Relevant bibliographies by topics / Polymer-bound-PAG resist

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Conference papers

Academic literature on the topic 'Polymer-bound-PAG resist'

Author: Grafiati
Published: 4 June 2021
Last updated: 2 February 2022

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'Polymer-bound-PAG resist.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "Polymer-bound-PAG resist"

1

Tarutani, Shinji, Hiroshi Tamaoki, Hideaki Tsubaki, et al. "Characterizing Polymer bound PAG Type EUV Resist." Journal of Photopolymer Science and Technology 24, no. 2 (2011): 185–91. http://dx.doi.org/10.2494/photopolymer.24.185.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Wang, Mingxing, Cheng-Tsung Lee, Clifford L. Henderson, and Kenneth Gonsalves. "Fullerene Grafted Photoacid Generator (PAG) Bound Polymer Resists." Journal of Photopolymer Science and Technology 21, no. 6 (2008): 747–51. http://dx.doi.org/10.2494/photopolymer.21.747.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Yamamoto, Hiroki, Takahiro Kozawa, and Seiichi Tagawa. "Study on dissolution behavior of polymer-bound and polymer-blended photo acid generator (PAG) resists by using quartz crystal microbalance (QCM) method." Microelectronic Engineering 129 (November 2014): 65–69. http://dx.doi.org/10.1016/j.mee.2014.07.019.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Wang, Mingxing, Cheng-Tsung Lee, Clifford L. Henderson, Wang Yueh, Jeanette M. Roberts, and Kenneth E. Gonsalves. "Novel Anionic Photoacid Generators (PAGs) and Photoresists for sub 50 nm Patterning by EUVL and EBL." MRS Proceedings 961 (2006). http://dx.doi.org/10.1557/proc-0961-o11-04.

Full text
Abstract:
ABSTRACTA new series of anionic photoacid generators (PAGs), and corresponding polymers were prepared. The thermostability of PAG bound polymers was superior to PAG blend polymers. PAG incorporated into the polymer main chain may improve acid diffusion compared with the PAG blend polymers, which was demonstrated by Extreme Ultraviolet lithography (EUVL) results: the fluorine PAG bound polymer resist gave 45 nm (1:1), 35 nm (1:2), 30 nm (1:3) and 20 nm (1:4) Line/Space as well as 50 nm (1:1) elbow patterned, showed better resolution than the blend sample.
APA, Harvard, Vancouver, ISO, and other styles

Dissertations / Theses on the topic "Polymer-bound-PAG resist"

1

Lee, Cheng-Tsung. "Development and advanced characterization of novel chemically amplified resists for next generation lithography." Diss., Atlanta, Ga. : Georgia Institute of Technology, 2008. http://hdl.handle.net/1853/31758.

Full text
Abstract:
Thesis (Ph.D)--Chemical Engineering, Georgia Institute of Technology, 2009.<br>Committee Chair: Clifford L. Henderson; Committee Member: Dennis W. Hess; Committee Member: Joseph W. Perry; Committee Member: Laren M. Tolbert; Committee Member: William J. Koros. Part of the SMARTech Electronic Thesis and Dissertation Collection.
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "Polymer-bound-PAG resist"

1

Tamaoki, Hiroshi, Shinji Tarutani, Hideaki Tsubaki, et al. "Characterizing polymer bound PAG-type EUV resist." In SPIE Advanced Lithography, edited by Robert D. Allen and Mark H. Somervell. SPIE, 2011. http://dx.doi.org/10.1117/12.879394.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Gronheid, Roel, Alessandro Vaglio Pret, Benjamen Rathsack, et al. "EUV RLS performance tradeoffs for a polymer bound PAG resist." In SPIE Advanced Lithography, edited by Robert D. Allen. SPIE, 2010. http://dx.doi.org/10.1117/12.847489.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Iwashita, Jun, Taku Hirayama, Kensuke Matsuzawa, Yoshiyuki Utsumi, and Katsumi Ohmori. "Out-of-band insensitive polymer-bound PAG for EUV resist." In SPIE Advanced Lithography, edited by Patrick P. Naulleau and Obert R. Wood II. SPIE, 2012. http://dx.doi.org/10.1117/12.916355.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Yamamoto, Hiroki, Takahiro Kozawa, and Seiichi Tagawa. "Study on dissolution behavior of polymer-bound and polymer-blended photo-acid generator (PAG) resists." In SPIE Advanced Lithography, edited by Mark H. Somervell. SPIE, 2013. http://dx.doi.org/10.1117/12.2011636.

Full text
APA, Harvard, Vancouver, ISO, and other styles
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography