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1

HARREY, P. M., P. S. A. EVANS, B. J. RAMSEY, and D. J. HARRISON. "INTERDIGITATED CAPACITORS BY OFFSET LITHOGRAPHY." Journal of Electronics Manufacturing 10, no. 01 (March 2000): 69–77. http://dx.doi.org/10.1142/s096031310000006x.

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Evans, P. S. A., P. M. Harrey, B. J. Ramsey, and D. J. Harrison. "RF circulator structures via offset lithography." Electronics Letters 35, no. 19 (1999): 1634. http://dx.doi.org/10.1049/el:19991131.

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3

Sagu, Jagdeep S., Nicola York, Darren Southee, and K. G. U. Wijayantha. "Printed electrodes for flexible, light-weight solid-state supercapacitors – a feasibility study." Circuit World 41, no. 2 (May 5, 2015): 80–86. http://dx.doi.org/10.1108/cw-01-2015-0004.

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Purpose – The purpose of this paper is to report on the feasibility of the manufacture of printed rechargeable power sources incorporating, in the first instance, electrode structures from the previous study, and moving on to improved electrode structures fabricated, via flexographic printing, using commercially available inks. It has been shown previously that offset lithography, a common printing technique, can be used to make electrodes for energy storage devices such as primary cells. Design/methodology/approach – A pair of the original Ag/C electrodes, printed via offset lithography, were sandwiched together with a PVA-KOH gel electrolyte and then sealed. The resultant structures were characterised using electrochemical techniques and the performance as supercapacitors assessed. Following these studies, electrode structures of the same dimensions, consisting of two layers, a silver-based current collector covered with a high surface area carbon layer, were printed flexographically, using inks, on a melinex substrate. The characterisation and assessment of these structures, as supercapacitors, was determined. Findings – It was found that the supercapacitors constructed using the offset lithographic electrodes exhibited a capacitance of 0.72 mF/cm2 and had an equivalent series resistance of 3.96 Ω. The structures fabricated via flexography exhibited a capacitance of 4 mF/cm2 and had an equivalent series resistance of 1.25 Ω The supercapacitor structures were subjected to bending and rolling tests to determine device performance under deformation and stress. It was found that supercapacitor performance was not significantly reduced by bending or rolling. Originality/value – This paper provides insight into the use of printed silver/carbon electrodes within supercapacitor structures and compares the performance of devices fabricated using inks for offset lithographic printing presses and those made using commercially available inks for flexographic printing. The potential viability of such structures for low-end and cheap energy storage devices is demonstrated.
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4

Zhu, Hu, Xue Yong Jing, and Peng Zhang. "An Overview of STL Model Offset." Advanced Materials Research 542-543 (June 2012): 499–502. http://dx.doi.org/10.4028/www.scientific.net/amr.542-543.499.

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The offset models of STL (Stereo Lithography) are useful in many applications such as interference-free tool path generation in numerical control machining, hollow or shelled model generation in rapid prototyping. So the methods for STL model offset are very important. In the paper, an overview of the STL models offset methods is presented in brief.
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RAMSEY, B. J., P. S. A. EVANS, and D. HARRISON. "A NOVEL CIRCUIT FABRICATION TECHNIQUE USING OFFSET LITHOGRAPHY." Journal of Electronics Manufacturing 07, no. 01 (March 1997): 63–67. http://dx.doi.org/10.1142/s0960313197000075.

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Southee, D. J., G. I. Hay, P. S. Evans, and D. J. Harrison. "Flexible dot-matrix display manufacture by offset lithography." Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture 222, no. 8 (August 2008): 943–48. http://dx.doi.org/10.1243/09544054jem939.

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Rong, Xiaoying. "Quality Comparison of HP Indigo to Offset Lithography." NIP & Digital Fabrication Conference 25, no. 1 (January 1, 2009): 478–81. http://dx.doi.org/10.2352/issn.2169-4451.2009.25.1.art00022_2.

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8

Aroonsrimorakot, Sayam, and Chumporn Yuwaree. "Cleaner Technology Application in Printing Factory (Offset Lithography System)." APCBEE Procedia 5 (2013): 203–7. http://dx.doi.org/10.1016/j.apcbee.2013.05.036.

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Rong, Xiaoying. "Print Quality Comparison Between Kodak Prosper and Offset Lithography." NIP & Digital Fabrication Conference 26, no. 1 (January 1, 2010): 256–59. http://dx.doi.org/10.2352/issn.2169-4451.2010.26.1.art00069_1.

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10

Al aasar, Mohamed, Adel Hanafy, Aly Al Khafif, and Mona Abu Tabl. "Evolution of Using Color Guides in Offset Lithography Printing." International Design Journal 9, no. 3 (July 1, 2019): 29–36. http://dx.doi.org/10.21608/idj.2019.82720.

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11

Adeyeye, Noah Adegoke, Sunday Roberts Ogunduyile, and Ebenezer Bankole Oladumiye. "Technological Development Trends and Adoption by Offset Lithography Printers in South West Nigeria." Volume 5 - 2020, Issue 9 - September 5, no. 9 (September 20, 2020): 327–36. http://dx.doi.org/10.38124/ijisrt20sep192.

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The sequence in the improvement drive in any discipline is a vital concern. This has become a mindset to printing practitioners. The special consideration accorded some brands of machine is as a result of peculiarities in terms of suitability, affordability, maintenance capability, ease of operation, durability among others. The excitement for better means of achieving printing goals has always prompted manufacturers to develop successive equipment to enhance offset printing practitioners in their daily activities. The aim of the study is to trace, identify and examine the brands of machine in use, and their impact on the practice of offset printing in South West Nigeria with a view to encouraging practitioners for better productivity and sustainability. The objectives of the study are to trace the trends in the technological development of offset printing in the offset printing industry, Identify brands of machines adopted in South West Nigeria, and examine reasons for the use of such brands. The sample size for each study area was selected at random from registered offset lithography printing establishments as follow: Somolu-274, Akure36 and Ibadan-192. Both primary and secondary data were employed. Survey Design was adopted and the data were gathered through structured questionnaire and subjected to both descriptive and inferential statistical tools for analysis. Findings from the study revealed that there were developments in both quantitative and qualitative aspects in the industry. From the quantitative aspect, the acquisition of additional machines, offices/buildings and staff were always on the increase, despite the use of old machines and reliance on on-the-job training of operators. From the qualitative aspect, the hypothesis postulated was tested using chi-square to test significant relationship. The analysis showed that the null-hypothesis was rejected in favor of the alternate hypothesis, implying that although developments were remarkable, it would have been more pronounced if not for the impact of the high significant relationship between the variables as indicated by x2 (4) = 144.289, p = 0.000. The study also revealed that old technology machines are durable, easy to manipulate and maintain, cost effective and affordable. Furthermore, spare parts are always available, operators with little education rely mostly on apprenticeship/on-the-job training. However, lack of surplus fund hindered the procurement of new machines. Some offset printers only adopted digital process as complementary for short runs and print-ondemand purposes, while some held the belief that digital machines are not as durable as offset printing machines. Since new offset machines are costly and not conveniently affordable to printing firms, the study recommended that two, three or more offset firms can embark on collaborative efforts for the procurement of new machines that would enhance better performance in productivity and profitability.
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Noraisyah Hafizan Sabturo and Siti Amira Othman. "Preparation and Characterisation of Irradiated Beans Ink for Offset Lithography Printing." Journal of Advanced Research in Fluid Mechanics and Thermal Sciences 93, no. 1 (March 25, 2022): 167–85. http://dx.doi.org/10.37934/arfmts.93.1.167185.

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Petroleum-based ink has been widely used around the world, especially in the offset of the lithography printing industry. However, it has negative consequences on the environment as well as the workers who are engaged with it. It includes volatile organic compounds (VOCs), which have a high vapor pressure at room temperature, such as toluene (C7H8). Peanut oil was used in this study to create an offset lithography ink. The objectives of this study are to investigate the physical and chemical properties of peanut beans, to study the effect on peanut oil during the pre- and post-irradiation, and to determine the appropriateness of ink to replace the use of petroleum-based ink. The preparation and characterization of this vegetable-based ink were then used to investigate its capability of becoming a good quality ink that does not bring harm to the consumer after being irradiated with gamma rays. About 15 ml of peanut oil was heated and mixed continuously with 1.5 g of 99% sodium hydroxide (NaOH) pellets for 30 min at a temperature of 133°C, to go through an alkali-refined process. The sieved solution was then added to 1 g of 99% butylated hydroxytoluene (BHT) powder, 1.5 g of 100% activated carbon, and 1 g of Arabic gum powder for 20 min, under the same temperature. After being irradiated, the intensities and viscosities of ink increased, compared to before it was irradiated by gamma rays. In the future, the concept of developing ink from vegetable oil has given rise to the concept of developing ink from peanut oil. This sort of ink was appropriate for usage in the offset lithography printing industry. The industry necessitated a greater use of ink for the manufacture of the majority of items we see today, such as newspapers, novels, comic books and magazines. It is far less expensive, and does not emit VOCs into the environment, which will have a negative consequence on a global scale.
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Janku, Andrea. "Gutenberg in Shanghai. Chinese Print Capitalism, 1876–1937. By Christopher A. Reed. [Vancouver, Toronto: University of British Columbia Press, 2004. xvii, 391 pp. ISBN 1206-9523.]." China Quarterly 182 (June 2005): 443–45. http://dx.doi.org/10.1017/s0305741005290264.

