Dissertations / Theses on the topic 'Run'
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Ingólfsson, Ármann. "Run by run process control." Thesis, Massachusetts Institute of Technology, 1991. http://hdl.handle.net/1721.1/13036.
Full textIncludes bibliographical references (leaves 115-118).
by Ármann Ingólfsson.
M.S.
Moyne, William P. (William Patrick). "Run by run control : interfaces, implementation, and integration." Thesis, Massachusetts Institute of Technology, 1995. http://hdl.handle.net/1721.1/38048.
Full textDuque-Estrada, Elliott Bryce. "Hell Run." Digital Commons at Loyola Marymount University and Loyola Law School, 2016. https://digitalcommons.lmu.edu/etd/286.
Full textGrant, Michael E. (Michael Edward). "China Run." Thesis, North Texas State University, 1986. https://digital.library.unt.edu/ark:/67531/metadc500963/.
Full textCrowder, Wade (Wade Allen). "Jonica Run." Thesis, University of North Texas, 1992. https://digital.library.unt.edu/ark:/67531/metadc500879/.
Full textDuran, Villalobos Carlos Alberto. "Run-to-run modelling and control of batch processes." Thesis, University of Manchester, 2016. https://www.research.manchester.ac.uk/portal/en/theses/runtorun-modelling-and-control-of-batch-processes(1d42c508-b96d-4ee6-96ad-ec649a199913).html.
Full textCampbell, William Jarrett. "Model predictive run-to-run control of chemical mechanical planarization /." Digital version accessible at:, 1999. http://wwwlib.umi.com/cr/utexas/main.
Full textHyde, Spencer. ""Let It Run"." Thesis, University of North Texas, 2018. https://digital.library.unt.edu/ark:/67531/metadc1248507/.
Full textDeZeeuw, Zane Truman. "Run Me Dusk." TopSCHOLAR®, 2018. https://digitalcommons.wku.edu/theses/3043.
Full textBaumann, Morgaine Lillian. "Cascade & Run." PDXScholar, 2019. https://pdxscholar.library.pdx.edu/open_access_etds/5121.
Full textStuckey, Eric J. (Eric James) 1974. "Development of a run by run control benchmarking and simulation system." Thesis, Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/50504.
Full textIncludes bibliographical references (p. 68-69).
As the semiconductor industry begins to move toward the introduction of fault detection and classification as well as run by run (RbR) process control methodologies, the identification of application scenarios and the means to compare and benchmark available solutions is an essential step. That step has been taken for FDC, and its importance for RbR has been recognized. The work presented here examines the feasibility of such an activity for run by run control including the determination of appropriate scenarios for run by run control, and determining how meaningful comparisons or benchmarking between controllers can be accomplished. There have been a number of benefits as a result of this project. First, we have shown that the benchmarking of run by run controllers is indeed feasible, and through the development of a run by run control simulation and benchmarking framework, and the determination of a set of process scenarios, SEMATECH is well-prepared for future efforts that might undertake benchmarking and/or demonstration of available commercial and experimental run by run controllers in specific realistic scenarios. Second, we now have a better understanding of the demands on and capabilities of run by run control, as well as a better understanding of the requirements of a successful benchmarking system. This information has been obtained through a literature survey and a questionnaire distributed to SEMATECH member companies to solicit feedback on the requirements and opportunities for run by run control and run by run control benchmarking. Third, we have defined and implemented several control scenarios that can serve as benchmarking cases in a future benchmarking effort. And finally, experience has been gained in using messaging protocols to connect RbR controllers to process simulators (or actual process tools) that can be beneficial in defining a standard set of communications for RbR controllers and other process peripherals.
by Eric J. Stuckey.
S.M.
Bode, Christopher Allen. "Run-to-run control of overlay and linewidth in semiconductor manufacturing." Digital version:, 2001. http://wwwlib.umi.com/cr/utexas/fullcit?p3008281.
Full textJin, Ming. "Chart allocation and control techniques for multistage and run-to-run processes /." View abstract or full-text, 2008. http://library.ust.hk/cgi/db/thesis.pl?IELM%202008%20JIN.
Full textGower, Aaron E. (Aaron Elwood). "Integrated model-based run-to-run uniformity control for epitaxial silicon deposition." Thesis, Massachusetts Institute of Technology, 2001. http://hdl.handle.net/1721.1/16787.
Full textAlso available online at the MIT Theses Online homepage
Includes bibliographical references (p. 241-247).
