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Relevant bibliographies by topics / Offset lithography

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Academic literature on the topic 'Offset lithography'

Author: Grafiati

Published: 4 June 2021

Last updated: 30 July 2024

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Journal articles on the topic "Offset lithography"

1

HARREY, P. M., P. S. A. EVANS, B. J. RAMSEY, and D. J. HARRISON. "INTERDIGITATED CAPACITORS BY OFFSET LITHOGRAPHY." Journal of Electronics Manufacturing 10, no. 01 (March 2000): 69–77. http://dx.doi.org/10.1142/s096031310000006x.

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Evans, P. S. A., P. M. Harrey, B. J. Ramsey, and D. J. Harrison. "RF circulator structures via offset lithography." Electronics Letters 35, no. 19 (1999): 1634. http://dx.doi.org/10.1049/el:19991131.

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Sagu, Jagdeep S., Nicola York, Darren Southee, and K. G. U. Wijayantha. "Printed electrodes for flexible, light-weight solid-state supercapacitors – a feasibility study." Circuit World 41, no. 2 (May 5, 2015): 80–86. http://dx.doi.org/10.1108/cw-01-2015-0004.

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Purpose – The purpose of this paper is to report on the feasibility of the manufacture of printed rechargeable power sources incorporating, in the first instance, electrode structures from the previous study, and moving on to improved electrode structures fabricated, via flexographic printing, using commercially available inks. It has been shown previously that offset lithography, a common printing technique, can be used to make electrodes for energy storage devices such as primary cells. Design/methodology/approach – A pair of the original Ag/C electrodes, printed via offset lithography, were sandwiched together with a PVA-KOH gel electrolyte and then sealed. The resultant structures were characterised using electrochemical techniques and the performance as supercapacitors assessed. Following these studies, electrode structures of the same dimensions, consisting of two layers, a silver-based current collector covered with a high surface area carbon layer, were printed flexographically, using inks, on a melinex substrate. The characterisation and assessment of these structures, as supercapacitors, was determined. Findings – It was found that the supercapacitors constructed using the offset lithographic electrodes exhibited a capacitance of 0.72 mF/cm2 and had an equivalent series resistance of 3.96 Ω. The structures fabricated via flexography exhibited a capacitance of 4 mF/cm2 and had an equivalent series resistance of 1.25 Ω The supercapacitor structures were subjected to bending and rolling tests to determine device performance under deformation and stress. It was found that supercapacitor performance was not significantly reduced by bending or rolling. Originality/value – This paper provides insight into the use of printed silver/carbon electrodes within supercapacitor structures and compares the performance of devices fabricated using inks for offset lithographic printing presses and those made using commercially available inks for flexographic printing. The potential viability of such structures for low-end and cheap energy storage devices is demonstrated.

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Zhu, Hu, Xue Yong Jing, and Peng Zhang. "An Overview of STL Model Offset." Advanced Materials Research 542-543 (June 2012): 499–502. http://dx.doi.org/10.4028/www.scientific.net/amr.542-543.499.

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The offset models of STL (Stereo Lithography) are useful in many applications such as interference-free tool path generation in numerical control machining, hollow or shelled model generation in rapid prototyping. So the methods for STL model offset are very important. In the paper, an overview of the STL models offset methods is presented in brief.

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RAMSEY, B. J., P. S. A. EVANS, and D. HARRISON. "A NOVEL CIRCUIT FABRICATION TECHNIQUE USING OFFSET LITHOGRAPHY." Journal of Electronics Manufacturing 07, no. 01 (March 1997): 63–67. http://dx.doi.org/10.1142/s0960313197000075.

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Southee, D. J., G. I. Hay, P. S. Evans, and D. J. Harrison. "Flexible dot-matrix display manufacture by offset lithography." Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture 222, no. 8 (August 2008): 943–48. http://dx.doi.org/10.1243/09544054jem939.

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Rong, Xiaoying. "Quality Comparison of HP Indigo to Offset Lithography." NIP & Digital Fabrication Conference 25, no. 1 (January 1, 2009): 478–81. http://dx.doi.org/10.2352/issn.2169-4451.2009.25.1.art00022_2.

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Aroonsrimorakot, Sayam, and Chumporn Yuwaree. "Cleaner Technology Application in Printing Factory (Offset Lithography System)." APCBEE Procedia 5 (2013): 203–7. http://dx.doi.org/10.1016/j.apcbee.2013.05.036.

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Rong, Xiaoying. "Print Quality Comparison Between Kodak Prosper and Offset Lithography." NIP & Digital Fabrication Conference 26, no. 1 (January 1, 2010): 256–59. http://dx.doi.org/10.2352/issn.2169-4451.2010.26.1.art00069_1.

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Al aasar, Mohamed, Adel Hanafy, Aly Al Khafif, and Mona Abu Tabl. "Evolution of Using Color Guides in Offset Lithography Printing." International Design Journal 9, no. 3 (July 1, 2019): 29–36. http://dx.doi.org/10.21608/idj.2019.82720.

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Dissertations / Theses on the topic "Offset lithography"

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Sun, Kuang-Hua. "A study of mechanical dot gain for different dot shapes based on the border zone theory /." Online version of thesis, 1991. http://hdl.handle.net/1850/11209.

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Forti, Frank C. "Black & white continuous tone printing using multiple negative working plates, so that each plate prints an equal segment of a determined density range /." Online version of thesis, 1986. http://hdl.handle.net/1850/8746.

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Chhajlani, Vinay. "A model for non-image area of offset lithographic process /." Online version of thesis, 1988. http://hdl.handle.net/1850/10146.

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Vlachopoulos, Georgios. "Phenomena affecting ink transfer in offset lithographic printing." Thesis, Swansea University, 2010. https://cronfa.swan.ac.uk/Record/cronfa42395.

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The ink transfer mechanisms in the offset lithographic printing process is consisted by a complex inking roller train which a series of alternately rigid and deformable rollers, are used to precondition and deliver the printing fluid from the ink and fount reservoirs to the image carrier. The lithographic printing inks are complex formulated non-Newtonian fluids with high viscoelastic rheological profile and thixotropic behaviour. A set of ink dilutions was produced based on coldset lithographic printing ink diluted in concentration with Butyl-Diglycol. The rheological profile of the produced inks was examined by detailed rheological characterisation with particular interest on viscosity on tack, thixotropy, viscoelasticity, surface tension, extension and shear viscosity. Further examination established the relationships between shear viscosity and tack focusing on a printing nip between a rigid and elastic roller. A decrease in tack was found to be associated with a decrease in shear and the apparent extension viscosity. Developed imprinting and photographic techniques used to capture and characterise the fundamental phenomena of ribbing and misting associated with ink film splitting at the rollers nip in offset printing. Such techniques used to capture the dynamic profile of those mechanisms on a closed loop distribution system by using a tack meter. The detailed profile of those phenomena was characterised with particular interest on the relationship with the fluids rheological profile and the Capillary number. Extension rheometer was also used to analyse the mechanisms of ribbing and misting phenomena by experimental simulation of a printing nip. A factorial experiment was undertaken based on LI8 Orthogonal Array techniques. The parameters of rollers ratio, ink film thickness, temperature, distribution speed, distribution time and inks viscosity were found to have an influence on misting and ribbing phenomena. Results and analysis established responses and interactions between the process parameters but also between ribbing and misting as essential phenomena with the ink transfer mechanisms in lithographic printing process.

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Smith, Curtis L. "Analysis of color variation during four-color offset lithographic press runs by monitoring changes in three-filter density values of overprint tints /." Online version of thesis, 1990. http://hdl.handle.net/1850/11531.

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Dailey, David Gordon. "A study of the effect of ink viscosity on dot gain in offset lithography /." Online version of thesis, 1985. http://hdl.handle.net/1850/10319.

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Mudge, James B. "A study of the effect of lithographic press speed on dot gain /." Online version of thesis, 1991. http://hdl.handle.net/1850/11149.

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Folkes, Noelle Lara. "A study of the Epic Delta dampening system's ability to eliminate plate-caused hickeys /." Online version of thesis, 1995. http://hdl.handle.net/1850/12248.

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Voutsas, Alexander M. "The effects of blanket tension and squeeze pressure on slur and doubling using conventional and compressible blankets in sheeted offset lithography /." Online version of thesis, 1991. http://hdl.handle.net/1850/11263.

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Oliver, Garth R. "Apparent quality of alternative halftone screening when compared to conventional screening in commercial offset lithography." Connect to this title online, 2007. http://etd.lib.clemson.edu/documents/1202500492/.

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Books on the topic "Offset lithography"

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Tritton, Kelvin. The printing processes: Offset lithography. 3rd ed. Leatherhead: Pira International, 1994.

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Hird, Kenneth F. Offset lithographic technology. South Holland, Ill: Goodheart-Willcox, 1991.

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Moss, P. Buckley. P. Buckley Moss: Offset lithographs. [S.l.]: P.B. Moss, 1986.

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Durrant, Bob. Developments in web offset: A literature review. Leatherhead: Pira International, 1993.

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Faux, Ian. Litho printing. London: Blueprint, 1987.

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Knudsen, Vibeke. Offset i Dansk billedkunst: Fra gennembruddet sidst i 60'erne og de følgende år. København: Statens museum for kunst, 1985.

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Moss, P. Buckley. P Buckley Moss. Washington. D.C. (1055 Thomas Jefferson St., N.W., Washington 20007): P.B. Moss., 1987.

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Keif, Malcolm G. Color stripping: A guide for process color image assembly. San Luis Obispo, Calif: Graphic Services+Seminars, 1992.

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United States. Environmental Protection Agency. Office of Air Quality Planning and Standards and United States. Environmental Protection Agency. Emission Standards Division. Chemicals and Petroleum Branch, eds. Control of volatile organic compound emissions from offset lithographic printing: Draft. Research Triangle Park, N.C: U.S. Environmental Protection Agency, Office of Air Quality Planning and Standards, 1993.

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Dennis, Ervin A. Lithographic technology in transition. Albany, N.Y: Delmar Publishers, 1996.

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Book chapters on the topic "Offset lithography"

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Masod, Muhammad Yusuf, Ridzuan Ahmad, and Mahadzir Mohamad. "A Survey of Offset Lithography Print Defects." In Proceedings of the International Symposium on Research of Arts, Design and Humanities (ISRADH 2014), 489–97. Singapore: Springer Singapore, 2015. http://dx.doi.org/10.1007/978-981-287-530-3_50.

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"Offset Lithography." In The Visual Dictionary of Pre-Press & Production, 177. AVA Publishing SA, 2010. http://dx.doi.org/10.5040/9781474293747.0161.

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Adams Stein, Jesse. "The continuity of craft masculinities: from letterpress to offset-lithography." In Hot Metal. Manchester University Press, 2016. http://dx.doi.org/10.7228/manchester/9781784994341.003.0004.

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This chapter considers the effect that an autonomous technical artefact – the printing press – had on the workers in charge of them, the press-machinists. It establishes how the printing press possesses material and social agency in the continuity and transformation of craft masculinity. This issue is examined in the context of the technological shift from letterpress printing to high-speed offset-lithography, which took place chiefly in the 1970s. While the compositors’ experience of technological change has received some attention in labour history and sociology, the trade of press-machining has been almost entirely ignored. Charting the printing industry’s transition from letterpress to offset-lithography opens a new window of understanding into the relevance and influence of large-scale technical machinery on the shop floor. This is related back to the reinforcement of craft masculinities in declining industrial contexts. This allows us to see how particular practices and identities are sometimes maintained and reinvigorated when a conservative institution is threatened with change.

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Greenhalgh, Charlotte. "Games with Time." In Aging in Twentieth-Century Britain, 133–55. University of California Press, 2018. http://dx.doi.org/10.1525/california/9780520298781.003.0006.

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Postwar social changes ranging from slum clearances to full employment sparked public interest in working-class lives during the first half of the twentieth century. From the late 1950s, technical developments including lithography and offset printing lowered the cost of printing and increased its speed. Community presses published newly diverse autobiographies. Older authors described youthful scenes that were set in the distant past and parsed social changes that had occurred over half a century or more. Many among them knew that memories were unreliable but found that the past constantly intruded on the present. Later life delivered new perspectives on childhoods that featured deprivation and violence as well as joy, and elderly autobiographers were quick to celebrate the achievements of the present.

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Sundararajan, P. R., and Mostofa Kamal Khan. "Poly(vinyl butyral)." In Polymer Data Handbook, 1130–41. Oxford University PressNew York, NY, 2009. http://dx.doi.org/10.1093/oso/9780195181012.003.0196.

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Abstract Major Applications The significant use is in lamination of safety glass (automotive windshields). Others are structural adhesives, binders for rocket propellants, ceramics, in metallized brake linings, lithographic and offset printing plates, magnetic tapes, powder coatings; binder matrix in photoactive, elecrooptic and electronic devices, protective coatings for glass, metal, wood, and ceramics; in wash primers for protecting metal surfaces (e.g., naval vessels); adhesion promoter in inks; dispersions used in textile industry to improve abrasion resistance and reduce color crocking.

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Greco, Albert N. "The Changing World of Scholarly Books." In The Business of Scholarly Publishing, 141–70. Oxford University Press, 2020. http://dx.doi.org/10.1093/oso/9780190626235.003.0005.

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Digital scholarly book technologies, especially print-on-demand (POD), directly impacted authors, readers, libraries, and publishers. It was possible to significantly reduce traditional lithographic (often called litho, offset, or photo-offset) print runs and rely on small runs, which were more likely to be sold, and then utilize POD for additional sales. This chapter addresses the impact of technological changes on print and digital scholarly books, including patron-driven access, and the impact on academic library collection development and electronic reserves. Attention is paid to the movement for open access scholarly books, libraries publishing academic books, and the growing threats and costs of book piracy to publishers, including Sci-Hub. Scholarly book revenues are presented and discussed.

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Tabatabaei, Maryam, and Satya N. Atluri. "Novel and Efficient Mathematical and Computational Methods for the Analysis and Architecting of Ultralight Cellular Materials and their Macrostructural Responses." In Advances in Computers and Information in Engineering Research, Volume 2, 199–246. ASME, 2021. http://dx.doi.org/10.1115/1.862025_ch7.

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Nature benefits from high stiffness and strength low-weight materials by involving architected cellular structures. For example, trabecular bone, beaks and bones of birds, plant parenchyma, and sponge optimize superior mechanical properties at low density by implementing a highly porous, complex architected cellular core [25]. The same engineering and architectural principles at the material scale have been used by humankind to develop materials with higher mechanical efficiency and lower mass in many weight-critical applications. The emergence of advanced manufacturing technologies such as additive manufacturing and three-dimensional (3D) laser lithography offer the opportunity to fabricate ultralight metallic and composite materials with intricate cellular architecture to location-specific requirements. For example, the world’s lightest metal [26,32], Fig. 7.1, and reversibly assembled ultralight carbon-fiber-reinforced composite materials [4], Fig. 7.2, with architected cellular structures have been recently fabricated at Hughes Research Laboratories (HRL) in California and MIT Media Lab-Center for Bits and Atoms, respectively.

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Kehinde Femi, Olaseinde. "Unveiling the Fourth Fundamental Circuit Element and Its Real-World Applications." In Memristors - The Fourth Fundamental Circuit Element - Theory, Device, and Applications. IntechOpen, 2024. http://dx.doi.org/10.5772/intechopen.1002330.