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Gutenberg in Shanghai is a book about the industrial revolution in China's print culture and the ensuing rise of print capitalism ‘with Chinese characteristics.’ It offers a coherent and unique account of the introduction, adaptation and eventual imitation of modern, i.e. Western, print technology in China, with the aim of establishing the material basis on which to study the transition of China's ancient literary culture into the industrial age. It reconstructs the history of print technology from the first cast type matrices to the adaptation of the electrotype process, from photo-lithography to the colour-offset press, from the platen press to the rotary printing press, and tells the stories of three of the most dominant lithograph and letterpress publishers of the late Qing and the early Republican period respectively. This is a worthwhile undertaking, exploring an aspect of modern publishing in China, which hitherto has not received the attention it deserves. The study is based on missionary writings, personal reminiscences, collections of source materials, documents on the early book printers' trade organizations from the Shanghai Municipal Archives, and oral history materials (interviews conducted during the 1950s with former printing workshops apprentices). The bibliography also lists a couple of interviews, but unfortunately it is not clear how relevant they are to the story told in the book.The introduction of lithography into Shanghai by Jesuit missionaries in 1876 plays a pivotal role in this account. Lithography, especially photolithography coming a few years later, was a technology particularly suited to Chinese needs and cheaper than traditional wood-block printing.
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14

Herrero, Rakel, Maite Aresti, María Lasheras, Itziar Landa, Juncal Estella, and Saioa Los Arcos. "New Developments in Printed Electronics using Offset Lithography on Paper Substrates." NIP & Digital Fabrication Conference 2018, no. 1 (September 23, 2018): 82–86. http://dx.doi.org/10.2352/issn.2169-4451.2018.34.82.

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15

Yuan, Liang (Leon), and Peter R. Herman. "Layered nano-gratings by electron beam writing to form 3-level diffractive optical elements for 3D phase-offset holographic lithography." Nanoscale 7, no. 47 (2015): 19905–13. http://dx.doi.org/10.1039/c5nr06822c.

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16

Dobronravin, Nikolai. "Design Elements and Illuminations in Nigerian “Market Literature” in Arabic and ʿAjamī." Islamic Africa 8, no. 1-2 (October 17, 2017): 43–69. http://dx.doi.org/10.1163/21540993-00801001.

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“Market literature” in Arabic and ʿAjamī is a particular variety of West African Islamic book culture, which is especially strong in northern Nigerian states. Arabic-script “Nithography” (by analogy to Nollywood, the modern Nigerian film industry) represents a unique phenomenon, although it is reminiscent of the nineteenth-century Islamic lithography in the Middle East. Nigerian “market literature” in Arabic and ʿAjamī has mostly followed the pre-colonial manuscript tradition of Central Sudanic Africa, including writing styles, colophons and glosses. In contrast to Middle Eastern book culture, Nigerian typeset printing largely preceded the era of offset. The innovative elements of offset book design in Nigeria and further perspectives of “Nithography” in Arabic and ʿAjamī are discussed.
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17

Ataeefard, Maryam, and Fereshteh Mirjalili. "Using mechanical technique for preparing antibacterial offset lithography ink with ZnO nanoparticles." Composites Part B: Engineering 51 (August 2013): 92–97. http://dx.doi.org/10.1016/j.compositesb.2013.03.001.

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18

Stein, Jesse Adams. "Masculinity and Material Culture in Technological Transitions: From Letterpress to Offset Lithography, 1960s–1980s." Technology and Culture 57, no. 1 (2016): 24–53. http://dx.doi.org/10.1353/tech.2016.0010.

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19

Griffiths, Stewart K. "Fundamental limitations of LIGA x-ray lithography: sidewall offset, slope and minimum feature size." Journal of Micromechanics and Microengineering 14, no. 7 (May 21, 2004): 999–1011. http://dx.doi.org/10.1088/0960-1317/14/7/022.

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20

Kapović, Dominik, Mirela Rožić, Marina Vukoje, and Branka Lozo. "Ink tack stability readings of the offset thermochromic inks." Pigment & Resin Technology 48, no. 4 (July 1, 2019): 309–16. http://dx.doi.org/10.1108/prt-07-2018-0064.

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Purpose This paper aims to analyse the tack stability measurement readings of thermochromic offset inks. For this purpose, three reversible leuco-dye formed thermochromic inks were used to evaluate their tack. The used inks differ in their activation temperature, colour, drying mechanism, viscosity and chemical content. Thermochromic offset inks differ from conventional inks in formulation and size of colourants due to the presence of the microcapsules. Design/methodology/approach Printing inks in offset lithography must have sufficient tack so they can be transported from a reservoir onto the substrate. The ink transfer takes place through the ink splitting by inking rollers, printing plate and blanket transport. An IGT Tackoscope device was used to produce the dynamic readings of ink tack as a function of distribution and splitting time. The data can be used for prediction of the ink press stability under controlled settings, such as temperature. Findings This research explains the temperature and velocity influence on the tack stability measurement readings of thermochromic inks. It also gives an insight of the chemical compounds that dictate the tack measuring reading results. Originality/value Development of new printing inks, such as thermochromic printing inks, may affect the printing of different products. The research was conducted due to a lack of available data for the tack of thermochromic inks.
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Parag Mahajan, Madhura, and Swati Bandyopadhyay. "Correlation of ink viscosity and printability in offset lithography process on paperboard used in packaging." ACTA GRAPHICA Journal for Printing Science and Graphic Communications 29, no. 3 (November 5, 2019): 37–48. http://dx.doi.org/10.25027/agj2017.28.v29i3.165.

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Withnall, R., J. Silver, G. R. Fern, P. J. Marsh, T. G. Ireland, P. S. A. Evans, D. J. Southee, G. I. Hay, D. J. Harrison, and K. F. B. Breen. "42.4: Low Cost, Flexible Electroluminescent Displays with a Novel Electrode Architecture Printed by Offset Lithography." SID Symposium Digest of Technical Papers 37, no. 1 (2006): 1491. http://dx.doi.org/10.1889/1.2433273.

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Farnand, Susan. "Further Investigation into the Image Quality Differences between Digital Print Technologies and Traditional Offset Lithography." NIP & Digital Fabrication Conference 25, no. 1 (January 1, 2009): 515–20. http://dx.doi.org/10.2352/issn.2169-4451.2009.25.1.art00031_2.

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Ji, Seung-Muk, In-Young Kim, Eun-Hee Kim, Jie-Un Jung, Wan-Doo Kim, and Hyun-Eui Lim. "Fabrication of a Hybrid Superhydrophobic/superhydrophilic Surface for Water Collection: Gravure Offset Printing & Colloidal Lithography." Journal of the Korean Society of Precision Engineering 29, no. 1 (January 1, 2012): 19–24. http://dx.doi.org/10.7736/kspe.2012.29.1.019.

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Rosseinsky, D. R., and A. M. Soutar. "Electrochemical and reflectance study of the conversion of zinc oxide by hexacyanoferrate (II) in offset lithography." Journal of Applied Electrochemistry 23, no. 3 (March 1993): 187–89. http://dx.doi.org/10.1007/bf00241907.

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Rosseinsky, D. R., J. D. Slocombe, and A. M. Soutar. "Electrochemical and reflectance study of the conversion of zinc oxide by hexacyanoferrate (II) in offset lithography." Journal of Applied Electrochemistry 23, no. 3 (March 1993): 190–96. http://dx.doi.org/10.1007/bf00241908.

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Kosev, Svetoslav. "Interpretation of Subjects in Works of Visual Arts, through a Combination of Digital and Classical Media." Cultural and Historical Heritage: Preservation, Presentation, Digitalization 8, no. 2 (December 26, 2022): 35–44. http://dx.doi.org/10.55630/kinj.2022.080203.

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Lithography is one of the emblematic graphic techniques discovered in the late 17th century to create large print runs. It is practically a prototype of modern color, offset printing. For this reason, it is one of the mandatory disciplines in higher education institutions that can afford the appropriate equipment. Three-dimensional computer graphics, on the other hand, is a technology that has only been available for use by a wider range of people since the last decade of the twentieth century. The combination of these two techniques for creating a visual product, although it sounds illogical, is the subject of this paper. In addition, the possibility of including and augmented reality (AR) to printed works created in this way will be considered.
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Yang, Zhenyu, Minfei He, Guozun Zhou, Cuifang Kuang, and Xu Liu. "An Autofocus Method Based on Improved Differential Confocal Microscopy in Two-Photon Lithography." Photonics 10, no. 3 (March 21, 2023): 338. http://dx.doi.org/10.3390/photonics10030338.

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Two-photon lithography (TPL) plays a vital role in microstructure fabrication due to its high processing accuracy and maskless characteristics. To optimize the manufacturing quality deteriorated by the defocus of the substrate, an autofocus approach based on improved differential confocal microscopy (IDCM) is proposed in this paper. Through analyzing the intensity response signals from two detectors with symmetrical axial offset, the defocus amount is measured and compensated for with high precision and noise immunity to stabilize the substrate. The verification experiments on the coverslip reported a detection sensitivity of 5 nm, a repetitive measurement accuracy of less than 15 nm, and a focusing accuracy reaching around 5 nm. The consistency between simulation and characterization demonstrated the effectiveness and superior performance of the autofocus system for the high production quality of the metalens array. The proposed autofocus method shows promise for further application to the fabrication of complex structures on various substrates.
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Unno, Noriyuki, and Tapio Mäkelä. "Thermal Nanoimprint Lithography—A Review of the Process, Mold Fabrication, and Material." Nanomaterials 13, no. 14 (July 8, 2023): 2031. http://dx.doi.org/10.3390/nano13142031.

