Relevant bibliographies by topics / R-HiPIMS / Journal articles
To see the other types of publications on this topic, follow the link: R-HiPIMS.

Journal articles on the topic 'R-HiPIMS'

Author: Grafiati
Published: 8 June 2024
Last updated: 31 July 2025

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the top 15 journal articles for your research on the topic 'R-HiPIMS.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Browse journal articles on a wide variety of disciplines and organise your bibliography correctly.

1

Hubička, Zdenek, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada, and Josef Krýsa. "Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System." Coatings 10, no. 3 (2020): 232. http://dx.doi.org/10.3390/coatings10030232.

Full text
Abstract:
A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFexOy thin films on glass with SnO2F conductive layer (FTO). The aim of this work was to deposit CuFexOy films with different atomic ratio of Cu and Fe atoms contained in the films by these two reactive sputtering methods and find deposition conditions that lead to growth of films with maximum amount of delafossite phase CuFeO2. Deposited copper iron oxide fil
APA, Harvard, Vancouver, ISO, and other styles
2

Anders, André. "Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)." Journal of Applied Physics 121, no. 17 (2017): 171101. http://dx.doi.org/10.1063/1.4978350.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Vargas, S., D. S. Galeano-Osorio, and C. E. Castano. "Controlling preferential growth of chromium – Nitrogen R-HiPIMS and R-DCMS films by substrate magnetic biasing." Applied Surface Science 569 (December 2021): 151113. http://dx.doi.org/10.1016/j.apsusc.2021.151113.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

SHIMIZU, Tetsuhide, Michelle VILLAMAYOR, Julien KERAUDY, Daniel LUNDIN, and Ulf HELMERSSON. "Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS)." Journal of the Vacuum Society of Japan 60, no. 9 (2017): 346–51. http://dx.doi.org/10.3131/jvsj2.60.346.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Strijckmans, K., F. Moens, and D. Depla. "Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?" Journal of Applied Physics 121, no. 8 (2017): 080901. http://dx.doi.org/10.1063/1.4976717.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Castro, José D., Beatriz Pinto, Fábio Ferreira, R. Serra, and S. Carvalho. "Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering." Journal of Vacuum Science & Technology A 41, no. 2 (2023): 023106. http://dx.doi.org/10.1116/6.0002341.

Full text
Abstract:
One of the main problems in ships is corrosion, which reduces the lifetime usage of ship parts and increases maintenance costs. Ceramic coatings can contribute to solving this situation. Zirconium nitrides obtained by reactive unbalanced magnetron sputtering technology are largely reported as coatings with high corrosion resistance. The present study used high-power impulse magnetron sputtering in a reactive atmosphere (R-HiPIMS), varying the nitrogen amount. SEM, EDS, XRD, AFM, and contact angle measurements were used to assess the obtained coatings’ performance. Corrosion resistance was eval
APA, Harvard, Vancouver, ISO, and other styles
7

RATCHAYOTEE, Pornthip, Artit CHINGSUNGNOEN, and Phitsanu POOLCHARUANSIN. "Controlling titanium incorporation in hydrogenated amorphous carbon films via closed-loop feedback in reactive high power impulse magnetron sputtering." Journal of Metals, Materials and Minerals 34, no. 4 (2024): 2114. http://dx.doi.org/10.55713/jmmm.v34i4.2114.

Full text
Abstract:
A closed-loop feedback approach has been developed to control titanium incorporation in hydrogenated amorphous carbon (a-C:H) films during reactive high-power impulse magnetron sputtering (R-HiPIMS). The average discharge current measured at the magnetron target is used as the primary feedback signal to regulate the target coverage state. Hence, the titanium concentration in the films can be controlled. Significant changes were observed in the film microstructure and properties as the target state evolved with increasing target coverage. This causes the film transition from metallic titanium t
APA, Harvard, Vancouver, ISO, and other styles
8

Tang, Chien Jen, Wei Hsuan Hsu, and Ching Tang Li. "Thermochromic Properties of Vanadium Oxide Films Prepared by R-HIPIMS Using Closed-Loop Controlled with Plasma Emission Monitoring." Materials Science Forum 940 (December 2018): 114–19. http://dx.doi.org/10.4028/www.scientific.net/msf.940.114.

Full text
Abstract:
The vanadium dioxide films were deposited by reactive high-power impulse magnetron sputtering for different plasma emission intensity at the substrate temperature of 310 °C. The setpoint of plasma emission intensity was controlled by a PID controller with plasma-emission-monitoring. The vanadium dioxide films characteristics were measured by optical spectrophotometer, X-ray diffraction and electrical source meter.
APA, Harvard, Vancouver, ISO, and other styles
9

Hubička, Z., M. Čada, A. Kapran, et al. "Plasma Diagnostics in Reactive High-Power Impulse Magnetron Sputtering System Working in Ar + H2S Gas Mixture." Coatings 10, no. 3 (2020): 246. http://dx.doi.org/10.3390/coatings10030246.

