Journal articles: 'PVD [Physical Vapour Deposition]'

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Goral, Marek, Slawomir Kotowski, and Jan Sieniawski. "The Technology of Plasma Spray Physical Vapour Deposition." High Temperature Materials and Processes 32, no. 1 (February 22, 2013): 33–39. http://dx.doi.org/10.1515/htmp-2012-0051.

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AbstractThe article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades.

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Stuart, Bryan W., and George E. Stan. "Physical Vapour Deposited Biomedical Coatings." Coatings 11, no. 6 (May 21, 2021): 619. http://dx.doi.org/10.3390/coatings11060619.

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This Special Issue was devoted to developments made in Physical Vapour Deposited (PVD) biomedical coatings for various healthcare applications. The scrutinized PVD methods were Radio-Frequency Magnetron Sputtering (RF-MS), Cathodic Arc Evaporation, Pulsed Electron Deposition and its variants, Pulsed Laser Deposition, and Matrix Assisted Pulsed Laser Evaporation (MAPLE), due to their great promise especially in the dentistry and orthopaedics. These methods have yet to gain traction for industrialization and large-scale application in biomedicine. A new generation of implant coatings can be made available by the (1) incorporation of organic moieties (e.g., proteins, peptides, enzymes) into thin films by innovative methods such as combinatorial MAPLE, (2) direct coupling of therapeutic agents with bioactive glasses or ceramics within substituted or composite layers via RF-MS, or (3) by innovation in high energy deposition methods such as arc evaporation or pulsed electron beam methods.

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Chaudhari, Mandakini N. "Thin film Deposition Methods: A Critical Review." International Journal for Research in Applied Science and Engineering Technology 9, no. VI (June 30, 2021): 5215–32. http://dx.doi.org/10.22214/ijraset.2021.36154.

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The aim of this review paper is to present a critical analysis of existing methods of thin film deposition. Paper discusses some thin film techniques which are advanced and popular. The advantages and disadvantages of each method are mentioned. The two major areas of interest discussed are physical and chemical vapor deposition techniques. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. It is examined that some remarkable similarities and difference between the specific methods. The sub methods which are having common principle are classified. The number of researchers attempted to explain the how the specific method is important and applicable for the deposition of thin films. In conclusion the most important method of depositing thin films is CVD. For our research work the Spray Pyrolysis technique, which is versatile and found suitable to use.

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Vu, Tuan Duc, Zhang Chen, Xianting Zeng, Meng Jiang, Shiyu Liu, Yanfeng Gao, and Yi Long. "Physical vapour deposition of vanadium dioxide for thermochromic smart window applications." Journal of Materials Chemistry C 7, no. 8 (2019): 2121–45. http://dx.doi.org/10.1039/c8tc05014g.

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In this paper, various PVD techniques, such as pulsed laser deposition (PLD), evaporation decomposition (ED) and sputtering, are examined with respect to their conditions for VO₂fabrication, film quality and the strategies for film improvements.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 98, no. 1 (January 2000): 410–23. http://dx.doi.org/10.1016/s0026-0576(00)80350-5.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 99 (January 2001): 409–23. http://dx.doi.org/10.1016/s0026-0576(01)85301-0.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 100 (January 2002): 394–408. http://dx.doi.org/10.1016/s0026-0576(02)82043-8.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 97, no. 1 (January 1999): 410–23. http://dx.doi.org/10.1016/s0026-0576(00)83101-3.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 97, no. 1 (January 1999): 417–30. http://dx.doi.org/10.1016/s0026-0576(99)80043-9.

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Mattox, Donald M. "Physical vapor deposition (PVD) processes." Metal Finishing 93, no. 1 (January 1995): 387–400. http://dx.doi.org/10.1016/0026-0576(95)93388-i.

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Abdullah, Mohd Zakuan Bin, Mohamad Azmirrudin Ahmad, Ahmad Nizam Abdullah, Mohamad Hazri Othman, Patthi Hussain, and Azman Zainuddin. "Metal Release of Multilayer Coatings by Physical Vapour Deposition (PVD)." Procedia Engineering 148 (2016): 254–60. http://dx.doi.org/10.1016/j.proeng.2016.06.612.

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Gabbitas, Brian, Peng Cao, Stella Raynova, and De Liang Zhang. "Fabrication of TiAl Target by Mechanical Alloying and Applications in Physical Vapour Deposition Coating." Materials Science Forum 534-536 (January 2007): 805–8. http://dx.doi.org/10.4028/www.scientific.net/msf.534-536.805.

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The research involves the development of a powder metallurgical route for producing good quality TiAl targets for making physical vapour deposition (PVD) coatings. Mixtures of elemental titanium and aluminium powders were mechanically milled using a novel discus milling technique under various conditions. Hot isostatic pressing (HIP) was then employed for consolidation of the mechanically alloyed powders. A cathodic arc vapour deposition process was applied to produce a TiAlN coating. A microstructural examination was conducted on the target material and PVD coatings, using X-ray diffractometry (XRD), X-ray photoelectron spectrometry (XPS) and scanning electron microscopy (SEM). It has been found that combining mechanical alloying and HIP enable us to produce a fairly good quality of TiAl based target. The PVD coatings obtained from the TiAl target showed very high microhardness values.

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Garcés, G., M. C. Cristina, M. Torralba, and P. Adeva. "Texture of magnesium alloy films growth by physical vapour deposition (PVD)." Journal of Alloys and Compounds 309, no. 1-2 (September 2000): 229–38. http://dx.doi.org/10.1016/s0925-8388(00)01075-6.

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OZIMINA, Dariusz, Joanna KOWALCZYK, and Monika MADEJ. "THE IMPACT OF BIODEGRADABLE CUTTING FLUID ON THE TRIBOLOGICAL PROPERTIES OF THE FRICTION PAIRS." Tribologia 265, no. 1 (February 29, 2016): 67–78. http://dx.doi.org/10.5604/01.3001.0010.7581.

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This paper discusses the results of wear tests performed with a T-01 M tribometer for a ball-on-disc configuration in sliding contact. The tests were carried out for HS6-5-2C steel discs with and without a TiAlN coating deposited by physical vapour deposition (PVD), which were in contact with 100Cr6 steel balls. The tests were conducted under dry friction conditions and under lubricated friction conditions with a cutting fluid containing zinc aspartate. The coating structure was observed using a JSM - 7100F scanning electron microscope. The surface texture of the discs and the balls was analysed as well as good adhesion to the substrate. Coated tools can operate under dry and wet machining conditions, and they improve the operating parameters of the element. Such coatings can be produced by chemical vapour deposition (CVD), physical vapour deposition (PVD), or similar techniques [L. 8, 4, 13].

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Gou, Ruyi, Xiaodong Zhang, Chunyu Feng, and Xin Wei. "Microstructure and Mechanical Properties Comparative Analysis of TiN Coated on Cemented Carbide." Journal of Computational and Theoretical Nanoscience 14, no. 1 (January 1, 2017): 441–47. http://dx.doi.org/10.1166/jctn.2017.6342.

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The cemented carbide of natural gas throttle valve has serious erosion phenomenon in natural gas exploitation. The titanium nitride (TiN) coating on cemented carbide is an effective method to prevent failure of cemented carbide. Three different processes physical vapor deposition (PVD), chemical vapor deposition (CVD) and plasma chemical vapor deposition (PCVD) are used to deposit TiN coating on cemented carbide. The experiments carried on the scanning electron microscopy, the digital micro hardness tester and scratch tester. The results indicate TiN coating deposited by PVD has characteristics of dense structure, uniform thickness, smooth surface. The coating hardness from big to small: PVD > PCVD > CVD. The coating elasticity modulus from big to small: PCVD > CVD > PVD. The bonding force between coating and substrate from big to small: PVD > CVD > PCVD. The results demonstrate that TiN coating deposited by PVD mechanical properties are superior to TiN coating deposited by CVD and PCVD.

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Tao, Lin, Lixiang Han, Qian Yue, Bin Yao, Yujue Yang, and Nengjie Huo. "High hole mobility in physical vapour deposition-grown tellurium-based transistors." Royal Society Open Science 8, no. 8 (August 2021): 210554. http://dx.doi.org/10.1098/rsos.210554.

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Carrier mobility is one of most important figures of merit for materials that can determine to a large extent the corresponding device performances. So far, extensive efforts have been devoted to the mobility improvement of two-dimensional (2D) materials regarded as promising candidates to complement the conventional semiconductors. Graphene has amazing mobility but suffers from zero bandgap. Subsequently, 2D transition-metal dichalcogenides benefit from their sizable bandgap while the mobility is limited. Recently, the 2D elemental materials such as the representative black phosphorus can combine the high mobility with moderate bandgap; however the air-stability is a challenge. Here, we report air-stable tellurium flakes and wires using the facile and scalable physical vapour deposition (PVD) method. The prototype field-effect transistors were fabricated to exhibit high hole mobility up to 1485 cm 2 V −1 s −1 at room temperature and 3500 cm 2 V −1 s −1 at low temperature (2 K). This work can attract numerous attentions on this new emerging 2D tellurium and open up a new way for exploring high-performance optoelectronics based on the PVD-grown p-type tellurium.

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Baptista, Andresa, Francisco Silva, Jacobo Porteiro, José Míguez, and Gustavo Pinto. "Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands." Coatings 8, no. 11 (November 14, 2018): 402. http://dx.doi.org/10.3390/coatings8110402.

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Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand.

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Kalenik, Jerzy, Konrad Kielbasinski, Piotr Firek, Elżbieta Czerwosz, and Jan Szmidt. "Thermal properties of modified carbon films." Circuit World 42, no. 1 (February 1, 2016): 37–41. http://dx.doi.org/10.1108/cw-10-2015-0055.

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Purpose – The purpose of this paper is to present thermal properties of palladium-carbon films prepared by physical vapour deposition (PVD)/chemical vapour deposition (CVD) methods. Design/methodology/approach – Thin palladium-carbon films were prepared at Tele- and Radioresearch Institute. Test structures containing palladium-carbon films and titanium electrodes were made. Temperature-resistance characteristics were measured. Findings – The results show strong temperature dependence of modified carbon film resistance. The dependence is stable, and so modified carbon films can be applied for various electronic applications. Originality/value – The paper presents thermal properties of thin palladium-carbon prepared by original PVD/CVD method at Tele- and Radioresearch Institute.

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Kim, Young Han, Su Yeong Jeong, Shunsuke Nishitani, Kouji Maeda, Yusuke Asakuma, and Keisuke Fukui. "Separation of fatty acids from binary melts using physical vapour deposition (PVD)." Journal of Chemical Technology & Biotechnology 84, no. 3 (March 2009): 316–19. http://dx.doi.org/10.1002/jctb.2039.

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Wang, Pei-bin, Kei Takeya, Kodo Kawase, and Hirohisa Uchida. "Effect of growth temperature conditions on the optimization of OH1 single-crystalline thin film by physical vapour deposition." CrystEngComm 21, no. 47 (2019): 7280–85. http://dx.doi.org/10.1039/c9ce01598a.

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The shape control of 2-(3-(4-hydroxystyry1)-5,5-dimethylcyclohex-2-enylidene) malononitrile (OH1) organic nonlinear optical (NLO) single-crystalline thin film grown by physical vapour deposition (PVD) has been achieved by optimizing the growth temperature condition.