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Micro- and nanopatterns perform unique functions and have attracted attention in various industrial fields, such as electronic devices, microfluidics, biotechnology, optics, sensors, and smart and anti-adhesion surfaces. To put fine-patterned products to practical use, low-cost patterning technology is necessary. Nanoimprint lithography (NIL) is a promising technique for high-throughput nanopattern fabrication. In particular, thermal nanoimprint lithography (T-NIL) has the advantage of employing flexible materials and eliminating chemicals and solvents. Moreover, T-NIL is particularly suitable for compostable and recyclable materials, especially when applying biobased materials for use in optics and electronics. These attributes make T-NIL an eco-friendly process. However, the processing time of normal T-NIL is longer than that of ultraviolet (UV) NIL using a UV-curable resin because the T-NIL process requires heating and cooling time. Therefore, many studies focus on improving the throughput of T-NIL. Specifically, a T-NIL process based on a roll-to-roll web system shows promise for next-generation nanopatterning techniques because it enables large-area applications with the capability to process webs several meters in width. In this review, the T-NIL process, roll mold fabrication techniques, and various materials are introduced. Moreover, metal pattern transfer techniques using a combination of nanotransfer printing, T-NIL, and a reverse offset are introduced.
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Cigula, Tomislav, Tamara Tomašegović, and Tomislav Hudika. "Effect of the paper surface properties on the ink transfer parameters in offset printing." Nordic Pulp & Paper Research Journal 34, no. 4 (November 18, 2019): 540–49. http://dx.doi.org/10.1515/npprj-2019-0018.

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Abstract Paper has a crucial impact on the qualitative properties of printed product as properties of the paper’s surface directly impact the ink transfer, consequently, basic optical properties of the print. Although same ISO paper type, papers possess variable surface properties leading to different influence on the ink transfer. The aim of this research was to analyse influence of the surface properties of the paper, including surface free energy, smoothness and gloss of some standard papers used in lithography on the ink transfer while matching the colorimetric values defined by ISO 12647-2:2013. Determination of amount of the ink transfer, optical density, mottling and colour difference of prints were performed to evaluate paper-ink interactions. Results have shown that produced prints differ in the investigated properties. Furthermore, there are significant correlations between the surface free energy of the paper and paper smoothness and the ink transfer. In addition, amount of ink used to produce a standardized print varies for different paper types (even in the same ISO paper classification), meaning difference in ink costs. This research proved the high influence of paper’s certain parameters on the ink transfer by strong correlation coefficients. This enables better process control and optimization of the printing.
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Zhu, Hu, Nan Li, and Zhi Jun Liu. "3D Laser Inner Engraving Path Generation and Simulation for Crystal Glass." Advanced Materials Research 201-203 (February 2011): 225–28. http://dx.doi.org/10.4028/www.scientific.net/amr.201-203.225.

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The method of laser inner engraving path generation and simulation for crystal glass is presented based on STL(Stereo Lithography) model. To generate the laser exposure points that are adaptive to the surface of model, the contour lines are obtained by cutting the STL model with unequal distance using a series of plans that are perpendicular to Z-axis. Then the contour lines are offset and scattered, and then the path is generated by sorting and connecting each discrete point in order. Simultaneously, simulation method of laser inner engraving for crystal glass is also proposed. The case studies show that the method can primely realize the engraving path generation and the simulation for the laser inner engraving of crystal glass, and that the system runs stably and reliably.
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Mahajan, Madhura P., and Swati Bandyopadhyay. "Characterization and optimization of color attributes chroma ( C *) and lightness ( L *) in offset lithography halftone print on packaging boards." Color Research & Application 45, no. 2 (November 12, 2019): 325–35. http://dx.doi.org/10.1002/col.22456.

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Leinauer, Elliott C., H. Mike Kim, and Jae W. Kwon. "Micromachined Tactile Sensor Array for RTSA." Micromachines 12, no. 11 (November 21, 2021): 1430. http://dx.doi.org/10.3390/mi12111430.

