Relevant bibliographies by topics / PVD [Physical Vapour Deposition]

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  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers

Academic literature on the topic 'PVD [Physical Vapour Deposition]'

Author: Grafiati
Published: 4 June 2021
Last updated: 14 February 2022

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Journal articles on the topic "PVD [Physical Vapour Deposition]"

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Goral, Marek, Slawomir Kotowski, and Jan Sieniawski. "The Technology of Plasma Spray Physical Vapour Deposition." High Temperature Materials and Processes 32, no. 1 (February 22, 2013): 33–39. http://dx.doi.org/10.1515/htmp-2012-0051.

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AbstractThe article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades.
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Stuart, Bryan W., and George E. Stan. "Physical Vapour Deposited Biomedical Coatings." Coatings 11, no. 6 (May 21, 2021): 619. http://dx.doi.org/10.3390/coatings11060619.

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This Special Issue was devoted to developments made in Physical Vapour Deposited (PVD) biomedical coatings for various healthcare applications. The scrutinized PVD methods were Radio-Frequency Magnetron Sputtering (RF-MS), Cathodic Arc Evaporation, Pulsed Electron Deposition and its variants, Pulsed Laser Deposition, and Matrix Assisted Pulsed Laser Evaporation (MAPLE), due to their great promise especially in the dentistry and orthopaedics. These methods have yet to gain traction for industrialization and large-scale application in biomedicine. A new generation of implant coatings can be made available by the (1) incorporation of organic moieties (e.g., proteins, peptides, enzymes) into thin films by innovative methods such as combinatorial MAPLE, (2) direct coupling of therapeutic agents with bioactive glasses or ceramics within substituted or composite layers via RF-MS, or (3) by innovation in high energy deposition methods such as arc evaporation or pulsed electron beam methods.
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Chaudhari, Mandakini N. "Thin film Deposition Methods: A Critical Review." International Journal for Research in Applied Science and Engineering Technology 9, no. VI (June 30, 2021): 5215–32. http://dx.doi.org/10.22214/ijraset.2021.36154.

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The aim of this review paper is to present a critical analysis of existing methods of thin film deposition. Paper discusses some thin film techniques which are advanced and popular. The advantages and disadvantages of each method are mentioned. The two major areas of interest discussed are physical and chemical vapor deposition techniques. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. It is examined that some remarkable similarities and difference between the specific methods. The sub methods which are having common principle are classified. The number of researchers attempted to explain the how the specific method is important and applicable for the deposition of thin films. In conclusion the most important method of depositing thin films is CVD. For our research work the Spray Pyrolysis technique, which is versatile and found suitable to use.
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Vu, Tuan Duc, Zhang Chen, Xianting Zeng, Meng Jiang, Shiyu Liu, Yanfeng Gao, and Yi Long. "Physical vapour deposition of vanadium dioxide for thermochromic smart window applications." Journal of Materials Chemistry C 7, no. 8 (2019): 2121–45. http://dx.doi.org/10.1039/c8tc05014g.

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In this paper, various PVD techniques, such as pulsed laser deposition (PLD), evaporation decomposition (ED) and sputtering, are examined with respect to their conditions for VO2fabrication, film quality and the strategies for film improvements.
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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 98, no. 1 (January 2000): 410–23. http://dx.doi.org/10.1016/s0026-0576(00)80350-5.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 99 (January 2001): 409–23. http://dx.doi.org/10.1016/s0026-0576(01)85301-0.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 100 (January 2002): 394–408. http://dx.doi.org/10.1016/s0026-0576(02)82043-8.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 97, no. 1 (January 1999): 410–23. http://dx.doi.org/10.1016/s0026-0576(00)83101-3.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 97, no. 1 (January 1999): 417–30. http://dx.doi.org/10.1016/s0026-0576(99)80043-9.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 93, no. 1 (January 1995): 387–400. http://dx.doi.org/10.1016/0026-0576(95)93388-i.

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Dissertations / Theses on the topic "PVD [Physical Vapour Deposition]"

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Davidson, John Lee. "⁵⁷Fe Mössbauer studies of surface interactions in a PVD process." Thesis, Sheffield Hallam University, 1997. http://shura.shu.ac.uk/19536/.

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A critical stage of the combined steered arc and unbalanced magnetron process is the metal ion pre-treatment which improves the adhesion of the TiN coating. In this study, Conversion Electron Mossbauer Spectroscopy (CEMS) has been used to investigate surface interactions in a commercial Arc Bond Sputtering (ABS) coating system. A novel application of the Liljequist theory of CEMS has been used to determine ion etch rates for deposited natural iron on stainless steel substrates, for various Ti ion pre¬treatment processes. The approach has estimated an etch rate of 60 nm min.'1 for samples positioned without substrate rotation at a cathode-sample distance of 250 mm. This has been calculated to correspond to a bias current density of 6.68 Amps m-2. Similar experiments involving modes of rotation yield an average etch rate of approximately 40 nm min.-1 To detect small quantities of iron containing phases formed during a pre-treatment process it has been necessary to enrich substrates with the Mossbauer isotope, 57Fe to achieve greater surface sensitivity. The enrichment used the technique of the deposition of an estimated 25 nm of 57Fe on polished mild steel substrates followed by annealing to generate an 57Fe diffusion profile into the near surface region. A diffusion model has been used to predict the 57Fe depth profile due to the adopted annealing process parameters. Verification of the estimated thickness of the deposited 57Fe overlayer and the diffusion profile has been provided by SIMS and SNMS. Using the 57Fe enriched mild steel samples, CEMS has investigated the formation of iron- titanium phases after a typical industrial ten minute pre-treatment process using substrate rotation, at a substrate bias voltage of -1200 V. Significant phase formation of both crystalline Fe[x]Ti[1-x] and amorphous Fe[x]Ti[1-x] have been identified. The formation of the crystalline phase has been confirmed by XRD. Using a model of the 57Fe isomer shift dependence of x, in amorphous alloys yielded x=0.31 +/-0.08 for Fe[x]Ti[1-x] Further experiments using an estimated 25 nm of 57Fe deposited on mild steel without annealing, showed the presence of magnetite and a small quantity of crystalline FeTi for a 25 s pre¬treatment process. After a 300 s pre-treatment time the oxide layer is removed and significant quantities of both crystalline and amorphous FeTi are formed. CEMS has also showed increased 57Fe removal at a 6 x 10-5 mbar Ar operating pressure within the coating chamber compared with a pre-treatment performed at a higher Ar pressure of 3 x 10-3 mbar, showing the greater effect of the Ti ion etching under these conditions. During the experiments performed at different Ar pressures, CEMS also identified iron carbonitride phases. Similar phases have also been identified in the early growth stages of a compound layer in a process performed using a modified Balzers coating system. CEMS has proved to be a powerful technique, enabling the investigation of surface interaction phenomena occurring in the near surface region of 57Fe enriched substrates treated by Physical Vapour Deposition (PVD) processes. The information provided by the technique makes it strategically important in the future research of interface regions generated by PVD processes.
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Macak, Eva. "Electron microscopy of sharp edges and corners coated by ion-assisted PVD." Thesis, Sheffield Hallam University, 2003. http://shura.shu.ac.uk/19991/.

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The thesis examines ion-assisted physical-vapour deposition (PVD) of thin coatings on non-flat three-dimensional samples, concentrating on the case of free-standing edges and comers. Changes in the electric field in the vicinity of sharp edges lead to local changes in the ion bombardment (ion flux and angle of incidence) which can significantly affect the ion-surface interaction and thus the properties and the performance of the coatings growing in the edge region. This work presents a detailed electron microscopy study of the edge-related changes in the coating properties and develops a physical model to explain and quantify the effects. The problem is studied on a system typical for industrial coating of cutting tools used in dry high speed cutting: TiAlN-type coatings (TiAlN/VN and TiAlCrYN) deposited on wedge-shaped samples by closed-field unbalanced magnetron sputtering (UBM), using high-flux, low-energy Ar+ ion irradiation (J[i]/J[me]~4, E[i] = 75-150 eV). The morphology and composition of the coatings in the edge region, as a function of the edge geometry (angle and radius of curvature) and the deposition conditions (substrate bias), is studied using scanning electron microscopy combined with energy-dispersive X-ray spectroscopy (SEM+EDX). The internal structure of the coatings growing on sharp edges is examined by transmission electron microscopy (TEM). A detailed theoretical analysis of the effects, based on the simulations of the plasma sheath around the samples and the resulting ion bombardment distribution, is presented. A direct relationship between the experimentally observed magnitude and spatial extent of the changes in the edge region and the simulated characteristics of the plasma sheath around the edges is shown.
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Abd, Rahman M. N. "Modelling of physical vapour deposition (PVD) process on cutting tool using response surface methodology (RSM)." Thesis, Coventry University, 2009. http://curve.coventry.ac.uk/open/items/cca436cf-b72b-c899-ef02-bd522b0d7ec5/1.

