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Journal articles on the topic 'Pulsed substrate bias'

Author: Grafiati

Published: 28 May 2022

Last updated: 30 July 2025

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1

Ma, D. L., Y. T. Li, Q. Y. Deng, B. Huang, Y. X. Leng, and N. Huang. "Tailoring the texture of titanium thin films deposited by high-power pulsed magnetron sputtering." International Journal of Modern Physics B 33, no. 01n03 (2019): 1940017. http://dx.doi.org/10.1142/s0217979219400174.

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Titanium (Ti) thin films with (002) or (100) texture are favored for many applications. In this paper, Ti thin films were prepared by high-power pulsed magnetron sputtering, and the texture of Ti thin films was successfully tailored by adjusting the pulse width, substrate bias and magnetic field strength. It is found that the peak power and average power of the Ti target are increased by increasing sputtering pulse width and decreasing magnetic field strength, which raise the Ti plasma flux and ion/atom ratio of Ti ions in front of the substrate simultaneously. Ti thin films with a highly (002

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2

Yu, Xiang, Yi Yong Yang, and Cheng Biao Wang. "Effect of Pulsed Substrate Bias on Evolution of Surface Morphology and sp³ Hybridization Degree of Ag-DLC Films in a Mid-Frequency Dual-Magnetron Sputtering." Advanced Materials Research 105-106 (April 2010): 444–47. http://dx.doi.org/10.4028/www.scientific.net/amr.105-106.444.

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In this work, we have investigated the influence of the pulsed substrate bias voltage on the evolution of the surface morphology and sp3 hybridization degree of Ag containing diamond-like carbon (Ag-DLC) films deposited by using a mid-frequency dual-magnetron sputtering system. The unipole substrate bias voltage at 0 V, -60 V, -100 V and -150 V, respectively, was employed on AISI 440 substrate with the duty ratio uniformly set at 70%. The surface morphology was observed by AFM and the hybridization degree of the DLC films was performed respectively using Raman Spectroscopy and Rockwell C inden

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3

Hanizam, H., Md Nizam Abd Rahman, Noraiham Mohamad, and A. R. Soufhwee. "Surface Energy and Crystallite Size Comparisons by Applying Direct Current and Pulse Direct Current on Substrate Bias in PVD Process." Applied Mechanics and Materials 315 (April 2013): 98–102. http://dx.doi.org/10.4028/www.scientific.net/amm.315.98.

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Surface morphology homogeneity and energy modifications for in situ PVD process are two critical factors to prevent unexpected adhesion failure during machining or service. Unlike during film depositing, there is still much gap to be explored on applying pulsed biasing concepts to the substrate during in situ, to ensure the substrate surface readiness prior to film coating. The purpose of this paper is to study the effects of conventional direct current (DC) and pulse direct current (PDC) applied at substrate bias to the surface energy and crystallite size. Tungsten carbide (WC) cutting tool i

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4

Zhang, Min, Guo Qiang Lin, Ai Min Wu, Sheng Zhi Hao, Chuang Dong, and Li Shi Wen. "Structural and Mechanical Properties of AlN Films by Pulsed Bias Arc Ion Plating." Materials Science Forum 561-565 (October 2007): 1157–60. http://dx.doi.org/10.4028/www.scientific.net/msf.561-565.1157.

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AlN thin films have been deposited on p-(100) Si and glass substrates by pulsed bias arc ion plating at different negative substrate biases. The crystal orientation, deposition rate and mechanical property of the films were investigated by X-ray diffraction, nanoindenter and UV-VIS spectrophotometer. The results reveal that pulsed bias has a large influence on film preferred orientation, deposition rate and mechanical property. A preferred (110) orientation is observed in the film deposited at a bias of -50V. With the increase of the bias, film deposition rate decreases first sharply then wild

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5

Guoqiang, Lin, Bai Xiao, Dong Chuang, and Wen Lishi. "Substrate temperature calculation for pulsed bias arc ion plating." Surface and Coatings Technology 194, no. 2-3 (2005): 325–29. http://dx.doi.org/10.1016/j.surfcoat.2004.07.074.

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6

Li, Ming Sheng, Yong Zhong Fan, Shu Juan Zhang, and Chang Jie Feng. "Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage." Advanced Materials Research 189-193 (February 2011): 668–71. http://dx.doi.org/10.4028/www.scientific.net/amr.189-193.668.

