Dissertations / Theses on the topic 'RF power transistor'
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Ankarcrona, Johan. "High Frequency Analysis of Silicon RF MOS Transistors." Doctoral thesis, Uppsala : Acta Universitatis Upsaliensis : Universitetsbiblioteket [distributör], 2005. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-5909.
Full textSyed, Asad Abbas. "Large Signal Physical Simulations of Si LD-MOS transistor for RF application." Thesis, Linköping University, The Department of Physics, Chemistry and Biology, 2004. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-2627.
Full textThe development of computer aided design tools for devices and circuits has increased the interest for accurate transistor modeling in microwave applications. In the increasingly expanding wireless communication market, there is a huge demand for high performance RF power devices. The silicon LD- MOSFET transistor is dueto its high power performance is today widely used in systems such as mobile base stations, private branch exchanges (PBX), and local area networks (LAN) utilizing the bands between 0.9 to 2.5 GHz.
In this research we simulated LD-MOSFET transistor characteristics of the structure provided by Infineon technology at Kista, Stockholm. The maximum drain current obtained in the simulation was 400 mA at a gate voltage of 8 V. This value is somewhat higher than the measured one. This difference can be attributed to the parasitic effects since no parasitic effects were included in the simulations in the beginning. The only parasitic effect studied was by placing the source contact at the bottom of the substrate according to real commercial device. The matching between simulated and measured results were improved and maximum drain current was reduced to 300 mA/mm which was 30% higher than the measured drain current
The large signal RF simulations were performed in time-domain in our novel technique developed at LiU. This technique utilizes a very simple amplifier circuit without any passive components. Only DC bias and RF signals are applied to the gate and drain terminals, with the same fundamental frequency but with 180o phase difference. The RF signal at the drain acting as a short at higher harmonics. These signals thus also acted as an active match to the transistor. Large signal RF simulations were performed at 1, 2 and 3 GHz respectively. The maximum of drain current signal was observed at the maximum of drain voltage signal indicating the normal behavior of the transistor. At 1 GHz the output power was 1.25 W/mm with 63% of drain efficiency and 23.7 dB of gain. The out pout power was decreased to 1.15 W/mm and 1.1 W/mm at 2 and 3 GHz respectively at the same time the efficiency and gain was also decreased to 57% and 19 dB at 2 GHz and 51% and 15 dB at 3GHz respectively.
Kashif, Ahsan-Ullah. "Optimization of LDMOS Transistor in Power Amplifiers for Communication Systems." Doctoral thesis, Linköpings universitet, Halvledarmaterial, 2010. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-61599.
Full textSrirattana, Nuttapong. "High-Efficiency Linear RF Power Amplifiers Development." Diss., Georgia Institute of Technology, 2005. http://hdl.handle.net/1853/6899.
Full textHeo, Deukhyoun. "Silicon MOS field effect transistor RF/Microwave nonlinear model study and power amplifier development for wireless communications." Diss., Georgia Institute of Technology, 2000. http://hdl.handle.net/1853/15618.
Full textSun, Wenyuan. "Impact of As-grown and Radiation-induced Traps on GaN RF and Power Transistor Performance and Reliability." The Ohio State University, 2020. http://rave.ohiolink.edu/etdc/view?acc_num=osu1586989454689707.
Full textWillemann, Michael Howard. "Polymer-Supported Bridges for Multi-Finger AlGaN/GaN Heterojunction Field Effect Transistors (HFETs)." Thesis, Virginia Tech, 2007. http://hdl.handle.net/10919/34801.
Full textMaster of Science
Connor, Mark Anthony. "Design of Power-Scalable Gallium Nitride Class E Power Amplifiers." University of Dayton / OhioLINK, 2014. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1405437893.
Full textBanerjee, Aritra. "Design of digitally assisted adaptive analog and RF circuits and systems." Diss., Georgia Institute of Technology, 2013. http://hdl.handle.net/1853/52919.
Full textRennesson, Stéphanie. "Développement de nouvelles hétérostructures HEMTs à base de nitrure de gallium pour des applications de puissance en gamme d'ondes millimétriques." Phd thesis, Université Nice Sophia Antipolis, 2013. http://tel.archives-ouvertes.fr/tel-00943619.
Full textCoulot, Thomas. "Stratégie d'alimentation pour les SoCs RF très faible consommation." Phd thesis, Université de Grenoble, 2013. http://tel.archives-ouvertes.fr/tel-00951423.
Full textGiry, Alexandre. "Étude des potentialités des technologies CMOS avancées pour les radiofréquences : application aux amplificateurs de puissance." Grenoble INPG, 2001. http://www.theses.fr/2001INPG0057.
Full textHniki, Saâdia. "Contribution à la modélisation des dispositifs MOS haute tension pour les circuits intégrés de puissance ("Smart Power")." Toulouse 3, 2010. http://thesesups.ups-tlse.fr/1162/.
Full textIn recent decades, power integrated circuits have experienced very significant growth. Today the regulation and distribution of electrical energy are crucial. The reduction of the dimensions and the need for power highlighted the need for efficient structures. Technology "smart power" has been developed to meet these demands. This technology uses high voltage devices, offering new solutions through its unique characteristics at high voltages and currents. The behavior of these devices is accompanied by the appearance of many phenomena. An accurate modeling of these phenomena is needed to replicate its physical behavior. The objective of this thesis is to improve modeling and to establish a good method of extracting physical parameters related to HV MOS. This thesis has been mainly devoted to modeling the phenomenon of self-heating: development of test structure, modeling of thermal coupling between the sources of transistor, development tool for generating the thermal network. This thesis also looks at the definition of a method for extracting RF noise in the high-voltage transistor including extrinsic gate resistance and capacity Cgs and Cgd. Finally, the last part of the thesis presents a brief assessment of compact HiSIM_HV dedicated to HV MOS and compares it with the macro model used by STMicroelectronics. The results presented in this thesis have been validated by comparison with different measures on SOI technology and solid substrate
Bengtsson, Olof. "Design and Characterization of RF-Power LDMOS Transistors." Doctoral thesis, Uppsala : University Library, Universitetsbiblioteket, 2008. http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-9259.
Full textAkhtar, Siraj. "Modeling of RF power transistors for power amplifier design /." The Ohio State University, 2000. http://rave.ohiolink.edu/etdc/view?acc_num=osu1488196781733682.
Full textEL-Rashid, Jihad, and Youssef Tawk. "Current Distribution in High RF Power Transistors." Thesis, University of Gävle, Ämnesavdelningen för elektronik, 2007. http://urn.kb.se/resolve?urn=urn:nbn:se:hig:diva-5735.
Full textTo obtain the power levels required from high RF power transistors, the size of the chip has often to be made so large that inductance of electrical connections inside the package cannot be neglected. This may have the effect that various parts of the transistor chip are not connected exactly parallel, i.e. drain and gate voltages and currents densities will not be the same on different parts of the chip. This may result in degraded output power and efficiency. The same effect may occur when more than one chip are connected in parallel in a transistor package to obtain even higher output power.Often the connections to the transistor package are approximated as a number of electrical point connections (normally three: gate, drain, source); meaning that each of them can be described by a single electrical potential and current. In reality, they may be large enough that voltage and current distributions have to be considered. These distributions will be affected by different mountings of the transistor and other connected components.In this work, the LDMOS power transistor MRF6S21140HR3 was modeled using the segmentation method in high frequency signal simulation HFSS which is a 3D Full-Wave Electromagnetic Field Simulation, and utilized the advanced design system ADS to find a parameterized lumped model. Both the electromagnetic and lumped models showed consistent results. Non-ideal parallel connection of sub-transistors on chip is very important, but further studies are needed for definite conclusion. It was verified through modeling that non ideal parallel connection of different chips in the package does have an effect; the effect however is quiet small which proves that the signal is slightly non-uniformly distributed between the three chips in the package. External connection to PCB (drain connection is considered in this work) can effectively be taken as a point connection to some approximation. The electrical behavior of the modeled transistor was studied through the design of a class B power amplifier in order to estimate the importance of performance degradation due to non-ideal parallel connections and how these non ideal connections degrade efficiency and output power. The modeled transistor can deliver a maximum output power of 147 watts and efficiency of 65%. We have also studied the current distribution between the three chips in a three stage class B power amplifier. Again, the difference in the current distribution between the three chips turned out to be quiet small. All these results are presented through this work. The final conclusion regarding the current distribution between multichips cannot be made just based on these simulation results. The next step should be aimed at considering other effects, the thermal effect for example, in order to know exactly whether it is uniformly or not uniformly distributed.
Hniki, Saadia. "Contribution à la modélisation des dispositifs MOS haute tension pour les circuits intégrés de puissance ("Smart Power")." Phd thesis, Université Paul Sabatier - Toulouse III, 2010. http://tel.archives-ouvertes.fr/tel-00581114.
Full textXia, Zhanbo. "Materials and Device Engineering for High Performance β-Ga2O3-based Electronics." The Ohio State University, 2020. http://rave.ohiolink.edu/etdc/view?acc_num=osu1587688595358557.
Full textBordelon, John H. "A large-signal model for the RF power MOSFET." Diss., Georgia Institute of Technology, 1999. http://hdl.handle.net/1853/15048.
Full textCao, Guangjun. "Physics and technology of silicon RF power devices." Thesis, De Montfort University, 2000. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.391785.
Full textBertilsson, Kent. "Simulation and Optimization of SiC Field Effect Transistors." Doctoral thesis, KTH, Microelectronics and Information Technology, IMIT, 2004. http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-81.
Full textSilicon Carbide (SiC) is a wide band-gap semiconductor material with excel-lent material properties for high frequency, high power and high temperature elec-tronics. In this work different SiC field-effect transistors have been studied using theoretical methods, with the focus on both the devices and the methods used. The rapid miniaturization of commercial devices demands better physical models than the drift-diffusion and hydrodynamic models most commonly used at present.
The Monte Carlo method is the most accurate physical methods available and has been used in this work to study the performance in short-channel SiC field-effect devices. The drawback of the Monte-Carlo method is the computational power required and it is thus not well suited for device design where the layout requires to be optimized for best device performance. One approach to reduce the simulation time in the Monte Carlo method is to use a time-domain drift-diffusion model in contact and bulk regions of the device. In this work, a time-domain drift-diffusion model is implemented and verified against commercial tools and would be suitable for inclusion in the Monte-Carlo device simulator framework.
Device optimization is traditionally performed by hand, changing device pa-rameters until sufficient performance is achieved. This is very time consuming work without any guarantee of achieving an optimal layout. In this work a tool is developed, which automatically changes device layout until optimal device per-formance is achieved. Device optimization requires hundreds of device simulations and thus it is essential that computationally efficient methods are used. One impor-tant physical process for RF power devices is self heating. Self heating can be fairly accurately modeled in two dimensions but this will greatly reduce the computa-tional speed. For realistic influence self heating must be studied in three dimensions and a method is developed using a combination of 2D electrical and 3D thermal simulations. The accuracy is much improved by using the proposed method in comparison to a 2D coupled electro/thermal simulation and at the same time offers greater efficiency. Linearity is another very important issue for RF power devices for telecommunication applications. A method to predict the linearity is imple-mented using nonlinear circuit simulation of the active device and neighboring passive elements.
Cheng, Peng. "Reliability of SiGe HBTs for extreme environment and RF applications." Diss., Georgia Institute of Technology, 2010. http://hdl.handle.net/1853/42836.
Full textYi, Changhyun. "InP-based heterojunction bipolar transistors for high speed and RF power applications : advanced emitter-base designs." Diss., Georgia Institute of Technology, 2002. http://hdl.handle.net/1853/13083.
Full textTsui, Kenneth Kin Pun. "RF characterization and modeling of MOSFET power amplifier in wireless communication /." View Abstract or Full-Text, 2003. http://library.ust.hk/cgi/db/thesis.pl?ELEC%202003%20TSUI.
Full textDoudorov, Grigori. "Evaluation of Si-LDMOS transistors for RF Power Amplifier in 2-6 GHz frequency range." Thesis, Linköping University, Department of Electrical Engineering, 2003. http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-1837.
Full textIn this thesis the models of Si-LDMOS transistors have been investigated with Agilent EEsof ADS version 2002a for operation in the 2-6 GHz frequency range. The first one is the Motorola’s (MRF21010) model based on a 30 mm prototype of a Si-LDMOS transistor. The second one is a model based on a 1 mm prototype of Si-LDMOS transistor developed at Chalmers University. Large-signal simulations of Chalmers’ model have demonstrated results, which lead to the conclusion that,this model cannot be efficiently utilised for design for a PA in the 2-6 GHz frequency range. However, additional simulations with reduced Rd (drain losses) show the deep impact of this parameter on the main properties of the designed PA. Hence, it is important to take it into account during new processes of Si-LDMOS as well as to improve the CAD model. The final conclusion regarding Si-LDMOS cannot be made just based on these simulation results, since they are not in accordance with the published ones. The next step should be aimed at improving the model and further investigation of Si-LDMOS to prove their ability to operate in the 2-6 GHz frequency range.
Wong, Melinda F. "Effect of varying gate-drain distance on the RF power performance of pseudomorphic high electron mobility transistors." Thesis, Massachusetts Institute of Technology, 2005. http://hdl.handle.net/1721.1/34638.
Full textIncludes bibliographical references (p. 134-137).
AIGaAs/lnGaAs Pseudomorphic High Electron Mobility Transistors (PHEMTs) are widely used in satellite communications, military and commercial radar, cellular telephones, and other RF power applications. One key figure of merit in these applications is RF power output. Increasing the gate-to-drain length (LRD) of the PHEMT leads to an increase in its breakdown voltage. This should theoretically allow the selection of a higher drain operating voltage and consequently result in higher output power at microwave frequencies. However, experimentally, a decrease in output power and peak power-added efficiency is generally observed with increasing LRD In order to understand this, we have studied in detail the RF power performance of industrial PHEMTs with different values of LRD. We have found that there is an optimum value of LRD beyond which the maximum RF power output that the device can deliver drops. In addition, we have found that the output power of long LRD devices declines significantly with increasing frequency. We explain the difference in RF power behavior of the different devices through the evolution of load lines with frequency, LRD, and operating voltage. We have found that the presence of oscillations in the NDR region limit the maximum allowable operating voltage of long LRD devices through catastrophic burnout. The maximum voltage of short LRD devices is limited by electrical degradation. Pulsed I-V measurements have revealed that long LRD devices increasingly suffer from surface state activity that limit the maximum drain current under RF operation. A delay time analysis has shown an increasing extension of the depletion region toward the drain with increasing LRD that limits the frequency response of long LRD devices.
by Melinda F. Wong.
S.M.
Fonder, Jean-Baptiste. "Analyse des mécanismes de défaillance dans les transistors de puissance radiofréquences HEMT AlGaN/GaN." Thesis, Cergy-Pontoise, 2012. http://www.theses.fr/2012CERG0576/document.
Full textAlGaN/GaN HEMTs are on the way to lead the radiofrequency power amplificationfield according to their outstanding performances. However, due to the relative youth of this technology, reliability studies in several types of operating conditions are still necessaryto understand failure mechanisms peculiar to these devices and responsible for their wearingout. This study deals with the failure analysis of power AlGaN/GaN HEMTs in RADARoperating mode (pulsed and saturated). This is based on the design of test amplifiers, theircharacterization and their stress on ageing benches. The setting up of a methodology aimingat discriminating predominant degradation modes, jointly with a micro-structural analysisof aged devices, permits to link the evolution of electrical performances with the physicalroots of these defects
Medrel, Pierre. "Amplification de puissance linéaire à haut rendement en technologie GaN intégrant un contrôle de polarisation de grille." Thesis, Limoges, 2014. http://www.theses.fr/2014LIMO0006/document.
