Relevant bibliographies by topics / Plasma screen

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  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'Plasma screen'

Author: Grafiati
Published: 4 June 2021
Last updated: 11 February 2022

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Journal articles on the topic "Plasma screen"

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OKI Electric Europe GmbH. "25 in plasma screen." Displays 13, no. 4 (October 1992): 213. http://dx.doi.org/10.1016/0141-9382(92)90096-a.

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Murakami, Hiroshi. "Large-screen color plasma display." JOURNAL OF THE ILLUMINATING ENGINEERING INSTITUTE OF JAPAN 80, Appendix (1996): 327–28. http://dx.doi.org/10.2150/jieij1980.80.appendix_327.

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Bell, T., and C. X. Li. "Active screen plasma nitriding of materials." International Heat Treatment and Surface Engineering 1, no. 1 (January 2007): 34–38. http://dx.doi.org/10.1179/174951407x169231.

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Li, C. X. "Active screen plasma nitriding – an overview." Surface Engineering 26, no. 1-2 (February 2010): 135–41. http://dx.doi.org/10.1179/174329409x439032.

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Nishimoto, Akio, and Kunishige Nakazawa. "Active Screen Plasma Nitriding of Titanium Alloy Using Titanium Double Screen." Materials Science Forum 891 (March 2017): 11–17. http://dx.doi.org/10.4028/www.scientific.net/msf.891.11.

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The low hardness and poor tribological performance of titanium alloys restrict their wide applications in automotive fields. Nitriding is widely used to improve tribological properties, wear resistance, and corrosion resistance of steel and titanium alloys. Plasma nitriding is becoming increasingly popular because of its high nitrogen potential, short treatment time, and low environmental impact. Recently, considerable interest has been devoted to alternative nitriding methods such as active screen plasma nitriding (ASPN). In this study, a Ti-6Al-4V titanium alloy was nitrided by ASPN using a titanium double screen in order to investigate the effect of applying the double screen on the microstructure of the nitriding layer. The Ti-6Al-4V sample was placed on the sample stage in a cathodic potential. A titanium double screen was mounted on the cathodic stage around the sample stage. The sample was treated for 1-25 hours at 600oC under 200 Pa in 75% N2 + 25% H2 atmosphere. After nitriding, glow discharge optical emission spectroscopy (GD-OES) revealed that the thickness of the nitriding layer composed of TiN tended to increase with increasing the nitriding time. The Vickers microhardness of the sample surface nitrided for 25 hours reached approximately 1300 HV. Ball-on-disk wear test revealed that a wear loss of nitrided sample considerably decreased than that of untreated sample.
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Țugui, Cătălin Andrei, Mihai Axinte, Carmen Nejneru, Petrică Vizureanu, Manuela Cristina Perju, and Daniela Lucia Chicet. "Active Screen Plasma Nitriding Efficiency and Ecology." Applied Mechanics and Materials 657 (October 2014): 369–73. http://dx.doi.org/10.4028/www.scientific.net/amm.657.369.

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Plasma nitriding has significant advantages: very low running costs (reduced consumption of energy and gases); optimized structure and layers; and nitriding of stainless steels. Plasma nitriding is totally safe and has no poisonous gas emissions and no negative environmental impact. However, conventional plasma nitriding has a number of well-known difficulties, including the direct application of plasma on the parts to be treated, the risk of arcing, hollow cathodes, white layers, non-homogenous batch temperature and the impossibility to mix parts of different geometries in the chamber made this technology to be almost forgotten. In the last years, due to the ecofriendly character of the technology, several atempts were made in order to establish an improvement in this technique in terms of batch damages. Active screen plasma nitriding technology is a new industrial solution that enjoys all the advantages of traditional plasma nitriding but does not have its inconveniences. A comparative study regarding quality surface and formed layer properties between conventional plasma nitriding and active screen plasma nitriding was conducted, in order to highlight the advantages that comes with this relatively new technique.
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Li, C. X., T. Bell, and H. Dong. "A Study of Active Screen Plasma Nitriding." Surface Engineering 18, no. 3 (June 2002): 174–81. http://dx.doi.org/10.1179/026708401225005250.

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Hamann, S., K. Börner, I. Burlacov, H.-J. Spies, and J. Röpcke. "Spectroscopic diagnostics of active screen plasma nitriding processes: on the interplay of active screen and model probe plasmas." Journal of Physics D: Applied Physics 48, no. 34 (August 5, 2015): 345204. http://dx.doi.org/10.1088/0022-3727/48/34/345204.

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Venturini, L. F. R., F. B. Artuso, I. da F. Limberger, and C. de S. Javorsky. "Differences in nitrided layer between classic active screen plasma nitriding and active screen plasma nitriding with hemispherical cathodic cage." International Heat Treatment and Surface Engineering 6, no. 1 (March 2012): 19–23. http://dx.doi.org/10.1179/174951411x13203192450269.

