Relevant bibliographies by topics / Photo-lithographic masks

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  1. Journal articles
  2. Dissertations / Theses
  3. Conference papers

Academic literature on the topic 'Photo-lithographic masks'

Author: Grafiati
Published: 19 February 2023

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Journal articles on the topic "Photo-lithographic masks"

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Erismis, Mehmet Akif. "A Review On Variable MEMS Mirrors For Photo-Lithographic Masks." Academic Platform Journal of Engineering and Science 1, no. 1 (2013): 7–14. http://dx.doi.org/10.5505/apjes.2013.54264.

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2

Tsai, Jhy Cherng, Meng Yun Hsieh, and Hsi Harng Yang. "Diffraction Effect in Proximity Printing of Circular Aperture Array." Key Engineering Materials 364-366 (December 2007): 955–60. http://dx.doi.org/10.4028/www.scientific.net/kem.364-366.955.

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Proximity printing is one of the lithographic processes used in fabricating semiconductor, micro optoelectronic components and micro electro-mechanical systems to transfer mask pattern to the substrate. This research investigates the cause of pattern distortion based on the analysis of diffraction effect of light beam due to the gap between the mask and the photo resistant in the proximity printing process. The Huygens-Fresnel diffraction theorem is first employed to derive the diffraction effect. It shows that irradiance decreases as the gap increased, which is consistent with practice. Further investigation shows that shading area can be exposed, even with a small gap, due to the diffraction effect that makes the exposed image imprecise. A deeper analysis on the diffraction effect in microlithography of proximity printing with single-aperture, dual-aperture, and multi-aperture masks is investigated. It shows that the contrast irradiance between the exposed and the shading regions becomes closer as the gap increases. This makes the boundary of image become vague and causes the exposed image to be distorted. Experiments are then designed and conducted to verify the derived results. Experimental results using φ80μm circular single-, dual- and multiaperture masks showed that the boundary of adjacent circular apertures begins to crossover with each other when the gap reaches 240μm. When the gap increases to 360μm, interference between adjacent circular apertures becomes stronger that results in hexagonal images. This shows that experimental results are consistent with simulations from theoretical analyses. The main contribution of this research is to analytically find the distortion of image in proximity printing due to diffraction effect and to verify the theory by experiments.
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Hsieh, Ming Fa, Chia Lin Sheu, and Hsi Wen Yang. "Micro-Lithographic Fabrication of Collagen and Hyaluronic Acid Hydrogel Scaffolds." Advanced Materials Research 647 (January 2013): 170–75. http://dx.doi.org/10.4028/www.scientific.net/amr.647.170.

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The regeneration of human diseased parts is based on substantial cell number to support physiological functions of diseased tissues/organs. To this end, the scaffolds for cellular proliferation should be structurally similar to normal tissues. This study aimed to fabricate biomimetic structures of naturally-occurring polymer. We utilized micro-lithography to produce three-dimensional scaffold of the composite of collagen and hyaluronic acid (HA) which is further used to evaluate the cellular attachment and proliferation. Collagen from porcine skin was characterized by SDS-PAGE that three species having molecular weights of 120, 130 and 250 kDa were assigned as 2, 1 and  chains of type I collagen. HA was purified by diafiltration and characterized by carbzaole method. The purity of HA was increased from 41.6 g/mL to 71.9 g/mL. To endow photo-cross linker to HA, a graft reaction, catalyzed by triethyl amine was carried out that glycidyl methacrylate (GM) was conjugated to side group of HA. Chemical shifts of 5.7 and 6.1 ppm of 1H NMR spectrum indicated that GMHA was synthesized. To develop 3D scaffolds, we formulated a weight ratio of 10:3 for GMHA and collagen as precursor of micro-lithography. Photo masks of curved, fine lines and rectangular patterns were utilized. For finest lines (100 m) in the pattern, it took 9 minutes to fully crosslink the formulation with UV light, whereas curved lines of 2 to 5 mm could be cross linked in 2 minutes. The scaffolds were found to have pores of 10- 100 m observed under scanning electron microscope. This study completed the scaffold fabrication of naturally-occurring polymers and confirmed the optimized conditions of micro-lithography. The 3D scaffolds having linear and curved lines and rectangular patterns will be used to evaluate the cellular attachment and migration of various mammalian cells.
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Li, Mu Jun, Hui Chun Ye, and Lian Guan Shen. "A Fast Method for Analyzing the Effect of Mask Error on Photolithography Pattern Quality." Advanced Materials Research 291-294 (July 2011): 3097–102. http://dx.doi.org/10.4028/www.scientific.net/amr.291-294.3097.

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As an important factor the error of mask pattern is often ignored in the lithography simulation model. To investigate the impact of mask errors on the lithographic pattern, effects of how the wave-front on different mask pattern region affects the field points in resist is first introduced, and based on this analysis a method is proposed to quickly judge the affection of round corner error of mask pattern on the photo-resist pattern. By comparing the actual effect area and the effective wave-front area around the corner on mask pattern, the method can illustrate the quantitative relationship between variation in photo-resist pattern and the related mask error. Finally the simulation results are verified by experiments. The study results may contribute to the fast and accurate judgments of error in the lithography, and provide important theoretical basis for lithography error correction.
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Choi, Kyung. "Microfluidic Synthesis and Functional Patterning for Advanced Nanotechnology." MRS Proceedings 1260 (2010). http://dx.doi.org/10.1557/proc-1260-t05-05.

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AbstractIn this study, we introduce ‘molecularly imprinted polymer' (MIP) system, which has receptor or binding sites with specific molecular recognitions.Due to the receptor or binding sites in MIP's systems, it can be used for developing bio- or chemical sensors.To fabricate bio-sensors, bio-molecules have been incorporated into MIP's systems as template molecules, but some bio-molecules are sensitive thus denatured during engineering processes.For this reason, bio-sensor fabrications by conventional UV photolithography have shown some limitations.We demonstrate here a photopatterning process, a micromolding in capillary technique (MIMIC) technique, to photopatterning a MIP's system containing a bio-molecule template.The MIMIC technique uses the photo-masks for photopolymerizing MIP's monomer solutions.The photomask is based on silicon rubbers, which are optically transparent and also minimize any damages of sensitive bio-molecules during photo-polymerizations. For visualizing lithographic performances of MIP's systems, we used a fluorescent template molecule to present a comparative result of MIP's photo-cured patterns.It shows a clear different in MIP's patterns with and without the template.We also employed a microfluidic approach to produce micro-sized MIP's particles, which contribute to increase the sensitivity of bio-molecule sensors/devices.
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Dissertations / Theses on the topic "Photo-lithographic masks"

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(9820148), Luke Moertel. "Microarray analysis of the Schistosoma japonicum transcriptome." Thesis, 2006. https://figshare.com/articles/thesis/Microarray_analysis_of_the_Schistosoma_japonicum_transcriptome/13423745.

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Schistosomiasis, a disease of humans caused by helminth parasites of the genus Schistosoma, kills 200 to 500 thousand people annually, endangering over 600 million people world-wide with 200 million people infected in 2003 [1, 2]. Three species of schistosome are primarily responsible for human infections, namely, Schistosoma haematobium, endemic to Africa, India, and the Middle East, S. mansoni, endemic to Africa / South America, and S. japonicum endemic to China and the Philippines [3]. The major pathological effects of schistosomiasis result from the deposition of parasite ova in human tissues and the subsequent intense granulomatous response induced by these eggs. There is a high priority to provide an effective sub-unit vaccine against these schistosome flukes, using proteins encoded by cDNAs expressed by the parasites at critical phases of their development. One technique that may expedite this gene identification is the use of microarrays for expression analysis. A 22,575 feature custom oligonucleotide DNA microarray designed from public domain databases of schistosome ESTs (Expressed Sequence Tags) was used to explore differential gene expression between the Philippine (SJP) and Chinese (SJC) strains of S. japonicum, and between males and females. It was found that 593, 664 and 426 probes were differentially expressed between the two geographical strains when mix sexed adults, male worms and female worms were compared respectively. Additionally, the study revealed that 1,163 male- and 1,016 female-associated probes were differentially expressed in SJP whereas 1,047 male- and 897 female-associated probes were differentially expressed in SJC [4]. Further to this, a detailed real time PCR expression study was used to explore the differential expression of eight genes of interest throughout the SJC life cycle, which showed that several of the genes were down-regulated in different life cycle stages. The study has greatly expanded previously published data of strain and gender-associated differential expression in S. japonicum. Further, the new data will provide a stepping stone for understanding the complexities of the biology, sexual differentiation, maturation, and development of human schistosomes, signaling new approaches for identifying novel intervention and diagnostic targets against schistosomiasis [4].
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Conference papers on the topic "Photo-lithographic masks"

