Relevant bibliographies by topics / Resiste SU-8

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  1. Journal articles
  2. Dissertations / Theses
  3. Conference papers

Academic literature on the topic 'Resiste SU-8'

Author: Grafiati
Published: 4 June 2021
Last updated: 5 February 2022

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Journal articles on the topic "Resiste SU-8"

1

Yoshihisa, Sensu, Sekiguchi Atsushi, Kondo Yoshiyuki, Mori Satoshi, Honda Nao, and Weber William D. "Profile Simulation of SU-8 Thick Film Resist." Journal of Photopolymer Science and Technology 18, no. 1 (2005): 125–32. http://dx.doi.org/10.2494/photopolymer.18.125.

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Jordan, A., and S. Büttgenbach. "Micromechanical force sensors based on SU-8 resist." Microsystem Technologies 18, no. 7-8 (2012): 1095–101. http://dx.doi.org/10.1007/s00542-012-1447-7.

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Lorenz, H., M. Despont, N. Fahrni, N. LaBianca, P. Renaud, and P. Vettiger. "SU-8: a low-cost negative resist for MEMS." Journal of Micromechanics and Microengineering 7, no. 3 (1997): 121–24. http://dx.doi.org/10.1088/0960-1317/7/3/010.

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Shew, Bor-Yuan, Jui-Tang Hung, Tai-Yuan Huang, Kun-Pei Liu, and Chang-Pin Chou. "High resolution x-ray micromachining using SU-8 resist." Journal of Micromechanics and Microengineering 13, no. 5 (2003): 708–13. http://dx.doi.org/10.1088/0960-1317/13/5/324.

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Lawes, Ronald A. "Manufacturing tolerances for UV LIGA using SU-8 resist." Journal of Micromechanics and Microengineering 15, no. 11 (2005): 2198–203. http://dx.doi.org/10.1088/0960-1317/15/11/029.

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Takamura, Makoto, Hiroki Hibino, and Hideki Yamamoto. "Applying strain into graphene by SU-8 resist shrinkage." Journal of Physics D: Applied Physics 49, no. 28 (2016): 285303. http://dx.doi.org/10.1088/0022-3727/49/28/285303.

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Reznikova, E. F., J. Mohr, and H. Hein. "Deep photo-lithography characterization of SU-8 resist layers." Microsystem Technologies 11, no. 4-5 (2005): 282–91. http://dx.doi.org/10.1007/s00542-004-0432-1.

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Kawai, Akira, and Shogo Ohtani. "Frequency Dispersion of Permittivity of SU-8 Resist Thin Film." Journal of Photopolymer Science and Technology 27, no. 6 (2014): 711–12. http://dx.doi.org/10.2494/photopolymer.27.711.

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Dey, P. K., B. Pramanick, A. RaviShankar, P. Ganguly, and S. Das. "MICROSTRUCTURING OF SU-8 RESIST FOR MEMS AND BIO-APPLICATIONS." International Journal on Smart Sensing and Intelligent Systems 3, no. 1 (2010): 118–29. http://dx.doi.org/10.21307/ijssis-2017-384.

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Agarwal, M., R. A. Gunasekaran, P. Coane, and K. Varahramyan. "Scum-free patterning of SU-8 resist for electroforming applications." Journal of Micromechanics and Microengineering 15, no. 1 (2004): 130–35. http://dx.doi.org/10.1088/0960-1317/15/1/020.

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Dissertations / Theses on the topic "Resiste SU-8"

1

Catelli, Ricardo Tardelli. "Desenvolvimento de processo litográfico tri-dimensional para aplicação em microóptica integrada." Universidade de São Paulo, 2010. http://www.teses.usp.br/teses/disponiveis/3/3140/tde-21102010-112508/.

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O presente trabalho tem como objetivo desenvolver um processo de fabricação de elementos micro-ópticos utilizando-se litografia por feixe de elétrons, empregando o resiste SU-8, negativo e amplificado quimicamente, sobre substrato de Si. Para tanto, é realizado o estudo dos parâmetros do efeito de proximidade a, b e h para se modelar e controlar os efeitos do espalhamento dos elétrons no resiste e no substrato, e se altera o processamento convencional do SU-8 para se obter um processo com baixo contraste. A determinação dos parâmetros do efeito de proximidade para o sistema de escrita direta e
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TROUSSIER, Ghislain. "Integration de bobines sur silicium pour la conversion d'energie." Phd thesis, INSA de Toulouse, 2004. http://tel.archives-ouvertes.fr/tel-00009239.

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Dans un contexte d'integration des dispositifs de conversion d'energie de petite puissance, le travail de these presente porte sur la realisation de micro-bobines integrees sur silicium. Les contraintes liees a ce type d'integration resident dans la mise au point, la compatibilite des procedes technologiques contribuant a la fabrication du systeme complet et le cout de fabrication. Dans un premier temps, une etude bibliographique nous a permis de faire une synthese sur les structures integrables de micro-bobines ainsi que sur les materiaux conducteurs et magnetiques et leurs techniques de depo
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陳信傑. "ArF excimer laser micromachining of SU-8 and PMMA resist." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/10357079285020408335.

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Liu, Kun-Pei, and 劉昆沛. "A Study on Ultra-Deep X-ray Lithography Technique with Highly-Sensitive SU-8 Resist." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/93638389674511533095.

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碩士<br>國立交通大學<br>機械工程系<br>91<br>This study investigates the feasibility of using SU-8 as a highly sensitive X-ray resist. An ultra-deep X-ray lithography (UDXL) technique will be developed to give a high- efficiency and high-precision micromachining process. This technique will be used to fabricate a deep (~1.5mm) and precise (＜2μm) resonant cavity of an mm-wave power supply in the future. Via chemical amplification mechanism, the SU-8 resist revealed very high sensitivity under X-ray irradiating. The result showed that its sensitivity is about 160 times higher than that of the tradi
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楊宗翰. "A Low Temperature Inkjet Printing and Filling Process for Low Resistive Ag TSV Fabrication in A SU-8 Substrate." Thesis, 2016. http://ndltd.ncl.edu.tw/handle/92094781200857441877.

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碩士<br>國立交通大學<br>工學院加速器光源科技與應用碩士學位學程<br>105<br>TSV is a critical interconnect structure for signal transmission with high density, speed, and flexibility in microsystems. Instead of electroplating, recent studies also explored the feasibility of inkjet printing and filling process for (TSV) Through-Silicon Via fabrication due to the superior characteristics of less chemical waste, processing time, and process temperature applicable for different TSV substrates. Nevertheless, the approach still needs to resolve the process difficulties such as process instability, high via resistance and aspec
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Conference papers on the topic "Resiste SU-8"

1

Johnson, Donald W., Harris Miller, Mike Kubenz, Freimut Reuther, and Gabi Gruetzner. "Nanoimprinting with SU-8 epoxy resists." In Advanced Lithography, edited by Michael J. Lercel. SPIE, 2007. http://dx.doi.org/10.1117/12.713710.

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Sensu, Yoshihisa, Atsushi Sekiguchi, Satoshi Mori, and Nao Honda. "Profile simulation of SU-8 thick film resist." In Microlithography 2005, edited by John L. Sturtevant. SPIE, 2005. http://dx.doi.org/10.1117/12.596856.

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Zhu, Jun, Xiaolin Zhao, and Zhiping Ni. "High-aspect-ratio microstructure fabrication using SU-8 resist." In Micromachining and Microfabrication, edited by Jean Michel Karam and John A. Yasaitis. SPIE, 2000. http://dx.doi.org/10.1117/12.396472.

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Singleton, Laurence, Alexei L. Bogdanov, Serguei Peredkov, et al. "Deep x-ray lithography with the SU-8 resist." In 26th Annual International Symposium on Microlithography, edited by Elizabeth A. Dobisz. SPIE, 2001. http://dx.doi.org/10.1117/12.436647.

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Vora, Kaushal D., Anthony S. Holland, Muralidhar K. Ghantasala, and Arnan Mitchell. "Patterning of SU-8 resist structures using CF 4." In Microelectronics, MEMS, and Nanotechnology, edited by Jung-Chih Chiao, Alex J. Hariz, David N. Jamieson, Giacinta Parish, and Vijay K. Varadan. SPIE, 2004. http://dx.doi.org/10.1117/12.523903.

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Ray, Prasenjit, V. Ramgopal Rao, and Prakash R. Apte. "A 8-resistor SU-8 accelerometer with reduced cross axis sensitivity." In APCCAS 2010-2010 IEEE Asia Pacific Conference on Circuits and Systems. IEEE, 2010. http://dx.doi.org/10.1109/apccas.2010.5775073.

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Suzuki, Toshiyuki, Junko Morikawa, Toshimasa Hashimoto, et al. "Thermal and optical properties of sol-gel and SU-8 resists." In SPIE MOEMS-MEMS, edited by Winston V. Schoenfeld, Raymond C. Rumpf, and Georg von Freymann. SPIE, 2012. http://dx.doi.org/10.1117/12.907028.

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Liu, Jingquan, Jun Zhu, Guipu Ding, Xiaolin Zhao, and Bingchu Cai. "Orthogonal method for processing of SU-8 resist in UV-LIGA." In Micromachining and Microfabrication, edited by Jean Michel Karam and John A. Yasaitis. SPIE, 2001. http://dx.doi.org/10.1117/12.442980.

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Wang, Tao, Marzia Quaglio, Fabrizio Pirri, Yang-Chun Cheng, David Busacker, and Franco Cerrina. "Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography." In SPIE Advanced Lithography, edited by Harry J. Levinson and Mircea V. Dusa. SPIE, 2009. http://dx.doi.org/10.1117/12.814831.

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Jordan, A., and S. Büttgenbach. "Fabrication process and characterization of micromechanical sensors based on SU-8 resist." In SPIE Microtechnologies, edited by Ulrich Schmid, José Luis Sánchez-Rojas, and Monika Leester-Schaedel. SPIE, 2011. http://dx.doi.org/10.1117/12.886467.

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Journal articles
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