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Kovács, Dorina, Annamária Szabó, and Alexandra Kemény. "The Role of the Material of Active Screen During the Plasma Nitriding Process." Acta Materialia Transylvanica 3, no. 1 (April 1, 2020): 20–25. http://dx.doi.org/10.33924/amt-2020-01-04.

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AbstractIn this research the effect of the active screen’s material was investigated. 42CrMo4 steel was plasma nitrided with unalloyed steel, titanium and nickel active screen at 490 and 510 °C for 4h in 75 % N2 + 25 % H2 gas mixture. Scanning electron microscopy (SEM), energy dispersive spectrometry (EDS) and X-ray photoelectron spectroscopy (XPS) were used for the characterisation of the surface properties. Iron-nitride was not formed on the surface with nickel screen. The evaluation of examination results showed that most of the detected nitrogen was molecular (N2) in the formed layer.
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Dissertations / Theses on the topic "Plasma screen"

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Hubbard, Paul, and paul hubbard@rmit edu au. "Characterisation of a Commercial Active Screen Plasma Nitriding System." RMIT University. Applied Physics, 2008. http://adt.lib.rmit.edu.au/adt/public/adt-VIT20090212.161932.

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Nitriding is a plasma based processing technique that is used to improve the surface properties of components and products in many areas including the aerospace, automotive and biomedical industries to name a few. Active Screen Plasma Nitriding (ASPN) is a relatively new nitriding technique which has potential advantages over the more traditional nitriding techniques such as Direct Current (DC) plasma nitriding where high substrate biases can be problematic. However, there is considerable debate as to the mechanism for nitriding in ASPN. This thesis focuses on investigating the mechanism for nitriding in a commercial ASPN system. Commercial ASPN treatments of nitrideable alloy steels were found to be unsatisfactory unless a sufficient bias was applied. The level of bias required to produce a satisfactory nitriding response, in terms of the cross sectional hardness, was found to depend on the concentration of strong alloy nitride forming elements present in the steel. Although active screen material was found to be transferred to the workload, no evidence was found that this process played a significant role in enhancing the nitriding response. The primary mechanism for nitrogen mass transfer in ASPN was found to be dependent on the active screen/workload separation distance. When this separation is small (less than approximately 10cm for the conditions used in this study) then nitrogen mass transfer in the form of energetic ions or neutrals can occur between the active screen and the workload. This allows samples to be treated without a substrate bias. On the other hand, when the active screen/workload separation distance is large (greater than approximately 10cm) as is normally the case in a commercial environment, this mechanism for nitrogen mass transfer breaks down and a substrate bias is essential. In this latter case, nitrogen ions attracted to the workload using a bias is the primary nitrogen mass transfer mechanism and the role of the active screen is primar ily to uniformly heat the workload.
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Fu, Xin. "Active screen plasma surface modification of polymeric materials for biomedical application." Thesis, University of Birmingham, 2012. http://etheses.bham.ac.uk//id/eprint/3514/.

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Surface modification of polymers has long been known in polymer chemistry but has not yet been widely applied to biomaterials. A newly developed active screen plasma technology has a potential to treat such non-conductive materials as polymers to improve their surface properties since this is a low-temparature, low cost and environmentally friendly plasma process. in this project, three kind of polymeric materials, ultra high molecular weight polyethylene, polyurethane and polycaprolacton, were surface modified using active screen plasma nitriding technology. The results demonstrated that it is feasible to conduct plasma surfae modification of polymeric materials using the newly developed active-screen plasma technology without causing any etching, significant sputtering or other surface damage. Changes in chemical composition and structure have been found an all three polymeric materials' surface following active screen plasma surface treatments. Crosslinking or/and new functional groups are formed on the topmost surface layer after the treatment. Along with changes in surface morphologies and structural, the wettability of the surface of all three polymeric materials can also be effectively improved by the active screen plasma nitriding treatments. Active-screen plasma nitriding technique is an effective and practical method to improve osteoblast cell adhesion and spreading on all three polymeric materials' surface.
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Kaklamani, Georgia. "The effect of active screen plasma nitriding on the cellular compatibility of polmeric biomaterials." Thesis, University of Birmingham, 2012. http://etheses.bham.ac.uk//id/eprint/3844/.

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Active Screen Plasma Nitriding (ASPN) is a novel surface engineering technique, the main advantage of which is the capacity to treat homogeneously all kind of materials surfaces of any shape. Here, ASPN is used to modify the surface properties of ionomer glasses and polymers in order to improve the surface cellular compatibility of these materials. A conventional DC nitriding unit has been used together with an AS experimental arrangement. The materials that were treated were an ionomer glass composition and UHMWPE. All treated/untreated samples were seeded with the 3T3 fibroblasts. In order to identify the effect of the plasma treatment, chemical and mechanical properties characterization was conducted. For the cellular samples, SEM, Interferometry, AFM and MTT assay were conducted in order to observe cells’ behavior on the untreated and treated materials. The inert surface of the untreated glass showed good interaction with fibroblasts only after the ASPN treatment which resulted in enhanced fibroblasts attachment and proliferation. The treatment temperature, the length of treatment and the presence of nitrogen had an influence on the surface properties of glass. UHMWPE treated samples chemical characterization showed the formation of C-N and N-H groups resulting in an increase of the functionality of treated surfaces. 3T3 fibroblasts cell culture studies showed that the ASPN treatment had a positive effect on the adhesion and proliferation of cells according to the time of treatment and the increase of the nitrogen concentration in the gas mixture. As a conclusion ASPN treatment can be a very effective method to modify inorganic and organic polymeric surfaces in order to improve cellular compatibility.
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Corujeira, Gallo Santiago. "Active screen plasma surface engineering of austenitic stainless steel for enhanced tribological and corrosion properties." Thesis, University of Birmingham, 2009. http://etheses.bham.ac.uk//id/eprint/275/.

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Low temperature plasma surface engineering has been a useful method for increasing the hardness and wear resistance of austenitic stainless steel without reducing the corrosion resistance of this alloy. Plasma carburising is of particular interest as it produces thicker hardened layers than plasma nitriding, and an equivalent improvement in the tribological and corrosion performance of the base material. In this project, the active screen (AS) plasma technique was used to carburise austenitic stainless steel AISI 316 and the obtained layer of carbon expanded austenite was compared with the one produced by conventional DC plasma treatments. The hardening and wear resistance produced by AS and DC plasma carburising were equivalent. With regard to corrosion, the AS treated material performed better than its DC counterpart as a consequence of the improved surface quality of the former. The mechanism of AS carburising was comparatively studied with its AS nitriding counterpart. Different experimental arrangements and two plasma diagnostic techniques were used for this purpose: optical emission spectroscopy and electrostatic probes. The evidence shows that AS nitriding relies on the deposition of iron nitrides and the active species in the plasma to produce hardening, whilst AS carburising requires the plasma activation and moderate ion bombardment.
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Forouzandeh, Farhad, and s2007552@student rmit edu au. "Development of Hartmann Screen Test for Measurement of Stress during Thin Film Deposition." RMIT University. Applied Sciences, 2008. http://adt.lib.rmit.edu.au/adt/public/adt-VIT20080731.144206.

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The Hartmann screen test (HST) is a well-known technique that has been used for many years in optical metrology. This thesis describes how the technique has been adapted to create a system for continuous in situ monitoring of the internal stress in thin films during plasma deposition. Stress is almost always present in thin films. Stress can affect the physical properties of film, and also influence phenomena which are important in the technology of thin film manufacture such as adhesion and crystallographic defects. For these reasons, it is very important to control and manage the film stress during manufacture of devices based on thin films. The commonest way to infer stress is to measure the change in substrate curvature that it produces. This is often done by comparison of substrate curvatures before and after deposition with surface profilometry, or interferometry. However, these methods are unsuitable for implementing during film deposition in the vacuum chamber. A novel method for measuring changes in curvature of the thin film substrate in situ has been developed, making use of the HST. An expanded laser beam is passed through a screen containing a number of small apertures, which breaks it up into several rays. After reflecting from the surface of the thin film wafer, the rays are received on an array detector as a spot pattern. Image processing is performed on the recorded spot images to determine the positions of spots accurately. Spot centre positions are recorded at start of deposition as a reference, then their displacement is tracked with time during deposition. The spot deflections are fitted to a theoretical model, in which the change in sample profile is described by a second-order surface. The principal axes of curvature of this surface and their orientation are obtained by a least-squares fitting procedure. From this, the thin film stress can be inferred and monitored in real time. Equipment using this technique has been designed and developed in prototype form for eventual use in the RMIT cathodic arc deposition facility. First experiments with a classic Hartmann screen configuration proved that the technique gave good results, but precision was limited by diffraction and interference effects in the recorded image which made determination of spot centres more difficult. A modified configuration was developed, in which a camera is focused on the Hartmann screen, giving much sharper spot patterns and improved resolution. Tests on the prototype system and comparison with other techniques have shown that it is possible to determine changes in sample curvature with a precision of approximately 0.01 m-1. This corresponds to stress changes of around 0.5 GPa for typical wafer and film thicknesses used in practice. The Hartmann screen test is straightforward to use and to interpret. Image processing and analysis of the recorded spot patterns can be automated and performed continuously in real time during thin film deposition. The system promises to be very useful for monitoring stress and thus controlling the deposition process for improved quality of thin film manufacture.
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Oliveira, Leonardo Fonseca. "Estudo da nitretação a plasma com tela ativa e potencial flutuante para o aço rápido ASTM M2." reponame:Biblioteca Digital de Teses e Dissertações da UFRGS, 2017. http://hdl.handle.net/10183/178734.