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Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

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7

Dai, Hai Yang, Feng Xiao Zhai, Xue Rui Cheng, Lei Su, and Zhen Ping Chen. "Effects of Substrate Bias on the Microstructure and Properties of a-C:H Films Deposited by MFPUMST." Advanced Materials Research 476-478 (February 2012): 2344–47. http://dx.doi.org/10.4028/www.scientific.net/amr.476-478.2344.

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Hydrogenated amorphous carbon (a-C:H) films on silicon wafers were prepared by middle frequency pulsed unbalanced magnetron sputtering technique (MFPUMST) at different substrate bias under the acetylene-argon mixed gases. These films were characterized with Raman spectroscopy, atomic force microscopy (AFM) and nanoindentation. Raman spectra show that the sp3 fraction in a-C:H films increases with increasing substrate bias voltage from 0 to 100 V, and then decreases when the substrate bias above 100 V. AFM and nanoindentation results reveal that the surface roughness and nano-hardness of the fi

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8

RUKKUN, Jariyaporn, Kamon AIEMPANAKIT, Pimchanok REAKAUKOT, Witthawat WONGPISAN, Kirati WAREE, and Montri AIEMPANAKIT. "Investigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition parameters on structural properties and hardness of TiAlN films deposited by reactive pulsed DC magnetron sputtering." Journal of Metals, Materials and Minerals 31, no. 2 (2021): 118–22. http://dx.doi.org/10.55713/jmmm.v31i2.1083.

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In this work, titanium aluminum nitride (TiAlN) films were deposited on a silicon substrate via reactive pulsed DC magnetron sputtering. The effect of deposition parameters such as nitrogen gas flow rate, substrate temperature, and bias voltage on the structural and mechanical properties of TiAlN films was investigated. The crystal structure, morphology, and hardness of TiAlN films were characterized via X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM, and nanoindentation. An improved crystallinity of TiAlN films was obtained by varying the substrate temperature an

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9

Jiang, Hui, Hai Yang Dai, and Ning Kang Huang. "Effects of Bias on the Bonding Structure and Mechanical Property of a-C:H Films Deposited by MFPUMST." Advanced Materials Research 507 (April 2012): 38–43. http://dx.doi.org/10.4028/www.scientific.net/amr.507.38.

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Hydrogenated amorphous carbon (a-C:H) films on silicon wafers were prepared by middle frequency pulsed unbalanced magnetron sputtering technique (MFPUMST) at different substrate bias under the methane-argon mixed gases. Raman spectra show that the sp3 fraction in a-C:H films increases with increasing substrate bias voltage from 0 to 100 V, and then decreases when the substrate bias above 100 V. Nano-hardness for these films prepared under different substrate bias voltage show that nano-hardness increase with increasing substrate bias voltage from 0 to 100 V, and then decrease from 100 up to 20

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10

Zhang, Shu Juan, Ming Sheng Li, Zhi Qin Chen, and Yong Zhong Fan. "Effects of Pulsed Negative Bias and Current Density on Properties of N-Doped TiO₂ Films Deposited by Arc Ion Plating." Advanced Materials Research 476-478 (February 2012): 2357–62. http://dx.doi.org/10.4028/www.scientific.net/amr.476-478.2357.

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The N-doped TiO2thin films of different pulsed negative bias and different current density were deposited on medical glass slide by arc ion plating. The influence of pulsed substrate bias and arc current on film properties was investigated by varying pulsed negative biases from 0 V to−600V and arc current from 40A to 60A. Film structure, surface morphologies and optical properties were measured with XRD, SEM and UV-VIS transmittance spectroscope. Photo-catalytic performance of the films was evaluated by degrading methyl orange. The results show that the N-doped TiO2films absorption edge succes

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11

Lin, Jian Liang, Brajendra Mishra, Malki Pinkas, and John J. Moore. "Pulsed Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS) Deposited TiC/a:C Thin Films." Materials Science Forum 561-565 (October 2007): 1177–80. http://dx.doi.org/10.4028/www.scientific.net/msf.561-565.1177.

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TiC/a:C nanocomposite thin film has proven to be a worthy material selection as a thin film for tribological applications due to its low coefficient of friction, good wear resistance and high hardness. In the current study TiC/a:C thin films with carbon concentration near 55-62 at % were deposited via pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) in pure argon atmosphere with different substrate bias voltages and onto 440C stainless steel substrate with different substrate roughness. It was found that the TiC/a:C film hardness and elastic modulus were increased from 18.5 GPa t

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12

Chang, Chi-Lung, Ching-Yen Lin, Fu-Chi Yang, and Jian-Fu Tang. "The Effect of Match between High Power Impulse and Bias Voltage: TiN Coating Deposited by High Power Impulse Magnetron Sputtering." Coatings 11, no. 7 (2021): 822. http://dx.doi.org/10.3390/coatings11070822.

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Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has revealed that output bias current depends on the total energy output of the cathodes, which means that bias voltage settings do not necessarily match the actual output. In this study, we investigated the effects of bias current and voltage on the characteristics of titanium nitride thin films produced using high impulse magnetron sputtering. The bias current and voltage values were adjusted by varying the supplied cathode power and substrate bias under DC and pulsed-DC output models. Our results

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13

Kim, Dae-Chul, Young-Woo Kim, Yong-Hyun Kim, Jong-Bae Park, Jong-Sik Kim, and Duk-Sun Han. "Measurement of Ion Energy Distribution and Deposition of Ti Thin Films Using ABPPS Technology on Glass Substrate." Coatings 11, no. 8 (2021): 904. http://dx.doi.org/10.3390/coatings11080904.

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Ion energy distributions (IEDs) play an important role in material processes and thin film deposition. We developed a newly designed multistep pulsed power supply (modulator) for the asymmetric bipolar pulsed power sputtering (ABPPS) technology and studied the effect of reverse bias voltage in improving the properties of thin films through Ti deposition. Using an ion energy analyzer, we confirmed IEDs and relative ion intensity under a reverse bias voltage of the modulator at the substrate position. A dense plasma was generated near the sputter target at reverse bias voltages above 300 V. Expe

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14

Takahashi, H., K. Ohata, and T. Morishita. "TEM studies on the crystal structure of YBa2Cu3O7−x thin films prepared by pulsed laser deposition." Journal of Materials Research 7, no. 9 (1992): 2333–36. http://dx.doi.org/10.1557/jmr.1992.2333.

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The crystal structures of YBa2Cu3O7−x thin films deposited on MgO(100) substrates have been investigated by cross-sectional transmission electron microscopy (TEM). At a substrate temperature of 670 °C, Cu–O chains become wavy. Stacking faults are formed between the Cu–O chains. Therefore, the domains with c-axis lattice constants of 15 Å, 27 Å, and 39 Å are observed. By applying a biasing voltage of + 300 V, deviation in the c-axis orientation is reduced compared to that at an unbiased condition; even some grain boundaries remain. Near substrate surfaces, deviation of the c-axis direction from

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15

Bobzin, K., T. Brögelmann, N. C. Kruppe, M. Engels, and C. Schulze. "Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN." Thin Solid Films 732 (August 2021): 138792. http://dx.doi.org/10.1016/j.tsf.2021.138792.

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16

Rumianowski, Roman, Franciszek Rozpłoch, Roman S. Dygdała, Sławomir Kulesza, Przemysław Płóciennik, and Andrzej Wojtowicz. "Pulsed laser deposition of Nd:YAG on Si with substrate bias voltage." Applied Surface Science 193, no. 1-4 (2002): 261–67. http://dx.doi.org/10.1016/s0169-4332(02)00488-9.

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17

Lang, Wen Chang, Rong Song, and Bin Gao. "Study on the Influence of Process Parameters on the Distribution of Macro-Particles on the Surface of Films." Advanced Materials Research 428 (January 2012): 147–52. http://dx.doi.org/10.4028/www.scientific.net/amr.428.147.

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This paper systematically studies the distribution of macro-particles on the surface of film influenced by the substrate position under conditions of the same magnetic field, different pulsed bias voltage and reaction gas partial pressure, and analyzes the mechanism of macro-particles influenced by different parameters. This study indicates that the substrate position has a better effect on decreasing macro-particles than that of the pulsed bias voltage and particles in different substrate position are very different in their forms and appearances, which easily leads to uneven deposition; unde

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18

Kohlscheen, Joern, and Christian Bareiss. "Combinatorial Deposition and Wear Testing of HiPIMS W-C Films." Coatings 15, no. 1 (2025): 115. https://doi.org/10.3390/coatings15010115.

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We used high-power impulse magnetron sputtering (HiPIMS) to deposit tungsten carbide films for superior wear protection in abrasive environments. In order to sample different W-to-C ratios more efficiently, a combinatorial approach was chosen. A single sputter target with two equal segments was used, consisting of an upper tungsten and lower graphite segment. This allowed us to vertically sample various elemental compositions in just one deposition run without creating graphitic nano-layers by rotating the substrate holder. The substrate bias voltage, being one of the most effective process pa

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19

Zhao, Yong, Shuo Hou, Li Guang Fang, et al. "The Effect of Negative Substrate Bias on the Strain Prosperities of ZnO Films Deposited by PFCVAD." Advanced Materials Research 287-290 (July 2011): 2373–80. http://dx.doi.org/10.4028/www.scientific.net/amr.287-290.2373.

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Keeping deposition temperature and oxygen pressure constant at 300°C and 4.0×10-2Pa, respectively, deposition of ZnO thin films with c-axis oriented (002) hexagonal wurtzite crystal structure was achieved by pulsed filtered cathodic vacuum arc deposition (PFCVAD) system at various negative substrate bias on Si(100). The surface morphology was characterized using AFM, and crystallographic structure was studied by means of X-ray diffraction. Based on the biaxial strain model, Strain properties of the ZnO films were investigated by calculation from XRD data. The calculated results revealed that t

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20

Romaniuk, Svitlana, Katarzyna Nowakowska-Langier, Grzegorz Witold Strzelecki, Katarzyna Mulewska, and Roman Minikayev. "The Influence of Bias Voltage on the Structure and Properties of TiZrNbMo Coating Deposited by Magnetron Sputtering." Coatings 14, no. 7 (2024): 844. http://dx.doi.org/10.3390/coatings14070844.

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TiZrNbMo coatings have been deposited using the direct current pulsed magnetron sputtering method in an argon atmosphere. The synthesis processes have been conducted under various process parameters. The structure (chemical and phase composition) and mechanical properties of the obtained multicomponent coatings are investigated as a function of plasma modulation frequency (10 Hz and 1000 Hz) and substrate bias (0 to −150 V). It is the case that an increase in the substrate bias decreases the deposition rate and alters the coating’s chemical composition. The latter leads to a Ti concentration d

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21

Subramonium, Pramod, and Mark J. Kushner. "Pulsed inductively coupled chlorine plasmas in the presence of a substrate bias." Applied Physics Letters 79, no. 14 (2001): 2145–47. http://dx.doi.org/10.1063/1.1406139.

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22

Jiang, Na-na, Tian Min Shao, and Da Rong Chen. "Properties of DLC Films Produced by Pulsed Laser Induced Arc Deposition." Materials Science Forum 475-479 (January 2005): 3901–4. http://dx.doi.org/10.4028/www.scientific.net/msf.475-479.3901.

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Diamond like carbon (DLC) films were prepared on Si wafer, using laser induced arc deposition (Laser arc) technique. Results of Raman Spectra analysis showed that the as-deposit films were amorphous, having obvious sp3 structure. Meanwhile, surface topography and micro-tribological properties were investigated by using Atomic Force Microscope and Nano-Scratch Tester. Influences of arc voltage, substrate bias voltage, target materials and substrate pre-treatment methods upon the film structures and film properties were studied.

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23

Wu, Feng Fang, Jian Xin Deng, and Pei Yan. "Effects of Substrate Bias Voltages on the Erosion Wear Resistance of TiN Coatings Deposited by Pulsed Filtered Vacuum Cathode Arc Deposition." Key Engineering Materials 443 (June 2010): 481–86. http://dx.doi.org/10.4028/www.scientific.net/kem.443.481.

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TiN coatings were produced on substrates of a hard metal at different bias by pulsed filtered vacuum cathode arc deposition assisted with ion bombardment. The erosion wear resistance of TiN coatings was investigated. The erosion wear was tested with a gas blast apparatus. In the test, TiN coatings were impacted at an impingement angle of 90° by angular SiC solid particles with an average diameter of 124um. The maximum depth of the erosion scar measured by the Veeco NT9300 optical profiler was used to evaluate the erosion wear loss of the coatings. The coatings proved to have lower erosion rate

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24

Chipatecua Godoy, Yuri, Olof Tengstrand, Jairo Olaya Florez, et al. "Corrosion Resistant TiTaN and TiTaAlN Thin Films Grown by Hybrid HiPIMS/DCMS Using Synchronized Pulsed Substrate Bias with No External Substrate Heating." Coatings 9, no. 12 (2019): 841. http://dx.doi.org/10.3390/coatings9120841.

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Ti0.92Ta0.08N and Ti0.41Al0.51Ta0.08N thin films grown on stainless-steel substrates, with no external heating, by hybrid high-power impulse and dc magnetron sputtering (HiPIMS/DCMS), were investigated for corrosion resistance. The Ta target was operated in HiPIMS mode to supply pulsed Ta-ion fluxes, while two Ti (or Ti and Al) targets were operated in DCSM mode in order to provide a high deposition rate. Corrosion resistance was investigated using potentiodynamic polarization and electrochemical impedance spectroscopy employing a 3.5% NaCl solution at room temperature. The 300-nm-thick transi

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25

Kadhim, Kamil J., Nizam Abd Rahman, Mohd Rizal Salleh, and Khairul Izani Mohd Zukee. "Effects of Layer Thickness on the Microstructures of TiN/AlTiN Multilayer Coatings." Applied Mechanics and Materials 761 (May 2015): 417–20. http://dx.doi.org/10.4028/www.scientific.net/amm.761.417.

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TiN/AlTiN multilayer coatings were deposited on tungsten carbide cutting tool by applying a direct current on a pulsed bias arc ion plating system. The effect of pulsed bias layer thickness on sample properties was investigated. The amount of grain size decreased with increasing layer thickness. The crystal structure of the coatings was determined using a D8 Advance Bruker X-ray diffractometer with CuKa (λ = 1.5405 Å) radiation. TiN/AlTiN multilayer coatings were crystallized with orientations in the (111), (200), (222), and (311) crystallographic planes, and the microstructure was enhanced w

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26

Simionescu, Octavian-Gabriel, Cosmin Romanițan, Oana Tutunaru, Valentin Ion, Octavian Buiu, and Andrei Avram. "RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate." Coatings 9, no. 7 (2019): 442. http://dx.doi.org/10.3390/coatings9070442.

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Rutile titanium oxide (TiO2) thin films require more energy to crystallize than the anatase phase of TiO2. It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed gas flow to modify the pressure, or ex situ annealing. In the present work, we managed to obtain high enough energy at the substrate in order for the particles to form rutile TiO2 at room temperature without any intentional substrate bias in a continuous gas flow. The rutile TiO2 thin films were deposited by a reactive radiofrequency magnetron s

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27

Wakatsuchi, M., Y. Ueda, and M. Nishikawa. "Cubic boron nitride film synthesis by reactive sputtering with pulsed RF substrate bias." Diamond and Related Materials 10, no. 3-7 (2001): 1380–84. http://dx.doi.org/10.1016/s0925-9635(00)00553-7.

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28

Liu, Jingjing, Zhangbo Lu, Xianju Zhang, et al. "Low Power Consumption Red Light-Emitting Diodes Based on Inorganic Perovskite Quantum Dots under an Alternating Current Driving Mode." Nanomaterials 8, no. 12 (2018): 974. http://dx.doi.org/10.3390/nano8120974.

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Inorganic perovskites have emerged as a promising candidate for light-emitting devices due to their high stability and tunable band gap. However, the power consumption and brightness have always been an issue for perovskite light-emitting diodes (PeLEDs). Here, we improved the luminescence intensity and decreased the current density of the PeLEDs based on CsPbI3 quantum dots (QDs) and p-type Si substrate through an alternating current (AC) driving mode. For the different driving voltage modes (under a sine pulsed bias or square pulsed bias), a frequency-dependent electroluminescent (EL) behavi

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29

Miyake, Shojiro, Takanori Shindo, and Masatoshi Miyake. "Regression Analysis of the Effect of Bias Voltage on Nano- and Macrotribological Properties of Diamond-Like Carbon Films Deposited by a Filtered Cathodic Vacuum Arc Ion-Plating Method." Journal of Nanomaterials 2014 (2014): 1–13. http://dx.doi.org/10.1155/2014/657619.

