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1

Chen, Shou-Mian. "Plasma immersion ion implantation of silicon." Thesis, University of Surrey, 1997. http://epubs.surrey.ac.uk/842893/.

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Plasma Immersion Ion Implantation has several unique advantages over conventional implantation, such as low cost, large area capability, non-line-of-sight features and high dose rate implantation. However, it is still far from use in routine production because of problems such as the ability to control the ion depth profile in targets, the ion dose and contamination. In this thesis, a PIII system has been systematically calibrated, and a computer simulation code for PIII has been developed in order to understand more clearly the physics of the PIII process and to optimise the experimental cond
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2

Allan, Scott Young. "Ion Energy Measurements in Plasma Immersion Ion Implantation." Thesis, The University of Sydney, 2009. http://hdl.handle.net/2123/5338.

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This thesis investigates ion energy distributions (IEDs) during plasma immersion ion implantation (PIII). PIII is a surface modification technique where an object is placed in a plasma and pulse biased with large negative voltages. The energy distribution of implanted ions is important in determining the extent of surface modifications. IED measurements were made during PIII using a pulse biased retarding field energy analyser (RFEA) in a capacitive RF plasma. Experimental results were compared with those obtained from a two dimensional numerical simulation to help explain the origins of featu
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3

Allan, Scott Young. "Ion Energy Measurements in Plasma Immersion Ion Implantation." The School of Physics. The Faculty of Science, 2009. http://hdl.handle.net/2123/5338.

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Doctor of Philosophy (PhD)<br>This thesis investigates ion energy distributions (IEDs) during plasma immersion ion implantation (PIII). PIII is a surface modification technique where an object is placed in a plasma and pulse biased with large negative voltages. The energy distribution of implanted ions is important in determining the extent of surface modifications. IED measurements were made during PIII using a pulse biased retarding field energy analyser (RFEA) in a capacitive RF plasma. Experimental results were compared with those obtained from a two dimensional numerical simulation to hel
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4

Oates, Thomas William Henry. "Metal plasma immersion ion implantation and deposition using polymer substrates." Connect to full text, 2003. http://hdl.handle.net/2123/571.

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Thesis (Ph. D.)--University of Sydney, 2004.<br>Title from title screen (viewed 5 May 2008). Submitted in fulfilment of the requirements for the degree of Doctor of Philosophy to the School of Physics, Faculty of Science. Degree awarded 2004; thesis submitted 2003. Includes bibliographical references. Also available in print form.
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5

Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." Thesis, The University of Sydney, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea
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6

Oates, T. W. H. "Metal plasma immersion ion implantation and deposition using polymer substrates." University of Sydney. Physics, 2003. http://hdl.handle.net/2123/571.

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This thesis investigates the application of plasma immersion ion implantation (PIII) to polymers. PIII requires that a high negative potential be applied to the surface of the material while it is immersed in a plasma. This presents a problem for insulating materials such as polymers, since the implanting ions carry charge to the surface, resulting in a charge accumulation that effectively neutralises the applied potential. This causes the plasma sheath at the surface to collapse a short time after the potential is applied. Measurements of the sheath dynamics, including the collapsing shea
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7

Kosobrodova, Elena. "Plasma Immersion Ion Implanted Polymers for Antibody Microarray Applications." Thesis, The University of Sydney, 2014. http://hdl.handle.net/2123/13676.

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A novel platform for protein microarrays with improved sensitivity and reproducibility was developed. Plasma immersion ion implantation (PIII) treated polycarbonate (PC) was used as a substrate for anti-cluster of differentiation (CD) antibody microarrays. Compared to the current industrial standard, nitrocellulose-coated glass slides, the novel platform requires a three times lower concentration of anti-CD antibodies to achieve an equivalent signal strength and has about two times better reproducibility and three times higher sensitivity. For the first time, an anti-CD antibody microarray w
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8

Bozkurt, Bilge. "Dynamic Ion Behavior In Plasma Source Ion Implantation." Master's thesis, METU, 2006. http://etd.lib.metu.edu.tr/upload/12607025/index.pdf.

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The aim of this work is to analytically treat the dynamic ion behavior during the evolution of the ion matrix sheath, considering the industrial application plasma source ion implantation for both planar and cylindrical targets, and then to de-velop a code that simulates this dynamic ion behavior numerically. If the sepa-ration between the electrodes in a discharge tube is small, upon the application of a large potential between the electrodes, an ion matrix sheath is formed, which fills the whole inter-electrode space. After a short time, the ion matrix sheath starts moving towards the cathod
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9

Tsoutas, Kostadinos Wallach. "Towards Advanced Bionics: Plasma Immersion Ion Implantation of Conductive Polypyrrole Films." Thesis, The University of Sydney, 2019. https://hdl.handle.net/2123/22624.

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This thesis investigates the use of Plasma Immersion Ion Implantation (PIII) to modify electroploymerised polypyrrole (PPy) to allow for surface covalent binding of a range of biomolecules for biofunctionalized bionic applications. Synthesis regimes were investigated, aiming to produce PPy samples with the highest degree of batch consistency, chemical homogeneity and electroactivity. Galvanostatic samples at 0.2mA proved to produce superior PPy samples. PIII of nitrogen ions into PPy was modelled using TRIM/SRIM software. The depth of the treated volume of PPy was determined, along with the u
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10

Watkins, John H. "The application of plasma immersion ion implantation to sheep shearing combs /." Title page, contents and abstract only, 1995. http://web4.library.adelaide.edu.au/theses/09PH/09phw335.pdf.

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11

Lui, So-ching, and 雷素青. "Surface bioactivity enhancement of polyetheretherketone (PEEK) by plasma immersion ion implantation." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2009. http://hub.hku.hk/bib/B43572340.

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12

Lui, So-ching. "Surface bioactivity enhancement of polyetheretherketone (PEEK) by plasma immersion ion implantation." Click to view the E-thesis via HKUTO, 2009. http://sunzi.lib.hku.hk/hkuto/record/B43572340.

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13

Michel, Thomas. "Développement de procédés d'implantation ionique par immersion plasma pour le photovoltaïque." Thesis, Aix-Marseille, 2013. http://www.theses.fr/2013AIXM4307.

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Le dopage du silicium par implantation ionique pour le photovoltaïque est une application relativement récente dont l'essor se heurte encore aujourd'hui aux coûts élevés d'intégration au sein des lignes de fabrication des cellules solaires. L'implantation ionique par immersion plasma promet de répondre aux futures exigences du secteur en termes de coûts et de productivité.Ces travaux de thèse ont permis le développement de procédés d'implantation ionique par immersion plasma de l'équipement PULSION®, conçu par IBS, dédiés à la fabrication de cellules solaires en silicium monocristallin. Dans u
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14

Ho, Joan Pui Yee. "Plasma Surface Modification of Biomedical Polymers and Metals." Thesis, The University of Sydney, 2007. http://hdl.handle.net/2123/2463.

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Biomedical materials are being extensively researched, and many different types such as metals, metal alloys, and polymers are being used. Currently used biomedical materials are not perfect in terms of corrosion resistance, biocompatibility, and surface properties. It is not easy to fabricate from scratch new materials that can fulfill all requirements and an alternative approach is to modify the surface properties of current materials to cater to the requirements. Plasma immersion ion implantation (PIII) is an effective and economical surface treatment technique and that can be used to en
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15

Ho, Joan Pui Yee. "Plasma Surface Modification of Biomedical Polymers and Metals." University of Sydney, 2007. http://hdl.handle.net/2123/2463.

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Doctor of Philosophy(PhD)<br>Biomedical materials are being extensively researched, and many different types such as metals, metal alloys, and polymers are being used. Currently used biomedical materials are not perfect in terms of corrosion resistance, biocompatibility, and surface properties. It is not easy to fabricate from scratch new materials that can fulfill all requirements and an alternative approach is to modify the surface properties of current materials to cater to the requirements. Plasma immersion ion implantation (PIII) is an effective and economical surface treatment techniq
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16

Lee, Shih-Liang. "Plasma-based modifications of synthetic vascular grafts." Thesis, University of Sydney, 2020. https://hdl.handle.net/2123/24373.

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Current clinically available synthetic vascular grafts are made from either polyethylene terephthalate (PET) or expanded polytetrafluoroethylene (ePTFE). In small diameter applications less than 6 mm, these materials are prone to high failure rates caused acutely by blood clot formation and in the mid-term by inflammatory-driven neointimal hyperplasia. A key driver of these modes of graft failure is the slow regeneration of the protective endothelial layer that lines the surface of blood vessels, impaired by the highly hydrophobic polymer surfaces and lack of appropriate biological cues. Surfa
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17

Kouadri, Boudjelthia El Amin. "Piégeage des impuretés métalliques présentes dans le silicium destiné au photovoltaïque par plasma immersion ion implantation (PIII)." Thesis, Orléans, 2012. http://www.theses.fr/2012ORLE2089.

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Malgré son grand potentiel, l’énergie photovoltaïque n’arrive pas encore à trouver une grande place dans le paysage énergétique mondial. Elle se heurte à deux problèmes de taille : le coût et le rendement. Les cellules solaires à base du silicium multicristallin (mc-Si) perdent beaucoup de leur rendement à cause de la présence des impuretés métalliques. Plusieurs recherches ont montré que les cavités induites par implantation ionique sont efficaces dans le piégeage des impuretés. Mais les techniques utilisées dans l’implantation n’ont pas permis à ce procédé de se développer dans l’industrie à
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18

Motloung, Setumo Victor. "Intense pulsed neutron generation based on the principle of Plasma Immersion Ion Implantation (PI3) technique." Thesis, University of the Western Cape, 2006. http://etd.uwc.ac.za/index.php?module=etd&action=viewtitle&id=gen8Srv25Nme4_9599_1182748458.

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<p>The development of a deuterium-deuterium/ tritium-deuterium (D-D/ D-T) pulsed neutron generator based on the principle of the Plasma Immersion Ion Implantation (PI3) technique is presented, in terms of investigating development of a compact system to generate an ultra short burst of mono-energetic neutrons (of order 1010 per second) during a short period of time (&lt<br>20&mu<br>s) at repetition rates up to 1 kHz. The system will facilitate neutron detection techniques, such as neutron back-scattering, neutron radiography and time-of-flight activation analysis.</p> <p><br /> Aspects address
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19

Chong, Yu-wah, and 莊瑜華. "In vitro and in vivo study of plasma immersion ion implantation (PIII)treated polyetheretherketone (PEEK)." Thesis, The University of Hong Kong (Pokfulam, Hong Kong), 2013. http://hub.hku.hk/bib/B4985883X.

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Polyetheretherketone (PEEK), a polymer with mechanical strength comparable to human bone, is gaining popularity in the orthopedic field because it can potentially relieve the clinical complications, such as stress shielding effect and inevitable implantation failure, which are caused by the mismatch of the mechanical strength between the current metallic implants and the implantation sites. However, it is bio-inert and requires supplementary modification. Plasma immersion ion implantation (PIII) has been well documented that it is a good way to improve the bioactivity of a biomaterial. It is
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20

Tran, Clara. "Plasma activated polymers for yeast and enzyme immobilization." Thesis, The University of Sydney, 2013. http://hdl.handle.net/2123/10127.

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This thesis investigates plasma immersion ion implantation (PIII) for immobilizing enzymes and yeast cells with the aim of developing new processes for cellulosic ethanol production. A rapid and effective immobilization of yeast cells was demonstrated on PIII treated polymer surfaces. The immobilization does not inhibit the ability of yeast cells to produce ethanol. A model was developed to describe the different mechanisms of rehydrated yeast attachment to untreated and PIII treated surfaces. Yeast cells attach to the untreated surface by hydrophobic interactions while they attach to the PII
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21

Jaichuen, C., R. Chundet, L. D. Yu, P. Thongkumkoon, and S. Anuntalabhochai. "Effect on Genetic Mutation Induction from Nano-Ranged Low-Energy Plasma Ion Bombardment of DNA and Gene Fragment." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/34948.

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22

Maury, Mathieu. "Simulation numérique de la fragmentation d'un précurseur de dopage au sein d'un réacteur d'implantation ionique par immersion plasma." Thesis, Sorbonne Paris Cité, 2015. http://www.theses.fr/2015USPCD057/document.

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Cette thèse est centrée sur le développement de modèles numériques pour simuler le comportement physique des plasmas présents dans un réacteur d'implantation ionique à immersion plasma. Ces modèles ont pour but d'estimer l'impact des réglages opérationnels du réacteur sur les paramètres plasma pertinents pour l'implantation, comme le flux ionique sur le substrat et la distribution en énergie des ions. La géométrie complexe du réacteur rend difficile sa modélisation d'un seul tenant, du fait des importants gradients temporels et spatiaux attendus pour les densités ioniques et la température éle
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23

Cheng, Xinying. "Shape Memory Polymers with Multifaceted Tunability and Bio-specificity." Thesis, The University of Sydney, 2017. http://hdl.handle.net/2123/17130.