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No presente trabalho foi investigada a nitretação a plasma do aço rápido ASTM M2 utilizando diferentes configurações, envolvendo as técnicas convencional e com tela ativa. Na técnica convencional, o material a ser nitretado atua como o cátodo do sistema, sendo coberto diretamente pela bainha da descarga luminescente. Nos tratamentos conduzidos com a técnica de tela ativa, uma estrutura de tela em formato cilíndrico atua como cátodo e o material a ser nitretado é posicionado no seu interior. Neste novo processo, como não há potencial elétrico externo aplicado aos substratos, a descarga luminescente se desenvolve apenas na estrutura da tela, evitando problemas intrínsecos do método convencional de nitretação a plasma. Todos os tratamentos investigados foram executados com os seguintes parâmetros: Temperatura de 500 °C, mistura gasosa composta 76% de volume de gás nitrogênio e 24% de volume de gás hidrogênio e pressão de 3 milibar. Para os tratamentos com tela ativa, os substratos foram mantidos eletricamente isolados. Os resultados foram comparados observando a diferença de método de nitretação (com e sem o uso de tela ativa) e a influência do tempo de tratamento (variando sua duração em 1, 4 e 8 horas) Todos os experimentos foram realizados utilizando uma fonte de potência de tensão retificada aplicada na tela ou nas amostras, dependendo da configuração. Adicionalmente, para o tempo de nitretação de 4 horas uma fonte de potência com tensão pulsada também foi aplicada. As amostras nitretadas foram caracterizadas por ensaios de rugosidade, ensaios de dureza e microdureza, microscopia ótica, microscopia eletrônica de varredura e difração de raios-X. Ensaios tribológicos para avaliação da resistência ao desgaste das diferentes condições de tratamento foram conduzidos. Dentre os principais resultados foi observada uma clara diferença na profundidade de camada nitretada, que foi sempre mais profunda nos tratamentos convencionais. Apesar de formadas camadas menos profundas, as amostras nitretadas oriundas dos tratamentos com tela ativa demonstraram melhor desempenho nos ensaios tribológicos, resultando em taxas de desgaste até sete vezes inferior do que as amostras do nitretadas convencionalmente, este resultado foi atribuído a não formação da zona de compostos nas amostras nitretadas com tela ativa.
In the present work an investigation on the plasma nitriding of ASTM M2 High-Speed Steel using different configurations was carried out, involving traditional and active screen techniques. In the traditional technique, the material to be nitrided act as the system cathode, being directly covered by the glow discharge sheath. In the active screen treatments, a cylindrical mesh structure (screen) plays the role of the cathode and the material to be nitrided is positioned in its interior. In this new process, as there is no external electric potential applied to the specimens, the glow discharge develops only in the screen structure, avoiding intrinsic problems from the conventional plasma nitriding method. All the studied treatments were carried out with the following parameters: temperature of 500 °C, gas mixture of 76 vol.-% N2 and 24 vol.-% H2 and pressure of 3 millibar. For the active screen treatments, the samples were kept electrically insulated. The results were compared observing the differences in the nitriding method (with and without the use of active screen) and the nitriding time influence (varying its duration in 1, 4 and 8 hours) All experiments were carried using a rectified voltage power supply applied to the screen or to the samples, depending on the configuration. Additionally, for the nitriding time of 4 hours a pulsed voltage power supply was also employed. The nitrided samples were characterized by roughness tests, hardness and microhardness tests, optical microscopy and scanning electron microscopy, X-ray diffraction. Tribological tests to evaluate the wear resistance of the different treatment conditions were also carried out. Among the main results a clear difference in the case layer depth was noticed, which was always deeper in the conventional treatments. Although forming shallower case depths, the active screen nitrided specimens presented better performance in the tribological tests, resulting in wear rates up to seven times lower than the wear rate for conventionally plasma nitrided samples, this result was assigned due to the non-formation of compound layer in the active screen plasma nitrided samples.
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McFarlane, Heather Elizabeth 1983. "Isolation and characterization of SOS5 in a novel screen for plasma membrane to cell wall adhesion genes in Arabidopsis thaliana." Thesis, McGill University, 2008. http://digitool.Library.McGill.CA:80/R/?func=dbin-jump-full&object_id=116116.

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Although dynamic interactions between plant cells and their environment require adhesion between the cell wall (CW) and the plasma membrane (PM), few plant adhesion molecules have been identified. Therefore, the seed coat mucilage secretory cells (MSCs) of Arabidopsis thaliana (which undergo developmentally regulated changes in adhesion) were developed into a novel model system to study PM-CW adhesion. Twenty-seven candidate genes were identified using data from publicly available and seed-specific microarrays. Mutant plants for these genes were screened for defects in adhesion via plasmolysis, and for changes in MSC morphology that may result from defective adhesion (Chapter 1). Two fasciclin-like arabinogalactan proteins were isolated in this screen. One of these, SOS5, was characterized in detail (Chapter 2). sos5 mutants are sensitive to hyperosmotic conditions and show defects in PM-CW adhesion and MSC mucilage structure. Interestingly, these phenotypes may be attributed to defects in adhesion or to defects in cell wall deposition.
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Hirech, Abdelhamid. "Diagnostics et modélisation d'une cellule de panneau à plasma couleur." Toulouse 3, 1997. http://www.theses.fr/1997TOU30291.

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Ce travail presente l'etude des diagnostics et de la modelisation d'une cellule de panneau a plasma (pap) alternatif couleur. Il a ete effectue en etroite collaboration avec la societe thomson tubes electroniques, en vue de l'amelioration des performances du pap. Deux etudes complementaires sont a la base de ce memoire. La premiere experimentale, consiste dans les etudes electriques et emissives de la decharge luminescente dans les panneaux a plasma couleur de type sandwich. Parallelement, nous avons developpe en seconde etude, un modele numerique afin de decrire le fonctionnement d'une cellule de panneau a plasma. L'etude experimentale a porte sur l'analyse spectroscopique dans l'ultraviolet lointain (vuv) des decharges des melanges binaires neon-xenon et neon-krypton et ternaires neon-krypton-xenon. En appliquant des signaux electriques alternatifs appropries a ses bornes, une decharge electrique s'amorce pendant un temps relativement court. Cette decharge electrique entraine la formation d'un plasma qui emet de la lumiere ultraviolette. Nous avons egalement calcule la puissance electrique consommee par le panneau lors de la decharge. Sa connaissance est absolument necessaire pour evaluer son rendement. Pour decrire le fonctionnement d'une cellule de pap, nous avons developpe un modele numerique hybride auto-coherent : fluide monte-carlo pour avoir acces au comportement hors equilibre de la decharge. On obtient egalement, pour des conditions initiales quelconques, les marges de fonctionnement, les variations spatio-temporelle des particules chargees et des especes excitees. Le modele donne aussi le bilan energetique et le rendement vuv de la decharge. Ces deux etudes, experimentale et numerique, ont aussi pour objectif de controler des parametres tel que la pression totale et la composition de melange de gaz rare ainsi que l'influence des parametres de transport (emission secondaire, coefficient d'ionisation, mobilite des ions,. . . Etc. ) sur les caracteristiques electriques, emissives et energetiques de la decharge. Les experiences effectuees et l'utilisation du modele ont permis de rechercher les conditions optimales de fonctionnement du pap. Les resultats experimentaux sont en bon accord avec ceux obtenus par le modele numerique.
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Smith, Rachel Jean. "Screens to find novel genes involved in pole plasm formation in Drosophilia melanogaster." Thesis, University of Cambridge, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.624546.

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Cluts, Jordan Dean. "Understanding and Control of Coupling of Supersonic Twin Jets Using Localized Arc Filament Plasma Actuators." The Ohio State University, 2018. http://rave.ohiolink.edu/etdc/view?acc_num=osu152555508900912.

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Books on the topic "Plasma screen"

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Moran, Gráinne. The antibody screen: Plasma v serum. [S.l: The Author], 1994.

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Buchaklian, Adam H., and David P. Dimmock. Citrin Deficiency. Oxford University Press, 2016. http://dx.doi.org/10.1093/med/9780199972135.003.0018.

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Citrin deficiency is an inborn error of metabolism that appears to affect both the urea cycle and energy generation. Worldwide, citrin deficiency is likely one of the commonest inborn errors of metabolism, 60,000–80,000 individuals are estimated to have citrin deficiency in China alone. Children typically present with an abnormal newborn screen or neonatal intrahepatic cholestasis with citrin deficiency (NICCD). Adults typically present clinically with neuropsychiatric symptoms, hepatic dysfunction and hyperammonemia. As plasma amino acids typically show an elevated citrulline at the time of crisis, this presentation is known as citrullinemia type II (CTLN2). Without therapy, cases may progress to liver failure. Individuals may also suffer recurrent pancreatitis. In contrast to other urea cycle defects, the treatment for citrin deficiency requires a high protein, low carbohydrate diet. Acute hyperammonemia responds to arginine therapy. Sodium pyruvate has been reported to provide benefit. In addition many cases will require restriction of galactose. Liver transplant fully corrects the CTLN2 phenotype.
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Abhishek, Abhishek, and Michael Doherty. Investigations of calcium pyrophosphate deposition. Oxford University Press, 2016. http://dx.doi.org/10.1093/med/9780199668847.003.0051.

