Dissertations / Theses on the topic 'Nitrure de niobium'
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Cabanel, Régis. "Elaboration, caractérisation et propriétés électroniques de couches minces de nitrure de niobium et d'oxyde de niobium." Grenoble 2 : ANRT, 1986. http://catalogue.bnf.fr/ark:/12148/cb37596198b.
Full textCabanel, Régis. "Elaboration, caractérisation et propriétés électroniques de couches minces de nitrure de niobium et d'oxyde de niobium." Grenoble INPG, 1986. http://www.theses.fr/1986INPG0051.
Full textMbaye, Kouly. "Contribution à l'étude des propriétés en hautes fréquences de couches minces supraconductrices de nitrure de niobium." Paris 11, 1988. http://www.theses.fr/1988PA112061.
Full textLinde, Alexander. "Preparation of cubic NbN via reactive diffusion and combustion synthesis in nitrogen gas." Montpellier 2, 2009. http://www.theses.fr/2009MON20149.
Full textThis PhD thesis was aimed at obtaining of δ-NbNx powders with various nitrogen/niobium ratio x (both below and above the unity) via reactive diffusion and SHS in nitrogen gas. Lattice parameter a of cubic niobium nitride powders was determined by means of XRD. Their critical temperatures Tc were determined using magnetic measurements. Simultaneous high-accuracy measurements of the x, a and Tc values allowed us to unambiguously reveal the maxima in the a(x) and Tc(x) curves which was found to happen at x = 0. 98. The mechanism of phase formations in the diffusion product with a particle size of about 100 m was investigated. According to EPMA data, it was found to proceed in the following order: Nb → α-Nb(N) → β-Nb2N1±y → γ-Nb4N3±y → δ-NbN1±y that is in agreement with the recent phase diagram. SHS experiments at lower pressures (P(N2) = 0. 12–10. 0 MPa) were aimed at investigation of different combustion modes such as “surface” and “layer-by-layer” modes experimentally and theoretically. Combustion with a concave front (“surface” mode) was found to occur within the pressure range 0. 12–1. 0 MPa while that with a planar front (“layer-by-layer” mode), in the range 1–10 MPa. SHS experiments at high pressures (P(N2) = 48–230 MPa) were mostly oriented on the investigation of influence of different heat conditions. It was shown that upon filtration combustion infiltration of nitrogen gas into the sample body is not the only parameter which limits the extent of nitriding of Nb powder. Gas permeable heat insulation is recommended in order to decrease heat loss from the sample into environment and thus to provide more favorable conditions for the achievement of higher extent of nitriding. Using heat insulation high extent of conversion (x = 1. 015) was obtained at lower pressures than in previous studies
Mbaye, Kouly. "Contribution à l'étude des propriétés en hautes fréquences de couches minces supraconductrices de nitrure de niobium." Grenoble 2 : ANRT, 1988. http://catalogue.bnf.fr/ark:/12148/cb376161845.
Full textJacquemin, Manoël. "Structure et propriétés supraconductrices de films de nitrure de niobium épitaxiés par CVD à haute température." Thesis, Université Grenoble Alpes (ComUE), 2019. http://www.theses.fr/2019GREAI054/document.
Full textThe studies concern the development of superconducting devices for single photon detection. Niobium nitride (NbN) is a material suitable for the production of superconducting wires for the detector target. This work is opening up perspectives on the development of epitaxial niobium nitride films on sapphire by the chemical vapor deposition (CVD) method. The production of thin films (5-100 nm) is carried out at high temperature (1000°C to 1300°C) from niobium chloride and ammonia diluted in hydrogen (H2-NH3-NbCl5). The substrate is oriented single crystalline sapphire (Al2O3) (0002), aluminum nitride (AlN) (0002) or magnesium oxide (MgO) (100).The study of epitaxial relationships during the growth of niobium nitride on the sapphire substrate was first performed. Observation of the microstructures and crystalline orientations of the various films processed made it possible to highlight the relationships between the surface state of the substrate and the growth mode of NbN. The potential for using single crystal substrates such as MgO and AlN is discussed in the conclusion.The study of the growth process and the relationships between the working conditions and the "quality" of thin films made it possible to identify the experimental windows leading to epitaxial growth. The activation energy of the growth reactions and the supersaturation conditions favorable to epitaxial growth were calculated.The study of the interactions between the structural properties and superconducting properties of films has allowed the superconducting transition temperature to be linked to the density of atomic defects, microstructural defects, the thickness of the films and their stress state. There is a linear relationship between the interplanar space of planes parallel to the substrate and the superconducting transition temperature.Finally, the durability of ultra-thin films (5 - 8 nm) of niobium nitride was studied. The electrical and superconducting properties of films processed at 1000°C and 1200°C on sapphire substrates and epitaxial layers of AlN were analyzed over a period of six months. The properties of films change most notably during the first month. High temperature deposition limits the rapid degradation of the films and preserves their superconducting properties
Goupy, Johannes. "Optimisation de détecteurs pour l'astronomie du rayonnement X : développement de jonctions supraconductrices pour l'isolation thermique dans les interconnexions." Phd thesis, Université de Grenoble, 2012. http://tel.archives-ouvertes.fr/tel-00877895.
Full textSetzu, Romano. "Etude et réalisation de jonctions Josephson en nitrure de niobium à barrière semi-métallique en TaxN ; application aux circuits logiques micro-ondes à impulsions quantiques RSFQ." Phd thesis, Université Joseph Fourier (Grenoble), 2007. http://tel.archives-ouvertes.fr/tel-00194521.
Full textLarrey, Vincent. "Etude et realisation de jonctions sis a base de nitrure de niobium et d'une barriere tunnel adaptee permettant la montee aux frequences thz des instruments heterodynes." Paris 6, 1998. http://www.theses.fr/1998PA066542.
Full textBaubert, Jean Benoît Martin. "Superconducting hot electron bolometers on thin membranes for SHAHIRA." Paris 6, 2005. http://www.theses.fr/2005PA066617.
Full textDaulle, Armelle. "Conception, réalisation et caractérisation de capteurs de puissance micro-onde." Université Joseph Fourier (Grenoble), 1999. http://www.theses.fr/1999GRE10167.
Full textLyne, Michael Peter. "High resolution spectroscopy of aminoborane and niobium nitride." Thesis, University of British Columbia, 1987. http://hdl.handle.net/2429/26442.
Full textScience, Faculty of
Chemistry, Department of
Graduate
Huang, Gejian. "High resolution spectroscopy of niobium nitride and vanadium oxide." Thesis, University of British Columbia, 1988. http://hdl.handle.net/2429/27961.
Full textScience, Faculty of
Chemistry, Department of
Graduate
Schwartz, Viviane. "Preparation and Reactivity of Niobium-Containing Hydrotreating Catalysts." Diss., Virginia Tech, 2000. http://hdl.handle.net/10919/26368.
Full textPh. D.
Dane, Andrew E. (Andrew Edward). "Reactive DC magnetron sputtering of ultrathin superconducting niobium nitride films." Thesis, Massachusetts Institute of Technology, 2015. http://hdl.handle.net/1721.1/97257.
Full textThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references.
DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical temperature were measured for a large number of samples. Film Tc was improved by changing the way the samples were heated during the deposition, by ex situ rapid thermal processing, and in some cases by the addition of an RF bias to the substrate holder during the sputter deposition. These improvements to the deposition of NbN have enabled the production of superconducting nanowire single photon detectors whose quantum efficiency saturates and was the starting point for work on the superconductor-insulator transition.
by Andrew E. Dane.
S.M. in Electrical Engineering
Baunemann, Arne. "Precursor chemistry of tantalum and niobium nitride for MOCVD and ALD applications." [S.l.] : [s.n.], 2006. http://deposit.ddb.de/cgi-bin/dokserv?idn=982633009.
Full textArcher, Lucy Elizabeth. "Optical properties of ultra-thin niobium nitride films for single photon detectors." Thesis, Massachusetts Institute of Technology, 2017. http://hdl.handle.net/1721.1/112044.
Full textCataloged from PDF version of thesis.
Includes bibliographical references (pages 75-78).
