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Journal articles on the topic 'Novolak'

Author: Grafiati

Published: 4 June 2021

Last updated: 25 July 2025

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1

Rokhati, Nur, and Aji Prasetyaningrum. "PEMBUATAN RESIN PHENOL FORMALDEHID TERHADAP APLIKASINYA SEBAGAI VERNIS." Reaktor 12, no. 1 (2008): 42. http://dx.doi.org/10.14710/reaktor.12.1.42-47.

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Phenol formaldehid termasuk kelompok resin sintetis yang dihasilkan dari reaksi polimerisasi antara phenol dengan formaldehid. Ada dua jenis resin phenol formaldehid yaitu : novolak yang bersifat termoplast dan resol yang bersifat termoset. Phenol formaldehid dapat diaplikasikan sebagai vernis karena dapat membentuk lapisan film yang kering.Penelitian dilakukan dengan mereaksikan phenol dan formaldehid dengan pH dan perbandingan mol bervariasi. Jenis novolak dibuat pada suasana asam dengan penambahan HCl, suhu 900C, dan waktu reaksi 5 jam, sedangkan jenis resol dibuat pada suasana basa dengan

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2

Waadallah Ahmed, Ammar. "Methanol Effect on color stability and shelf life of phenolic Resin compound under acidic conditions." Iraqi Journal of Chemical and Petroleum Engineering 10, no. 3 (2009): 57–63. http://dx.doi.org/10.31699/ijcpe.2009.3.8.

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The object of this work is to investigate the effect of the addition of methanol on the shelf life and color characteristics of novolak resin. Different percentages were added and two mechanisms were suggested for the addition. High ortho structure (1, 2-3) novolak resin was prepared and used in the above investigation. Experimental determination using FT-IR and UV-spectroscopy showed that on the addition of 30% of methanol and according to the second mechanism of addition novolak shelf life increased to 12 months without obvious decomposition and color change. It is suggested that methanol pl

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3

Patel, H. S., and K. G. Prabhu. "Modified Polyimides Based on Epoxy Resin, Part 1." Polymers and Polymer Composites 7, no. 7 (1999): 465–71. http://dx.doi.org/10.1177/0967391119990707465.

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A 2-furanyl imino derivative of a novolak epoxy resin (FNE) was prepaid 1 and characterised. The Diels-Alder polymerisation of FNE with various bismaleimides was carried out in solution as well as in bulk. The resultant novolak epoxy resin based polyimides were characterised by elemental analyses, 1R spectral studies, and thermogravimetry. The "in-situ" glass reinforced composites of FNE-bismaleimides were prepared and characterised by chemical resistance and mechanical properties.

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4

Li, Gai Yun, and Te Fu Qin. "Novolak Type Phenol Formaldehyde Resin from Waste Brown-Rotted Wood." Advanced Materials Research 217-218 (March 2011): 490–94. http://dx.doi.org/10.4028/www.scientific.net/amr.217-218.490.

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The waste brown-rotted wood was liquefied in phenol with phosphoric acid as a catalyst and the resulting liquefied products were condensed with formaldehyde to yield novolak liquefied wood-based phenol formaldehyde resin (LWF). The results showed that brown-rotted wood could be almost completely liquefied within 0.5 h at phenol to wood (P/W) ratio 2. An increase in P/W ratio from 2 to 3 slightly improved the flow property of LWF, but accompanied by decreasing the product yield from approximately 140 to 120 %. The increase of liquefaction time from 30 min to 60 min did not have a significant in

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5

Hawkins, E. G. E. "Degradation of novolak resins." Journal of Applied Chemistry 6, no. 4 (2007): 131–39. http://dx.doi.org/10.1002/jctb.5010060402.

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6

Shih, Hsiao-Yi, and Arnost Reiser. "Percolation View of Novolak Dissolution. 6. The Acceleration of Novolak Dissolution by Phenolic Additives." Macromolecules 30, no. 13 (1997): 3855–59. http://dx.doi.org/10.1021/ma9700800.

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7

Abbas, Rola Abdul Khader, Saleh Abdol Reza ALSaleh, and Asirae atiya Agil. "Study the effect of microbial factor on the qualities and characteristics of Novolak composite material, reinforced glass fibers / Asbestos fibers." Journal of Engineering 23, no. 5 (2017): 1–14. http://dx.doi.org/10.31026/j.eng.2017.05.11.

