Relevant bibliographies by topics / RF sputtering

Contents

  1. Journal articles
  2. Dissertations / Theses
  3. Books
  4. Book chapters
  5. Conference papers
  6. Reports

Academic literature on the topic 'RF sputtering'

Author: Grafiati
Published: 4 June 2021
Last updated: 25 July 2025

Create a spot-on reference in APA, MLA, Chicago, Harvard, and other styles

Select a source type:

Consult the lists of relevant articles, books, theses, conference reports, and other scholarly sources on the topic 'RF sputtering.'

Next to every source in the list of references, there is an 'Add to bibliography' button. Press on it, and we will generate automatically the bibliographic reference to the chosen work in the citation style you need: APA, MLA, Harvard, Chicago, Vancouver, etc.

You can also download the full text of the academic publication as pdf and read online its abstract whenever available in the metadata.

Journal articles on the topic "RF sputtering"

1

Yokogawa, Yoshiyuki, Taishi Morishima, Mitunori Uno, et al. "Wettability and Durability of Si-O Coatings on Zirconia Substrate by RF-Magnetron Plasma Sputtering." Key Engineering Materials 782 (October 2018): 189–94. http://dx.doi.org/10.4028/www.scientific.net/kem.782.189.

Full text
Abstract:
The wettability and durability of Si-O coatings prepared on zirconia substrate using radiofrequency magnetron sputtering (rf-sputtering) was studied. XRD analysis revealed no phase transformation of zirconia before/after rf-sputtering process. XPS spectroscopy showed that as-deposited films with a SiO2configuration was formed. EDX analysis indicated that the Si/Zr ratio was high and when magnetron rf-sputtering was performed using a plasma gas Ar+5% O2, which may be the optimum condition of rf-sputtering to form a sustainable hydrophilic layer on zirconia substrate. The wear testing using pin
APA, Harvard, Vancouver, ISO, and other styles
2

Park, Min Woo, Wang Woo Lee, Jae Gab Lee, and Chong Mu Lee. "A Comparison of the Mechanical Properties of RF- and DC- Sputter-Deposited Cr Thin Films." Materials Science Forum 546-549 (May 2007): 1695–98. http://dx.doi.org/10.4028/www.scientific.net/msf.546-549.1695.

Full text
Abstract:
Chromium (Cr) films were deposited on plain carbon steel sheets by DC and RF magnetron sputtering as well as by electroplating. Effects of DC or RF sputtering power on the deposition rate and properties such as hardness and surface roughness of the Cr films were investigated. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microcopy (SEM) analyses were performed to investigate the crystal structure, surface roughness, thickness of the Cr films. The deposition rate, hardness and surface roughness of the Cr film deposited by either DC or RF sputtering increase with the
APA, Harvard, Vancouver, ISO, and other styles
3

Zhao, Haili, Jingpei Xie, and Aixia Mao. "Effects of Bottom Layer Sputtering Pressures and Annealing Temperatures on the Microstructures, Electrical and Optical Properties of Mo Bilayer Films Deposited by RF/DC Magnetron Sputtering." Applied Sciences 9, no. 7 (2019): 1395. http://dx.doi.org/10.3390/app9071395.

Full text
Abstract:
Most of the molybdenum (Mo) bilayer films are deposited by direct current (DC) magnetron sputtering at the bottom and the top layer (DC/DC). However, the deposition of Mo bilayer film by radio frequency (RF) Mo bottom layer and DC Mo top layer magnetron sputtering has been less studied by researchers. In this paper, the bottom layer of Mo bilayer film was deposited by RF magnetron sputtering to maintain its good adhesion and high reflectance, and the top layer was deposited by DC magnetron sputtering to obtain good conductivity (RF/DC). Generally, the bottom layer sputtering pressure is relati
APA, Harvard, Vancouver, ISO, and other styles
4

Ma, Wei Hong, and Chang Long Cai. "Studying on Thickness Control of ITO Films Deposited Using RF Magnetron Sputtering." Advanced Materials Research 415-417 (December 2011): 1921–24. http://dx.doi.org/10.4028/www.scientific.net/amr.415-417.1921.