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Baragetti, Sergio, Stefano Cavalleri, and Federico Tordini. "Contact Fatigue Crack Growth in PVD-Coated Spur Gears." Key Engineering Materials 417-418 (October 2009): 797–800. http://dx.doi.org/10.4028/www.scientific.net/kem.417-418.797.

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The aim of this work is to investigate the (rolling) contact fatigue behaviour of transmission spur gears coated with PVD (Physical Vapour deposition) thin hard films. Numerical models of coated steel and titanium spur gears were developed. The effect of the residual stress gradient induced by the coating deposition process was considered in the calculations. A theoretical-numerical procedure was arranged to foresee the crack propagation direction. Such a procedure could represent a powerful tool to predict the (rolling) contact fatigue resistance of PVD-coated gears.

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Góral, Marek, Maciej Pytel, Tadeusz Kubaszek, Marcin Drajewicz, Wojciech Simka, and Łukasz Nieużyła. "The new concept of thermal barrier coatings with Pt + Pd/Zr/Hf-modified aluminide bond coat and ceramic layer formed by PS-PVD method." High Temperature Materials and Processes 40, no. 1 (January 1, 2021): 281–86. http://dx.doi.org/10.1515/htmp-2021-0029.

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Abstract Thermal barrier coatings (TBCs) are widely used for protection of gas turbine parts from high temperature and corrosion. In the present study, the new concept of TBCs with three-element-modified aluminide coatings was presented. In the first stage, the Pt and Pd were electroplated on MAR M247 nickel superalloy. In the next stage, the low-activity CVD aluminizing process with Zr or Hf doping was conducted. The ceramic layer containing yttria-stabilized zirconia was obtained by the plasma spray physical vapour deposition (PS-PVD) method. The microscopic examination showed the formation of aluminide coating containing up to 5 at% of Pt and 10 at% of Pd in (Ni, Pt, Pd)Al solid solution. The small concentration of Hf and Zr in diffusion zone of aluminide bond coat was noted as well. The outer ceramic layer was characterized by columnar structure typically formed during the PS-PVD process. The obtained results showed that the new concept of TBCs formed using new processes might be an attractive alternative to conventional coatings produced using the expensive electron beam physical vapour deposition (EB-PVD) method.

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Džupon, Miroslav, Ľuboš Kaščák, Dušan Németh, and Réne Kubík. "Failure of Physical Vapour Deposition Coating Zirconium Nitride on the Punch of Clinching Tool." Acta Mechanica et Automatica 11, no. 2 (June 1, 2017): 143–49. http://dx.doi.org/10.1515/ama-2017-0022.

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AbstractA tool with a punch of ø5 mm and a die with a specially formed circular cavity and an annular gap was used for mechanical joining of thin hot-dip galvanized steel sheets. The active parts of punch and die were covered by PVD coating of ZrN type with LARC technology. The punches and the dies were tested in a complex tool by joining thin hot-dip galvanized steel sheets with the pressing force of 7,000 N. Decohesion of coating with width of 100 – 200 μm was observed in the perimeter of cylindrical part of ø5×4 mm in the in edge of punch radius R = 0.5 mm with deposited ZrN coating after the creation of 150 mechanical joints. The decohesion of PVD coating occurred mainly in the surroundings of the radius R = 0.5 mm on the front plane of ø15 mm part.

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Adhikari, N., S. Bereznev, J. Kois, O. Volobujeva, Taavi Raadik, R. Traksmaa, A. Tverjanovich, and A. Öpik. "PVD of N-CuIn3Se5 Photoabsorber Films." Key Engineering Materials 495 (November 2011): 339–42. http://dx.doi.org/10.4028/www.scientific.net/kem.495.339.

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Thin films of Cu-In-Se (CISe) photoabsorber with overall composition of CuIn3Se5 were deposited onto glass/ITO substrates by using physical vapour deposition (PVD) technique. Thermal conditions for the substrates during deposition process and following thermal annealing were selected with the purpose to prepare polycrystalline n-CuIn3Se5 photoabsorber layers for the hybrid photovoltaic structures based on inorganic photoabsorber and conductive polymer functional layers. It was found, that the CISe layers deposited at the temperature of substrate of 200 °C and annealed at the temperature range of 450-500 oC in vacuum and double annealed in argon and vacuum at 500 oC demonstrate high photosensitivity and photoconductivity under white light illumination of 100 mW/cm2 intensity. Obtained results show the chalcopyrite structure of prepared photoabsorber films with good adhesion to the glass/ITO substrate.

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N. Lenin Rakesh et al.,, N. Lenin Rakesh et al ,. "The Microstructure and Characterization of TiN Coatings Prepared by Physical Vapour Deposition (PVD)." International Journal of Mechanical and Production Engineering Research and Development 9, no. 4 (2019): 1269–74. http://dx.doi.org/10.24247/ijmperdaug2019132.

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Inaguma, Y. "Reduction of Friction Torque in Vane Pumps by Using Physical Vapour Deposition-Coated Vane." Proceedings of the Institution of Mechanical Engineers, Part C: Journal of Mechanical Engineering Science 224, no. 11 (April 12, 2010): 2449–58. http://dx.doi.org/10.1243/09544062jmes2120.

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This paper presents a method of reducing friction torque in a hydraulic vane pump through a short-period pump operation by using physical vapour deposition (PVD)-coated vanes. It is well known that the friction torque in a vane pump as well as in other hydraulic machines can be reduced by running-in through a long-time pump operation. This paper revealed that the reduction in the friction torque was derived from lowered friction between a cam contour and vane tips owing to the smoothed surface of a cam contour. Commonly, it was difficult to obtain such an effect through a short-period pump operation. The author has attempted to lessen the surface roughness of the cam contour and to decrease the friction torque of a vane in a short period of time by using vanes coated with an extremely hard PVD layer on their tips. In this study, three kinds of coatings of chromium nitride (CrN), titanium carbonitride (TiCN), and diamond-like carbon (DLC) by PVD were examined. It was found that the TiCN-coated vane was excellent in smoothing the surface roughness of the cam contour and in reducing the friction torque of the vane in a short period of time. It was also shown that the reduced friction torque of the vane depended essentially on the smoothness of the cam contour surface. In addition, the difference of the friction at the vane tip between an ordinary vane and coated vanes was indistinct for the same surface roughness of the cam contour below 0.8 μ m Rz.