Full text
Abstract:
A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy. A wide range of mass flow rates of reactive gas H2S was used for the investigation of the deposition process. It w
APA, Harvard, Vancouver, ISO, and other styles
10

Boivin, D., A. Najah, R. Jean-Marie-Désirée, et al. "Towards control of TiO2 thickness film in R-HiPIMS process with a coupled optical and electrical monitoring of plasma." Surface and Coatings Technology 433 (March 2022): 128073. http://dx.doi.org/10.1016/j.surfcoat.2021.128073.

Full text
APA, Harvard, Vancouver, ISO, and other styles
11

Bunnell, Arianna, Dustin Valdez, Thomas Wolfgruber, et al. "Abstract P3-04-05: Artificial Intelligence Detects, Classifies, and Describes Lesions in Clinical Breast Ultrasound Images." Cancer Research 83, no. 5_Supplement (2023): P3–04–05—P3–04–05. http://dx.doi.org/10.1158/1538-7445.sabcs22-p3-04-05.

Full text
Abstract:
Abstract Purpose Many low-middle income countries (LMIC) suffer from chronic shortages of resources that inhibit the implementation of effective breast cancer screening programs. Advanced breast cancer rates in the U.S. Affiliated Pacific Islands substantially exceed that of the United States. We propose the use of portable breast ultrasound coupled with artificial intelligence (AI) algorithms to assist non-radiologist field personnel in real-time field lesion detection, classification, and biopsy, as well as determination of breast density for risk assessment. In this study, we examine the ab
APA, Harvard, Vancouver, ISO, and other styles
12

ARASHLOO, BANAFSHEH ALIZADEH, and HASAN EFEOGLU. "AN APPLICATION OF R-HiPIMS METHOD FOR TiO2-AND TiO2:Cu-BASED MEMRISTORS: CONTROLLING Cu DOPING USING DC PULSE METHOD." Surface Review and Letters, October 9, 2020, 2050041. http://dx.doi.org/10.1142/s0218625x20500419.

Full text
Abstract:
Nowadays, the High-Power Impulse Magnetron Sputtering (HiPIMS) as an additional technique to plasma-based sputtering, is applied to depositing or coating of thin films. HiPIMS is based on applying high-power and low-duty-cycle unipolar pulses to the magnetron target by a low repetition frequency, which are produced from the high ionization part of sputtered atoms by high discharge power. By applying voltage to substrate and bombarding it in the presence of an inert gas such as Ar, the growth of the film is controlled by the acceleration of the sputtered material across the highly dense plasma.
APA, Harvard, Vancouver, ISO, and other styles
13

Promjantuk, Chamnan, Tossaporn Lertvanithphol, Nutthamon Limsuwan, et al. "Spectroscopic study on alternative plasmonic TiN-NRs film prepared by R-HiPIMS with GLAD technique." Radiation Physics and Chemistry, October 2022, 110589. http://dx.doi.org/10.1016/j.radphyschem.2022.110589.

Full text
APA, Harvard, Vancouver, ISO, and other styles
14

BOIVIN, Dimitri, Ronny JEAN-MARIE-DESIREE, Aymane NAJAH, Stephane Cuynet, and Ludovic de Poucques. "Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO2 deposition process drifts." Physica Scripta, March 12, 2024. http://dx.doi.org/10.1088/1402-4896/ad3302.

Full text
Abstract:
Abstract In this work, coupled optical and electrical discharge measurements have been implemented to investigate the plasma state of a reactive HiPIMS TiO2 deposition process running at a fixed duty cycle of 2% and at a repetition rate of 1 kHz. Investigations focus on both the effect of the erosion target and substrate-holder temperature in an Ar/O2 gas mixture at fixed working pressure. First, as the racetrack shape evolves with the use of the target, the deposition rate is modified, in the same way as the emission intensity measured. Second, with the heater set at 400 °C in pure Ar, the co
APA, Harvard, Vancouver, ISO, and other styles
15

Krýsová, H., S. Cichoň, A. Kapran, et al. "Deposition of Fe2O3:Sn semiconducting thin films by reactive pulsed r-HiPIMS + ECWR co-sputtering from Fe and Sn targets." Journal of Photochemistry and Photobiology A: Chemistry, April 2024, 115676. http://dx.doi.org/10.1016/j.jphotochem.2024.115676.

Full text
APA, Harvard, Vancouver, ISO, and other styles
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography