Relevant bibliographies by topics / RF reactive sputtering

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Book chapters
  4. Conference papers

Academic literature on the topic 'RF reactive sputtering'

Author: Grafiati
Published: 3 June 2025
Last updated: 20 July 2025

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'RF reactive sputtering.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "RF reactive sputtering"

1

Kim, Young-Rae, Sun-Phil Kim, Sung-Dong Kim, and Sarah Eun-Kyung Kim. "Characterization and Fabrication of Tin Oxide Thin Film by RF Reactive Sputtering." Korean Journal of Materials Research 20, no. 9 (2010): 494–99. http://dx.doi.org/10.3740/mrsk.2010.20.9.494.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Park, Hyun Ah, Hyun Seok Hong, Sun Keun Hwang, and Chong Mu Lee. "The Structure and Hardness of rf-Reactive Sputtered Ti-Zr-N Films." Key Engineering Materials 280-283 (February 2007): 1449–52. http://dx.doi.org/10.4028/www.scientific.net/kem.280-283.1449.

Full text
Abstract:
Ternary Ti-Zr-N thin films were synthesized by rf-reactive sputtering in Ar–N2 plasma. Effects of the substrate temperature in the sputtering process on the microstructures of Ti-Zr-N thin films were investigated using SEM, TEM, XRD and AES techniques. The hardness of the Ti-Zr-N film increases as the substrate temperature in reactive sputtering increases. The reactive sputtered Ti-Zr-N film is characterized as polycrystalline in nature with two dominant orientations of (111) and (200). A substrate temperature of 300°C is suggested for getting a densely packed film structure with the highest h
APA, Harvard, Vancouver, ISO, and other styles
3

Gajdics, Marcell, Miklós Serényi, Tamás Kolonits, Attila Sulyok, Zsolt Endre Horváth, and Béla Pécz. "Reactive Sputter Deposition of Ga2O3 Thin Films Using Liquid Ga Target." Coatings 13, no. 9 (2023): 1550. http://dx.doi.org/10.3390/coatings13091550.

Full text
Abstract:
Ga2O3 is a promising material in the optoelectronics and semiconductor industry. In this work, gallium oxide thin films were deposited via radio frequency (RF) sputtering, using a liquid Ga target. The reactive sputtering was carried out using different oxygen flow rates and DC target potentials induced via the RF power. The thickness of the samples varied between 160 nm and 460 nm, depending on the preparation conditions. The composition and the refractive index of the layers were investigated via energy-dispersive spectroscopy, X-ray photoelectron spectroscopy, and spectroscopic ellipsometry
APA, Harvard, Vancouver, ISO, and other styles
4

Gang, Gye-Won, Yeong-Hun Lee, Jae-Cheon Gwak, et al. "Structural and Optical Properties of TiO2Thin Films Prepared by RF Reactive Magnetron Sputtering." Korean Journal of Materials Research 12, no. 6 (2002): 452–57. http://dx.doi.org/10.3740/mrsk.2002.12.6.452.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Itoh, Takashi, Shun Hibino, Tatsuro Sahashi, et al. "InXGa1-XN films deposited by reactive RF-sputtering." Journal of Non-Crystalline Solids 358, no. 17 (2012): 2362–65. http://dx.doi.org/10.1016/j.jnoncrysol.2012.01.023.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Lossy, R., and J. Engemann. "Rf-broad-beam ion source for reactive sputtering." Vacuum 36, no. 11-12 (1986): 973–76. http://dx.doi.org/10.1016/0042-207x(86)90150-8.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Tvaroěk, V., I. Novotný, R. Harman, and J. Kováč. "Rf reactive sputtering of indium-tin-oxide films." Vacuum 36, no. 7-9 (1986): 479–82. http://dx.doi.org/10.1016/0042-207x(86)90231-9.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Srivastava, Rishabh Raj, Sudarsan Ghosh, and Paruchuri Venkateswara Rao. "Comparison and Sustainability Enhancement of Oxide Coatings by Reactive and Non-Reactive Radio Frequency Magnetron Sputtering Technique." Solid State Phenomena 370 (March 26, 2025): 73–79. https://doi.org/10.4028/p-nkju7d.

Full text
Abstract:
Technological advancements and changing global needs drive deposition techniques, widely used for altering surface properties of components. The crosswinds from global technological advancements in the mobility and power sectors have piqued the interest in sustainable renewable energy tapping devices. Thin aluminium oxide (Al2O3) films are highly valued for various applications in the manufacturing industry, such as cutting tool coatings, optics, energy, and microelectronics. A novel and facile approach has been adopted in the present work to fabricate an oxide-based thin film on a BK7 glass s
APA, Harvard, Vancouver, ISO, and other styles
9

Shin, Young Chul, Eun Hong Kim, and Tae Geun Kim. "EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT." ASEAN Journal on Science and Technology for Development 24, no. 1&2 (2017): 147–52. http://dx.doi.org/10.29037/ajstd.195.

Full text
Abstract:
We report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA). Two methods were used for the deposition of SiOX layer: One was deposited by sputtering using SiO2 target (Ar gas at a rate of 50 sccm) and the other was deposited by reactive sputtering using Si target (Ar gas at a rate of 45 sccm, with an O2 gas at a rate of 5 sccm). Photoluminescence peak at 430 nm was observed in the sample composed of SiOx interlayer sputtered from S
APA, Harvard, Vancouver, ISO, and other styles
10

Jayatissa, Ahalapitiya H., A. M. Soleimanpour, and Yue Hao. "Manufacturing of Multifunctional Nanocrystalline ZnO Thin Films." Advanced Materials Research 383-390 (November 2011): 4073–78. http://dx.doi.org/10.4028/www.scientific.net/amr.383-390.4073.

Full text
Abstract:
Optical, surface and structural properties of ZnO thin films fabricated by reactive radio- frequency (rf) magnetron sputtering and sol-gel coating methods are comparatively investigated. The optical properties of films produced by both techniques have very similar characteristics, however; the surface morphology and degree of crystallinity have different behaviors. The nanostructure columnar zinc oxide thin films can be synthesized by sol-gel coating methods which can have numerous applications requiring larger surface area. Also, the process scalability and large-scale manufacturing of these
APA, Harvard, Vancouver, ISO, and other styles
More sources

Dissertations / Theses on the topic "RF reactive sputtering"

1

Todi, Ravi. "INVESTIGATIONS ON RF SPUTTER DEPOSITED SICN THIN FILMS FOR MEMS APPLICATIONS." Master's thesis, University of Central Florida, 2005. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/3330.

Full text
Abstract:
With the rapid increase in miniaturization of mechanical components, the need for a hard, protective coatings is of great importance. In this study we investigate some of the mechanical, chemical and physical properties of the SiCN thin films. Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a RF magnetron sputtering system using a powder pressed SiC target. Films with various compositions were deposited on to silicon substrate by changing the N2/Ar gas ratios during sputtering. Nano-indentation studies were performed to investigate the mechanical properties such as
APA, Harvard, Vancouver, ISO, and other styles
2

Atcheson, Gwénaël Yves Peter. "Integration of oxynitride barriers by reactive RF sputtering for use in magnetic tunnel junctions." Thesis, Queen's University Belfast, 2014. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.675949.

Full text
Abstract:
Magnetic field sensors were developed with use of a SFI Shamrock sputtering tool. GMR spin-valve type sensors were developed in CIP geometry requiring no additional processing once deposited, and TMR magnetic tunnel junctions were developed in CPP. This meant the additional development of a photolithographic process in order to produce working devices. The MTJs used MgO as a tunneling barrier in reference devices, and a novel oxynitride barrier in experimental devices deposited by reactive RF sputtering from an elemental target in a variable argon/oxygen/nitrogen atmosphere. Devices produced s
APA, Harvard, Vancouver, ISO, and other styles
3

Bosco, Giácomo Bizinoto Ferreira 1987. "Photoluminescence of Tb3+ in a-Si3N4:H prepared by reactive RF-Sputtering and ECR PECVD = Fotoluminescência de Tb3+ em a-Si3N4:H preparado por RF-Sputtering reativo e ECR PECVD." [s.n.], 2017. http://repositorio.unicamp.br/jspui/handle/REPOSIP/322722.

Full text
Abstract:
Orientador: Leandro Russovski Tessler<br>Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Física Gleb Wataghin<br>Made available in DSpace on 2018-09-01T20:54:28Z (GMT). No. of bitstreams: 1 Bosco_GiacomoBizinotoFerreira_D.pdf: 9507140 bytes, checksum: 4980b29f48f98f8ff97e8a0a37b7577e (MD5) Previous issue date: 2017<br>Resumo: Este trabalho fornece caracterização ótica e estrutural de filmes finos compostos por nitreto de silício amorfo hidrogenado dopado com térbio (a-SiNx:H) ¿ crescidos por deposição química a vapor assistida por plasma gerado através de ressonância ciclo
APA, Harvard, Vancouver, ISO, and other styles
4

Jiang, Nanke. "Reactive Sputtering Deposition and Characterization of Zinc Nitride and Oxy-Nitride Films for Electronic and Photovoltaic Applications." University of Toledo / OhioLINK, 2013. http://rave.ohiolink.edu/etdc/view?acc_num=toledo1365165773.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Jin, Chengfei. "Dépôts de TaNx par pulvérisation cathodique magnétron à fort taux d’ionisation de la vapeur pulvérisée." Thesis, Paris 11, 2011. http://www.theses.fr/2011PA112212/document.

Full text
Abstract:
Grâce à ses excellentes propriétés physiques et chimiques (stable thermiquement, bon conducteur électrique et de chaleur, ductile, très dur mécaniquement, bonne inertie chimique), le matériau tantale et son nitrure TaNx sont utilisés comme revêtement de surface des outils, résistance électrique, barrière de diffusion au cuivre, croissance de nanotubes par un procédé chimique catalytique en phase vapeur. C’est ce matériau et son nitrure que nous avons étudiés lors de cette thèse.Aujourd’hui les exigences des industriels nécessitent que la pulvérisation cathodique magnétron (PCM) puisse être app
APA, Harvard, Vancouver, ISO, and other styles
6

Ruiz, Preciado Marco Alejandro. "Synthèse, caractérisation et réponse photocatalytique des oxydes semi-conducteurs à base de NiTiO3." Thesis, Le Mans, 2016. http://www.theses.fr/2016LEMA1037/document.

Full text
Abstract:
Structures semi-conductrices à base de NiTiO3, et l'étude de leurs propriétés dans le but de les appliquer en photocatalyse. Une étude théorique et des simulations numériques ont été effectuées pour analyser les propriétés électroniques, vibrationnelles et optiques de NiTiO3 massif ou sous forme de clusters nanométriques. Les poudres NiTiO3 ont été synthétisées par sol-gel par réaction en phase solide, tandis que les films minces ont été obtenus par pulvérisation cathodique rf-magnétron. Les caractérisations de leurs propriétés physiques confirment l'obtention de NiTiO3 polycristallin dans sa
APA, Harvard, Vancouver, ISO, and other styles
7

Wang, Horng Jwo, and 王宏灼. "Growth of ALN Films by Reactive RF Sputtering." Thesis, 1995. http://ndltd.ncl.edu.tw/handle/69354251443050827144.

Full text
Abstract:
碩士<br>國立中山大學<br>電機工程研究所<br>83<br>C-axis oriented aluminum nitride (AlN) thin films on different substrates, such as Corning glass, Si(100), GaAs(100), LiNbO3, SiO2/Si(100), are prepared by reactive RF magnetron sputtering The dependence of highly c-axis preferred orientation and surface morphology of AlN thin films on various sputtering pressure, RF power, N2 concentration and substrate temperature for developing the acoustic-optical (AO) devices in the future. In this study, the cr
APA, Harvard, Vancouver, ISO, and other styles
8

Li, Wei-Pin, and 黎偉彬. "Photocatalytic TiO2 films deposited by RF reactive magnetron sputtering." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/63028510607121866359.

Full text
Abstract:
碩士<br>龍華科技大學<br>工程技術研究所<br>97<br>Photocatalytic TiO2 films were deposited by rf reactive magnetron sputtering on non-alkali glass at 300 ℃ under total gas pressure of 10 mtorr with various N2/O2 flow ratios. The films were characterized by X-ray diffraction (XRD),atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV-Vis spectroscopy. X-ray diffraction spectra evidenced that all the films show anatase (1 0 1) preferred orientation. The deposited TiO2 films were of the anatase phase with a (1 0 1) preferred orientation. We performed both photoinduced decomposition of methylene
APA, Harvard, Vancouver, ISO, and other styles
9

Kuo, Yi-Nan, and 郭益男. "Photoluminescence Characteristics of ZnO Thin Films by Reactive RF Magnetron Sputtering." Thesis, 2004. http://ndltd.ncl.edu.tw/handle/13778007541907436201.

Full text
Abstract:
碩士<br>國立中山大學<br>電機工程學系研究所<br>92<br>In this study, the reactive rf magnetron sputtering was used to deposit zinc oxide (ZnO) thin films on Si substrate. The optimal sputtering parameters for film as luminescence application were found to be oxygen concentration (O2/O2+Ar) of 21%, RF power of 100W, substrate temperature of 500°C and sputtering pressure of 5 mtorr. Beside, the thermal treatment procedure was carried out to improve the luminescence characteristics of ZnO thin films. The physical characteristics of ZnO thin films deposited on Si substrate with different sputtering parameters we
APA, Harvard, Vancouver, ISO, and other styles
10

Chou, Lin-I., and 周凌毅. "Investigation on transition silicon thin film using RF reactive sputtering process." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/02811678752389400202.

Full text
Abstract:
碩士<br>國立中央大學<br>光電科學研究所<br>97<br>For mankind''s demand for the energy is greater and greater, it is necessary to develop renewable energies under limited resources. Solar energy plays an important role in the renewable energies, because it is inexhaustible. One of the most important components is hydrogenated silicon thin film solar cells. A lot of kinds of ideas for the solar cells have been proposed in recently. The commercial method to fabricate thin film solar cells is PECVD. However, the method has disadvantages such as high facility cost. In this research, a cheaper and without toxic met
APA, Harvard, Vancouver, ISO, and other styles
More sources

Book chapters on the topic "RF reactive sputtering"

1

Moustakas, T. D. "Growth and Crystallization Mechanism of Microcrystalline Silicon Films Produced by Reactive RF Sputtering." In Tetrahedrally-Bonded Amorphous Semiconductors. Springer US, 1985. http://dx.doi.org/10.1007/978-1-4899-5361-2_8.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Diao, Chien-Chen, Chia-Ching Wu, and Cheng-Fu Yang. "Crystalline Indium-Doped Zinc Oxide Thin Films Prepared by RF Magnetron Reactive Sputtering." In Lecture Notes in Electrical Engineering. Springer International Publishing, 2016. http://dx.doi.org/10.1007/978-3-319-17314-6_64.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Shet, Sudhakar, Kwang-Soon Ahn, Nuggehalli Ravindra, Yanfa Yan, and Mowafak Al-Jassim. "Nitrogen Doped ZnO (ZnO:N) Thin Films Deposited by Reactive RF Magnetron Sputtering for PEC Application." In Supplemental Proceedings. John Wiley & Sons, Inc., 2012. http://dx.doi.org/10.1002/9781118356074.ch85.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Shirahata, Jun, Tetsutaro Ohori, Hiroki Asami, et al. "Mechanical Properties of Cr-Si-N-O Thin Films Deposited by RF Reactive Unbalanced Magnetron Sputtering." In Advanced Processing and Manufacturing Technologies for Structural and Multifunctional Materials IV. John Wiley & Sons, Inc., 2010. http://dx.doi.org/10.1002/9780470944066.ch2.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Ma, K., and J. Y. Feng. "Photoluminescence and Structural Properties of Si Nanoparticles Embedded in SiO2 Matrix by Reactive RF Magnetron Sputtering." In Key Engineering Materials. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-410-3.2074.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Este, Grant O., and William D. Westwood. "AC and RF Reactive Sputtering." In Handbook of Thin Film Process Technology. CRC Press, 2018. http://dx.doi.org/10.1201/9781351072786-4.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "RF reactive sputtering"

1

Williams, F. L., H. D. Nusbaum, and B. J. Pond. "New method of arc suppression for reactive-dc-magnetron sputtering." In OSA Annual Meeting. Optica Publishing Group, 1992. http://dx.doi.org/10.1364/oam.1992.fh4.

Full text
Abstract:
Modulated-dc-magnetron sputtering offers a novel solution to problems associated with arcing on the surface of the sputtering target. Arcing has been identified as a main contributor to defects in thin films produced with low-pressure reactive magnetron-sputtering deposition. By biasing the target with a de potential that is modulated at ultrasonic frequencies, sputtering-target arcing is eliminated so that coatings with fewer defects are produced. In the technique presented here, the output from a de power supply is directed into a modulator circuit that switches the output according to a fre
APA, Harvard, Vancouver, ISO, and other styles
2

Gou, Zhenhui, and Francis Placido. "Aluminum oxynitride rugate filters grown by reactive rf sputtering." In 4th International Conference on Thin Film Physics and Applications, edited by Junhao Chu, Pulin Liu, and Yong Chang. SPIE, 2000. http://dx.doi.org/10.1117/12.408382.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Clarke, Peter J., and Bill Gardner. "RF bias getter reactive sputtering of La-Cu-O." In Topical conference on high tc superconducting thin films, devices, and applications. AIP, 1989. http://dx.doi.org/10.1063/1.37972.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Lirio, Adriana Cogo Malgueiro, Antonio C. S. de Arruda, Ronaldo D. Mansano, Antônio Felizes Pinto, and Terezinha de Jesus Andreoli Pinto. "Application of Reactive RF Magnetron Sputtering in customized Orthopedic Implants." In The 9th World Congress on Recent Advances in Nanotechnology. Avestia Publishing, 2024. http://dx.doi.org/10.11159/icnnfc24.152.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Tvarozek, V., I. Novotny, P. Sutta, et al. "Physical properties of transparent conductive oxides prepared by RF reactive sputtering." In 2006 International Conference on Advanced Semiconductor Devices and Microsystems. IEEE, 2006. http://dx.doi.org/10.1109/asdam.2006.331181.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Vasanelli, L., A. Valentini, and A. Losacco. "Preparation Of Transparent Conducting Zinc Oxide Films By RF Reactive Sputtering." In 1986 International Symposium/Innsbruck, edited by Claes-Goeran Granqvist, Carl M. Lampert, John J. Mason, and Volker Wittwer. SPIE, 1986. http://dx.doi.org/10.1117/12.938319.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Juskevicius, Kestutis, Martynas Audronis, Andrius Subacius, et al. "Nb2O5-SiO2 mixtures produced by reactive DC and RF magnetron sputtering." In Optical Interference Coatings. OSA, 2013. http://dx.doi.org/10.1364/oic.2013.wa.2.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Yoshida, Kunio, Tomosumi Kamimura, Kanyoshi Ochi, et al. "Optical properties of thin films deposited by reactive-Rf-magnetron sputtering." In Laser-Induced Damage in Optical Materials: 1996, edited by Harold E. Bennett, Arthur H. Guenther, Mark R. Kozlowski, Brian E. Newnam, and M. J. Soileau. SPIE, 1997. http://dx.doi.org/10.1117/12.274285.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Woelfel, Christian. "Electron Plasma Frequency Feedback Control for Reactive RF Magnetron Sputtering Processes." In 61st Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2018. http://dx.doi.org/10.14332/svc18.proc.0037.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Shu-ying, Zheng, Bertil Stjerna, and C. G. Granqvist. "Optical Properties of CeOxFy Thin Films Produced by Reactive Sputtering." In Optical Interference Coatings. Optica Publishing Group, 1992. http://dx.doi.org/10.1364/oic.1992.otue8.

Full text
Abstract:
The purpose of our work is to observe the optical energy gap shift for amorphous thin films of cerium oxide produced by addition of CF4 to Ar and O2 gas mixture during rf sputtering of Ce target. It has been expected that the refractive index of cerium oxyfluoride in thin film form decreases as the CF4 concentration increases. Such bandgap- and index- controllable coating materials may be useful for both energy efficiency and optical multilayer devices.
APA, Harvard, Vancouver, ISO, and other styles
You might also be interested in the extended bibliographies on the topic 'RF reactive sputtering' for particular source types:
Journal articles Dissertations / Theses
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography