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Journal articles on the topic 'Pulsed laser deposition (PLD)'

Author: Grafiati

Published: 4 June 2021

Last updated: 25 July 2025

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1

Niemczyk, Moszyński, Jędrzejewski, Kwiatkowski, Piwowarczyk, and Baranowska. "Chemical Structure of EVA Films Obtained by Pulsed Electron Beam and Pulse Laser Ablation." Polymers 11, no. 9 (2019): 1419. http://dx.doi.org/10.3390/polym11091419.

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Poly(ethylene-co-vinyl acetate) (EVA) films were deposited for the first time using physical methods. The chemical structure of the films obtained using two techniques, pulsed electron beam deposition (PED) and pulsed laser deposition (PLD), was studied by attenuated total reflection Fourier infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectroscopy (XPS). Whilst significant molecular degradation of the EVA films was observed for the PLD method, the original macromolecular structure was only partially degraded when the PED technique was used, emphasizing the superiority of the PED m

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RAO, M. C. "PULSED LASER DEPOSITION — ABLATION MECHANISM AND APPLICATIONS." International Journal of Modern Physics: Conference Series 22 (January 2013): 355–60. http://dx.doi.org/10.1142/s2010194513010362.

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Laser ablation is the process of removing material from a solid surface by irradiating it with a laser beam. At low laser flux, the material is heated by the absorbed laser energy and evaporates or sublimates. At high laser flux, the material is typically converted to a plasma. Usually, laser ablation refers to removing material with a pulsed laser, but it is possible to ablate material with a continuous wave laser beam if the laser intensity is high enough. In general, the method of pulsed laser deposition (PLD) is simple. Only few parameters need to be controlled during the process. Targets

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3

Hubler, Graham K. "Pulsed Laser Deposition." MRS Bulletin 17, no. 2 (1992): 26–29. http://dx.doi.org/10.1557/s0883769400040586.

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Research on materials grown by pulsed laser deposition, or PLD, has experienced phenomenal growth since late 1987 when T. Venkatesan (one of the authors for this issue) and co-workers pointed out that extreme nonequilibrium conditions created by pulsed laser melting of YBaCuO allowed in-situ preparation of thin films of this high transition temperature (Tc) superconducting material. Since then, PLD has emerged as the primary means for high throughput deposition of high-quality superconducting thin films for research and devices. This probably came as no surprise to J.T. Cheung (another of this

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Deng, Ying, Anthony Pelton, and R. A. Mayanovic. "Comparison of Vanadium Oxide Thin Films Prepared Using Femtosecond and Nanosecond Pulsed Laser Deposition." MRS Advances 1, no. 39 (2016): 2737–42. http://dx.doi.org/10.1557/adv.2016.311.

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ABSTRACTPulsed laser deposition (PLD) is a technique which utilizes a high energy pulsed laser ablation of targets to deposit thin films on substrates in a vacuum chamber. The high-intensity laser pulses create a plasma plume from the target material which is projected towards the substrate whereupon it condenses to deposit a thin film. Here we investigate the properties of vanadium oxide thin films prepared utilizing two variations of the pulsed laser deposition (PLD) technique: femtosecond PLD and nanosecond PLD. Femtosecond PLD (f-PLD) has a significantly higher peak intensity and shorter d

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Wang, Yuxuan, Bin Zou, Bruno Rente, Neil Alford, and Peter K. Petrov. "Deposition of Nanocrystalline Multilayer Graphene Using Pulsed Laser Deposition." Crystals 13, no. 6 (2023): 881. http://dx.doi.org/10.3390/cryst13060881.

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The wide application of graphene in the industry requires the direct growth of graphene films on silicon substrates. In this study, we found a possible technique to meet the requirement above. Multilayer graphene thin films (MLG) were grown without a catalyst on Si/SiO2 using pulsed laser deposition (PLD). It was found that the minimum number of laser pulses required to produce fully covered (uninterrupted) samples is 500. This number of laser pulses resulted in samples that contain ~5 layers of graphene. The number of layers was not affected by the laser fluence and the sample cooling rate af

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ZHAO, YAFAN, CHUANZHONG CHEN, MINGDA SONG, JIE MA, and DIANGANG WANG. "EFFECTS OF TECHNICAL PARAMETERS ON THE PULSED LASER DEPOSITED FERROELECTRIC FILMS." Surface Review and Letters 13, no. 05 (2006): 687–95. http://dx.doi.org/10.1142/s0218625x06008669.

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Pulsed laser deposition (PLD), which is a novel technique in producing thin films in the recent years, shows unique advantages for the deposition of ferroelectric films. Effects of technical parameters on the pulsed laser deposited ferroelectric films, including substrate temperature, oxygen pressure, post-annealing, buffer layer, target composition, energy density, wavelength, target-to-substrate distance, and laser pulse rate, are systematically reviewed in order to optimize these parameters. Processing-microstructure-property relationships of ferroelectric films by PLD are discussed. The ap

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7

Cotell, Catherine M., and Kenneth S. Grabowski. "Novel Materials Applications of Pulsed Laser Deposition." MRS Bulletin 17, no. 2 (1992): 44–53. http://dx.doi.org/10.1557/s0883769400040616.

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The successful use of pulsed laser deposition (PLD) to fabricate thin film superconductors has generated interest in using the technique to deposit thin films of other materials. The compositional fidelity between laser target and deposited film and the ability to deposit films in reactive gas environments make the PLD process particularly well suited to the deposition of complex multicomponent materials. Cheung and Sankur recently provided an excellent review of the PLD field, including a table of over 100 elements, inorganic and organic compounds, andsuperlattices that have been laser evapor

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8

Thyen, Laurenz, Daniel Splith, Max Kneiß, Marius Grundmann, and Holger von Wenckstern. "Masked-assisted radial-segmented target pulsed-laser deposition: A novel method for area-selective deposition using pulsed-laser deposition." Journal of Vacuum Science & Technology A 41, no. 2 (2023): 020801. http://dx.doi.org/10.1116/6.0002275.

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We introduce a novel technique, masked-assisted radial-segmented target pulsed-laser deposition (MARS-PLD) for unprecedented capabilities in area-selective physical vapor deposition. The MARS-PLD setup consists of a conventional PLD chamber with mechanical feedthrough for a laterally movable mask or mask set. By this means and, in principle, the arbitrary choice of a shadow mask layout, any desired area on a substrate can be masked in order to create multinary lateral and vertical material composition gradients using radially segmented targets already described in the literature [Kneiß et al.,

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9

Bulai, Georgiana, Oana Pompilian, Silviu Gurlui, et al. "Ge-Sb-Te Chalcogenide Thin Films Deposited by Nanosecond, Picosecond, and Femtosecond Laser Ablation." Nanomaterials 9, no. 5 (2019): 676. http://dx.doi.org/10.3390/nano9050676.

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Ge-Sb-Te thin films were obtained by ns-, ps-, and fs-pulsed laser deposition (PLD) in various experimental conditions. The thickness of the samples was influenced by the Nd-YAG laser wavelength, fluence, target-to-substrate distance, and deposition time. The topography and chemical analysis results showed that the films deposited by ns-PLD revealed droplets on the surface together with a decreased Te concentration and Sb over-stoichiometry. Thin films with improved surface roughness and chemical compositions close to nominal values were deposited by ps- and fs-PLD. The X-ray diffraction and R

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10

Dumitrescu, Luminita Nicoleta, Eusebiu-Rosini Ionita, Ruxandra Birjega, et al. "Kaolinite Thin Films Grown by Pulsed Laser Deposition and Matrix Assisted Pulsed Laser Evaporation." Nanomaterials 12, no. 3 (2022): 546. http://dx.doi.org/10.3390/nano12030546.

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In this work, thin films of lamellar clays were deposited by laser techniques (matrix assisted pulsed laser evaporation (MAPLE) and pulsed laser deposition (PLD)). The focus of this paper is the optimization of deposition parameters for the production of highly oriented crystalline films. The films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM). Contact angle measurements were employed to identify the wetting properties of the deposited thin films. Hydrophobic to superhydrophilic films

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11

Walck, Scott D., Jeffrey S. Zabinski, and Michael S. Donley. "Electron microscopy of pulsed-laser-deposited thin films for tribological applications." Proceedings, annual meeting, Electron Microscopy Society of America 51 (August 1, 1993): 852–53. http://dx.doi.org/10.1017/s0424820100150095.

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Pulsed laser deposition (PLD) is a novel thin film deposition technique which has recently been applied to tribological materials with great success. PLD has several inherent advantages over conventional deposition techniques, including excellent film adhesion, replication of target chemistry, and low film deposition temperature. Because load-bearing materials are typically hardened, heat treated alloys, these properties of PLD are ideally suited for tribological applications. In addition to being a relatively simple deposition technique, considerable processing flexibility is inherent with PL

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12

Venkatesan, T., X. D. Wu, R. Muenchausen, and A. Pique. "Pulsed Laser Deposition: Future Directions." MRS Bulletin 17, no. 2 (1992): 54–58. http://dx.doi.org/10.1557/s0883769400040628.

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Despite the discovery of the laser a few decades ago, the potential for pulsed laser deposition (PLD) of thin films has remained unexploited. Despite the sustained pioneering work at Rockwell in laser deposition, it took the development of high-temperature superconductors to fully realize the technique's potential. Early work on PLD of high-temperature superconductors demonstrated for the first time that the composition of rather complex multi-elementary materials can be reproduced in the deposited film under appropriate conditions of laser energy density and deposition angle. These features m

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13

Kusiński, J., A. Kopia, Ł. Cieniek, S. Kąc, and A. Radziszewska. "Deposition Of Oxide And Intermetallic Thin Films By Pulsed Laser (PLD) And Electron Beam (PED) Methods." Archives of Metallurgy and Materials 60, no. 3 (2015): 2173–82. http://dx.doi.org/10.1515/amm-2015-0363.

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Abstract In this work the pulsed laser deposition (PLD) and the pulsed electron beam deposition (PED) techniques were used for fabrication of Mo-Bi2O3, La1−xSrxCoO3, La1−xCaxCoO3 and Al-Mg thin films. An influence of ablation process basic parameters on the coatings structure and properties was discussed. Two types of laser ablation systems were applied: one equipped with a KrF excimer and second with a Q-switched Nd:YAG. Films were deposited on Si and MgO substrates. Scanning (SEM) and transmission (TEM) electron microscopy, atomic force microscopy (AFM) as well as X-ray diffraction (XRD) wer

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14

Rasha H. Ahmed, Abdul Majeed E. Ibrahim, and Kadhim A. Aadem. "Study of the optical proprieties of copper oxide nanoparticles prepared by PLD method." Tikrit Journal of Pure Science 23, no. 10 (2019): 72–75. http://dx.doi.org/10.25130/tjps.v23i10.566.

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Nano CuO thin films on glass substrates were prepared at a constant temperature of (300°C), by pulsed laser deposition (PLD) using Nd:YAG laser at 1064 nm wavelength and five deposition energies (400, 500, 600, 700 and 800 mJ) with fixed pulses (300 pulse and 6 Hz) was used on the properties of CuO films. CuO nanoparticles were deposited on glass substrates to study optical properties and formed thin films of thickness (200 nm).CuO thin flims were characterized by X-ray diffraction (XRD) measurements have shown that the polycrystalline CuO prepared at laser energies , includes optical transmit

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15

Tabara, Tomohiro, Naoki Wakiya, Takanori Kiguchi, M. Tanaka, and Kazuo Shinozaki. "Fabrication of HfO₂ Thin Film on Si Substrate by Double-Pulse Excitation PLD." Key Engineering Materials 350 (October 2007): 129–32. http://dx.doi.org/10.4028/www.scientific.net/kem.350.129.

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Thin films of HfO2 were fabricated on a p-Si(001) substrate using double pulse excitation (DPE) pulsed laser deposition (PLD) with KrF excimer and Nd:YAG lasers, and using conventional Nd:YAG laser PLD under two typical oxygen pressures (7.3 × 10-2 and 7.3 × 10-1 Pa). At 400°C or higher temperatures, the films are crystalline; at less than 400°C, they are amorphous. At higher oxygen pressures, DPE-PLD was effective against droplets. Then the surface morphology and electrical insulation properties of thin films were improved. At lower pressure, DPE-PLD was ineffective.

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H. Ahmed1, Rasha, ,. Abdul Majeed E. Ibrahim1, and Kadhim A. Aadem2. "Study of the optical proprieties of copper oxide nanoparticles prepared by PLD method." Tikrit Journal of Pure Science 23, no. 10 (2019): 72. http://dx.doi.org/10.25130/j.v23i10.760.

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Nano CuO thin films on glass substrates were prepared at a constant temperature of (300°C), by pulsed laser deposition (PLD) using Nd:YAG laser at 1064 nm wavelength and five deposition energies (400, 500, 600, 700 and 800 mJ) with fixed pulses (300 pulse and 6 Hz) was used on the properties of CuO films. CuO nanoparticles were deposited on glass substrates to study optical properties and formed thin films of thickness (200 nm).CuO thin flims were characterized by X-ray diffraction (XRD) measurements have shown that the polycrystalline CuO prepared at laser energies , includes optical transmit

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17

Yang, Zhibin, and Jianhua Hao. "Progress in pulsed laser deposited two-dimensional layered materials for device applications." Journal of Materials Chemistry C 4, no. 38 (2016): 8859–78. http://dx.doi.org/10.1039/c6tc01602b.

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Recent advances of preparing two-dimensional (2D) materials by pulsed laser deposition (PLD) are presented, including deposition processes, structure and characterization. The performance of proof-of-concept electronic or optoelectronic devices based on PLD grown 2D materials is introduced.

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ZHAO, YAFAN, CHUANZHONG CHEN, and DIANGANG WANG. "THE APPLICATION OF PULSED LASER DEPOSITION IN PRODUCING BIOACTIVE CERAMIC FILMS." Surface Review and Letters 12, no. 03 (2005): 401–8. http://dx.doi.org/10.1142/s0218625x05007177.

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Pulsed laser deposition (PLD) is a relatively new technique for producing thin films. It presents unique advantages for the deposition of bioactive ceramics. The mechanism and characteristics of the technique PLD are introduced. Its applications and current research status in hydroxyapatite and bioglass thin films are reviewed. The effect of processing parameters of PLD, including atmosphere, substrate temperature, laser wavelength and target properties, on the structures and the properties of the hydroxyapatite film, is analyzed in detail. Future application trends are also analyzed.

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Bloisi, Francesco, Mario Barra, Antonio Cassinese, and Luciano Rosario Maria Vicari. "Matrix-Assisted Pulsed Laser Thin Film Deposition by Using Nd:YAG Laser." Journal of Nanomaterials 2012 (2012): 1–9. http://dx.doi.org/10.1155/2012/395436.

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Matrix-Assisted Pulsed Laser Evaporation (MAPLE) is a deposition technique, developed from Pulsed Laser Deposition (PLD) especially well suited for producing organic/polymeric thin films, which can take advantage from using Nd:YAG laser. Depending on the relative values of light absorption coefficients of the solvent and of the molecules to be deposited, laser energy is directly absorbed by the solvent or is transferred to it, providing a softer desorption mechanism with respect to PLD. In PLD ultraviolet laser radiation is commonly used, but in MAPLE, since easily damaged molecules are usuall

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ZHAO, YAFAN, CHUANZHONG CHEN, MINGDA SONG, and JIAN LIU. "INFLUENCE OF THE TECHNICAL PARAMETERS ON BIOACTIVE FILMS DEPOSITED BY PULSED LASER." Surface Review and Letters 14, no. 02 (2007): 283–91. http://dx.doi.org/10.1142/s0218625x07009372.

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Pulsed laser deposition (PLD), which is a novel technique in producing thin films in the recent years, shows unique advantages for the deposition of bioactive films. Research states of the technical parameters of the pulsed laser deposited bioactive films, including substrate temperature, atmosphere pressure, energy density, wavelength, post-annealing, target, deposition rate, and thickness of the films, are systematically reviewed. Processing-microstructure-property relationships of bioactive films by pulsed laser deposition are discussed. The application prospect is pointed as well.

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TAN, X., Y. C. ZHOU, and X. J. ZHENG. "COMPARISON OF ISLAND FORMATION BETWEEN PULSED LASER DEPOSITION AND MOLECULAR BEAM EPITAXY: A KINETIC MONTE CARLO SIMULATION." Surface Review and Letters 12, no. 04 (2005): 611–17. http://dx.doi.org/10.1142/s0218625x05007505.

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Based on a hexagonal lattice which includes deposition, dissociation, and diffusion, we performed a kinetic Monte Carlo model to explore thin film growth via pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) within the submonolayer regime. First and second nearest-neighbor interactions calculated by the Morse potential are taken into account in this case. These simulations show that thin film deposition by PLD is markedly different from that by MBE. With PLD, as pulse duration decreases, the island density increases and the island size decreases. Similarly, at temperature T = 550

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De Bonis, Angela, and Roberto Teghil. "Ultra-Short Pulsed Laser Deposition of Oxides, Borides and Carbides of Transition Elements." Coatings 10, no. 5 (2020): 501. http://dx.doi.org/10.3390/coatings10050501.

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Oxides, borides and carbides of the transition elements are materials of great interest from a technologic point of view. Many of these materials are used in the form of thin films, so several techniques are commonly used to deposit them. Among these techniques, Pulsed Laser Deposition (PLD) performed using ultra-short pulse lasers, mainly fs lasers, presents unique characteristics in respect to PLD performed using conventional short pulse lasers. Indeed, the films deposited using fs PLD are often nanostructured, and this technique often allows the target stoichiometry to be transferred to the

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Puppala, Harsha K., Anthony T. Pelton, and Robert A. Mayanovic. "A Comparative Characterization Study of Molybdenum Oxide Thin Films Grown Using Femtosecond and Nanosecond Pulsed Laser Deposition." MRS Advances 1, no. 37 (2016): 2585–90. http://dx.doi.org/10.1557/adv.2016.245.

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ABSTRACTGroup 6 transition metal oxide thin films are in large demand for photocatalysis, heterogeneous catalysis, fuel cell, battery and electronic applications. Pulsed laser deposition offers an inexpensive method for the preparation of nanostructured thin films that may be suitable for heterogeneous catalysis. We have synthesized molybdenum oxide thin films using two types of pulsed laser deposition (PLD). The first method utilizes femtosecond laser-based PLD (f-PLD) while the second method uses an excimer (nanosecond) laser-based PLD (n-PLD). The PLD films have been deposited using f-PLD a

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Ma, Liang, Xiangwei Kong, Jingjing Liang, et al. "Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition." Materials 15, no. 15 (2022): 5157. http://dx.doi.org/10.3390/ma15155157.

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Direct laser deposition (DLD) is widely used in precision manufacturing, but the process parameters (e.g., laser power, scanning patterns) easily lead to changes in dimensional accuracy and structural properties. Many methods have been proposed to analyze the principle of distortion and residual stress generation, but it is difficult to evaluate the involvement of temperature and stress in the process of rapid melting and solidification. In this paper, a three-dimensional finite element model is established based on thermal–mechanical relationships in multilayer DLD. Differences in temperature

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Faraj, Sarah S., and Nabil H. Hadi. "Enhancing the Surface Mechanical Properties of AL2618 Alloy Turbochargers Using a PLD Device with AI2O3." Al-Khwarizmi Engineering Journal 20, no. 4 (2024): 89–98. https://doi.org/10.22153/kej.2024.07.004.

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Abstract Pulsed laser deposition (PLD) has become a widespread technology for the fabrication of multicomponent thin films Material. In this research, the Microstructure phase, composition and effect of paint made from A nanomaterial (Alfa- Al2O3) were study, A Pulsed laser deposition used in order to improving mechanical performance of aluminum alloy (AL-2618) of turbocharger blades, The main advantages of using it in the manufacture of turbocharger blades to reduce corrosion and erosion, and to ensure high hardness and long-life fatigue, The Pulsed laser deposition used for turbocharger blad

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Mallamaci, Michael P., James Bentley та C. Barry Carter. "Microanalysis of silicate glass films grown on α-Al2O3 by pulsed-laser deposition". Proceedings, annual meeting, Electron Microscopy Society of America 51 (1 серпня 1993): 438–39. http://dx.doi.org/10.1017/s0424820100148022.

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Glass-oxide interfaces play important roles in developing the properties of liquid-phase sintered ceramics and glass-ceramic materials. Deposition of glasses in thin-film form on oxide substrates is a potential way to determine the properties of such interfaces directly. Pulsed-laser deposition (PLD) has been successful in growing stoichiometric thin films of multicomponent oxides. Since traditional glasses are multicomponent oxides, there is the potential for PLD to provide a unique method for growing amorphous coatings on ceramics with precise control of the glass composition. Deposition of

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Suad M.Kadhim. "Characterization of Nanocrystalline SnS Thin Film Fabricated used PLD Method for Photodetection Applications." International Journal of Nanoelectronics and Materials (IJNeaM) 17, no. 2 (2024): 172–79. http://dx.doi.org/10.58915/ijneam.v17i2.656.

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Pulsed laser deposition was used to create tin sulfide (SnS) nanoparticles with a Nd:YAG laser (700 mJ) with laser pulses of (200, 250, 300, and 350 pulses). Nanoparticles were created and investigated using XRD, AFM, and UV-Vis spectroscopy to understand their optical, topographical, and electrical properties. After that, a SnS photodetector was built for the first time, and its performance, photoresponse, and sensitivity were evaluated. The development of monocrystalline SnS films was confirmed by X-ray diffraction (XRD) examination. Clear crystallization with increased crystalline size and

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WANCHOO, SUNIL KUMAR, J. JASUDASAN, V. C. BAGWE, S. P. PAI, A. M. NARSALE та R. PINTO. "STUDIES ON LA0.7CA0.3MNO3 - YBA2CU3O7-δ HETEROSTRUCTURES GROWN BY PULSED LASER DEPOSITION TECHNIQUE". International Journal of Modern Physics B 21, № 18n19 (2007): 3429–32. http://dx.doi.org/10.1142/s0217979207044688.

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Pulsed laser deposition (PLD) is a unique method for growing highly stoichiometric, materials in the form of epitaxial thin films. Here we discuss the optimization of deposition parameters for laser ablation of multi-component La 0.7 Ca 0.3 MnO 3- YBa 2 Cu 3 O 7-δ (LCMO-YBCO) heterostructures grown in situ by sequential deposition of LCMO and YBCO on <100> LaAlO 3 (LAO) substrates using a PLD system. We discuss the growth of these multi-layers, from the device applications point of view.

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Niemczyk, Agata, Agata Goszczyńska, Dariusz Moszyński, Paweł Figiel, Sebastian Fryska, and Jolanta Baranowska. "Comparative Study on Structural Differences in Monosaccharide Layers Using PLD and PED Techniques." Molecules 29, no. 21 (2024): 5095. http://dx.doi.org/10.3390/molecules29215095.

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To demonstrate the feasibility of obtaining low-molecular-weight organic films (below 200 Da) using non-solvent PVD processes, glucose layers were produced via pulsed laser deposition (PLD) and pulsed electron beam deposition (PED) methods. Glucose was chosen due to its fundamental role in various biological processes, and because this low-molecular-weight compound is a solid at room temperature, which is required for both techniques. The physical and chemical structures of the deposited glucose layers were characterized by optical, scanning electron, and atomic force microscopy, as well as by

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Ajmal, Rizwan, Shakeela Bibi, Rizwan Ahmed, et al. "The role of saturable absorbers thickness in the Q-switching of the erbium-doped fiber laser." Laser Physics Letters 20, no. 3 (2023): 035101. http://dx.doi.org/10.1088/1612-202x/acb3c8.