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Semiconductor fabrication facilities require an increasingly expensive and integrated set of processes. The bounds on efficiency and repeatability for each process step continue to tighten under the pressure of economic forces and product performance requirements. This thesis addresses these issues and describes the concept of an "Equipment Cell," which integrates sensors and data processing software around an individual piece of semiconductor equipment. Distributed object technology based on open standards is specified and utilized for software modules that analyze and improve semiconductor equipment processing capabilities. A testbed system for integrated, model-based, run-to-run control of epitaxial silicon (epi) film deposition is developed, incorporating a cluster tool with a single-wafer epi deposition chamber, an in-line epi film thickness measurement tool, and off-line thickness and resistivity measurement systems. Automated single-input-single-output, run-to-run control of epi thickness is first demonstrated. An advanced, multi-objective controller is then developed (using distributed object technology) to provide simultaneous epi thickness control on a run-to-run basis using the in-line sensor, as well as combined thickness and resistivity uniformity control on a lot-to-lot basis using off-line thickness and resistivity sensors.
(cont.) Control strategies are introduced for performing combined run-to-run and lot-to-lot control, based on the availability of measurements. Also discussed are issues involved with using multiple site measurements of multiple film characteristics, as well as the use of time-based inputs and rate-based models. Such techniques are widely applicable for many semiconductor processing steps.
by Aaron Elwood Gower-Hall.
Ph.D.
Pettey, Samantha. "Run, Women, Run! Female Candidates and Term Limits: A State-Level Analysis." Thesis, University of North Texas, 2016. https://digital.library.unt.edu/ark:/67531/metadc862859/.
Full textMoreno, Moreno Ahuitzotl Héctor. "Long run economic mobility." Thesis, Paris 1, 2018. http://www.theses.fr/2018PA01E004/document.
Full textEconomic mobility constitutes a social aspiration in many modern societies however do we really know the actual evolution of social mobility? In other words: 1) how can we measure economic mobility with the data available or with the technology at hand? 2) What are the trends of economic mobility experienced by the current generation? Moreover 3) how mobile is a society relative to previous generations? These questions motivate this dissertation. The complexity of these issues may derive in some sort of paralysis but it is claimed here that it may be possible to learn something about its evolution by restricting analysis to a couple of key dimensions within the economic discipline: income and education. This is the scope followed by this research. The first paper in this dissertation is devoted to deal with the lack of the required data to examine the income dynamics within one generation. It is well known that longitudinal data is often scarce and is seldom available in many countries. This is the case even in well-developed countries! This conundrum has been partially addressed through recent methodological approaches by the so-called synthetic panels. The second part of this dissertation is entirely devoted to applied research. More specifically, the second and third papers describe long run trends of economic mobility in income and education respectively. The former is devoted to intra-generational mobility while the later is devoted to inter-generational mobility. Each of them address the second and third interrogations referred above. In a way this dissertation attempts to improve the addition of the time dimension in the analysis of economic wellbeing. It attempts to produce the effect of a motion picture by the use multiple snapshots. The trends contained herein are far from being perfect and complete but they are based on the use of extensive data and multiple methods covering three decades and the same number of generations in each case. This research expects to expand our knowledge on the empirics of economic mobility as most of the studies refer to few years of intra-generational mobility or to a couple of generations only. Furthermore, most of the empirical evidence available refers to Nordic and highly industrialized countries. Mexico is the canvas of this work but the approaches and principles followed here could be easily mimicked elsewhere. The roads of our lives are constantly moving: rising and falling. In a democratic context, it is useful to know, whether our society provides the chance to get ahead regardless of our origins, or whether this chance is ruled or doomed by them. Empirical evidence is needed to foster these deliberations. This dissertation may well be an invitation to sustain this kind conversation
BERBERI, LORELA. "RUN FOR YOUR LIFE." Thesis, The University of Arizona, 2016. http://hdl.handle.net/10150/614093.
Full textMcGinley, Susan. "Eat and Run - Scientifically." College of Agriculture and Life Sciences, University of Arizona (Tucson, AZ), 1992. http://hdl.handle.net/10150/622402.
Full textMolocchi, Giorgia <1995>. "Run Over The Blog." Master's Degree Thesis, Università Ca' Foscari Venezia, 2019. http://hdl.handle.net/10579/15916.
Full textSprague, Dean R. "A multi-media (slide show) publicity package in support of Run, Jane, Run." Virtual Press, 1986. http://liblink.bsu.edu/uhtbin/catkey/491459.
Full textTitle from p. 2.
Krauss, Alan. "Control of run-by-run processes with applications to large-area material deposition." Diss., Georgia Institute of Technology, 1998. http://hdl.handle.net/1853/14685.
Full textByrne, Joseph Paul. "International reserves revisited : long-run determinants and short-run dynamics after Bretton Woods." Thesis, University of Strathclyde, 2000. http://oleg.lib.strath.ac.uk:80/R/?func=dbin-jump-full&object_id=21146.
Full textHaskaraman, Feyza. "Chamber matching in semiconductor manufacturing using statistical analysis and run-to-run control." Thesis, Massachusetts Institute of Technology, 2016. http://hdl.handle.net/1721.1/107544.
Full textCataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 79-81).
This thesis focuses on a chamber matching methodology for semiconductor manufacturing in Analog Devices Inc.'s fabrication sites. As ADI extends its efforts to implement Internet of Things and predictive maintenance (PdM) to its fabrication facilities, it is also seeking to increase their overall yield by implementing better monitoring and control of processes and matching the performance of chambers. This thesis project was conducted by F. Haskaraman, T. Nilgianskul and T. Nerurkar as a team to make a series of recommendations to improve process yields using statistical control and to show the benefits of chamber matching in particular. Nilgianskul's thesis focuses on the statistical process control and Nerurkar's thesis focuses on Design on Experiments (DOEs). A chamber matching methodology is created and applied to chambers that run the plasma-ashing process. Using design of experiments, the machines are modeled individually and globally. While individual models reveal the mismatch, a global model is proposed as a step to optimize the process recipes for matching. The root cause of the differences is diagnosed with instrumented wafers and in-situ sensor monitoring. Recommendations are made to standardize the hardware and software along with calibration methods. First batch of streamed raw data from an in-situ thermocouple is analyzed and found to be another tool to monitor the chamber performance differences. The process is simulated using an EWMA controller and is found to achieve lower mismatch by keeping outputs of the machine closer to the strip thickness in the case of a process drift. At the end of the project, a chamber matching methodology was recommended to the Analog Devices to complement its Internet of Things efforts. By increasing the routing flexibility and decreasing yield variability and tool qualification, this strategy is expected to save significant amount of costs and increase the quality of its products.
by Feyza Haskaraman.
M. Eng. in Advanced Manufacturing and Design
Smith, Taber H. (Taber Hardesty). "Novel techniques for the run by run process control of chemical-mechanical polishing." Thesis, Massachusetts Institute of Technology, 1996. http://hdl.handle.net/1721.1/40235.
Full textFranco, Alice Elena. "To Run or Not to Run| Understanding Motives and Barriers among Female Runners." Thesis, California Baptist University, 2018. http://pqdtopen.proquest.com/#viewpdf?dispub=10934139.
Full textThis study examines females’ various motives and barriers for running. Female event participation has grown exponentially over the past two decades. However, current research does not explore levels of runners to include the evolving running culture, nor does it explore stages experienced throughout motherhood in connection to running. Using an online questionnaire, a total of 150 female runners were grouped into different runner levels (e.g. serious, enthusiastic, and incidental) as well as different stages of motherhood (e.g. mothers with young children, mothers with school aged children, mothers with older children, and females with no children). Participants completed the Motivations of Marathoners Scales (MOMS) to measure running motives and a modified version of the Exercise Benefits/Barriers Scale (EBBS) to measure running barriers. Multiple multivariate analysis of variance (MANOVA) analyses were used to test the hypothesized differences. As a group, serious runners endorsed goal achievement, competition, life meaning, psychological coping, and affiliation as reasons for running. Enthusiastic runners were more likely to endorse personal goal achievement than incidental runners. Additionally, mothers with young children were more likely to cite family barriers as barriers to running than mothers with older children or females with no children. The findings’ potential applications to research, programs, policy, and training are discussed.
Chen, M. C. "The determination of house prices in Taiwan : long-run equilibrium and short-run dynamics." Thesis, University of Cambridge, 1999. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.597523.
Full textLe, Minh Sy. "Variation reduction in plasma etching via run-to-run process control and endpoint detection." Thesis, Massachusetts Institute of Technology, 1997. http://hdl.handle.net/1721.1/43565.
Full text李家豪. "Run-to-run control for mixed-run production system." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/78634086844531654654.
Full textChiang, Chung-Li, and 蔣崇立. "Two-Product Mixed-Run Run-to-Run Control for Drifted Process." Thesis, 2017. http://ndltd.ncl.edu.tw/handle/9zev4m.
Full text國立清華大學
統計學研究所
105
Exponentially weighted moving average (EWMA) feedback controller has been widely used in semiconductor manufacturing processes. The long-term stability and short-term performance of EWMA control scheme have been addressed by several studies in the literatures. Most of the controllers emphasize on the case of a single-tool with single-product production situation. However, in advanced manufacturing, multiple-product production situations are common for the practical implementation of run-to-run (R2R) control scheme. Recently, tool-based (TB), product-based (PB), cycle resetting (CR) and modified tool-based (MTB) controllers have been proposed to handle the mixed-run R2R control problem. These controllers are developed under the scenarios of non-drifted processes. For drifted-processes, these control schemes may suffer from a larger total sum square error (TSSE). The drifted-version MTB (DMTB) controller partially solves this problem, leading to a smaller TSSE (of output) but still having a non-ignorable bias during the same product production run. To overcome this issue, this thesis propose a modified DMTB with an extra controller to compensate for drift, called MTB-dEWMA. The stability conditions of MTB-dEWMA controller under the assumption that the process disturbance follows general time series are discussed. Furthermore, a simulation is conducted to examine the performance of MTB-dEWMA controller with existing competitors, including DMTB, MTB and CR. The results show that MTB-dEWMA controller outperforms other competitors in terms of TSSE criterion.
Chou, Ywh-Leh, and 周育樂. "Age-Based Run-to-Run Control Methods." Thesis, 2000. http://ndltd.ncl.edu.tw/handle/36926608624863526347.
Full text國立臺灣大學
工業工程學研究所
88
ABSTRACT Process control has been playing an important role in effective manufacturing. The goal of process control may be broadly stated as maintaining the performance of a process at the best possible level over time. The purpose of the Run-to-Run control is to compensate for the systematic disturbance of processes based on post-measurements of the current process or of the preceding process. The systematic disturbance usually comes from the external factors, such as aging effects of the processing equipments/tools and raw material quality deviations. Both the traditional Run-to-Run control schemes and the simple time series AutoRegressive Integrated Moving Average (ARIMA) models are based on the assumption that successive values in the data sequence represent consecutive measurements taken at equally spaced time intervals. However, in many applications, the data sampling time is not equally spaced. This incorrect assumption leads to poor results in both the traditional Run-to-Run control schemes and the simple ARIMA models. In order to control processes with data sampled at unequally spaced time intervals and enhance the Run-to-Run control schemes'' capability, several age-based Run-to-Run control methods, including age-based Double Exponentially Weighted Moving Average (age-based D-EWMA) controller, Multiple Inputs Single Output AutoRegressive Integrated Moving Average with eXogenous variables (MISO ARIMAX) model and a modified transfer function ARIMA model, referred to as Functional ARIMA (F-ARIMA), are proposed in this thesis. These proposed methods have been applied to and demonstrated in the prediction of Chemical Mechanical Polishing (CMP) removal rate. The results show that these proposed methods are more effective. It is recommended that when the age data for the processing equipments and/or tools is available, the proposed age-based Run-to-Run control methods should be used to perform the process control.
WANG, SHENG-YA, and 王聖雅. "Self-Tuning Run by Run Process Controller." Thesis, 1997. http://ndltd.ncl.edu.tw/handle/93415780936966454405.
Full text國立臺灣大學
商學研究所
85
In recent years, many process control techniques have been developedin the scenario of wafer fabrication, one of which is the MIT's EWMA (exponentially weighted moving average) controller which compensates for process drifts by adjusting the process inputs on a run-by-run basis. The goal of this thesis is to further enhance the MIT's approach by self-tuning the control parameter dynamically so that process outputscan be maintained on the targets as close as possible. In the EWMA controller, process models are assumed as linear polynomials,in which constant terms are tuned run-by-run based on the EWMA algorithmwhile slope terms are fixed and determined off-line. The optimal controlparameter, which determines the effectiveness of the controller, is obtained by minimizing the equation of mean square error from target. Based on the statistical derivation, it is dependent on the estimation of the drift rate and model slope terms. In this thesis, we assume the slope terms are correct and propose two modules, one to estimate the drift rate and the other one to decide when to change the control parameter, so that the optimal control parameter can be self-tuned dynamically. In the drift rate estimation module, both biased and unbiased estimates are derived using statistical theory and characterized using Monte Carol simulations. Results show that both methods can estimate the true process drift rates within 50 runs. In the decision module, the control parameter is updated only when there is a statistically significant change in the drift rate estimate. Two decision rules under reset and no reset conditions are established and their performances are evaluated using Monte Carol simulations. Results show that the proposed self-tuning EWMA controller can capture the process characteristics dynamically and achieve a better performance than the original EWMA controller.
Chou, Yu-Shoun, and 周煜舜. "SPC Monitoring Under Run-to-Run ControlFramework." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/37467795535154854789.
Full text銘傳大學
應用統計資訊學系碩士班
98
For the last two decades, the run-to-run controller has become very popular to enhance the performance of semiconductor manufacturing processes by integrating feedback control and statistical process control. Due to lot-to-lot feedback adjustment, the recipe of the process is varied in lot. It induces that process output is not only auto-correlated, but also has variation in terms of lot, wafer and the sites of a wafer. In this study, according to the framework of run-to-run control for semiconductor manufacturing process, we use the state space model to describe the process output by Single Exponentially Weighted Moving Average (SEWMA) feedback. According the proposed model, the state prediction controller (STPC) was proposed to monitoring the expected means for each lot. Based on the assumption that the process output adjusted by the feedback controller is stationary, we use the criteria of average run length to evaluate the performance of our proposed STPC. Compare to the traditional Shewhart control chart, we have the two main results as follows: (1) The ARL0 of our proposed control chart is very close to 370.4. (2) When the process is shift, the proposed control chart can detect the assignable cause quickly.
Wang, Yukai, and 王昱凱. "Distrubance Retuned EWMA Approach for a Mixed Run Production Run-to-Run Process." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/72245285679152547238.
Full text靜宜大學
財務與計算數學系
101
EWMA (Exponentially Weighted Moving Average) controller has been commonly applied in semiconductor manufacturing in recent years. The controller is mainly used to manipulate the parameter in Run-to-Run process control (R2R). Through adjusting the current value variants between process output value and target value to generate a new variable for next process runs, the chief process adjustment purpose will therefore be effectively achieved. Several methods have been proposed in the previous literature, such as tool-based controller, product-based controller, MTB (Modified tool-based) controller and modified single EWMA controller, which are mainly designed to improve initial deviation. These methods have been proven to gradually minimize the gap between process output value and target value; however, the output deviations are usually very large at the beginning of the first few runs. Therefore, we construct a DREWMA (Distrubance retuned EWMA) controller to solve the problem, and investigate performance analysis of DREWMA controller comparison between performance of MTB controller and modified single EWMA controller. Thus, we conclude that DREWMA controller is better than MTB controller and modified single EWMA controller, In particular, when estimated value deviation is large, DREWMA controller more effectively reduce the process of TMSE (total mean square error).
Kuo, Tzu-Wei, and 郭子瑋. "Run-by-Run Control of Metal Sputter Deposition." Thesis, 2005. http://ndltd.ncl.edu.tw/handle/91615351017185513060.
Full text中華大學
機械與航太工程研究所
93
In this thesis, the time series model of the metal sputter deposition is constructed by history data and the Extended Kalman Filter is used to estimate the deposition rate and update the parameters of the time series model simultaneously. Then, the constant rate of deposition is accomplished by controlling the power based on the updated model. Furthermore, the thesis also proposes a method to estimate the deposition rate when the data is measured at non-fixed interval. The simulation results demonstrate that the performance of the proposed method is higher than Exponentially Weighted Moving Average(EWMA) and Double Exponentially Weighted Moving Average(DEWMA) controllers that are adopted popularly in semiconductor processes.
米忻超. "A Study of Multivariate Run-to-Run Controllers for Dynamic and Mixed-Run Manufacturing Processes." Thesis, 2012. http://ndltd.ncl.edu.tw/handle/84485779235431077942.
Full textLi-Fu, Wang, and 王立夫. "Run-to-Run Control of Mix-Product Semiconductor Processes." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/85667049002411454106.
Full text中華大學
機械與航太工程研究所
95
This thesis developed an advanced control technology for mix-product semiconductor processes. The conventional run-to-run process control for single-tool and single-type-product processes was improved to that for mix-tool and mix-product processes through individually estimating the disturbances induced by tools and products. The proposed controller, termed D-JADE, can estimate the shift and drift disturbances simultaneously for the drifting semiconductor processed by two estimators, one for shifts and the other for drifts. The simulation results demonstrate that the performance of the proposed controller is higher than those of existed controllers for the drifting mix-product semiconductor processes.
Liu, Po-Sheng, and 劉柏聖. "Run to Run Prediction and Control of ADI CD." Thesis, 2007. http://ndltd.ncl.edu.tw/handle/49894167789460390050.
Full text國立交通大學
機械工程系所
96
Semiconductor wafer size has been increased from 8 inch to 12 inch, line width in the IC wafer has been reduced from micrometer to nanometer range. The bigger the wafer size and the smaller the line width, the more complicated the wafer manufacturing process. Photolithography process is the key process in reducing line width in IC wafer. There are three kinds of photolithography process inspection, i.e. overlay error, critical dimension (CD) and after develop Inspection (ADI), the yield of photolithography process depends on these three parameters. This research proposes a new run to run (MISO) advances process controller for photolithography process. In this thesis, the run to run control model among input recipes (focus and exposure dose) and output variables (Critical Dimension) are formed by using design of experiment (DOE) method. We then uses on-line recursive least squares (RLS) model identification to update parameters of run to run controller. We can find the best recipe (best focus and best exposure dose) to keep CD on the target, enhance the process control capability and improve the quality of line width on the wafer. According to experimental results, using RLS Run to Run controller, of ADI CD can be improved from 1.472 to 1.8136, a 23% improvement compared with the case of no feedback control of ADI CD.
Shiu, Sheng-Jyh, and 許勝智. "Multi-Zone CMP: Multivariable and Run-to-Run Control." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/42454584322189311300.
Full text國立臺灣大學
化學工程學研究所
91
In this work, the control of a new type of chemical mechanical polishing (CMP), multi-zone CMP, is explored. Unlike the typical single zone configuration, the wafer carrier is divided into three zones in the radial position and different pressure can be applied to each zone. This provides an effective tool to improve global planarity. For the Applied Materials three-zone CMP, the copper thickness across the radial position is measured with an in-situ sensor which is embedded in the polishing table. The measurement is converted to 59 data points along the radial position. In the process control notation, these are the controlled variables and the manipulated variables are the three pressures applied to each zone. In this first part of the thesis, we focus on the multivariable control of this 59x3 process. First, a two-level factorial design is carried out on all three pressures followed by the least square regression to find the steady-state gain matrix. Incorporated with the gas holdup dynamics, we have a 59x3 process transfer function matrix with the same first order dynamics in each column. The control objective is to maintain uniform surface profile using all three manipulated variables. Because this is a non-square system, it is not possible to keep all 59 outputs at their set points using only 3 inputs. To the best, a least square solution, minimizing the sum of square errors (between the set point and measured thickness), can be obtained. The singular value decomposition (SVD) is used to design the non-square feedback controller. First, the outputs (59x1) are transformed into principal output direction (3x1) and, next, a diagonal PI controller (3x3) is designed and the controller outputs in the principle input directions (3x1) are computed. Finally, these controller outputs are transformed to the true inputs (3 pressures) to the process. This SVD controller can be implemented using standard software with little difficulty. The proposed control system is test on incoming wafers with different surface profiles. Results show that achievable performance (least square results) can be maintained using the proposed SVD controller. The run-to-run (R2R) control of the multi-zone CMP is studied next. Run-to-run control is an effective tool for robotic control and, recently, it has received great deal of attention in batch process control and semiconductor manufacturing processes. A significant portion of R2R control research focuses on the controller design, algorithm, convergence, and statistical implications etc. Unlike typical run-to-run control of chemical or robotic systems, in most of semiconductor manufacturing processes (CMP in particular), we have some prior knowledge about the quality of the incoming wafer. This is especially true for CMP because we measure the surface profile (uniformity) right after the electrochemical plating (ECP) step. The question then becomes: is it possible to improve the yield (speedup the convergence) via arrangement of feeding-sequence? Two feeding policies are considered. One is feeding the wafers with better uniformity first (good-to-bad) and the other is the opposite, feeding the wafers with inferior uniformity first (bad-to-good). A simple example is used to illustrate the similarity and difference between these two policies followed by a more realistic multi-zone CMP example. Results show that improved run-to-run control can be achieved by feeding the better wafers first (good-to-bad). More importantly, better yield is obtained with extremely simple means: improved feeding policy.
HSUNG, YU CHENG, and 游政雄. "Neural Network Based Run-to-Run CMP Process Control." Thesis, 2001. http://ndltd.ncl.edu.tw/handle/31703272593892232053.
Full text國立中興大學
機械工程學系
89
The goal of this thesis is to propose an intelligent process control strategy that combines the RBF based neural fuzzy network and the run-to-run process control techniques for the erratic and unstable CMP processes. In this new run-to-run control scheme, two RBF based neural fuzzy networks are employed to replace the 1st order linear process predicting model and the linear controller of the conventional EWMA scheme, respectively. The learning and nonlinear mapping essences of the neural network provide this new control structure with more power in nonlinear process modeling and control. Computer simulations and experimental results demonstrate that the proposed new control scheme can suppress the drifting problem better than the conventional EWMA model. In addition, no extra sensor and machine modification is required to employ the new control method. Consequently, it is highly feasible for industrial implementation.
李淑伶. "Quasi MMSE controller for dynamic run-to-run system." Thesis, 2010. http://ndltd.ncl.edu.tw/handle/80856784085218081434.
Full text簡勁舟. "Run-to-run control scheme for a mixed-run process with single tool and multiple products." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/94620779000262420122.
Full text國立清華大學
統計學研究所
99
Exponentially weighted moving average (EWMA) controller has been widely used in semiconductor manufacturing processes. In the literatures, several papers addressed the efforts of long-term stability and short-term performance of EWMA control scheme. However, all the existing models are only valid when focusing on single-product and single-tool production style. In practical applications, multiple-product and multiple-tool production style is common for the practical implementation of run to run (R2R) control scheme. Recently, product-based approach and tool-based approach have been proposed to handle this mixed-run production problem. Although these control schemes will eventually bring the process output to the desired targets; they may suffer from a larger rework rate (RR) due to larger process variations. To overcome this difficulty, we propose a modified single EWMA controller to tackle this problem. We first address the stability conditions of the proposed controller. The result demonstrates that the stability conditions of the proposed controller will be held under some specific assumptions. Furthermore, we also use simulation study to investigate the performance of the proposed controller via total mean square error (TMSE) and RR criterion. The results demonstrate proposed controller outperforms existing models.
Wu, Lingyi, and 吳玲儀. "A simulation Study of Various Run-to-Run Control Schemes for a Mixed-Run Production System." Thesis, 2013. http://ndltd.ncl.edu.tw/handle/95057108326736547055.
Full text靜宜大學
財務與計算數學系
101
Exponentially weighted moving average (EWMA) is commonly used in Run-to-run (R2R) control of the semiconductor manufacturing process. The EWMA feedback controller is a popular model-based controller which primarily uses data from past process run to adjust the input recipe for the next run. In the literatures, several papers addressed the efforts of long-term stability and short-term performance of EWMA control scheme. However, in practical applications, multiple-tool and multiple- product production style is common for the practical implementation of R2R control scheme. A single EWMAcontroller can not be directly used to monitor the production process. Thus, for a such mixing production style, product-based controller, tool-based controller, MTB controller, modified sing EWMA controller and DREWMA controller have been proposed. Therefore, in this paper, we adopt the Distrubance retuned EWMA (DREWMA) controller to discuss the improvement of total means square error (TMSE), to explore different combinations of process disturbances under various controllers and its relative efficiency and to make comparison and analysis of the merits and drawbacks so as to efficiently use the existing controller to significantly reduce TMSE.
Wu, Ming Feng, and 吳明峰. "Performance analysis of run-to-run controllers subject to metrology delay and virtual metrology and the development novel run-to-run control approach." Thesis, 2008. http://ndltd.ncl.edu.tw/handle/78572003687996472232.
Full text國立清華大學
化學工程學系
96
Two problems encountered in many semiconductor manufacturing are metrology delay caused by the equipments and mixture products on producing. For this thesis, we develop some controllers to eliminate the influences of two problems. First, focusing on the metrology delay problem, we deriver an analytic formula of the performance for a single EWMA controller and provide the guideline to reduce the effects of metrology delay system. Additionally, we provide VM (Virtual Metrology) system to solve it and analyze the performance of VM of modeling methods. Finally, we suggest Stepwise method to plug in VM system. Mixed-product production can reduce amount of cost and time in semiconductor manufacturing. However, each product has a different I-O model and it is a big challenge to run-to-run control. In order to solve it, we use an ANCOVA model to deal with the characteristic of mixed products in different platforms, and to correct the modeling error due to mixed products in order to impove the controller performance and quality.
tsai, yi-ting, and 蔡一婷. "Long-Run and Short-Run Budgeting:Evidence from Taiwan and China." Thesis, 2005. http://ndltd.ncl.edu.tw/handle/80682482784676959743.
Full text逢甲大學
財稅所
93
For resolving the budget deficit problem, some economists have advocated spending cuts, while others support either tax increases or tax cuts. This paper investigates the long-run relationship between two fiscal variables for Taiwan and China using vector error correction model, and tests incremental decision-making in the short-run budgeting process. The results show that, in the long-run, revenues are the driving force behind the budget in Taiwan using real data. Revenues and Expenditures force the budget toward balance synchronously in Taiwan using nominal data and in China using real data. Expenditures force the budget toward balance in China using nominal data. Furthermore, in the short-run, incrementalism occurs in both revenues and expenditures in Taiwan using either nominal data or real data. However, incrementalism occurs neither in revenues nor in expenditures in China using real data and nominal data.
Chang, Wan-Hsuan, and 張菀瑄. "Application of BPNN Controller to Run-to-Run Process Control." Thesis, 2003. http://ndltd.ncl.edu.tw/handle/68758972143703970622.
Full text元智大學
工業工程與管理學系
91
The purpose of this research is to develop a Back-propagation neural network-based (BPNN) run-to-run real-time process controller for the common process disturbances in semiconductor industries. We consider using BPNN for controlling the process disturbances, including the process noises, shifts and drifts. The performances of control result were compared with the EWMA controllers. On the other hand, we compared the control speed between the controllers and considered the MISO (multiple input single output) system for the follow-up research. After the study, we conclude that the BPNN controller outperform the EWMA controllers in the different process disturbances. The BPNN controller has higher stability and real-time control ability. The MISO system promotes the process estimation and prediction efficiently, and the demonstration of the BPNN controller performance can arise the application and feasibility in the practical process.
Chan, Chien-Lung, and 詹建隆. "Long-Run and Shot-Run Economic Analysis Under Wage Stickiness." Thesis, 2009. http://ndltd.ncl.edu.tw/handle/83999997208692318777.
Full textChen, Pei Yu, and 陳沛瑜. "Generalized Quasi-MMSE Controller for Run-to-Run Dynamic Models." Thesis, 2015. http://ndltd.ncl.edu.tw/handle/77499815019090403830.
Full text國立清華大學
統計學研究所
103
Run-to-run process control techniques are frequently used in semiconductor manufacturing operations. Most of the model-based studies (such as EWMA-based controllers) in literature assumed that process input-output (I-O) relationship is static and simply considers colored noise models for the process disturbance. However, the EWMA-based controllers usually lead to unsatisfactory performance when process dynamics and disturbance dynamics are occurred simultaneously. Recently, a quasi minimum mean square error (qMMSE) controller is proposed in literature, based on the assumption that process I-O model follows a combined first-order transfer function (TF)-noise model. However, it lacks of generality in practical applications. To overcome this difficulty, this study first proposes a generalized qMMSE controller when the process I-O model follows a combined general-order TF-noise model. Then, the expression of process output, the long-term stability conditions and the optimal discount factor of this controller are derived analytically. Furthermore, we use a second-order TF model to illustrate the effects of mis-identification of process I-O model (at the offline stage) on the process total mean square error (TMSE). Via a comprehensive simulation study, it demonstrates that the TMSE may even inflate more than 150% if a second-order TF-noise model with moderately large carry-over effects is wrongly identified as that of a first-order model. It means that the model identification at off-line stage is not negligible for implementing a dynamic RTR process control.
Cavaleiro, João Pedro dos Santos. "A validade e reprodutibilidade do protocolo run-bike-run modificado." Master's thesis, 2011. http://hdl.handle.net/10400.5/3071.
Full textEste estudo pretende verificar a validade e reprodutibilidade do protocolo Run-Bike- Run (RBR) modificado, em 7 triatletas de distância sprint (SD), 8 distância olímpica (OD) e 8 longa distância (LD) não elite. Foram efectuados 4 testes: 1) progressivo de corrida (TPC), 2-3) Dois RBR modificado e 3) contra-relógio (30 minutos ciclismo + 20 minutos corrida). Foram encontradas diferenças entre OD e LD no VO2máx e o LV como percentagem do VO2máx do TPC (p<0.05) mas não no tempo total da competição de triatlo. O VO2máx absoluto e relativo da corrida são diferentes entre SD e OD (ambos p<0.001), e entre SD e LD (p<0.001, p<0.02). Não existe correlação no VO2máx entre as corridas e o tempo de triatlo ou dos 10km, em OD+LD. O tempo do triatlo sprint foi correlacionado com o VO2máx e velocidademáx na corrida (ambos p<0.05) em SD. Não existe diferenças no VO2 e economia entre as corridas nos subgrupos no RBR1 mas o lactato foi diferente entre as corridas (todos p<0.001, OD+LD p<0.02, SD p<0.001) mas não em LD nem OD. Os resultados sugerem que o RBR modificado apresenta validade ecológica e é reproduzível nos atletas grupos de idades OD.
Martinez, Victor Manuel. "Adaptive run-to-run control of overlay in semiconductor manufacturing." Thesis, 2002. http://wwwlib.umi.com/cr/utexas/fullcit?p3110651.
Full text鄭又慈. "Variable Quasi MMSE Run-to-Run Controller for Dynamic Systems." Thesis, 2011. http://ndltd.ncl.edu.tw/handle/66034567013333226131.
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