Academic literature on the topic 'Pulsed laser deposition (PLD)'

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Journal articles on the topic "Pulsed laser deposition (PLD)"

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Niemczyk, Moszyński, Jędrzejewski, Kwiatkowski, Piwowarczyk, and Baranowska. "Chemical Structure of EVA Films Obtained by Pulsed Electron Beam and Pulse Laser Ablation." Polymers 11, no. 9 (2019): 1419. http://dx.doi.org/10.3390/polym11091419.

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Poly(ethylene-co-vinyl acetate) (EVA) films were deposited for the first time using physical methods. The chemical structure of the films obtained using two techniques, pulsed electron beam deposition (PED) and pulsed laser deposition (PLD), was studied by attenuated total reflection Fourier infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectroscopy (XPS). Whilst significant molecular degradation of the EVA films was observed for the PLD method, the original macromolecular structure was only partially degraded when the PED technique was used, emphasizing the superiority of the PED m
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RAO, M. C. "PULSED LASER DEPOSITION — ABLATION MECHANISM AND APPLICATIONS." International Journal of Modern Physics: Conference Series 22 (January 2013): 355–60. http://dx.doi.org/10.1142/s2010194513010362.

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Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates. At high laser flux, the material is typically converted to a plasma. Usually, laser ablation refers to removing material with a pulsed laser, but it is possible to ablate material with a continuous wave laser beam if the laser intensity is high enough. In general, the method of pulsed laser deposition (PLD) is simple. Only few parameters need to be controlled during the process. Targets
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Hubler, Graham K. "Pulsed Laser Deposition." MRS Bulletin 17, no. 2 (1992): 26–29. http://dx.doi.org/10.1557/s0883769400040586.

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Research on materials grown by pulsed laser deposition, or PLD, has experienced phenomenal growth since late 1987 when T. Venkatesan (one of the authors for this issue) and co-workers pointed out that extreme nonequilibrium conditions created by pulsed laser melting of YBaCuO allowed in-situ preparation of thin films of this high transition temperature (Tc) superconducting material. Since then, PLD has emerged as the primary means for high throughput deposition of high-quality superconducting thin films for research and devices. This probably came as no surprise to J.T. Cheung (another of this
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Deng, Ying, Anthony Pelton, and R. A. Mayanovic. "Comparison of Vanadium Oxide Thin Films Prepared Using Femtosecond and Nanosecond Pulsed Laser Deposition." MRS Advances 1, no. 39 (2016): 2737–42. http://dx.doi.org/10.1557/adv.2016.311.

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ABSTRACTPulsed laser deposition (PLD) is a technique which utilizes a high energy pulsed laser ablation of targets to deposit thin films on substrates in a vacuum chamber. The high-intensity laser pulses create a plasma plume from the target material which is projected towards the substrate whereupon it condenses to deposit a thin film. Here we investigate the properties of vanadium oxide thin films prepared utilizing two variations of the pulsed laser deposition (PLD) technique: femtosecond PLD and nanosecond PLD. Femtosecond PLD (f-PLD) has a significantly higher peak intensity and shorter d
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Wang, Yuxuan, Bin Zou, Bruno Rente, Neil Alford, and Peter K. Petrov. "Deposition of Nanocrystalline Multilayer Graphene Using Pulsed Laser Deposition." Crystals 13, no. 6 (2023): 881. http://dx.doi.org/10.3390/cryst13060881.

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The wide application of graphene in the industry requires the direct growth of graphene films on silicon substrates. In this study, we found a possible technique to meet the requirement above. Multilayer graphene thin films (MLG) were grown without a catalyst on Si/SiO2 using pulsed laser deposition (PLD). It was found that the minimum number of laser pulses required to produce fully covered (uninterrupted) samples is 500. This number of laser pulses resulted in samples that contain ~5 layers of graphene. The number of layers was not affected by the laser fluence and the sample cooling rate af
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ZHAO, YAFAN, CHUANZHONG CHEN, MINGDA SONG, JIE MA, and DIANGANG WANG. "EFFECTS OF TECHNICAL PARAMETERS ON THE PULSED LASER DEPOSITED FERROELECTRIC FILMS." Surface Review and Letters 13, no. 05 (2006): 687–95. http://dx.doi.org/10.1142/s0218625x06008669.

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Pulsed laser deposition (PLD), which is a novel technique in producing thin films in the recent years, shows unique advantages for the deposition of ferroelectric films. Effects of technical parameters on the pulsed laser deposited ferroelectric films, including substrate temperature, oxygen pressure, post-annealing, buffer layer, target composition, energy density, wavelength, target-to-substrate distance, and laser pulse rate, are systematically reviewed in order to optimize these parameters. Processing-microstructure-property relationships of ferroelectric films by PLD are discussed. The ap
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Cotell, Catherine M., and Kenneth S. Grabowski. "Novel Materials Applications of Pulsed Laser Deposition." MRS Bulletin 17, no. 2 (1992): 44–53. http://dx.doi.org/10.1557/s0883769400040616.

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The successful use of pulsed laser deposition (PLD) to fabricate thin film superconductors has generated interest in using the technique to deposit thin films of other materials. The compositional fidelity between laser target and deposited film and the ability to deposit films in reactive gas environments make the PLD process particularly well suited to the deposition of complex multicomponent materials. Cheung and Sankur recently provided an excellent review of the PLD field, including a table of over 100 elements, inorganic and organic compounds, andsuperlattices that have been laser evapor
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Thyen, Laurenz, Daniel Splith, Max Kneiß, Marius Grundmann, and Holger von Wenckstern. "Masked-assisted radial-segmented target pulsed-laser deposition: A novel method for area-selective deposition using pulsed-laser deposition." Journal of Vacuum Science & Technology A 41, no. 2 (2023): 020801. http://dx.doi.org/10.1116/6.0002275.

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We introduce a novel technique, masked-assisted radial-segmented target pulsed-laser deposition (MARS-PLD) for unprecedented capabilities in area-selective physical vapor deposition. The MARS-PLD setup consists of a conventional PLD chamber with mechanical feedthrough for a laterally movable mask or mask set. By this means and, in principle, the arbitrary choice of a shadow mask layout, any desired area on a substrate can be masked in order to create multinary lateral and vertical material composition gradients using radially segmented targets already described in the literature [Kneiß et al.,
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Bulai, Georgiana, Oana Pompilian, Silviu Gurlui, et al. "Ge-Sb-Te Chalcogenide Thin Films Deposited by Nanosecond, Picosecond, and Femtosecond Laser Ablation." Nanomaterials 9, no. 5 (2019): 676. http://dx.doi.org/10.3390/nano9050676.

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Ge-Sb-Te thin films were obtained by ns-, ps-, and fs-pulsed laser deposition (PLD) in various experimental conditions. The thickness of the samples was influenced by the Nd-YAG laser wavelength, fluence, target-to-substrate distance, and deposition time. The topography and chemical analysis results showed that the films deposited by ns-PLD revealed droplets on the surface together with a decreased Te concentration and Sb over-stoichiometry. Thin films with improved surface roughness and chemical compositions close to nominal values were deposited by ps- and fs-PLD. The X-ray diffraction and R
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Dumitrescu, Luminita Nicoleta, Eusebiu-Rosini Ionita, Ruxandra Birjega, et al. "Kaolinite Thin Films Grown by Pulsed Laser Deposition and Matrix Assisted Pulsed Laser Evaporation." Nanomaterials 12, no. 3 (2022): 546. http://dx.doi.org/10.3390/nano12030546.

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In this work, thin films of lamellar clays were deposited by laser techniques (matrix assisted pulsed laser evaporation (MAPLE) and pulsed laser deposition (PLD)). The focus of this paper is the optimization of deposition parameters for the production of highly oriented crystalline films. The films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM). Contact angle measurements were employed to identify the wetting properties of the deposited thin films. Hydrophobic to superhydrophilic films
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Dissertations / Theses on the topic "Pulsed laser deposition (PLD)"

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Krogstad, Hedda Nordby. "Deposition of Thin Film Electrolyte by Pulsed Laser Deposition (PLD) for micro-SOFC Development." Thesis, Norges teknisk-naturvitenskapelige universitet, Institutt for materialteknologi, 2012. http://urn.kb.se/resolve?urn=urn:nbn:no:ntnu:diva-19017.

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Optimalization of PLD deposition of YSZ for micr-SOFC electrolyte applications by varying deposition pressure and target-substrate distance.Substrate used was Si-based chips and wafers (large area PLD), and the substrate temperature was held at 600. Dense films were obtained at 20 mTorr.
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Jenderka, Marcus. "Pulsed Laser Deposition of Iridate and YBiO3 Thin Films." Doctoral thesis, Universitätsbibliothek Leipzig, 2017. http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-219334.

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Die vorliegende Arbeit befasst sich mit dem Dünnfilmwachstum der ternären Oxide Na2IrO3, Li2IrO3, Y2Ir2O7 und YBiO3. All diesen oxidischen Materialien ist gemein, dass sie Verwirklichungen sogenannter Topologischer Isolatoren oder Spin-Flüssigkeiten sein könnten. Diese neuartigen Materiezustände versprechen eine zukünftige Anwendung in der Quantencomputation, in magnetischen Speichern und in elektrischen Geräten mit geringer Leistungsaufnahme. Die Herstellung der hier gezeigten Dünnfilme ist daher ein erster Schritt zur Umsetzung dieser Anwendungen in der Zukunft. Alle Dünnfilme werden mittels
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Kawwam, Mohammad. "Pulsed Laser Deposition and Structural Analysis of Crystalline CuO and GaN Thin Films." Thesis, Lyon 1, 2014. http://www.theses.fr/2014LYO10007.

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Cette thèse présente les résultats expérimentaux relatifs à l'étude des couches de GaN et de CuO déposées par la technique PLD (dépôt par laser à impulsions) sur des substrats de saphir, SrTiO3, quartz et MgO. Nous avons étudié les effets de plusieurs paramètres qui jouent sur la cristallisation et la morphologie des surfaces des films déposés, à savoir, la température du substrat, la pression au fond, la distance entre le substrat et la cible, la densité d'énergie du laser et la position du substrat. Les couches ont été caractérisées par XRD, microscopie à force atomique et Le microscope élec
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Farrell, Ian Laurence. "Growth of Metal-Nitride Thin Films by Pulsed Laser Deposition." Thesis, University of Canterbury. Physics and Astronomy, 2010. http://hdl.handle.net/10092/5011.

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The growth of thin-film metal nitride materials from elemental metal targets by plasma-assisted pulsed laser deposition (PLD) has been explored and analysed. A new UHV PLD growth system has been installed and assembled and its system elements were calibrated. A series of GaN thin films have been grown to calibrate the system. In-situ RHEED indicated that the films were single crystal and that growth proceeded in a three-dimensional fashion. SEM images showed heavy particulation of film surfaces that was not in evidence for later refractory metal nitride films. This may be connected to the fac
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Zhao, Yue. "Fabrication and characterization of superconducting PLD MgB2 thin films." Access electronically, 2005. http://www.library.uow.edu.au/adt-NWU/public/adt-NWU20060719.121046/index.html.

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Jiang, Ge. "Preparation and Characteristics of Bi0.5Na0.5TiO3 based Lead-Free thin films by Pulsed Laser Deposition." Thesis, KTH, Skolan för elektroteknik och datavetenskap (EECS), 2018. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-247872.

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Lead-based piezoelectric materials, such as PbZrxTi1-xO3 (PZT), have attracted considerable attention and have been widely used in actuators, sensors and transducers due to their excellent electric properties. However, considering the toxicity of lead and its oxides, environmentally friendly lead-free piezoelectric materials are attracting more attention as potential replacements for PZT. Among them, Bi0.5Na0.5TiO3 (BNT)-based materials exhibit good electrical properties and electromechanical coupling response. In this work, the 0.97Bi0.5Na0.5TiO3-0.03BiAlO3 (BNTBA) thin films (~120 nm thickne
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Hardie, Graham Lyall. "Techniques for enhancing the PLD growth of superconducting YBCO thin films." Thesis, Stellenbosch : Stellenbosch University, 2014. http://hdl.handle.net/10019.1/96096.

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Thesis (MEng)--Stellenbosch University, 2014.<br>ENGLISH ABSTRACT: High Temperature Superconductors (HTS) exhibit exceptional electrical properties that make them attractive candidates for numerous electronic devices and applications. However, constructing working devices can be challenging due to fabrication difficulties of these brittle ceramics. This thesis investigates new methods to make the fabrication of high quality YBa2Cu3O7 (YBCO) thin films easier and compatible with more materials. We present the development of a universal add-on method that can be used in situ to improve the
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Wu, Yi Sun. "Fabrication of in-situ MgB₂ thin films on Al₂O₃ substrate using off-axis PLD technique." Access electronically, 2007. http://www.library.uow.edu.au/adt-NWU/public/adt-NWU20080917.103857/index.html.

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Stock, François. "Traitements laser UV de couches de carbone amorphe adamantin (DLC) obtenues par ablation laser pulsée (PLD) : application à la synthèse d'électrodes transparentes." Thesis, Strasbourg, 2019. http://www.theses.fr/2019STRAD035.

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L'un des grands défis que les technologies d'affichage (LCD, OLeds…), dispositifs optoélectroniques et photovoltaïques devront affronter dans le futur est de trouver une alternative à l'utilisation d’oxydes conducteurs transparents tel l’oxyde d’indium-étain (ITO). Le graphène, un matériau 2D conducteur et transparent à base de carbone apparait comme une alternative attractive à l’ITO. Cependant, son transfert sur grandes surfaces est complexe et délicat à mettre en œuvre. Dans cette étude, une fine couche mince de carbone adamantin (DLC : Diamond-Like Carbon) est déposée par ablation laser pu
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Madaci, Ismail. "Croissance épitaxiale de films minces de Fe3O4 sur ZnO par PLD : une perspective pour la spintronique." Electronic Thesis or Diss., université Paris-Saclay, 2023. http://www.theses.fr/2023UPAST170.

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Ce travail de doctorat s'inscrit dans ledomaine de la science des matériaux pourl'électronique de spin. Notre objectif est de maîtriserla croissance épitaxiale du semi-métal Fe3O4, ayantune densité d'états entièrement polarisée, sur dessubstrats semi-conducteurs en ZnO, possédant unelongue cohérence de spin (dans la gamme dumicromètre). La combinaison réussie "Fe3O4/ZnO"constitue la première fondation nécessaire pour desétudes physiques sur l'injection de spin dans lesdispositifs. Dans ce travail, des réalisations notablesont été obtenues, en particulier les processus réussisde croissance épit
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Books on the topic "Pulsed laser deposition (PLD)"

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Eason, Robert, ed. Pulsed Laser Deposition of Thin Films. John Wiley & Sons, Inc., 2006. http://dx.doi.org/10.1002/0470052120.

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Eason, Robert. Pulsed Laser Deposition of Thin Films. John Wiley & Sons, Ltd., 2006.

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B, Chrisey Douglas, and Hubler G. K, eds. Pulsed laser deposition of thin films. J. Wiley, 1994.

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Recker, Stephanie J. Pulsed laser deposition of YBa2Cu3O7-[delta]/PrBa2Cu3O7-[delta]. Brock University, Dept. of Physics, 1998.

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United States. National Aeronautics and Space Administration., ed. Soft X-ray optics by pulsed laser deposition: Final report. National Aeronautics and Space Administration, 1996.

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United States. National Aeronautics and Space Administration., ed. Soft X-ray optics by pulsed laser deposition: Final report. National Aeronautics and Space Administration, 1996.

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United States. National Aeronautics and Space Administration., ed. Soft X-ray optics by pulsed laser deposition: Final report. National Aeronautics and Space Administration, 1996.

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Jackson, Brian Douglas. Pulsed-laser deposition of silicon dioxide thin-films using the molecular fluorine laser. National Library of Canada = Bibliothèque nationale du Canada, 1999.

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Yazdanian, Mohammad Mehdi. Preparation of SrMgx-Ru1-xO3 thin films by pulsed laser deposition. Brock University, Dept. of Physics, 2004.

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Landázuri, Henry Riascos. Síntesis de películas delgadas de nitruro de carbono por ablación láser. Universidad Tecnológica de Pereira, Facultad de Ciencias Básicas, Departamento de Física, 2007.

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Book chapters on the topic "Pulsed laser deposition (PLD)"

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Winter, Patrick M., Gregory M. Lanza, Samuel A. Wickline, et al. "Pulsed-Laser Deposition (PLD)." In Encyclopedia of Nanotechnology. Springer Netherlands, 2012. http://dx.doi.org/10.1007/978-90-481-9751-4_100689.

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Rijnders, Guus, and Dave H. A. Blank. "In Situ Diagnostics by High-Pressure RHEED During PLD." In Pulsed Laser Deposition of Thin Films. John Wiley & Sons, Inc., 2006. http://dx.doi.org/10.1002/9780470052129.ch4.

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Gorbunoff, Andreé. "Cross-Beam PLD: Metastable Film Structures from Intersecting Plumes." In Pulsed Laser Deposition of Thin Films. John Wiley & Sons, Inc., 2006. http://dx.doi.org/10.1002/9780470052129.ch6.

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Krebs, Hans-Ulrich, Martin Weisheit, Jörg Faupel, et al. "Pulsed Laser Deposition (PLD) -- A Versatile Thin Film Technique." In Advances in Solid State Physics. Springer Berlin Heidelberg, 2003. http://dx.doi.org/10.1007/978-3-540-44838-9_36.

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Beltrano, Joseph J., Lorenzo Torrisi, Anna Maria Visco, Nino Campo, and E. Rapisarda. "Pulsed Laser Deposition (PLD) Technique to Prepare Biocompatible Thin Films." In Advances in Science and Technology. Trans Tech Publications Ltd., 2006. http://dx.doi.org/10.4028/3-908158-05-2.56.

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Leedy, Kevin D. "Pulsed Laser Deposition 1." In Gallium Oxide. Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-37153-1_14.

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von Wenckstern, Holger, Daniel Splith, and Marius Grundmann. "Pulsed Laser Deposition 2." In Gallium Oxide. Springer International Publishing, 2020. http://dx.doi.org/10.1007/978-3-030-37153-1_15.

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Takeuchi, Ichiro. "Combinatorial Pulsed Laser Deposition." In Pulsed Laser Deposition of Thin Films. John Wiley & Sons, Inc., 2006. http://dx.doi.org/10.1002/9780470052129.ch7.

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Mihailescu, I. N., and E. György. "Pulsed Laser Deposition: An Overview." In Springer Series in OPTICAL SCIENCES. Springer Berlin Heidelberg, 1999. http://dx.doi.org/10.1007/978-3-540-48886-6_13.

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Krebs, Hans-Ulrich. "Pulsed Laser Deposition of Metals." In Pulsed Laser Deposition of Thin Films. John Wiley & Sons, Inc., 2006. http://dx.doi.org/10.1002/9780470052129.ch16.

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Conference papers on the topic "Pulsed laser deposition (PLD)"

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Harris, Sumner B., Arpan Biswas, Daniel T. Yimam, et al. "AI-driven pulsed laser deposition of nanomaterials." In Nanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2025, edited by Andrei V. Kabashin, Maria Farsari, and Masoud Mahjouri-Samani. SPIE, 2025. https://doi.org/10.1117/12.3045072.

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Rode, Andrei V., Barry Luther-Davies, and Eugene G. Gamaly. "Laser Ablation of Carbon with High-Pulse-Rate Nanosecond and Picosecond Lasers." In The European Conference on Lasers and Electro-Optics. Optica Publishing Group, 1998. http://dx.doi.org/10.1364/cleo_europe.1998.cmf2.

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We discuss and demonstrate a novel technique for the deposition of high quality thin films via pulsed laser deposition (PLD) using high repetition rate (up to several tens of MHz) picosecond or nanosecond laser pulses. Differences between this method and conventional PLD arise because the pulse energy is markedly reduced compared with the conventional high-energy low repetition rate lasers used for PLD and this significantly improves the quality of the films due to the large decrease (up to nine orders of magnitude) in the number of particles evaporated during a single laser pulse. This effect
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O'Donnell, K. P., P. G. Middleton, C. Trager-Cowan, D. Cole, M. Cazzanelli, and J. G. Lunney. "Pulsed laser deposited (PLD) GaN and its powder precursor." In The European Conference on Lasers and Electro-Optics. Optica Publishing Group, 1998. http://dx.doi.org/10.1364/cleo_europe.1998.cthk2.

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Pulsed laser deposition offers a fast and convenient route for preparing crystalline GaN thin films that may be used either directly in devices or as substrates for conventional growth. 3 Jcm-2 pulses from an excimer laser impinge upon a rotating compressed powder target immersed in a nitrogen or ammonia atmosphere. The resulting ablated plume of material sublimes on a heated sapphire substrate to form the PLD layer. We report here a comparitive study of PLD films and their powder precursor by low temperature photoluminescence (PL) spectroscopy and cathodoluminescence (CL) imaging.
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Plociennik, Przemyslaw, Anna Zawadzka, Janusz Strzelecki, Zbigniew Lukasiak, and Andrzej Korcala. "Pulsed laser deposition (PLD) of hafnium oxide thin films." In 2014 16th International Conference on Transparent Optical Networks (ICTON). IEEE, 2014. http://dx.doi.org/10.1109/icton.2014.6876620.

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NAEEMA, Nadia, Hanaa E. JASIM, and Ahmed Shaker HUSSEIN. "EFFECT OF LASER SHOTS ON THE OPTICAL PROPERTIES OF FE2O3: CUO THIN FILMS PREPARED BY PULSE LASER DEPOSITION TECHNIQUE." In III.International Scientific Congress of Pure,Appliedand Technological Sciences. Rimar Academy, 2021. http://dx.doi.org/10.47832/minarcongress3-10.

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CuO-doped Fe2O3 thin films were deposited onto glass substrates using the Pulsed Laser Deposition (PLD) process at room temperature and a vacuum of 10-2 mbar, utilizing a Nd:YAG laser with a wavelength of 1064 nm, an average frequency of 6 Hz, and a pulse duration of 10 at various laser pulses (300,400 and 500 and).The effect of number of pulsed laser shots on the optical properties of the films was invesigated. UV-VIS spectrophotometer mentioned that the transmittance increases to 90 % when decresing the number of the laser shots. Furthermore, The optical measurements indicate that the Fe2O3:
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Fialkova, Svitlana, Sergey Yarmolenko, Jagannathan Sankar, Geoffrey Ndungu, and Kevin Wilkinson. "Bioactive Coating From White Portland Cement Deposited by Pulsed Laser Deposition." In ASME 2017 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 2017. http://dx.doi.org/10.1115/imece2017-70986.

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Objective. We report the study of feasibility to produce the thing bioactive coating from experimental dental cement using pulsed laser deposition (PLD) technique. Methods. The targets for PLD system (disks 30 mm in diameter × 5 mm thick) were sintered from micronized powder of set Alborg White Portland cement (WPC). The parameters for sintering process were chosen based thermo-gravimetric analysis and differential scanning calorimetry (TGA/DSC). The coatings were deposited by PLD on silicon substrates. The effect of laser power on coating crystallinity and morphology was evaluated by scanning
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Sheng, Biqing, and Zhaoyan Zhang. "Experimental Investigation of Pulsed Laser Deposition Based on a Compressible Flow Framework." In ASME 2006 International Mechanical Engineering Congress and Exposition. ASMEDC, 2006. http://dx.doi.org/10.1115/imece2006-14219.

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Pulsed laser deposition (PLD) is a popular technique for creating thin films. The film characteristics are directly related to the kinetic energy of the laser-induced plume. According to the theory of transient shock wave expansion during laser ablation, laser-induced plume properties are strongly affected by laser intensity as well as ambient temperature, pressure, and gas species. This theory leads to the development of PLD strategies to properly optimize the PLD parameters. The experiments were carried out to deposit diamond-like carbon (DLC) thin films under different ambient temperature,
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Haywood, Talisha M., Kwadwo M. Darkwa, Ram K. Gupta, and Dhananjay Kumar. "Pulsed Laser Deposition and Biocompatibility of Titanium Nitride Coatings." In ASME 2012 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 2012. http://dx.doi.org/10.1115/imece2012-86330.

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TiN thin films were deposited on pure titanium (99.9 %) and stainless steel (316L) substrates using the pulsed laser deposition (PLD) technique. PLD is a very versatile technique to deposit high quality films and it allows the stoichiometry transfer of a multi-component system from target to deposited film. The crystallographic orientation of the films was studied using the X-ray diffraction technique and the results showed that the films were polycrystalline with the (111) preferred orientation. The hydrophilic/hydrophobicity nature of the films was investigated using contact angle measuremen
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Belouet, C. "Pulsed laser deposition of high-Tc superconducting thin films for device applications." In The European Conference on Lasers and Electro-Optics. Optica Publishing Group, 1994. http://dx.doi.org/10.1364/cleo_europe.1994.cmg1.

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Pulsed laser assisted deposition (PLD) has recently emerged as a most promising film-growth technique, at least for basic research, as this has been best demonstrated for the case of superconducting compounds and YBa2Cu3O7–8 in particular. The field of applications of the PLD technique has rapidly spread, and to date, it already covers a broad spectrum of materials. One may anticipate that the PLD technique will soon give birth to a most competitive film-growth technology, in particular in the field of electronics, where it creates new opportunities.
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Zergioti, I., C. Fotakis, and G. N. Haidemenopoulos. "Nanocrystalline Growth of Hard Coatings by Pulsed Laser Deposition." In The European Conference on Lasers and Electro-Optics. Optica Publishing Group, 1998. http://dx.doi.org/10.1364/cleo_europe.1998.cthh89.

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The main objective of this research work was the growth of Titanium Carbide and Titanium Diboride hard coatings on tool steels with Pulsed Laser Deposition (PLD) in order to improve their surface mechanical properties. A pulsed KrF excimer laser was used with the deposition chamber at a base pressure of 10−6 mbar. The morphology and the microstructure of the coatings were examined using Scanning Electron Microscopy, X Ray Diffraction and Transmission Electron Microscopy.
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Reports on the topic "Pulsed laser deposition (PLD)"

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Laube, Samuel J., and Jeffery J. Heyob. Magnetron Sputtered Pulsed Laser Deposition Scale Up. Defense Technical Information Center, 2003. http://dx.doi.org/10.21236/ada422887.

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2

Rubin, M., S. J. Wen, T. Richardson, J. Kerr, K. von Rottkay, and J. Slack. Electrochromic lithium nickel oxide by pulsed laser deposition and sputtering. Office of Scientific and Technical Information (OSTI), 1996. http://dx.doi.org/10.2172/446407.

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Hamblen, David G., David B. Fenner, Peter A. Rosenthal, Joseph Cosgrove, and Pang-Jen Kung. Epitaxial Growth of High Quality SiC of Pulsed Laser Deposition. Defense Technical Information Center, 1995. http://dx.doi.org/10.21236/ada360082.

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Peter Pronko. Isotopically Enriched Films and Nanostructures by Ultrafast Pulsed Laser Deposition. Office of Scientific and Technical Information (OSTI), 2004. http://dx.doi.org/10.2172/835030.

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Fernandez, Felix E. Pulsed Laser Deposition of Thin Film Material for Nonlinear Waveguides. Defense Technical Information Center, 1994. http://dx.doi.org/10.21236/ada290789.

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Britson, Jason Curtis. Pulsed laser deposition of AlMgB14 thin films. Office of Scientific and Technical Information (OSTI), 2008. http://dx.doi.org/10.2172/964388.

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Siegal, M. P., D. R. Tallant, J. C. Barbour, P. N. Provencio, L. J. Martinez-Miranda, and N. J. DiNardo. Characterization of amorphous carbon films grown by pulsed-laser deposition. Office of Scientific and Technical Information (OSTI), 1998. http://dx.doi.org/10.2172/658461.

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Kolagani, R., and S. Friedrich. Heteroepitaxial Growth of NSMO on Silicon by Pulsed Laser Deposition. Office of Scientific and Technical Information (OSTI), 2008. http://dx.doi.org/10.2172/945832.

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Norton, D. P., B. C. Chakoumakos, D. H. Lowndes, and J. D. Budai. Formation of artificially-layered thin-film compounds using pulsed-laser deposition. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/102249.

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Cook, L. P., P. K. Schenck, C. K. Chiang, M. D. Vaudinl, and W. Wong-Ng. Ferroelectric thin films prepared by pulsed laser deposition processing and characterization. National Institute of Standards and Technology, 1992. http://dx.doi.org/10.6028/nist.ir.4844.

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