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The study was reflection of the impact of the widespread use of polymer Novolak composite reinforced Glass fiber and Asbestos fiber once again with weight fraction 60% on the physical properties, which included (Hardness, Compressive deformation, compressive modulus of elasticity, Flexural modulus of elasticity, Resilience modulus, the maximum of Flexural strength, Flexural strain energy and Shear strength inner layers); it is known how much important the media as a source of bacterial contamination, which contributes directly or indirectly in the process of aging of these materials. These Nov

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8

Wanat, Stanley F. "Novolak resins and the microelectronic revolution." Journal of Micro/Nanolithography, MEMS, and MOEMS 7, no. 3 (2008): 033008. http://dx.doi.org/10.1117/1.2968268.

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9

WANG, Xiuxun, Hiromu SAITO, and Takashi INOUE. "Miscibility of Polyoxymethylene with Novolak Resin." KOBUNSHI RONBUNSHU 48, no. 7 (1991): 443–47. http://dx.doi.org/10.1295/koron.48.443.

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10

Paniez, P., A. Schiltz, M. J. Bouzid, and E. Dechenaux. "Thermal flow properties of novolak polymers." Microelectronic Engineering 9, no. 1-4 (1989): 585–89. http://dx.doi.org/10.1016/0167-9317(89)90125-1.

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11

Bajdur, Wioletta M., and Wies?aw W. Su?kowski. "Polyelectrolytes from NS-novolak production waste." Journal of Applied Polymer Science 89, no. 11 (2003): 3000–3005. http://dx.doi.org/10.1002/app.12425.

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12

Yamagishi, Tada-Aki, Masahiro Nomoto, Shouhei Yamashita, Toshio Yamazaki, Yoshiaki Nakamoto, and Shin-ichiro Ishida. "Characterization of high molecular weight novolak." Macromolecular Chemistry and Physics 199, no. 3 (1998): 423–28. http://dx.doi.org/10.1002/(sici)1521-3935(19980301)199:3<423::aid-macp423>3.0.co;2-n.

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13

Reiser, Arnost. "The Molecular Mechanism of Novolak Resists." Journal of Imaging Science and Technology 42, no. 1 (1998): 15–22. http://dx.doi.org/10.2352/j.imagingsci.technol.1998.42.1.art00003.

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14

Horibe, Hideo. "Novolak Resist Removal Using Laser (266/532nm)." Journal of Photopolymer Science and Technology 18, no. 6 (2005): 665–71. http://dx.doi.org/10.2494/photopolymer.18.665.

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15

Huang, Jian Ping, T. K. Kwei, and Arnost Reiser. "The dissolution of novolak in aqueous alkali." Macromolecules 22, no. 10 (1989): 4106–12. http://dx.doi.org/10.1021/ma00200a051.

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16

Reiser, A., J. P. Huang, X. He, et al. "The molecular mechanism of novolak–diazonaphthoquinone resists." European Polymer Journal 38, no. 4 (2002): 619–29. http://dx.doi.org/10.1016/s0014-3057(01)00230-0.

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17

Paniez, P., and G. Amblard. "Commercial dyes for novolak based multilayer systems." Microelectronic Engineering 5, no. 1-4 (1986): 321–27. http://dx.doi.org/10.1016/0167-9317(86)90060-2.

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18

ZHENG, Hongfei, Zhihong LI, and Yumei ZHU. "Bismaleimide Modified by Allyl Novolak for Superabrasives." Chinese Journal of Chemical Engineering 15, no. 2 (2007): 302–4. http://dx.doi.org/10.1016/s1004-9541(07)60075-5.

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19

Mathurosemontri, Suchalinee, Kentaro Okuno, Yoichiro Ogura, Supaphorn Thumsorn, and Hiroyuki Hamada. "Investigation on Fracture Behavior of Glass Fiber Reinforced Thermoplstic and Thermosetting Composites." Key Engineering Materials 728 (January 2017): 235–39. http://dx.doi.org/10.4028/www.scientific.net/kem.728.235.

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Glass fiber reinforced thermoplastics and thermosetting composites were prepared in this study. Commercial grades of 20% glass fiber filled polypropylene, polyoxymethylene, polyamide 6 and polycarbonate were injection molded to dumbbell specimens. The specimens are referred as GF/PP, GF/POM, GF/PA and GF/PC, respectively. 55% GF reinforced novolak composites were fabricated by hand lay-up, which different curing times of 20 s, 35 s and 50 s. Mechanical properties, fracture behavior and morpgology of GF composites with and without notched were investigated. GF/PA showed the highest properties o

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20

Dante, Roberto, Roberto Dante, Andrea Sliepcevich, Marco Andreoni, Mario Cotilli, and Mario Cotilli. "Interference between Tin Sulfides, Graphite and Novolak Oxidation." SAE International Journal of Materials and Manufacturing 11, no. 1 (2017): 89–93. http://dx.doi.org/10.4271/05-11-01-0009.

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21

Cirino, Giuseppe Antonio, Ana Paula Mousinho, Ronaldo Domingues Mansano, Patrick Verdonck, Luiz Goncalves Neto, and Antonio Carlos Seabra. "Fabrication of Microlenses With a Novolak-type Polymer." Molecular Crystals and Liquid Crystals 374 (2002): 153–58. http://dx.doi.org/10.1080/713738256.

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22

Yoshimura, Toshiyuki, Naoko Asai, Hiroshi Shiraishi, Minoru Toriumi, and Shinji Okazaki. "Formation of Fractionated Novolak Resin Langmuir-Blodgett Films." Japanese Journal of Applied Physics 32, Part 2, No. 4B (1993): L631—L632. http://dx.doi.org/10.1143/jjap.32.l631.

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23

Yeh, Tung Feng, Hsiao Yi Shih, and Arnost Reiser. "Percolation view of novolak dissolution and dissolution inhibition." Macromolecules 25, no. 20 (1992): 5345–52. http://dx.doi.org/10.1021/ma00046a037.

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24

Kojima, Yoshikatsu, Yukinori Ochiai, and Shinji Matsui. "Focused Ion Beam Lithography Using Novolak-Based Resist." Japanese Journal of Applied Physics 27, Part 2, No. 9 (1988): L1780—L1782. http://dx.doi.org/10.1143/jjap.27.l1780.

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25

CIRINO, GIUSEPPE ANTONIO, ANA PAULA MOUSINHO, RONALDO DOMINGUES MANSANO, PATRICK VERDONCK, LUIZ GONçALVES NETO, and ANTONIO CARLOS SEABRA. "Fabrication of Microlenses With a Novolak-type Polymer." Molecular Crystals and Liquid Crystals 374, no. 1 (2002): 153–58. http://dx.doi.org/10.1080/10587250210432.

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26

Weill, A., E. Dechenaux, and P. Paniez. "Differential scanning calorimetry analysis of novolak-based photoresists." Microelectronic Engineering 4, no. 4 (1986): 285–96. http://dx.doi.org/10.1016/0167-9317(86)90019-5.

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27

Dössel, K. F., H. L. Huber, and H. Oertel. "Highly-sensitive novolak-based positive X-ray resist." Microelectronic Engineering 5, no. 1-4 (1986): 97–104. http://dx.doi.org/10.1016/0167-9317(86)90035-3.

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28

Chaker, M., S. Boily, H. Lafontaine, et al. "Laser plasma x-ray lithography using novolak resists." Microelectronic Engineering 11, no. 1-4 (1990): 313–16. http://dx.doi.org/10.1016/0167-9317(90)90121-9.

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29

Lingnau, J., R. Dammel, and J. Theis. "Highly sensitive novolak-based X-ray positive resist." Polymer Engineering and Science 29, no. 13 (1989): 874–77. http://dx.doi.org/10.1002/pen.760291309.

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30

Hanabata, Makoto, Fumio Oi, and Akihiro Furuta. "Novolak design concept for high performance positive photoresists." Polymer Engineering and Science 32, no. 20 (1992): 1494–99. http://dx.doi.org/10.1002/pen.760322009.

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31

Reiser, Arnost, Hsiao-Yi Shih, Tung-Feng Yeh, and Jian-Ping Huang. "Novolak-Diazochinon-Photoresiste: abbildende Systeme für den Computerchip." Angewandte Chemie 108, no. 21 (1996): 2610–22. http://dx.doi.org/10.1002/ange.19961082105.

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32

Simitzis, Johannis. "Composites von novolak-lignit zur herstellung von aktivkohle." Angewandte Makromolekulare Chemie 148, no. 1 (1987): 41–52. http://dx.doi.org/10.1002/apmc.1987.051480104.

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33

Lüders, Günter, Harald Goering, Martina Pohl, and Heinz Raubach. "Struktur und eigenschaften von simultanvernetzten bismaleimidmodifizierten novolak-epoxidharzen." Angewandte Makromolekulare Chemie 194, no. 1 (1992): 119–31. http://dx.doi.org/10.1002/apmc.1992.051940110.

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34

Samatadze, A. I., I. V. Parakhin, and A. S. Tumanov. "SOLID RESOL-NOVOLAK RESINS AND COMPOSITION ON THEIR BASED." Proceedings of VIAM, no. 9 (September 2014): 10. http://dx.doi.org/10.18577/2307-6046-2014-0-9-10-10.

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35

Nakano, Ritsuko, Minoru Hirose, Nobuaki Santoh, Kenji Nakagawa, and Kazumasa Shigematsu. "Effect of Low-Molecular-Weight Novolak Resin on Microgrooves." Japanese Journal of Applied Physics 30, Part 1, No. 11B (1991): 3121–24. http://dx.doi.org/10.1143/jjap.30.3121.

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36

Yeh, Tung-Feng, Jian Ping Huang, Arnost Reiser, Kenji Honda, Bernard T. Beauchemin, Jr., and Rodney J. Hurditch. "The interaction of novolak oligomers with hydrogen bond acceptors." Journal of Photopolymer Science and Technology 7, no. 1 (1994): 229–40. http://dx.doi.org/10.2494/photopolymer.7.229.

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37

Kozawa, Takahiro, Mitsuru Uesaka, Takeo Watanabe, Yoshio Yamashita, Yoichi Yoshida, and Seiichi Tagawa. "Radiation-induced reactions in novolak-based chemically amplified resists." Journal of Photopolymer Science and Technology 8, no. 1 (1995): 37–42. http://dx.doi.org/10.2494/photopolymer.8.37.

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38

HANABATA, Makoto, and Akihiro FURUTA. "Applications of high-ortho novolak resins to photoresist materials." KOBUNSHI RONBUNSHU 45, no. 10 (1988): 803–8. http://dx.doi.org/10.1295/koron.45.803.

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39

Reiser, Arnost, Zhenglin Yan, Yu-Kai Han, and Myoung Soo Kim. "Novolak–diazonaphthoquinone resists: The central role of phenolic strings." Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 18, no. 3 (2000): 1288. http://dx.doi.org/10.1116/1.591376.

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40

Bogan, Leonard E. "The novolak synthesis reaction: a description based on reactivities." Macromolecules 25, no. 7 (1992): 1966–69. http://dx.doi.org/10.1021/ma00033a021.

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41

Yamagishi, Tada-Aki, Masahiro Nomoto, Shingo Ito, Shin-ichiro Ishida, and Yoshiaki Nakamoto. "Preparation and characterization of high molecular weight novolak resins." Polymer Bulletin 32, no. 5-6 (1994): 501–7. http://dx.doi.org/10.1007/bf00973894.

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42

Shih, Hsiao-Yi, Tung-Feng Yeh, Arnost Reiser, Ralph R. Dammel, Hans J. Merrem, and Gerhard Pawlowski. "A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition." Macromolecules 27, no. 12 (1994): 3330–36. http://dx.doi.org/10.1021/ma00090a029.

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43

Jagdhold, U., and J. Pelka. "Passivation effects in novolak based resists during O2-RIE." Microelectronic Engineering 17, no. 1-4 (1992): 331–35. http://dx.doi.org/10.1016/0167-9317(92)90068-3.

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44

Böschel, Dorit, and Manfred Fedtke. "Zum reaktionsverhalten von resol- und novolak-modellen mit säureanhydriden." Angewandte Makromolekulare Chemie 220, no. 1 (1994): 163–76. http://dx.doi.org/10.1002/apmc.1994.052200114.

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45

Jones, T. T. "The melt-viscosity of some phenol-formaldehyde novolak resins." Journal of Applied Chemistry 2, no. 3 (2007): 134–49. http://dx.doi.org/10.1002/jctb.5010020306.

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46

Furuta, A., and M. Hanabata. "Novolak structures suitable for high resolution positive photoresists and application." Journal of Photopolymer Science and Technology 2, no. 3 (1989): 383–90. http://dx.doi.org/10.2494/photopolymer.2.383.

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47

Marakhovskii, K. M., V. S. Osipchik, D. N. Panova, E. A. Gorshkova, L. S. Bichevii, and P. A. Povernov. "Curing Kinetics of Epoxy—Novolak Binders Modified by DEG-1." Polymer Science, Series D 12, no. 3 (2019): 236–39. http://dx.doi.org/10.1134/s1995421219030146.

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48

HARA, Tetsuya, Goichi Ben, and Akiko HIRABAYASHI. "J0450101 Development of Novolak type phenol CFRP with plutrusion molding." Proceedings of Mechanical Engineering Congress, Japan 2015 (2015): _J0450101——_J0450101—. http://dx.doi.org/10.1299/jsmemecj.2015._j0450101-.

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49

Horibe, Hideo, Tomosumi Kamimura, Takashi Hata, et al. "Removal of Diazonaphthoquinone/Novolak Resist Using UV Laser (266 nm)." Polymer Journal 37, no. 11 (2005): 813–17. http://dx.doi.org/10.1295/polymj.37.813.

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50

Lee, Haiwon, Seok-Kyu Lee, and Byung-Sun Park. "Novolak Based Resists for X-ray and Electron Beam Lithography." Journal of Photopolymer Science and Technology 5, no. 1 (1992): 197–205. http://dx.doi.org/10.2494/photopolymer.5.197.

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