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Memristors are a type of electronic circuit element that was first proposed in the early 1970s. Unlike traditional circuit elements such as resistors, capacitors, and inductors, memristors has last memory and can therefore be used to store information. They were initially considered a theoretical concept, but recent advances in nanotechnology have made it possible to create physical memristor devices and apply it in various aspect of life. Memristors are considered the fourth fundamental circuit element, alongside resistors, capacitors, and inductors. They have unique properties, such as the ability to store information in their resistance state, which makes them promising candidates for future computing systems. Memristors have been integrated into crossbar arrays, which allow for massively parallel computing with low power consumption. Memristor fabrication methods vary based on the materials used and the intended application. Thin-film deposition, nanoimprint lithography, and self-assembly processes are common techniques. The performance properties of the memristor, such as switching speed, endurance, and scalability, are influenced by the material selection, such as polymers or transition metal oxides. Memristors have a wide range of potential applications, including in the development of artificial intelligence and neural networks. They can also be used in memory devices, logic circuits, and sensor applications. Research is ongoing to further explore the unique properties of this lovely device and to develop various applications for it. The unique properties of memristors have also sparked interest in unconventional computing paradigms. Memristor-based systems have shown potential for implementing neural networks, cellular automata, and even analog computers, providing alternative approaches to solving complex computational problems. Memristor-based logic and arithmetic units offer advantages in terms of power efficiency and density compared to traditional transistor-based designs. This project shows the progress made in memristor technology, including the development of various memristive materials and device architectures. It explores the challenges associated with memristor fabrication, reliability, and scalability. Moreover, the paper highlights recent advancements in memristor-based applications, such as in-memory computing, deep learning accelerators, and brain-inspired computing systems. This piece provides an overview of the theory behind memristors, including their mathematical models and properties. It also discusses the different types of memristor devices that have been developed and their potential applications. Finally, it highlights some of the challenges and future directions in the field of memristor research.

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Matore, Daniel. "Olson Among the Letterers." In The Graphics of Verse, 142–207. Oxford University PressOxford, 2023. http://dx.doi.org/10.1093/oso/9780192857217.003.0004.

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Abstract The third chapter is concerned with the seminal experiments of Charles Olson, a key transitional figure between early modernism and postwar poetry. The first section, ‘The New Ear, Breath Stops, and the Beats’, argues that the breath poetics of ‘Projective Verse’ for which Olson has become famous are supplanted by the labour of typography when he writes The Maximus Poems. In ‘“A full graphics-knowing man”: Black Mountain College and Ben Shahn’s Print Shop’, I argue that Olson conceives of mid-century America as mired in the advertising culture’s graphical malaise; with lithographer Ben Shahn, he envisages Black Mountain College as a centre of typographical resistance and re-education. Olson also becomes preoccupied with the poet’s interactions with the typographer and the printer. In ‘The Poet and the Typographer: Frances Motz Boldereff, David Jones, and the Labour of Verse’, I argue that this question of poetics comes to life in Olson’s relationship with the typographer Frances Motz Boldereff. Measuring space is figured as an art of verse, which is manifested in Olson’s drafting and compositional practices. Olson begins to conceive of typography as key to the work of poetry. His critique of discourse and Aristotelian logic convinces him that language needs to be spatialized, I argue in ‘“Metric then is mapping”: Olson, Prynne, and the Language of Space’. Through his correspondence with J. H. Prynne, Olson formulates the grammar of a spatial language. Typographical calculations, though, rather than the syntactical complexities formulated with Prynne, form the spatial language of The Maximus Poems. In the final section, ‘Literal, real realty: Typography, Topology and Property’, I claim that Olson’s later verse and essays rewrite poetics in metaphysical terms modelled after the philosophy of Alfred North Whitehead. I argue that territory and ownership is critiqued through the typography of Olson’s poetry. Experimental typography, I conclude, is how Olson attempts to offer a true map of the world, apprised of buried geology and history.

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Conference papers on the topic "Offset lithography"

1

Lin, Chia Ching, En Chuan Lio, Chang Mao Wang, Howard Chen, Sho Shen Lee, Henry Hsing, Kince Liu, and Nuriel Amir. "LELE CD bias offset monitor through OVL measurement." In SPIE Advanced Lithography, edited by Luigi Capodieci and Jason P. Cain. SPIE, 2016. http://dx.doi.org/10.1117/12.2219509.

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Wang, Wenhui, Liping Cui, Lei Sun, and Ryoung-Han Kim. "Mean offset optimization for multi-patterning overlay using Monte Carlo simulation method." In SPIE Advanced Lithography, edited by Jason P. Cain and Martha I. Sanchez. SPIE, 2014. http://dx.doi.org/10.1117/12.2046580.

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Zhou, Jianming, Sarah Wu, Craig Hickman, Ewoud van West, Maurits van der Schaar, Wangshi Zhou, Youping Zhang, et al. "Eliminating the offset between overlay metrology and device patterns using computational metrology target design." In SPIE Advanced Lithography, edited by Martha I. Sanchez and Vladimir A. Ukraintsev. SPIE, 2016. http://dx.doi.org/10.1117/12.2219439.

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Harrey, P. M., P. S. A. Evans, B. J. Ramsey, and D. Harrison. "A novel manufacturing process for capacitors using offset lithography." In Proceedings First International Symposium on Environmentally Conscious Design and Inverse Manufacturing. IEEE, 1999. http://dx.doi.org/10.1109/ecodim.1999.747726.

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Newman, Brian E. "Development of Free-Electron Laser Sources for XUV Projection Lithography." In OSA Annual Meeting. Washington, D.C.: Optica Publishing Group, 1990. http://dx.doi.org/10.1364/oam.1990.wy2.

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Future rf-linac-driven free-electron lasers (FELs), operating in the extreme-ultraviolet (XUV) range from 4 nm to 100 nm, could be excellent exposure tools for extending the resolution limit of projection optical lithography to ≤0.1 µm and with adequate total depth of focus (1 to 2 µm). The capability of such FELs to produce relatively high-average power at a tunable wavelength with selectable spectral bandwidth will enable these lasers to offset the inherently low throughput of the XUV projection optics which will have about five reflections at ≤50% each. When operated at a moderate duty rate of ≥1%, one XUV FEL should be able to supply sufficient average power to support high-volume chip production for multiple lithographic steppers operating simultaneously. In this multiplexed arrangement, the FEL photon-source cost per wafer level Is projected to be lower than proposed alternatives. Recent progress in attaining a very bright electron beam, short-period magnetic undulator, and high-reflectance resonator mirrors are described which make feasible a near-term demonstration of FEL operation below 100 nm.

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Song, Zhichao, Jaejong Lee, and Sunggook Park. "Finite Element Analysis for Demolding Process in Thermal Imprint Lithography." In ASME 2007 International Mechanical Engineering Congress and Exposition. ASMEDC, 2007. http://dx.doi.org/10.1115/imece2007-43699.

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In thermal imprint lithography, most of the imprint failures occur during demolding, a process to separate the mold insert from the substrate after conformal molding. The success of demolding is determined by the stress generated in the resist with respect to the yield stress of the resist. In this paper we simulated the demolding process in thermal imprint lithography using the finite element method to study the stress distribution and deformation in poly(methyl methacrylate) (PMMA) resist during demolding. During demolding, the stress concentrates both at the transition corner zone between the residual layer and the replicated pattern, and close to the contact region with the moving stamp. As demolding proceeds, the highest local stress for both locations shows two maximums, indicating that a structural failure may occur not only when demolding starts, but also immediately before demolding ends. The structural failure at the second maximum becomes dominant as the angular offset from the ideal normal demolding to the substrate surface increases or for the structures located far away from the symmetric centerline. In addition, we will discuss the influence of other process and geometry parameters, including demolding rate and stamp aspect ratio.

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Wettergreen, M., J. Scheffe, A. G. Mikos, and M. A. K. Liebschner. "Micro-Particle Fabrication for Tissue Engineering Applications Using Rapid Prototyping and Soft Lithography Principles." In ASME 2005 International Mechanical Engineering Congress and Exposition. ASMEDC, 2005. http://dx.doi.org/10.1115/imece2005-81990.