In this thesis I made a study of the properties of reactively sputtered ultra-thin films of niobium nitride (NbN) and niobium titanium nitride (NbTiN). Using Variable Angle Spectral Ellipsometry (VASE), I found that the optical properties of NbN films appear to have a critical thickness above which the optical parameters stabilize. I also found that the deposition process has better stability over time for thicker films than for thinner ones; that is, when films are deposited weeks apart, the thinner films show more variation in thickness and optical properties than do the thicker films. The data also suggest that the crystallinity of the substrate upon which the NbN is deposited has a significant effect on the optical parameters. The set of films deposited for the optical study was also tested against a universal scaling law for thin film superconductors, which seems to support the existence of the critical thickness, below which the properties change significantly and do not conform to the power law scaling that holds for thicker films. Finally, I explored recipes for depositing NbTiN with our sputtering system, in the hope of creating films that have better properties than NbN to be used in device manufacturing. I was able to create films with the same properties as our current NbN films with minimal optimization, and further work in this area should result in NbTiN films that are better than our NbN films.
by Lucy Elizabeth Archer.
S.M.
Lichtenwalner, Daniel Jenner. "The ion-beam reactive sputtering process for deposition of niobium nitride thin films." Thesis, Massachusetts Institute of Technology, 1990. http://hdl.handle.net/1721.1/42466.
Full textVita.
Includes bibliographical references (leaves 284-290).
by Daniel Jenner Lichtenwalner.
Ph.D.
Acevedo, Reyes Daniel Epicier Thierry Perez Michel. "Evolution de l'état de précipitation au cours de l'austénitisation d'aciers microalliés au vanadium et au niobium." Villeurbanne : Doc'INSA, 2007. http://docinsa.insa-lyon.fr/these/pont.php?id=acevedo_reyes.
Full textAcevedo, Reyes Daniel. "Evolution de l'état de précipitation au cours de l'austénitisation d'aciers microalliés au vanadium et au niobium." Lyon, INSA, 2007. http://theses.insa-lyon.fr/publication/2007ISAL0008/these.pdf.
Full textGrain size control during heat treatments in austenite can be ensured by vanadium and niobium carbonitrides. However, the evolution of the precipitation state must be known to optimise the austenisation treatment, and no quantitative characterisation of this kind is available nowadays. This study deals with the dissolution kinetics of vanadium and niobium carbonitrides in austenite, for two high purity model alloys FeCV and FeCVNb, and a commercial alloy designed for springs fabrication. The characterisation combines several experimental techniques : structure and chemical composition of precipitates are established by transmission electronic microscopy and related techniques (EDS analysis, HAADF), particle size distribution is measured by means of scanning electronic microscopy (using a STEM detector), and volume fraction of precipitates is estimated by dosing the precipitated phases after an electrolytic dissolution of the matrix. In order to predict the evolution of the precipitation state during an austenitisation treatment, a precipitation-dissolution model has been developed. The modelling approach used in this work allows the description of (i) a non stoichiometric binary precipitate, the coexistence of two independent binary precipitates, (iii) the evolution of a single family of homogeneous ternary precipitates with varying chemical composition (VxNb1-xC). These different approaches were calibrated and validated on model alloys, then applied to the industrial alloy
Decams, Jean-Manuel. "Synthese et caracterisation de derives du niobium et du tantale avec des ligands azotes bidentes fonctionnalises : precurseurs potentiels de nitrures par cvd." Nice, 1999. http://www.theses.fr/1999NICE5376.
Full textModarres, Tehrani Zoreh. "Etude électrochimique de la réactivité de complexes biscyclopentadiéniques du niobium vis à vis de fonctions organiques azotées (nitrile, hydroxylamine, amine, azo, nitroso et azoxy)." Dijon, 1997. http://www.theses.fr/1997DIJOS023.
Full textCarvalho, Renata Gomes. "Deposição e caracterização de filmes finos de NbAIN por magnetron sputtering reativo." Universidade Federal de Sergipe, 2016. https://ri.ufs.br/handle/riufs/3526.
Full textThe objective of this work was to study NbAlN thin films and the influence of variation in the concentration of aluminum in the crystal structure, mechanical properties and oxidation resistance of these coatings. The thin films were deposited by reactive magnetron sputtering and characterized by Grazing Incidence X-ray Diffraction (GIXRD), Energy Dispersive Spectroscopy (EDS), Rutherford Backscattering Spectrometry (RBS), nanohardness analysis and oxidation tests at high temperatures. It was first necessary to define the deposition parameters of NbN thin films with δ-NbN phase (fcc). From this, NbAlN thin films were deposited and present at concentration of 10, 20 and 42 at% Al. The NbAlN crystalline phase obtained was the δ-NbN, however it was observed a shift of the peaks in the patterns obtained GIXRD of regions for larger angles for these samples, indicating the formation of a solid solution. The higher oxidation resistance temperature was 700° C for the sample with 42 in at% Al. From the SEM analysis it was possible to observe the surface of the film after oxidation, all films showed defects, however the amount of such defects was lower in samples with higher aluminum concentrations. The average hardness values obtained for thin films NbAlN was 25 GPa.
O objetivo do presente trabalho foi estudar filmes finos de NbAlN e verificar a influência da variação da concentração de alumínio na estrutura cristalina, propriedades mecânicas e resistência à oxidação desses revestimentos. Os filmes finos foram depositados por magnetron sputtering reativo e caracterizados por Difração de Raios X em Ângulo Rasante (GIXRD), Espectroscopia de Energia dispersiva (EDS), Espectroscopia por Retroespalhamento Rutherford (RBS), análises de nanodureza e testes de oxidação a altas temperaturas. Primeiramente foi necessário definir os parâmetros de deposição de filmes finos de NbN com fase δ-NbN (cfc). A partir disso, filmes finos de NbAlN foram depositados e apresentaram concentração em at% de Al de 10, 20 e 42. A fase cristalina obtida para os filmes de NbAlN foi a δ-NbN, entretanto foi observado um deslocamento dos picos obtidos nos padrões de GIXRD para regiões de ângulos maiores para essas amostras, o que indica a formação de uma solução sólida. A maior temperatura de resistência à oxidação foi de 700°C para a amostra com 42 at% de Al. A partir das análises de MEV foi possível observar a superfície dos filmes após a oxidação, todos os filmes apresentaram defeitos, entretanto a quantidade desses defeitos foi menor nas amostras com maiores concentrações de alumínio. Os valores médios de dureza obtido para os filmes finos de NbAlN foi de 25 GPa.
Alves, Luiz Antonio. "Propriedades óticas de filmes de nitreto de titânio com adição de nióbio depositados por triodo-magnetron sputtering." Universidade do Estado de Santa Catarina, 2014. http://tede.udesc.br/handle/handle/619.
Full textConselho Nacional de Desenvolvimento Científico e Tecnológico
Titanium nitride (TiN) films with niobium (Nb) addition (TiN[Nb], 0,01 < Nb/Ti < 0,15) were obtained by sputter deposition in a triode magnetron sputtering system from a mosaic target of titanium with niobium inserts at the erosion zone. The effects of Nb/Ti in surface morphology were analyzed by atomic force and confocal microscopy measurements. The reflectivities of the films with niobium incorporation are in agreement with the Drude-Lorentz model. The constants obtained by the fitting show an increase in plasma frequency and relaxation time with increased Nb/Ti ratio, indicating an increase in the number of charge carriers. The color parameters according CIELab system show an increase in L*, a* and b* coordinates. The visual analysis indicates an increased red tone when compared with pure TiN film in agreement with the increased absolute values of a* coordinates.
Filmes de nitreto de titânio com adição de nióbio ((TiN[Nb], 0,01 < Nb/Ti < 0,15) foram depositados pelo processo de pulverização catódica utilizando um sistema Triodo Magnetron Sputtering. A pulverização catódica de Titânio e Nióbio foi feita a partir de um alvo de titânio com insertos de nióbio dispostos na região de erosão. Foram analisados os efeitos da razão Nb/Ti na morfologia superficial do filme através de microscopia de força atômica e confocal. As medidas de refletividade dos filmes de TiN[Nb] obedecem perfeitamente o modelo de Drude-Lorentz. As constantes obtidas pelo modelo de Drude-Lorentz mostram um aumento nos valores da frequência de plasma e tempo de relaxação com o aumento na razão Nb/Ti, indicando que a presença de nióbio aumenta o número de portadores de carga. Os parâmetros de cor segundo o sistema CIELab mostram um aumento nas coordenadas L*, a* e b*. A análise visual das amostras mostra uma tonalidade avermelhada, quando comparadas com o filme contendo somente TiN, em concordância com o aumento absoluto nas coordenadas a*.
Norlin, Anna. "Investigation of electrochemical properties and performance of stimulation/sensing electrodes for pacemaker applications." Doctoral thesis, Stockholm, 2005. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-176.
Full textJan, Jin-Shyong. "All niobium nitride Josephson vortex flow transistor." 1990. http://catalog.hathitrust.org/api/volumes/oclc/22806461.html.
Full textTypescript. Vita. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 211-219).
Bedorf, Sven Holger [Verfasser]. "Development of ultrathin niobium nitride and niobium titanium nitride films for THz hot-electron bolometers / vorgelegt von Sven Holger Bedorf." 2005. http://d-nb.info/978280849/34.
Full textLi, Yen-Jun, and 李彥濬. "Phase and superconductivity studies of micro-sized niobium nitride." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/ar2242.
Full text國立政治大學
應用物理研究所
106
Niobium nitride is a low compressibility and high hardness material. It has many phases structures, including cubic δ-NbN, ε-hexagonal, δ’-hexagonal and tetragonal. In this work, we investigate the appearance of superconductivity of each NbN phase. Pure cubic δ-NbN specimens were prepared by annealing 1400 oC from NbN powder of Alfa Aesar. The lattice constant of this specimen was determined to be 4.385 Å by powder X-ray diffraction (XRD) measurement. Superconductivity of Cubic δ-NbN phase was revealed at 13.4 K by the measurements of resistivity magnetic susceptibility and heat capacity of pressed powders. It is consistent with previous reports that Tc is a function of lattice constant. Zou et. al. reported that two superconducting temperatures of 17.1 K and 10.1 K appear in the powder of Goodfellow, they claimed 17.1 K is of cubic phase and 10.1 K is of ε-hexagonal phase. We also observed two Tc from the powder of Goodfellow, based on X-ray and magnetic data the Tc =17.1 K is defined from cubic phase, but the phase of Tc =10.1 K is hardly fitted to the ε-hexagonal phase. In order to check whether ε-hexagonal phase have superconductivity or not, a sub-micron particles of single crystal was selected from the powder of Goodfellow, the ε-hexagonal phase of the particle is revealed by the measurements of EBSD (Electron Back Scattering Diffraction). The resistivity measurement of the sub-micro crystal shows no superconductivity as temperature down to 2 K. We also measured the specific heat of cubic NbN from pressed powder of Alfa Aesar. The superconductivity transition temperature Tc =11 K was observed. The electronic part of specific heat, ΔC/γTc is equal to 0.83 which is lower than BCS value, 1.43, indicating an unusual superconductivity. The critical field of superconductivity Hc1 obtained from the magnetic field dependent magnetization is 185 Oe. The Hc2 obtained from magneto resistivity data is 19.22 T. A sub-micron size δ-cubic crystal successfully selected from Alfa Aesar powder was confirmed by EBSD, Tc=13 K and Hc2 =21.3 T were obtained from resistivity measurements, the results are in consistent with that obtained from χ(T) and R(T) of the pressed powder specimen.
Lin, Shin Yu, and 林信宇. "Investigation on characteristics of niobium nitride and molybdenum nitride gates on hafnium oxide gate dielectrics." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/91108897930458042664.
Full text國立聯合大學
材料科學工程學系碩士班
99
In this study, niobium nitride (NbNx) and molybdenum nitride (MoNx) thin films are deposited by magnetron sputtering on various thicknesses of HfO2 gate dielectrics (i.e., 2 nm, 4 nm, 6 nm, 8 nm, and 12 nm) to fabricate the metal/oxide/semiconductor capacitors. The incorporation of nitrogen into the NbNx and MoNx films is controlled by N2/(Ar+N2) flow ratios. The Nb/NbNx and Mo/MoNx gate stacks are deposited on HfO2, and followed by forming gas annealing (FGA) at 400oC for 30 min. The characteristics of Nb/NbNx and Mo/MoNx thin films deposited with various N2/(Ar+N2) flow ratios, before and after FGA, are examined. In addition, the effective work functions (Φm) of gate electrodes are also extracted from capacitance-voltage (C-V) curves to discuss the relation between material properties and the shift of Φm. The thicknesses and surface morphology of NbNx and MoNx films are determined by field emission scanning electron microscopy (FESEM). The crystal structure is identified by grazing incidence angle x-ray diffractometer (GIAXRD). The composition and chemical bonding of NbNx and MoNx films are tailored by X-ray photoelectron spectroscopy (XPS). For electrical properties, the resistivity is measured by four point probe, and C-V curves are obtained by using the LCR meter (Agilent E4980A) to extract the Φm. The SEM and GIAXRD results show that the morphology and crystal structure of NbNx and MoNx films exhibit a transition when the N2/(Ar+N2) flow ratio is more than 2%. The surface morphology changes from polyhedron to slab, and the phase changes from body-centered- cubic to face-centered- cubic structure. The NbNx structure is becoming nearly amorphous when the N2/(Ar+N2) flow ratio increases, whereas the MoNx structure shows increased crystallinity. Moreover, the resistivity of MoNx films, before and after FGA, is lower than that of NbNx films using the same deposition parameters. The results reveal that the Φm of NbNx films ranges from 3.83 eV to 4.17 eV, and that of MoNx films ranges from 4.58 eV to 5.23 eV. It suggests that the Φm can be modulated by the nitrogen content. Consequently, the NbNx and MoNx gate electrodes are promising for applications in n-channel and p-channel metal-oxide-semiconductor field-effect transistors, respectively.
Zhuang, Yan. "Linear and nonlinear characteristics of niobium nitride hot-electron bolometer devices." 2002. https://scholarworks.umass.edu/dissertations/AAI3068608.
Full textChown, Lesley H. "The influence of continuous casting parameters on hot tensile behaviour in low carbon, niobium and boron steels." Thesis, 2009. http://hdl.handle.net/10539/6499.
Full textGerecht, Eyal. "Development of niobium nitride hot electron bolometric mixer for terahertz frequencies: The phonon-cooled version." 1998. https://scholarworks.umass.edu/dissertations/AAI9841871.
Full textBaunemann, Arne [Verfasser]. "Precursor chemistry of tantalum and niobium nitride for MOCVD and ALD applications / vorgelegt von Arne Baunemann." 2006. http://d-nb.info/982633009/34.
Full textYi-RuWu and 吳佾儒. "Wear performance of micro-drills with amorphous carbon nitride (a-C:N) coatings doped with hydrogen and niobium." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/8dafa3.
Full textKrishnan, R. "Investigations On The Properties Of TiN, NbN Thin Films And Multilayers By Reactive Pulsed Laser Deposition." Thesis, 2010. http://etd.iisc.ernet.in/handle/2005/2274.
Full textYin-HsiangMao and 毛胤翔. "Titanium Addition of Niobium Nitride Single and Multilayer Coating on Wear Property, Corrosion Resistance and Applications on High Speed Drills after Acetylene Introduction." Thesis, 2019. http://ndltd.ncl.edu.tw/handle/2vvdbb.
Full text國立成功大學
機械工程學系
107
This study was composed of three stages. In first stage, NbNxA coatings were prepared by DC magnetron sputtering. In second stage, NbTi-NX and NbN/TiNxmin coatings were prepared using RF magnetron sputtering. In third stage, acetylene was introduced to prepare NbTi-NX-CH coating. Considering wear property and corrosion resistance, NbTi-N12-CH coating was the optimal parameter for preparation in this research. Applied the NbTi-N12-CH coating to a high-speed drill and tested it by drilling 2000, 4000, and 6000 holes. The results revealed that applying this coating to the drill could increase its drill life to 4000 holes, which is two times longer than that of an uncoated drill.