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Abstract A passively Q-switched Erbium (Er3+) doped fiber laser (EDFL) based on a ZnO saturable absorber (SA) prepared using a pulsed laser deposition (PLD) technique is demonstrated. The in-situ monitoring of the thickness in the PLD system enabled the control of the SA’s thickness during the growth. The thickness of the SA was varied and the output characteristics of the fiber laser with all thicknesses are compared. This study reveals that the performance and efficiency of an EDFL including pulse repetition rates, pulse duration, pulse energy, peak power, stability, and signal-to-noise rati

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Lu, Xinyu, Xingjian Fan, Hao Zhang, Qingyu Xu, and Mohsin Ijaz. "Review on Preparation of Perovskite Solar Cells by Pulsed Laser Deposition." Inorganics 12, no. 5 (2024): 128. http://dx.doi.org/10.3390/inorganics12050128.

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Pulsed laser deposition (PLD) is a simple and extremely versatile technique to grow thin films and nanomaterials from a wide variety of materials. Compared to traditional fabrication methods, PLD is a clean physical vapour deposition approach that avoids complicated chemical reactions and by-products, achieving a precise stochiometric transfer of the target material onto the substrate and providing control over the film thickness. Halide perovskite materials have attracted extensive attention due to their excellent photoelectric and photovoltaic properties. In this paper, we present an overvie

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Vila-Fungueiriño, José Manuel, Beatriz Rivas-Murias, Juan Rubio-Zuazo, Adrian Carretero-Genevrier, Massimo Lazzari, and Francisco Rivadulla. "Polymer assisted deposition of epitaxial oxide thin films." Journal of Materials Chemistry C 6, no. 15 (2018): 3834–44. http://dx.doi.org/10.1039/c8tc00626a.

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Chemical solution methods for thin-film deposition constitute an affordable alternative to high-vacuum physical technologies, like Sputtering, Pulsed Laser Deposition (PLD) or Molecular Beam Epitaxy (MBE).

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Liu, Fu, Ying Song, Fu Ping Wang, Kaoru Igarashi, and Tadao Shimizu. "Hydroxyapatite Coatings Deposited on Titanium Substrate by Pulsed Laser Deposition." Key Engineering Materials 336-338 (April 2007): 1670–72. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.1670.

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Hydroxyapatite (HA) coatings were deposited on titanium substrate by means of pulsed laser deposition (PLD) with Nd:YAG laser. Deposition was carried out at 20 Pa of water vapor atmosphere and at room temperature. An Nd:YAG laser operating at a repetition rate of 10 HZ was used for deposition. In above deposition condition, the HA coatings deposited by PLD at room temperature are amorphous phase, and Ca/P ratio in HA coatings decreases with increasing water vapor pressure. The amorphous HA coatings were recrystallized after hydrothermal treatment at 190°C for 10 h. The bonding strength of the

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Ogugua, Simon N., Odireleng Martin Ntwaeaborwa, and Hendrik C. Swart. "Latest Development on Pulsed Laser Deposited Thin Films for Advanced Luminescence Applications." Coatings 10, no. 11 (2020): 1078. http://dx.doi.org/10.3390/coatings10111078.

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Currently, pulsed laser deposition (PLD) is a widely used technique to grow thin films for academic research and for industrial applications. The PLD has superior advantages including versatility, control over the growth rate, stoichiometric transfer and unlimited degree of freedom in the ablation geometry compared to other deposition techniques. The primary objective of this review is to revisit the basic operation mechanisms of the PLD and discuss recent modifications of the technique aimed at enhancing the quality of thin films. We also discussed recent progress made in the deposition param

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Cai, Wei, Yuxiang Liu, Rihui Yao, et al. "Optimization of Pulsed Laser Energy Density for the Preparation of MoS2 Film and Its Device by Pulsed Laser Deposition." Micromachines 15, no. 8 (2024): 945. http://dx.doi.org/10.3390/mi15080945.

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This article aims to explore the most optimal pulsed laser energy density when using the pulsed laser deposition (PLD) process to prepare the MoS2 films. We gradually increased the pulsed laser energy density from 70 mJ·cm−2 to 110 mJ·cm−2 and finally determined that 100 mJ·cm−2 was the best-pulsed laser energy density for MoS2 films by PLD. The surface morphology and crystallization of the MoS2 films prepared under this condition are the best. The films consist of a high-crystallized 2H-MoS2 phase with strong (002) preferential orientation, and their direct optical band gap (Eg) is 1.614 eV.

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Fiat Varol, Songül, Derya Şahin, Michael Kompitsas, and Güven Çankaya. "The impact of different ZnO growth methods on the electrical and optical properties of a n-ZnO/p-GaN:Mg/c-plane sapphire UV LED." RSC Adv. 4, no. 26 (2014): 13593–600. http://dx.doi.org/10.1039/c4ra00222a.

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Soni, Ankit, Komal Mulchandani, and K. R. Mavani. "UV activated visible-blind Ga:ZnO photodetectors using the GLAD technique: a comparative study in different gas atmospheres and temperatures." Journal of Materials Chemistry C 8, no. 23 (2020): 7837–46. http://dx.doi.org/10.1039/d0tc00990c.

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Effects of various gas adsorbates on deep-UV photo-sensing of crystalline and porous ZnO and Ga:ZnO nanostructures produced by Glancing Angle Deposition (GLAD)-assisted pulsed laser deposition (PLD) method.

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Khakani, M. A. El, B. Le Drogoff, and M. Chaker. "Effect of the deposition temperature on the properties of iridium thin films grown by means of pulsed laser deposition." Journal of Materials Research 14, no. 8 (1999): 3241–46. http://dx.doi.org/10.1557/jmr.1999.0438.

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Pulsed laser deposition (PLD) of Ir thin films has been achieved by ablating an iridium target with a KrF excimer laser. The iridium deposition rate was investigated, over the (0.4–2) × 109 W/cm2 laser intensity range, and found to reach its maximum at (1.6 ± 0.1) × 109 W/cm2. At this laser intensity, the PLD Ir films were deposited at substrate deposition temperatures ranging from 20 to 600 °C. The PLD Ir films exhibited a (111) preferentially oriented polycrystalline structure with their average grain size increasing from about 10 to 30 nm as the deposition temperature was raised from 20 to

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Duta, Liviu, and Ion N. Mihailescu. "Advances and Challenges in Pulsed Laser Deposition for Complex Material Applications." Coatings 13, no. 2 (2023): 393. http://dx.doi.org/10.3390/coatings13020393.

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Various physical vapor deposition (PVD) techniques, such as molecular beam epitaxy, electron beam physical vapor deposition, pulsed laser deposition (PLD), arc discharge, magnetron sputtering and/or ion beam sputtering, are currently used for coating or growing thin films on solid substrates [...]

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Rzaij, Jamal M. "Characterization of CuO thin films for gas sensing applications." Iraqi Journal of Physics (IJP) 14, no. 31 (2019): 1–12. http://dx.doi.org/10.30723/ijp.v14i31.167.

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Nanostructural cupric oxide (CuO) films were prepared on Si and glass substrate by pulsed laser deposition technique (PLD) using laser Nd:YAG, using different laser pulses energies from 200 to 600 mJ. The X-ray diffraction pattern (XRD) of the films showed a polycrystalline structure with a monoclinic symmetry and preferred orientation toward (111) plane with nano structure. The crystallite size was increasing with increasing of laser pulse energy. Optical properties was characterized by using UV–vis spectrometer in the wave lengthrange (200-1100) nm at room temperature. The results showed tha

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Cheung, Jeff, and Jim Horwitz. "Pulsed Laser Deposition History and Laser-Target Interactions." MRS Bulletin 17, no. 2 (1992): 30–36. http://dx.doi.org/10.1557/s0883769400040598.

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The laser, as a source of “pure” energy in the form of monochromatic and coherent photons, is enjoying ever increasing popularity in diverse and broad applications from drilling micron-sized holes on semiconductor devices to guidance systems used in drilling a mammoth tunnel under the English Channel. In many areas such as metallurgy, medical technology, and the electronics industry, it has become an irreplaceable tool.Like many other discoveries, the various applications of the laser were not initially defined but were consequences of natural evolution led by theoretical studies. Shortly afte

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Moise, Călin, Lidar Rachmani, Geanina Mihai, Oana Lazar, Marius Enăchescu, and Naum Naveh. "Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature." Polymers 13, no. 7 (2021): 1138. http://dx.doi.org/10.3390/polym13071138.

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Single wall carbon nanotubes (SWCNTs) were grown on either sized or desized carbon fabric in a self-designed reactor by Pulsed Laser Deposition (PLD). The uniqueness of the PLD system lies, among other things, in the ability to keep the substrate at a low temperature, compared to the 1100 °C needed for the SWCNTs synthesis, thus, rendering it undamaged. Samples were placed at different positions on a cold finger (CF), where a temperature gradient develops, in the range 25–565 °C. The chemical composition and morphology of desized and surface treatments, as well as SWCNTs grown on carbon fibres

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Irimiciuc, Stefan Andrei, Sergii Chertopalov, Jan Lancok, and Valentin Craciun. "Langmuir Probe Technique for Plasma Characterization during Pulsed Laser Deposition Process." Coatings 11, no. 7 (2021): 762. http://dx.doi.org/10.3390/coatings11070762.

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The history of pulsed laser deposition (PLD) and transient plasmas generated by laser ablation is intertwined with the development of various techniques for its fundamental understanding. Some diagnostic tools have been developed to better suit the rapid transient nature of the plasma (space and time dependence of all parameters, fast decay and complex chemistry inside the plasma), whereas others have been adapted from basic plasma physics studies. Langmuir probe method has been used as a real-time in situ diagnostic tool for laser ablation and later for PLD. It remains a useful tool for the P

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Taha, Samar, Samer Y. Al-Dabag, Sudad S. Ahmed, and Wasan J. Taher. "TiO2- CuI Nanoparticle /Ru Solid State Dye-Sensitize Solar Cells." JOURNAL OF ADVANCES IN CHEMISTRY 12, no. 2 (2016): 3971–76. http://dx.doi.org/10.24297/jac.v12i2.2154.

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In this work solid state dye sensitized solar cell (SSDSSC) type (ITO / TiO2/ Ru / CuI / Ag) is fabricated. The thin films are prepared by pulse laser deposition (PLD) technique under the vacuum pressure of 3×10−3 mbar and annelid at 450 oC. In this technique Nd:YAG laser at 1064 nm wavelength with (200 , 500 , 800) pulsed was used. It was noticed from (I-V) characteristics of the solar cell that the photocurrent collected from the TiO2 (NP) is increase as the number of laser pulses increase. The conversion efficiency of TiO2 is increased from 2.115% up to 5.654% and for CuI from 1.73 % to 5.1

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Hamed, Esraa K. "Laser energy effect on the properties of ZnS thin films prepared by PLD technique." Iraqi Journal of Physics (IJP) 11, no. 21 (2019): 84–90. http://dx.doi.org/10.30723/ijp.v11i21.371.

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Zinc sulfide (ZnS) thin films were deposited on glass substrates using pulsed laser deposition technique. The laser used is the Q-switched Nd: YAG laser with 1064nm wavelength and 1Hz pulse repetition rate and varying laser energy 700mJ-1000mJ with 25 pulse. The substrate temperature was kept constant at 100°C. The structural, morphological and optical properties of ZnS thin films were characterized with X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscope (AFM) and UV-VIS spectrophotometer.

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Lysne, Hogne, Thomas Brakstad, Morten Kildemo, and Turid Reenaas. "Improved methods for design of PLD and combinatorial PLD films." Journal of Applied Physics 132, no. 12 (2022): 125301. http://dx.doi.org/10.1063/5.0105298.

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Pulsed laser deposition (PLD) is a powerful technique for prototyping thin film materials, both single component (single composition) films and films with a varying composition (e.g., lateral continuous compositional spread, CCS). In this work, we improve one of the simulation methods used to design the deposition of PLD films: We extend the mathematical model for the material spread on the substrate, [Formula: see text], for each laser pulse hitting the target, and we use a more accurate method to determine [Formula: see text] experimentally. The deposition of the material on the substrate is

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Hu, Juguang, Huabin Tang, Xiaodong Lin, et al. "Doped Titanium Dioxide Films Prepared by Pulsed Laser Deposition Method." International Journal of Photoenergy 2012 (2012): 1–8. http://dx.doi.org/10.1155/2012/758539.

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TiO2was intensively researched especially for photocatalystic applications. The nitrogen-doped TiO2films prepared by pulsed laser deposition (PLD) method were reviewed, and some recent new experimental results were also presented in this paper. A new optical transmission method for evaluating the photocatalystic activity was presented. The main results are (1) PLD method is versatile for preparing oxide material or complex component films with excellent controllability and high reproducibility. (2) Anatase nitrogen-doped TiO2films were prepared at room temperature, 200°C, and 400°C by PLD meth

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Carradò, Adele, Hervé Pelletier, Jacques Faerber, Gilles Versini, and Ion N. Mihailescu. "Pulsed Laser Deposition of Thin Coatings: Applications on Biomaterials." Materials Science Forum 638-642 (January 2010): 530–35. http://dx.doi.org/10.4028/www.scientific.net/msf.638-642.530.

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We report results on Pulsed Laser Deposition (PLD) of ceramic thin films for biomedical applica-tions. The coating of metallic implants with bioceramic thin films (e.g. calcium phosphates, in particular hydroxyapatite) has been proposed as a solution for combining the mechanical properties of the metallic material with the bioactive character of the ceramic layer, leading to a better integration of the entire implant with the newly remodelled bone. Other bioceramics (as e.g. alumina) exhibit a high degree of chemical inertness under physiological conditions, excellent wear resistance, ability

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Huang, Yu, Xiaoyu Zhou, Lichun Zhang, et al. "Tunable electroluminescence from an n-ZnO/p-GaN heterojunction with a CsPbBr3 interlayer grown by pulsed laser deposition." Journal of Materials Chemistry C 8, no. 35 (2020): 12240–46. http://dx.doi.org/10.1039/d0tc02807j.

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Yang, Hui, Wenliang Wang, Zuolian Liu, Weijiang Yang, and Guoqiang Li. "Epitaxial growth mechanism of pulsed laser deposited AlN films on Si (111) substrates." CrystEngComm 16, no. 15 (2014): 3148–54. http://dx.doi.org/10.1039/c3ce42378f.

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