Full text
Abstract:
Indium tin oxide (ITO) films are widely applied as the transparent electrode in the photoelectric device because of its high conductivity and high transmittance in the visible wavelength. But the resistivity and position of transmittance peak of ITO films were influenced by the thickness of ITO films, so it is important significant to study the deposition rate of ITO films deposited using RF magnetron sputtering. In this paper, ITO films were prepared by RF magnetron sputtering method on K9 glass substrate, the influence of RF power, sputtering pressure, oxygen ratio, and substrate temperature
APA, Harvard, Vancouver, ISO, and other styles
5

Jin, Chun Long, Ha Na Shim, Eou Sik Cho, and Sang Jik Kwon. "Effect of Pulsed-DC Power on the Zinc Oxide Window Layer of CIGS Solar Cells Deposited by In-Line Sputtering Methods." Advanced Materials Research 805-806 (September 2013): 131–35. http://dx.doi.org/10.4028/www.scientific.net/amr.805-806.131.

Full text
Abstract:
Zinc oxide (ZnO) thin film was deposited on the glass substrate and cadmium-sulfide (CdS) thin film at room temperature by using an in-line pulsed-DC magnetron sputtering system. The sputtering process was carried out at various pulsed-DC power and radio frequency (RF) power from 400 W to 1 kW. From the thickness of the sputtered ZnO films, it was possible to obtain much higher deposition rate in case of pulsed-DC sputtering than RF sputtering. However, for both pulsed-DC sputtered and RF sputtered ZnO films, the similar results were obtained in case of the energy band gaps and the structural
APA, Harvard, Vancouver, ISO, and other styles
6

Biederman, H., P. Bílková, J. Ježek, P. Hlídek, and D. Slavínská. "RF magnetron sputtering of polymers." Journal of Non-Crystalline Solids 218 (September 1997): 44–49. http://dx.doi.org/10.1016/s0022-3093(97)00196-8.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Stelmashuk, V., H. Biederman, D. Slavı́nská, M. Trchová, and P. Hlidek. "Rf magnetron sputtering of polypropylene." Vacuum 75, no. 3 (2004): 207–15. http://dx.doi.org/10.1016/j.vacuum.2004.02.007.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Morohashi, Shin'ichi, Atsunori Matsuo, Toshihiro Hara, Shogo Tsujimura, and Masanori Kawanishi. "SiO2Insulation Layer Fabricated using RF Magnetron Facing Target Sputtering and Conventional RF Magnetron Sputtering." Japanese Journal of Applied Physics 40, Part 1, No. 8 (2001): 4876–77. http://dx.doi.org/10.1143/jjap.40.4876.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Lee, Chong Mu, Choong Mo Kim, Sook Joo Kim, and Yun Kyu Park. "Enhancement of the Quality of the ZnO Thin Films by Optimizing the Process Parameters of High-Temperature RF Magnetron Sputtering." Key Engineering Materials 336-338 (April 2007): 581–84. http://dx.doi.org/10.4028/www.scientific.net/kem.336-338.581.

Full text
Abstract:
ZnO thin films were deposited on sapphire (α-Al2O3) substrates by RF magnetron sputtering at substrate temperatures of 500, 600, 650 and 700°C for 3h at rf-powers ranging from 60 to 120 W. The FWHM of the XRD (0002) peak for the ZnO film was reduced down to 0.07° by optimizing the chamber pressure at a substrate temperature of 700°C. Sharp near-band-edge emission was observed in the photoluminescence (PL) spectrum for the ZnO film grown at room temperature. Excess RF power aggravates the crystallinity and the surface roughness of the ZnO thin film. Pole figure, AES and PL analysis results conf
APA, Harvard, Vancouver, ISO, and other styles
10

Watazu, Akira, Katsuhiko Kimoto, Sonoda Tsutomu, et al. "Ti-Ca-P Films Formed by RF Magnetron Sputtering Method Using Dual Targets." Materials Science Forum 544-545 (May 2007): 495–98. http://dx.doi.org/10.4028/www.scientific.net/msf.544-545.495.

Full text
Abstract:
Ti-Ca-P films on commercial pure (cp) titanium plates were uniformly deposited using dual target RF magnetron sputtering apparatus with DC magnetron sputtering system under the conditions of 50 W DC power to a cp titanium target and 200 W RF power to a β-tricalcium phosphate (β-TCP) target for 60 min in 2.2×10-1 Pa Ar. Resulting samples had smooth surface like mirror. Crystal structure of the film was amorphous. The film had the chemical composition of about 3: 1.7: 1: 11 in Ti: Ca: P: O ratio under controlling the β-TCP target RF sputtering power and the titanium target DC sputtering power. T
APA, Harvard, Vancouver, ISO, and other styles
More sources

Dissertations / Theses on the topic "RF sputtering"

1

Prasankumar, Rohit Prativadi 1975. "Novel saturable absorber devices grown using RF and magnetron RF sputtering." Thesis, Massachusetts Institute of Technology, 1999. http://hdl.handle.net/1721.1/80599.

Full text
Abstract:
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1999.<br>Includes bibliographical references (leaves 81-85).<br>by Rohit Prativadi Prasankumar.<br>S.M.
APA, Harvard, Vancouver, ISO, and other styles
2

Subramanian, Senthilnathan. "Characterization of cadmium zinc telluride solar cells by RF sputtering." [Tampa, Fla.] : University of South Florida, 2004. http://purl.fcla.edu/fcla/etd/SFE0000429.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Silva, Adilson Oliveira da. "Estudo da obtenção de filmes de anatásio utilizando rf-magnetron sputtering." Florianópolis, SC, 2000. http://repositorio.ufsc.br/xmlui/handle/123456789/78441.

Full text
Abstract:
Tese (doutorado) - Universidade Federal de Santa Catarina, Centro Tecnológico.<br>Made available in DSpace on 2012-10-17T14:24:13Z (GMT). No. of bitstreams: 0Bitstream added on 2014-09-25T18:14:24Z : No. of bitstreams: 1 171844.pdf: 210584418 bytes, checksum: d9e7ff65b380888e7b8f6e1f64840d9e (MD5)<br>Filmes finos de TiO2 foram preparados pela técnica de RF-magnetron sputtering utilizando-se um alvo de rutilo. As camadas foram depositadas sobre substratos de Silício monocristalino e sílica vítrea, mantidos a temperatura ambiente. Primeiramente foi verificado a influência da fração molar de ox
APA, Harvard, Vancouver, ISO, and other styles
4

Todi, Ravi. "INVESTIGATIONS ON RF SPUTTER DEPOSITED SICN THIN FILMS FOR MEMS APPLICATIONS." Master's thesis, University of Central Florida, 2005. http://digital.library.ucf.edu/cdm/ref/collection/ETD/id/3330.

Full text
Abstract:
With the rapid increase in miniaturization of mechanical components, the need for a hard, protective coatings is of great importance. In this study we investigate some of the mechanical, chemical and physical properties of the SiCN thin films. Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a RF magnetron sputtering system using a powder pressed SiC target. Films with various compositions were deposited on to silicon substrate by changing the N2/Ar gas ratios during sputtering. Nano-indentation studies were performed to investigate the mechanical properties such as
APA, Harvard, Vancouver, ISO, and other styles
5

Treharne, Robert E. "RF magnetron sputtering of transparent conducting oxides and CdTe/CdS solar cells." Thesis, Durham University, 2011. http://etheses.dur.ac.uk/3310/.

Full text
Abstract:
The applicability of radio frequency magnetron sputtering (RFMS) for the development of: a) transparent conducting oxides (TCOs) and b) fully sputtered CdTe/CdS solar cells is demonstrated. TCO materials - In2O3:Sn (ITO), SnO2:F (FTO), ZnO:Al (AZO) and ZnO:F (FZO) - were investigated with respect to key deposition parameters in an attempt to generate films with low resistivities and high transmittances. Minimum resistivity values of 1.2 x 10^-4 Ohm.cm and 4.7 x 10^-4 Ohm.cm were achieved for films of ITO and AZO respectively while maintaining transmittances of > 80%. Such films are viable for
APA, Harvard, Vancouver, ISO, and other styles
6

Ramalhadeiro, Rui Miguel Martins. "Estudo estrutural e ótico de filmes de ZnO/MgO por RF-sputtering." Master's thesis, Universidade de Aveiro, 2012. http://hdl.handle.net/10773/9300.

Full text
Abstract:
Mestrado em Física<br>Este trabalho tem como objetivo o estudo estrutural e ótico de filmes de óxido de Zinco (ZnO) em substrato de óxido de Magnésio (MgO), em função das condições de crescimento por RF-sputtering (pulverização catódica de rádiofrequência). As condições de pressão parcial de O2 e temperatura do substrato são variáveis que influenciam bastante o crescimento de filmes finos de ZnO. A escolha do substrato cúbico de MgO, reside no facto deste material além de ser um óxido, possuir arranjo atómico não polar que poderá favorecer o crescimento de filmes finos de ZnO com orient
APA, Harvard, Vancouver, ISO, and other styles
7

Peres, Marco António Baptista. "Estudo de defeitos em filmes finos de ZnO depositados por Rf-sputtering." Doctoral thesis, Universidade de Aveiro, 2014. http://hdl.handle.net/10773/13983.

Full text
Abstract:
Doutoramento em Engenharia Física<br>Neste trabalho foram estudados diferentes filmes finos de ZnO depositados por Rf-Sputtering. Filmes finos de ZnO com diferentes propriedades óticas foram obtidos intencionalmente variando os parâmetros de deposição. De modo a correlacionar as propriedades óticas e estruturais com os parâmetros de deposição, foram utilizadas diferentes técnicas de caracterização avançadas, tais como, fotoluminescência, microscopia de força atómica, difração de raios- X e retrodispersão de Rutherford. Este trabalho centra-se na discussão e análise das bandas de emissão
APA, Harvard, Vancouver, ISO, and other styles
8

Campbell, Bryce W. "Preparation and characterization of lithium thiogermanate thin films using RF magnetron sputtering." [Ames, Iowa : Iowa State University], 2006.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
9

Bosco, Giácomo Bizinoto Ferreira 1987. "Photoluminescence of Tb3+ in a-Si3N4:H prepared by reactive RF-Sputtering and ECR PECVD = Fotoluminescência de Tb3+ em a-Si3N4:H preparado por RF-Sputtering reativo e ECR PECVD." [s.n.], 2017. http://repositorio.unicamp.br/jspui/handle/REPOSIP/322722.

Full text
Abstract:
Orientador: Leandro Russovski Tessler<br>Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Física Gleb Wataghin<br>Made available in DSpace on 2018-09-01T20:54:28Z (GMT). No. of bitstreams: 1 Bosco_GiacomoBizinotoFerreira_D.pdf: 9507140 bytes, checksum: 4980b29f48f98f8ff97e8a0a37b7577e (MD5) Previous issue date: 2017<br>Resumo: Este trabalho fornece caracterização ótica e estrutural de filmes finos compostos por nitreto de silício amorfo hidrogenado dopado com térbio (a-SiNx:H) ¿ crescidos por deposição química a vapor assistida por plasma gerado através de ressonância ciclo
APA, Harvard, Vancouver, ISO, and other styles
10

Gignac, Lynne Marie. "Processing and characterization of RF sputtered alumina thin films." Diss., The University of Arizona, 1988. http://hdl.handle.net/10150/184611.

Full text
Abstract:
Thin films of alumina were deposited on ferrite (NiₓZn₍₁₋ₓ₎Fe₂O₄), glass, single crystal silicon and graphite substrates by RF sputtering. Though standard, amorphous Al₂O₃ films are readily soluble in hot phosphoric acid, these sputtered films exhibited only reluctant etchability by the acid. Experiments were initially performed to understand the parameters in the sputtering process which were influential in the formation of unetchable films. The results showed that a high concentration of water vapor or oxygen molecules in the sputtering chamber during deposition was the most significant vari
APA, Harvard, Vancouver, ISO, and other styles
More sources

Books on the topic "RF sputtering"

1

Hayes, John Richard. Validation of a plasma sheath model for use in RF sputtering systems. The Author], 2003.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
2

Centre, Bhabha Atomic Research, ed. Development of a state-of-the-art R.F. sputtering coating system for the fabrication of multilayer x-ray mirrors. Bhabha Atomic Research Centre, 2000.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
3

Karner, Christine. Thin film characterisation of polycrystalline II-VI display phosphor materials prepared bypulsed laser deposition and RF sputtering. The Author], 1997.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
4

National Renewable Energy Laboratory (U.S.) and IEEE Photovoltaic Specialists Conference (2011 : Austin, Taxas), eds. Optical properties of Zn(O,S) thin films deposited by RF sputtering atomic layer deposition, and chemcial bath deposition: Preprint. National Renewable Energy Laboratory, 2012.

Find full text
APA, Harvard, Vancouver, ISO, and other styles
5

Ang, Wie Ming. ACTFEL phosphor deposition by RF sputtering. 1992.