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The Physical Vapour Deposition (PVD) magnetron sputtering process is one of the widely used techniques for depositing thin film coatings on substrates for various applications such as integrated circuit fabrication, decorative coatings, and hard coatings for tooling. In the area of coatings on cutting tools, tool life can be improved drastically with the application of hard coatings. Application of coatings on cutting tools for various machining techniques, such as continuous and interrupted cutting, requires different coating characteristics, these being highly dependent on the process parameters under which they were formed. To efficiently optimise and customise the deposited coating characteristics, PVD process modelling using RSM methodology was proposed. The aim of this research is to develop a PVD magnetron sputtering process model which can predict the relationship between the process input parameters and resultant coating characteristics and performance. Response Surface Methodology (RSM) was used, this being one of the most practical and cost effective techniques to develop a process model. Even though RSM has been used for the optimisation of the sputtering process, published RSM modelling work on the application of hard coating process on cutting tool is lacking. This research investigated the deposition of TiAlN coatings onto tungsten carbide cutting tool inserts using PVD magnetron sputtering process. The input parameters evaluated were substrate temperature, substrate bias voltage, and sputtering power; the out put responses being coating hardness, coating roughness, and flank wear (coating performance). In addition to that, coating microstructures were investigated to explain the behaviour of the developed model. Coating microstructural phenomena assessed were; crystallite grain size, XRD peak intensity ratio I111/I200 and atomic number percentage ratio of Al/Ti. Design Expert 7.0.3 software was used for the RSM analysis. Three process models (hardness, roughness, performance) were successfully developed and validated. The modelling validation runs were within the 90% prediction interval of the developed models and their residual errors compared to the predicted values were less than 10%. The models were also qualitatively validated by justifying the behaviour of the output responses (hardness, roughness, and flank wear) and microstructures (Al/Ti ratio, crystallographic peak ratio I111/1200, and grain size) with respect to the variation of the input variables based on the published work by researchers and practitioners in this field. The significant parameters that influenced the coating hardness, roughness, and performance (flank wear) were also identified. Coating hardness was influenced by the substrate bias voltage, sputtering power, and substrate temperature; coating roughness was influenced by sputtering power and substrate bias; and coating performance was influenced by substrate bias. The analysis also discovered that there was a significant interaction between the substrate temperature and the sputtering power which significantly influenced coating hardness, roughness, and performance; this interaction phenomenon has not been reported in previously published literature. The correlation study between coating characteristics, microstructures and the coating performance (flank wear) suggested that the coating performance correlated most significantly to the coating hardness with Pearson coefficient of determination value (R2) of 0.7311. The study also suggested some correlation between coating performance with atomic percentage ratio of Al/Ti and grain size with R2 value of 0.4762 and 0.4109 respectively.
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Gulizia, Stefan. "Soldering in high pressure die casting (HPDC) performance evaluation and characterisation of physical vapour deposition (PVD) coatings /." Swinburne Research Bank, 2008. http://hdl.handle.net/1959.3/39640.

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Thesis (MEng) - School of Engineering and Science, Swinburne University of Technology, 2008.
Thesis submitted for the degree of Master of Engineering, School of Engineering and Science, Swinburne University of Technology, 2008. Typescript. Includes bibliographical references (p. 98-101).
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Pereira, Vitor Emanuel M. Loureiro S. "Computer model to predict electron beam-physical vapour deposition (EB-PVD) and thermal barrier coating (TBC) deposition on substrates with complex geometry." Thesis, Cranfield University, 2000. http://dspace.lib.cranfield.ac.uk/handle/1826/5714.

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For many decades gas turbine engineers have investigated methods to improve engine efficiency further. These methods include advances in the composition and processing of materials, intricate cooling techniques, and the use of protective coatings. Thermal barrier coatings (TBCs) are the most promising development in superalloy coatings research in recent years with the potential to reduce metal surface temperature, or increase turbine entry temperature, by 70-200°C. In order for TBCs to be exploited to their full potential, they need to be applied to the most demanding of stationary and rotating components, such as first stage blades and vanes. Comprehensive reviews of coating processes indicate that this can only be achieved on rotating components by depositing a strain-tolerant layer applied by the electron beam-physical vapour deposition (EB-PVD) coating process. A computer program has been developed in Visual c++ based on the Knudsen cosine law and aimed at calculating the coating thickness distribution around any component, but typically turbine blades. This should permit the controlled deposition to tailor the TBC performance and durability. Various evaporation characteristics have been accommodated by developing a generalised point source evaporation model that involves real and virtual sources. Substrates with complex geometry can be modelled by generating an STL file from a CAD package with the geometric information of the component, which may include shadow-masks. Visualisation of the coated thickness distributions around components was achieved using OpenGL library functions within the computer model. This study then proceeded to verify the computer model by first measuring the coating thickness for experimental trial runs and then comparing the calculated coating thickness to that measured using a laboratory coater. Predicted thickness distributions are in good agreement even for the simplified evaporation model, but can be improved further by increasing the complexity of the source model.
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Branger, Vincent. "Analyse microstructurale et mécanique de films minces métalliques obtenus par PVD [physical vapor deposition]." Poitiers, 1998. http://www.theses.fr/1998POIT2258.