Full textThis work deals with linear and high efficiency microwave power amplification in GaN technology.The first chapter is dedicated to the general context of wireless telecommunication with a special emphasis on the RF power amplifier. The most representative figures of merit in terms of linearity and power efficiency are introduced.The second chapter deals more specifically with the GaN technology and GaN-based transistor for microwave power amplification. A description of the principal architectures found in the literature related to high efficiency and linear amplification is summarized.In the third chapter, the developed envelope time-domain test bench is presented. Time-synchronization and envelope calibration procedures are discussed. As an illustration, a new specific wideband NPR measurement is presented and experimentally validated.An innovative power amplifier architecture is presented in the fourth chapter. It is based on a specific dynamic gate biasing technique of the power amplifier biased close to the pinch-off point. A 10W GaN S-band demonstrator has been developed. Compared to fixed class-B conditions, a linearity improvement has been reported without any prohibitive efficiency degradation of the RF power amplifier. Finally, an investigation of the proposed technique for the efficiency improvement in the drain envelope tracking technique is proposed
Dai, Wenhua. "Large signal electro-thermal LDMOSFET modeling and the thermal memory effects in RF power amplifiers." Connect to this title online, 2004. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=osu1078935135.
Full textTitle from first page of PDF file. Document formatted into pages; contains xix, 156 p.; also includes graphics (some col.). Includes bibliographical references (p. 152-156).
Subramani, Nandha kumar. "Physics-based TCAD device simulations and measurements of GaN HEMT technology for RF power amplifier applications." Thesis, Limoges, 2017. http://www.theses.fr/2017LIMO0084/document.
Full textGaN High Electron Mobility Transistors (HEMTs) have demonstrated their capabilities to be an excellent candidate for high power microwave and mm-wave applications. However, the presence of traps in the device structure significantly degrades the device performance and also detriments the device reliability. Moreover, the origin of these traps and their physical location remains unclear till today. A part of the research work carried out in this thesis is focused on characterizing the traps existing in the GaN/AlGaN/GaN HEMT devices using LF S-parameter measurements, LF noise measurements and drain-lag characterization. Furthermore, we have used TCAD-based physical device simulations in order to identify the physically confirm the location of traps in the device. Moreover, our experimental characterization and simulation study suggest that LF measurements could be an effective tool for characterizing the traps existing in the GaN buffer whereas gate-lag characterization could be more useful to characterize the AlGaN barrier traps of GaN HEMT devices. The second aspect of this research work is focused on characterizing the AlN/GaN/AlGaN HEMT devices grown on Si and SiC substrate. We attempt to characterize the temperature-dependent on-resistance (RON) extraction of these devices using on-wafer measurements and TCAD-based physical simulations. Furthermore, we have proposed a simplified methodology to extract the temperature and bias-dependent channel sheet resistance (Rsh) and parasitic series contact resistance (Rse) of AlN/GaN HEMT devices. Further, we have made a comprehensive evaluation of thermal behavior of these devices using on-wafer measurements and TCAD-based three-dimensional (3D) thermal simulations. The thermal resistance (RTH) has been extracted for various geometries of the device using measurements and validated using TCAD-thermal simulations
Plet, Sullivan. "Conception d'amplificateurs intégrés de puissance en technologies Silicium pour station de base de la quatrième génération des systèmes de radiocommunications cellulaires." Thesis, Limoges, 2016. http://www.theses.fr/2016LIMO0095/document.
Full textThis research concerns the RF power amplifiers for base stations. The current most competitive technology of RF transistor, the LDMOS, faces the constantly increasing data rate and competition from other technologies such as GaN HEMT. Another challenge is the integration of the output matching made outside of the package which is not compatible with future standards combining up to sixty-four power amplifiers close to each other. A first track proposed in this thesis is the high resistivity Si substrate. From simulations and measurements on wafers, improved passive elements quality factor has been demonstrated but these initial investigations do not allow the integration of the output matching with the current technology, although the results are very encouraging. The technological challenges of this new substrate led to consider the differential structure for amplifiers. Besides to the known advantages of this configuration, we have shown that the design of a differential power amplifier shows a significant improvement in the instantaneous band width meeting the need for higher data rate. This improvement does not degrade other performance as gain, efficiency and output power. In continuation of this thesis, the perspective concerns the design of a power amplifier on a high resistivity Si substrate combined with a differential structure that could enable a major advance over all performance while keeping the advantage of low cost of LDMOS silicon compared to other substrates
Coen, Christopher T. "Development and integration of silicon-germanium front-end electronics for active phased-array antennas." Thesis, Georgia Institute of Technology, 2012. http://hdl.handle.net/1853/48990.
Full textEl, Ghouli Salim. "UTBB FDSOI mosfet dynamic behavior study and modeling for ultra-low power RF and mm-Wave IC Design." Thesis, Strasbourg, 2018. http://www.theses.fr/2018STRAD015/document.
Full textThis research work has been motivated primarily by the significant advantages brought about by the UTBB FDSOI technology to the Low power Analog and RF applications. The main goal is to study the dynamic behavior of the UTBB FDSOI MOSFET in light of the recent technology advances and to propose predictive models and useful recommendations for RF IC design with particular emphasis on Moderate Inversion regime. After a brief review of progress in MOSFET architectures introduced in the semiconductor industry, a state-of-the-art UTBB FDSOI MOSFET modeling status is compiled. The main physical effects involved in the double gate transistor with a 7 nm thick film are reviewed, particularly the back gate impact, using measurements and TCAD. For better insight into the Weak Inversion and Moderate Inversion operations, both the low frequency gm/ID FoM and the proposed high frequency ym/ID FoM are studied and also used in an efficient first-cut analog design. Finally, a high frequency NQS model is developed and compared to DC and S-parameters measurements. The results show excellent agreement across all modes of operation including very low bias conditions and up to 110 GHz
Cui, Xian. "Efficient radio frequency power amplifiers for wireless communications." Columbus, Ohio : Ohio State University, 2007. http://rave.ohiolink.edu/etdc/view?acc%5Fnum=osu1195652135.
Full textDisserand, Anthony. "Nouvelle architecture d’amplificateur de puissance fonctionnant en commutation." Thesis, Limoges, 2017. http://www.theses.fr/2017LIMO0107/document.
Full textTelecommunication systems development is linked to working frequency and bandwidths increasement of future systems on one hand, and the growing place taken by digital electronics in the transmission chains on the other hand. Concerning the second point, the RF power generation in emitters is still implemented in an analog way, but the energy management of the RF power amplifiers is more and more assisted by numeric devices. The appearance of the 'digital technology' in the field of RF power is characterized by the implementation of high speed switching electronic systems like bias modulators for envelope tracking, power digital to analog converters (Power-DAC) or switching mode RF amplifiers (Classe S or D). This thesis work fits in this context, it describes two original switching devices based on GaN HEMT transistors. These elementary switching cells are realized in MMIC technology, they allow switching frequencies up to few hundreds MHz, with voltages reaching 50V, powers about 100W and energy efficiency greater than 80%. These switching cells are then used in various applications: two kinds of bias modulators for envelope tracking system as well as two architectures of class D amplifiers (half-bridge and full-bridge) are analyzed and validated by experimental results
Zhang, Hao. "Circuit d'amplification Doherty intégré large bande pour applications radio cellulaires de puissance." Thesis, Poitiers, 2019. http://www.theses.fr/2019POIT2265.
Full textThis work presents the design, realization and measurement result of integrated broadband Doherty amplification circuits for base stations, required for 5G. Initially, based on the research for techniques to improve electrical efficiency for signals with high dynamic range, the Doherty technique is chosen to continue the work. Studies on different Doherty architectures showed that performance can be improved and extended by adding a third stage (3-way Doherty) with calculated auxiliary transistors’ sizes for which are operated in class C mode. Limitations on the practical use of the Doherty technique is demonstrated by the considerations of various non linearities of the LDMOS transistors. The research of wideband architectures shows simultaneous advantages of integration and broadband capability by the CdS absorption technique and the use of mixed type of input splitters. Based on the results of various studies, three-way Doherty MMIC power amplifiers were designed and realized using the CdS absorption technique with an asymmetry ratio of 1 : 3 : 3 in the band of 1805 MHz to 2170 MHz. Experimental performances have shown the potentialities of the 3-way Doherty and a clear efficiency improvement over the entire frequency band. Specific wideband operating conditions are presented to reduce distortion products of third (IMD 3), 10th and 12th (IMD 10/12). The linearity measurements at different instantaneous bandwidths are very encouraging and validate the new asymmetric three-way Doherty architecture
Ayari, Lotfi. "Contribution au développement d’un banc de mesures temporelles 4-canaux pour la caractérisation avancée de composants et de sous-systèmes RF non linéaires." Thesis, Limoges, 2016. http://www.theses.fr/2016LIMO0117/document.
Full textThe future communications for civil and military applications will use complex wideband modulated signals to be transmitted through multi-channel DOHERTY power amplifiers which should have high performance in terms of power, efficiency, OBO, and bandwidth. In order to meet these stringent requirements, designers need time-domain characterization tools for calibrated measurements and for optimizing voltages and currents at both ports of non-linear connectorized or on-wafer devices. This work successfully implements time-domain characterization tools used to meet specific needs for transistor modeling, to optimize their operation in terms of pulse to pulse stability, and to search optimal conditions of their operation modes in a Doherty power amplifier. For this implementation, mathematical modeling is performed to evaluate sampler’s performances in terms of time-domain sampling efficiency in order to choose the best suited sampling architecture for RF time-domain measurements. Rigorous calibration procedures have been developed to obtain simultaneously full time-domain calibrated waveforms (from low Frequencies to Microwave frequencies)
Courty, Alexis. "Architecture d'amplificateur de puissance linéaire et à haut rendement en technologie GaN de type Doherty numérique." Thesis, Limoges, 2019. http://www.theses.fr/2019LIMO0067/document.
Full textThe high capabilities of current and future 5G communication satellite links lead the processed signals in the payloads to simultaneously exhibit large amplitude variations (PAPR>10dB) and wide instantaneous bandwidths (BW>1GHz). Within the microwave transmission subsystem, the operation of the power amplification stage is highly constrained by the transmitted waveforms, it is one of the most energy-consuming module of the payload affecting as well the integrity of the transmitted signal. In this context, the functions dedicated to digital signal processing and currently implemented by the digital processor (such as filtering, channeling, and possibly the demodulation and regeneration of baseband signals) embedded in the payloads, represent a potential solution that would reduce the constraints reported on the power amplification function and help to manage the allocated power ressource. This work proposes a study on the capability of dual input power amplifier architectures in order to manage the efficiency-linearity trade-off over a wide bandwidth. This study is carried out on a 20W GaN Doherty demonstrator operating in C band. The combination of the output signals on the RF load is managed by an optimal amplitude and phase distribution that is digitally controlled at the input. Firstly, a wideband design methodology of Doherty amplifier is introduced and validated on a C band demonstrator. In a second time the experimental tool allowing the extraction of amplitude and phase input distributions is presented, the dual input characterization is achieved and compared with simulation results. Finally, in perspective of this work, a preliminary study of the capabilities of the digital Doherty for the management of an output load mismatch (VSWR management) is carried out and the results are put forward
Delprato, Julien. "Analyse de la stabilité d'impulsion à impulsion des amplificateurs de puissance HEMT GaN pour applications radar en bande S." Thesis, Limoges, 2016. http://www.theses.fr/2016LIMO0060/document.
Full textRadar-oriented applications require stringent performances. Among them, emitting pulse train with uniform envelope characteristics in term of amplitude and phase. The criterion to quantify the self-consistency of radar signals over the pulse train is the pulse to pulse stability. The power amplifier is the most critical element in the RF radar chain because it has a strong impact on the overall pulse to pulse stability performances. In this context, this work is focused on the study of the impact of a HEMT GaN power amplifier on the pulse to pulse stability. Mathematical approach is presented to derive the pulse to pulse stability from time domain envelope measurements. Design and implementation of a 50Ω matched RF power amplifier are presented. Different radar bursts scenario are investigated and their impact on the pulse to pulse stability are quantified through extensive time domain envelope measurements. For that purpose, a dedicated experimental heterodyne time domain envelope test bench has been developed. These pulse to pulse stability measurements are finally used to optimize and fully validate a nonlinear electrical model of a HEMT GaN, allowing to quantify the relative impact of thermal and trapping effects during circuit envelope simulation in radar-oriented applications
Hsu, Heng-Ming, and 許恒銘. "Integrated Power MOS Transistor for RF System-On-a-Chip Applications." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/64361917309699092660.
Full text國立臺灣大學
電機工程學研究所
91
Silicon RF power transistor integrated into 0.18um CMOS technology is proposed at first time in the study. Because of thinner gate oxide and shallow source/drain junction in deep submicron technology, the resulted breakdown voltage of the associated device is inferior for high power operation. In order to enhance the breakdown voltage, one may face with the challenge of integrating power transistor into deep submicron technology. In this study, many efforts are engaged in device engineering; it contains drain engineering by adopting additional mask and substrate engineering by using butted structure to implement the resulted device. Considering both DC and RF characteristics based on the knowledge of device engineering, the breakdown voltage may be improved to 10V and the cutoff and maximum oscillation frequencies to 16GHz and 24GHz, respectively. The resulted device is more than enough to operate at 2.4GHz for Blue tooth and lithium battery applications. The maximum output power can attain 21.26dBm corresponding to power added efficiency 44.3% after optimization of quiescent point on the matrix measurement of large-signal performance. In this study, successfully integrated power device into state-of-the-art technology is demonstrated and it is a milestone for system-on-a-chip (SoC) to provide portable handholds with the properties of short-distance, low-power, and high-frequency operation.
Lai, Bo-Kang, and 來伯康. "Design and Fabrication of RF Power AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistor." Thesis, 2018. http://ndltd.ncl.edu.tw/handle/rc3a9f.
Full textHoile, Gary Alec. "Computer-aided design of RF MOSFET power amplifiers." Thesis, 1992. http://hdl.handle.net/10413/6890.
Full textThesis (Ph.D.)-University of Natal, Durban, 1992.
Chen, Ying Jen, and 陳膺任. "A 2.4GHz RF CMOS Power Amplifier Using High Breakdown Voltage Asymmetric-LDD MOS Transistors." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/51062007806292744050.
Full text國立交通大學
電子工程系所
96
This thesis presents a 2.4 GHz RF CMOS power amplifier based on two stages amplifiers topology with asymmetric-lightly-doped-drain (LDD) CMOS power cell which is fully embedded in the conventional foundry logic process with only one additional mask but without extra process step. The power amplifier can achieved higher output power and higher power-added efficiency (PAE) and novel linearity. The simulation result demonstrated 20dB power gain, and 30% PAE with 2.5V supply voltage, 21.5dBm at 1-dB compression point (P1dB), 23.2dBm saturate output power, -41dBc ACPR at 15dBm output power point with standard W-CDMA π/4 QPSK modulation , and ~36dBm OIP3 with 2.75V supply voltage.
Deng, Jie Hwang James C. M. Bartoli Filbert J. Curtice Walter R. Ooi Boon S. White Marvin H. "Modeling and characterization of gallium nitride based metal-oxide-semiconductor heterostructure field-effect transistors for RF power amplifiers." 2009. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqdiss&rft_dat=xri:pqdiss:3373073.
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