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This work presents a polymer-based tactile capacitive sensor capable of measuring joint reaction forces of reverse total shoulder arthroplasty (RTSA). The capacitive sensor contains a polydimethylsiloxane (PDMS) dielectric layer with an array of electrodes. The sensor was designed in such a way that four components of glenohumeral contact forces can be quantified to help ensure proper soft tissue tensioning during the procedure. Fabricated using soft lithography, the sensor has a loading time of approximately 400 ms when a 14.13 kPa load is applied and has a sensitivity of 1.24 × 10−3 pF/kPa at a load of 1649 kPa. A replica RTSA prothesis was 3D printed, and the sensor was mounted inside the humeral cap. Four static right shoulder positions were tested, and the results provided an intuitive graphical description of the pressure distribution across four quadrants of the glenohumeral joint contact surface. It may help clinicians choose a right implant size and offset that best fit a patient’s anatomy and reduce postoperative biomechanical complications such as dislocation and stress fracture of the scapula.
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Peng, Kai-Yu, and Da-Hua Wei. "Improving Light Extraction of Organic Light-Emitting Devices by Attaching Nanostructures with Self-Assembled Photonic Crystal Patterns." International Journal of Photoenergy 2014 (2014): 1–9. http://dx.doi.org/10.1155/2014/936049.

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A single-monolayered hexagonal self-assembled photonic crystal (PC) pattern fabricated onto polyethylene terephthalate (PET) films by using simple nanosphere lithography (NSL) method has been demonstrated in this research work. The patterned nanostructures acted as a scattering medium to extract the trapped photons from substrate mode of optical-electronic device for improving the overall external quantum efficiency of the organic light-emitting diodes (OLEDs). With an optimum latex concentration, the distribution of self-assembled polystyrene (PS) nanosphere patterns on PET films can be easily controlled by adjusting the rotation speed of spin-coater. After attaching the PS nanosphere array brightness enhancement film (BEF) sheet as a photonic crystal pattern onto the device, the luminous intensity of OLEDs in the normal viewing direction is 161% higher than the one without any BEF attachment. The electroluminescent (EL) spectrum of OLEDs with PS patterned BEF attachment also showed minor color offset and superior color stabilization characteristics, and thus it possessed the potential applications in all kinds of display technology and solid-state optical-electronic devices.
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Burge, Daniel, Susan Farnand, and Franziska Frey. "Review of Research at RIT Comparing the Print Value and Permanence of Digital Prints vs. Offset Lithography and Silver-Halide Prints." International Symposium on Technologies for Digital Photo Fulfillment 2012, no. 1 (January 1, 2012): 39–43. http://dx.doi.org/10.2352/issn.2169-4672.2012.3.0.23.

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Rosseinsky, D. R., J. D. Slocombe, and A. M. Soutar. "Electrochemical and reflectance study of the conversion of zinc oxide by hexacyanoferrate(II) in offset lithography Part I: Zinc electrochemistry with minor components." Journal of Applied Electrochemistry 21, no. 9 (September 1991): 774–80. http://dx.doi.org/10.1007/bf01402813.

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Shen, Wei, Brenda Hutton, and Fuping Liu. "A new understanding on the mechanism of fountain solution in the prevention of ink transfer to the non-image area in conventional offset lithography." Journal of Adhesion Science and Technology 18, no. 15-16 (January 2004): 1861–87. http://dx.doi.org/10.1163/1568561042708395.

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McCulloch, Iain, Clare Bailey, Kristijonas Genevicius, Martin Heeney, Maxim Shkunov, David Sparrowe, Steven Tierney, et al. "Designing solution-processable air-stable liquid crystalline crosslinkable semiconductors." Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences 364, no. 1847 (August 22, 2006): 2779–87. http://dx.doi.org/10.1098/rsta.2006.1854.

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Organic electronics technology, in which at least the semiconducting component of the integrated circuit is an organic material, offers the potential for fabrication of electronic products by low-cost printing technologies, such as ink jet, gravure offset lithography and flexography. The products will typically be of lower performance than those using the present state of the art single crystal or polysilicon transistors, but comparable to amorphous silicon. A range of prototypes are under development, including rollable electrophoretic displays, active matrix liquid crystal (LC) displays, flexible organic light emitting diode displays, low frequency radio frequency identification tag and other low performance electronics. Organic semiconductors that offer both electrical performance and stability with respect to storage and operation under ambient conditions are required. This work describes the development of reactive mesogen semiconductors, which form large crosslinked LC domains on polymerization within mesophases. These crosslinked domains offer mechanical stability and are inert to solvent exposure in further processing steps. Reactive mesogens containing conjugated aromatic cores, designed to facilitate charge transport and provide good oxidative stability, were prepared and their liquid crystalline properties evaluated. The organization and alignment of the mesogens, both before and after crosslinking, were probed by grazing incidence wide-angle X-ray scattering of thin films. Both time-of-flight and field effect transistor devices were prepared and their electrical characterization reported.
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39

Sönmez, S., and Ö. Özden. "The influence of pigment proportions and calendering of coated paperboards on dot gain." Bulgarian Chemical Communications 51, no. 2 (2019): 212–18. http://dx.doi.org/10.34049/bcc.51.2.4853.