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Diamond-like carbon (DLC) films are deposited by bend filtered cathodic vacuum arc (FCVA) technique with DC and pulsed bias voltage. The effects of varying bias voltage on nanoindentation and nanowear properties were evaluated by atomic force microscopy. DLC films deposited with DC bias voltage of −50 V exhibited the greatest hardness at approximately 50 GPa, a low modulus of dissipation, low elastic modulus to nanoindentation hardness ratio, and high nanowear resistance. Nanoindentation hardness was positively correlated with the Raman peak ratioId/Ig, whereas wear depth was negatively correl

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30

Wang, J., H. Ni, K. Zhao, Y. C. Kong, H. K. Wong, and S. X. Zhong. "Polarity Switchable Photovoltages in Miscut La0.67Ca0.33MnO3Films." International Journal of Photoenergy 2012 (2012): 1–5. http://dx.doi.org/10.1155/2012/547591.

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We report the transient laser-induced anomalous photovoltaic effect in the La0.67Ca0.33MnO3film grown on miscut LaSrAlO4(001) substrate under 248 nm pulsed laser irradiation at ambient temperature without any applied bias. A photovoltaic pulse signal was observed when the La0.67Ca0.33MnO3film was irradiated directly, and the signal polarity was reversed when the sample was irradiated through the LaSrAlO4substrate, while the signal recorded between the two electrodes on the surface of LaSrAlO4was not reversed when the sample was irradiated through La0.67Ca0.33MnO3film rather than at the surface

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31

Malyshev, M. V., and V. M. Donnelly. "Dynamics of inductively-coupled pulsed chlorine plasmas in the presence of continuous substrate bias." Plasma Sources Science and Technology 9, no. 3 (2000): 353–60. http://dx.doi.org/10.1088/0963-0252/9/3/314.

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32

Audronis, M., A. Matthews, and A. Leyland. "Pulsed-bias magnetron sputtering of non-conductive crystalline chromia films at low substrate temperature." Journal of Physics D: Applied Physics 41, no. 3 (2008): 035309. http://dx.doi.org/10.1088/0022-3727/41/3/035309.

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33

Gottardi, G., N. Laidani, R. Bartali, et al. "Amorphous carbon films PACVD in CH4–CO2 under pulsed and continuous substrate bias conditions." Diamond and Related Materials 14, no. 3-7 (2005): 1031–35. http://dx.doi.org/10.1016/j.diamond.2004.10.016.

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34

Li, Cheng-Xun, Yi-Cheng Lin, Yung-Lin Chen, and Wan-Yu Wu. "Bilayer molybdenum contact prepared via high-power pulsed magnetron sputtering: Effects of substrate bias." Materials Chemistry and Physics 299 (April 2023): 127547. http://dx.doi.org/10.1016/j.matchemphys.2023.127547.

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35

Banna, S., A. Agarwal, K. Tokashiki, et al. "Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching." IEEE Transactions on Plasma Science 37, no. 9 (2009): 1730–46. http://dx.doi.org/10.1109/tps.2009.2028071.

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36

Steinhoff, Michael K., Damian M. Holzapfel, Soheil Karimi Aghda, et al. "Ag Surface and Bulk Segregations in Sputtered ZrCuAlNi Metallic Glass Thin Films." Materials 15, no. 5 (2022): 1635. http://dx.doi.org/10.3390/ma15051635.

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We report on the formation of Ag-containing ZrCuAlNi thin film metallic glass (nano)composites by a hybrid direct-current magnetron sputtering and high-power pulsed magnetron sputtering process. The effects of Ag content, substrate temperature and substrate bias potential on the phase formation and morphology of the nanocomposites were investigated. While applying a substrate bias potential did not strongly affect the morphological evolution of the films, the Ag content dictated the size and distribution of Ag surface segregations. The films deposited at low temperatures were characterized by

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37

Yao, Xiao Hong, Bin Tang, Lin Hai Tian, Xiao Fang Li, and Yong Ma. "Microstructure and Corrosion Resistance of TiN Coating on HSS by Pulsed Bias Cathodic Arc Ion Plating." Materials Science Forum 675-677 (February 2011): 1307–10. http://dx.doi.org/10.4028/www.scientific.net/msf.675-677.1307.

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TiN coating with thickness of 2.5μm was deposited on high-speed steel (HSS) substrate by pulsed bias cathodic arc ion plating. The surface and cross-section morphologies, composition depth profile and phase structure were characterized by FESEM, GDOES and XRD, respectively. Scratch test for adhesion evaluation, microhardness test for hardness measurement, and potentiodynamic polarization for corrosion resistance test were used. The results show that the TiN coating exhibits smooth surface, dense columnar grain structure and an obviously preferred orientation of TiN(111). The adhesion of the co

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Zhong, Jing-Yi, Jian-Jie Wang, and Fan-Yi Ouyang. "Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method." Materials 15, no. 22 (2022): 8238. http://dx.doi.org/10.3390/ma15228238.