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The goal of this study was to develop an efficient and repeatable process for fabrication of micro-particles from multiple materials using rapid prototyping and soft lithography. Phase change three-dimensional printing was used to create masters for PDMS molds. A photocrosslinkable polymer was then delivered into these molds to fabricate geometrically complex three-dimensional micro-particles. This repeatable process has demonstrated the ability to generate micro-particles with greater than 95% repeatability with complete pattern transfer. This process was illustrated for three shapes based on the extrusion of two-dimensional shapes. These particles will allow for tailoring of the pore shapes within a porous scaffold utilized in tissue engineering applications. In addition, the different shapes may allow control of drug release by varying the surface to volume ratio, which could modulate drug delivery. While soft lithography is currently used with photolithography, its high precision is offset by high cost of production. The employment of rapid prototyping to a specific resolution offers a much less expensive alternative with increased throughput due to the speed of current rapid prototyping systems.

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Wallace, Christine, Brian Martin, and Graham G. Arthur. "Pitch-dependent intrafield dimensional offsets in advanced lithography." In Microlithography 2000, edited by Neal T. Sullivan. SPIE, 2000. http://dx.doi.org/10.1117/12.386519.

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Hudika, Tomislav, Tomislav Cigula, Filip Golub, and Gabriela Aleksić. "Lightfastness of lithographic primary colours coated with nanocomposites composed of tio2 and water-based varnish." In 11th International Symposium on Graphic Engineering and Design. University of Novi Sad, Faculty of technical sciences, Department of graphic engineering and design, 2022. http://dx.doi.org/10.24867/grid-2022-p15.

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The UV radiation causes inks to fade. The ink fading will lead to the degradation of the visual appearance of printed imprints making them less attractive to the user. To deal with this that phenomenon, one of the solutions is to create a coating that could challenge these issues. In order to create efficient protective coating against UV induced degradation, nano scaled titanium dioxide (TiO2) wasl added to the commercial water-based varnish. To determine influence of the amount of TiO2, was homogenized in various weight ratios. The prepared nanocomposites were applied onto offset (lithography) prints made in accordance with Fogra PSO, i.e. ISO 12647-2:2013 on gloss coated paperboard. The samples have been subjected to artificial UV induced aging for 30 hours. The protective properties of the nanocomposite TiO2 coating was determined by calculating colorimetric and densitometric change on full tone and determining tone value change of half tones. The results showed that the prepared nanocomposite coating has relatively little effect on the printed colour of the samples. However, some coating compositions exceed the allowed tolerance ΔEab> 5, however in those cases the initial colorimetric value of WB (ΔEab) was close to the FOGRA PSO border value. The coatings with TiO2 will increase resistance to accelerated ageing on full and halftone. To conclude, this research has provided the new perspective on modulation possibilities of commercially available varnishes in order to cope a designated problematics and downsides of coatings which was, in this case, UV induced fading and degradation of visual appearance. The further research should investigate the applicability of this kind of modulated varnish in other coating techniques as well the use of other kind of nano sized compounds.

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10

Nguyen, K. B., A. MacDowell, K. Fujii, D. M. Tennant, and L. A. Fetter. "At-wavelength inspection of EUVL mask defects with a 1X Offner ring-field system." In Extreme Ultraviolet Lithography. Washington, D.C.: Optica Publishing Group, 1996. http://dx.doi.org/10.1364/eul.1996.r49.

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Abstract:

At-wavelength inspection of EUV masks containing programmed defects was performed with an EUV 1X Offner ring-field system. At-wavelength inspection was sensitive to thin substrate defects. The sensitivity of the detection was limited by the resolution of the imaging system. At-wavelength inspection also revealed defects that are not detectable by other inspection techniques.

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Reports on the topic "Offset lithography"

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Griffiths, Stewart K. Fundamental limitations of LIGA x-ray lithography : sidewall offset, slope and minimum feature size. Office of Scientific and Technical Information (OSTI), January 2004. http://dx.doi.org/10.2172/918215.

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