Books on the topic 'Plasma enhanced chemical vapor deposition (PECVD)'

Geiser, Juergen. Simulation of deposition processes with PECVD apparatus. Hauppauge, N.Y: Nova Science Publishers, 2011.

Lamberton, R. W. A study of the microstructure and growth of ultra-thin film amorphous hydrogenated carbon (a-C:H) prepared by plasma enhanced chemical vapour deposition (PECVD). [s.l: The Author], 1998.

Etemadi, Peyman. Plasma enhanced chemical vapor deposition of crystalline diamond films. Ottawa: National Library of Canada, 2002.

Konuma, Mitsuharu. Plasma techniques for film deposition. Harrow, U.K: Alpha Science International, 2005.

Luminous chemical vapor deposition and interface engineering. New York: Marcel Dekker, 2005.

1950-, Konuma Mitsuharu, ed. Film deposition by plasma techniques. Berlin: Springer-Verlag, 1992.

Michalski, Andrzej. Krystalizacja warstw wielofazowych z plazmy impulsowej. Warszawa: Wydawnictwa Politechniki Warszawskiej, 1987.

Prani͡avichi͡us, L. Coating technology : ion beam deposition. Warwick, R.I: Satas & Associates, 1993.

Jönsson, Martin. Investigations of plasma-enhanced CVD growth of carbon nanotubes and potential applications. Göteborg: Göteborg University, 2007.

Outlaw, R. A. Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition. Washington: NASA, 1986.

Menno N van den Donker. Plasma deposition of microcrystalline silicon solar cells: Looking beyond the glass. Jülich: Forschungszentrum Jülich GmbH, Zentralbibliothek, 2006.

Bliznakovska, Blagica. PACVD of TiN. Jülich: Forschungszentrum Jülich, 1995.

Flückiger, Roger Sylvain. Microcrystalline silicon thin films deposited by VHF plasmas for solar cell applications. Konstanz: Hartung-Gorre Verlag, 1995.

Simon, Tsuo Y., ed. Hydrogenated amorphous silicon alloy deposition processes. New York: M. Dekker, 1993.

Symposium B on Photon-Assisted Processing of Surfaces and Thin Films (1994 Strasbourg, France). Photon-assisted processing of surfaces and thin films: Proceedings of Symposium B on Photon-Assisted Processing of Surfaces and Thin Films of the 1994 E-MRS Spring Conference, Strasbourg, France, May 24-27, 1994. Amsterdam: Elsevier, 1995.

Beam technologies for integrated processing: Report of the Committee on Beam Technologies: Opportunities in Attaining Fully-Integrated Processing Systems, National Materials Advisory Board, Commission on Engineering and Technical Systems, National Research Council. Washington, D.C: National Academy Press, 1992.

Symposium on Interconnect and Contact Metallization (1997 Paris, France). Proceedings of the Symposium on Interconnect and Contact Metallization. Edited by Rathore Harzara S, Electrochemical Society. Dielectric Science and Technology Division., Electrochemical Society Electronics Division, and Electrochemical Society Electrodeposition Division. Pennington, NJ: Electrochemical Society, 1998.

(Editor), H. G. Tompkins, ed. Plasma-enhanced chemical vapor deposition. The Education Committee, American Vacuum Society, 1997.

United States. National Aeronautics and Space Administration. Scientific and Technical Information Program., ed. Numerical modeling tools for chemical vapor deposition. [Washington, D.C.]: National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program, 1992.

Plasma Techniques for Film Deposition. Alpha Science International, Ltd, 2006.

Yasuda, Hirotsugu. Luminous Chemical Vapor Deposition and Interface Engineering (Surfactant Science). CRC, 2004.

United States. National Aeronautics and Space Administration., ed. An overview of CVD processes. Washington DC: National Aeronautics and Space Administration, 1986.

Riccardo, D'Agostino, Favia Pietro, Fracassi Francesco, and NATO Advanced Study Institute on Plasma Treatments and Deposition of Polymers (1996 : Acquafredda di Maratea, Italy), eds. Plasma processing of polymers. Dordrecht: Kluwer Academic Publishers, 1997.

Giovanni, Bruno, Capezzuto Pio, and Madan A, eds. Plasma deposition of amorphous silicon-based materials. Boston: Academic Press, 1995.

E, Spear Karl, Dismukes John P, and Electrochemical Society, eds. Synthetic diamond: Emerging CVD science and technology. New York: Wiley, 1994.

Lucovsky, Gerald, Dale E. Ibbotson, and Dennis W. Hess. Characterization of Plasma-Enhanced CVD Processes: Volume 165. University of Cambridge ESOL Examinations, 2014.

Plasma Deposition and Treatment of Polymers: Symposium Held November 30-December 2, 1998, Boston, Massachusetts, U.S.A (Materials Research Society Symposium Proceedings). Materials Research Society, 1999.

Plasma Processing of Polymers (NATO Science Series E: (closed)). Springer, 1997.

P, Hopson, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch, eds. Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition. [Washington, DC]: National Aeronautics and Space Administration, Scientific and Technical Information Branch, 1986.

P, Hopson, and United States. National Aeronautics and Space Administration. Scientific and Technical Information Branch, eds. Growth of high-quality thin-film Ge single crystals by plasma-enhanced chemical vapor deposition. [Washington, DC]: National Aeronautics and Space Administration, Scientific and Technical Information Branch, 1986.

Kamleshwar, Upadhya, Minerals, Metals and Materials Society. Structural Materials Division., and Minerals, Metals and Materials Society. Electronic, Magnetic, and Photonic Materials Division., eds. Plasma and laser processing of materials. Warrendale, Pa: Minerals, Metals & Materials Society, 1991.

G, Lucovsky, Ibbotson Dale E, and Hess Dennis W, eds. Characterization of plasma-enhanced CVD processes: Symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1990.

Lucovsky, Gerald, Dale E. Ibbotson, and Dennis W. Hess. Characterization of Plasma-Enhanced Cvd Processes: Symposium Held November 27-28, 1989, Boston, Massachusetts, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 1990.

Dieleman, J., and U. K. P. Biermann. Photon-Assisted Processing of Surfaces and Thin Films. North-Holland, 1995.

André, Bouchoule, ed. Dusty plasmas: Physics, chemistry, and technological impacts in plasma processing. Chichester: Wiley, 1999.

Y, Pauleau, ed. Materials and processes for surface and interface engineering. Dordrecht: Kluwer Academic Publishers, 1995.

(US), National Research Council. High Performance Synthetic Fibers for Composites (Publication (National Research Council (U.S.)), No. 458.). National Academies Press, 1992.

S, Mathad G., Rathore Harzara S, and Arita Y, eds. Interconnect and contact metallization for ULSI: Proceedings of the international symposium. Pennington, N.J: Electrochemical Society, 2000.

Brannon, James H., Carol I. H. Asby, and Stella W. Pang. Photons and Low Energy Particles in Surface Processing: Volume 236. University of Cambridge ESOL Examinations, 2014.

Ashby, Carol H., and James H. Brannon. Photons and Low Energy Particles in Surface Processing: Symposium Held December 3-6, 1991, Boston, Massachusetts, U.S.A. (Materials Research Society Symposium Proceedings). Materials Research Society, 1992.

Ashby, Carol Iris Hill, 1953-, Brannon James H, and Pang Stella W, eds. Photons and low energy particles in surface processing: Symposium held December 3-6, 1991, Boston, Massachusetts, U.S.A. Pittsburgh, Pa: Materials Research Society, 1992.

Dim-Lee, Kwong, and Müller Heinrich G, eds. Rapid thermal and laser processing: 24-25 September 1992, San Jose, California. Bellingham, Wash., USA: SPIE, 1993.