out-of-contact processing, and chemical vapor deposition. These coatings were evaluated on both directionally solidified and single crystal nickel base superalloy turbine blades. These high pressure turbine blades were tested in a commercial high bypass turbofan engine operating predomin

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Aslund, M. L., A. Canagasabey, Yang Liu, et al. "Internal reaction temperatures of a modified chemical vapour deposition (MCVD) optical fibre perform lathe dynamically measured with regenerated fibre Bragg gratings." In 35th Australian Conference on Optical Fibre Technology (ACOFT 2010). IEEE, 2010. http://dx.doi.org/10.1109/acoft.2010.5929885.

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Reports on the topic "Modified chemical vapor deposition"

1

Baron, B. N., R. E. Rocheleau, and S. S. Hegedus. Chemical vapor deposition and photochemical vapor deposition of amorphous silicon photovoltaic devices. Office of Scientific and Technical Information (OSTI), 1989. http://dx.doi.org/10.2172/5042415.

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Mayer, T. M., D. P. Adams, B. S. Swartzentruber, and E. Chason. Dynamics of nucleation in chemical vapor deposition. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/170570.

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HO, PAULINE. Chemical reactions in TEOS/ozone chemical vapor deposition[TetraEthylOrtho Silicate]. Office of Scientific and Technical Information (OSTI), 2000. http://dx.doi.org/10.2172/751369.

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Kaplan, Daniel, Kendall Mills, and Venkataraman Swaminathan. Chemical Vapor Deposition of Atomically-Thin Molybdenum Disulfide (MoS2). Defense Technical Information Center, 2015. http://dx.doi.org/10.21236/ada613852.

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Stevenson, D. A. Fundamental studies of the chemical vapor deposition of diamond. Office of Scientific and Technical Information (OSTI), 1991. http://dx.doi.org/10.2172/5639356.

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Banks, H. T. Modeling Validation and Control of Advanced Chemical Vapor Deposition Processes. Defense Technical Information Center, 2000. http://dx.doi.org/10.21236/ada384359.

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Lampert, Lester. High-Quality Chemical Vapor Deposition Graphene-Based Spin Transport Channels. Portland State University Library, 2000. http://dx.doi.org/10.15760/etd.3308.

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Muenchausen, R. Chemical-vapor deposition of complex oxides: materials and process development. Office of Scientific and Technical Information (OSTI), 1996. http://dx.doi.org/10.2172/405750.

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Kagan, Harris, Richard Kass, and K. K. Gan. Development of Single Crystal Chemical Vapor Deposition Diamonds for Detector Applications. Office of Scientific and Technical Information (OSTI), 2014. http://dx.doi.org/10.2172/1115741.

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Ekerdt, John G. Silicon and Germanium Thin Film Chemical Vapor Deposition, Modeling and Control. Defense Technical Information Center, 2002. http://dx.doi.org/10.21236/ada417307.

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