Academic literature on the topic 'Pulsed-NIL'

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Journal articles on the topic "Pulsed-NIL"

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Fialkova, Svitlana, Sergey Yarmolenko, Arvind Krishnaswamy, et al. "Nanoimprint Lithography for Next-Generation Carbon Nanotube-Based Devices." Nanomaterials 14, no. 12 (2024): 1011. http://dx.doi.org/10.3390/nano14121011.

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This research reports the development of 3D carbon nanostructures that can provide unique capabilities for manufacturing carbon nanotube (CNT) electronic components, electrochemical probes, biosensors, and tissue scaffolds. The shaped CNT arrays were grown on patterned catalytic substrate by chemical vapor deposition (CVD) method. The new fabrication process for catalyst patterning based on combination of nanoimprint lithography (NIL), magnetron sputtering, and reactive etching techniques was studied. The optimal process parameters for each technique were evaluated. The catalyst was made by de
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Joseph, Joby, S. Muthukumaran, and K. S. Pandey. "Weldability Characteristics of Sintered Hot-Forged AISI 4135 Steel Produced through P/M Route by Using Pulsed Current Gas Tungsten Arc Welding." High Temperature Materials and Processes 35, no. 1 (2016): 9–19. http://dx.doi.org/10.1515/htmp-2014-0097.

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AbstractPresent investigation is an attempt to study the weldability characteristics of sintered hot-forged plates of AISI 4135 steel produced through powder metallurgy (P/M) route using matching filler materials of ER80S B2. Compacts of homogeneously blended elemental powders corresponding to the above steel were prepared on a universal testing machine (UTM) by taking pre-weighed powder blend with a suitable die, punch and bottom insert assembly. Indigenously developed ceramic coating was applied on the entire surface of the compacts in order to protect them from oxidation during sintering. S
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Socol, Marcela, Nicoleta Preda, Oana Rasoga, et al. "Pulsed Laser Deposition of Indium Tin Oxide Thin Films on Nanopatterned Glass Substrates." Coatings 9, no. 1 (2018): 19. http://dx.doi.org/10.3390/coatings9010019.

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Indium tin oxide (ITO) thin films were grown on nanopatterned glass substrates by the pulsed laser deposition (PLD) technique. The deposition was carried out at 1.2 J/cm2 laser fluence, low oxygen pressure (1.5 Pa) and on unheated substrate. Arrays of periodic pillars with widths of ~350 nm, heights of ~250 nm, and separation pitches of ~1100 nm were fabricated on glass substrates using UV nanoimprint lithography (UV-NIL), a simple, cost-effective, and high throughput technique used to fabricate nanopatterns on large areas. In order to emphasize the influence of the periodic patterns on the pr
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Gilewski, Marian. "The state of art in the horticulture lighting." Photonics Letters of Poland 12, no. 4 (2020): 100. http://dx.doi.org/10.4302/plp.v12i4.1068.

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The article presents an overview of currently used greenhouse lighting systems. It does not apply to traditional sodium lighting systems, but only to the most modern LEDs. The publication presents descriptions of lamp designs, both foreign and Polish. The aim of the work is not only to review solutions, but also to identify the reasons for the low transfer of scientific and technical solutions to business. There are several barriers to overcome, mainly subjective ones, so that new solutions can be implemented and developed. Full Text: PDF ReferencesS. Ki-Ho, J. Yu-Min, O. Myung-Min, "Applicati
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Dissertations / Theses on the topic "Pulsed-NIL"

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PIANIGIANI, MICHELE. "Nano Imprinting Lithography Ultrafast process and its chemical and physical effects on advanced plastic materials." Doctoral thesis, Università degli Studi di Trieste, 2017. http://hdl.handle.net/11368/2908135.

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The main goal of this PhD was to understand the effects of the Pulsed Nanoimprint Lithography (Pulsed-NIL) technique on thermoplastic materials, by performing the imprinting process on a range of different materials and using different stamps and characterization techniques to assess how this process affects chemically and physically the plastic materials. This study has been conducted comparing the imprinting results by the standard Thermal Nano Imprint Lithography technique (standard T-NIL) and by the Pulsed Thermal NIL (Pulsed-NIL). The study on the material was necessary because, even if
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Rubio, Roy Miguel. "Surface Properties of Hard Fluorinated Amorphous Carbon Films Deposited by Pulsed-DC Discharges." Doctoral thesis, Universitat de Barcelona, 2010. http://hdl.handle.net/10803/21773.

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New Generation Lithographic (NGL) techniques have been recently investigated in order to overcome the limitations of the long-used UV lithography. Several techniques have been proposed during the last decades, but the continued improvement of UV lithography rendered them useful only for a limited number of applications. More recently, nanoimprint lithography (NIL), invented in the nineties, has been considered as the new NGL due to its extreme simplicity and high resolution. Thermal NIL consists in the deformation of a thermoplastic under pressure and temperature by a nanostructured mold, w
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Book chapters on the topic "Pulsed-NIL"

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Socol, Marcela, Nicoleta Preda, Carmen Breazu, and Oana Rasoga. "Pulsed Laser Deposition of Transparent Conductive Oxides on UV-NIL Patterned Substrates for Optoelectronic Applications." In Thin Film Deposition - Fundamentals, Processes, and Applications [Working Title]. IntechOpen, 2022. http://dx.doi.org/10.5772/intechopen.105798.

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Transparent conductive oxide (TCO) electrodes are key components in the fabrication of optoelectronic devices such as organic photovoltaic cells (OPVs) or organic emitting devices (OLEDs). Pulsed laser deposition (PLD) results in TCO coatings with adequate optical and electrical properties, the preservation of the target chemical composition in the transferred films being the major advantage of this technique. Furthermore, the performance of the optoelectronic devices can be enhanced by patterning the TCO electrodes. Indium tin oxide (ITO) remains the most popular TCO due to its high conductiv
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Conference papers on the topic "Pulsed-NIL"

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Lee, Yung-Chun, Cheng-Yu Chiu, Chun-Hung Chen, and Chun-Shiang Chen. "Laser-Assisted and Roller-Based Nano-Imprinting Technologies and Their Applications." In ASME 2007 International Design Engineering Technical Conferences and Computers and Information in Engineering Conference. ASMEDC, 2007. http://dx.doi.org/10.1115/detc2007-34624.

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Nano-imprinting lithography (NIL) has been developed over 15 years and has shown its great potentials for nanopatterning and nano-fabrication. In this paper, new ideas on improving current nano-imprinting methods have been proposed and preliminary experimental tests are carried out. These proposed nano-imprinting methods are all based on the utilization of pulsed laser sources, either in UV or IR region, and can be easily implemented into a roller-based configuration, which is more effective and much faster than conventional planar type nano-imprinting methods. First of all, based on the Laser
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