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Un grand nombre de travaux experimentaux ont montre que les materiaux sous forme de films minces peuvent admettre des contraintes qui sont tres largement superieures a la limite elastique de ces memes materiaux a l'etat massif. La microstructure particuliere (hors d'equilibre, nanograins) de ces films est generalement avancee pour argumenter les observations experimentales. Ainsi, pour mieux comprendre les relations etroites qui existent entre la structure, les proprietes mecaniques et les processus d'elaboration des films minces, il est necessaire de mener de front une etude a la fois sur la microstructure et les aspects mecaniques intrinseques du film tels que les contraintes residuelles et le module elastique. Pour atteindre cet objectif, nous avons mis en uvre un ensemble de techniques d'analyse variees et complementaires (diffraction des rayons x, spectroscopie mecanique) qui permet d'acceder aux defauts et aux contraintes dans les regions intra granulaires mais aussi inter granulaires (joints de grains) de films minces metalliques (ag, pt, ni, cu, mo et cu-mo). Nous avons confirme l'influence de l'energie des atomes deposes sur la genese des contraintes dans ces films minces et etabli le lien etroit existant entre les defauts et l'etat mecanique au travers de modeles simples decrits par certains auteurs dans la litterature. Lors de l'etude de la stabilite des solutions solides cu-mo, nous avons montre le role important joue par les contraintes residuelles et determine par des techniques variees (spectroscopie mecanique, acoustique picoseconde et diffusion brillouin) le module d'young de ces films. Enfin, une premiere etude par microscopie en champ proche des decollements spontanes inities par les contraintes dans ces films minces nous a permis de determiner l'energie d'adhesion de l'ensemble film/substrat.
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Schmitz, Tobias [Verfasser], and Jürgen [Gutachter] Groll. "Functional coatings by physical vapor deposition (PVD) for biomedical applications / Tobias Schmitz ; Gutachter: Jürgen Groll." Würzburg : Universität Würzburg, 2017. http://d-nb.info/1126419125/34.

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Ivchenko, Dmitrii. "Modeling and design of a physical vapor deposition process assisted by thermal plasma (PS-PVD)." Thesis, Limoges, 2018. http://www.theses.fr/2018LIMO0099/document.

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Le procédé de dépôt physique en phase vapeur assisté par plasma thermique (PS-PVD) consiste à évaporer le matériau sous forme de poudre à l’aide d’un jet de plasma d’arc soufflé pour produire des dépôts de structures variées obtenus par condensation de la vapeur et/ou dépôt des nano-agrégats. Dans le procédé de PS-PVD classique, l’intégralité du traitement du matériau est réalisée dans une enceinte sous faible pression, ce qui limite les phénomènes d’évaporation ou nécessite d’utiliser des torches de puissance importante. Dans ce travail, une extension du procédé de PS-PVD conventionnel à un procédé à deux enceintes est proposée puis explorée par voie de modélisation et de simulation numérique : la poudre est évaporée dans une enceinte haute pression (105 Pa) reliée par une tuyère de détente à une enceinte de dépôt basse pression (100 ou 1 000 Pa), permettant une évaporation énergétiquement plus efficace de poudre de Zircone Yttriée de granulométrie élevée, tout en utilisant des torches de puissance raisonnable. L’érosion et le colmatage de la tuyère de détente peuvent limiter la faisabilité d’un tel système. Aussi, par la mise en oeuvre de modèles numériques de mécaniquedes fluides et basé sur la théorie cinétique de la nucléation et de la croissance d’agrégats, on montre que, par l’ajustement des dimensions du système et des paramètres opératoires ces deux problèmes peuvent être contournés ou minimisés. En particulier, l’angle de divergence de la tuyère de détente est optimisé pour diminuer le risque de colmatage et obtenir le jet et le dépôt les plus uniformes possibles à l'aide des modèles susmentionnés, associés à un modèle DSMC (Monte-Carlo) du flux de gaz plasmagène raréfié. Pour une pression de 100 Pa, les résultats montrent que la barrière thermique serait formée par condensation de vapeur alors que pour 1 000 Pa, elle serait majoritairement formée par dépôt de nano-agrégats
Plasma Spray Physical Vapor Deposition (PS-PVD) aims to substantially evaporate material in powder form by means of a DC plasma jet to produce coatings with various microstructures built by vapor condensation and/or by deposition of nanoclusters. In the conventional PS-PVD process, all the material treatment takes place in a medium vacuum atmosphere, limiting the evaporation process or requiring very high-power torches. In the present work, an extension of conventional PS-PVD process as a two-chamber process is proposed and investigated by means of numerical modeling: the powder is vaporized in a high pressure chamber (105 Pa) connected to the low pressure (100 or 1,000 Pa) deposition chamber by an expansion nozzle, allowing more energetically efficient evaporation of coarse YSZ powders using relatively low power plasma torches. Expansion nozzle erosion and clogging can obstruct the feasibility of such a system. In the present work, through the use of computational fluid dynamics, kinetic nucleation theory and cluster growth equations it is shown through careful adjustment of system dimensions and operating parameters both problems can be avoided or minimized. Divergence angle of the expansion nozzle is optimized to decrease the clogging risk and to reach the most uniform coating and spray characteristics using the aforementioned approaches linked with a DSMC model of the rarefied plasma gas flow. Results show that for 100 Pa, the thermal barrier coating would be mainly built from vapor deposition unlike 1,000 Pa for which it is mainly built by cluster deposition
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Kabir, Humaun Md. "Beeinflussung und Charakterisierung von Schichteigenschaften metallisierter Textilien." Doctoral thesis, Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden, 2004. http://nbn-resolving.de/urn:nbn:de:swb:14-1107163601832-76149.

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Mit dünnen Schichten, die mittels der PVD-Dünnschichttechnik auf Textilien aufgebracht werden, wird eine neue Möglichkeit zur Veredlung von Textilien eröffnet. Die Plasmabehandlung bewirkt eine Veränderung der Substratoberfläche in zwei Richtungen. Einerseits werden die Oberflächenspannung und die Adhäsion beeinflusst und andererseits kommt es zum Aufrauhen der Oberfläche. Die Zunahme der Oberflächenrauheit, hat drei Auswirkungen. Erstens bietet die größere Fläche mehrere molekulare Aufstellungsorte für die Wechselwirkung zwischen dem Adhärens und dem Adhäsiv an. Zweitens wird das mechanische Ineinandergreifen (Interlocking) zwischen dem Adhäsiv und Adhärens stärker und drittens kommt es zum Entfernen der schwachen Grenzschichten auf der Proben-Oberfläche. Die Vorbehandlung mittels Fluorierung führt ebenso wie die Niederdruckplasmabehandlung mit Sauerstoff bei Gewebe aus synthetische Fasern grundsätzlich zu einer Verbesserung der Festigkeit im Verbund. Beide Vorbehandlungsmethoden stellen alternative, notwendige Verfahren zur Haftungsverbesserung dar. Im Allgemeinen haften die Schichten bei besputterten Proben gegenüber bedampften Proben besser. Eine wesentlich geringere Haftung weisen die Schichten auf den unbehandelten Substraten auf. Neben Untersuchungen zur Haftbeständigkeit der Schichten erfolgen Untersuchungen zur Leitfähigkeit und zur elektromagnetischen Schirmdämpfung der Substrate. Die Oberflächenwiderstände werden sowohl von der Konstruktion der textilen Fläche als auch von den Beschichtungszeiten beeinflusst. Erwartungsgemäß führen längere Beschichtungszeiten zu sinkenden Oberflächenwiderständen.
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Hagerty, Phillip. "Physical Vapor Deposition of Materials for Flexible Two Dimensional Electronic Devices." University of Dayton / OhioLINK, 2016. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1460739765.

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Books on the topic "PVD [Physical Vapour Deposition]"

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Moran, Robert. Physical vapor deposition (PVD). Norwalk, Conn., U.S.A: Business Communications Co., 1990.

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Mattox, D. M. Handbook of physical vapor deposition (PVD) processing. 2nd ed. Norwich, N.Y: William Andrew, 2010.

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Handbook of physical vapor deposition (PVD) processing: Film formation, adhesion, surface preparation and contamination control. Westwood, N.J: Noyes Publications, 1998.

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Kucharska, Barbara. Powłoki PVD ze stali chromowo-niklowej modyfikowane dodatkami Al, Ir, Re i Ru: PVD coatings composed of chromium nickel steel modified with addition of Al, Ir, Re and Ru. Częstochowa: Wydawnictwo Wydziału Inżynierii Procesowej, Materiałowej i Fizyki Stosowanej Politechniki Częstochowskiej, 2011.

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Bates, Robin Ian. Physical vapour deposition of magnesium and titanium onto the internal surface of hemispheres. Salford: University of Salford, 1992.

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Handbook of Physical Vapor Deposition (PVD) Processing. Elsevier, 2010. http://dx.doi.org/10.1016/c2009-0-18800-1.

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Cockrem, Jeremy Maurice. Investigation of plasma nitriding and titanium nitride coating by physical vapour deposition of titanium 6A14V alloy to improve the wear resistance of inner bores V1:Initial investigation of plasma nitriding and titanium nitride coating by physical vapour deposition of titanium 6A1-4V alloy. 1995.

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Cockrem, Jeremy Maurice. Investigation of plasma nitriding and titanium nitride coating by physical vapour deposition of titanium 6A14V alloy to improve the wear resistance of inner bores V2:Final test results of plasma nitrided and physical vapour deposited titanium nitride coated titanium 6A1-4V samples and compared with samples coated using the established techniquesof electroless nickel phosphorous plating. 1995.