Find full text
APA, Harvard, Vancouver, ISO, and other styles

Book chapters on the topic "RF sputtering"

1

Berladir, Khrystyna, Tetiana Hovorun, Oleksandr Oleshko, and Svetlana Radchenko. "RF Magnetron Sputtering of Biocompatible Coatings." In Lecture Notes in Mechanical Engineering. Springer Nature Switzerland, 2025. https://doi.org/10.1007/978-3-031-82746-4_34.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Tang, Hui Dong, Shou Hong Tan, and Zheng Ren Huang. "SiC Coatings Deposited by RF Magnetron Sputtering." In High-Performance Ceramics III. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-959-8.1309.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Tamai, Fujio, and Yuji Kawakami. "Reflecting Multi-Layer Coatings by RF Sputtering." In Materials Science Forum. Trans Tech Publications Ltd., 2005. http://dx.doi.org/10.4028/0-87849-980-6.309.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Vasanelli, L., A. Valentini, A. Quirini, A. M. Mancini, and A. Losacco. "ZnO/CdTe Solar Cells Prepared by RF Sputtering." In Seventh E.C. Photovoltaic Solar Energy Conference. Springer Netherlands, 1987. http://dx.doi.org/10.1007/978-94-009-3817-5_113.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Naoe, Hiroyuki, Satoru Kishida, Fumihiko Toda, Yuzuru Mitani, and Heizo Tokutaka. "Ba0.6Rb0.4 BiO Thin Films by RF Magnetron Sputtering." In Advances in Superconductivity X. Springer Japan, 1998. http://dx.doi.org/10.1007/978-4-431-66879-4_239.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

Hattori, Hisao, Hideo Itozaki, and Shuji Yazu. "(100) Oriented BSCCO Thin Film by RF Magnetron Sputtering." In Advances in Superconductivity III. Springer Japan, 1991. http://dx.doi.org/10.1007/978-4-431-68141-0_237.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Singha, R. K., K. Das, S. Das, A. Dhar, and S. K. Ray. "Characteristics of Ge Nanocrystals Grown by RF Magnetron Sputtering." In Semiconductor Photonics: Nano-Structured Materials and Devices. Trans Tech Publications Ltd., 2007. http://dx.doi.org/10.4028/0-87849-471-5.89.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Naoe, Hiroyuki, Yuzuru Mitani, Toshiyuki Kitagawa, Satoru Kishida, Fumihiko Toda, and Heizo Tokutaka. "Ba1-xRbxBiOy Thin Films Prepared by Rf Magnetron Sputtering." In Advances in Superconductivity XI. Springer Japan, 1999. http://dx.doi.org/10.1007/978-4-431-66874-9_247.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Shimizu, Kenichi, and Tomoaki Mitani. "Application Example 16: On the Nature of rf-GD Sputtering." In New Horizons of Applied Scanning Electron Microscopy. Springer Berlin Heidelberg, 2009. http://dx.doi.org/10.1007/978-3-642-03160-1_17.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Díaz-Reyes, Joel, Roberto S. Castillo-Ojeda, and Javier Martínez-Juárez. "Characterization of Wurtzite Type ZnS Grown by RF Magnetron Sputtering." In Materials Characterization. Springer International Publishing, 2015. http://dx.doi.org/10.1007/978-3-319-15204-2_19.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Conference papers on the topic "RF sputtering"

1

Churton, B., L. Couëdel, A. A. Samarian, et al. "Dust Growth by RF Sputtering." In MULTIFACETS OF DUSTRY PLASMAS: Fifth International Conference on the Physics of Dusty Plasmas. AIP, 2008. http://dx.doi.org/10.1063/1.2996830.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Biederman, H. "Plasma polymers prepared by rf sputtering." In IEE Seminar Plasma Polymerisation - Processing for the Future. IEE, 1999. http://dx.doi.org/10.1049/ic:19990163.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Jing Li, Suntao Wu, and Junyong Kang. "ZnO films deposited by RF magnetron sputtering." In 2004 13th International Conference on Semiconducting and Insulating Materials. IEEE, 2004. http://dx.doi.org/10.1109/sim.2005.1511390.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Chiasera, Alessandro, Francesco Scotognella, Dominik Dorosz, et al. "Glass based structures fabricated by rf-sputtering." In 2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO). IEEE, 2017. http://dx.doi.org/10.23919/mipro.2017.7973384.

Full text
APA, Harvard, Vancouver, ISO, and other styles
5

Chiasera, A., F. Scotognella, S. Varas, et al. "Dielectric multilayer structures fabricated by rf-sputtering." In 2017 Conference on Lasers and Electro-Optics Europe (CLEO/Europe) & European Quantum Electronics Conference (EQEC). IEEE, 2017. http://dx.doi.org/10.1109/cleoe-eqec.2017.8086607.

Full text
APA, Harvard, Vancouver, ISO, and other styles
6

German, J., and R. Lovro. "RF Sputtering of ITO on Rotary Cathodes." In Society of Vacuum Coaters Annual Technical Conference. Society of Vacuum Coaters, 2014. http://dx.doi.org/10.14332/svc14.proc.1828.

Full text
APA, Harvard, Vancouver, ISO, and other styles
7

Fujii, Satoshi, Yuki Odo, and Hiroshi Nishizato. "Development of Minimal RF-magnetron Sputtering Machine." In International Conference on Industrial Application Engineering 2023. The Institute of Industrial Applications Engineers, 2023. http://dx.doi.org/10.12792/iciae2023.014.

Full text
APA, Harvard, Vancouver, ISO, and other styles
8

Zanetti, Giacomo, Alice Carlotto, Thi Ngoc Lam Tran, et al. "1D photonic crystals fabricated by rf-sputtering." In Fiber Lasers and Glass Photonics: Materials through Applications IV, edited by Stefano Taccheo, Maria Rita Cicconi, and Matthias L. Jäger. SPIE, 2024. http://dx.doi.org/10.1117/12.3025887.

Full text
APA, Harvard, Vancouver, ISO, and other styles
9

Chiasera, A., C. Macchi, S. Mariazzi, et al. "GeO2glass ceramic planar waveguides fabricated by RF-sputtering." In SPIE OPTO, edited by Michel J. F. Digonnet and Shibin Jiang. SPIE, 2014. http://dx.doi.org/10.1117/12.2042099.

Full text
APA, Harvard, Vancouver, ISO, and other styles
10

Adamiec, Krzysztof, Jaroslaw Rutkowski, S. Bednarek, and E. Michalski. "RF sputtering deposition of CdTe on GaAs substrate." In XII Conference on Solid State Crystals: Materials Science and Applications, edited by Antoni Rogalski, Jaroslaw Rutkowski, Andrzej Majchrowski, and Jerzy Zielinski. SPIE, 1997. http://dx.doi.org/10.1117/12.276217.

Full text
APA, Harvard, Vancouver, ISO, and other styles

Reports on the topic "RF sputtering"

1

L.H. Ouyang, D.L. Rode, T. Zulkifli, B. Abraham-Shrauner, N. Lewis, and M.R. Freeman. GaAs Films Prepared by RF-Magnetron Sputtering. Office of Scientific and Technical Information (OSTI), 2001. http://dx.doi.org/10.2172/821684.

Full text
APA, Harvard, Vancouver, ISO, and other styles
2

Tzeng, Yonhua, and Hongbin Zhu. Electron Assisted Deposition of Cubic Boron Nitride by RF Magnetron Sputtering. Defense Technical Information Center, 1999. http://dx.doi.org/10.21236/ada362770.

Full text
APA, Harvard, Vancouver, ISO, and other styles
3

Coutts, T. J., X. Wu, and W. P. Mulligan. High performance transparent conducting films of cadmium indate prepared by RF sputtering. Office of Scientific and Technical Information (OSTI), 1996. http://dx.doi.org/10.2172/296769.

Full text
APA, Harvard, Vancouver, ISO, and other styles
4

Foster, C. M., R. Csencsits, P. M. Baldo, et al. Epitaxial Pb(Zr{sub x}Ti{sub 1{minus}x})O{sub 3}/SrRuO{sub 3} (x = 0, 0.35, 0.65) multilayer thin films on SrTiO{sub 3}(100) and MgO(100) prepared by MOCVD and RF sputtering. Office of Scientific and Technical Information (OSTI), 1995. http://dx.doi.org/10.2172/52818.

Full text
APA, Harvard, Vancouver, ISO, and other styles
You might also be interested in the extended bibliographies on the topic 'RF sputtering' for particular source types:
Journal articles Dissertations / Theses
We offer discounts on all premium plans for authors whose works are included in thematic literature selections. Contact us to get a unique promo code!

To the bibliography