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Shape memory polymers (SMP) have been of great interest in biomedical applications due to their unique ability to recover a primary shape by external actuation. Shape memory polyurethanes (SMPU) have also been widely studied as implant biomaterials, benefiting from the opportunity to create dual-shape, compliant, and durable materials. However, SMPU still suffer from the lack of mechanical properties and a failure to tune their biological interface prior to implantation. In this study, SMPU and carbon fibre (CF) reinforced composites for implantable biomaterials were developed, and their mecha
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24

Urbonavičius, Marius. "Titano okisdų formavimas vandens garų plazmoje." Master's thesis, Lithuanian Academic Libraries Network (LABT), 2012. http://vddb.laba.lt/obj/LT-eLABa-0001:E.02~2012~D_20120202_132623-41801.

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Šio darbo literatūros apžvalgoje aptariami plazmos tipai, plazmos charakteristikos bei sąveika su medžiaga. Aptariama plazminės implantacijos technologija. Trumpai apibūdinama vandens garų plazma ir jos panaudojimas. Apžvelgiama titano oksido struktūra bei jo panaudojimas katalizatorių gamybai, kurie gali būti skirti skaldyti vandens molekules ir gaminti vandenilį. Darbe paaiškinamas magnetroninis nusodinimas bei jo privalumai. Darbo metu buvo oksiduojamas titanas vandens garų plazmoje. Titano oksidacija priklauso nuo daugybės plazmoje vykstančių procesų (adsorbcija, sulaikymas, vakansijų susi
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25

Kaeppelin, Vincent. "Caractérisation d'une source de plasma hélicon et application à l'implantation ionique par immersion plasma." Aix-Marseille 1, 2002. http://www.theses.fr/2002AIX11027.

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Cette thèse a porté sur l'étude d'une source de plasma de type hélicon et sur l'implantation ionique par immersion plasma (IIIP). La caractérisation du réacteur s'est faite dans des plasmas d'argon à l'aide d'une sonde de Langmuir, et d'un spectromètre de masse, doté d'un secteur d'analyse en énergie. Suivant les valeurs de puissance injectée, pression de gaz et champ magnétique, trois modes de couplage distincts ont été mis en évidence : un couplage capacitif à faible puissance avec des densités comprises entre 10[9] et 10[10] cm[-3], puis avec une puissance plus élevée, un couplage inductif
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Katsifis, Georgio Andrew. "Analysis and Characterisation of Plasma Treated PEEK Scaffolds and their Implementation in Radiotherapy." Thesis, The University of Sydney, 2022. https://hdl.handle.net/2123/29503.

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Bone sarcomas are a present as tumours which occur in bones and soft tissues. Bone must often be removed during the treatment of these cancers and a replacement bone scaffold must be implanted to heal and bridge the removed tissue. Titanium stands as the most popular implant as a general orthopaedic implant due to its impressive mechanical properties and bio-compatibility. However, the high stiffness also poses problems due to the material mismatch with bone and can cause aseptic loosening at the interface, potentially leading to implant failure. In radiotherapy, titanium perturbs radiat
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27

Duchaine, Julian. "Caractérisation de l'implantation par immersion plasma avec pulsion(r) et intégration dans la fabrication de transistors FD-SOI et Trigate." Toulouse 3, 2012. http://www.theses.fr/2012TOU30197.

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L'industrie de la micro-électronique remet à jour régulièrement sa " roadmap " internationale pour ses développements technologiques. L'introduction des nouvelles filières technologiques s'accélère, motivée par les besoins en électronique portable, en ordinateurs personnels de plus en plus puissants, en télécommunications et multimédia, ainsi que par le développement maintenant très important de l'électronique dans le monde de l'automobile. Cette course à l'intégration nécessite des implantations à des énergies de plus en plus faibles et des doses de plus en plus fortes (en fonction des compos
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28

Barakel, Damien. "Implantations d'ions H+ et BF2+ dans du silicium par faisceau et immersion plasma. Application aux cellules solaires." Aix-Marseille 3, 2004. http://www.theses.fr/2004AIX30065.

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La technique d'implantation d'ions par faisceau est actuellement bien maîtrisée dans le silicium. Elle pourrait être remplacée par l'immersion dans un plasma. Dans ce travail nous examinons les effets de l'implantation à forte dose d'ions hydrogène par les deux techniques précédentes ainsi que la formation de jonctions P+-N par un plasma de BF3. Nous montrons que l'hydrogène peut former des donneurs peu profonds et que du silicium de type P est converti en type N, au voisinage de la surface implantée, à une profondeur correspondant au parcours projeté. Des plaquettes de silicium multicristalli
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29

Vervisch, Vanessa. "Etude et réalisation de jonctions ultra fines P+N par la technique d'implantation d'ions par immersion plasma. Application aux cellules photovoltaïques." Aix-Marseille 3, 2007. http://www.theses.fr/2007AIX30065.

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Ce travail présente la technique d'implantation d'ions par immersion plasma (PIII) comme un outil prometteur pour la réalisation des jonctions ultra fines (USJ). Le prototype PIII appelé PULSION® utilisé dans cette étude, a été conçu et développé par la société IBS. Les profils SIMS de bore obtenus sur des échantillons implantés par PULSION® montrent des profondeurs d'implantation variant de quelques nanomètres à une trentaine de nanomètres avant activation. Ces résultats nous ont amené à concentrer nos efforts sur l'optimisation des recuits d'activation post implantation afin d'obtenir le mei
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30

Hayes, Maxim. "Intégration de collecteurs de charges avancés dans les cellules solaires bifaciales à haut rendement : vers un procédé générique pour les nouveaux matériaux silicium." Electronic Thesis or Diss., Aix-Marseille, 2020. http://www.theses.fr/2020AIXM0519.

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L'industrie PV connaît un fort engouement pour les cellules PERC. Néanmoins leurs performances sont limitées par deux sources de recombinaison des porteurs de charge: au niveau de l'émetteur obtenu par diffusion de P, et en face arrière aux interfaces Al-Si. L'objectif principal de cette thèse vise à limiter ces pertes en intégrant deux nouveaux collecteurs. Le premier est un émetteur sélectif (ES) obtenu par implantation ionique à immersion plasma (PIII) de P. Le second concerne un contact passivé (CP) constitué d'un film de silicium polycristallin (poly-Si) dopé au B sur un oxyde mince. Dans
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Veau, Antoine. "Intégration de jonctions ultra minces avec passivation tunnel : application aux générations avancées de cellules PV silicium homojonction." Thesis, Université Grenoble Alpes, 2020. http://www.theses.fr/2020GRALT004.

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L’objectif principal de ces travaux de thèse est d’étudier des voies d’améliorations pour la fabrication du dopage n+ utilisé comme zone d’émetteur dans les cellules PV industrielles en silicium cristallin (c-Si). La technique d’implantation ionique par immersion plasma (PIII) permet un contrôle précis des profils de dopage des zones implantées. L'influence de la dose d'implantation et de la température de recuit d'activation des dopants sur les profils de dopage fabriqués sur des substrat c-Si de type p ont d'abord été étudiées. Ces dopages ont été intégrés en tant qu'émetteur dans des cellul
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32

Walia, Rashi. "Solid-Hydrogel Hybrid Structural Materials for Biomedical Devices and Applications." Thesis, The University of Sydney, 2022. https://hdl.handle.net/2123/29549.

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Hybrid combinations of hydrogels and solid materials allow a high level of functionality for devices such as tissue engineering scaffolds and soft machines. This thesis reports a versatile strategy to develop mechanically robust solid-hydrogel hybrid materials using surface embedded radicals generated through plasma immersion ion implantation (PIII) of polymeric surfaces. Acrylamide and silk hydrogels were formed on PIII activated polytetrafluoroethylene (PTFE), polyethylene (PE) and polystyrene (PS) surfaces without any external crosslinking agents or initiators. X-ray photoelectron spectrosc
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Assmann, Andre. "AÇO DUPLEX LDX 2101 SUBMETIDO À NITRETAÇÃO POR IMPLANTAÇÃO IÔNICA, IMPLANTAÇÃO IÔNICA POR IMERSÃO EM PLASMA E DESCARGA LUMINOSA: PROPRIEDADES MECÂNICAS E TRIBOLÓGICAS." UNIVERSIDADE ESTADUAL DE PONTA GROSSA, 2011. http://tede2.uepg.br/jspui/handle/prefix/890.

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Made available in DSpace on 2017-07-21T19:26:00Z (GMT). No. of bitstreams: 1 Andre Assmann.pdf: 3125745 bytes, checksum: 38854736eae2fcc4e8c2c21a2668f387 (MD5) Previous issue date: 2011-04-27<br>Coordenação de Aperfeiçoamento de Pessoal de Nível Superior<br>In the present work showing the results on mechanical and tribological properties of duplex stainless steel LDX2101 nitriding by Ion Implantation (II), Plasma Immersion Ion Implantation (PI3) and Glow Discharge (GD). Nitrogen ion implantation was performed at room temperature and 350 C. The nitrogen fluencies were combined to obtain an a
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Oliveira, Willian Rafael de. "INFLUÊNCIA DOS PARÂMETROS DE IMPLANTAÇÃO IÔNICA POR IMERSÃO EM PLASMA NA EFICIÊNCIA DA NITRETAÇÃO DO AÇO INOXIDÁVEL SUPER DUPLEX." UNIVERSIDADE ESTADUAL DE PONTA GROSSA, 2016. http://tede2.uepg.br/jspui/handle/prefix/858.

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Made available in DSpace on 2017-07-21T19:25:52Z (GMT). No. of bitstreams: 0 Previous issue date: 2016-03-10<br>This work aimed at study the correlation of variables in a plasma immersion ion implantation (PIII) system, as well as their synergistic combination for the nitriding of the UNS S32750 super duplex stainless steel ( SD 2507). The research comprised two phases, as follows. (i) Study of the system. The interconnection of variables, namely voltage (V), pulse width (L), frequency (f) and current (I), were systematically analyzed with respect to the cathode heating. A mathematical formu
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Venhaus, Thomas Joseph. "Plasma source ion implantation of high voltage electrodes." W&M ScholarWorks, 2000. https://scholarworks.wm.edu/etd/1539623981.

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Field emission and breakdown characteristics of high voltage, large area electrodes determine the performance of many vacuum-based electron sources. A corroborative project with the Thomas Jefferson National Accelerator Facility involves studying the behavior of such electrodes after nitrogen ion implantation. A Plasma Source Ion Implantation (PSII) facility is designed and constructed at William and Mary, and used to treat stainless steel electrodes. PSII is a novel implantation technique developed at the University of Wisconsin-Madison. A workpiece is submerged in a quiescent plasma of the s
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Fu, King Yu. "Plasma implantation and deposition for advanced materials surface modification /." access full-text access abstract and table of contents, 2005. http://libweb.cityu.edu.hk/cgi-bin/ezdb/thesis.pl?phd-ap-b19887310a.pdf.

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Thesis (Ph. D.)--City University of Hong Kong, 2005.<br>"Submitted to Department of Physics and Materials Sciences in partial fulfillment of the requirements for the degree of Philosophy of Doctor." Includes bibliographical references.
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Nassar, Rafat Mohammad. "A new tritium monitor design based on plasma source ion implantation technique." Thesis, University of St Andrews, 1997. http://hdl.handle.net/10023/13373.

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Tritium is an important isotope of hydrogen. The availability of tritium in our environment is manifest through both natural and artificial sources. Consequently, the requirement for tritium handling and usage will continue to increase in the future. An important future contributor is nuclear fusion power plants and facilities. Essential safety regulations and procedures require effective monitoring and measurements of tritium concentrations in workplaces. The unique characteristics of tritium impose an important role on the criteria for its detection and measurement. As tritium decays by the
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Arab, Zeinab. "Plasma based ion implantation and plasma hydrogenation of silicon for photovoltaics : influence on the electrical properties." Poitiers, 2009. http://www.theses.fr/2009POIT2263.

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This report reviews the history, the present status and possible future developments of photovoltaic industry. The base material in this domain is crystalline silicon. Although c-Si is not the optimal material from a solid state physics point of view it dominates the market and will continue to do this. A considerable part of this study deals with quality improvement of crystalline silicon via passivation by hydrogenation and hydrogen implantation (PBII). Some conventional in-line implantation has also been performed in order to compare these two implantation methods. Mono crystalline p-type (
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Batocki, Regiane Godoy de Santana [UNESP]. "Implantação iônica por imersão em plasma - IIIP - de argônio, nitrogênio e hélio em hexametildissilazano polimerizado a plasma." Universidade Estadual Paulista (UNESP), 2009. http://hdl.handle.net/11449/103743.

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Made available in DSpace on 2014-06-11T19:32:50Z (GMT). No. of bitstreams: 0 Previous issue date: 2009-11-27Bitstream added on 2014-06-13T20:04:23Z : No. of bitstreams: 1 batocki_rgs_dr_guara.pdf: 753160 bytes, checksum: 45bdf421ee548b969fb254971bfe730c (MD5)<br>Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)<br>Filmes finos polimerizados a plasma apresentam várias aplicações nas indústrias óticas, elétrica, mecânica de alimentos, de biomateriais entre outras, devido suas interessantes propriedades químicas e físicas. No entanto, as aplicações para os filmes finos podem s
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Batocki, Regiane Godoy de Santana. "Implantação iônica por imersão em plasma - IIIP - de argônio, nitrogênio e hélio em hexametildissilazano polimerizado a plasma /." Guaratinguetá : [s.n.], 2009. http://hdl.handle.net/11449/103743.

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Resumo: Filmes finos polimerizados a plasma apresentam várias aplicações nas indústrias óticas, elétrica, mecânica de alimentos, de biomateriais entre outras, devido suas interessantes propriedades químicas e físicas. No entanto, as aplicações para os filmes finos podem ser limitadas em função de algumas de suas características mecânicas e de superfície. Neste trabalho, filmes finos poliméricos foram depositados por radiofrequência a partir de plasmas de hexametildissilazano mantido a baixa pressão. Posteriormente, foram implantados íons de argônio, hélio e nitrogênio nestes filmes através da
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Tuckute, S., and L. L. Pranevicius. "Separation of Hydrogen from Water Molecules by Ion Implantation into Thin Ti Films." Thesis, Sumy State University, 2012. http://essuir.sumdu.edu.ua/handle/123456789/35410.

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The potential of hydrogen as primary gas source has generated considerable interest in hydrogen separation technologies. In the present work, the method of ion implantation has been used to separate hydrogen from energetic water molecules penetrating into Ti films. According to the results of the present study, the technique and method of implantation are capable of splitting water molecular ions into their constituent atoms with accommodation of oxygen and hydrogen atoms in interstitials of Ti film. The experimental distribution profiles are fitted with the simulated results based on the
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Meyer, Kevin Alan. "Development of a plasma source ion implantation facility for the modification of materials' surfaces." Doctoral thesis, University of Cape Town, 2001. http://hdl.handle.net/11427/6538.

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Bibliography: p. 197-203.<br>In Plasma Source Ion Implantation high energy [10-50 keV] plasma ions are implanted into materials to modify surface properties, achieving surface hardening, increased wear and corrosion resistance. Plasma Source Ion Implantation is alos used for doping semiconductors and could form an essential step in the manufacture of multilayered wafers. This thesis describes the development and construction of the plasma implantation facility at the Materials Research Group of the Naitonal Accelerator Centre; in particular, the development of the Plasma Assisted Materials Mod
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LE, COEUR FREDERIC. "Décharges excitées à la résonance cyclotronique électronique distribuée et générateurs à transformateur d'imulsions pour implantation ionique par immersion plasma." Grenoble INPG, 1999. http://www.theses.fr/1999INPG0127.

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La technique d'implantation ionique par immersion plasma (piii) consiste a appliquer a un substrat conducteur plonge dans le plasma des impulsions negatives haute tension. Les ions positifs presents dans le plasma sont alors acceleres vers la surface du substrat ou ils sont implantes. Les principaux avantages de la technique piii par rapport a l'implantation par faisceau d'ions sont de pouvoir traiter facilement des formes complexes ou des grandes surfaces, et de preparer les surfaces sous bombardement ionique de faible energie avant l'etape d'implantation. Par contre, la selection des ions en
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Marot, Laurent. "Développement d'un nouveau système d'implantation ionique en immersion plasma et analyses des processus de nitruration." Phd thesis, Université de Poitiers, 2001. http://tel.archives-ouvertes.fr/tel-00003632.

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L'objectif de ce travail était double : le développement d'un réacteur d'implantation par immersion plasma et l'analyse des mécanismes de nitruration. En ce qui concerne la nitruration des aciers, nous avons montré que des traitements de nitruration au potentiel flottant à des températures aussi basses que 300 °C étaient réalisables dans le réacteur URANOS avec des longueurs de diffusion de plusieurs centaines de microns. Pour les aciers faiblement alliés, les diffusions réalisées à 380 °C, conduisent à une amélioration notable des propriétés mécaniques de surface. Ainsi la dureté de surface e
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Fouquet, Valérie. "Etude des mécanismes d'implantation et diffusion lors de la nitruration du titane et de Ti-6Al-4V par implantation ionique en immersion plasma." Poitiers, 2004. http://www.theses.fr/2004POIT2271.

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L'objectif de ce travail est d'étudier les mécanismes d'implantation et de diffusion lors de la nitruration du titane et de Ti-6Al-4V par implantation ionique en immersion plasma. Des études chimiques et microstructurales ont permis de préciser les caractéristiques des phases formées selon les conditions de traitements. A basse température, le processus d'implantation est le mécanisme principal de formation des nitrures tandis qu'à haute température, la part de la diffusion thermique devient prédominante. Une résolution numérique de la première loi de Fick a permit de conclure que, grâce aux d
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Vempaire, David. "Modification des propriétés magnétiques de couches minces de nickel et de manganèse et réalisation de microstructures magnétiques par implantation ionique en immersion plasma." Université Joseph Fourier (Grenoble), 2004. http://www.theses.fr/2004GRE10252.

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Nous avons tout d'abord etudie le depot de couches minces de manganese et de nickel sur silicium 100 par pulverisation ionique assistee par plasma micro-onde mul tidipolaire. Les couches de nickel et de manganese deposees ont ensuite ete implantees par de l'azote en utilisant la technique d'implantation ionique en immersion plasma assistee par plasma micro-onde decr. Cette technique nous a permis de synthetiser les nitrures ni3n et mn4n malgre la metastabilite du ni3n et la forte reactivite chimique a l'oxygene du manganese. Nous avons ensuite implante de l'azote dans une double couche ni sur
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Renaud, Justine. "Application des faisceaux d'ions focalisés à la création de centres NV du diamant. Caractérisation de ces faisceaux d'ions issus d'une source plasma." Thesis, Université Paris-Saclay (ComUE), 2019. http://www.theses.fr/2019SACLN027.

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Depuis plus de 45 ans, les colonnes à faisceaux d'ions focalisés FIB à base de source à métal liquide (Ga) sont utilisées pour l'élaboration, la modification ou l'analyse de nanostructures. Beaucoup plus récemment, moins de 10 ans, les sources plasma sont intégrées dans les FIB afin de répondre aux besoins d'analyse de défaillance mais également de préparation d'échantillons. Ce marché des FIB plasma est en forte progression ces derniers années et s'accompagne d'une amélioration permanente des spécifications de cette technologie encore jeune. Il est donc nécessaire de caractériser au mieux ces
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Kapser, Stefan [Verfasser], Rudolf [Akademischer Betreuer] Neu, Rudolf [Gutachter] Neu, and Johannes [Gutachter] Barth. "Deuterium Permeation Through Tungsten Driven by Plasma-Based Low-Energy Ion Implantation / Stefan Kapser ; Gutachter: Rudolf Neu, Johannes Barth ; Betreuer: Rudolf Neu." München : Universitätsbibliothek der TU München, 2018. http://d-nb.info/1176107046/34.

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Liao, Jiunn-Der. "Modifications physico-chimiques et mécaniques du polyéthylène et du polypropylène par implantation ionique, plasma micro-ondes,bombardement d'électrons et irradiation gamma." Grenoble INPG, 1995. http://www.theses.fr/1995INPG4202.

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La surface d'une polyolefine traitee par plasma micro-ondes ou par faible dose d'implantation ionique d'azote devient mouillable. Pour obtenir des peroxydes polarisables sur une polyolefine, un traitement par plasma d'argon de courte duree est suffisant. Les analyses xps couplees avec les resultats obtenus en resonance paramagnetique electronique, par decomposition des peroxydes, par mesures de mouillabilite et par l'exploitation des spectres actifs en infrarouge ont montre que les structures oxydees, formees par differentes techniques de traitement, jouent un role important pour interpreter l
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Basso, Rodrigo Leonardo de Oliveira. "Efeito do carbono no processo de nitrocarburização com plasma pulsado da liga metálica AISI H13." [s.n.], 2007. http://repositorio.unicamp.br/jspui/handle/REPOSIP/277746.

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Orientador: Fernando Alvarez<br>Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin<br>Made available in DSpace on 2018-08-11T05:33:37Z (GMT). No. of bitstreams: 1 Basso_RodrigoLeonardodeOliveira_D.pdf: 34307948 bytes, checksum: fd2817ddc7e94a48942bf4136fdb0472 (MD5) Previous issue date: 2007<br>Resumo: Este trabalho apresenta um estudo sobre os efeitos da incorporação de carbono e nitrogênio na formação de uma camada monofásica, compacta e homogênea, composta por carbonitretos do tipo e -Fe2-3(C,N), na superfície da liga metálica AISI H13. Também são apre
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