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Bhuiyan, Abuhanif K., S. K. Dew, and M. Stepanova. "Kinetic Monte Carlo Simulation of Metallic Nanoislands Grown by Physical Vapor Deposition." Communications in Computational Physics 9, no. 1 (January 2011): 49–67. http://dx.doi.org/10.4208/cicp.311209.230410a.

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AbstractWe report kinetic Monte-Karlo (KMC) simulation of self-assembled synthesis of nanocrystals by physical vapor deposition (PVD), which is one of most flexible, efficient, and clean techniques to fabricate nanopatterns. In particular, self-assembled arrays of nanocrystals can be synthesized by PVD. However size, shape and density of self-assembled nanocrystals are highly sensitive to the process conditions such as duration of deposition, temperature, substrate material, etc. To efficiently synthesize nanocrystalline arrays by PVD, the process control factors should be understood in detail. KMC simulations of film deposition are an important tool for understanding the mechanisms of film deposition. In this paper, we report a KMC modeling that explicitly represents PVD synthesis of self-assembled nanocrystals. We study how varying critical process parameters such as deposition rate, duration, temperature, and substrate type affect the lateral 2D morphologies of self-assembled metallic islands on substrates, and compare our results with experimentally observed surface morphologies generated by PVD. Our simulations align well with experimental results reported in the literature.

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bin Abdullah, Mohd Zakuan, Ahmad Nizam bin Abdullah, Mohamad Hazri bin Othman, Amin bin Morat, and Mohamad Azmiruddin bin Ahmad. "Mechanical Properties of Cr/CrN/CrCN/ZrN Multilayer Coatings by Physical Vapour Deposition (PVD)." Advanced Materials Research 1133 (January 2016): 99–102. http://dx.doi.org/10.4028/www.scientific.net/amr.1133.99.

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Multilayer coating onto orthopedic implants has been studied extensively due to their excellence mechanical and biological properties. A multilayer coating was coated onto metal implants to prevent the leaching of metallic ions into human body. This paper aims to study the hardness of multilayer coatings of Chromium (Cr), Chromium Nitride (CrN), Chromium Carbonitride (CrCN) and Zirconium Nitride (ZrN) by Physical Vapour Deposition (PVD). The deposited multilayer coating was characterised by Scanning Electron Microscope (SEM), X-ray Diffraction (XRD) and Energy Dispersive X-ray (EDX). Cr, CrN, CrCN and ZrN have been successfully deposited onto stainless steel substrates by PVD. XRD analysis detected major peak in preferred orientation of (200) and other peaks with (111), (220), (311) for CrN cubic phase. For CrCN, XRD analysis detected only low intensity peaks of Cr7C3 and ZrN peaks with preferred orientation of (111), (200) with other peak (220), (311) and (222). Microvickers Hardness results showed an increment in hardness value from substrates with 160HV to 174HV for Cr, 236HV for CrN, 362HV for CrCN, 364HV for ZrN and 370HV for multilayer coatings.

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Cheng, Zefei, Jiasheng Yang, Fang Shao, Xinghua Zhong, Huayu Zhao, Yin Zhuang, Jinxing Ni, and Shunyan Tao. "Thermal Stability of YSZ Coatings Deposited by Plasma Spray–Physical Vapor Deposition." Coatings 9, no. 8 (July 24, 2019): 464. http://dx.doi.org/10.3390/coatings9080464.

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The plasma spray–physical vapor deposition (PS–PVD) process has received considerable attention due to its non-line of sight deposition ability, high deposition rates, and cost efficiency. Compared with electron beam–physical vapor deposition (EB–PVD), PS–PVD can also prepare thermal barrier coatings (TBCs) with columnar microstructures. In this paper, yttria-stabilized zirconia (YSZ) coatings were fabricated by PS–PVD. Results showed that the as-deposited coating presented a typical columnar structure and was mainly composed of metastable tetragonal (t′-ZrO2) phase. With thermal exposure, the initial t′ phase of YSZ evolved gradually into monoclinic (m-ZrO2) phase. Significant increase in hardness (H) and the Young’s modulus (E) of the coating was attributed to the sintering effect of the coating during the thermal exposure, dependent on exposure temperature and time. However, the values of H and E decreased in the coatings thermally treated at 1300–1500 °C for 24 h, which is mainly affected by the formation of m-ZrO2 phase.

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Malarvannan, R. Ravi Raja, T. V. Moorthy, and M. Shunmuga Priyan. "Performance of PVD Coated on High Speed Steel Cutting Tool in Industrial Applications." Advanced Materials Research 984-985 (July 2014): 495–501. http://dx.doi.org/10.4028/www.scientific.net/amr.984-985.495.

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An experimental investigation of mechanical properties of TiN and AlCrN Coated cutting tools have been performed at room Temperature. HSS single point cutting tool is taken as substrate material. Aluminium chromium nitride (AlCrN) and Titanium Nitride (TiN) is applied by physical vapour deposition method. Vaporized and condensed form of the desired film material on to various work piece surface is generally known as Physical Vapor Deposition (PVD). The finished product’s surface finish is increased by the coated tool and hence it reduces the cost of quality control process in industry. In uncoated HSS tool, the tool frequently requires replacement or reconditioning, which is not required for TiN and AlCrN Coated cutting tool and hence it reduces the cost for replacements .In PVD coating, the tool life is increased about 7.5 times compared to the uncoated cutting tool. For the factor of cost analysis, the cost required for making an AlCrN coated cutting tool is drastically reduced and increased life of tool also reduces the cost to procure a new tool or replacing an old one.

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Maile, Karl, K. Berreth, and A. Lyutovich. "Functionally Graded Coatings of Carbon Reinforced Carbon by Physical and Chemical Vapour Deposition (PVD and CVD)." Materials Science Forum 492-493 (August 2005): 347–52. http://dx.doi.org/10.4028/www.scientific.net/msf.492-493.347.

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This paper reflects our R&D results in the field of functionally graded coating processes. For industrial applications a special architecture for coatings is necessary: because the surface has to withstand environmental attacks, specific physical and mechanical functions and characteristics are required. In the interface region to the substrate additional stresses and strains occur due to the different materials combined. Consequently, the coatings have to be chemically and mechanically adjusted to the substrates. For this challenging problem, a concept named Materials Adapter has been developed within the frame of different research programs at MPA. For optimisation of the interface region an ion bombardment-activated inter-diffusion process ("ion mixing") was employed by using ion assisted electron beam PVD (IA EB PVD). Several Cr, Ti, Al and Zr coatings have been produced. An automated precursor inlet has been installed for CVD processes to obtain preset composition profiles for graded systems. Especially multilayer stacks of PyC-SixCy-SiC-Si3N4-Al2O3 have been deposited in a single growth process. The structure and composition of the coatings and interfaces were investigated by XRD, AFM, SEM, EDX, EPMA, ESCA and the micro-Raman spectroscopy. The characterisation confirms the gradual transition between Si and Cr, as well as between Cr and Al deposited by IA EB PVD and between C and Si grown by CVD.

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Baptista, A., F. J. G. Silva, J. Porteiro, J. L. Míguez, G. Pinto, and L. Fernandes. "On the Physical Vapour Deposition (PVD): Evolution of Magnetron Sputtering Processes for Industrial Applications." Procedia Manufacturing 17 (2018): 746–57. http://dx.doi.org/10.1016/j.promfg.2018.10.125.

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Sgarabotto, Francesco, and Andrea Ghiotti. "Tribological Behaviour of PVD Coatings for Sheet Metal Forming Tools: Laboratory and Industrial Evaluation." Key Engineering Materials 504-506 (February 2012): 543–48. http://dx.doi.org/10.4028/www.scientific.net/kem.504-506.543.

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In the last decades, Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD) processes have been significantly improved and optimized for the applications on dies for sheet metal forming processes. However, due to the different contact conditions at dies-blank interfaces, and the wide range of applied contact pressures, the selection of the correct coating may be still affected by trials-and-error approaches. Although many methods to evaluate the tribological performances of such coatings can be found in scientific literature, they often suffer of limitations in reproducing the interface conditions typical of industrial processes. The objective of the present research work is to investigate the tribological behaviour of two coatings deposited by PVD magnetron sputtering technique. Both investigations in laboratory and industrial conditions were performed: the former to evaluate their tribological characteristics, the latter to test the performances of coatings in production lines. The results, in terms of wear resistance, outline the comparison of the new technology with the performances of traditional dies.

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Zhang, Bochun, Kuiying Chen, and Natalie Baddour. "The Effect of Interfacial Roughness on Residual Stresses in Electron Beam-Physical Vapor Deposition of Thermal Barrier Coatings." Coatings 11, no. 3 (March 17, 2021): 341. http://dx.doi.org/10.3390/coatings11030341.

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Residual stresses play an essential role in determining the failure mechanisms and life of an electron beam-physical vapour deposition thermal barrier coating (EB-PVD TBC) system. In this paper, a new transitional roughness model was proposed and applied to describe the interfacial roughness profile during thermal cycles. Finite element models were implemented to calculate residual stresses at specific positions close to the interface of TBCs using temperature process-dependent model parameters. Combining stresses evaluated at valleys of the topcoat (TC) and excessive sharp tip roughness profiles, positions where the maximum out-of-plane residual stresses occur were identified and used to explain possible cracking routes of EB-PVD TBCs as interfacial roughness evolves during thermal cycling.

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Kawamoto, H., N. Higashitarumizu, N. Nagamura, M. Nakamura, K. Shimamura, N. Ohashi, and K. Nagashio. "Micrometer-scale monolayer SnS growth by physical vapor deposition." Nanoscale 12, no. 45 (2020): 23274–81. http://dx.doi.org/10.1039/d0nr06022d.

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Métraux, C., and B. Grobéty. "Tellurium nanotubes and nanorods synthesized by physical vapor deposition." Journal of Materials Research 19, no. 7 (July 2004): 2159–64. http://dx.doi.org/10.1557/jmr.2004.0277.

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Tellurium nanotubes and nanorods were synthesized by physical vapor deposition (PVD) in an induction furnace for reaction times between 25 and 35 min. The growth morphologies depended on the reaction times and the atmosphere in the induction furnace. Nanotubes grew only under argon atmosphere (1 mbar). Under vacuum, tellurium blades and nanorods were observed. Of particular interest are the dense carpets of nanorods observed on polycrystalline aluminum. PVD experiences in a conventional high vacuum coating system did not lead to the formation of nanotubes nor nanorods. The interesting electrical properties of tellurium and tellurium compounds combined with the observed growth morphologies are promising for the fabrication of nanoscale functional devices.

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Lille, Harri, Alexander Ryabchikov, Jakub Kõo, Valdek Mikli, Eron Adoberg, Heinar Vagiström, Jakob Kübarsepp, and Priidu Peetsalu. "Average Residual Stresses in Hard Physical Vapor Deposited (PVD) Coatings." Key Engineering Materials 799 (April 2019): 20–25. http://dx.doi.org/10.4028/www.scientific.net/kem.799.20.

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In this study we determined average residual stresses in hard nitride PVD AlCrN, TiAlN and TiCN coatings through simultaneous measurement of length variation in thin-walled tubular substrates and of the curvature of plate substrates. A device for measurement of the length of the tube was developed. Inside the depositing chamber the tube and the plate were fixed parallel in the relation to the axis of the rotating cathode. One batch of plate samples was produced by deposition on front surface (facing the cathode) and the other batch, by deposition on back surface (with back to the cathode). The cross-sectional microstructure and thickness of the coatings were investigated by means of scanning electron microscopy (SEM). The thicknesses of the coatings deposited on front and back surfaces of the plates and on the tube were significantly different. The values of average compressive residual stresses, determined by both methods, were very high irrespective of coating thickness. It was found that the values of compressive residual stresses in the coating were dependent on the shape of the substrate and on its position in the relation to the axis of the rotating cathode.

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Liu, Ai Hua, Jian Xin Deng, and Peng Zhang. "Tribological Properties of PVD CrAlN Coating Tools." Advanced Materials Research 706-708 (June 2013): 375–78. http://dx.doi.org/10.4028/www.scientific.net/amr.706-708.375.

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The paper reports the tribological properties of the CrAlN coating tools at different speeds and loads. The coating was deposited on cemented carbide by cathodic arc physical vapour deposition technique. Ball-on-disc wear tests were performed on the CETR UMT-2 test system against SiC balls. The coating character and test results were obtained through SEM, XRD and Wyko surface profilometer. The results are as follows: The value of friction of coefficients decreased and depth of wear tracks became sallower as speeds increased and the coating presented adhesion phenomenon under low load. CrAlN coating showed excellent anti-wear properties at high speed and low load, and was more suitable for these similar working conditions.

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Skoric, Branko, Damir Kakas, and Aleksansar Miletic. "Characterization of Hard Coatings Modified with Nitrogen Implantation." Defect and Diffusion Forum 297-301 (April 2010): 1027–36. http://dx.doi.org/10.4028/www.scientific.net/ddf.297-301.1027.

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In this paper, we present results of a study of TiN films which are deposited by Physical Vapor Deposition and Ion Beam Assisted Deposition. In the present investigation the subsequent ion implantation was provided with N2+ ions. The ion implantation was applied to enhance the mechanical properties of the surface. The film deposition process exerts a number of effects such as crystallographic orientation, morphology, topography, densification of the films. The evolution of the microstructure from porous and columnar grains to densely packed grains is accompanied by changes in mechanical and physical properties. A variety of analytic techniques were used for characterization, such as scratch test, calo test, SEM, AFM, XRD and EDAX. The experimental results indicated that the mechanical hardness is elevated by penetration of nitrogen, whereas the Young’s modulus is significantly elevated. Thin hard coatings deposited by physical vapour deposition (PVD), e.g. titanium nitride (TiN) are frequently used to improve tribological performance in many engineering applications. Ion bombardment during vapour deposition of thin films, colled ion beam assisted deposition (IBAD), exerts a number of effects such as densification, changes in grain size, crystallographic orientation, morphology and topography of the films. This paper describes the successful use of the nanoindentation technique for determination of hardness and elastic modulus. In the nanoindentation technique, hardness and Young’s modulus can be determined by the Oliver and Pharr method. Therefore, in recent years, a number of measurements have been made in which nanoindentation and AFM have been combined.

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Malarvannan, R. Ravi Raja, T. V. Moorthy, and Samraj Ravi. "Improvement of Wear Performance of High Speed Steel Tool Using Physical Vapour Deposition Coating Process." Applied Mechanics and Materials 787 (August 2015): 391–95. http://dx.doi.org/10.4028/www.scientific.net/amm.787.391.

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Manufacturing industries are presently using many tool materials, such as high speed steel, carbide tool and diamond tools etc. The most widely and commonly used tool in the engineering industries is high speed steel (HSS). The HSS tools are the cheapest and reliable for medium and small scale industries. In this work, the HSS single point cutting tool is taken as substrate material and coated with two different combinations of TiAlN composite coating using Physical vapour deposition (PVD) technique. Also, Tool life was calculated and compared with uncoated HSS tool. The hardness and surface roughness value for both the tools have been taken under same condition. The loss of weight in the tool after machining has been weighed using standard equipments. The differences have been closely observed with sufficient trials and find out the loss in weight in both the tools. The weight loss percentage was calculated after proper machining trials. The tool life of the Titanium Aluminium Nitride (Ti 70%, Al 25%) coated tool has been increased by 3.74 times than that of uncoated tool. The surface finish for TiAlN (Ti 70%, Al 25%) coating is better than the uncoated tool. The PVD coated tools having better performance comparing with uncoated HSS tool.

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M., Reshmi P., Chandrasekharan K. A., and Kunjomana A. G. "Study of a Horizontal Gradient Furnace for Vapour Growth." Mapana - Journal of Sciences 7, no. 2 (November 30, 2008): 46–51. http://dx.doi.org/10.12723/mjs.13.5.

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A horizontal linear gradient two zone furnace has been employed to grow single crystals of semiconducting compounds by physical vapour deposition (PVD) method. It was calibrated for various trials including, series and parallel combination of coils, and set temperatures. The temperature profile of the furnace was studied by recording temperature versus distance along the axis of the furnace using chromel-alumel thermocouples. The results were analyzed systematically and the optimum conditions for setting source zone and growth zone temperature were identified.

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Tański, Tomasz, Krzysztof Labisz, and Janusz Szewczenko. "TEM Investigations of (Ti, Si)N Layer Coated on Magnesium Alloy Using PVD Technique." Solid State Phenomena 203-204 (June 2013): 198–203. http://dx.doi.org/10.4028/www.scientific.net/ssp.203-204.198.

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Thin films and coatings are applied to engineering materials in order to improve the mechanical properties of the surface, such as wear resistance, corrosion resistance and hardness. This research work deals with coatings deposited by appliance of the Physical Vapour Deposition method (PVD). The presented instigations concerning the production of coatings are one of the present important directions connected with modern surface engineering, ensuring the obtainment of coatings of high usable properties like mechanical characteristics and wear resistance. The general purpose of this work is investigation and evaluation of the obtained Ti/(Ti,Si)N/(Ti,Si)N coatings on magnesium cast alloys using electron microscope as the main investigation tool. The investigations were performed using scanning and transmission electron microscopy for the microstructure determination, also EDS microanalysis and electron diffraction was possible to obtain. While investigating the coating material, there were studied the transition zone between the coating and the substrate material as well the occurrence of some structure defects which can be present after the deposition process and could have any influence of the properties of the achieved coating. Also the structure character will be investigated for the occurrence of the nanostructure coatings, which could be seen as the solution of this issue. In the present work, the goal is set on current practices and future trends for nanocomposite thin films and coatings deposited by physical vapour deposition (PVD) technique. This investigation will touch some aspects of such coatings, but the main objective is to give a general view on features revealed using electron microscopy application in PVD coating investigations.

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Mikołajczyk, Tomasz, Marcin Turemko, and Bogusław Pierożyński. "Ethanol oxidation reaction at Pd-modified nickel foam obtained by PVD method." Polish Journal of Chemical Technology 17, no. 2 (June 1, 2015): 47–50. http://dx.doi.org/10.1515/pjct-2015-0028.

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Abstract In this study, palladium-modified nickel foam substrate was applied to examine ethanol oxidation reaction (EOR) in 0.1 M NaOH supporting solution. An EOR catalyst was prepared by physical vapour deposition (PVD) of palladium onto Ni foam material. Temperature-dependent kinetics of the EOR were studied over the temperature range: 20-60°C by means of a.c. impedance spectroscopy and cyclic voltammetry techniques. Deposition of a noble metal additive was clearly exposed through scanning electron microscopy: SEM/EDX-supported analysis. Most importantly, this work investigated the effect of pre-deposited fullerene on nickel foam, on the catalytic (EOR) properties of such-produced Ni foam/Pd composite material.

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Mativenga, P. T., and K. K. B. Hon. "Wear and cutting forces in high-speed machining of H13 using physical vapour deposition coated carbide tools." Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture 219, no. 2 (February 1, 2005): 191–99. http://dx.doi.org/10.1243/95440505x8127.

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This paper reviews the contributions that coatings make in enhancing the cutting performance of carbide tools and, in particular, their application in high-speed machining. It examines flank wear and cutting force process trends that are essential for monitoring tool degradation in automated machining factories. The findings of the investigation into cutting forces over the life cycle of different physical vapour deposition (PVD) tool coatings on micrograin carbide in the high-speed machining of tool steel are presented and related to the existing literature. Cutting tests were carried out at a very high spindle speed, 40000 r/min, and for a predetermined cutting time. Variants of the TiAlN coating, i.e. single- and double-layer and composite coating enhanced with WC/C, were evaluated against the uncoated tool and the TiCN, CrN, and TiN coatings. The paper reflects on the performance of advanced PVD coatings and also presents force trends and suggestions for process monitoring.

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Almeida, D. S., Cosme Roberto Moreira Silva, Maria do Carmo de Andrade Nono, and Carlos Alberto Alves Cairo. "Electron Beam-Physical Vapour Deposition of Zirconia Co-Doped with Yttria and Niobia." Materials Science Forum 498-499 (November 2005): 453–58. http://dx.doi.org/10.4028/www.scientific.net/msf.498-499.453.

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Turbine blades of airplanes and thermoelectric plants work in adverse conditions, with corrosive environment and high temperature and pressure. One way to improve the life or the working temperature of the blades is by the use of special coatings over metallic material applied by Electron Beam – Physical Vapour Deposition (EB-PVD). The most usual material for this application is zirconia doped with yttria. Addition of niobia, as a co-dopant in the Y2O3-ZrO2 system, can reduce the thermal conductivity and improve mechanical properties of the coating. The purpose of this work is to show the influence of the addition of niobia on microstructure of ceramic coating taking in to consideration X-ray diffraction and scanning electron microscopy observations. First result shows a columnar structure with only tetragonal phase in the ceramic coating in the chemical composition range studied.

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Lavecchia, Fulvio, Gianluca Percoco, Eujin Pei, and Luigi Maria Galantucci. "Computer Numerical Controlled Grinding and Physical Vapor Deposition for Fused Deposition Modelled Workpieces." Advances in Materials Science and Engineering 2018 (November 1, 2018): 1–7. http://dx.doi.org/10.1155/2018/9037490.

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The use of additive manufacturing (AM) enables companies to directly produce complex end-use parts. Fused deposition modelling (FDM) is an AM technology based on an extrusion process of fabricating parts. This layer-by-layer method results in a poor surface finish, and as a result, manual finishing is often required, which consequentially reduces the definition of the geometrical features. This research proposes a novel way of achieving high surface finishing by using additive and finishing processes, followed by a physical vapor deposition (PVD) coating. Two test pieces were produced, the first one was subjected to computer numerical controlled (CNC) mechanical grinding with appropriate grades of grindstones; the second one was subjected to microsandblasting to remove excess material and the stair-stepping effect. Both test pieces were then subjected to a PVD coating process to provide a metal thin film. To benchmark the test pieces, the authors used a coordinate measure machine for dimensions and a roughness meter to verify the effectiveness of this postprocessing approach.

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Góral, Marek, Tadeusz Kubaszek, Marek Poręba, and Małgorzata Wierzbińska. "Deposition of YSZ Layer by PS-PVD on Different Materials." Solid State Phenomena 320 (June 30, 2021): 72–76. http://dx.doi.org/10.4028/www.scientific.net/ssp.320.72.

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Plasma Spray Physical Vapour Deposition (PS-PVD) method was designed for production of ceramic layer on nickel superalloys. In typical process before deposition the base material is heated by plasma up to 900 °C. In present article the yttria stabilized zirconia (YSZ) was deposited on low melting point materials: 2017A-type aluminium alloy and Cu-ETP copper. The influence of power current, process time and powder feed rate on structure and thickness of obtained coatings was analysed. During first deposition process the overheating of Al-sample was observed and as result the power current was decreased to 1600 A. In the next experimental the approx. 5 mm thick dense coating was formed. During experimental processes of YSZ deposition on copper the thickness of coating increased from approx. 5 to 22 mm. The copper-oxide layer was formed under ceramic layer. The microscopic assessment showed the difficulties in formation of columnar ceramic layer on use base materials. The obtained coating was characterized by dense structure as a result of lower plasma energy during process. The increasing of power current is not possible in the case of overheating of base material.

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Malhotra, Chetan P., Roop L. Mahajan, and W. S. Sampath. "High Knudsen Number Physical Vapor Deposition: Predicting Deposition Rates and Uniformity." Journal of Heat Transfer 129, no. 11 (July 21, 2006): 1546–53. http://dx.doi.org/10.1115/1.2712855.

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The problem of predicting deposition rates and film thickness variation is relevant to many high-vacuum physical vapor deposition (PVD) processes. Analytical methods for modeling the molecular flow fail when the geometry is more complicated than simple tubular or planar sources. Monte Carlo methods, which have traditionally been used for modeling PVD processes in more complicated geometries, being probabilistic in nature, entail long computation times, and thus render geometry optimization for deposition uniformity a difficult task. Free molecular flow is governed by the same line-of-sight considerations as thermal radiation. Though the existence of an analogy between the two was recognized by Knudsen (1909, Ann. Phys., 4(28), pp. 75–130) during his early experiments, it has not been exploited toward mainstream analysis of deposition processes. With the availability of commercial finite element software having advanced geometry modelers and built-in cavity radiation solvers, the analysis of diffuse thermal radiation problems has become considerably simplified. Hence, it is proposed to use the geometry modeling and radiation analysis capabilities of commercial finite element software toward analyzing and optimizing high-vacuum deposition processes by applying the radiation-molecular flow analogy. In this paper, we lay down this analogy and use the commercial finite element software ABAQUS for predicting radiation flux profiles from planar as well as tube sources. These profiles are compared to corresponding deposition profiles presented in thin-film literature. In order to test the ability of the analogy in predicting absolute values of molecular flow rates, ABAQUS was also employed for calculating the radiative flux through a long tube. The predictions are compared to Knudsen’s analytical formula for free molecular flow through long tubes. Finally, in order to see the efficacy of using the analogy in modeling the film thickness variation in a complex source-substrate configuration, an experiment was conducted where chromium films were deposited on an asymmetric arrangement of glass slides in a high-vacuum PVD chamber. The thickness of the deposited films was measured and the source-substrate configuration was simulated in ABAQUS. The variation of radiation fluxes from the simulation was compared to variation of the measured film thicknesses across the slides. The close agreement between the predictions and experimental data establishes the feasibility of using commercial finite element software for analyzing high vacuum deposition processes.

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Migowski, Pedro, and Adriano F. Feil. "Uses of Physical Vapor Deposition Processes in Photoelectrochemical Water Splitting Systems." Recyclable Catalysis 3, no. 1 (January 27, 2016): 1–12. http://dx.doi.org/10.1515/recat-2016-0001.

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AbstractMost of the hydrogen on planet earth is found bound to oxygen atoms in water, making H2O one of the most promising H2 storage molecules. Large availability, non-toxicity and low cost are among the advantages of using H2O as a H2 gas source. However, the decomposition of water into H2 and O2, called water splitting, needs a large amount of energy, increasing the final cost per kg of hydrogen produced. In this context, the energy provided by the sun may be used to power photoelectrochemical cells (PEC) for water splitting to produce cheap and high purity H2. This mini-review will show recent advances on the use of physical vapor deposition (PVD) methods to improve semiconducting electrode performance. PVD enables the preparation of thin layers of expensive materials over photoelectrodes, therefore decreasing PEC systems manufacture costs. Moreover, the interface of between the semiconductor and the evaporated materials can be optimized under high vacuum conditions used in PVD processes and more efficient PEC systems can be obtained.

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Lille, Harri, Jakub Kõo, Andre Gregor, Alexander Ryabchikov, Fjodor Sergejev, Rainer Traksmaa, and Priit Kulu. "Comparison of Curvature and X-Ray Methods for Measuring of Residual Stresses in Hard PVD Coatings." Materials Science Forum 681 (March 2011): 455–60. http://dx.doi.org/10.4028/www.scientific.net/msf.681.455.

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Physical Vapour Deposition and PVD coatings are designed for several applications, from industrial to biomedical. Residual stresses, arising during coating deposition, have important effect on the coating’s service life as their influence to the mechanical and tribological properties. Our aim was to investigate the residual stresses in five different PVD coatings (TiN, TiCN, TiAlN, TiAlN, nc-(AlTi) N/α -Si3N4) (presence of the Ti as adhesion layer) by the layer growing curvature method and the X-ray diffraction techniques using a plate and a strip as the substrate. Residual stresses were compressive and very large (2.98 - 7.24) GPa in all coatings and comparable in TiN, TiAlN, TiAlN coatings in the case of both methods. The magnitude of residual stresses is influenced by intrinsic strain in the case of layer growth rather than by thermal stress.

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Journal articles on the topic 'PVD [Physical Vapour Deposition]'

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