Relevant bibliographies by topics / Nanoscale multilayer mirror

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  1. Journal articles
  2. Dissertations / Theses
  3. Conference papers

Academic literature on the topic 'Nanoscale multilayer mirror'

Author: Grafiati
Published: 25 January 2025
Last updated: 31 July 2025

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Journal articles on the topic "Nanoscale multilayer mirror"

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Kavei, Ghassem, and Saeed Nikbin. "Substrate temperature effect on the nanoscale multilayer ZnS/Ag/ZnS for heat mirror application." Materials Science-Poland 33, no. 4 (2015): 760–66. http://dx.doi.org/10.1515/msp-2015-0103.

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AbstractNanoscale multilayers of ZnS/Ag/ZnS were deposited on Corning glass substrates at different substrate temperatures. The depositions were carried out in high vacuum using electron beam deposition technique at 20, 60, 100 and 150 °C, respectively. The optical and electrical performance of each single layer and the accomplished ZnS/Ag/ZnS multilayer system were characterized using spectroscopic ellipsometry analysis, XRD and finally AFM. Based on these analyses and associated theories, such as the characteristic matrix theory, the optimized multilayer system was speculated and tested. Cry
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Sauppe, Mario, Dimitrios Rompotis, Benjamin Erk, et al. "XUV double-pulses with femtosecond to 650 ps separation from a multilayer-mirror-based split-and-delay unit at FLASH." Journal of Synchrotron Radiation 25, no. 5 (2018): 1517–28. http://dx.doi.org/10.1107/s1600577518006094.

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Extreme ultraviolet (XUV) and X-ray free-electron lasers enable new scientific opportunities. Their ultra-intense coherent femtosecond pulses give unprecedented access to the structure of undepositable nanoscale objects and to transient states of highly excited matter. In order to probe the ultrafast complex light-induced dynamics on the relevant time scales, the multi-purpose end-station CAMP at the free-electron laser FLASH has been complemented by the novel multilayer-mirror-based split-and-delay unit DESC (DElay Stage for CAMP) for time-resolved experiments. XUV double-pulses with delays a
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IJpes, D., A. E. Yakshin, J. M. Sturm, and M. D. Ackermann. "Increasing soft x-ray reflectance of short-period W/Si multilayers using B4C diffusion barriers." Journal of Applied Physics 133, no. 2 (2023): 025302. http://dx.doi.org/10.1063/5.0130677.

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Short-period multilayer mirrors are used in wavelength-dispersive x-ray fluorescence to extend the wavelength range available with naturally occurring Bragg-crystals. W/Si multilayer mirrors with a period of 2.5 nm are used to reflect and disperse elements in the O-Kα–Al-Kα range. However, the reflectance is far from theoretical due to nanoscale W-Si intermixing and formation of WSix. In this work, B4C diffusion barriers were applied in sputter deposited 2.5 nm W/Si multilayers to inhibit W–Si interaction. A peak reflectance of 45% at 9.7° grazing was measured at a wavelength of 0.834 nm—the h
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Petrakis, Stylianos, Alexandros Skoulakis, Yannis Orphanos, et al. "Coherent XUV Multispectral Diffraction Imaging in the Microscale." Applied Sciences 12, no. 20 (2022): 10592. http://dx.doi.org/10.3390/app122010592.

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The rapid growth of nanotechnology has increased the need for fast nanoscale imaging. X-ray free electron laser (XFEL) facilities currently provide such coherent sources of directional and high-brilliance X-ray radiation. These facilities require large financial investments for development, maintenance, and manpower, and thus, only a few exist worldwide. In this article, we present an automated table-top system for XUV coherent diffraction imaging supporting the capabilities for multispectral microscopy at high repetition rates, based on laser high harmonic generation from gases. This prototyp
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Kumar, Niranjan, Roman S. Pleshkov, Aleksey V. Nezhdanov, et al. "Microstructural Transformation of Nanoscale Be Layers in the Mo/Be and Be/Mo Periodic Multilayer Mirrors Investigated by Raman Spectroscopy." Journal of Physical Chemistry C 125, no. 4 (2021): 2729–38. http://dx.doi.org/10.1021/acs.jpcc.0c10210.

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Chan, Selena, Scott R. Horner, Benjamin L. Miller, and Philippe M. Fauchet. "Nanoscale Silicon Microcavity Optical Sensors for Biological Applications." MRS Proceedings 638 (2000). http://dx.doi.org/10.1557/proc-638-f10.4.1.

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AbstractThe large surface area of porous silicon provides numerous sites for many potential species to attach, which makes it an ideal host for sensing applications. The average pore size can be easily adjusted to accommodate either small or large molecular species. When porous silicon is fabricated into a structure consisting of two high reflectivity multilayer mirrors separated by an active layer, a microcavity is formed. Multiple narrow and visible luminescence peaks are observed with a full width at half maximum value of 3 nm. The position of these peaks is extremely sensitive to small cha
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Dissertations / Theses on the topic "Nanoscale multilayer mirror"

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Ravinet, Nolann. "Développement de revêtements interférentiels pour des imageurs X à haute résolution." Electronic Thesis or Diss., université Paris-Saclay, 2024. http://www.theses.fr/2024UPASP127.

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La FCI (fusion par confinement inertiel) est une voie privilégiée pour accéder expérimentalement aux conditions extrêmes de la matière, via l'implosion d'une cible par laser. Pour caractériser la symétrie d'implosion, un microscope de résolution micrométrique, opérant dans le domaine des rayons X durs, est développé par le CEA (Commissariat à l'énergie atomique). TXI (Toroidal X-ray Imager) qui sera installé au NIF (National Ignition Facility) est un diagnostic X de type Wolter, où les miroirs coniques sont remplacés par des miroirs toriques. Il est également un diagnostic multicanal, fonction
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Conference papers on the topic "Nanoscale multilayer mirror"

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Dudin, Stanislav, Stanislav Yakovin, and Alexander Zykov. "Multilayer Interference Mirrors with Nanoscale Metal Layers." In 2024 IEEE 14th International Conference Nanomaterials: Applications & Properties (NAP). IEEE, 2024. http://dx.doi.org/10.1109/nap62956.2024.10739700.

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Himel, Marc D. "Optic Fabrication and Metrology for Soft X-Ray Projection Lithography." In Soft X-Ray Projection Lithography. Optica Publishing Group, 1993. http://dx.doi.org/10.1364/sxray.1993.tub.3.

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One of the many technology areas that lie on the critical-path to the success of soft X-ray projection lithography (SXPL) is the fabrication and metrology of aspheric mirrors. I will review the progress of our collaboration with a number of companies to determine if the mirror fabrication and metrology technologies can be developed so that SXPL can meet the early next century demand for 0.1 μm design rule devices. The figure and finish tolerances for these mirrors are well beyond the current state-of-the-art for aspheres and even beyond industry's capability to fabricate spheres. To achieve th
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