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We demonstrate a systematic study optimizing the properties of CoCrFeNi medium entropy alloy (MEA) thin films by tuning the deposition parameters of the pulsed direct current (DC) magnetron sputtering process. The chemical composition and microstructure of thin films were studied with energy dispersive X-ray spectroscopy (EDS), an X-ray diffractometer (XRD) and a transmission electron microscope (TEM). Abundant nanotwins and the dual face-centered cubic−hexagonal close-packed (FCC-HCP) phases were formed in some specimens. The Taguchi experimental method and analysis of variance (ANOVA) were a

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Ding, X. Z., X. T. Zeng, and H. Xie. "Cubic boron nitride films deposited by unbalanced RF magnetron sputtering and pulsed DC substrate bias." Thin Solid Films 429, no. 1-2 (2003): 22–27. http://dx.doi.org/10.1016/s0040-6090(03)00142-1.

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Hsu, Chia-Yuan, Liang-Yih Chen, and Franklin Chau-Nan Hong. "Properties of diamond-like carbon films deposited by ion plating with a pulsed substrate bias." Diamond and Related Materials 7, no. 6 (1998): 884–91. http://dx.doi.org/10.1016/s0925-9635(97)00324-5.

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Гренадёров, А. С., А. А. Соловьев та К. В. Оскомов. "Влияние толщины гидрогенизированных углеродных пленок, легированных кремнием и кислородом, на свойства их поверхности". Журнал технической физики 91, № 1 (2021): 155. http://dx.doi.org/10.21883/jtf.2021.01.50287.204-20.

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In this work, 0.5-7 µm thick a-C:H:SiOx films were obtained on silicon and VT6 ti-tanium alloy substrates in plasma of non-self-sustained arc discharge with a hot cathode using a bipolar pulsed substrate bias voltage. The dependence of hardness, internal stress-es, surface morphology, wettability, and the surface potential a-C:H:SiOx films on the thickness was studied. It is shown that increasing the film's thickness enhances the allow-able load on the material and its hardness. The a-C:H:SiOx films had low internal stresses (less than 600 MPa), and the contact angle with water was 75–80°. It

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Grenadyorov, A. S., K. V. Oskomov, Andrey A. Solovyev, S. V. Rabotkin, and N. F. Kovsharov. "The Deposition of Silicon-Carbon Coatings in Plasma Based Nonself-Sustained Arc Discharge with Heated Cathode." Key Engineering Materials 685 (February 2016): 643–47. http://dx.doi.org/10.4028/www.scientific.net/kem.685.643.

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Silicon-carbon coatings on silicon substrates were deposited in plasma based nonself-sustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the

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Alekseeva, Olga, Artem Mikhalev, Elena Lutikova, et al. "Structural and Electrocatalytic Properties of Platinum and Platinum-Carbon Layers Obtained by Magnetron-Ion Sputtering." Catalysts 8, no. 12 (2018): 665. http://dx.doi.org/10.3390/catal8120665.

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This article is devoted to further development of magnetron sputtering technology for catalysts and catalysts layer production for fuel cells and other electrochemical devices. Platinum-carbon films with Pt content up to 95–97 wt % were deposited using different sputtering regimes—DC (direct current) sputtering with and without application of a pulse negative bias voltage to the titanium substrate and also bipolar pulse sputtering with frequency of 10 kHz and 100 kHz. Composite platinum carbon targets were used for sputtering. Characteristics of platinum-carbon films were compared with those o

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Lee, Jyh-Wei, Shih-Kang Tien, and Yu-Chu Kuo. "The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering." Journal of Electronic Materials 34, no. 12 (2005): 1484–92. http://dx.doi.org/10.1007/s11664-005-0155-9.

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Tian, Lin Hai, Rui Hua Zhu, Yan Zhang, and Bin Tang. "Microstructure and Corrosion Resistance of Aluminized Coatings on Magnesium Alloy by Pulsed Bias Magnetron Sputtering." Materials Science Forum 687 (June 2011): 688–93. http://dx.doi.org/10.4028/www.scientific.net/msf.687.688.

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Aluminized coatings were prepared on AZ91D magnesium alloy using pulsed bias magnetron sputtering. Effects of deposition temperature on the microstructure and corrosion resistance were studied. The microstructure, element distribution and hardness of the coatings were characterized using optical microscopy (OM), X-ray diffraction (XRD), glow discharge optical emission spectroscopy (GDOES), and microhardness tester, respectively. The corrosion behavior of the aluminized coatings was studied by measuring anodic polarization curves in 0.5 wt% NaCl solution and compared with that of bare AZ91D. Re

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Ismail, Raid A., Omar A. Abdulrazzaq, and Abdullah M. Ali. "Photovoltaic properties of ITO/p-Si heterojunction prepared by pulsed laser deposition." International Journal of Modern Physics B 34, no. 32 (2020): 2050321. http://dx.doi.org/10.1142/s021797922050321x.

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In this study, indium tin oxide (ITO) was deposited onto sapphire and low resistive p-Si substrates using pulsed laser deposition (PLD) technique. The optical energy gap of ITO deposited on the sapphire substrate was 3.7 eV at room temperature. Photoluminescence (PL) of ITO shows an emission of broad peak at 524 nm. Photovoltaic (PV) characteristics of the n-ITO/p-Si heterojunction are examined and showed conversion efficiency [Formula: see text] of 1.8%. The open circuit voltage [Formula: see text] for this cell was 0.49 V while the short circuit current density [Formula: see text] was 17.4 m

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BULBUL, FERHAT, and IHSAN EFEOGLU. "STRESS-RELIEF SOLUTIONS FOR BRITTLE TiB2 COATINGS." Surface Review and Letters 19, no. 04 (2012): 1250045. http://dx.doi.org/10.1142/s0218625x1250045x.

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Engineering applications of TiB 2 coatings are limited because of the brittle nature of interfacial bonds on the substrate surfaces, although they have many major properties such as high hardness, high wear and high temperature strength. To overcome this drawback, many researchers have studied over many years and their efforts have taken several forms such as the rotation of substrate, heating treatment during deposition or after deposition, application of positive bias voltage to the substrate, the introduction of transition elements as an interlayer, gradient or multilayer or composite stren

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Гренадеров, А. С., А. А. Соловьёв, К. В. Оскомов та М. О. Жульков. "Зависимость механических и трибологических свойств a-C : H : SiO-=SUB=-x-=/SUB=--пленок от амплитуды напряжения смещения подложки". Журнал технической физики 91, № 8 (2021): 1286. http://dx.doi.org/10.21883/jtf.2021.08.51106.15-21.

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The paper presents the AISI 316L stainless steel surface modification by plasma-assisted chemical vapor deposition of a-C:H:SiOx film using the pulsed bipolar substrate bias voltage. The mechanical and tribological properties of the a-C:H:SiOx film and the steel surface are examined using the nanoindentation method and the pin-on-disk tribometer, respectively. The optimum value is obtained for the amplitude of the negative pulse of the bipolar bias voltage, when the hardness of the a-C:H:SiOx film is high (19±2 GPa). This hardness value is 3.5 times greater, than the hardness of the AISI 316L

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Saraswati, Teguh Endah, Shun Tsumura, and Masaaki Nagatsu. "Covalent Functionalization of Amino Group onto Carbon-Based Magnetic Nanoparticles Using Pulsed-Powder Explosion Technique." Advanced Materials Research 896 (February 2014): 122–25. http://dx.doi.org/10.4028/www.scientific.net/amr.896.122.

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In order to enhance the treatment processing for powder of nanoparticle, we developed a modified setup using an inductively coupled radio frequency plasma with a pulsed explosion technique. Applying a negative pulsed bias voltage of -1 kV to the substrate stage in 15 seconds with a repetition frequency of 1 kHz and a duty ratio of 50 % in ammonia plasma, a significant increase of N 1s peak intensity in the X-ray photoelectron spectroscopy spectra was observed. The intensity of N 1s peak treated in the pulsed-biasing system raised both about four times higher than those of the particles treated

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Hiromi, Takahashi, Izumi Hirohiko, Ohata Katsumi, et al. "Crystal structure of YBa2Cu3O7−x thin films prepared by pulsed laser deposition with substrate bias voltage." Physica C: Superconductivity 190, no. 4 (1992): 427–32. http://dx.doi.org/10.1016/0921-4534(92)90701-d.

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