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Joint aspiration and microscopic examination of the aspirated synovial fluid remains the gold standard for the diagnosis of calcium pyrophosphate crystal deposition (CPPD). If synovial fluid aspiration is not feasible, plain radiography and/or ultrasound scanning may be used to detect chondrocalcinosis (CC) which predominantly occurs due to calcium pyrophosphate (CPP) crystals, and this can be used as a diagnostic surrogate for CPPD as suggested by the EULAR Task Force. Acute CPP crystal arthritis often associates with a brisk acute phase response (elevated C-reactive protein (CRP) and/or erythrocyte sedimentation rate (ESR), plasma viscosity) and neutrophilia. A mildly raised CRP and/or ESR may be present in chronic CPP crystal inflammatory arthritis. On the contrary, asymptomatic CC, or CPPD with osteoarthritis does not cause raised acute phase reactants. As CPPD most commonly occurs due to increasing age and osteoarthritis, investigations to screen for underlying metabolic abnormalities should be carried out in those with early-onset CPPD (under 55 years), or in those with florid polyarticular CC. As hyperparathyroidism gets more common with ageing its presence should be specifically sought in all age groups. Tests for other predisposing metabolic conditions should only be carried out in the presence of specific clinical features. Genotyping for mutations, especially in the ANKH gene, may be warranted in those with a family history of premature CPPD and no evidence of inherited metabolic predisposition, but such testing is unavailable to most clinicians.
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Wells, Elizabeth M. Anti-N-Methyl-D-Aspartate Receptor Encephalitis. Oxford University Press, 2017. http://dx.doi.org/10.1093/med/9780199937837.003.0091.

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Anti- N-methyl-D-aspartate receptor (NMDAR) encephalitis is a severe but treatable recently identified form of immune-mediated encephalitis associated with antibodies in serum and cerebrospinal fluid (CSF) against the GluN1 subunit of the NMDAR. Research has rapidly expanded the understanding of disease mechanisms and how the condition manifests in different populations (e.g., pediatrics vs. adult, cancer vs. noncancer, male vs. female). Immunocytochemical, physiological, and molecular studies of the effects of human CSF on the rodent and murine brain in vitro and in vivo indicate a noncytotoxic antibody-mediated mechanism of disease pathogenesis. Finding positive antibodies prompts a search for occult neoplasm, most likely ovarian teratoma in young women; other age groups and male patients are less likely to have tumor but need to be screened. Fifty percent of patients respond to first line steroids, IVIG, plasma exchange or a combination, and many others improve with addition of rituximab or cyclophosphamide. Cured patients may have cognitive or motor sequelae, and refractory disease and death may occur despite treatment. Knowledge about etiology and biomarkers of refractory disease are lacking. Additional work is needed to further elucidate the origin of the immune-mediated response, to determine optimal clinical management and develop effective therapies for refractory patients.
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Book chapters on the topic "Plasma screen"

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Aghajani, Hossein, and Sahand Behrangi. "Active Screen Plasma Nitriding." In Plasma Nitriding of Steels, 127–59. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-43068-3_4.

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Nishimoto, Akio, Kimiaki Nagatsuka, Ryota Narita, Hiroaki Nii, and Katsuya Akamatsu. "Effect of Gas Pressure on Active Screen Plasma Nitriding Response." In 18th International Federation for Heat Treatment and Surface Engineering, 327–35. 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959: ASTM International, 2011. http://dx.doi.org/10.1520/stp49441t.

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Nishimoto, Akio, Kimiaki Nagatsuka, Ryota Narita, Hiroaki Nii, and Katsuya Akamatsu. "Effect of Gas Pressure on Active Screen Plasma Nitriding Response." In 18th International Federation for Heat Treatment and Surface Engineering, 327–35. 100 Barr Harbor Drive, PO Box C700, West Conshohocken, PA 19428-2959: ASTM International, 2011. http://dx.doi.org/10.1520/stp153220120023.

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Kim, Kwang-Seok, Woo-Ram Myung, and Seung-Boo Jung. "Atmospheric-Pressure Plasma Sintering of Silver Nanopaste Screen-Printed on PI." In Supplemental Proceedings, 87–94. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2012. http://dx.doi.org/10.1002/9781118357002.ch12.

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Eremenko, Arkadiy, Il'ya Kurochkin, and Nataliya Nechaeva. "Bioanalytical systems based on cholinesterases for detection of organophosphates." In ORGANOPHOSPHORUS NEUROTOXINS, 205–18. ru: Publishing Center RIOR, 2020. http://dx.doi.org/10.29039/32_205-218.

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Various types of electrochemical sensors based on the inhibition of butyrylcholinesterase (BChE) have been presented for the analysis of organophosphates (OPC). A special design of thick film sensors and electrochemical detector for cholinesterases assay and their inhibitors in aqueous samples has been developed. For this assay, thiol sensitive sensors based on screen printed graphite electrode modified with nanoparticles of manganese dioxide were used. High sensitivity of manganese dioxide modified thick film sensors towards thiocholine and therefore low detection limit of BChE (1 pM) enabled their use for subnanomolar detection of an organophosphate pesticide diazinon, and other irreversible inhibitors of BChE. This work also presents modern innovative approach for the analysis of BChE by Raman spectroscopy. New SERS-substrates based on silver paste for sensitive quantification of BChE activity were obtained, characterized and applied to thiocholine detection, with LOD (TCh) being 260 nM. Real samples of human plasma were analyzed; a good correlation between spectrophotometric detection and Raman detection was shown. The developed technique is inexpensive and easy-to-use and has promising potential for analysis of OPC.
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Eremenko, Arkadiy, Il'ya Kurochkin, and Nataliya Nechaeva. "Bioanalytical systems based on cholinesterases for detection of organophosphates." In Organophosphorous Neurotoxins, 0. ru: Publishing Center RIOR, 2020. http://dx.doi.org/10.29039/chapter_5e4132b6096d14.18045940.

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Various types of electrochemical sensors based on the inhibition of butyrylcholinesterase (BChE) have been presented for the analysis of organophosphates (OPC). A special design of thick film sensors and electrochemical detector for cholinesterases assay and their inhibitors in aqueous samples has been developed. For this assay, thiol sensitive sensors based on screen printed graphite electrode modified with nanoparticles of manganese dioxide were used. High sensitivity of manganese dioxide modified thick film sensors towards thiocholine and therefore low detection limit of BChE (1 pM) enabled their use for subnanomolar detection of an organophosphate pesticide diazinon, and other irreversible inhibitors of BChE. This work also presents modern innovative approach for the analysis of BChE by Raman spectroscopy. New SERS-substrates based on silver paste for sensitive quantification of BChE activity were obtained, characterized and applied to thiocholine detection, with LOD (TCh) being 260 nM. Real samples of human plasma were analyzed; a good correlation between spectrophotometric detection and Raman detection was shown. The developed technique is inexpensive and easy-to-use and has promising potential for analysis of OPC.
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Chung, H. K., S. B. Hansen, and H. A. Scott. "Generalized Collisional Radiative Model Using Screened Hydrogenic Levels." In Modern Methods in Collisional-Radiative Modeling of Plasmas, 51–79. Cham: Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-27514-7_3.

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Tomassetti, Mauro, Elisabetta Martini, Luigi Campanella, Gabriele Favero, Gabriella Sanzò, and Franco Mazzei. "Atrazine Determination Using Immunosensor Method Based on Surface Plasmon Resonance. Comparison with Two Other Immunological Methods Based on Screen-Printed and Classical Amperometric Devices." In Lecture Notes in Electrical Engineering, 65–69. Cham: Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-09617-9_12.

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Giannetti, Anthony M., Houston N. Gilbert, Donald P. Huddler, Mac Reiter, Chris Strande, Keith E. Pitts, and Brandon J. Bravo. "CHAPTER 2. Getting the Most Value from Your Screens: Advances in Hardware, Software, and Methodologies to Enhance Surface Plasmon Resonance Based Fragment Screening and Hit-to-Lead Support." In Fragment-Based Drug Discovery, 19–48. Cambridge: Royal Society of Chemistry, 2015. http://dx.doi.org/10.1039/9781782620938-00019.

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"Plasma Display Screen." In Basic TV Technology, 57–58. Routledge, 2012. http://dx.doi.org/10.4324/9780080499901-27.

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Conference papers on the topic "Plasma screen"

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BENEDICT, LANCE, WAYLAND GRIFFITH, WILLIAM YANTA, W. SPRING, III, and CHRISTOPHERF BOYD. "Quantification of vapor screen analysis." In 22nd Fluid Dynamics, Plasma Dynamics and Lasers Conference. Reston, Virigina: American Institute of Aeronautics and Astronautics, 1991. http://dx.doi.org/10.2514/6.1991-1691.

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Ochmann, Lukas, Moh'd M. Amro, Bernd Gronde, Gundula Fischer, Silke Weber, and Dirk Martin. "Development of Plasma Sprayed Coatings to Improve the Erosion Resistance of Wire Wrapped Screens." In International Petroleum Technology Conference. IPTC, 2021. http://dx.doi.org/10.2523/iptc-21158-ms.

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Abstract The installation of sand screens in wells can fail in one of two ways: by causing an unacceptable high pressure drop in the near wellbore area or by losing the ability to retain particles. Four mechanisms can lead to a failure: plugging, corrosion, erosion and mechanical deformation. To increase the lifetime under erosive conditions, a coating for wire wrapped screens was developed and tested. Erosion occurs, when formation particles hit the screen surface with high velocities or by continuous production of fines through the screen openings. The screen openings must keep a specified size in order to control the formation sand or gravel pack. If the opening size increases due to erosion, more particles are produced and erosion increases. A newly developed coating is put on the outside (i.e. facing the formation) of standard wire wrapped screens to make the slots resistant against erosion. The coating consists of ceramic or hard metal and is applied by plasma spraying. An extensive development and verification program was conducted to guarantee defined slot widths, corrosion resistance and mechanical strength of coating and screen. A test facility was built to investigate the erosion resistance of sand screens. It consists of a flow loop to circulate a slurry of water and particles through 2″ coupons. Samples of standard wire wrapped, metal mesh and coated screens were tested. The tests were conducted with flow velocities of up to 18.5 m/s and particles of up to 100 micrometer for up to 60 h. The screens where compared under consideration of optical criteria, mass loss and functionality. The coated screens showed no sign of wear on the outside and kept their initial slot size. The slots of uncoated wire wrapped screens more than doubled in some places, when eroded under the same conditions. To test the functionality of the samples, sand retention tests were conducted before and after erosion. Since there were no changes in slot width, the coated screens show the same retention capabilities before and after erosion, while metal mesh screens that were eroded under the same conditions lost their ability to retain sand. The newly developed coating improves the resistance against erosion, is able to withstand corrosive well environments and has mechanical properties suitable to be safely installed in any well. Therefore the coating has the ability to improve the lifetime of screens under erosive conditions.
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Oskirko, Vladimir, Igor Goncharenko, Artem Pavlov, Alexander Zakharov, Sergey Rabotkin, and Alexander Grenadyorov. "Active Screen Hydrogen Free Plasma Nitriding Steel." In 2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE). IEEE, 2020. http://dx.doi.org/10.1109/efre47760.2020.9242122.

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Chung, Shen Shou Max, Je Wei Lan, and Shiaw Hwei Chen. "Shielding effectiveness of low temperature plasma screen." In 2009 IEEE Pulsed Power Conference (PPC). IEEE, 2009. http://dx.doi.org/10.1109/ppc.2009.5386137.

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Awamoto, Kenji, Manabu Ishimoto, Hitoshi Hirakawa, and Tsutae Shinoda. "Progress in Large Screen Plasma Display and New Approach for Extra-large Screen System with Plasma Tube Technology." In Conference Record of the 2006 IEEE Industry Applications Conference Forty-First IAS Annual Meeting. IEEE, 2006. http://dx.doi.org/10.1109/ias.2006.256599.

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Szilágyi Bíró, Andrea, and Miklós Tisza. "Active Screen Plasma Nitriding of Case Hardening Steels." In MultiScience - XXXI. microCAD International Multidisciplinary Scientific Conference. University of Miskolc, 2017. http://dx.doi.org/10.26649/musci.2017.075.

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Mujahid, Zaka-ul-Islam. "Measurement of time-resolved plasma parameters in an active screen plasma nitriding system." In THE SIXTH SAUDI INTERNATIONAL MEETING ON FRONTIERS OF PHYSICS 2018 (SIMFP2018). Author(s), 2018. http://dx.doi.org/10.1063/1.5042403.

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MURAVIEVA, N. V., YU V. TOKAREV, G. N. BOIKO, E. YU RYNDYK, and M. L. KAISER. "DOUBLE SCREEN TRANSITION EFFECTS IN NEAR EARTH PLASMA TURBULENCE STUDYING." In 5th Experimental Chaos Conference. WORLD SCIENTIFIC, 2001. http://dx.doi.org/10.1142/9789812811516_0039.

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Axinte, M., P. Vizureanu, C. Nejneru, A. V. Sandu, and M. C. Perju. "Surface quality improvements using active screen in plasma nitriding technology." In PROCEEDINGS OF ADVANCED MATERIAL, ENGINEERING & TECHNOLOGY. AIP Publishing, 2020. http://dx.doi.org/10.1063/5.0023854.

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Yu, Jun, Jun Chen, S. Z. Deng, and N. S. Xu. "Post Treatment of Screen-Printed Carbon Nanotubes Emitter by Plasma Etching." In 2006 19th International Vacuum Nanoelectronics Conference. IEEE, 2006. http://dx.doi.org/10.1109/ivnc.2006.335220.

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Reports on the topic "Plasma screen"

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Lambert, Michael Allen. Field simulation of axisymmetric plasma screw pinches by alternating-direction-implicit methods. Office of Scientific and Technical Information (OSTI), June 1996. http://dx.doi.org/10.2172/410408.

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Arnett, Clint, Justin Lange, Ashley Boyd, Martin Page, and Donald Cropek. Expression and secretion of active Moringa oleifera coagulant protein in Bacillus subtilis. Engineer Research and Development Center (U.S.), August 2021. http://dx.doi.org/10.21079/11681/41546.

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Cationic polypeptide proteins found in the seeds of the tropical plant Moringa oleifera have coagulation efficiencies similar to aluminum and ferric sulfates without their recalcitrant nature. Although these proteins possess great potential to augment or replace traditional coagulants in water treatment, harvesting active protein from seeds is laborious and not cost-effective. Here, we describe an alternative method to express and secrete active M. oleifera coagulant protein (MO) in Bacillus subtilis. A plasmid library containing the MO gene and 173 different types of secretory signal peptides was created and cloned into B. subtilis strain RIK1285. Fourteen of 440 clones screened were capable of secreting MO with yields ranging from 55 to 122 mg/L of growth medium. The coagulant activity of the highest MO secreting clone was evaluated when grown on Luria broth, and cell-free medium from the culture was shown to reduce turbidity in a buffered kaolin suspension by approximately 90% compared with controls without the MO gene. The clone was also capable of secreting active MO when grown on a defined synthetic wastewater supplemented with 0.5% tryptone. Cell-free medium from the strain harboring the MO gene demonstrated more than a 2-fold reduction in turbidity compared with controls. Additionally, no significant amount of MO was observed without the addition of the synthetic wastewater, suggesting that it served as a source of nutrients for the effective expression and translocation of MO into the medium.
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