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Journal articles on the topic 'Nanocrystalline thin films'

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1

Kawar, Shashank S. "Synthesis and Characterization of Nanocrystalline Chalcogenide Cus Thin Films." Indian Journal of Applied Research 4, no. 5 (2011): 580–82. http://dx.doi.org/10.15373/2249555x/may2014/184.

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2

Mustafa Yuksek, Mustafa Yuksek, Huseyin Ertap Huseyin Ertap, Mevlut Karabulut Mevlut Karabulut, and Gasan M. Mamedov Gasan M. Mamedov. "Nonlinear and saturable absorption properties of PbS nanocrystalline thin films." Chinese Optics Letters 11, no. 9 (2013): 093001–93004. http://dx.doi.org/10.3788/col201311.093001.

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3

Jiang, Xiao Long, Y. J. Yao, M. Lai, K. Peng, and Y. W. Du. "Cutoff Frequency Study on Nanocrystalline FeNbB Thin Films." Advanced Materials Research 465 (February 2012): 72–75. http://dx.doi.org/10.4028/www.scientific.net/amr.465.72.

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A series of nanocrystalline FeNbB films were fabricated using ion-beam sputtering technique from FeNbB target. Pieces of these films were annealed for 1 hour at various temperatures up to 5730C. Room temperature soft magnetic properties of these films were measured. The influence of microstructure on magnetic behavior in nanocrystalline FeNbB films is investigated in a series of specimens with different film’s thickness. For the sample 120nm and 5000C annealed, cutoff frequency was found to be 5E7 Hz, which has the μf0=5E10.
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4

Wang, Chao, and Alan R. Esker. "Nanocrystalline chitin thin films." Carbohydrate Polymers 102 (February 2014): 151–58. http://dx.doi.org/10.1016/j.carbpol.2013.10.103.

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5

Tanaka, Keiseke, Masashi Sakakibara, Hiroto Tanaka, and Hirohisa Kiamchi. "OS04F033 Microstructural Characterization of Nanocrystalline Nickel Thin Films by X-Ray Diffraction." Abstracts of ATEM : International Conference on Advanced Technology in Experimental Mechanics : Asian Conference on Experimental Mechanics 2011.10 (2011): _OS04F033——_OS04F033—. http://dx.doi.org/10.1299/jsmeatem.2011.10._os04f033-.

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6

Zhang, M., Y. F. Zhang, P. D. Rack, M. K. Miller, and T. G. Nieh. "Nanocrystalline tetragonal tantalum thin films." Scripta Materialia 57, no. 11 (2007): 1032–35. http://dx.doi.org/10.1016/j.scriptamat.2007.07.041.

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7

Preschilla A., Nisha, S. Major, Nigvendra Kumar, I. Samajdar, and R. S. Srinivasa. "Nanocrystalline gallium nitride thin films." Applied Physics Letters 77, no. 12 (2000): 1861. http://dx.doi.org/10.1063/1.1311595.

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8

Szmidt, J., A. Werbowy, K. Zdunek, A. Sokowska, J. Konwerska-Hrabowska, and S. Mitura. "Nanocrystalline C=N thin films." Diamond and Related Materials 5, no. 3-5 (1996): 564–69. http://dx.doi.org/10.1016/0925-9635(95)00437-8.

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9

Sharma, Mansi, Jagannath Panigrahi, and Vamsi K. Komarala. "Nanocrystalline silicon thin film growth and application for silicon heterojunction solar cells: a short review." Nanoscale Advances 3, no. 12 (2021): 3373–83. http://dx.doi.org/10.1039/d0na00791a.

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Doped nanocrystalline silicon thin films, in which silicon nanocrystallites are embedded in an amorphous silicon matrix, are emerging as carrier-selective contacts for next-generation silicon heterojunction solar cells.
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10

Blum, W., and P. Eisenlohr. "Deformation Strength of Nanocrystalline Thin Films." Journal of Materials Science & Technology 33, no. 7 (2017): 718–22. http://dx.doi.org/10.1016/j.jmst.2016.11.025.

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11

Menaka Jha, Sandeep Marka, M. Ghanashyam Krishna, and A. K. Ganguli. "Multifunctional nanocrystalline chromium boride thin films." Materials Letters 73 (April 2012): 220–22. http://dx.doi.org/10.1016/j.matlet.2011.12.124.

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12

Chaure, Shweta, Nandu B. Chaure, and R. K. Pandey. "Self-assembled nanocrystalline CdSe thin films." Physica E: Low-dimensional Systems and Nanostructures 28, no. 4 (2005): 439–46. http://dx.doi.org/10.1016/j.physe.2005.05.044.

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13

Ma, C. H., J. H. Huang, and Haydn Chen. "Nanohardness of nanocrystalline TiN thin films." Surface and Coatings Technology 200, no. 12-13 (2006): 3868–75. http://dx.doi.org/10.1016/j.surfcoat.2004.10.098.

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14

Vankhade, Dhaval, Jaymin Ray, and Tapas K. Chaudhuri. "Nanocrystalline PbS Thin Films as Photodetectors." Advanced Science Letters 22, no. 4 (2016): 1022–25. http://dx.doi.org/10.1166/asl.2016.6948.

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15

Lepoutre, Sophie, Béatrice Julián-López, Clément Sanchez, Heinz Amenitsch, Mika Linden, and David Grosso. "Nanocasted mesoporous nanocrystalline ZnO thin films." J. Mater. Chem. 20, no. 3 (2010): 537–42. http://dx.doi.org/10.1039/b912613a.

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16

Barreca, Davide, Simona Garon, Eugenio Tondello, and Pierino Zanella. "SnO2 Nanocrystalline Thin Films by XPS." Surface Science Spectra 7, no. 2 (2000): 81–85. http://dx.doi.org/10.1116/1.1288177.

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17

Yong, Jie, Yeping Jiang, Xiaohang Zhang, Jongmoon Shin, Ichiro Takeuchi, and Richard L. Greene. "Magnetotransport in nanocrystalline SmB6 thin films." AIP Advances 5, no. 7 (2015): 077144. http://dx.doi.org/10.1063/1.4927398.

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18

Zheng, J. G. "Dislocations in nanocrystalline SnO2 thin films." Philosophical Magazine Letters 73, no. 3 (1996): 93–100. http://dx.doi.org/10.1080/095008396180885.

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19

Golubev, V. G., L. E. Morozova, A. B. Pevtsov, and N. A. Feoktistov. "Conductivity of thin nanocrystalline silicon films." Semiconductors 33, no. 1 (1999): 66–68. http://dx.doi.org/10.1134/1.1187635.

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20

Hübert, Thomas, Uwe Beck, and Helga Kleinke. "Amorphous and nanocrystalline SrTiO3 thin films." Journal of Non-Crystalline Solids 196 (March 1996): 150–54. http://dx.doi.org/10.1016/0022-3093(96)80010-x.

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21

Deo, Soumya R., Ajaya K. Singh, Lata Deshmukh, and Md Abu Bin Hasan Susan. "Metal Chalcogenide Nanocrystalline Solid Thin Films." Journal of Electronic Materials 44, no. 11 (2015): 4098–127. http://dx.doi.org/10.1007/s11664-015-3940-0.

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22

Özkan, M., N. Ekem, M. Z. Balbag, and S. Pat. "ZnSe nanocrystalline thin films deposition on Si substrate by thermionic vacuum arc." Proceedings of the Institution of Mechanical Engineers, Part L: Journal of Materials: Design and Applications 226, no. 2 (2012): 103–8. http://dx.doi.org/10.1177/1464420711433095.

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ZnSe nanocrystalline thin films were deposited on Si wafer using thermionic vacuum arc (TVA) method. For the first time, binary semiconductor thin films were deposited by TVA. The microstructure and surface morphology of the ZnSe nanocrystalline thin films were investigated using X-ray diffractometry, scanning electron microscopy, energy-dispersive X-ray spectrometry, and atomic force microscopy (AFM). Grain dimensions and grain size were determined by AFM measurement. Moreover, spectroscopic ellipsometer was used to characterize the refractive indices of ZnSe nanocrystalline thin film. Accord
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23

Jayatissa, Ahalapitiya H., A. M. Soleimanpour, and Yue Hao. "Manufacturing of Multifunctional Nanocrystalline ZnO Thin Films." Advanced Materials Research 383-390 (November 2011): 4073–78. http://dx.doi.org/10.4028/www.scientific.net/amr.383-390.4073.

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Optical, surface and structural properties of ZnO thin films fabricated by reactive radio- frequency (rf) magnetron sputtering and sol-gel coating methods are comparatively investigated. The optical properties of films produced by both techniques have very similar characteristics, however; the surface morphology and degree of crystallinity have different behaviors. The nanostructure columnar zinc oxide thin films can be synthesized by sol-gel coating methods which can have numerous applications requiring larger surface area. Also, the process scalability and large-scale manufacturing of these
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24

Carretero-Genevrier, Adrian, Glenna L. Drisko, David Grosso, Cédric Boissiere, and Clement Sanchez. "Mesoscopically structured nanocrystalline metal oxide thin films." Nanoscale 6, no. 23 (2014): 14025–43. http://dx.doi.org/10.1039/c4nr02909g.

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25

Hurley, D. C., R. H. Geiss, M. Kopycinska-Müller, et al. "Anisotropic elastic properties of nanocrystalline nickel thin films." Journal of Materials Research 20, no. 5 (2005): 1186–93. http://dx.doi.org/10.1557/jmr.2005.0146.

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The elastic properties of a nickel film approximately 800 nm thick were measured with nanoindentation, microtensile testing, atomic force acoustic microscopy (AFAM), and surface acoustic wave (SAW) spectroscopy. Values for the indentation modulus (220–223 GPa) and Young’s modulus (177–204 GPa) were lower than predicted for randomly oriented polycrystalline nickel. The observed behavior was attributed to grain-boundary effects in the nanocrystalline film. In addition, the different measurement results were not self-consistent when interpreted assuming elastic isotropy. Agreement was improved by
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26

Kulkarni, Aniruddha, Alexander Bourandas, Junhang Dong, Paul A. Fuierer, and Hai Xiao. "Synthesis and characterization of nanocrystalline (Zr0.84Y0.16)O1.92–(Ce0.85Sm0.15)O1.925 heterophase thin films." Journal of Materials Research 21, no. 2 (2006): 500–504. http://dx.doi.org/10.1557/jmr.2006.0041.

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A new type of nanocrystalline samarium-doped-ceria/yttrium-stabilized-zirconia (SDC/YSZ) heterophase thin film electrolytes was synthesized on MgO and Si substrates by spin coating and thermal treatment of SDC-nanoparticle-incorporated polymeric precursors. In the heterophase films, SDC nanoparticles were uniformly dispersed in a nanocrystalline YSZ matrix. The heterophase structure was stable when fired in air at temperatures up to 850 °C. The nanocrystalline heterophase thin films exhibited electrical conductivities significantly higher than that of the phase-pure YSZ and SDC nanocrystalline
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27

Portavoce, Alain, Khalid Hoummada та Lee Chow. "Atomic Transport in Nano-Сrystalline Thin Films". Defect and Diffusion Forum 367 (квітень 2016): 140–48. http://dx.doi.org/10.4028/www.scientific.net/ddf.367.140.

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Ge and B diffusion was studied in nanocrystalline Si, and Pd and Si self-diffusion was studied in nanocrystalline Pd2Si during and after Pd/Si reactive diffusion. These experiments showed that grain boundary (GB) diffusion kinetic is the same in micro-and nanoGBs, whereas triple junction (TJ) diffusion is several orders of magnitude faster than GB diffusion. In addition, GB segregation and GB migration can significantly modify atomic diffusion profiles in nanocrystalline materials, and atomic transport kinetics can be largely increased in nanograins compared to micro-grains, as well as during
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28

Deng, Li Jie, Wei He, and Zheng Ping Li. "Excimer Laser Crystallization of Nanocrystalline Silicon Thin Films." Advanced Materials Research 1120-1121 (July 2015): 361–68. http://dx.doi.org/10.4028/www.scientific.net/amr.1120-1121.361.

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Nanocrystalline silicon (nc-Si) thin film on glass substrate is subjected to excimer laser crystallized by varying the laser energy density in the range of 50~600 mJ/cm2. The effect of excimer laser crystallization on the structure of silicon film is investigated using Raman spectroscopy, X-ray diffraction, atomic force microscopy and scanning electron microscopy. The results show that polycrystalline silicon thin films can be obtained by excimer laser crystallization of nc-Si films. A laser threshold energy density of 200 mJ/cm2 is estimated from the change of crystalline fraction and surface
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29

Tsiulyanu, Dumitru. "Gas-sensing features of nanostructured tellurium thin films." Beilstein Journal of Nanotechnology 11 (July 10, 2020): 1010–18. http://dx.doi.org/10.3762/bjnano.11.85.

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Nanocrystalline and amorphous nanostructured tellurium (Te) thin films were grown and their gas-sensing properties were investigated at different operating temperatures with respect to scanning electron microscopy and X-ray diffraction analyses. It was shown that both types of films interacted with nitrogen dioxide, which resulted in a decrease of electrical conductivity. The gas sensitivity, as well as the response and recovery times, differed between these two nanostructured films. It is worth mentioning that these properties also depend on the operating temperature and the applied gas conce
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30

Shim, Jae Hyun, and Nam Hee Cho. "The Effect of DC Bias Voltage on the Structural and Optical Properties of Hydrogenated Nanocrystalline Si Thin Films." Solid State Phenomena 124-126 (June 2007): 1261–64. http://dx.doi.org/10.4028/www.scientific.net/ssp.124-126.1261.

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Amorphous and nanocrystalline Si films were prepared by plasma enhanced chemical vapor deposition (PECVD). The films were deposited with a RF power of 100 W, while substrates were under DC biases varying from 0 to -600 V. The size as well as the concentration of Si nanocrystallites increased with raising the DC bias; the PL emission wavelength was shifted from 400 to 750 nm. A model for the nanostructural variation in the nc-Si:H films was suggested to describe the change in the size and concentration of the nanocrystallites as well as the amorphous matrix depending on the DC bias conditions.
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31

Li, Jianhua, Jian Wang, Letao Zhang, and Shengdong Zhang. "Nanocrystalline SnO2 thin films prepared by anodization of sputtered Sn thin films." Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33, no. 3 (2015): 031508. http://dx.doi.org/10.1116/1.4916944.

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32

Yang, Yan Zhen, Ren Jie Sun, Yu Cheng Wu, Li Tao, and Cheng Wu Shi. "Immobilization of a Series of Homo/Heterobinuclear Metal (II) Phthalocyanine Hexasulphonates on Nanocrystalline TiO2 Thin Films and their Application in the Degradation of Methylene Blue." Advanced Materials Research 356-360 (October 2011): 1728–32. http://dx.doi.org/10.4028/www.scientific.net/amr.356-360.1728.

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A series of binuclear metal (II) phthalocyanine hexasulphonates, (M-M)Pc, including (Co-Co)Pc, (Co-Zn)Pc, (Co-Mn)Pc, (Zn-Zn)Pc, (Zn-Mn)Pc and (Mn-Mn)Pc were synthesized and immobilized on nanocrystalline TiO2 thin films. The nanocrystalline TiO2 thin film was characterized by SEM, XRD and profilometer. The catalytic activity of various (M-M)Pc/nanocrystalline TiO2 thin films was evaluated by the degradation of methylene blue (MB) with air as the oxidant under visible light irradiation and dark condition. The results indicated that the prepared nanocrystalline TiO2 thin film had good crystallin
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33

Patil, S. M., and P. H. Pawar. "Nanocrystalline Hexagonal Shaped CdS Thin Films for Photoconducting Application." International Letters of Chemistry, Physics and Astronomy 36 (July 2014): 153–67. http://dx.doi.org/10.18052/www.scipress.com/ilcpa.36.153.

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Nanocrystalline thin films of cadmium sulphide were prepared by chemical bath deposition technique onto glass substrate at 60 °C. The deposition parameters were optimized to obtain good quality of nanocrystalline thin films such as, time, precursor concentration, temperature of deposition and pH of the solution. The studies on crystal structure, composition, surface morphology, electrical conductivity and photoconductivity of the films were carried out by using different analytical technique. Characterization includes X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM
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34

Dub, S. N., A. A. Goncharov, S. S. Ponomarev, V. B. Filippov, G. N. Tolmacheva, and A. V. Agulov. "Mechanical properties of HfB2.7 nanocrystalline thin films." Journal of Superhard Materials 33, no. 3 (2011): 151–58. http://dx.doi.org/10.3103/s1063457611030026.

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35

Panda, S. K., A. Antonakos, E. Liarokapis, S. Bhattacharya, and S. Chaudhuri. "Optical properties of nanocrystalline SnS2 thin films." Materials Research Bulletin 42, no. 3 (2007): 576–83. http://dx.doi.org/10.1016/j.materresbull.2006.06.028.

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36

ZHANG, M., B. YANG, J. CHU, and T. NIEH. "Hardness enhancement in nanocrystalline tantalum thin films." Scripta Materialia 54, no. 7 (2006): 1227–30. http://dx.doi.org/10.1016/j.scriptamat.2005.12.027.

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37

Villar, F., J. Escarré, A. Antony, et al. "Nanocrystalline silicon thin films on PEN substrates." Thin Solid Films 516, no. 5 (2008): 584–87. http://dx.doi.org/10.1016/j.tsf.2007.06.196.

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38

Hsu, Chao-Sheng, Chih-Chieh Chan, Hung-Tai Huang, Chia-Hsiang Peng, and Wen-Chia Hsu. "Electrochromic properties of nanocrystalline MoO3 thin films." Thin Solid Films 516, no. 15 (2008): 4839–44. http://dx.doi.org/10.1016/j.tsf.2007.09.019.

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39

Sursaeva, V. G., G. Gottstein, and L. S. Shvindlerman. "Grain growth in thin nanocrystalline silver films." Scripta Materialia 116 (April 2016): 91–94. http://dx.doi.org/10.1016/j.scriptamat.2016.01.021.

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40

Singh, Ajay, D. K. Aswal, C. S. Viswanadham, et al. "Enhanced magnetoresistance in nanocrystalline La0.6Pb0.4MnO3 thin films." Journal of Crystal Growth 244, no. 3-4 (2002): 313–17. http://dx.doi.org/10.1016/s0022-0248(02)01699-8.

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41

Ikhmayies, Shadia J., and Riyad N. Ahmad-Bitar. "Optical properties of nanocrystalline CdTe thin films." Physica B: Condensed Matter 405, no. 15 (2010): 3141–44. http://dx.doi.org/10.1016/j.physb.2010.04.031.

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42

Coetsee, E., J. J. Terblans, H. C. Swart, J. M. Fitz-Gerald, and J. R. Botha. "Luminescence of Y2SiO5:Ce Nanocrystalline Thin Films." e-Journal of Surface Science and Nanotechnology 7 (2009): 369–74. http://dx.doi.org/10.1380/ejssnt.2009.369.

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43

Luo, Jinsong, Ligong Zhang, Haigui Yang, et al. "Oxidation kinetics of nanocrystalline Al thin films." Anti-Corrosion Methods and Materials 66, no. 5 (2019): 638–43. http://dx.doi.org/10.1108/acmm-11-2018-2037.

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Purpose This paper aims to study the oxidation kinetics of the nanocrystalline Al ultrathin films. The influence of structure and composition evolution during thermal oxidation will be observed. The reason for the change in the oxidation activation energy on increasing the oxidation temperature will be discussed. Design/methodology/approach Al thin films are deposited on the silicon wafers as substrates by vacuumed thermal evaporation under the base pressure of 2 × 10−4 Pa, where the substrates are not heated. A crystalline quartz sensor is used to monitor the film thickness. The film thicknes
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44

Moss, John A., Jeremy M. Stipkala, John C. Yang, et al. "Sensitization of Nanocrystalline TiO2by Electropolymerized Thin Films." Chemistry of Materials 10, no. 7 (1998): 1748–50. http://dx.doi.org/10.1021/cm980283i.

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45

Barreca, Davide, Alberto Gasparotto, Cinzia Maragno, and Eugenio Tondello. "Nanocrystalline Lanthanum Oxyfluoride Thin Films by XPS." Surface Science Spectra 11, no. 1 (2004): 52–58. http://dx.doi.org/10.1116/11.20050401.

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46

Checchetto, R., N. Bazzanella, A. Miotello, R. S. Brusa, A. Zecca, and A. Mengucci. "Deuterium storage in nanocrystalline magnesium thin films." Journal of Applied Physics 95, no. 4 (2004): 1989–95. http://dx.doi.org/10.1063/1.1637953.

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47

Rush, G. E., A. V. Chadwick, I. Kosacki, and H. U. Anderson. "An exafs study of nanocrystalline thin films." Radiation Effects and Defects in Solids 156, no. 1-4 (2001): 117–21. http://dx.doi.org/10.1080/10420150108216881.

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48

Zhang, K., and W. Z. Shen. "Electron dephasing in nanocrystalline silicon thin films." Applied Physics Letters 92, no. 8 (2008): 083101. http://dx.doi.org/10.1063/1.2840179.

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49

Cavaleiro, A. "Nanocrystalline structure and hardness of thin films." Vacuum 64, no. 3-4 (2002): 211–18. http://dx.doi.org/10.1016/s0042-207x(01)00337-2.

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50

Zhou, Xiao Wen, Rui Feng Lin, and Xu Rui Xiao. "Morphologic studies of nanocrystalline CdSe thin films." Applied Surface Science 119, no. 3-4 (1997): 203–6. http://dx.doi.org/10.1016/s0169-4332(97)00208-0.

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