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Dot gain is called Tone Value Increase (TVI). Low dot gain and rounder dot shape are important properties to obtain a good print. Dot gain is a measure of how much extra weight a given percent dot or tone has gained on the final printed substrate by comparison to the actual dot area on a press plate. Dot gain value depends on many factors. The interactions of paper, ink and press conditions are important determinates for a good print. In addition, the pigment coating process and calendering conditions have a significant effect on the printability of paperboards. Pigment coating formulations including mineral pigments, binders and additives improve the gloss, brightness, opacity and smoothness of the paperboards. As a result, print quality of paperboards increase. A uniform paperboard surface is needed to obtain a high quality surface smoothness after the coating process. High surface smoothness improves the uniformity of the dot shape and size. Pigment coating formulation parameters; pigment selection, binder selection and binder level influence print quality. The aims of this study - pigment selection and ratio - are to determine the effect on dot gain in lithography printing. To this aim, base paperboards were coated using five pigment coating formulations which included different combinations of kaolin, calcium carbonate and titanium dioxide pigment with a styrene\n-butyl acrylate copolymer binder using a bar application. After coating, the samples were air-dried overnight under TAPPI conditions. Then, half of the coated-paperboards were calendered. Tone scales from 1 to 100 % were offset printed using black ink on the uncalendered and calenderedcoated paperboards. Then, from the printed tone scale, the tone area values were measured with the Gretagmacbeth Spectrolino spectrophotometer. These values showed that pigment coating improved the surface optical and physical properties of paperboards. After calendering, the roughness values of coated paperboards decreased. In addition, the obtained dot and line sharpness on calendered-coated paperboards were better than on uncalenderedcoated paperboards. However, the dot gain values of calendered-coated paperboards had fewer dot gains than uncalendered-coated paperboards. It was established that the variation of pigment proportions in the coating formulations had no significant effect on dot gain.
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Gordeladze, Nino, and Daniel Burge. "Colorant Fade and Page Yellowing of Bound and Unbound Materials Printed Using Digital Presses and Offset Lithography when Exposed to O<sub>3</sub> or NO<sub>2</sub>." NIP & Digital Fabrication Conference 28, no. 1 (January 1, 2012): 387–91. http://dx.doi.org/10.2352/issn.2169-4451.2012.28.1.art00031_2.

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41

Li, Tian, Jian Wang, Shaolin Zhou, Haiyang Quan, Lei Chen, Junbo Liu, Jing Du, Xianchang Zhu, and Song Hu. "Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement." Photonics 10, no. 2 (February 4, 2023): 168. http://dx.doi.org/10.3390/photonics10020168.

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As with the decreasing feature size prompted by Moore’s law and the continuous technological advancements in the semiconductor industry, the distortion of the projection lens is an important factor that affects the overlay. In this paper, we propose a wavefront-measurement-based method to detect the projection lens distortion in the lithographic system. By normalizing the coordinates of the Shack–Hartmann system with the image displacements represented in the Z2 and Z3 terms of Zernike coefficients, the offsets between the actual image points and the ideal image points can be determined. By offset collection at an array of 7 × 7 field points to establish an overdetermined system of equations, the proposed method can simultaneously detect the distortions of translation, magnification, rotation, decentering distortion, thin prism distortion, and third-order radial distortion. This distortion measurement method is highly flexible for distortion measurement with portable and compactly integrated sensors, enabling the real-time and cost-efficient measurement of wave aberration and distortion. For proof-of-concept experiments, a projection lens with a numerical aperture (NA) of 0.58 for i-line (365 nm) is used for experimental testing. The results reveal that the repeatability accuracy of distortion detection is 51 nm and the 72 h long-term reproducibility is 143 nm.
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Rivett, B., E. V. Koroleva, F. J. Garcia-Garcia, J. Armstrong, G. E. Thompson, and P. Skeldon. "Surface topography evolution through production of aluminium offset lithographic plates." Wear 270, no. 3-4 (January 2011): 204–17. http://dx.doi.org/10.1016/j.wear.2010.10.061.

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43

Cordeiro, N., A. Blayo, N. M. Belgacem, A. Gandini, C. Pascoal Neto, and J. F. LeNest. "Cork suberin as an additive in offset lithographic printing inks." Industrial Crops and Products 11, no. 1 (January 2000): 63–71. http://dx.doi.org/10.1016/s0926-6690(99)00037-0.

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44

Hay, G. I., D. J. Southee, P. S. A. Evans, D. J. Harrison, G. B. Simpson, and J. Wood. "A time–strain monitoring system fabricated via offset lithographic printing." Smart Materials and Structures 18, no. 1 (December 15, 2008): 015015. http://dx.doi.org/10.1088/0964-1726/18/1/015015.

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Hoang Thi Kieu Nguyen. "Ink Sequence Effects on Color Gamut in Multicolor Lithographic Printing." International Journal of Scientific Research in Science and Technology 11, no. 3 (June 12, 2024): 602–6. http://dx.doi.org/10.32628/ijsrst2411334.

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This research investigates the impact of ink sequences and paper substrates on color reproduction in offset printing. Through experimentation and analysis, we demonstrate how altering the sequence of ink application influences color gamut. The variations in color gamut depend on the ink transfer capabilities. The MYCK order allows the most extensive color gamut for the investigated conditions. However, the effect is less observed on uncoated paper due to its high absorbency, resulting in minimal changes in ink transfer processes. Furthermore, our study highlights a substantial difference in color gamut between coated and uncoated paper, emphasizing the importance of considering paper substrate for achieving desired color reproduction. This research provides valuable insights for optimizing color fidelity in offset printing processes.
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Harrey, P. M., B. J. Ramsey, P. S. A. Evans, and D. J. Harrison. "Capacitive-type humidity sensors fabricated using the offset lithographic printing process." Sensors and Actuators B: Chemical 87, no. 2 (December 2002): 226–32. http://dx.doi.org/10.1016/s0925-4005(02)00240-x.

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47

Chen, Li Qiang. "Research of Sheet-Fed Offset Damping System Green Printing Technology." Advanced Materials Research 380 (November 2011): 306–10. http://dx.doi.org/10.4028/www.scientific.net/amr.380.306.

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Lithographic printing press must maintain a stable standard printing environment; we need to maintain the ink-water balance for achieve stability print quality. Not only stable for ink supply, but also stable supply of dampening solution from dampening circulation system. The study tries to conduct less proportion of alcohol to reduce emissions of volatile IPA, using green printing technology in the standard production. This study analyzed a variety of automatic sheet-fed offset press dampening system to study how to control the tank fluid additives, and reduce alcohol consumption. Design standard operation of "automatic green formula system“, the system should contain four main functions: purity water systems, precise formulation systems, circulated filtration system and computer numerical control system. Its purpose: to make the operation under the automated water quality standards, make stable print quality and increase printing capacity, increase product yield, reduce pollution. The water dampening system makes the quality and stability while reducing pollution emissions.
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ENGSTRÖM, Gunnar. "Causes of back-trap mottle in lithographic offset prints on coated papers." February 2016 15, no. 2 (March 1, 2016): 91–101. http://dx.doi.org/10.32964/tj15.2.91.

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Back-trap mottle is a common and serious print quality problem in lithographic offset printing of coated papers. It is caused by nonuniform ink retransfer from an already printed surface when it passes through a subsequent printing nip with the print in contact with the rubber blanket in that nip. A nonuniform surface porosity gives rise to mottle. A key parameter in mottling contexts is the coating mass distribution, which must be uniform. Good relationships between mottle and mass distribution have also been reported; the mottle pattern coincides with that of the coating mass distribution. High blade pressures, compressible base papers, and high water pick-up between application and metering, which plasticizes the paper, yield uniform mass distributions, but these parameters might have a detrimental effect on the runnability in blade coating in terms of web breaks. The general opinion has been that nonuniform surface porosity is caused by binder migration and enrichment of binder in the coating surface, more in the high coat weight areas and less in the low coat weight areas. Recent research has suggested that a more probable mechanism is depletion of binder in the coating surface. Nonuniform shrinkage of the pigment matrix (filter cake) formed during the consolidation between the first critical concentration (FCC) and the second critical concentration (SCC) is another possible mechanism. Relevant relaxation times for latex and the time scales for consolidation show that the high coat weight areas shrink more than the low coat weight areas in the coating layer. A recent pilot-scale experiment has shown that the drying strategy did not affect the differences in shrinkage between high and low coat weight areas. The drying strategy has a pronounced impact on mottle. A high evaporation rate at the beginning of the evaporation results in less mottle than a low evaporation rate. The least mottle is obtained if the drying is performed with a gap in the course of evaporation between the FCC and the SCC.
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Englund, Cristofer, and Antanas Verikas. "Ink flow control by multiple models in an offset lithographic printing process." Computers & Industrial Engineering 55, no. 3 (October 2008): 592–605. http://dx.doi.org/10.1016/j.cie.2008.01.019.

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Englund, C., and A. Verikas. "A hybrid approach to outlier detection in the offset lithographic printing process." Engineering Applications of Artificial Intelligence 18, no. 6 (September 2005): 759–68. http://dx.doi.org/10.1016/j.engappai.2005.01.008.

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