Books on the topic 'Organic semiconductors - Design and construction'
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Organic Contamination Workshop (3rd 2001 Erlangen, Germany). Organic Contamination Workshop: SEMICON Europa 2001 : proceedings, Erlangen, Germany, April 27, 2001. Fraunhofer IRB Verlag, 2001.
Find full textP, Colino Ronald, ed. Power electronic modules: Design and manufacture. CRC Press, 2005.
Find full textMahajan, Subhash. Principles of growth and processing of semiconductors. WCB/McGraw-Hill, 1998.
Find full textS, SreeHarsha K., ed. Principles of growth and processing of semiconductors. WCB/McGraw-Hill, 1999.
Find full textCampbell, Stephen A. Fabrication engineering at the micro and nanoscale. 3rd ed. Oxford University Press, 2007.
Find full textThe science and engineering of microelectronic fabrication. Oxford University Press, 1996.
Find full textLanzerotti, M. Y. Introductory semiconductor device physics for chip design and manufacturing: A high-performance silicon technology approach. John Wiley & Sons, Inc., 2016.
Find full textCampbell, Stephen A. Fabrication engineering at the micro- and nanoscale. 3rd ed. Oxford University Press, 2008.
Find full textMiddleman, Stanley. Process engineering analysis in semiconductor device fabrication. McGraw-Hill, 1993.
Find full textNATO Advanced Research Workshop on Science and Engineering of One- and Zero-Dimensional Semiconductors (1989 Cádiz, Spain). Science and engineering of one- and zero-dimensional semiconductors. Plenum Press, 1990.
Find full textPearton, S. J. Processing of wide bandgap semiconductors. Noyes Publications/William Andrews Pub., 1999.
Find full textA, Neamen Donald, ed. Microelectronics: Circuit analysis and design. 3rd ed. McGraw-Hill, 2007.
Find full textHelmut, Föll, ed. Porous semiconductors: Optical properties and applications. Springer, 2009.
Find full textCircuit design techniques for non-crystalline semiconductors. Taylor & Francis, 2012.
Find full textIEEE/SEMI International Semiconductor Manufacturing Science Symposium. (3rd 1991 Burlingame, Calif.). IEEE/SEMI International Manufacturing science Science Symposium: Theme: "Semiconductor manufacturing" : May 19-22, 1991, Hyatt Regency Hotel, Burlingame, CA, USA. Institute of Electrical and Electronics Engineers, 1991.
Find full textIEEE/SEMI International Semiconductor Manufacturing Science Symposium. (4th 1992 San Francisco, Calif.). IEEE/SEMI International Semiconductor Manufacturing Science Symposium: June 15-16, 1992, San Francisco, CA USA. Institute of Electrical and Electronics Engineers, 1992.
Find full textIEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (13th 2002 Boston, Mass.). ASMC 2002 proceedings: 2002 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop : advancing the science of semiconductor manufacturing excellence, April 30 - May 2, 2002, Boston, Massachusetts. Institute of Electrical & Electronics Engineers, 2002.
Find full textTverʹi︠a︡novich, A. S. Lazernye i mikrovolnovye metody poluchenii︠a︡ i modifikat︠s︡ii khalʹkogenidnykh poluprovodnikovykh materialov = Synthesis and modification of chalcogenide semiconductors with laser ablation and microwave irradiation. BKhV-Peterburg, 2006.
Find full textK, Board, ed. An introduction to semiconductor microtechnology. 2nd ed. J. Wiley, 1990.
Find full textIEEE/SEMI International Semiconductor Manufacturing Science Symposium. (2nd 1990 Burlingame, Calif.). IEEE/SEMI International Semiconductor Manufacturing Science Symposium: Theme: "Manufacturing Science" : Burlingame, CA, USA, May 21-23, 1990. IEEE, 1990.
Find full textHigh voltage MOS device design: Injection enhancement and negative gate capacitance. Hartung-Gorre Verlag, 2005.
Find full textMarshall, Andrew. SOI design: Analog, memory and digital techniques. Kluwer Academic Publishers, 2002.
Find full text1921-, Morris Paul, ed. Modern electronic devices: Circuit design and application. Reston Pub. Co., 1985.
Find full textSreedhar, Natarajan, ed. SOI design: Analog, memory and digital techniques. Kluwer Academic Publishers, 2002.
Find full textSwaminathan, Madhavan. Power integrity modeling and design for semiconductors and systems. Prentice Hall, 2008.
Find full textJones, Anthony C. CVD of compound semiconductors: Precursor synthesis, development and applications. VCH, 1997.
Find full textE, Butner Steven, ed. Gallium arsenide digital integrated circuit design. McGraw-Hill, 1990.
Find full textLong, Stephen I. Gallium arsenide digital integrated circuit design. McGraw-Hill, 1990.
Find full textZelenka, Stefan. Stress-related problems in process simulation. Hartung-Gorre, 2001.
Find full textSchumicki, G. Prozesstechnologie: Fertigungsverfahren für integrierte MOS-Schaltungen. Springer-Verlag, 1991.
Find full textŌyō Butsuri Gakkai. Shirikon Tekunorojī Bunkakai. and IEEE Electron Devices Society, eds. Extended abstracts of the third International Workshop on Junction Technology: IWJT : December 2-3, 2002, Tokyo, Japan. Business Center for Academic Societies Japan, 2002.
Find full textSymposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing (1st 1992 Toronto, Ont.). Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing I. Edited by Schmidt Dennis N, Reedy David, Schwarz Alex, Electrochemical Society Electronics Division, and Electrochemical Society. Dielectric Science and Technology Division. Electrochemical Society, 1992.
Find full textFundamentals of semiconductor processing technologies. Kluwer Academic Publishers, 1995.
Find full textSymposium, on Contamination Control and Defect Reduction in Semiconductor Manufacturing (3rd 1994 San Francisco Calif ). Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III. Electrochemical Society, 1994.
Find full textSemiconductors and Semimetals: Pulsed Laser Processing of Semiconductors (Semiconductors and Semimetals). Academic Press, 1985.
Find full textSheng, William W., and Ronald P. Colino. Power Electronic Modules: Design and Manufacture. CRC, 2004.
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