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Book chapters on the topic "PVD [Physical Vapour Deposition]"

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Bouzakis, Konstantinos-Dionysios, and Nikolaos Michailidis. "Physical Vapor Deposition (PVD)." In CIRP Encyclopedia of Production Engineering, 1–8. Berlin, Heidelberg: Springer Berlin Heidelberg, 2015. http://dx.doi.org/10.1007/978-3-642-35950-7_6489-4.

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Bouzakis, Konstantinos-Dionysios, and Nikolaos Michailidis. "Physical Vapor Deposition (PVD)." In CIRP Encyclopedia of Production Engineering, 1–8. Berlin, Heidelberg: Springer Berlin Heidelberg, 2018. http://dx.doi.org/10.1007/978-3-642-35950-7_6489-5.

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Bouzakis, Konstantinos-Dionysios, and Nikolaos Michailidis. "Physical Vapor Deposition (PVD)." In CIRP Encyclopedia of Production Engineering, 939–46. Berlin, Heidelberg: Springer Berlin Heidelberg, 2014. http://dx.doi.org/10.1007/978-3-642-20617-7_6489.

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Bouzakis, Konstantinos-Dionysios, and Nikolaos Michailidis. "Physical Vapor Deposition (PVD)." In CIRP Encyclopedia of Production Engineering, 1308–16. Berlin, Heidelberg: Springer Berlin Heidelberg, 2019. http://dx.doi.org/10.1007/978-3-662-53120-4_6489.

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Thévenot, F. "By Physical Vapor Deposition (PVD)." In Inorganic Reactions and Methods, 10. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2007. http://dx.doi.org/10.1002/9780470145241.ch9.

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Hwang, Nong Moon. "Thermodynamics of Physical and Chemical Vapour Deposition." In Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes, 21–50. Dordrecht: Springer Netherlands, 2016. http://dx.doi.org/10.1007/978-94-017-7616-5_2.

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Koike, Junichi. "Physical Vapor Deposition Barriers for Cu metallization - PVD Barriers." In Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications, 311–23. New York, NY: Springer New York, 2009. http://dx.doi.org/10.1007/978-0-387-95868-2_21.

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Maile, K., K. Berreth, and A. Lyutovich. "Functionally Graded Coatings of Carbon Reinforced Carbon by Physical and Chemical Vapour Deposition (PVD and CVD)." In Functionally Graded Materials VIII, 347–52. Stafa: Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-970-9.347.

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Harder, B. J., and D. Zhu. "Plasma Spray-Physical Vapor Deposition (PS-PVD) of Ceramics for Protective Coatings." In Advanced Ceramic Coatings and Materials for Extreme Environments, 71–84. Hoboken, NJ, USA: John Wiley & Sons, Inc., 2011. http://dx.doi.org/10.1002/9781118095232.ch7.

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Pervaiz, Salman, and Wael Abdel Samad. "Tool Wear Mechanisms of Physical Vapor Deposition (PVD) TiAlN Coated Tools Under Vegetable Oil Based Lubrication." In Mechanics of Additive and Advanced Manufacturing, Volume 9, 101–7. Cham: Springer International Publishing, 2017. http://dx.doi.org/10.1007/978-3-319-62834-9_14.

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Conference papers on the topic "PVD [Physical Vapour Deposition]"

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Northam, Matthew, Lin Rossmann, Brooke Sarley, Bryan Harder, Jun-Sang Park, Peter Kenesei, Jonathan Almer, Vaishak Viswanathan, and Seetha Raghavan. "Comparison of Electron-Beam Physical Vapor Deposition and Plasma-Spray Physical Vapor Deposition Thermal Barrier Coating Properties Using Synchrotron X-Ray Diffraction." In ASME Turbo Expo 2019: Turbomachinery Technical Conference and Exposition. American Society of Mechanical Engineers, 2019. http://dx.doi.org/10.1115/gt2019-90828.

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Abstract Electron-beam physical vapor deposition (EB-PVD) is widely used for the application of thermal barrier coatings (TBCs) to turbine blades in jet engines. An emerging method, plasma-spray physical vapor deposition (PS-PVD), is a hybrid technique whereby coatings can be applied via the liquid phase to form lamellar microstructures or via the vapor to form columnar microstructures similar to that of EB-PVD. In this study, PS-PVD and conventional EB-PVD coated samples of a columnar configuration were prepared and thermally cycled to 300 and 600 cycles. These samples were subsequently characterized in-situ, under thermal load using synchrotron x-rays. From the high-resolution x-ray diffraction (XRD) patterns, the residual and in-situ strain in the TGO layer was obtained during a thermal cycle. At high temperature, the TGO layer for both deposition methods displayed a constant near zero-strain for all samples as anticipated. In the samples with 300 thermal cycles, both deposition methods showed similar strain profiles in the TGO layer. For samples with 600 cycles, PS-PVD samples showed a more significant strain relief in the TGO at room temperature compared to similarly cycled EB-PVD samples. This could explain the coating lifetime performance between the two deposition methods. The findings support ongoing efforts to tune the manufacturing of PS-PVD coatings towards the goal of meeting or exceeding the performance of currently used coatings on jet engines. This will pave the way for more affordable high temperature coating alternatives that meet durability needs.
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Gott, Kevin, Anil Kulkarni, and Jogender Singh. "A Comparison of Continuum, DSMC and Free Molecular Modeling Techniques for Physical Vapor Deposition." In ASME 2013 International Mechanical Engineering Congress and Exposition. American Society of Mechanical Engineers, 2013. http://dx.doi.org/10.1115/imece2013-66433.

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Advanced Physical Vapor Deposition (PVD) techniques are available that produce thin-film coatings with adaptive nano-structure and nano-chemistry. However, such components are manufactured through trial-and-error methods or in repeated small increments due to a lack of adequate knowledge of the underlying physics. Successful computational modeling of PVD technologies would allow coatings to be designed before fabrication, substantially improving manufacturing potential and efficiency. Previous PVD modeling efforts have utilized three different physical models depending on the expected manufacturing pressure: continuum mechanics for high pressure flows, Direct Simulation Monte Carlo (DSMC) modeling for intermediate pressure flows or free-molecular (FM) dynamics for low pressure flows. However, preliminary calculations of the evaporation process have shown that a multi-physics fluidic solver that includes all three models may be required to accurately simulate PVD coating processes. This is due to the high vacuum and intermolecular forces present in vapor metals which cause a dense continuum region to form immediately after evaporation and expands to a rarefied region before depositing on the target surface. This paper seeks to understand the effect flow regime selection has on the predicted deposition profile of PVD processes. The model is based on experiments performed at the Electron-Beam PVD (EB-PVD) laboratory at the Applied Research Lab at Penn State. CFD, DSMC and FM models are separately used to simulate a coating process and the deposition profiles are compared. The mass deposition rates and overall flow fields of each model are compared to determine if the underlying physics significantly alter the predicted coating profile. Conclusions are drawn on the appropriate selection of fluid physics for future PVD simulations.
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von Niessen, Konstantin, and Malko Gindrat. "Vapor Phase Deposition Using a Plasma Spray Process." In ASME Turbo Expo 2010: Power for Land, Sea, and Air. ASMEDC, 2010. http://dx.doi.org/10.1115/gt2010-22640.

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Plasma spray - physical vapor deposition (PS-PVD) is a low pressure plasma spray technology recently developed by Sulzer Metco AG (Switzerland) to deposit coatings out of the vapor phase. PS-PVD is developed on the basis of the well established low pressure plasma spraying (LPPS) technology. In comparison to conventional vacuum plasma spraying (VPS) and low pressure plasma spraying (LPPS), these new process use a high energy plasma gun operated at a work pressure below 2 mbar. This leads to unconventional plasma jet characteristics which can be used to obtain specific and unique coatings. An important new feature of PS-PVD is the possibility to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional physical vapor deposition (PVD) technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and electron beam - physical vapor deposition (EB-PVD) coatings. In contrast to EB-PVD, PS-PVD incorporates the vaporized coating material into a supersonic plasma plume. Due to the forced gas stream of the plasma jet, complex shaped parts like multi-airfoil turbine vanes can be coated with columnar thermal barrier coatings using PS-PVD. Even shadowed areas and areas which are not in the line of sight to the coating source can be coated homogeneously. This paper reports on the progress made by Sulzer Metco to develop a thermal spray process to produce coatings out of the vapor phase. Columnar thermal barrier coatings made of Yttria stabilized Zircona (YSZ) are optimized to serve in a turbine engine. This includes coating properties like strain tolerance and erosion resistance but also the coverage of multiple air foils.
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Gott, Kevin, Anil K. Kulkarni, and Jogender Singh. "A Combined Rarefied and Continuum Flow Regime Model for Physical Vapor Deposition (PVD) Manufacturing Processes." In ASME 2009 International Mechanical Engineering Congress and Exposition. ASMEDC, 2009. http://dx.doi.org/10.1115/imece2009-10796.

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Several modifications to physical vapor deposition (PVD) models are proposed to address the deficiencies in current theoretical studies. Simple calculations show that the flow regime of PVD fabrications will most likely vary from a continuum flow to a rarefied flow in the vacuum chamber as the vapor cloud expands toward the substrate. The flow regime for an evaporated ideal gas is calculated and then an improved equation of state is constructed and analyzed that more accurately describes vaporized metals. The result, combined with experimental observations, suggests PVD fabrication is best represented by a multi-regime flow. Then, a CFD analysis is summarized that further validates the multi-regime analysis hypothesis. Finally, a methodology for constructing and implementing the results of a theoretical multi-regime PVD model is presented.
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"Finding New Customized Materials by Physical Vapor Deposition (PVD) for Device Needs." In SVC TechCon 2016. Society of Vacuum Coaters, 2016. http://dx.doi.org/10.14332/svc16.proc.0025.

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Alberdi, A., M. Marin, I. Etxeberria, and G. Alberdi. "PVD-Based Microstructuring Surface Techniques for Tribological Applications." In World Tribology Congress III. ASMEDC, 2005. http://dx.doi.org/10.1115/wtc2005-63303.

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Combined techniques of Physical Vapour Deposition (PVD), laser ablation and UV-Photolithography have been set up to produce well defined surface textures able to increase the seizure resistance of high loaded lubricated systems. Using these new techniques, different predefined surface textures, following rectangular grid and zigzag stripped patterns have been generated. The microstructured surfaces developed have been characterised with confocal microscopy, optical and scanning electron microscopy. Ball-on-disc tribological tests under progressively increased load have been carried out using mineral oil as lubricant to determine the influence of surface microtextures on seizure resistance. The influence of shape and size of texture patterns on the tribological performance of the surface have been also studied.
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Soon, B. W., N. Singh, J. M. Tsai, and C. Lee. "Vacuum based wafer level encapsulation (WLE) of MEMS using physical vapor deposition (PVD)." In 2012 IEEE 14th Electronics Packaging Technology Conference - (EPTC 2012). IEEE, 2012. http://dx.doi.org/10.1109/eptc.2012.6507104.

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Murčinková, Zuzana, and Jaromír Murčinko. "Coating as Micro-Structural System." In 2nd International Conference on Research in Science, Engineering and Technology. Acavent, 2019. http://dx.doi.org/10.33422/2nd.icrset.2019.11.783.

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The paper provides the application of nanostructured TiAlN and nanocomposite structured TiAlSiN coatings on step drills. The analyses proved that the obtained tool lives are different despite the fact that the same tool geometry, coating, and PVD (physical vapour deposition) technology are used. This disproportion was experimentally tested focusing on surface condition using the pre and post treatment and on the chemical and structural coating composition.
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Teixeira, V., M. Andritschky, W. Fischer, D. Stöver, and H. P. Buchkremer. "Residual Stress Analysis of Plasma Sprayed Thermal Barrier Coatings." In ITSC 1997, edited by C. C. Berndt. ASM International, 1997. http://dx.doi.org/10.31399/asm.cp.itsc1997p0839.

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Abstract ZrO27Y2O3 plasma sprayed coatings were applied on high temperature Ni-based alloys precoated with a thin, dense, stabilized zirconia coating produced by Physical Vapour Deposition. This contribution concerns with the experimental and numerical analysis of residual stresses in PVD/Plasma Sprayed TBC's systems after coating deposition and after high temperature testing, such as cyclic oxidation and rapid thermal cycling. The thermal residual stress developed in the plasma sprayed top coating during spraying was simulated by using an heat transfer FEM program and an elasto-plastic biaxial stress model which calculate the stress gradients in coating/substrate system. The residual stress distributions within the TBC undergoing thermal cycling is then calculated by a biaxial stress model, taking into account the residual stress due to the deposition technique of the PVD and plasma sprayed top coating and the presence of the growing oxide interlayer. The residual stress within the upper layers of the top coating was verified experimentally by X-ray Diffraction for the as-deposited and thermal cycled samples, and the stresses within PVD bond coating and oxide interlayer were measured by microRaman spectroscopy technique in cross-sectioned samples. The measurements are in good agreement with residual stress modelled results.
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Singh, Lakshmi, Anil K. Kulkarni, and Jogender Singh. "A Model for Deposition of Metal Vapors From Multiple Targets on a Cylindrical Substrate." In ASME 2009 International Mechanical Engineering Congress and Exposition. ASMEDC, 2009. http://dx.doi.org/10.1115/imece2009-10637.

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The paper addresses a challenging problem of developing technology for heat exchanger tubes embedded in ceramic composite matrix. Functionally graded composite tubes, made using physical vapor deposition (PVD) process, are required to have diffusion barrier layers, withstand high temperature, and be impermeable to hydrogen. The work addresses mathematical modeling of the deposition of metallic vapors from multiple targets on a cylindrical substrate to simulate the PVD process in manufacturing such tubes. Materials used for the deposition are Molybdenum and Niobium because they have shown good formability, strength, toughness and ductility over a wide range of temperatures. Commercially available software FLUENT was used to model the process. Prediction of condensation of vapors from metal ingots occurs in varying proportion along the circumference of the tube, resulting in submicron layers of different materials of varying thicknesses being ingrained into each other. Results are presented for patterns of materials showing continuously changing relative concentration of deposited metals over a stationary and rotating cylindrical substrate.
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