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Heins, Torben, Uwe Dersch, Roman Liebe, and Jan Richter. "Line edge roughness on photo lithographic masks." In SPIE 31st International Symposium on Advanced Lithography, edited by Chas N. Archie. SPIE, 2006. http://dx.doi.org/10.1117/12.655531.

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Smolyaninov, Igor I., Joseph N. Mait, David L. Mazzoni, and Christopher C. Davis. "Fabrication of Submicron Feature Diffractive Elements using Near-Field Direct-Write Ultra-Violet Lithography." In Diffractive Optics and Micro-Optics. Washington, D.C.: Optica Publishing Group, 1996. http://dx.doi.org/10.1364/domo.1996.dwd.3.

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The fabrication of surface relief diffractive elements using a series of binary exposures and etches in photo-resist is attractive because it relies upon standard lithographic techniques [1]. Disadvantages of this process include the necessity for mask generation prior to photoresist exposure and the logarithmic relationship between the desired number of phase levels and number of exposures. To overcome the latter restriction, the generation of gray level masks has been proposed [2]. However, both restrictions can be overcome if the photoresist is exposed directly. Electron beam [3] and laser beam direct-write [4] procedures have been proposed. Electron beam writing is attractive for its high resolution and laser beam writing for its cost. Both high resolution and low cost are possible if a tapered fiber is used to deliver energy to the photoresist [5,6]. We report on the fabrication of diffractive gratings with submicron features using a tapered fiber to deliver ultra-violet (UV) energy to a layer of photoresist.
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Jenness, Nathan J., Daniel G. Cole, and Robert L. Clark. "Three-Dimensional Holographic Lithography Using a Spatial Light Modulator." In ASME 2008 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. ASMEDC, 2008. http://dx.doi.org/10.1115/detc2008-50067.

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In this paper we present a lithographic process with the ability to automatically translate and arbitrarily position three-dimensional (3D) computer-generated patterns through the use of phase holograms. This method, dynamic maskless holographic lithography (DMHL), advances current photo-directed patterning and functionalization capabilities by expanding the capability to manipulate light in real-time without the use of expensive fixed masks. The system could be used for large-scale parallel manufacturing over larger areas and for point specific serial fabrication, interrogation, and metrology. The use of coherent illumination allows for the direct creation of 3D patterns of light for lithography as opposed to the mechanical stage, layer-by-layer 3D fabrication approach typical of direct-write systems. Extrinsic control over interfacial properties will provide a method for addressing aqueous phase bionanotechnolgy experimental systems in which detection, separation, transport, and handling are vital.
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Kang, Dongwoo, Taik-Min Lee, Youngman Choi, Seung-Hyun Lee, Dukkyun Yoon, Inyoung Kim, and Jeongdai Jo. "Precision Measurement and Control of Synchronization Errors in a Contact-Type Printing Machine for Fine Pattern Printing and Overlay Improvement." In ASME 2013 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/imece2013-64408.

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Next-generation patterning processes have been extensively studied recently, with a view to replacing the photo-lithographic process and to reducing production costs. For micron scale patterning, the printing process is one of major candidates. In particular, contact printing is more promising in view of the possibilities for mass production. In this process, the motion of the two printing contact surfaces should be synchronized perfectly to prevent slip and unwanted distortion in the surfaces and to make precise ink transfer between the surfaces. In this article, a force-based direct measurement method of the synchronization error is proposed, and the effect of synchronization error on the printing process is analyzed.
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